WO2021114365A1 - 显示面板及其制备方法 - Google Patents

显示面板及其制备方法 Download PDF

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Publication number
WO2021114365A1
WO2021114365A1 PCT/CN2019/126850 CN2019126850W WO2021114365A1 WO 2021114365 A1 WO2021114365 A1 WO 2021114365A1 CN 2019126850 W CN2019126850 W CN 2019126850W WO 2021114365 A1 WO2021114365 A1 WO 2021114365A1
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WO
WIPO (PCT)
Prior art keywords
alignment film
substrate
area
display panel
preparation
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Application number
PCT/CN2019/126850
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English (en)
French (fr)
Inventor
曹武
Original Assignee
深圳市华星光电半导体显示技术有限公司
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Application filed by 深圳市华星光电半导体显示技术有限公司 filed Critical 深圳市华星光电半导体显示技术有限公司
Priority to US16/626,729 priority Critical patent/US20210333646A1/en
Publication of WO2021114365A1 publication Critical patent/WO2021114365A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723—Polyimide, polyamide-imide
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells

Definitions

  • This application relates to the field of display panel manufacturing, in particular to a display panel and a manufacturing method thereof.
  • the black matrix is set on the array substrate (Black Matrix on Array, BOA) technology and the color film is set on the array substrate (Color Filter on Array, COA) technology is two integrated technologies commonly used in liquid crystal display devices, while black optical spacers (Black Photo Spacer (BPS) technology, as a kind of BOA technology, is often combined with COA technology to realize the preparation of display panels.
  • Black Matrix on Array, BOA Black Matrix on Array
  • COA Color Filter on Array
  • BPS Black Photo Spacer
  • the two independent manufacturing processes of the black matrix and spacers in the liquid crystal display device are integrated into one manufacturing process to realize the preparation of three functional structures; namely, the use of black organic photoresist on the array substrate and the single-exposure development process Process, the main spacers, sub spacers and black matrix of different heights are prepared at one time, which can not only shading light, but also have the function of supporting the thickness of the box.
  • the black matrix fabricated on the color filter substrate can be formed through a patterning process to form alignment marks and other information to improve the accuracy of each process section.
  • the black matrix is prepared on the array substrate, which is different from the BM on CF structure, only a transparent conductive layer needs to be deposited on the color film substrate as the upper substrate as the common electrode, and does not involve the pattern of the alignment mark Therefore, it is impossible to obtain positioning marks for fine patterns, so the conventional patterning process is used to form alignment information, and then the method of realizing precision control is not applicable.
  • the sprayed PI alignment film When the sprayed PI alignment film cannot completely cover the display area of the display device, it will cause light leakage; in addition, if the PI alignment film is stacked on the boundary of the display area, This will cause uneven brightness problems; if the PI alignment film exceeds the coating range, that is, beyond the cutting line, when it is sprayed to parts such as the via area, due to the subsequent influence of the PI alignment film and the sealant, plus a long time Influenced by water vapor, there will be a risk of stability failure in the reliability test.
  • the embodiments of the present application provide a display panel and a manufacturing method thereof, which can solve the problem that the alignment film boundary cannot be accurately controlled when the substrate has no alignment mark during the manufacturing process of the existing display panel, which causes light leakage or uneven brightness of the display panel.
  • the problem, and the problem that the alignment film and the sealant then cause stability failure in the reliability test.
  • an embodiment of the present application provides a method for manufacturing a display panel, including the following steps:
  • S20 Provide a photomask, use the photomask to expose the substrate, define a hydrophilic area and a hydrophobic area on the surface of the substrate, the hydrophilic area corresponds to the display area of the display panel, and the hydrophobic area Corresponding to the non-display area of the display panel;
  • the photomask includes a light-transmitting area and a light-shielding area.
  • step S20 the light-transmitting area is aligned with the display area, and the light-shielding area is aligned with the non-display area. .
  • the substrate is exposed to ultraviolet light.
  • step S20 extreme ultraviolet light is used to expose the substrate.
  • the preparation method before the step S20, the preparation method further includes cleaning the substrate to be coated with the alignment film.
  • the substrate includes a substrate and a conductive layer, the conductive layer is disposed on the surface of the substrate and located in the display area and the non-display area, and the alignment film is formed on the surface of the substrate.
  • the conductive layer is away from the surface of one side of the substrate.
  • the preparation material of the conductive layer includes one of indium tin oxide, indium tin oxide, and zinc oxide.
  • the display panel further includes a sealant area located in the non-display area, and the boundary between the hydrophilic area and the hydrophobic area is located in the sealant area in the non-display area Close to the side of the display area.
  • step S30 further includes:
  • S302 Perform curing treatment on the alignment film solution to obtain the alignment film.
  • the contact angle of the alignment film solution in the hydrophobic region is greater than the contact angle of the alignment film solution in the hydrophilic region.
