WO2013185422A1 - 母板取向膜的制作方法及转印版、取向液 - Google Patents

母板取向膜的制作方法及转印版、取向液 Download PDF

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Publication number
WO2013185422A1
WO2013185422A1 PCT/CN2012/082374 CN2012082374W WO2013185422A1 WO 2013185422 A1 WO2013185422 A1 WO 2013185422A1 CN 2012082374 W CN2012082374 W CN 2012082374W WO 2013185422 A1 WO2013185422 A1 WO 2013185422A1
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Prior art keywords
alignment
liquid
alignment film
transfer plate
film
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PCT/CN2012/082374
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English (en)
French (fr)
Inventor
林海云
赵承潭
李辉
李京鹏
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北京京东方光电科技有限公司
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Priority to EP12829171.3A priority Critical patent/EP2781955B1/en
Priority to KR1020137009812A priority patent/KR101543932B1/ko
Priority to US13/823,312 priority patent/US9513512B2/en
Priority to JP2015516410A priority patent/JP2015519613A/ja
Publication of WO2013185422A1 publication Critical patent/WO2013185422A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region

Definitions

  • Embodiments of the present invention relate to a method for producing a mother sheet oriented film, a transfer plate, and an alignment liquid. Background technique
  • a thin film transistor liquid crystal display has become a mainstream display product;
  • a TFT-LCD mainly includes a color film substrate and an array substrate which are opposed to each other, and a liquid crystal is filled between the color filter substrate and the array substrate.
  • an alignment liquid is applied to each of the surface of the array substrate and the color filter substrate.
  • the alignment liquid forms an alignment film on the array substrate and the color filter substrate.
  • the alignment film on the array substrate and the color filter substrate is rubbed with a rubbing cloth, and by the rubbing, minute grooves are formed on the surface of the alignment film, so that the liquid crystal molecules are initially arranged regularly along the groove direction.
  • the processing of the array substrate and the color film substrate is usually performed by simultaneously coating two or more substrates (array substrate or color film substrate) on a mother board, and finally, the divided mother boards are obtained into a single array substrate or color.
  • Membrane substrate Generally, the processing of the array substrate and the color film substrate is usually performed by simultaneously coating two or more substrates (array substrate or color film substrate) on a mother board, and finally, the divided mother boards are obtained into a single array substrate or color.
  • the apparatus for coating the alignment liquid is, for example, as shown in FIG.
  • the alignment liquid 101 is dropped through a nozzle 102 to a contact position of an Anilox Roll 103 and a Blade Roll 104; the doctor blade 104 coats the alignment liquid 101 on the rotating rubber roller 103.
  • Uniform the uniform roller 103 is in contact with the transfer plate 105 with a pre-formed pattern, and the alignment liquid 101 is transferred onto the transfer plate 105; finally, the rotating transfer plate 105 prints the alignment liquid 101 onto the substrate 106.
  • an alignment film 108 is formed on the surface of the mother board 107.
  • a schematic view of the side of the existing transfer plate is shown in Fig. 2, and a schematic view of the plane is shown in Fig. 3.
  • the transfer plate 105 includes a base film 109 and a transfer layer 110, and the transfer layer 110 has two or more convex transfer regions 111 respectively corresponding to the substrates on the mother substrate and between the transfer regions 111.
  • each of the transfer regions 111 corresponds to one substrate on the mother substrate 107, and since the edge alignment liquid 101 is easily accumulated at the edge of each transfer region 111, the alignment liquid 101 accumulated at these edges further proceeds.
  • the film is transferred to the display region of the substrate, resulting in uneven film quality of the alignment film 108 on the substrate, resulting in an uneven edge (Haro) region of the alignment film 108 or an excessively thick alignment film 108.
  • This makes the liquid crystal molecules in the edge region of the finally prepared product not properly oriented, and thus The area of the display area that causes the substrate to function properly is reduced.
  • the above-mentioned transfer plate 105 is also prone to the problem of the alignment of the alignment film 108, thereby further causing the area or reduction of the display area i or the substrate in which the substrate can operate normally.
