WO2014205968A1 - 显示面板及其制备方法和显示装置 - Google Patents

显示面板及其制备方法和显示装置 Download PDF

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Publication number
WO2014205968A1
WO2014205968A1 PCT/CN2013/085810 CN2013085810W WO2014205968A1 WO 2014205968 A1 WO2014205968 A1 WO 2014205968A1 CN 2013085810 W CN2013085810 W CN 2013085810W WO 2014205968 A1 WO2014205968 A1 WO 2014205968A1
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WIPO (PCT)
Prior art keywords
substrate
layer
layer pattern
area
display
Prior art date
Application number
PCT/CN2013/085810
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English (en)
French (fr)
Inventor
陈珍霞
姜妮
张俊瑞
林准焕
Original Assignee
京东方科技集团股份有限公司
成都京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 成都京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/375,648 priority Critical patent/US9588378B2/en
Publication of WO2014205968A1 publication Critical patent/WO2014205968A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells

Definitions

  • Embodiments of the present invention relate to a display panel, a method of fabricating the same, and a display device. Background technique
  • An alignment film is formed to set a pretilt angle of the liquid crystal molecules so that the liquid crystal molecules are aligned in an initial state.
  • the alignment film is usually formed by transferring a photoalignment liquid onto a color filter substrate and an array substrate using a photosensitive plate, and then performing conventional rubbing or light alignment.
  • the photo-alignment liquid is transferred onto the color filter substrate and the array substrate by using the photosensitive plate, the thickness of the edge of the alignment film is easily made uneven, and the alignment direction is not uniform. Therefore, in order to prevent the edge region of the alignment film from affecting the normal display of the display region, the area of the alignment film formed by transferring the photoalignment liquid onto the color filter substrate and the array substrate needs to be larger than the area of the display region. The larger the printable area around the alignment film, the lower the process requirements, and the lower the risk that the alignment film uneven area enters the display area.
  • the non-display area of the narrow-frame display device is small.
  • the coated area of the sealant 03 is used. It is easy to coincide with the edge portion of the alignment film 04, or, as shown in Fig. 2, the edge of the alignment film 04 protrudes from the coated region of the sealant 03.
  • the alignment film 04 may include an upper alignment layer and a bottom layer having high mechanical strength.
  • the upper alignment layer of the alignment film has low mechanical strength and is easily peeled off from the sealant, so that moisture in the external environment easily enters the display panel, resulting in a display panel. Bad display. Summary of the invention
  • Embodiments of the present invention provide a display panel having a narrow bezel while having a better display effect.
  • Embodiments of the present invention also provide a method for preparing a display panel, which improves the display effect of the display panel. Embodiments of the present invention also provide a display device having a better display effect.
  • An aspect of the invention provides a display panel having a display area and a non-display area, the display panel comprising: a first substrate and a second substrate disposed opposite to each other, and the first substrate and the second substrate a liquid crystal molecular layer between the first substrate and the second substrate, wherein an alignment film is disposed at a position corresponding to the display region, and a position corresponding to the non-display region is provided with a sealant for coating
  • the first frame substrate is provided with a first elevated layer facing the frame sealant region of the surface of the liquid crystal molecular layer, and the first elevated layer causes the frame sealant region of the first substrate to be higher than a display region;
  • the second substrate is disposed at a portion of the sealant region of the surface of the liquid crystal molecular layer; and the second elevated layer is configured such that the sealant region of the second substrate is higher than the display region thereof region.
  • the first elevated layer or the second elevated layer is formed by stacking one or more layers of color resist layers of a color filter.
  • the first elevated layer and/or the second elevated layer are formed of a metal, metal alloy, resin or photoresist material.
  • the display panel may further include: a spacer layer between the first substrate and the second substrate, the first elevated floor or the second lifting The upper layer is formed by the spacer layer.
  • the display panel may further include: a spacer layer between the first substrate and the second substrate, the first elevated floor or the second lifting
  • the upper layer is formed by superposing a color resist layer of a color filter, one or more layers of the spacer layer.
  • the thickness of the first raised upper layer and the second raised upper layer is less than or equal to one-half of the thickness of the liquid crystal cell.
  • Another aspect of the present invention provides a method of manufacturing a display panel, the display panel having a display area and a non-display area, and the display panel includes: a first substrate and a second substrate disposed opposite to each other, and a location a liquid crystal molecular layer between the first substrate and the second substrate, wherein the first substrate and the second substrate respectively have a sealant region for coating the sealant corresponding to the non-display region, the method
  • the method includes: forming a first elevated layer pattern on the sealant region of the first substrate, such that the sealant region of the first substrate is higher than the display region thereof; forming a frame in the sealant region of the second substrate Lifting a high-level pattern such that a sealant region of the second substrate is higher than a display region thereof; forming an alignment film on a display region of the first substrate and a display region of the second substrate; And the second substrate pair cassette; injecting liquid crystal between the first substrate and the second substrate Child.
  • the forming a first elevated layer pattern on the sealant region of the first substrate or forming the second elevated layer pattern on the sealant region of the second substrate includes: forming a first color resist layer pattern on the sealant region of the first substrate or the sealant region of the second substrate; forming a second color resist layer pattern on the first resist layer pattern; Forming a third color resist layer pattern on the second color resist layer pattern; the first color resist layer pattern, the second color resist layer pattern, and the third color resist layer pattern are superposed to form the first Lifting the high-rise pattern or the second elevated layer pattern.
  • the forming a first elevated layer pattern on the sealant region of the first substrate or forming the second elevated layer pattern on the sealant region of the second substrate may include: forming a spacer in the sealant region of the first substrate or the sealant region of the second substrate, the spacer forming the first elevated layer pattern or the second elevated layer pattern.
  • the forming a first elevated layer pattern on the sealant region of the first substrate and/or forming the second elevated layer pattern on the sealant region of the second substrate may include Forming a photoresist material layer on the sealant region of the first substrate and/or the sealant region of the second substrate, the photoresist material layer forming the first elevated layer pattern and/or The second elevated layer pattern.
  • forming the alignment film on the display region of the first substrate and the display region of the second substrate respectively may include: transferring the decomposing optical alignment liquid to the first On a substrate and the second substrate, the light alignment liquid on the first elevated layer pattern and the second elevated layer pattern will flow to the frame sealant regions of the first substrate and the second substrate respectively In the non-display area between the display areas; irradiating the first substrate and the second substrate with ultraviolet light in a certain direction; cleaning the first substrate and the second substrate.
  • the first substrate and the second substrate are irradiated with ultraviolet light of a certain direction, and the first substrate and the second substrate are cleaned.
  • the method further includes: performing a fully polarized ultraviolet light exposure on the sealant region of the first substrate and the sealant region of the second substrate using a mask.
  • Another aspect of the present invention provides a display device comprising the display panel of any of the above.
  • FIG. 1 is a schematic view showing a structure in which a coating region of a sealant in a conventional display panel overlaps an edge portion of an alignment film;
  • FIG. 2 is a schematic view showing the structure of a coating region of an edge of the alignment film in the conventional display panel
  • FIG. 3 is a schematic structural diagram of a display panel according to an embodiment of the present invention.
  • FIG. 4 is a schematic structural diagram of a color filter substrate in a display panel according to an embodiment of the present invention
  • FIG. 5 is a schematic structural diagram of an array substrate in a display panel according to an embodiment of the present invention. Reference mark:
  • FIG. 3 is a schematic structural diagram of a display panel according to an embodiment of the present invention.
  • the embodiment provides a display panel having a display area and a non-display area, for example, the non-display area is located at the periphery of the display area.