  • the difference between the contact angle of the alignment film solution in the hydrophobic region and the contact angle of the alignment film solution in the hydrophilic region is greater than or equal to 15° and less than or equal to 180° .
  • the contact angle of the alignment film solution in the hydrophilic region is greater than or equal to 0° and less than 90°.
  • the contact angle of the alignment film solution in the hydrophilic region is greater than or equal to 0° and less than or equal to 30°.
  • the preparation material of the alignment film solution is polyimide.
  • the photomask is a hard patterned substrate or a soft patterned substrate.
  • the photomask is a hard patterned substrate or a soft patterned substrate.
  • the present application also provides a display panel manufactured by the manufacturing method of the display panel.
  • the display panel further includes an array substrate with alignment marks, and the array substrate is provided with a first alignment film on a side surface with the alignment marks.
  • the embodiment of the present application provides a display panel and a preparation method thereof.
  • the preparation method includes: providing a substrate to be coated with an alignment film; providing a photomask, and applying the photomask to the substrate Exposure treatment is performed to define a hydrophilic area and a hydrophobic area on the surface of the substrate, the hydrophilic area corresponds to the display area of the display panel, and the hydrophobic area corresponds to the non-display area of the display panel; coating alignment on the substrate Film to confine the alignment film in the hydrophilic region.
  • the existing display panel manufacturing method cannot control the boundary accuracy of the alignment film because there is no alignment mark on the substrate, and it is easy to make the coverage area of the alignment film insufficient or exceed the coverage.
  • the area should be prepared to cause light leakage or uneven brightness of the display panel; avoid the problem of stability failure in the reliability test due to the adhesion of the alignment film and the sealant; also avoid the lack of alignment marks to assist in the preparation of the alignment
  • the edge information of the substrate is used as the reference mark, which causes the technical problem of error; this application can realize the control of the boundary accuracy of the alignment film without increasing the difficulty and time of the existing manufacturing process.
  • FIG. 1A is a flow chart of preparing a display panel provided by an embodiment of the application.
  • Figures 1B ⁇ 1E are process schematic diagrams corresponding to the preparation method shown in 1A;
  • FIG. 2 is a schematic diagram of the structure of a substrate provided by an embodiment of the application.
  • FIG. 3 is a top view of a display panel provided by an embodiment of the application.
  • FIG. 4 is a schematic diagram of the structure of a photomask provided by an embodiment of the application.
  • FIG. 1A is a flow chart of the preparation of the display panel provided by the embodiment of the application, as shown in Figs. 1B to 1D, which is a schematic diagram of the process corresponding to the preparation method shown in 1A, including the following steps:
  • S10 Provide a substrate 101 to be coated with an alignment film, as shown in FIG. 1B;
  • S20 Provide a photomask 200, use the photomask 200 to expose the substrate 101, define and form a hydrophilic region 101a and a hydrophobic region 101b on the surface of the substrate 101, and the hydrophilic region 101a corresponds to the display panel.
  • the display area, the hydrophobic area 101b corresponds to the non-display area of the display panel, as shown in FIG. 1C and FIG. 1D;
  • the preparation method further includes cleaning the substrate 101 to be coated with the alignment film.
  • the substrate 101 is exposed to ultraviolet light
  • the ultraviolet lithography technology includes extreme ultraviolet (Extreme Ultraviolet Lithography, EUV) lithography technology.
  • the step S30 also includes:
  • the alignment film solution is polyimide, and the alignment film solution can be prepared in the hydrophilic region 101a by spraying method, spin coating method, liquid phase method, or the like. Due to the tendency of the alignment membrane solution to diffuse, at the boundary between the hydrophilic region 101a and the hydrophobic region 101b, the alignment membrane solution is easier to prepare in the hydrophilic region 101a, and the alignment membrane solution An expected coating boundary will be obtained at the junction of the hydrophilic region 101a and the hydrophobic region 101b, so as to achieve the control of the boundary accuracy.
  • the contact angle of the liquid on the surface of the solid material is generally used for characterization. Therefore, the contact angle can also be used for the performance of the alignment film solution in the hydrophilic region 101a and the hydrophobic region 101b. Characterize.
  • the alignment membrane solution has different contact angles in the hydrophobic region 101b and the hydrophilic region 101a, so that The alignment film solution forms the alignment film 102 with sufficient boundary accuracy.
  • the contact angle ⁇ 1 of the alignment film solution in the hydrophobic region 101b is greater than that of the alignment film solution in the hydrophilic region.
  • the contact angle ⁇ 2 of 101a enables the hydrophilic region 101a to have better wetting performance, and facilitates the diffusion of the alignment film solution in the hydrophilic region 101a.
