WO2013101385A1 - Light emitting devices and components having excellent chemical resistance and related methods - Google Patents
Light emitting devices and components having excellent chemical resistance and related methods Download PDFInfo
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- WO2013101385A1 WO2013101385A1 PCT/US2012/067055 US2012067055W WO2013101385A1 WO 2013101385 A1 WO2013101385 A1 WO 2013101385A1 US 2012067055 W US2012067055 W US 2012067055W WO 2013101385 A1 WO2013101385 A1 WO 2013101385A1
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Classifications
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/85909—Post-treatment of the connector or wire bonding area
- H01L2224/8592—Applying permanent coating, e.g. protective coating
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- H01—ELECTRIC ELEMENTS
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/64—Heat extraction or cooling elements
- H01L33/647—Heat extraction or cooling elements the elements conducting electric current to or from the semiconductor body
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
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- Y10T428/264—Up to 3 mils
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Definitions
- the subject matter herein relates generally to light emitting devices, components and methods. More particularly, the subject matter herein relates to light emitting devices, components and methods with improved resistance to chemicals and/or chemical vapors or gases that can adversely affect the brightness and reliability of such devices.
- LEDs Light emitting diodes
- LEDs can be utilized in light emitting devices or packages for providing white light (e.g., perceived as being white or near- white), and are developing as replacements for incandescent, fluorescent, and metal halide high-intensity discharge (HID) light products.
- Conventional LED devices or packages can incorporate components such as metallic traces or mounting surfaces which can become tarnished, corroded, or otherwise degraded when exposed to various undesirable chemicals and/or chemical vapors. Such chemicals and/or chemical vapors can enter conventional LED devices, for example, by permeating an encapsulant filling material disposed over such components.
- undesirable chemicals and/or chemical vapors can contain sulfur, sulfur-containing compounds (e.g., sulfides, sulfites, sulfates, SO x ), chlorine and bromine containing complexes, nitric oxide or nitrogen dioxides (e.g., NO x ), and oxidizing organic vapor compounds which can permeate the encapsulant and physically degrade various components within the LED device via corroding, oxidizing, darkening, and/or tarnishing such components. Such degradation can adversely affect brightness, reliability, and/or thermal properties of conventional LED devices over time, and can further adversely affect the performance of the devices during operation.
- sulfur-containing compounds e.g., sulfides, sulfites, sulfates, SO x
- chlorine and bromine containing complexes e.g., nitric oxide or nitrogen dioxides (e.g., NO x )
- oxidizing organic vapor compounds which can permeate the encapsulant and
- Devices, components, and methods described herein can advantageously improve chemical resistance to undesirable chemicals and/or chemical vapors within encapsulated LED devices, while promoting ease of manufacture and increasing device reliability and performance in high power and/or high brightness applications. Described methods can be used and applied to create chemically resistant surface mount device (SMD) type of LED devices of any size, thickness, and/or dimension.
- SMD surface mount device
- Devices, components, and methods described herein can advantageously be used and adapted within any style of LED device, for example, devices including a single LED chip, multiple chips, and/or multi- arrays of LEDs and/or devices incorporating different materials for the body or submount such as plastic, ceramic, glass, aluminum nitride (AIN), aluminum oxide (AI 2 O 3 ), printed circuit board (PCB), metal core printed circuit board (MCPCB), and aluminum panel based devices.
- AIN aluminum nitride
- AI 2 O 3 aluminum oxide
- PCB printed circuit board
- MCPCB metal core printed circuit board
- devices, components, and methods herein can prevent degradation of optical and/or thermal properties of devices or packages incorporating silver (Ag) or Ag plated components by preventing tarnishing of the Ag or Ag- plated components.
- Figure 1 is a top perspective view of a first embodiment of a light emitting diode (LED) device according to the disclosure herein;
- Figure 2 is a cross-sectional view of the first embodiment of the LED device according to the disclosure herein;
- Figure 3 is a top perspective view of a second embodiment of an LED device according to the disclosure herein;
- Figure 4 is a cross-sectional view of the second embodiment of the
- FIGS 5 through 13 are cross-sectional views of LED devices according to the disclosure herein. DETAILED DESCRIPTION
- references to a structure being formed “on” or “above” another structure or portion contemplates that additional structure, portion, or both may intervene. References to a structure or a portion being formed “on” another structure or portion without an intervening structure or portion are described herein as being formed “directly on” the structure or portion.