  • the display panel includes: a first substrate 1 and a second substrate 2 disposed opposite to each other, and a liquid crystal molecular layer between the first substrate 1 and the second substrate 2, the first substrate 1 and the second substrate 2 corresponding to the display region
  • the position is provided with an alignment film 4, and a frame sealant region 3 for coating the sealant is provided at a position corresponding to the non-display area.
  • the sealant area 3 is part of the non-display area.
  • a first elevated layer 51 is disposed on the sealant region 3 of the first substrate 1 facing the surface of the liquid crystal molecular layer.
  • the first elevated layer 51 causes the sealant region 3 (relative to the first substrate 1) of the first substrate 1 to be higher than the display region thereof;
  • a second elevated layer 52 is disposed on the frame sealant region 3 of the second substrate 2 facing the surface of the liquid crystal molecular layer, and the second elevated layer 52 causes the frame sealant region 3 (relative to the second substrate 2) of the second substrate 2 to be higher than Its display area i or.
  • Conventional display panels typically include a display area that is primarily used to display imaging and a non-display area that is used to route and apply the sealant. As the display panel becomes narrower and narrower, the non-display area of the display panel becomes smaller and smaller, and the process requirements for printing the alignment film become higher and higher, which requires that the light alignment liquid should not be printed to the sealant area as much as possible. Inside, the effect of the upper alignment layer in the alignment film on the adhesion of the sealant is reduced.
  • the display area of the first elevated layer higher than the first substrate means that when the display area is a horizontal plane, the first elevated layer is convex relative to the display area; the second elevated layer is higher than the display area of the second substrate When the display area is a horizontal plane, the second raised upper layer is convex relative to the display area.
  • the sealant regions 3 of the first substrate 1 and the second substrate 2 have a first elevated layer 51 and a second raised layer 52, respectively.
  • the first elevated layer 51 is such that the sealant region 3 of the first substrate 1 is higher than the display region of the first substrate 1.
  • the alignment film 4 of the first substrate 1 is located in the region surrounded by the sealant region 3 of the first substrate 1. .
  • the alignment film 4 formed on the first elevated layer 51 Due to the difference in height between the first elevated layer 51 and the display region of the first substrate 1, the alignment film 4 formed on the first elevated layer 51 is thinned, and the upper alignment layer where photodecomposition occurs during illumination orientation disappears, mechanical strength The large underlayer remains, reducing the influence of the alignment film 4 on the first substrate 1 on the adhesion of the sealant to the sealant region 3 of the first substrate 1.
  • the second elevated layer 52 also reduces the influence of the alignment film 4 on the second substrate 2 on the adhesion of the sealant to the sealant region 3 of the second substrate 2.
  • the display panel provided by the embodiment can have a better display effect, and the narrow bezel display device can be more easily realized.
  • the first substrate is a color film substrate
  • the second substrate is a display substrate of the array substrate.
  • the first substrate may be a common substrate and the second substrate may be integrated.
  • Other types of display panels such as a color film array substrate (COA) are not limited herein.
  • FIG. 4 is a schematic structural diagram of an example of a color filter substrate in a display panel according to the embodiment.
  • the first elevated layer 51 is formed by stacking one or more layers of the color resist layers of the color filter. That is to say, the first elevated layer 51 may be formed by one of the color layers of the color filter, or may be formed of two of the color layers of the color filter, and will not be enumerated here.
  • the first elevated upper layer 51 and/or the second raised upper layer 52 are formed of a metal, metal alloy, resin or photoresist material.
  • the display panel may further include: a spacer between the color filter substrate and the array substrate.
  • the spacer layer is disposed on the color filter substrate, the first elevated layer 51 is formed by the spacer layer.
  • FIG. 5 is a schematic structural diagram of another example of the array substrate in the display panel according to the embodiment.
  • the spacer layer is disposed on the array substrate, for example, the second elevated layer 52 is formed of a spacer layer.
  • the display panel may further include: a spacer layer between the color filter substrate and the array substrate.
  • the first elevated layer 51 is formed by a color filter layer of the color filter.
  • One or more layers in the spacer layer are stacked to form. That is, the first elevated layer 51 is formed by one of the color resist layers of the color filter and the spacer layer, or may be formed of two layers of the color resist layer of the color filter and the spacer layer. , here is no longer - enumeration.
  • the thickness of the first raised upper layer and the second raised upper layer is less than or equal to one-half of the thickness of the liquid crystal cell.
  • the embodiment of the invention provides a method for preparing a display panel.
  • the display panel has a display area and a non-display area, and the first substrate and the second substrate respectively have a sealant for coating the sealant.
  • Area including:
  • Step S101 forming a first elevated layer pattern in the first substrate sealant region, so that the sealant region of the first substrate is higher than the display region of the first substrate;
  • Step S102 forming a second elevated layer pattern on the sealant region of the second substrate, so that the sealant region of the second substrate is higher than the display region of the array substrate;
  • Step S103 forming an alignment film on the display area of the first substrate and the display area of the second substrate; Step S104: aligning the first substrate and the second substrate;
  • Step S105 Injecting liquid crystal molecules between the first substrate and the second substrate.
  • the alignment film formed on the first elevated layer pattern is changed due to the difference in height between the first elevated layer pattern and the display region of the first substrate. Thin, so that in this part of the alignment film, photolysis occurs when the light is oriented The upper alignment layer disappears, and the mechanically strong underlayer remains, which reduces the effect of the alignment film on the adhesion of the sealant. Similarly, the second elevated layer also reduces the influence of the alignment film on the second substrate on the adhesion of the sealant to the sealant region of the second substrate.
  • the process of pairing the first substrate and the second substrate to the cartridge includes disposing the first substrate and the second substrate opposite each other, and fixing the two by a sealant to form a liquid crystal cell accommodating the liquid crystal material therebetween.
  • the method for preparing the display panel improves the display effect of the display panel on the premise of ensuring the narrow border of the display panel.
  • the method of preparing the display panel in which the first substrate is a color filter substrate and the second substrate is an array substrate will be described as an example.
  • the present invention is not limited thereto.
  • a first elevated layer pattern is formed on the sealant region of the first substrate, so that the sealant region of the first substrate is higher than the display region of the first substrate (the first substrate 1 is used as the color filter substrate as an example).
  • An example of the detailed description includes: first, a red color resist layer pattern 11 is formed on the sealant region of the color filter substrate; secondly, a green color resist layer pattern 12 is formed on the red resist layer pattern 11; A blue color resist layer pattern 13 is formed on the green color resist layer pattern 12; thus, the red color resist layer pattern 11, the green color resist layer pattern 12, and the blue color resist layer pattern 13 are superposed to form a raised first high layer pattern.
  • the red color resist layer pattern 11 in the sealant region is retained in this embodiment.
  • the green color resist layer pattern 12 and the blue color resist layer pattern 13 are formed to form a first elevated layer pattern.
  • the first elevated layer pattern may also be formed by stacking either or both of the red color resist layer pattern 11, the green color resist layer pattern 12, and the blue color resist layer pattern 13. That is to say, any one or two of the red color resist layer pattern 11, the green color resist layer pattern 12, and the blue color resist layer pattern 13 may be left in the manufacturing process to form the first elevated layer pattern. Further, the formation of the red, green, and blue color resist layers is not limited to the above order, and may be any other suitable order.
  • the filter can also be RGBY (red, green, blue, yellow), CMYK (green, red, yellow, black). ) and other displays A variety of color filters commonly found in the field.
  • the alignment film is formed in the display region of the first substrate in the step S103 (the first substrate is a color film substrate as an example) is as follows. The following process is included.
  • the color film substrate is irradiated by ultraviolet light in a certain direction, and the molecules in the alignment film matched with the polarization direction of the ultraviolet light will undergo a chain scission reaction, which is decomposed into small molecules, so that the alignment film is thinner; the color filter substrate is cleaned.