  • the contact angle ⁇ 1 of the alignment film solution in the hydrophobic region 101b and the contact angle ⁇ 2 of the alignment film solution in the hydrophilic region 101a are more different, the alignment film solution is in the hydrophilic region 101a. 101a and the hydrophobic region 101b exhibit different diffusion properties. Therefore, the contact angle ⁇ 1 of the alignment film solution in the hydrophobic region 101b differs from the contact angle of the alignment film solution in the hydrophilic region 101a. The difference is greater than or equal to 15° and less than or equal to 180°, that is, 15° ⁇ 1- ⁇ 2 ⁇ 180°, to ensure that the wettability of the hydrophilic region 101a and the hydrophobic region 101b is sufficiently different to ensure the alignment The boundary of the film 102 has sufficient accuracy.
  • the contact angle is equal to 90°, it is the dividing line of whether the alignment film solution can wet the hydrophilic region 101a; therefore, in order to ensure that the alignment film solution can be prepared in the hydrophilic region 101a, and the prepared all
  • the alignment film 102 has sufficient boundary accuracy, and the contact angle ⁇ 2 of the alignment film solution in the hydrophilic region 101a is less than 90°.
  • the contact angle ⁇ 2 of the alignment film solution in the hydrophilic region 101a is greater than or equal to 0°.
  • the contact angle ⁇ 2 of the alignment film solution in the hydrophilic region 101a is equal to 0°, the alignment film solution can be completely prepared in the hydrophilic region 101a.
  • the change range of the contact angle ⁇ 2 of the alignment film solution in the hydrophilic region 101a is: 0° ⁇ 2 ⁇ 90°, and further, the contact angle of the alignment film solution in the hydrophilic region 101a
  • the variation range of ⁇ 2 is: 0° ⁇ 2 ⁇ 30°.
  • the step S20 and the step S30 are all in the pre-cleaning section (Before Process Cleaning, BPC) machine, because the BPC machine includes pure water or chemical reagent cleaning parts, drying and EUV treatment parts, film curing parts, etc., each part of the BPC machine corresponds to each station, so in
  • the cleaning of the substrate to be coated with the alignment film during preparation may be performed at a cleaning station, the step S20 may be performed at an ultraviolet (Ultraviolet Lithography, UV) or EUV station, and the step S30 may be performed at a film-forming curing station.
  • UV Ultraviolet Lithography
  • EUV station EUV station
  • the step S30 may be performed at a film-forming curing station. In this way, the manufacturing process can be saved to the utmost extent, and the control of the boundary accuracy of the alignment film 102 can be improved while ensuring that the time of the existing manufacturing process is unchanged or not greatly changed.
  • FIG. 2 is a schematic structural diagram of a substrate provided by an embodiment of the application;
  • the substrate 101 includes a substrate 1011 and a conductive layer 1012, and the conductive layer 1012 is disposed on the surface of the substrate 1011 and located on the display Region and the non-display region, the alignment film 102 is formed on the surface of the conductive layer 1012 away from the substrate 1011.
  • the hydrophilic region 101a and the hydrophobic region 101b are formed on the surface of the conductive layer 1012 away from the substrate 1011 by the ultraviolet photolithography technique.
  • the preparation material of the conductive layer 1012 includes one of indium tin oxide, indium tin oxide, and zinc oxide.
  • the present application also provides a display panel manufactured by the manufacturing method of the display panel; specifically, please refer to FIG. 3, which is a top view of the display panel provided by an embodiment of the application; the display panel has at least one display area 100a and a non-display area 100b located at the periphery of the display area 100a, the non-display area 100b includes a first non-display area 1001 and a second non-display area 1002, and the second non-display area 1002 is located in the display area 100a And the first non-display area 1001.
  • the display panel also includes a sealant area (not shown in the figure) located in the non-display area 100b, and the boundary 103 between the hydrophilic area 101a and the hydrophobic area 101b is located in the non-display area 100b.
  • the sealant area is close to the side of the display area 100a; specifically, the boundary 103 between the hydrophilic area 101a and the hydrophobic area 101b is located on the side of the GOA trace 104 close to the display area 100a.
  • the substrate 101 is a color filter substrate, and the display panel further includes an array substrate 210 disposed opposite to the substrate 101.
  • the array substrate 210 includes a first alignment film, a first conductive layer, a first insulating layer, and a color resist. Not shown parts of the layer, the second insulating layer, the gate insulating layer, the gate signal line, the data signal line, and the like.
  • An alignment mark 211 is provided on the array substrate 210, and the alignment mark 211 is used to form the first alignment film on the side of the array substrate 210 close to the substrate 101.
  • the display panel is provided with binding terminals 212 in the non-display area of the array substrate 210, and the binding terminals 212 are not covered by the substrate 101.
  • FIG. 4 is a schematic structural diagram of a photomask provided by an embodiment of the application;
  • the photomask 200 includes a light-transmitting area 200a and a light-shielding area 200b.
  • the light-transmitting area 200a is aligned with In the display area
  • the shading area 200b is aligned with the non-display area.