- relative terms such as “on”, “above”, “upper”, “top”, “lower”, or “bottom” are used herein to describe one structure's or portion's relationship to another structure or portion as illustrated in the figures. It will be understood that relative terms such as “on”, “above”, “upper”, “top”, “lower” or “bottom” are intended to encompass different orientations of the device in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, structure or portion described as “above” other structures or portions would now be oriented “below” the other structures or portions. Likewise, if devices in the figures are rotated along an axis, structure or portion described as “above”, other structures or portions would now be oriented “next to” or “left of the other structures or portions. Like numbers refer to like elements throughout.
- Light emitting devices can comprise group lll-V nitride (e.g., gallium nitride (GaN)) based light emitting diodes (LEDs) or lasers that can be fabricated on a growth substrate, for example, a silicon carbide (SiC) substrate, such as those devices manufactured and sold by Cree, Inc. of Durham, North Carolina.
- a silicon carbide (SiC) substrate such as those devices manufactured and sold by Cree, Inc. of Durham, North Carolina.
- Other growth substrates are also contemplated herein, for example and not limited to sapphire, silicon (Si) and GaN.
- SiC substrates/layers can be 4H polytype silicon carbide substrates/layers.
- Other Sic candidate polytypes, such as 3C, 6H, and 15R polytypes, however, can be used.
- SiC substrates are available from Cree, Inc., of Durham, N.C., the assignee of the present subject matter, and the methods for producing such substrates are set forth in the scientific literature as well as in a number of commonly assigned U.S. patents, including but not limited to U.S. Patent No. Re. 34,861 ; U.S. Patent No. 4,946,547; and U.S. Patent No. 5,200,022, the disclosures of which are incorporated by reference herein in their entireties. Any other suitable growth substrates are contemplated herein.
- Group III nitride refers to those semiconducting compounds formed between nitrogen and one or more elements in Group III of the periodic table, usually aluminum (Al), gallium (Ga), and indium (In).
- the term also refers to binary, ternary, and quaternary compounds such as GaN, AIGaN and AllnGaN.
- the Group III elements can combine with nitrogen to form binary (e.g., GaN), ternary (e.g., AIGaN), and quaternary (e.g., AllnGaN) compounds. These compounds may have empirical formulas in which one mole of nitrogen is combined with a total of one mole of the Group III elements. Accordingly, formulas such as AlxGa1-xN where 1>x>0 are often used to describe these compounds. Techniques for epitaxial growth of Group III nitrides have become reasonably well developed and reported in the appropriate scientific literature.
- LEDs disclosed herein comprise a growth substrate
- the crystalline epitaxial growth substrate on which the epitaxial layers comprising an LED are grown can be removed, and the freestanding epitaxial layers can be mounted on a substitute carrier substrate or substrate which can have different thermal, electrical, structural and/or optical characteristics than the original substrate.
- the subject matter described herein is not limited to structures having crystalline epitaxial growth substrates and can be used in connection with structures in which the epitaxial layers have been removed from their original growth substrates and bonded to substitute carrier substrates.
- Group III nitride based LEDs can be fabricated on growth substrates (e.g., Si, SiC, or sapphire substrates) to provide horizontal devices (with at least two electrical contacts on a same side of the LED) or vertical devices (with electrical contacts on opposing sides of the LED).
- the growth substrate can be maintained on the LED after fabrication or removed (e.g., by etching, grinding, polishing, etc.). The growth substrate can be removed, for example, to reduce a thickness of the resulting LED and/or to reduce a forward voltage through a vertical LED.
- a horizontal device (with or without the growth substrate), for example, can be flip chip bonded (e.g., using solder) to a carrier substrate or printed circuit board (PCB), or wire bonded.
- a vertical device (with or without the growth substrate) can have a first terminal solder bonded to a carrier substrate, mounting pad, or PCB and a second terminal wire bonded to the carrier substrate, electrical element, or PCB. Examples of vertical and horizontal LED chip structures are discussed by way of example in U.S. Publication No. 2008/0258130 to Bergmann et al. and in U.S. Publication No. 2006/0186418 to Edmond et al., the disclosures of which are hereby incorporated by reference herein in their entireties.