  • the small molecules will be cleaned and removed, the alignment film will be thinner, and the alignment layer of the alignment film on the first elevated layer pattern will be removed, which can greatly reduce the influence of the alignment film on the adhesion of the sealant. Improve the display of the display panel.
  • the area of the alignment film formed by transferring the photo-alignment liquid onto the color filter substrate and the array substrate needs to be larger than the area of the display region.
  • the following process may be performed between the irradiation of the color filter substrate by using ultraviolet light in a certain direction and the step of cleaning the color filter substrate: using a mask
  • the plate is exposed to the fully polarized ultraviolet light of the sealing frame area of the color film substrate, and the mask plate blocks the display area of the color film substrate and the vicinity thereof, and the first elevated layer pattern is exposed, and the fully polarized ultraviolet light will be applied to the first lift.
  • the high-rise pattern is exposed. Since light of various polarization directions exists, the molecular chain in each direction of the alignment film on the first elevated layer pattern is decomposed, and when the color filter substrate is cleaned, the alignment film on the first elevated layer pattern is almost No residue.
  • a method of preparing a display panel in which a first substrate is a color filter substrate and a second substrate is an array substrate will be described in detail as an example, but is not limited thereto.
  • Step S101 forming a first elevated layer pattern on the sealant region of the first substrate, so that the sealant region of the first substrate is higher than the display region of the first substrate (the first substrate is used as a color filter substrate as an example for detailed description)
  • An example of this includes the following process.
  • a spacer layer is formed on the color filter substrate, and the spacer layer forms a first elevated layer pattern.
  • the first elevated layer pattern may also be formed by stacking one or more of the red color resist layer pattern 11, the green color resist layer pattern 12, the blue color resist layer pattern 13, and the spacer layer.
  • step S103 Forming an alignment film in the display region of the first substrate in step S103 (using the first substrate as a color film substrate)
  • An example of the board as an example of the detailed description includes the following process.
  • the alignment liquid on the first elevated layer pattern will flow into the non-display area between the sealant region of the color filter substrate and the display region of the color filter substrate, that is, It is said that the alignment film formed on the first elevated layer pattern will be thinned;
  • the color film substrate is irradiated by ultraviolet light in a certain direction, and the molecules in the alignment film matched with the polarization direction of the ultraviolet light will undergo a chain scission reaction, which is decomposed into small molecules, so that the alignment film is thinner; the color filter substrate is cleaned.
  • the small molecules will be cleaned and removed, the alignment film will be thinner, and the upper alignment layer of the alignment film on the first elevated layer pattern will be removed, which can greatly reduce the influence of the alignment film on the adhesion of the sealant. In turn, the display effect of the display panel is improved.
  • the following process may be performed between the step of irradiating the color filter substrate with a certain direction of ultraviolet light and the step of cleaning the color filter substrate:
  • the film plate exposes the framed glue region of the color film substrate to the fully polarized ultraviolet light, and the mask plate blocks the display area of the color film substrate and the vicinity thereof, and the first elevated layer pattern is exposed, and the fully polarized ultraviolet light will be applied to the first lift.
  • the high-rise pattern is exposed. Since light of various polarization directions exists, the molecular chain in each direction of the alignment film on the first elevated layer pattern is decomposed, and when the color filter substrate is cleaned, the alignment film on the first elevated layer pattern is almost No residue.
  • a method of preparing a display panel in which a first substrate is a color filter substrate and a second substrate is an array substrate will be described in detail as an example, but is not limited thereto.
  • Step S101 forming a first elevated layer pattern on the sealant region of the first substrate, so that the sealant region of the first substrate is higher than the display region of the first substrate (the first substrate is used as a color filter substrate as an example for detailed description)
  • One example of the process includes a process of forming a layer of photoresist material on a color film substrate, the layer of photoresist material forming a first elevated layer pattern.
  • the color filter substrate is exposed using a mask to retain the photoresist material layer in the sealant region of the color filter substrate to form a first elevated layer pattern.
  • the photoresist is classified into a positive photoresist or a negative photoresist.
  • the photoresist used is a negative photoresist, the mask substrate of the cured frame sealant may be exposed to the color filter substrate, and the photoresist material layer in the sealant region will be retained to form the first layer. Lifting the high-level pattern;
  • the photoresist used is a positive photoresist, an additional exposure mask is required.
  • step S103 Forming an alignment film in the display region of the first substrate in step S103 (using the first substrate as a color film substrate)
  • An example of a board as an example is as follows: The following processes are included:
  • the alignment liquid on the first elevated layer pattern will flow into the non-display area between the sealant region of the color filter substrate and the display region of the color filter substrate, that is, It is said that the alignment film formed on the first elevated layer pattern will be thinned;
  • the color film substrate is irradiated by ultraviolet light in a certain direction, and the molecules in the alignment film matched with the polarization direction of the ultraviolet light will undergo a chain scission reaction, which is decomposed into small molecules, so that the alignment film is thinner; the color filter substrate is cleaned.
  • the small molecules will be cleaned and removed, the alignment film will be thinner, and the alignment layer of the alignment film on the first elevated layer pattern will be removed, which can greatly reduce the influence of the alignment film on the adhesion of the sealant. Improve the display of the display panel.
  • the following process may be performed between the step of irradiating the color filter substrate with a certain direction of ultraviolet light and the step of cleaning the color filter substrate:
  • the film plate exposes the framed glue region of the color film substrate to the fully polarized ultraviolet light, and the mask plate blocks the display area of the color film substrate and the vicinity thereof, and the first elevated layer pattern is exposed, and the fully polarized ultraviolet light will be applied to the first lift.
  • the high-rise pattern is exposed. Since light of various polarization directions exists, the molecular chain in each direction of the alignment film on the first elevated layer pattern is decomposed, and when the color filter substrate is cleaned, the alignment film on the first elevated layer pattern is almost No residue.
  • a photoresist stripping technique may also be employed such that there is no alignment film in the sealant region, and there is no influence of the alignment film on the adhesion of the sealant.
  • a method of preparing a display panel in which a first substrate is a color filter substrate and a second substrate is an array substrate will be described in detail as an example, but is not limited thereto.
  • step S102 a second elevated layer pattern is formed on the sealant region of the second substrate, so that the sealant region of the second substrate is higher than the display region of the second substrate (the second substrate 2 is used as the array substrate).
  • An example of a detailed description of the example includes: forming a spacer on the array substrate, and the spacer 21 forms a second elevated pattern.
  • the second elevated layer may also be any one of a gate line layer, an active layer, a data line layer, a pixel electrode layer, a common electrode layer flat layer, and a spacer layer or Multilayer stacking is formed.
  • An example of forming an alignment film in the display region of the second substrate in step S103 includes the following process: Transfer the decomposed photo-alignment film onto the array substrate, and the alignment liquid on the second elevated layer pattern will flow into the non-display area between the encapsulation area of the array substrate and the display area of the array substrate, that is, raise the upper layer The alignment film formed on the pattern will be thinned;
  • the array substrate is irradiated with ultraviolet light in a certain direction, and the molecules in the alignment film matched with the polarization direction of the ultraviolet light undergo a chain scission reaction, which is decomposed into small molecules, so that the alignment film is thinner; the array substrate is cleaned, The small molecules will be cleaned and removed, the alignment film will be thinner, and the upper alignment layer of the alignment film on the second elevated layer pattern will be removed, which can greatly reduce the influence of the alignment film on the adhesion of the sealant, thereby improving Display panel display effect.