  • the light transmission area 200a includes a first light transmission area 2001 and a second light transmission area 2002 located outside the first light transmission area 2001; in the step S20, the first light transmission area 2001 is aligned with In the display area, the second light-transmitting area 2002 is aligned with the second non-display area, and the light-shielding area 200b is aligned with the non-display area, so that the boundary between the hydrophilic area and the hydrophobic area is located In the non-display area, the problem of light leakage of the display panel caused by insufficient coverage of the alignment film is avoided.
  • the photomask 200 when the photomask 200 is placed on the surface of the conductive layer 1012, the first light-transmitting area 2001 is aligned with the display area 100a, and the second light-transmitting area
  • the area 2002 is aligned with the second non-display area 1002
  • the shading area 200b is aligned with the first non-display area 1001
  • the surface treatment of the conductive layer 1012 covering the photomask 200 is performed using EUV lithography technology , It will excite the oxygen ions on the conductive layer 1012, generate an oxidation reaction, activate the surface, and form a hydrophilic functional group that is conducive to surface adhesion, and change the adhesion properties of the conductive layer 1012, so that the conductive layer 1012 can be used in the conductive layer 1012.
  • the surface of the layer 1012 forms the hydrophilic region 101a and the hydrophobic region 101b.
  • the hydrophilic region 101a includes a first hydrophilic region 1012a and a second hydrophilic region 1012b; specifically, the conductive layer 1012 is exposed to the first light-transmitting region 2001 of the photomask 200, and The first hydrophilic region 1012a is formed on the surface of the conductive layer 1012; the second light-transmitting region 2002 of the photomask 200 is used to expose the conductive layer 1012, and the conductive layer 1012 is formed on the surface of the conductive layer 1012.
  • the second hydrophilic region 1012b so that the boundary 103 between the hydrophilic region 101a and the hydrophobic region 101b is located in the non-display region 100b, so as to prevent the alignment film 102 from being insufficiently covered and causing the display panel to leak light problem.
  • the lithography resolution rate is also higher. Its performance in the product is that the feature size is more accurate, that is, the EUV lithography technology is used to