- one or more LEDS can be at least partially coated with one or more phosphors.
- the phosphors can absorb a portion of the LED light and emit a different wavelength of light such that the LED device or package emits a combination of light from each of the LED and the phosphor.
- the LED device or package emits what is perceived as white light resulting from a combination of light emission from the LED chip and the phosphor.
- One or more LEDs can be coated and fabricated using many different methods, with one suitable method being described in U.S. Patent Application Serial Nos. 11/656,759 and 11/899,790, both entitled "Wafer Level Phosphor Coating Method and Devices Fabricated Utilizing Method", and both of which are incorporated herein by reference in their entireties.
- LEDs can also be coated using other methods such electrophoretic deposition (EPD), with a suitable EPD method described in U.S. patent Application Serial No.
- LED devices, systems, and methods according to the present subject matter can also have multiple LEDs of different colors, one or more of which can be white emitting.
- LED device 10 can comprise a surface mount device (SMD) comprising a body 12 which can be molded or otherwise formed about a leadframe.
- SMD types of LED devices can be suitable for general LED illumination applications, such as indoor and outdoor lighting, automotive lighting, and preferably suitable for high power and/or high brightness lighting applications.
- the subject matter disclosed herein can be suitably adapted for application within a wide range of SMD type LED device designs, not limited to dimensional and/or material variations.
- body 12 can be disposed about a leadframe comprising a thermal element 14 and one or more electrical elements, for example, first and second electrical elements 16 and 18, respectively. That is, thermal element 14 and electrical elements 16 and 18 can be collectively referred to as a "leadframe" and can be singulated from a sheet of leadframe components (not shown).
- a corner notch, generally designated N can be used for indicating electrical polarity of first and second electrical elements 16 and 18.
- Thermal element 14 and first and second electrical elements 16 and 18 can comprise a material that is electrically and/or thermally conductive such as a metal or metal alloy.
- thermal element 14 can be electrically and/or thermally isolated one and/or both of first and second electrical elements 16 and 18 by one or more isolating portions 20 of the body.
- One or more LED chips or LEDs 22 can be mounted over thermal element 14 using any suitable die attach technique(s) and/or material(s), for example only and not limited to die attach adhesive (e.g., silicone, epoxy, or conductive silver (Ag) epoxy) or a metal-to-metal die attach technique such as flux or no-flux eutectic, non-eutectic, or thermal compression die attach.
- die attach adhesive e.g., silicone, epoxy, or conductive silver (Ag) epoxy
- metal-to-metal die attach technique such as flux or no-flux eutectic, non-eutectic, or thermal compression die attach.
- LEDs 22 can electrically communicate with one and/or both first and second electrical elements 16 and 18 via one or more electrical connectors such as electrically conductive wire bonds 24.
- LEDs 22 with two electrical contacts on the same side are shown as electrically connected to two electrical elements (e.g., 16 and 18) via wire bonds 24.
- LEDs 22 having one electrical contact on the upper surface that is electrically connected with a single electrical element is also contemplated.
- LED 22 can comprise a horizontally structured chip (e.g., having at least two electrical contacts on a same side of the LED) or a vertically structured chip (e.g., with electrical contacts on opposing sides of the LED) with or without a growth substrate.
- LED 22 can comprise one or more substantially straight cut and/or beveled (i.e., angled) cut sides or surfaces.
- LED 22 can comprise a direct attach build (e.g., bonded to a carrier substrate) or a build incorporating a grown substrate such as sapphire, SiC, or GaN. LEDs 22 having any build, structure, type, style, shape, and/or dimension are contemplated herein.
- Wire bonds 24 or other electrical attachment connectors and related methods can be adapted to communicate, transmit, or convey an electrical current or signal from electrical elements 16 and 18 to one or more LEDs 22 thereby causing illumination of the one or more LEDs 22.
- Thermal element 14 and/or first and second electrical elements 16 and 18, respectively can be coated, plated, deposited, or otherwise layered with a reflective material (Figure 2), such as, for example and without limitation, Ag or a Ag-containing alloy for reflecting light from the one or more LEDs 22.