  • the following process may be performed between the step of irradiating the array substrate with ultraviolet light in a certain direction and the step of cleaning the array substrate: using a mask Fully polarized ultraviolet light exposure is performed on the sealant region of the array substrate, the mask plate blocks the display area of the array substrate and its vicinity, and the second elevated layer pattern is exposed, and the fully polarized ultraviolet light exposes the second elevated layer pattern . Since light of various polarization directions exists, the molecular chains in all directions of the alignment film on the second elevated layer pattern are decomposed, and when the array substrate is cleaned, the alignment film on the second elevated layer pattern is hardly Residual.
  • a method of preparing a display panel in which a first substrate is a color filter substrate and a second substrate is an array substrate will be described in detail as an example, but is not limited thereto.
  • Step S102 forming a second elevated layer pattern on the sealant region of the second substrate, so that the sealant region of the second substrate is higher than the display region of the second substrate (the second substrate is used as an array substrate as an example for detailed description)
  • One example includes a process of forming a layer of photoresist material on an array substrate, the layer of photoresist material forming a second elevated layer pattern.
  • the array substrate is exposed by using a mask to retain the photoresist material layer in the sealant region of the array substrate to form a second elevated layer pattern.
  • the photoresist is classified into a positive photoresist or a negative photoresist.
  • the array substrate may be exposed by using a mask of the cured sealant, and the photoresist material layer in the sealant region is retained to form a second elevated pattern.
  • an additional exposure mask is required.
  • An example of forming an alignment film in the display region of the second substrate in step S103 includes: Transferting the decomposed photo-alignment film onto the array substrate, and the alignment liquid on the second elevated pattern of the array substrate flows into the non-display area between the sealant region of the array substrate and the display region of the array substrate, that is, Said that the alignment film formed on the second elevated layer pattern will be thinner;
  • the array substrate is irradiated with ultraviolet light in a certain direction, and the molecules in the alignment film matched with the polarization direction of the ultraviolet light undergo a chain scission reaction, which is decomposed into small molecules, so that the alignment film is thinner; the array substrate is cleaned, The small molecules will be cleaned and removed, the alignment film will be thinner, and the alignment layer of the alignment film on the second elevated layer pattern will be removed, which can greatly reduce the influence of the alignment film on the adhesion of the sealant, thereby improving the display.
  • the display effect of the panel is irradiated with ultraviolet light in a certain direction, and the molecules in the alignment film matched with the polarization direction of the ultraviolet light undergo a chain scission reaction, which is decomposed into small molecules, so that the alignment film is thinner; the array substrate is cleaned, The small molecules will be cleaned and removed, the alignment film will be thinner, and the alignment layer of the alignment film on the second elevated layer pattern will be removed, which can greatly reduce the influence of the alignment film on the adhesion of the