  • the embodiment of the invention provides a method for preparing a mother substrate oriented film, a transfer plate and an alignment liquid, which can solve the problem that the edge region of the alignment film is too thick, and the edge region of the alignment film is too thick to overlap with the sealant region.
  • the display is poor.
  • a method for fabricating a mother sheet oriented film comprising: coating an alignment liquid on a mother board having two or more substrates by using a transfer plate, and forming an alignment film on the mother substrate to form an alignment film,
  • the transfer plate has a transfer region that covers two or more substrates at the same time; the alignment film on the mother substrate outside the display region of the substrate and in which the alignment film is not required to be left is removed.
  • the alignment film is composed of a photo-processed material; when the alignment film is removed, an exposure process is performed using a mask, and then a development process is performed.
  • the alignment liquid includes a liquid crystal molecule alignment material, a photosensitive material, a photo-sensitizer, and a solvent, and, for example, is composed of a liquid crystal molecule alignment material, a photosensitive material, a photosensitizer, and a solvent.
  • the liquid crystal molecular alignment material accounts for 25-35% by weight of the alignment liquid
  • the photosensitive material accounts for 3.5-6% by weight of the alignment liquid
  • the photosensitizer accounts for the weight ratio of the alignment liquid. It is 0.8-2.5%.
  • the liquid crystal molecule alignment material is one or both of a main chain type polyimide and a branched type polyimide.
  • the photosensitive material is 2,3,4,4'-tetrahydroxybenzophenone 1,2-diazonaphthoquinone-5-transesterate.
  • the photosensitizer is diazonaphthoquinone ascorbic acid chloride.
  • the ultraviolet light emitted from the exposure device has a wavelength of 340 nm to 460 nm and an exposure time of 60 s to 100 s.
  • Another aspect of the present invention also provides a transfer plate having a transfer region covering two or more substrates at the same time.
  • Still another aspect of the present invention provides an alignment liquid comprising a liquid crystal molecule alignment material, a photosensitive material, a photosensitizer, and a solvent.
  • the alignment liquid is composed of a liquid crystal molecular alignment material, and a sense Composition of light materials, photosensitizers and solvents.
  • the weight ratio of the liquid crystal molecular alignment material to the alignment liquid is
  • the photosensitive material accounts for 3.5-6% by weight of the alignment liquid
  • the photosensitizer accounts for 0.8-2.5% by weight of the alignment liquid.
  • the liquid crystal molecule alignment material is one or both of a main chain type polyimide and a branched type polyimide.
  • the photosensitive material is 2,3,4,4'-tetrahydroxybenzophenone 1,2-diazonaphthoquinone-5-carboxylate.
  • the photosensitizer is diazonaphthoquinone ascorbic acid chloride.
  • the method for preparing a mother sheet oriented film and the transfer plate and the alignment liquid provided by the embodiment of the present invention apply an alignment liquid on a mother board having two or more substrates by using a transfer plate to form an alignment film on the mother substrate.
  • the transfer plate has a transfer region covering at least two substrates at the same time; removing the alignment film on the mother substrate outside the display region of the substrate without leaving the alignment film, thereby solving the existing alignment film An excessively thick edge region, and an edge region where the alignment film is too thick, overlaps with the frame sealant region to cause a problem of poor display.
  • FIG. 1 is a schematic view of a device for coating an orientation agent in the prior art
  • Figure 2 is a side elevational view of the transfer plate of the prior art
  • Figure 3 is a plan view showing a transfer plate in the prior art
  • Figure 4 is a side view of the transfer plate of the present invention.
  • Figure 5 is a plan view of the transfer plate of the present invention
  • FIG. 6 is a schematic flow chart of a method for fabricating a mother substrate oriented film according to the present invention.
  • Figure 7 is a plan view showing the obtained mother board after coating the orientation liquid in the present invention.
  • Figure 8 is a plan view showing the mother board after mask exposure of the present invention.
  • Embodiments of the present invention provide a transfer plate.
  • 4 and 5 are a schematic side view and a plan view, respectively, of the transfer plate in the present embodiment.