  • the conductive layer 1012 is exposed to light, and the obtained boundary between the hydrophilic region 101a and the hydrophobic region 101b is also finer, and since the alignment film 102 is confined in the hydrophilic region 101a, the alignment film The boundary of 102 is also finer, so the boundary accuracy of the alignment film 102 can be controlled.
  • the photomask 200 is a hard patterned substrate or a soft patterned substrate, including a glass substrate plated with a metal pattern, a metal sheet with meshes, and a film film.
  • An embodiment of the present application provides a display panel and a manufacturing method thereof.
  • the manufacturing method includes: providing a substrate 101 to be coated with an alignment film; providing a photomask 200, and using the photomask 200 to expose the substrate 101 , A hydrophilic area 101a and a hydrophobic area 101b are defined on the surface of the substrate 101, the hydrophilic area 101a corresponds to the display area of the display panel, and the hydrophobic area 101b corresponds to the non-display area of the display panel; on the substrate 101
  • the alignment film 102 is coated to confine the alignment film 102 within the hydrophilic region 101a.
  • the existing display panel manufacturing method has no alignment mark on the substrate 101, and the boundary of the alignment film 102 cannot be restricted, and the coverage area of the alignment film 102 is likely to be insufficient or The coverage exceeds the area to be prepared, causing the display panel to have light leakage or uneven brightness; avoiding the problem of stability failure in the reliability test due to the adhesion of the alignment film 102 and the sealant; also avoiding the auxiliary preparation due to no alignment mark
  • the edge information of the substrate 101 is used as a reference mark, which causes a technical problem of error; the present application can realize the control of the boundary accuracy of the alignment film without increasing the difficulty and time of the existing manufacturing process.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
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Abstract

一种显示面板及其制备方法，所述制备方法包括：提供一待涂布配向膜的基板（S10）；提供一光罩，利用光罩对基板进行曝光处理，在基板表面界定形成亲水区和疏水区（S20）；在基板上涂布配向膜，以将配向膜限制在亲水区内（S30），以实现对配向膜边界精度的控制，避免显示面板出现漏光、亮度不均或在可靠性测试中出现稳定性失效的问题。

Description

显示面板及其制备方法 技术领域
本申请涉及显示面板制造领域，尤其涉及一种显示面板及其制备方法。
 背景技术
黑色矩阵设置在阵列基板上 (Black Matrix on Array，BOA)技术与彩膜设置在阵列基板上(Color Filter on Array，COA )技术是液晶显示装置中常用的两种集成技术，而黑色光学间隔物(Black Photo Spacer，BPS)技术作为BOA技术的一种，常搭配COA技术实现显示面板的制备。在制程过程中，将液晶显示装置中黑色矩阵与隔垫物两道独立制程整合为一道制程，实现三种功能结构的制备；即在阵列基板上利用黑色有机光阻，采用单次曝光显影制程工艺，一次性制得高度不同的主隔垫物、次隔垫物及黑色矩阵，在实现遮光的同时，也可具备支撑盒厚的功能。