- Body 12 can comprise any suitable material molded or otherwise disposed about thermal element 14 and/or first and second elements 16 and 18, respectively.
- body 12 can comprise a ceramic material such as a low temperature co-fired ceramic (LTCC) material, a high temperature co-fired ceramic (HTCC) material, alumina, aluminum nitride (AIN), aluminum oxide (Al 2 0 3 ), glass, and/or an Al panel material.
- body 12 can comprise a molded plastic material such as polyamide (PA), polyphthalamide (PPA), liquid crystal polymer (LCP) or silicone.
- At least one electrostatic discharge (ESD) protection device 25 can be disposed within device 10 and can be electrically connected to electrical elements 16 and 18 reverse biased with respect to LEDs 22.
- ESD device 25 can protect against damage from ESD within device 10.
- different elements can be used as ESD protection devices 25 such as various vertical silicon (Si) Zener diodes, different LEDs arranged reverse biased to LEDs 22, surface mount varistors and lateral Si diodes.
- ESD device 25 can comprise a vertically structured device having one electrical contact on the bottom and another electrical contact on the top; however, horizontally structured devices are also contemplated.
- body 12 of device 10 can comprise a cavity, generally designated 26, for example, a reflector cavity optionally coated with a reflective material for reflecting light from the one or more LEDs 22.
- cavity 26 can be filled at least partially or completely with a filling material, such as an encapsulant 28.
- Encapsulant can optionally comprise one or more phosphor materials adapted to emit light of a desired wavelength when activated by light emitted from the one or more LEDs 22.
- device 10 can emit light having a desired wavelength or color point that can be a combination of light emitted from phosphors disposed in encapsulant 28 and from the light emitted from one or more LEDs 22.
- thermal element 14 and first and second electrical elements 16 and 18 can comprise an inner portion 30 and an outer portion 32.
- inner portion 30 and outer portion 32 can comprise electrically and/or thermally conductive materials.
- Outer portion 32 may be applied such that it entirely surrounds inner portion 30 as shown, or in other aspects outer portion 32 can optionally plate, coat, or comprise a layer over a single surface or two or more surfaces of portion 30.
- outer portion 32 can comprise a highly reflective Ag substrate, substrate containing Ag, or layer of material such as Ag for maximizing light output from device 10 and for assisting in heat dissipation by conducting heat away from the one or more LEDs 22.
- Outer portion 32 can also comprise a substrate of Ag-containing alloy instead of pure Ag, and such alloy can contain other metals such as titanium (Ti) or nickel (Ni).
- Inner portion 30 can comprise a metal or metal alloy such as copper (Cu) substrate or Cu-alloy substrate.
- an optional layer of material can be disposed between inner portion 30 and outer portion 32, such as a layer of Ni for providing a barrier between the Ag and Cu, thereby preventing defects caused by migratory Cu atoms, such as a defect commonly known as "red plague".
- outer portion 32 can be directly attached to and/or directly coat inner portion 30.
- Outer portion 32 can advantageously reflect light emitted from the one or more LEDs 22 thereby improving optical performance of device 10.
- Upper surfaces of thermal element 14 and electrical elements 16 and 18 can be disposed along a floor 34 of cavity 26 such that respective upper surfaces of thermal and electrical elements are disposed along the same plane and/or different planes.
- First and second electrical elements 16 and 18 can extend from one or more lateral sides of body 12 and form one or more external tab portions, generally designated 36 and 38.
- Tab portions 36 and 38 can bend to form one or more lower mounting surfaces such that device 10 can be mounted to an underlying substrate.
- Tab portions 36 and 38 can outwardly bend away from each other or inwardly bend towards each other thereby adapting either a J-bend or gull-wing orientation as known in the art.
- any configuration of external tabs 36 and 38 is contemplated.
- a filling material can be disposed and filled to any level within cavity 26 and may be partially disposed below and/or above a top surface 40 of device 10.
- filling material can comprise an encapsulant 28 that it is filled to a level flush with top surface 40 of device as shown.
- encapsulant 28 can be filled such that it forms a concave or convex surface with respect to top surface 40 of device 10 as indicated by the dotted lines.
- encapsulant 28 can be adapted for dispensing within cavity 26.