  • the transfer plate 105 includes a base film 109 and a transfer layer 110 having a transfer area of two or more substrates capable of simultaneously covering the coated mother substrate. 111.
  • FIG. 6 is a schematic flow chart of a method for fabricating a mother substrate oriented film according to the embodiment. As shown in Figure 6, the method includes the following steps:
  • Step 602 applying an alignment liquid on a mother board having two or more substrates by using a transfer plate, and forming an alignment film on the mother substrate, the transfer plate having a transfer region covering at least two substrates.
  • the orientation liquid 101 is applied onto the cleaned mother substrate 107, and the alignment liquid 101 is spread on the mother substrate 107 to form an alignment film 108.
  • the transfer plate has a transfer area that covers two or more substrates at the same time.
  • the alignment film is composed of a photo-processed material that can utilize an exposure and development process to remove unwanted portions of the material.
  • the exposure step may be performed using a mask first, and then the development step may be performed.
  • the alignment liquid includes a liquid crystal molecule alignment material, a photosensitive material, a photosensitizer, and a solution.
  • the agent for example, is mainly composed of a liquid crystal molecular alignment material, a photosensitive material, a photosensitizer, and a solvent, and the alignment liquid is cured to form the above-mentioned photo-processed material.
  • the weight ratio of the liquid crystal molecular alignment material to the alignment liquid may be 25-35%, the weight ratio of the photosensitive material to the alignment liquid may be 3.5-6%, and the weight ratio of the photosensitizer to the alignment liquid may be 0.8-2.5. %.
  • the above liquid crystal molecular alignment material is exemplified by one or both of a main chain type polyimide and a branched type polyimide.
  • photosensitive material is 2,3,4,4'-tetrahydroxybenzophenone 1,2-diazonaphthoquinone-5-transester.
  • photosensitizer may be diazonaphthoquinonesulfonyl chloride.
  • the main chain type polyimide is polymerized from PMDA and MDA, and the branched polyimide is composed of PMDA.
  • MDA and TBCA are polymerized; PMDA is pyromellitic dianhydride, MDA is 4,4'-diaminodiphenyl decane, and TBCA is 4-(4-(trifluoromethoxy)phenyl fluorenyl) Cyclohexyl-3,5-diaminophenyl phthalate.
  • Fig. 7 is a schematic plan view showing the obtained mother substrate after coating the alignment liquid in the present invention.
  • the transfer plate 105 has a transfer portion 111 which covers two or more substrates at the same time. Therefore, when the transfer plate 105 transfers the alignment film 108 on the two or more substrates of the mother substrate 107, the display region 113, the non-display region 114, the sealant region 115, and the mother board of each substrate on the mother substrate 107.
  • the other regions 116 on 107 are formed with an alignment film 108; the non-display region 114 includes a sealant region 115 surrounding the display region 113.
  • Step 603 removing the alignment film on the mother board outside the display area of the substrate without leaving the alignment film.
  • the alignment film 108 is formed on the mother board 107 by using the transfer plate 105 shown in FIGS. 4 and 5, the non-display area 114 of the mother board 107 and the sealant area 115 are formed. And other regions 116 on the mother board 107 are also covered by the alignment film 108, which will affect the conductivity of the upper and lower substrates. Therefore, in this step, the display area 114 on the mother board 107 or the area where the alignment film needs to be retained is blocked by the mask.
  • the device emits ultraviolet light, and the ultraviolet light passes through the mask plate and is irradiated onto the alignment film 108 of the mother substrate 107 to which the photosensitive material is applied, that is, the exposure and development methods are used to remove the display substrate 113 on the mother substrate 107 outside the display region 113 of the substrate and need not be retained.
  • the alignment film 108 of the region of the alignment film may be removed by photolithography or the like to obtain the mother substrate 107 shown in Fig. 8.
  • the ultraviolet light emitted by the exposure device may have a wavelength of 340 nm to 460 nm, and the exposure time is 60s ⁇ 100s.