在常规的黑色矩阵制备于彩膜基板上(BM on CF)结构中，黑色矩阵制备于彩膜基板上可以经由图形化工艺，形成对位标记等信息，提高各制程段的精度。但在BPS技术中，由于黑色矩阵制备于阵列基板上，区别于BM on CF结构，所以作为上基板的彩膜基板上仅需沉积一层透明导电层作为公共电极，不涉及对位标记的图形化制程，因此也就无法得到关于精细图形的定位标记，故常规的采用图形化工艺形成对位信息，继而实现对精度控制的方法就无法适用。
具体的，在成盒制程中，由于BPS不涉及图形化制程，所以也就无法对聚酰亚胺(Polyimide，PI)配向膜喷涂的精度进行控制。而PI配向膜喷涂精度又会对显示性能造成一定影响，当喷涂的PI配向膜不能完整的覆盖显示装置的显示区时，会造成漏光问题；此外若PI配向膜堆积在显示区的边界处，将引起亮度不均的问题；若PI配向膜超出应涂布范围，即超出切割线，被喷涂至如过孔区等部位时，由于PI配向膜与框胶的接着影响，再加之长时间的水汽影响，就会存在可靠性测试中稳定性失效的风险。
 技术问题
本申请实施例提供一种显示面板及其制备方法，能够解决现有的显示面板在制备过程中基板无对位标记时，致使配向膜边界无法得到精确调控而造成显示面板漏光或亮度不均的问题，以及配向膜与框胶接着在可靠性测试中导致稳定性失效的问题。
 技术解决方案
第一方面，本申请实施例提供一种显示面板的制备方法，包括以下步骤：
S10：提供一待涂布配向膜的基板；
S20：提供一光罩，利用所述光罩对所述基板进行曝光处理，在所述基板表面界定形成亲水区和疏水区，所述亲水区对应显示面板的显示区，所述疏水区对应显示面板的非显示区；
S30：在所述基板上涂布配向膜，以将所述配向膜限制在所述亲水区内。
在所述的制备方法中，所述光罩包括透光区和遮光区，在所述步骤S20中，所述透光区对准所述显示区，所述遮光区对准所述非显示区。
在所述的制备方法中，在所述步骤S20中，采用紫外光对所述基板进行曝光处理。
在所述的制备方法中，在所述步骤S20中，采用极紫外光对所述基板进行曝光处理。
在所述的制备方法中，在所述步骤S20之前，所述制备方法还包括对所述待涂布配向膜的基板进行清洗。
在所述的制备方法中，所述基板包括衬底与导电层，所述导电层设置于所述衬底的表面且位于所述显示区和所述非显示区，所述配向膜形成于所述导电层远离所述衬底的一侧表面。
在所述的制备方法中，所述导电层的制备材料包括氧化铟锡、铟锡氧化物、氧化锌的其中一种。
在所述的制备方法中，所述显示面板还包括位于所述非显示区内的框胶区，所述亲水区与所述疏水区的边界位于所述非显示区内所述框胶区靠近所述显示区的一侧。
在所述的制备方法中，所述步骤S30还包括：
S301：在所述基板表面涂布配向膜溶液；
S302：对所述配向膜溶液进行固化处理，得到所述配向膜。
在所述的制备方法中，在所述步骤S301中，所述配向膜溶液在所述疏水区的接触角大于所述配向膜溶液在所述亲水区的接触角。
在所述的制备方法中，所述配向膜溶液在所述疏水区的接触角与所述配向膜溶液在所述亲水区的接触角的差值大于或等于15°且小于或等于180°。
在所述的制备方法中，所述配向膜溶液在所述亲水区的接触角大于或等于0°且小于90°。
在所述的制备方法中，所述配向膜溶液在所述亲水区的接触角大于或等于0°且小于或等于30°。
在所述的制备方法中，所述配向膜溶液的制备材料为聚酰亚胺。
在所述的制备方法中，所述光罩为硬质图形化基板或软质图形化基板。
在所述的制备方法中，所述光罩为硬质图形化基板或软质图形化基板。
第二方面，本申请还提供一种由所述显示面板的制备方法制得的显示面板。
在所述的显示面板中，所述显示面板还包括具有一对位标记的阵列基板，所述阵列基板在具有所述对位标记的一侧表面设置有第一配向膜。
 有益效果
相较于现有技术，本申请实施例提供的显示面板及其制备方法，所述制备方法包括：提供一待涂布配向膜的基板；提供一光罩，利用所述光罩对所述基板进行曝光处理，在所述基板表面界定形成亲水区和疏水区，所述亲水区对应显示面板的显示区，所述疏水区对应显示面板的非显示区；在所述基板上涂布配向膜，以将所述配向膜限制在所述亲水区内。采用本发明，可解决现有的显示面板制备方法中因所述基板上无对位标记，而无法对所述配向膜的边界精度进行控制，易使所述配向膜的覆盖面积不足或覆盖超出应制备区域，导致显示面板出现漏光或亮度不均的问题；避免了配向膜与框胶接着易造成可靠性测试中存在稳定性失效的问题；也避免了因无对位标记辅助制备所述配向膜时，采用基板边缘信息作为参考标记，而造成误差的技术问题；本申请可在不增加现有制程难度及时间的前提下，实现对所述配向膜边界精度的控制。
 附图说明
图1A为本申请实施例提供的显示面板制备流程图；
图1B~1E其为对应1A所示制备方法的过程示意图；
图2为本申请实施例提供的基板的结构示意图；
图3为本申请实施例提供的显示面板的俯视图；
图4为本申请实施例提供的光罩的结构示意图。
 本发明的实施方式
为使本申请的目的、技术方案及效果更加清楚、明确，以下参照附图并举实施例对本申请进一步详细说明。应当理解，此处所描述的具体实施例仅用以解释本申请，并不用于限定本申请。
具体的，请参阅图1A，其为本申请实施例提供的显示面板的制备流程图，如图1B~1D所示，其为对应1A所示制备方法的过程示意图，包括以下步骤：
S10：提供一待涂布配向膜的基板101，如图1B所示；
S20：提供一光罩200，利用所述光罩200对所述基板101进行曝光处理，在所述基板101表面界定形成亲水区101a和疏水区101b，所述亲水区101a对应显示面板的显示区，所述疏水区101b对应显示面板的非显示区，如图1C和图1D所示；
S30：在所述基板101上涂布配向膜102，以将所述配向膜102限制在所述亲水区101a内，避免因所述配向膜102的覆盖面积不足或覆盖超出应制备区域，导致显示面板出现漏光或亮度不均的问题，如图1E所示。