- Encapsulant 28 can comprise a selective amount of one or more phosphors adapted to emit light or combinations of light providing device 10 having a desired color point or color temperature.
- encapsulant 28 can comprise a silicone material, such as a methyl or phenyl silicone encapsulant.
- SMD type devices such as device 10, do not have secondary optics (e.g., a secondary lens) for preventing harmful chemicals or complexes from permeating the device and thereby degrading Ag or Ag- alloyed outer portions 32 of thermal and/or electrical elements.
- secondary optics e.g., a secondary lens
- encapsulant 28 can provide physical protection against foreign solids and liquids, but may not provide adequate protection against gaseous chemicals or airborne elements such as sulfur, oxygen, or moisture which can tarnish or otherwise degrade outer portion 32 where outer portion comprises Ag (e.g., pure Ag, Ag-alloys or Ag plating).
- Ag- containing components such as outer portion 32 of thermal and electrical elements 14, 16, and 18 can over time become tarnished, corroded, or otherwise degraded where the device 10 has poor chemical resistance. This can decrease the brightness of device 10.
- undesirable chemicals, vapors, or complexes C can permeate encapsulant 28 and potentially interact with outer portion 32 of elements, for example, by tarnishing such elements thereby resulting in degradation to optical, physical, electrical, and/or thermal properties such as a loss in brightness output and the noticeable darkening of surfaces along cavity floor 34.
- undesirable chemical vapors or complexes C can permeate the encapsulant 28 as indicated by the dotted trajectory lines shown in Figure 2 and could potentially adversely affect outer portion 32 if not deflected from surfaces within the device as shown.
- the current subject matter optimizes the chemical resistance of device 10 by incorporating a protective layer P serving as a protective barrier or barrier layer disposed over one or more surfaces of device 10, within device 10, and/or over components of device 10 to prevent complexes C from reaching, interacting with, and/or adversely affecting components such as Ag-containing outer portion 32 of thermal and electrical elements 14, 16, and 18.
- protective layer P can be directly disposed over outer portion 32 of elements as shown along cavity floor 34.
- Protective layer P can be applied before attaching the one or more LEDs 22 to thermal element 14 such that protective layer P can be disposed between LED 22 and outer portion 32 of thermal/electrical components or elements.
- Protective layer P can be used either alone or in combination with a phenyl silicone encapsulant for improving the chemical resistance of LED devices as described herein.
- Figures 4 to 13 illustrate various other alternative locations of protective layer P for providing protection against chemical complexes C within LED devices or packages.
- undesired chemicals, vapors, or complexes C can comprise chemical vapors containing sulfur, sulfur containing compounds (sulfides, sulfites, sulfates, SOx), chlorine or bromine containing complexes, nitric oxide or nitrogen dioxide (NO x ), and/or oxidizing organic vapor compounds.
- Complexes C can degrade the Ag components (e.g., outer portion 32 of thermal/electrical elements) and result in a loss of brightness output and noticeable darkening of surfaces within the device.
- the current subject matter can optimize the chemical resistance of device 10 and components within device 10 such that harmful vapors, chemicals, or complexes C cannot reach Ag-containing components (e.g., outer portion 32) as illustrated by the dotted trajectory of complexes C being repelled from the surface of protective layer P, thereby minimizing the damage to reflective Ag components, and further minimizing and/or totally preventing any loss in brightness from device 10 and/or darkening of components within device 10.
- Ag-containing components e.g., outer portion 32
- Protective layer P can be directly and/or indirectly disposed over vulnerable components within devices described herein, such as located directly or indirectly over Ag or Ag-alloy containing components.
- Protective layer P can be adapted for application to a variety of surfaces of components within LED devices which is advantageous.
- protective layer P can be directly applied to portions of surfaces of Ag or Ag-alloy containing components (e.g., outer portions 32 of thermal element 14 and electrical elements 16, 18) alone and/or layer P can be applied to portions of surfaces of LED chips 22 including underfills, on or over wires, wire bonds 24, wire bond balls (e.g., ball formed where wire 24 attaches to LED chip 22), and on surfaces of the LED housing or body all of which, when comprising a portion or layer of Ag over the surface, can comprise Ag-containing components.