  • the mother board 107 is used, for example, to prepare an array substrate or a color filter substrate. After the alignment film is formed, a rubbing process is performed on the alignment film, and minute grooves arranged in a certain direction are formed in the alignment film. For the array substrate and the color filter substrate, the rubbing directions may be the same or different. Then, the mother board is cut to obtain a single array substrate or a color filter substrate.
  • the alignment liquid has better uniformity on the substrate when the alignment liquid is applied, and it is easier to form an alignment film having a uniform thickness.
  • the excess alignment film can be removed by exposure and development or photolithography, thereby solving the problem that the alignment film is too thick.
  • the edge region, and the edge region where the alignment film is too thick overlaps with the frame sealant region to cause display defects. Further, it is possible to make a corresponding transfer plate without using each model, and the same transfer plate can be used as long as the substrates on the mother board 107 are the same size.

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Abstract

一种母板取向膜的制作方法及转印版、取向液，该方法包括：利用转印版（105）在具有两个以上基板的母板（107）上涂布取向液（101），使取向液（101）在母板（107）上形成取向膜（108），所述转印版（105）具有同时覆盖两个以上基板的转印区（111）；将所述母板（107）上位于基板的显示区域（113）以外且不需保留取向膜（108）的区域的取向膜（108）去除。该方法能够解决目前存在取向膜过厚的边缘区，以及取向膜过厚的边缘区与封框胶区域重叠引起的显示不良问题。

Description

母板取向膜的制作方法及转印版、 取向液 技术领域
本发明的实施例涉及一种母板取向膜的制作方法及转印版、 取向液。 背景技术
目前， 薄膜晶体管液晶显示器 （TFT-LCD ) 已成为主流的显示产品； TFT-LCD主要包括彼此对置的彩膜基板和阵列基板，彩膜基板和阵列基板之 间填充有液晶。 为了使液晶分子能够正确地被取向， 在阵列基板和彩膜基板 的表面各涂上一层取向液。取向液在阵列基板和彩膜基板上形成一层取向膜。 然后， 用摩擦布摩擦阵列基板和彩膜基板上的取向膜， 通过该摩擦， 在取向 膜表面形成微小的沟槽， 使得液晶分子初始沿沟槽方向有规律排列。
一般的阵列基板和彩膜基板加工过程通常都是对一块母板上的两块以 上基板（阵列基板或彩膜基板） 同时涂覆取向液， 最后再将分割母板得到单 个的阵列基板或彩膜基板。
