JP2015519613A - マザーボードの配向膜の製作方法及び転写シートと配向液 - Google Patents
マザーボードの配向膜の製作方法及び転写シートと配向液 Download PDFInfo
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G03F7/004—Photosensitive materials
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- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
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- G03F7/16—Coating processes; Apparatus therefor
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
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Abstract
Description
102 ディスペンサ
103 アニロックスロール
104 ブレードロール
105 転写シート
106 ベース台
107 マザーボード
108 配向膜
109 ベース膜
110 転写層
111 転写領域
112 非転写領域
113 表示領域
114 非表示領域
115 シーラント領域
116 その他の領域
Claims (14)
- マザーボードの配向膜を製作する方法であって、転写シートを利用して二つ以上の基板を有するマザーボードに配向液を塗布し、配向液がマザーボードに配向膜を形成し、前記転写シートは同時に二つ以上の基板を覆う転写領域を有し、
前記マザーボードの基板の表示領域以外に位置し、かつ配向膜を残す必要がない領域の配向膜を除去することを特徴とするマザーボードの配向膜の製作方法。 - 前記配向膜が光加工材料によって形成され、
前記配向膜を除去する場合、マスクで露光工程を行った後現像工程を行うことを特徴とする請求項1に記載のマザーボードの配向膜の製作方法。 - 前記配向液は、液晶分子配向材料、感光性材料、光増感剤及び溶媒を含むことを特徴とする請求項1または請求項2に記載のマザーボードの配向膜の製作方法。
- 前記配向液に対する重量比は、前記液晶分子材料が25〜35%であり、前記感光性材料が3.5〜6%であり、前記光増感剤が0.8〜2.5%であることを特徴とする請求項3に記載のマザーボードの配向膜の製作方法。
- 前記液晶分子材料は主鎖型ポリイミドおよび側鎖型ポリイミドの中の一つあるいは二つであることを特徴とする請求項3または請求項4に記載のマザーボードの配向膜の製作方法。
- 前記感光材料が2,3,4,4′−テトラヒドロキシベンゾフェノン1,2−ジアゾナフトキノン−5−アルホン酸エステルであることを特徴とする請求項3から請求項5のいずれか1項に記載のマザーボードの配向膜の製作方法。
- 前記光増感剤がジアゾナフトキノンスルホニルクロラクドであることを特徴とする請求項3から請求項6のいずれか1項に記載のマザーボードの配向膜の製作方法。
- 前記露光と現像方法で前記配向膜を除去する時、露光設備が放出した紫外線の波長が340nm〜460nmであり、露光時間が60s〜100sであることを特徴とする請求項2に記載のマザーボードの配向膜の製作方法。
- 同時に二つ以上の基板を覆う転写領域を有することを特徴とする転写シート。
- 液晶分子配向材料、感光性材料、光増感剤及び溶媒を含むことを特徴とする配向液。
- 配向液に対する重量比は、前記液晶分子材料が25〜35%であり、前記感光性材料が3.5〜6%であり、前記光増感剤が0.8〜2.5%であることを特徴とする請求項10に記載の配向液。
- 前記液晶分子材料が主鎖型ポリイミドと側鎖型ポリイミドの中の一つあるいは二つであることを特徴とする請求項10または請求項11に記載の配向液。
- 前記感光材料が2,3,4,4′−テトラヒドロキシベンゾフェノン1,2−ジアゾナフトキノン−5−アルホン酸エステルであることを特徴とする請求項10から請求項12のいずれか1項に記載の配向液。
- 前記光増感剤がジアゾナフトキノンスルホニルクロラクドであることを特徴とする請求項10から請求項13のいずれか1項に記載の配向液。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210199221.7A CN102768439B (zh) | 2012-06-14 | 2012-06-14 | 一种母板取向膜的制作方法及转印版、取向液 |
CN201210199221.7 | 2012-06-14 | ||
PCT/CN2012/082374 WO2013185422A1 (zh) | 2012-06-14 | 2012-09-28 | 母板取向膜的制作方法及转印版、取向液 |
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JP2015519613A true JP2015519613A (ja) | 2015-07-09 |
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JP2015516410A Pending JP2015519613A (ja) | 2012-06-14 | 2012-09-28 | マザーボードの配向膜の製作方法及び転写シートと配向液 |
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US (1) | US9513512B2 (ja) |
EP (1) | EP2781955B1 (ja) |
JP (1) | JP2015519613A (ja) |
KR (1) | KR101543932B1 (ja) |
CN (1) | CN102768439B (ja) |
WO (1) | WO2013185422A1 (ja) |
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- 2012-09-28 EP EP12829171.3A patent/EP2781955B1/en active Active
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Patent Citations (4)
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JP2000111921A (ja) * | 1998-10-05 | 2000-04-21 | Canon Inc | 感光性樹脂材料、液晶用配向膜材料およびそれを用いた液晶素子 |
JP2005141235A (ja) * | 2003-11-07 | 2005-06-02 | Samsung Electronics Co Ltd | 配向膜形成装置及びその形成方法 |
JP2005157240A (ja) * | 2003-11-07 | 2005-06-16 | Iinuma Gauge Seisakusho:Kk | 液晶表示素子製造装置および液晶表示素子の製造方法 |
JP2008156393A (ja) * | 2006-12-21 | 2008-07-10 | Jsr Corp | 感放射線性樹脂組成物、垂直配向型液晶表示素子の突起、ならびにそれらの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR101543932B1 (ko) | 2015-08-11 |
EP2781955A1 (en) | 2014-09-24 |
WO2013185422A1 (zh) | 2013-12-19 |
US20140057200A1 (en) | 2014-02-27 |
CN102768439B (zh) | 2014-12-10 |
EP2781955A4 (en) | 2015-07-22 |
KR20140015262A (ko) | 2014-02-06 |
US9513512B2 (en) | 2016-12-06 |
EP2781955B1 (en) | 2020-11-04 |
CN102768439A (zh) | 2012-11-07 |
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