  • the following process may be performed between the step of irradiating the array substrate with ultraviolet light in a certain direction and the step of cleaning the array substrate: using a mask Fully polarized ultraviolet light exposure is performed on the sealant region of the array substrate, the mask substrate shields the display region of the array substrate and its vicinity, and the second elevated layer pattern is exposed, and the fully polarized ultraviolet light exposes the second elevated layer pattern . Since light of various polarization directions exists, the molecular chains in all directions of the alignment film on the second elevated layer pattern are decomposed, and when the array substrate is cleaned, the alignment film on the second elevated layer pattern is hardly Residual.
  • a photoresist stripping technique may also be employed such that there is no alignment film in the sealant region, and there is no influence of the alignment film on the adhesion of the sealant.
  • the first elevated layer pattern in the color filter substrate in the display panel may be formed by any one of the foregoing method of Embodiment 3, Embodiment 4, and Embodiment 5.
  • the second elevated layer pattern in the array substrate may select the above embodiment.
  • the method of any of the seventh embodiment is formed.
  • the combination of the first elevated layer pattern on the color filter substrate and the second elevated layer pattern on the array substrate is not repeated - the description of the embodiments is given.
  • This embodiment also provides a display device including the above display panel. Since the above display panel has a better display effect, the display device provided by the embodiment has a better display effect.
  • the above display device may be any product or component having a display function such as a mobile phone, a tablet computer, a display, a notebook computer, a navigator or the like.
  • the display panel provided by the embodiment of the invention avoids the influence of the upper alignment layer in the alignment film on the adhesion of the sealant, and has a narrow display and a better display effect.

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Abstract

一种显示面板具有显示区域和非显示区域，且该显示面板包括：相对设置的第一基板和第二基板、以及位于第一基板和第二基板之间的液晶分子层，第一基板和第二基板对应于显示区域的位置均设有配向膜、对应于非显示区域的位置均设有用于涂布封框胶的封框胶区域，第一基板靠近液晶分子层的表面的封框胶区域设有第一抬高层，第一抬高层使第一基板的封框胶区域高于其显示区域；第二基板靠近液晶分子层的表面的封框胶区域设有第二抬高层，第二抬高层使第二基板的封框胶区域高于其显示区域。上述显示面板在具有窄边框的同时具有较好的显示效果。

Description

显示面板及其制备方法和显示装置 技术领域
本发明的实施例涉及一种显示面板及其制备方法和显示装置。 背景技术
在液晶显示装置的制备过程中， 仅通过在玻璃基板之间注入液晶材料很 难得到所希望的液晶材料分子的取向状态， 因此需要在液晶显示装置中的彩 膜基板和阵列基板的显示区域内形成配向膜，以设定液晶分子的预倾斜角度， 使液晶分子在初始状态时整齐排列。
例如， 配向膜的形成通常是使用感光板将光配向液转印到彩膜基板和阵 列基板上， 然后进行传统的摩擦或者进行光照配向。 使用感光板将光配向液 转印在彩膜基板和阵列基板上时， 容易使配向膜的边缘厚度不均匀、 配向方 向不均一。 因此， 为了防止配向膜的边缘区影响显示区的正常显示， 光配向 液转印到彩膜基板和阵列基板上形成的配向膜的面积需大于显示区域的面 积。 配向膜周边可印的范围越大， 对工艺要求就越低， 配向膜不均匀区域进 入显示区域的风险也就越小。
但是， 窄边框的显示装置的非显示区域较小， 如图 1所示， 将彩膜基板 01和阵列基板 02对盒（ cell-assembly ) 以形成显示面板时， 封框胶 03的涂 覆区域容易与配向膜 04的边缘部分重合， 或者， 如图 2所示， 配向膜 04的 边缘伸出封框胶 03的涂覆区域。 配向膜 04可以包括进行取向的上取向层和 机械强度大的底层， 配向膜的上取向层机械强度低， 容易与封框胶剥离， 使 得外界环境中的水分容易进入显示面板中， 造成显示面板不良显示。 发明内容
本发明的实施例提供了一种显示面板， 具有窄边框的同时具有较好的显 示效果。
本发明的实施例还提供了一种显示面板的制备方法， 提高了显示面板的 显示效果。 本发明的实施例还提供了一种显示装置， 具有较好的显示效果。
本发明的一个方面提供了一种显示面板， 具有显示区域和非显示区域， 所述显示面板包括： 相对设置的第一基板和第二基板、 以及位于所述第一基 板和所述第二基板之间的液晶分子层， 所述第一基板和所述第二基板对应于 所述显示区域的位置均设有配向膜、 对应于所述非显示区域的位置均设有用 于涂布封框胶的封框胶区域， 所述第一基板朝向所述液晶分子层的表面的封 框胶区域设有第一抬高层， 所述第一抬高层使所述第一基板的封框胶区域高 于其显示区域； 所述第二基板朝向所述液晶分子层的表面的封框胶区域设有 第二抬高层，所述第二抬高层使所述第二基板的封框胶区域高于其显示区域。
例如， 在一些可选的实施方式中， 所述第一抬高层或所述第二抬高层由 彩色滤光片的色阻层中的一层或多层叠加形成。
例如， 在一些可选的实施方式中， 所述第一抬高层和 /或所述第二抬高层 由金属、 金属合金、 树脂或光刻胶材料形成。
例如， 在一些可选的实施方式中， 上述显示面板还可以包括： 位于所述 第一基板和所述第二基板之间的隔垫物层， 所述第一抬高层或所述第二抬高 层由所述隔垫物层形成。
例如， 在一些可选的实施方式中， 上述显示面板还可以包括： 位于所述 第一基板和所述第二基板之间的隔垫物层， 所述第一抬高层或所述第二抬高 层由彩色滤光片的色阻层、 所述隔垫物层中的一层或多层叠加形成。
例如， 在一些可选的实施方式中， 所述第一抬高层和所述第二抬高层的 厚度小于等于液晶盒厚度的二分之一。