涂布取向液的装置例如如图 1 所示。 首先， 将取向液 101 通过喷嘴 ( Dispenser ) 102滴加到匀胶辊（ Anilox Roll ) 103与刮刀 （ Blade Roll ) 104 的接触位置； 刮刀 104把旋转的匀胶辊 103上的取向液 101涂布均匀； 匀胶 辊 103与带有预先形成图形的转印版 105接触， 将取向液 101转印到转印版 105上； 最后，旋转的转印版 105把取向液 101印刷到基台 106上的母板 107 表面上， 形成取向膜 108。 现有的转印版的侧面展开示意图如图 2所示， 平 面示意图如图 3所示。 转印版 105包括基膜 109和转印层 110, 转印层 110 上有两个以上分别与母板上的基板分别对应的凸起状的转印区 111和位于转 印区 111之间的非转印区 112。
上述涂布取向液的装置， 由于各转印区 111分别与母板 107上的一个基 板对应， 而且由于在各转印区 111的边缘取向液 101容易积聚， 这些边缘积 聚的取向液 101进一步会被转印到基板的显示区域， 从而导致基板上取向膜 108的膜质不均匀， 产生取向膜 108不均匀或取向膜 108过厚的边缘（Haro ) 区。 这使得在最后所制备的产品的边缘区的液晶分子不能正常取向， 进而会 导致基板能够正常工作的显示区域的面积缩小。 另一方面， 上述转印版 105 还容易出现取向膜 108印偏的问题， 从而进一步导致基板能够正常工作的显 示区 i或的面积、缩小。 发明内容
本发明的实施例提供了一种母板取向膜的制作方法及转印版、 取向液， 可以解决目前存在取向膜过厚的边缘区， 以及取向膜过厚的边缘区与封框胶 区域重叠引起的显示不良问题。
本发明的一个方面提供一种母板取向膜的制作方法， 包括： 利用转印版 在具有两个以上基板的母板上涂布取向液， 使取向液在母板上形成取向膜， 所述转印版具有同时覆盖两个以上基板的转印区； 将所述母板上位于基板的 显示区域以外且不需保留取向膜的区域的取向膜去除。
上述方法中， 例如， 所述取向膜由光加工材料组成； 去除所述取向膜时， 先利用掩膜版进行曝光工序， 再进行显影工序。
上述方法中， 例如， 所述取向液包括液晶分子取向材料、 感光材料、 光 敏剂和溶剂， 又例如， 由液晶分子取向材料、 感光材料、 光敏剂和溶剂组成。
上述方法中，例如，所述液晶分子取向材料占取向液的重量比为 25-35%, 所述感光材料占取向液的重量比为 3.5-6%, 所述光敏剂占取向液的重量比为 0.8-2.5%。
上述方法中， 例如， 所述液晶分子取向材料为主链型聚酰亚胺和支链型 聚酰亚胺中的一种或两种。
上述方法中， 例如， 所述感光材料为 2,3,4,4'-四羟基二苯曱酮 1,2-二叠氮 基萘醌 _5-横酸酯。
上述方法中， 例如， 所述光敏剂为重氮萘醌横酰氯。
上述方法中， 例如， 所述利用曝光和显影方法去除所述取向膜时， 曝光 设备发出的紫外光的波长为 340nm~460nm, 曝光时长为 60s~100s。
本发明的另一个方面还提供一种转印版， 所述转印板具有同时覆盖两个 以上基板的转印区。
本发明的再一个方面还提供一种取向液， 所述取向液包括液晶分子取向 材料、 感光材料、 光敏剂和溶剂。 例如， 该取向液由液晶分子取向材料、 感 光材料、 光敏剂和溶剂组成。
上述取向液中， 例如， 所述液晶分子取向材料占取向液的重量比为
25-35%, 所述感光材料占取向液的重量比为 3.5-6%, 所述光敏剂占取向液的 重量比为 0.8-2.5%。
上述取向液中， 例如， 所述液晶分子取向材料为主链型聚酰亚胺和支链 型聚酰亚胺中的一种或两种。
上述取向液中， 例如， 所述感光材料为 2,3 ,4,4'-四羟基二苯曱酮 1,2-二叠 氮基萘醌 -5- 酸酯。
上述取向液中， 例如， 所述光敏剂为重氮萘醌横酰氯。
本发明实施例提供的母板取向膜的制作方法及转印版、 取向液， 利用转 印版在具有两个以上基板的母板上涂布取向液， 使取向液在母板上形成取向 膜； 所述转印版具有同时覆盖两个以上基板的转印区； 将所述母板上位于基 板的显示区域以外且不需保留取向膜的区域的取向膜去除， 因此能够解决目 前存在取向膜过厚的边缘区， 以及取向膜过厚的边缘区与封框胶区域重叠弓 I 起的显示不良问题。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1是现有技术中涂布取向剂的装置示意图；