- Protective layer P can be applied over portions of a ceramic or plastic body of LED device, for example, isolating portions 20 of body 12 ( Figure 2).
- protective layer P can be selectively applied at or parallel to any number of processing steps within the manufacturing process (e.g., before/after die attachment of LED, before/during/after encapsulation, see Figures 4 to 13) for providing broad protection against chemical vapors, such as but not limited to, nitric oxide or nitrogen dioxide (NO x ), oxidizing organic vapor compounds, sulfur, sulfur-containing compounds (e.g., sulfides, sulfates, SO x ) and chlorine- or bromine-containing complexes.
- chemical vapors such as but not limited to, nitric oxide or nitrogen dioxide (NO x )
- SO x sulfur-containing compounds
- chlorine- or bromine-containing complexes such as but not limited to, chlorine- or bromine-containing complexes.
- devices described herein can exhibit excellent chemical, including sulfur, resistance and long lasting protection against chemical complexes C as compared to conventional devices.
- improved devices such as device 10 can retain approximately 95% or more of its initial brightness value (e.g., measured in lumens) when exposed to a sulfur environment as compared to conventional devices which may only retain approximately 60% of its initial brightness value when exposed to the same sulfur environment. Depending on the level of sulfur present and severity of the environment, improved devices such as device 10 can retain approximately 100% of their initial brightness value.
- SMD type devices shown and described herein can comprise a protective barrier or protective layer P.
- Protective layer P is not limited in application or use, and can be used in devices comprising ceramic, plastic, PCB, MCPCB, or laminate substrates or submounts and can advantageously be applied over multiple surfaces, including LEDs 22 disposed within the SMDs.
- Protective layer P can at least partially comprise an inorganic material for increasing chemical resistance of the substrate.
- the inorganic material can comprise an inorganic coating, an inorganic film with an organic or silicone matrix material, and/or an inorganic oxide coating having a thickness ranging from approximately 1 nm to 100 pm.
- inorganic coating(s) can include some organic material or component in the mixture in addition to the inorganic material or component.
- Such coating(s), layer(s), and/or film(s) as used herein can be mostly inorganic, primarily SiO x in nature, however, there may generally be some organic component remaining.
- protective layer P thickness between approximately 1 nm and 100 ⁇ is also contemplated herein, for example, thicknesses ranging between approximately 1 and 10 nm; 10 nm and 50 nm; 50 nm and 200 nm; 200 nm and 400 nm; 400 and 600 nm; 600 and 800 nm; 800 nm and 1 pm; 1 pm and 5 pm; 5 pm and 10 pm; 10 pm and 50 pm; and 50 pm and 100 pm are contemplated.
- Protective layer P can also comprise a thickness ranging from approximately 1 nm to 100 nm, 100 nm to 500 nm, and 0.5 pm to 20 pm are also contemplated herein.
- a thicker protective layer P can provide superior barrier protection of Ag components against harmful chemical complexes C, thereby improving the brightness retention of LED device 10.
- Protective layer P can be applied via any suitable technique, such as, for example and without limitation, spinning on, dispensing, brushing, painting, dipping, plating, spraying, screen-printing and/or chemical or physical vapor deposition (CVD or PVD) techniques.
- CVD or PVD chemical or physical vapor deposition
- protective layer P can comprise a Si-containing inorganic oxide coating.
- protective layer P can comprise an inorganic oxide coating selected from the group consisting of, but not limited to, organosilicate glass, organosilicate solution, organosilicate dispersion, organosilicate sol-gel, Si-containing spin-on glass (SOG) materials, spin-on polymer materials, and/or spin-on dielectric materials.
- organosilicate glass organosilicate solution, organosilicate dispersion, organosilicate sol-gel, Si-containing spin-on glass (SOG) materials, spin-on polymer materials, and/or spin-on dielectric materials.
- Precursors of inorganic or inorganic oxide in solution, dispersion, sol-gel, or liquid form can be used to form protective layer P.
- SOG materials can comprise glasses selected from various product or glass families, such as the silicate family, phosphosilicate family, siloxane family, methylsiloxane family, silsesquioxane family, and dopant-containing variations of these families.