本发明的另一方面还提供了一种显示面板的制备方法， 所述显示面板具 有显示区域和非显示区域， 且所述显示面板包括： 相对设置的第一基板和第 二基板、 以及位于所述第一基板和所述第二基板之间的液晶分子层， 所述第 一基板和第二基板对应所述非显示区域的分别具有用于涂布封框胶的封框胶 区域， 该方法包括： 在所述第一基板的封框胶区域形成第一抬高层图案， 使 所述第一基板的封框胶区域高于其显示区域； 在所述第二基板的封框胶区域 形成第二抬高层图案， 使所述第二基板的封框胶区域高于其显示区域； 在所 述第一基板的显示区域和所述第二基板的显示区域形成配向膜； 将所述第一 基板和所述第二基板对盒； 在所述第一基板和所述第二基板之间注入液晶分 子。
例如， 在一些可选的实施方式中， 所述在所述第一基板的封框胶区域形 成第一抬高层图案或所述在所述第二基板的封框胶区域形成第二抬高层图案 包括： 在所述第一基板的封框胶区或所述第二基板的封框胶区域形成第一色 阻层图案； 在所述第一色阻层图案上形成第二色阻层图案； 在所述第二色阻 层图案上形成第三色阻层图案； 所述第一色阻层图案、 所述第二色阻层图案 以及所述第三色阻层图案叠加形成所述第一抬高层图案或所述第二抬高层图 案。
例如， 在一些可选的实施方式中， 所述在所述第一基板的封框胶区域形 成第一抬高层图案或所述在所述第二基板的封框胶区域形成第二抬高层图案 可以包括： 在所述第一基板的封框胶区或所述第二基板的封框胶区域形成隔 垫物， 所述隔垫物形成所述第一抬高层图案或所述第二抬高层图案。
例如， 在一些可选的实施方式中， 所述在第一基板的封框胶区域形成第 一抬高层图案和 /或在所述第二基板的封框胶区域形成第二抬高层图案可以 包括：在所述第一基板的封框胶区和 /或所述第二基板的封框胶区域形成光刻 胶材料层，所述光刻胶材料层形成所述第一抬高层图案和 /或所述第二抬高层 图案。
例如， 在一些可选的实施方式中， 所述在所述第一基板的显示区域和所 述第二基板的显示区域分别形成配向膜可以包括： 将分解型光配向液转印到 所述第一基板和所述第二基板上， 所述第一抬高层图案和所述第二抬高层图 案上的光配向液将流向所述第一基板和所述第二基板的封框胶区域分别与显 示区域之间的非显示区域内； 采用一定方向的紫外光对所述第一基板和所述 第二基板进行照射； 对所述第一基板和所述第二基板进行清洗。
例如， 在一些可选的实施方式中， 所述采用一定方向的紫外光对所述第 一基板和所述第二基板进行照射和所述对所述第一基板和所述第二基板进行 清洗之间还可以包括： 使用掩膜板对所述第一基板的封框胶区域和所述第二 基板的封框胶区域进行全偏振紫外光曝光。
本发明的另一方面还提供了一种显示装置， 包括上述任一项所述的显示 面板。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 筒单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1为传统的显示面板中的封框胶的涂覆区域与配向膜的边缘部分重合 结构示意图；
图 2为传统的显示面板中的配向膜的边缘伸出封框胶的涂覆区域结构示 意图；
图 3为本发明实施例提供的一种显示面板的结构示意图；
图 4为本发明实施例提供的显示面板中的彩膜基板的一种结构示意图； 图 5为本发明实施例提供的显示面板中的阵列基板的一种结构示意图。 附图标记：
01.彩膜基板 02.阵列基板 03. 封框胶区域 04.配向膜 1.第一基板 11.红色色阻层图案 12.绿色色阻层图案 13.蓝色色阻层图案 2.第二基板 21.隔垫物 3.封框胶区域 4.配向层 51.第一抬高层 52.第二抬高层 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例的附图，对本发明实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本发明的一部分实施例， 而不是全部的实施例。 基于所描 述的本发明的实施例， 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例， 都属于本发明保护的范围。
实施例一
图 3为本发明一个实施例提供的一种显示面板的结构示意图。 本实施例 提供一种显示面板， 具有显示区域和非显示区域， 例如非显示区域位于显示 区域的周边。 该显示面板包括： 相对设置的第一基板 1和第二基板 2、 以及 位于第一基板 1和第二基板 2之间的液晶分子层， 第一基板 1和第二基板 2 对应于显示区域的位置均设有配向膜 4、 对应于非显示区域的位置设有用于 涂布封框胶的封框胶区域 3。 封框胶区域 3为非显示区域的一部分。
第一基板 1朝向液晶分子层的表面的封框胶区域 3设有第一抬高层 51 , 第一抬高层 51使第一基板 1的封框胶区域 3 (相对于第一基板 1 ) 高于其显 示区域；
第二基板 2朝向液晶分子层的表面的封框胶区域 3设有第二抬高层 52, 第二抬高层 52使第二基板 2的封框胶区域 3 (相对于第二基板 2 ) 高于其显 示区 i或。
传统的显示面板一般包括显示区域和非显示区域， 显示区域主要用来显 示成像， 非显示区域用来布线和涂抹封框胶。 随着显示面板越来越窄边化， 显示面板的非显示区域越来越小， 对印刷配向膜的工艺要求也就越来越高， 这需要使光配向液尽量不要印刷到封框胶区域内， 减少配向膜中的上取向层 对封框胶粘结力的影响。
此处说明， 第一抬高层高于第一基板的显示区域指以显示区域为水平面 时， 第一抬高层相对显示区域是凸出来的； 第二抬高层高于第二基板的显示 区域指以显示区域为水平面时， 第二抬高层相对显示区域是凸出来的。
本实施例提供的显示面板中， 第一基板 1和第二基板 2的封框胶区域 3 分别具有第一抬高层 51和第二抬高层 52。第一抬高层 51使第一基板 1的封 框胶区域 3高于第一基板 1的显示区域， 第一基板 1的配向膜 4位于第一基 板 1的封框胶区域 3围成的区域内。由于第一抬高层 51与第一基板 1的显示 区域的高度差的存在，使得第一抬高层 51上形成的配向膜 4变薄，进行光照 取向时发生光分解的上取向层消失， 机械强度大的底层保留下来， 减少了第 一基板 1上的配向膜 4对封框胶与第一基板 1的封框胶区域 3粘结力的影响。 同理，第二抬高层 52也减少了第二基板 2上的配向膜 4对封框胶与第二基板 2的封框胶区域 3粘结力的影响。
所以， 本实施例提供的显示面板可以具有较好的显示效果， 且更易于实 现窄边框显示装置。
需要说明的是， 本发明以下实施例中， 仅以第一基板为彩膜基板、 第二 基板为阵列基板的显示面板进行详细说明，但是第一基板也可以为普通基板、 第二基板为集成彩膜的阵列基板 ( COA )等其他类型的显示面板， 在此不作 限定。
可选地， 图 4为本实施例提供的显示面板中的彩膜基板的一个示例的结 构示意图。 第一抬高层 51由彩色滤光片的色阻层中的一层或多层叠加形成。 也就是说，第一抬高层 51可以由彩色滤光片的色组层中的一层形成，也可以 由彩色滤光片的色组层中的两层形成， 这里就不再一一列举。
可选地， 例如， 第一抬高层 51和 /或第二抬高层 52由金属、 金属合金、 树脂或光刻胶材料形成。
上述显示面板还可以包括： 位于彩膜基板和阵列基板之间的隔垫物， 当 隔垫物层设置在彩膜基板上时， 第一抬高层 51由隔垫物层形成。
请参考图 5 , 图 5为本实施例提供的显示面板中的阵列基板的另一个示 例的结构示意图。 当隔垫物层设置在阵列基板上时，例如第二抬高层 52由隔 垫物层形成。
上述显示面板还可以包括： 位于彩膜基板和阵列基板之间的隔垫物层， 当隔垫物层设置在彩膜基板上时，第一抬高层 51由彩色滤光片的色阻层、隔 垫物层中的一层或多层叠加形成。也就是说，第一抬高层 51由彩色滤光片的 色阻层中的一层和隔垫物层形成， 也可以由彩色滤光片的色阻层中的两层和 隔垫物层形成， 这里就不再——列举。
为了不影响液晶盒的盒厚（即两个基板之间用于容纳液晶材料的空间的 厚度） ， 第一抬高层和第二抬高层的厚度小于等于液晶盒厚度的二分之一。
实施例二
本发明实施例提供了一种显示面板的制备方法， 显示面板具有显示区域 和非显示区域， 第一基板和第二基板对应所述非显示区域分别具有用于涂布 封框胶的封框胶区域， 包括：
步骤 S101 : 在第一基板封框胶区域形成第一抬高层图案， 使第一基板的 封框胶区域高于第一基板的显示区域；
步骤 S102: 在第二基板的封框胶区域形成第二抬高层图案，使第二基板 的封框胶区域高于阵列基板的显示区域；
步骤 S103: 在第一基板的显示区域和第二基板的显示区域形成配向膜； 步骤 S104: 将第一基板和第二基板对盒；
步骤 S105: 在第一基板和第二基板之间注入液晶分子。