图 2是现有技术中转印版的侧面展开示意图；
图 3是现有技术中转印版的平面示意图；
图 4是本发明中转印版的侧面示意图；
图 5是本发明中转印版的平面示意图
图 6是本发明实现母板取向膜的制作方法的流程示意图；
图 7是本发明中涂布取向液后的得到的母板的平面示意图；
图 8是本发明掩膜曝光后母板的平面示意图。
附图标记说明：
101 : 取向液 102: 喷嘴 103： 匀胶辊 104： 刮刀
105 ： 转印版 106 • • 丞 it 口
107 ： 母板 108 ： 取向膜
109 ： 基膜 110 转印层
111 转印区 112: 非转印区
113 显示区域^ 114 非显示区域
115 封框胶区域 116 其他区域 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例的附图，对本发明实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本发明的一部分实施例， 而不是全部的实施例。 基于所描 述的本发明的实施例， 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例， 都属于本发明保护的范围。
本发明的实施例提供一种转印版。 图 4和图 5分别是本实施例中的转印 版的侧面示意图和平面示意图。如图 4和图 5所示，转印版 105包括基膜 109 和转印层 110, 所述转印层 110上具有一个能够同时覆盖被涂覆的母板的两 个以上基板的转印区 111。
利用上述转印版， 本发明的实施例还提供一种母板取向膜的制作方法。 图 6是本实施例实现母板取向膜的制作方法的流程示意图。 如图 6所示， 该 方法包括以下步骤：
步骤 602, 利用转印版在具有两个以上基板的母板上涂布取向液， 使取 向液在母板上形成取向膜，所述转印版具有同时覆盖两个以上基板的转印区。
例如， 利用本发明图 4和图 5所示的转印版， 在清洗后的母板 107上涂 布加取向液 101 ,使取向液 101在母板 107铺展开上形成取向膜 108; 所述转 印版具有同时覆盖两个以上基板的转印区。
例如， 所述取向膜由光加工材料组成， 该光加工材料可利用能够使用曝 光和显影工艺去除不需要的部分材料。 在去除该取向膜时， 可以先利用掩膜 版进行曝光工序， 再进行显影工序。
所述取向液的一个示例包括液晶分子取向材料、 感光材料、 光敏剂和溶 剂， 例如， 主要由液晶分子取向材料、 感光材料、 光敏剂和溶剂组成， 该取 向液固化后可形成上述光加工材料。
上述液晶分子取向材料占取向液的重量比可为 25-35%,所述感光材料占 取向液的重量比可为 3.5-6%, 所述光敏剂占取向液的重量比可为 0.8-2.5%。
上述液晶分子取向材料的示例为主链型聚酰亚胺和支链型聚酰亚胺中的 一种或两种。
所述感光材料的示例为 2,3,4,4'-四羟基二苯曱酮 1,2-二叠氮基萘醌 -5-横 酸酯。
所述光敏剂的示例可以是重氮萘醌磺酰氯。
主链型聚酰亚胺由 PMDA和 MDA聚合而成 ,支链型聚酰亚胺由 PMDA、
MDA和 TBCA聚合而成； PMDA为均苯四酸二酐， MDA为 4,4'-二胺基二 苯曱烷， TBCA为 4-(4- (三氟曱氧基)苯曱酞基)环己基 -3,5-二胺基苯曱酸酯。
图 7是本发明中涂布取向液后的得到的母板的平面示意图。如图 7所示， 利用本实施例的如图 4和图 5所示的转印版 105 , 该转印版 105具有同时覆 盖两个以上基板的转印区 111。 因此， 该转印版 105在母板 107的两个以上 基板上转印取向膜 108时， 在母板 107上每个基板的显示区域 113、 非显示 区域 114、 封框胶区域 115及母板 107上的其他区域 116, 都形成有取向膜 108; 非显示区域 114包含封框胶区域 115 , 围绕在显示区域 113四周。
步骤 603 , 将所述母板上位于基板的显示区域以外且不需保留取向膜的 区域的取向膜去除。