其中，在所述步骤S20之前，所述制备方法还包括对所述待涂布配向膜的基板101进行清洗。
在所述步骤S20中，采用紫外光对所述基板101进行曝光处理，所述紫外光光刻技术包括极紫外光（Extreme Ultraviolet Lithography， EUV）光刻技术。
所述步骤S30还包括：
S301：在所述基板101表面涂布配向膜溶液；
S302：对所述配向膜溶液进行固化处理，得到所述配向膜102。
所述配向膜溶液为聚酰亚胺，所述配向膜溶液可采用喷涂法、旋涂法、液相法等方法制备于所述亲水区101a。由于配向膜溶液扩散的倾向性，所以在所述亲水区101a与所述疏水区101b的边界处，所述配向膜溶液会更容易制备于所述亲水区101a，且所述配向膜溶液会在所述亲水区101a与所述疏水区101b的交界处获得预期的涂敷边界，实现对边界精度的控制。
在衡量液体对材料表面润湿性能时一般采用液体在固体材料表面上的接触角进行表征，所以对于所述配向膜溶液在所述亲水区101a与所述疏水区101b的性能也可用接触角进行表征。
由于所述亲水区101a与所述疏水区101b表现出不同的亲水性质，所以所述配向膜溶液在所述疏水区101b和所述亲水区101a具有不同的接触角，而为使所述配向膜溶液形成具有足够边界精度的所述配向膜102，在所述步骤S301中，所述配向膜溶液在所述疏水区101b的接触角θ1大于所述配向膜溶液在所述亲水区101a的接触角θ2，以使所述亲水区101a具有更好的润湿性能，便于所述配向膜溶液在所述亲水区101a扩散。
另外，由于所述配向膜溶液在所述疏水区101b的接触角θ1与所述配向膜溶液在所述亲水区101a的接触角θ2差异越大，所述配向膜溶液在所述亲水区101a与所述疏水区101b所表现出的扩散性能就越不同，所以所述配向膜溶液在所述疏水区101b的接触角θ1与所述配向膜溶液在所述亲水区101a的接触角的差值大于或等于15°且小于或等于180°，即15°≤θ1-θ2≤180°，以保证所述亲水区101a与所述疏水区101b润湿性能具有足够差异，确保所述配向膜102边界具有足够精度。
由于接触角等于90°时，是配向膜溶液能否润湿所述亲水区101a的分界线；所以，为保证所述配向膜溶液可以制备在所述亲水区101a，且制备出的所述配向膜102具有足够的边界精度，所述配向膜溶液在所述亲水区101a的接触角θ2小于90°。类似地，所述配向膜溶液在所述亲水区101a的接触角θ2大于或等于0°。在所述配向膜溶液在所述亲水区101a的接触角θ2等于0°时，所述配向膜溶液可以完全制备在所述亲水区101a。因此，所述配向膜溶液在所述亲水区101a的接触角θ2的变化范围为：0°≤θ2<90°，更进一步地，所述配向膜溶液在所述亲水区101a的接触角θ2的变化范围为：0°≤θ2≤30°。
在所述步骤S20之前，对所述待涂布配向膜的基板进行清洗的步骤、步骤S20及步骤S30均在前清洗段（Before Process Cleaning, BPC）机台中进行，由于所述BPC机台中包括纯水或化学试剂清洗部件、干燥和EUV处理部件、成膜固化部件等部件，所述BPC机台的各部件对应各个站点，所以在制备时对所述待涂布配向膜的基板进行清洗可在清洗站点进行，所述步骤S20可在紫外线（Ultraviolet Lithography，UV）或EUV站点进行，所述步骤S30可在成膜固化站点进行。如此便可最大限度的节省制程工序，在保证现有制程流程时间不变或不大幅变动的同时，提高对所述配向膜102边界精度的控制。
请参阅图2，其为本申请实施例提供的基板的结构示意图；所述基板101包括衬底1011与导电层1012，所述导电层1012设置于所述衬底1011的表面且位于所述显示区和所述非显示区，所述配向膜102形成于所述导电层1012远离所述衬底1011的一侧表面。
所述亲水区101a及所述疏水区101b通过所述紫外光光刻技术形成于所述导电层1012远离所述衬底1011的表面。
所述导电层1012的制备材料包括氧化铟锡、铟锡氧化物、氧化锌的其中一种。
本申请还提供一种由所述显示面板的制备方法制得的显示面板；具体地，请参阅图3，其为本申请实施例提供的显示面板的俯视图；所述显示面板至少具有一显示区100a及位于所述显示区100a外围的非显示区100b，所述非显示区100b包括第一非显示区1001和第二非显示区1002，所述第二非显示区1002位于所述显示区100a与所述第一非显示区1001之间。
所述显示面板还包括位于所述非显示区100b内的框胶区（图中未示出），所述亲水区101a与所述疏水区101b的边界103位于所述非显示区100b内所述框胶区靠近所述显示区100a的一侧；具体地，所述亲水区101a与所述疏水区101b的边界103位于GOA走线104靠近所述显示区100a的一侧。
所述基板101为彩膜基板，所述显示面板还包括与所述基板101相对设置的阵列基板210，所述阵列基板210包括第一配向膜、第一导电层、第一绝缘层、色阻层、第二绝缘层、栅极绝缘层、栅极信号线、数据信号线等未示出部分。所述阵列基板210上设置有对位标记211，所述对位标记211用于在所述阵列基板210靠近所述基板101的一侧形成所述第一配向膜。所述显示面板在所述阵列基板210的非显示区设置有绑定端子212，所述绑定端子212未被所述基板101所覆盖。
请参阅图4，其为本申请实施例提供的光罩的结构示意图；所述光罩200包括透光区200a和遮光区200b，在所述步骤S20中，所述透光区200a对准所述显示区，所述遮光区200b对准所述非显示区。
所述透光区200a包括第一透光区2001以及位于所述第一透光区2001外侧的第二透光区2002；在所述步骤S20中，所述第一透光区2001对准所述显示区，所述第二透光区2002对准所述第二非显示区，所述遮光区200b对准所述非显示区，以使所述亲水区与所述疏水区的边界位于所述非显示区内，避免所述配向膜覆盖不足导致所述显示面板出现漏光的问题。