- Spin-on dielectric materials are mostly delivered in solution form known as flowable oxides. Spin-on materials can be supplied, for example, by suppliers such as Filmtronics, Inc., headquartered in Butler, PA, Desert Silicon, LLC headquartered in Glendale, AZ, or Honeywell Electronic Materials having sales offices in North America, Asia, and Europe.
- Dopant-containing SOG or spin-on dielectric materials in various delivery forms can also be used to form protective layer P.
- the application of SOG materials to components within LED devices can be optimized in terms of adopting novel application methods, curing schedules, and/or curing temperatures.
- SOG materials can be, but are not limited to application via spin-on techniques.
- novel methods of applying SOG materials can include dispensing, dipping, painting, screen printing, brushing, and spraying such materials such that they achieve the unexpected result of protecting LED components from undesirable chemical components which can permeate LED devices.
- protective layer P can, but does not have to have a uniform thickness.
- SOG materials typically need to be cured at temperatures of greater than approximately 300 °C.
- SOG materials require curing at temperatures greater than approximately 425 °C.
- LED devices can comprise bodies (e.g., body 12) that are formed from molded plastic which can melt at approximately 300 °C or less
- SOG materials can be cured via novel curing schedules including curing at temperatures that are less than approximately 300 °C such that the plastic body is not susceptible to softening and/or melting.
- protective layer P can comprise SOG materials cured at temperatures of approximately 300 °C or less such as approximately 250 °C or less, approximately 200 °C or less, approximately 150 °C or less, or approximately 100 °C or less.
- Such novel curing schedules and temperatures can unexpectedly produce films which do not crack or shrink and which can be useful for protecting the LED device and/or components within the LED device against undesirable chemical components that can permeate the encapsulant of LED devices.
- the SOG materials described herein can be chosen for use depending on the type of package body or device used (e.g., ceramic based body, molded plastic body, etc.) and optimized cure schedules/temperatures and/or application method can be considered before adopting a given material for protective layer P.
- Conventional wisdom regarding the manufacture of LED packages or devices conflicts with using SOG materials within and/or over surfaces of such devices, as SOG materials can be difficult to apply, susceptible to cracking and/or shrinking, and can require high curing temperatures.
- devices and components herein can unexpectedly incorporate SOG materials which are optimized with respect to application and/or curing techniques and adapted for use in LED devices described herein to provide excellent chemical resistance against undesired chemicals, chemical vapors, or chemical complexes which can tarnish, corrode, or adversely affect components and brightness of LED devices.
- FIGs 3 and 4 illustrate top perspective and cross-sectional views of another embodiment of an LED package or device, generally designated 50.
- LED device 50 can also be optimized for chemical resistance by incorporating a protective layer P, for example, on an external surface of device 50 and/or on internal surfaces of device ( Figure 4).
- LED device 50 can comprise an SMD type device, similar to device 10 in that a secondary optics is not used. Thus, the possibility of degradation of device components exists where undesirable chemical vapors or complexes C permeate the filling material of the device ( Figure 4).
- LED device 50 can comprise a submount 52 over which an emission area, generally designated 54, can be disposed.
- Emission area 54 can comprise one or more LEDs 22 disposed under a filling material, such as an encapsulant 58 (see Figure 4).
- emission area 54 can be substantially centrally disposed with respect to submount 52 of LED device 50. In the alternative, emission area 54 can be disposed at any location over LED device 50, for example, in a corner or adjacent an edge. Any location is contemplated, and more than one emission area 54 is also contemplated. For illustration purposes, a single, circular emission area 54 is shown; however, the number, size, shape, and/or location of emission area 54 can change subject to the discretion of LED device consumers, manufacturers, and/or designers. Emission area 54 can comprise any suitable shape such as a substantially circular, square, oval, rectangular, diamond, irregular, regular, or asymmetrical shape.
- LED device 50 can further comprise a retention material 56 at least partially disposed about emission area 54 where retention material 56 can be referred to as a dam.
- Retention material 56 can comprise any material such as a silicone, ceramic, thermoplastic, and/or thermosetting polymer material.
- retention material 56 is adapted for dispensing about emission area 54, which is advantageous as it is easy to apply and easy to obtain any desired size and/or shape.