本发明实施例提供的显示面板的制备方法， 在印刷配向膜时， 由于第一 抬高层图案与第一基板的显示区域之间高度差的存在， 使得第一抬高层图案 上形成的配向膜变薄， 从而在该部分配向膜中， 进行光照取向时发生光分解 的上取向层消失， 而机械强度大的底层保留下来， 这减少了配向膜对封框胶 粘结力的影响。 同理， 第二抬高层也减少了第二基板上的配向膜对封框胶与 第二基板的封框胶区域粘结力的影响。
将第一基板和第二基板对盒的工艺， 包括将第一基板和第二基板彼此相 对设置， 并通过封框胶将二者固定以在其间形成容纳液晶材料的液晶盒 ( cell ) 。
所以， 本实施例提供的显示面板的制备方法， 在保证显示面板窄边框的 前提下， 提高了显示面板的显示效果。
实施例三
在实施例二的基础上， 请继续参考图 4, 以第一基板为彩膜基板、 第二 基板为阵列基板的显示面板的制备方法为例进行说明， 但本发明不限于此。
步骤 S101 中， 在第一基板的封框胶区域形成第一抬高层图案， 使第一 基板的封框胶区域高于第一基板的显示区域（以第一基板 1为彩膜基板为例 进行详细说明） 的一个示例包括： 首先， 在彩膜基板的封框胶区域形成红色 色阻（color filter )层图案 11; 其次， 在红色色阻层图案 11上形成绿色色阻 层图案 12; 然后， 在绿色色阻层图案 12上形成蓝色色阻层图案 13; 由此， 红色色阻层图案 11、绿色色阻层图案 12以及蓝色色阻层图案 13叠加形成抬 第一高层图案。
在传统的工艺中， 只保留显示区域的红色色阻层图案 11、 绿色色阻层图 案 12和蓝色色阻层图案 13, 而本实施例保留封框胶区域内的红色色阻层图 案 11、 绿色色阻层图案 12和蓝色色阻层图案 13以形成第一抬高层图案。
当然，第一抬高层图案也可以由红色色阻层图案 11、绿色色阻层图案 12 以及蓝色色阻层图案 13中的任一层或两层叠加形成。也就是说在制作过程中 可保留红色色阻层图案 11、 绿色色阻层图案 12、 蓝色色阻层图案 13中的任 一层或两层以形成第一抬高层图案。 并且， 形成红色、 绿色和蓝色色阻层并 不限于上述顺序， 也可以为其他任何适当的顺序。
需要说明的是， 本发明实施例中， 仅以彩色滤光片的第一色阻层为红色 色阻层、 第二色阻层为绿色色阻层、 第三色阻层为蓝色色阻层为例进行详细 说明， 其顺序和颜色并不作限定， 滤光片除了为 RGB (红绿蓝）类型之外， 还可以为还可以为 RGBY (红绿蓝黄） 、 CMYK (青品红黄黑）等其他显示 领域常见的彩色滤光片类型。
步骤 S103 中在第一基板的显示区域形成配向膜（以第一基板为彩膜基 板为例进行详细说明） 的一个示例包括如下工艺。
将分解型光配向液转印到彩膜基板上， 第一抬高层图案上的光配向液将 流向彩膜基板的封框胶区域与彩膜基板的显示区域之间的非显示区域内， 也 就是说抬高层图案上形成的配向膜将变薄；
采用一定方向的紫外光对彩膜基板进行照射， 与紫外光偏振方向相匹配 的配向膜中的分子将发生断链反应， 分解成小分子， 使得配向膜更薄些； 对彩膜基板进行清洗， 上述小分子将被清洗去除， 配向膜将更薄一些， 第一抬高层图案上的配向膜的取向层将被去除， 可以大大的降低配向膜对封 框胶的粘结力的影响， 进而提高显示面板的显示效果。
在本实施例以及下面的实施例中， 在转印分解型光配向液时， 光配向液 转印到彩膜基板和阵列基板上形成的配向膜的面积需大于显示区域的面积。
进一步地， 为了使第一抬高层图案上的配向膜更薄些， 在采用一定方向 的紫外光对彩膜基板进行照射和步骤对彩膜基板进行清洗之间还可以进行如 下工艺： 使用掩膜板对彩膜基板的封框胶区域进行全偏振紫外光曝光， 掩膜 板将彩膜基板的显示区域及其附近区域遮挡住， 第一抬高层图案露出， 全偏 振紫外光将对第一抬高层图案进行曝光。 由于各种偏振方向的光都存在， 使 得第一抬高层图案上的配向膜的各个方向的分子链都发生分解反应， 再对彩 膜基板进行清洗时， 第一抬高层图案上的配向膜几乎没有残留。
实施例四
在实施例二的基础上， 以第一基板为彩膜基板、 第二基板为阵列基板的 显示面板的制备方法为例进行详细说明， 但不作限定。
步骤 S101 在第一基板的封框胶区域形成第一抬高层图案， 使第一基板 的封框胶区域高于第一基板的显示区域（以第一基板为彩膜基板为例进行详 细说明） 的一个示例包括如下工艺。
在彩膜基板上形成隔垫物层， 隔垫物层形成第一抬高层图案。 当然， 第 一抬高层图案也可以由红色色阻层图案 11、绿色色阻层图案 12、蓝色色阻层 图案 13、 以及隔垫物层中的一层或多层叠加形成。
步骤 S103 中在第一基板的显示区域形成配向膜（以第一基板为彩膜基 板为例进行详细说明） 的一个示例包括如下工艺。
将分解型光配向膜转印到彩膜基板上， 第一抬高层图案上的配向液将流 向彩膜基板的封框胶区域与彩膜基板的显示区域之间的非显示区域内， 也就 是说第一抬高层图案上形成的配向膜将变薄；
采用一定方向的紫外光对彩膜基板进行照射， 与紫外光偏振方向相匹配 的配向膜中的分子将发生断链反应， 分解成小分子， 使得配向膜更薄些； 对彩膜基板进行清洗， 上述小分子将被清洗去除， 配向膜将更薄一些， 第一抬高层图案上的配向膜的上取向层将被去除， 可以大大的降低配向膜对 封框胶的粘结力的影响， 进而提高显示面板的显示效果。
进一步地， 为了使第一抬高层图案上的配向膜更薄些， 在步骤采用一定 方向的紫外光对彩膜基板进行照射和步骤对彩膜基板进行清洗之间还可以进 行如下工艺： 使用掩膜板对彩膜基板的封框胶区域进行全偏振紫外光曝光， 掩膜板将彩膜基板显示区域及其附近区域遮挡住， 第一抬高层图案露出， 全 偏振紫外光将对第一抬高层图案进行曝光。 由于各种偏振方向的光都存在， 使得第一抬高层图案上的配向膜的各个方向的分子链都发生分解反应， 再对 彩膜基板进行清洗时， 第一抬高层图案上的配向膜几乎没有残留。
实施例五
在实施例二的基础上， 以第一基板为彩膜基板、 第二基板为阵列基板的 显示面板的制备方法为例进行详细说明， 但不作限定。
步骤 S101 在第一基板的封框胶区域形成第一抬高层图案， 使第一基板 的封框胶区域高于第一基板的显示区域（以第一基板为彩膜基板为例进行详 细说明） 的一个示例包括如下工艺： 在彩膜基板上形成光刻胶材料层， 光刻 胶材料层形成第一抬高层图案。
例如， 在彩膜基板上形成光刻胶材料层后， 使用掩模板对彩膜基板进行 曝光,保留彩膜基板的封框胶区域内的光刻胶材料层以形成第一抬高层图案。
光刻胶分为正性光刻胶或负性光刻胶。 当所使用的光刻胶为负性光刻胶 时， 可以采用固化封框胶的掩膜板对彩膜基板进行曝光， 封框胶区域内的光 刻胶材料层将被保留下来， 形成第一抬高层图案； 当所使用的光刻胶为正性 光刻胶时， 则需要另外制作曝光掩膜板。
步骤 S103 中在第一基板的显示区域形成配向膜（以第一基板为彩膜基 板为例进行详细说明） 的一个示例包括如下工艺：
将分解型光配向膜转印到彩膜基板上， 第一抬高层图案上的配向液将流 向彩膜基板的封框胶区域与彩膜基板的显示区域之间的非显示区域内， 也就 是说第一抬高层图案上形成的配向膜将变薄；
采用一定方向的紫外光对彩膜基板进行照射， 与紫外光偏振方向相匹配 的配向膜中的分子将发生断链反应， 分解成小分子， 使得配向膜更薄些； 对彩膜基板进行清洗， 上述小分子将被清洗去除， 配向膜将更薄一些， 第一抬高层图案上的配向膜的取向层将被去除， 可以大大的降低配向膜对封 框胶的粘结力的影响， 进而提高显示面板的显示效果。
进一步地， 为了使第一抬高层图案上的配向膜更薄些， 在步骤采用一定 方向的紫外光对彩膜基板进行照射和步骤对彩膜基板进行清洗之间还可以进 行如下工艺： 使用掩膜板对彩膜基板的封框胶区域进行全偏振紫外光曝光， 掩膜板将彩膜基板显示区域及其附近区域遮挡住， 第一抬高层图案露出， 全 偏振紫外光将对第一抬高层图案进行曝光。 由于各种偏振方向的光都存在， 使得第一抬高层图案上的配向膜的各个方向的分子链都发生分解反应， 再对 彩膜基板进行清洗时， 第一抬高层图案上的配向膜几乎没有残留。
更进一步地， 在另一个示例中， 还可以采用光刻胶剥离技术， 使得封框 胶区域内没有配向膜， 也就不存在配向膜对封框胶的附着性的影响。
实施例六
在实施例二的基础上， 以第一基板为彩膜基板、 第二基板为阵列基板的 显示面板的制备方法为例进行详细说明， 但不作限定。
请继续参考图 5 ,步骤 S102在第二基板的封框胶区域形成第二抬高层图 案， 使第二基板的封框胶区域高于第二基板的显示区域（以第二基板 2为阵 列基板为例进行详细说明） 的一个示例包括： 在阵列基板上形成隔垫物， 隔 垫物 21形成第二抬高层图案。
当第二基板 2为阵列基板时， 第二抬高层也可以由栅极线层、 有源层、 数据线层、 像素电极层、 公共电极层平坦层、 隔垫物层中的任一层或多层叠 加形成。
步骤 S103 中在第二基板的显示区域形成配向膜（以第二基板为阵列基 板为例进行详细说明） 的一个示例包括如下工艺： 将分解型光配向膜转印到阵列基板上， 第二抬高层图案上的配向液将流 向阵列基板的封框胶区域与阵列基板的显示区域之间的非显示区域内， 也就 是说抬高层图案上形成的配向膜将变薄；