具体地，请参阅图3和图4，当将所述光罩200置于所述导电层1012表面时，所述第一透光区2001对准所述显示区100a，所述第二透光区2002对准所述第二非显示区1002，所述遮光区200b对准所述第一非显示区1001，采用EUV光刻技术对覆盖所述光罩200的所述导电层1012进行表面处理，会激发所述导电层1012上的氧离子，产生氧化反应，活化表面，形成有利于表面接着的亲水性官能基团，改变所述导电层1012表面的接着性质，从而可在所述导电层1012表面形成所述亲水区101a与所述疏水区101b。
所述亲水区101a包括第一亲水区1012a和第二亲水区1012b；具体地，利用所述光罩200的所述第一透光区2001对所述导电层1012进行曝光处理，在所述导电层1012表面形成所述第一亲水区1012a；利用所述光罩200的所述第二透光区2002对所述导电层1012进行曝光处理，在所述导电层1012表面形成所述第二亲水区1012b，以使所述亲水区101a与所述疏水区101b的边界103位于所述非显示区100b内，避免所述配向膜102覆盖不足导致所述显示面板出现漏光的问题。
由于EUV光刻技术采用的光源波长较短，得到的曝光波长也较短，所以光刻分别率也较高，其表现在产品中即为特征尺寸更精确，即采用EUV光刻技术对所述导电层1012进行曝光处理，得到的所述亲水区101a与所述疏水区101b的边界也更精细，而由于所述配向膜102被限制在所述亲水区101a内，所以所述配向膜102的边界也更精细，因此可实现对所述配向膜102边界精度的控制。
所述光罩200为硬质图形化基板或软质图形化基板，包括镀有金属图案的玻璃基板、具有网孔的金属薄片、菲林膜片。
本申请实施例提供的显示面板及其制备方法，所述制备方法包括：提供一待涂布配向膜的基板101；提供一光罩200，利用所述光罩200对所述基板101进行曝光处理，在所述基板101表面界定形成亲水区101a和疏水区101b，所述亲水区101a对应显示面板的显示区，所述疏水区101b对应显示面板的非显示区；在所述基板101上涂布配向膜102，以将所述配向膜102限制在所述亲水区101a内。采用本发明，可解决现有的显示面板制备方法中因所述基板101上无对位标记，而无法对所述配向膜102的边界进行限制，易使所述配向膜102的覆盖面积不足或覆盖超出应制备区域，导致显示面板出现漏光或亮度不均的问题；避免了配向膜102与框胶接着易造成可靠性测试中存在稳定性失效的问题；也避免了因无对位标记辅助制备所述配向膜102时，采用基板101边缘信息作为参考标记，而造成误差的技术问题；本申请可在不增加现有制程难度及时间的前提下，实现对所述配向膜边界精度的控制。
在上述实施例中，对各个实施例的描述都各有侧重，某个实施例中没有详述的部分，可以参见其他实施例的相关描述。
以上对本申请实施例所提供的显示面板及其制备方法进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的技术方案及其核心思想；本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本申请各实施例的技术方案的范围。

Claims (17)

  1. 一种显示面板的制备方法，其中，包括以下步骤：
    S10：提供一待涂布配向膜的基板；
    S20：提供一光罩，利用所述光罩对所述基板进行曝光处理，在所述基板表面界定形成亲水区和疏水区，所述亲水区对应显示面板的显示区，所述疏水区对应显示面板的非显示区；
    S30：在所述基板上涂布配向膜，以将所述配向膜限制在所述亲水区内。
  2. 根据权利要求1所述的制备方法，其中，所述光罩包括透光区和遮光区，在所述步骤S20中，所述透光区对准所述显示区，所述遮光区对准所述非显示区。
  3. 根据权利要求1所述的制备方法，其中，在所述步骤S20中，采用紫外光对所述基板进行曝光处理。
  4. 根据权利要求3所述的制备方法，其中，在所述步骤S20中，采用极紫外光对所述基板进行曝光处理。
  5. 根据权利要求1所述的制备方法，其中，在所述步骤S20之前，所述制备方法还包括对所述待涂布配向膜的基板进行清洗。
  6. 根据权利要求1所述的制备方法，其中，所述基板包括衬底与导电层，所述导电层设置于所述衬底的表面且位于所述显示区和所述非显示区，所述配向膜形成于所述导电层远离所述衬底的一侧表面。
  7. 根据权利要求6所述的制备方法，其中，所述导电层的制备材料包括氧化铟锡、铟锡氧化物、氧化锌的其中一种。
  8. 根据权利要求1所述的制备方法，其中，所述显示面板还包括位于所述非显示区内的框胶区，所述亲水区与所述疏水区的边界位于所述非显示区内且位于所述框胶区靠近所述显示区的一侧。
  9. 根据权利要求1所述的制备方法，其中，所述步骤S30还包括：
    S301：在所述基板表面涂布配向膜溶液；
    S302：对所述配向膜溶液进行固化处理，得到所述配向膜。
  10. 根据权利要求9所述的制备方法，其中，在所述步骤S301中，所述配向膜溶液在所述疏水区的接触角大于所述配向膜溶液在所述亲水区的接触角。
  11. 根据权利要求10所述的制备方法，其中，所述配向膜溶液在所述疏水区的接触角与所述配向膜溶液在所述亲水区的接触角的差值大于或等于15°且小于或等于180°。
  12. 根据权利要求9所述的制备方法，其中，所述配向膜溶液在所述亲水区的接触角大于或等于0°且小于90°。
  13. 根据权利要求12所述的制备方法，其中，所述配向膜溶液在所述亲水区的接触角大于或等于0°且小于或等于30°。
  14. 根据权利要求9所述的制备方法，其中，所述配向膜溶液的制备材料为聚酰亚胺。
  15. 根据权利要求1所述的制备方法，其中，所述光罩为硬质图形化基板或软质图形化基板。
  16. 一种如权利要求1所述的显示面板的制备方法制得的显示面板。
  17. 根据权利要求16所述的显示面板，其中，所述显示面板还包括具有一对位标记的阵列基板，所述阵列基板在具有所述对位标记的一侧表面设置有第一配向膜。
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