例如， 在步骤 602形成的母板 107上， 由于利用图 4和图 5所示的转印 版 105在母板 107上形成取向膜 108,母板 107的非显示区域 114、封框胶区 域 115及母板 107上的其他区域 116也被取向膜 108覆盖， 将影响上下基板 的导电， 因此本步骤中， 利用掩膜板将母板 107上显示区域 114或需要保留 取向膜的区域遮挡， 曝光设备发出紫外光， 紫外光经过掩膜板后照射到母板 107上加有光敏材料的取向膜 108上， 即利用曝光和显影方法去除母板 107 上位于基板的显示区域 113以外且不需保留取向膜的区域的取向膜 108。 这 里， 也可以利用光刻法等方式将母板 107上位于每个基板的显示区域 113以 外且不需保留取向膜的区域的取向膜 108去除， 得到图 8所示的母板 107。
例如， 曝光设备发出的紫外光的波长可以为 340nm~460nm, 曝光时长为 60s~100s。
该母板 107例如用于制备阵列基板或彩膜基板。 在形成了取向膜之后， 对于取向膜进行摩擦工艺，在取向膜之中形成沿一定方向排列的微小的沟槽。 对于阵列基板和彩膜基板， 摩擦方向可以相同或不同。 然后， 对母板进行切 割， 得到单个的阵列基板或彩膜基板。
本发明实施例提供的母板取向膜的制作方法及转印版中， 通过对现有转 印版的改进和处理， 在将取向膜转印到母板上的基板上时， 与现有的具有活 性区和非活性区的转印版相比，涂布取向液时取向液在基板上的均一性更好， 更容易形成厚度一致的取向膜。 这时， 即使显示区域外边缘存在较多的取向 液， 或即使存在取向膜印偏现象， 也可以利用曝光和显影法或光刻法将多余 的取向膜去除， 从而解决目前存在取向膜过厚的边缘区， 以及取向膜过厚的 边缘区与封框胶区域重叠引起的显示不良问题。 此外， 可以不用每个型号都 制作相应的转印版， 只要母板 107上的基板的尺寸相同就可以用同一个转印 版。
以上所述， 仅为本发明的较佳实施例而已， 并非用于限定本发明的保护 范围， 凡在本发明的精神和原则之内所作的任何修改、 等同替换和改进等， 均应包含在本发明的保护范围之内。

Claims

权利要求书
1、 一种母板取向膜的制作方法， 包括：
利用转印版在具有两个以上基板的母板上涂布取向液， 使取向液在母板 上形成取向膜， 所述转印版具有同时覆盖两个以上基板的转印区；
将所述母板上位于基板的显示区域以外且不需保留取向膜的区域的取向 膜去除。
2、 根据权利要求 1所述的方法， 其中，
所述取向膜由光加工材料组成；
去除所述取向膜时， 先利用掩膜版进行曝光工序， 再进行显影工序。
3、根据权利要求 1或 2所述的方法， 其中， 所述取向液包括液晶分子取 向材料、 感光材料、 光敏剂和溶剂。
4、根据权利要求 3所述的方法， 其中， 所述液晶分子取向材料占取向液 的重量比为 25-35%, 所述感光材料占取向液的重量比为 3.5-6%, 所述光敏 剂占取向液的重量比为 0.8-2.5%。
5、根据权利要求 3或 4所述的方法， 其中， 所述液晶分子取向材料为主 链型聚酰亚胺和支链型聚酰亚胺中的一种或两种。
6、 根据权利要求 3-5任一所述的方法， 其中， 所述感光材料为 2,3,4,4'- 四羟基二苯曱酮 1,2-二叠氮基萘醌 -5-横酸酯。
7、 根据权利要求 3-6任一所述的方法， 其中， 所述光敏剂为重氮萘醌磺 酰氯。
8、根据权利要求 2所述的方法， 其中， 所述利用曝光和显影方法去除所 述取向膜时， 曝光设备发出的紫外光的波长为 340nm~460nm, 曝光时长为 60s~100s。
9、 一种转印版， 包括同时覆盖两个以上基板的转印区。
10、 一种取向液， 包括液晶分子取向材料、 感光材料、 光敏剂和溶剂。
11、根据权利要求 10所述的取向液， 其中， 所述液晶分子取向材料占取 向液的重量比为 25-35%, 所述感光材料占取向液的重量比为 3.5-6%, 所述 光敏剂占取向液的重量比为 0.8-2.5%。
12、 根据权利要求 10或 11所述的取向液， 其中， 所述液晶分子取向材 料为主链型聚酰亚胺和支链型聚酰亚胺中的一种或两种。
13、 根据权利要求 10-12任一所述的取向液， 其中， 所述感光材料为 2,3 ,4,4'-四羟基二苯曱酮 1 ,2-二叠氮基萘醌 -5-横酸酯。
14、 根据权利要求 10-13任一所述的取向液， 其中， 所述光敏剂为重氮 萘醌横酰氯。
PCT/CN2012/082374 2012-06-14 2012-09-28 母板取向膜的制作方法及转印版、取向液 WO2013185422A1 (zh)

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