采用一定方向的紫外光对阵列基板进行照射， 与紫外光偏振方向相匹配 的配向膜中的分子将发生断链反应， 分解成小分子， 使得配向膜更薄些； 对阵列基板进行清洗， 上述小分子将被清洗去除， 配向膜将更薄一些， 第二抬高层图案上的配向膜的上取向层将被去除， 可以大大的降低配向膜对 封框胶的粘结力的影响， 进而提高显示面板的显示效果。
进一步地， 为了使第二抬高层图案上的配向膜更薄些， 在步骤采用一定 方向的紫外光对阵列基板进行照射和步骤对阵列基板进行清洗之间还可以进 行如下工艺： 使用掩膜板对阵列基板的封框胶区域进行全偏振紫外光曝光， 掩膜板将阵列基板显示区域及其附近区域遮挡住， 第二抬高层图案露出， 全 偏振紫外光将对第二抬高层图案进行曝光。 由于各种偏振方向的光都存在， 使得第二抬高层图案上的配向膜的各个方向的分子链都发生分解反应， 再对 阵列基板进行清洗时， 第二抬高层图案上的配向膜几乎没有残留。
实施例七
在实施例二的基础上， 以第一基板为彩膜基板、 第二基板为阵列基板的 显示面板的制备方法为例进行详细说明， 但不作限定。
步骤 S102在第二基板的封框胶区域形成第二抬高层图案， 使第二基板 的封框胶区域高于第二基板的显示区域（以第二基板为阵列基板为例进行详 细说明） 的一个示例包括如下工艺： 在阵列基板上形成光刻胶材料层， 光刻 胶材料层形成第二抬高层图案。
例如， 阵列基板上形成光刻胶材料层后， 使用掩模板对阵列基板进行曝 光， 保留阵列基板的封框胶区域内的光刻胶材料层以形成第二抬高层图案。
光刻胶分为正性光刻胶或负性光刻胶。 当光刻胶为负性光刻胶时， 可以 采用固化封框胶的掩膜板对阵列基板进行曝光， 封框胶区域内的光刻胶材料 层将被保留下来， 形成第二抬高层图案； 当光刻胶为正性光刻胶时， 则需要 另外制作曝光掩膜板。
步骤 S103 中在第二基板的显示区域形成配向膜（以第二基板为阵列基 板为例进行详细说明） 的一个示例包括： 将分解型光配向膜转印到阵列基板上， 阵列基板的第二抬高层图案上的 配向液将流向阵列基板的封框胶区域与阵列基板的显示区域之间的非显示区 域内， 也就是说第二抬高层图案上形成的配向膜将变薄；
采用一定方向的紫外光对阵列基板进行照射， 与紫外光偏振方向相匹配 的配向膜中的分子将发生断链反应， 分解成小分子， 使得配向膜更薄些； 对阵列基板进行清洗， 上述小分子将被清洗去除， 配向膜将更薄一些， 第二抬高层图案上的配向膜的取向层将被去除， 可以大大的降低配向膜对封 框胶的粘结力的影响， 进而提高显示面板的显示效果。
进一步地， 为了使第二抬高层图案上的配向膜更薄些， 在步骤采用一定 方向的紫外光对阵列基板进行照射和步骤对阵列基板进行清洗之间还可以进 行如下工艺： 使用掩膜板对阵列基板的封框胶区域进行全偏振紫外光曝光， 掩膜基板将阵列基板显示区域及其附近区域遮挡住， 第二抬高层图案露出， 全偏振紫外光将对第二抬高层图案进行曝光。由于各种偏振方向的光都存在， 使得第二抬高层图案上的配向膜的各个方向的分子链都发生分解反应， 再对 阵列基板进行清洗时， 第二抬高层图案上的配向膜几乎没有残留。
更进一步地， 在另一个示例中， 还可以采用光刻胶剥离技术， 使得封框 胶区域内没有配向膜， 也就不存在配向膜对封框胶的附着性的影响。
例如， 显示面板中的彩膜基板中的第一抬高层图案可以选择上述实施例 三、 实施四、 实施例五中的任一方法形成， 阵列基板中的第二抬高层图案可 以选择上述实施例六和实施例七中的任一方法形成。 这里对于彩膜基板上的 第一抬高层图案和阵列基板上的第二抬高层图案的形成方法的彼此之间的组 合就不再——列举实施例说明。
实施例八
本实施例还提供了一种显示装置， 包括上述的显示面板。 由于上述显示 面板具有较好的显示效果， 所以本实施例提供的显示装置具有较好的显示效 果。
上述显示装置可以为手机、 平板电脑、 显示器、 笔记本电脑、 导航仪等 任何具有显示功能的产品或部件。
本发明实施例提供的显示面板， 避免了配向膜中的上取向层对封框胶的 粘结力的影响， 在具有窄边框的同时还具有较好的显示效果。 以上所述仅是本发明的示范性实施方式， 而非用于限制本发明的保护范 本发明的保护范围由所附的权利要求确定。

Claims

权利要求书
1、 一种显示面板， 具有显示区域和非显示区域， 所述显示面板包括： 相 对设置的第一基板和第二基板、 以及位于所述第一基板和所述第二基板之间 的液晶分子层， 所述第一基板和所述第二基板对应于所述显示区域的位置均 设有配向膜、 对应于所述非显示区域的位置均设有用于涂布封框胶的封框胶 区域， 其中，
所述第一基板朝向所述液晶分子层的表面的封框胶区域设有第一抬高 层， 所述第一抬高层使所述第一基板的封框胶区域高于其显示区域；
所述第二基板朝向所述液晶分子层的表面的封框胶区域设有第二抬高 层， 所述第二抬高层使所述第二基板的封框胶区域高于其显示区域。
2、根据权利要求 1所述的显示面板， 其中， 所述第一抬高层或所述第二 抬高层由彩色滤光片的色阻层中的一层或多层叠加形成。
3、 根据权利要求 1所述的显示面板， 其中， 所述第一抬高层和 /或所述 第二抬高层由金属、 金属合金、 树脂或光刻胶材料形成。
4、根据权利要求 1所述的显示面板，还包括： 位于所述第一基板和所述 第二基板之间的隔垫物层， 所述第一抬高层或所述第二抬高层由所述隔垫物 层形成。
5、根据权利要求 1所述的显示面板，还包括： 位于所述第一基板和所述 第二基板之间的隔垫物层， 所述第一抬高层或所述第二抬高层由彩色滤光片 的色阻层、 所述隔垫物层中的一层或多层叠加形成。
6、 根据权利要求 1~5任一项所述的显示面板， 其中， 所述第一抬高层 和所述第二抬高层的厚度小于等于液晶盒厚度的二分之一。
7、一种显示面板的制备方法，所述显示面板具有显示区域和非显示区域， 且所述显示面板包括： 相对设置的第一基板和第二基板、 以及位于所述第一 基板和所述第二基板之间的液晶分子层， 所述第一基板和第二基板对应所述 非显示区域的分别具有用于涂布封框胶的封框胶区域， 该方法包括：
在所述第一基板的封框胶区域形成第一抬高层图案， 使所述第一基板的 封框胶区域高于其显示区域；
在所述第二基板的封框胶区域形成第二抬高层图案， 使所述第二基板的 封框胶区域高于其显示区域；
在所述第一基板的显示区域和所述第二基板的显示区域分别形成配向 膜；
将所述第一基板和所述第二基板对盒；
在所述第一基板和所述第二基板之间注入液晶分子。
8、根据权利要求 7所述的显示面板的制备方法， 其中， 所述在所述第一 基板的封框胶区域形成第一抬高层图案或在所述第二基板的封框胶区域形成 第二抬高层图案包括：
在所述第一基板的封框胶区域或所述第二基板的封框胶区域形成第一色 阻层图案；
在所述第一色阻层图案上形成第二色阻层图案；
在所述第二色阻层图案上形成第三色阻层图案；
所述第一色阻层图案、 所述第二色阻层图案以及所述第三色阻层图案叠 加形成所述第一抬高层图案或所述第二抬高层图案。
9、根据权利要求 7所述的显示面板的制备方法， 其中，在所述第一基板 的封框胶区域形成第一抬高层图案或所述在所述第二基板的封框胶区域形成 第二抬高层图案包括：
在所述第一基板的封框胶区域或所述第二基板的封框胶区域形成隔垫 物， 所述隔垫物形成所述第一抬高层图案或所述第二抬高层图案。
10、 根据权利要求 7所述的显示面板的制备方法， 其中， 在所述第一基 板的封框胶区域形成第一抬高层图案和 /或所述在所述第二基板的封框胶区 域形成第二抬高层图案包括：
在所述第一基板的封框胶区域和 /或所述第二基板的封框胶区域形成光 刻胶材料层，所述光刻胶材料层形成所述第一抬高层图案和 /或所述第二抬高 层图案。
11、 根据权利要求 7~9任一项所述的显示面板的制备方法， 其中， 在所 述第一基板的显示区域和所述第二基板的显示区域分别形成配向膜包括： 将分解型光配向液转印到所述第一基板和所述第二基板上， 所述第一抬 高层图案和所述第二抬高层图案上的光配向液将流向所述第一基板和所述第 二基板的封框胶区域分别与显示区域之间的非显示区域内； 采用一定方向的紫外光对所述第一基板和所述第二基板进行照射； 对所述第一基板和所述第二基板进行清洗。
12、根据权利要求 11所述的显示面板的制备方法， 其中， 采用一定方向 的紫外光对所述第一基板和所述第二基板进行照射和对所述第一基板和所述 第二基板进行清洗之间还包括：
使用掩膜板对所述第一基板的封框胶区域和所述第二基板的封框胶区域 进行全偏振紫外光曝光。
13、 一种显示装置， 包括如权利要求 1~6任一项所述的显示面板。
PCT/CN2013/085810 2013-06-28 2013-10-23 显示面板及其制备方法和显示装置 WO2014205968A1 (zh)

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