- Submount 52 can comprise any suitable mounting substrate, for example, a printed circuit board (PCB), a metal core printed circuit board (MCPCB), an external circuit, a dielectric laminate panel, a ceramic panel, an Al panel, AIN, AI 2 O 3 , or any other suitable substrate over which lighting devices such as LEDs may mount and/or attach.
- LEDs 22 disposed in emission area 54 can electrically and/or thermally communicate with electrical elements disposed with submount 52, for example, conductive traces ( Figure 4).
- Emission area 54 can comprise a plurality of LED chips, or LEDs 22 disposed within and/or below a filling material 58 such as illustrated in Figure 4.
- LEDs 22 can comprise any suitable size and/or shape of chip and can be vertically structured (e.g., electrical contacts on opposing sides) and/or horizontally structured (e.g., contacts on the same side or surface). LEDs 22 can comprise any style of chip for example, straight cut and/or bevel cut chips, a sapphire, SiC, or GaN growth substrate or no substrate. One or more LEDs 22 can form a multi-chip array of LEDs 22 electrically connected to each other and/or electrically conductive traces in combinations of series and parallel configurations. In one aspect, LEDs 22 can be arranged in one or more strings of LEDs, where each string can comprise more than one LED electrically connected in series. Strings of LEDs 22 can be electrically connected in parallel to other strings of LEDs 22. Strings of LEDs 22 can be arranged in one or more pattern (not shown). LEDs 22 can be electrically connected to other LEDs in series, parallel, and/or combinations of series and parallel arrangements depending upon the application.
- LED device 50 can further comprise at least one opening or hole, generally designated 60, that can be disposed through or at least partially through submount 52 for facilitating attachment of LED device 50 to an external substrate, circuit, or surface.
- LED device 50 can also comprise one or more electrical attachment surfaces 62.
- attachment surfaces 62 comprise electrical contacts such as solder contacts or connectors.
- Attachment surfaces 62 can be any suitable configuration, size, shape and/or location and can comprise positive and negative electrode terminals, denoted by the "+" and/or "-" signs on respective sides of device 50, through which an electrical current or signal can pass when connected to an external power source.
- attachment surfaces 62 can comprise devices configured to clamp, crimp, or otherwise attached to external wires (not shown). Electrical current or signal can pass into LED device 50 from the external wires electrically connected to device 10 at the attachment surfaces 62. Electrical current can flow into the emission area 54 to facilitate light output from the LED chips disposed therein. Attachment surfaces 62 can electrically communicate with LEDs 22 of emission area 54 via conductive traces 64 and 66 ( Figure 4).
- attachment surfaces 62 can comprise a same layer of material as first and second conductive traces 64 and 66 ( Figure 4) and therefore can electrically communicate to LEDs 22 attached to traces 64 and 66 via electrical connectors such as wire bonds 24.
- Electrical connectors can comprise wire bonds 24 or other suitable members for electrically connecting LEDs 22 to first and second conductive traces 64 and 66 ( Figure 4).
- a filling material 58 can be disposed between inner walls of retention material 56.
- Filling material 58 can comprise an encapsulant that can include a predetermined, or selective, amount of one or more phosphors and/or lumiphors in an amount suitable for any desired light emission, for example, suitable for white light conversion or any given color temperature or color point. Alternatively, no phosphors may be included in filling material 58.
- Filling material 58 can comprise a silicon encapsulant material, such as a methyl and/or phenyl silicone material. Filling material 58 can interact with light emitted from the plurality of LEDs 22 such that a perceived white light, or any suitable and/or desirable wavelength of light, can be observed.
- Retention material 56 can be adapted for dispensing, positioning, damming, or placing, about at least a portion of emission area 54.
- filling material 58 can be selectively filled to any suitable level within the space disposed between one or more inner walls of retention material 56.
- filling material 58 can be filled to a level equal to the height of retention material 56 or to any level above or below retention material 56, for example, as indicated by the broken lines terminating at retention material 56 shown in Figure 4.
- the level of filling material 58 can be planar or curved in any suitable manner, such as concave or convex (e.g., see broken lines in Figure 4).
- Figure 4 illustrates retention material 56 dispensed or otherwise placed over submount 52 after wire bonding the one or more LEDs 22 such that retention material 56 is disposed over and at least partially covers at least a portion of the wire bonds 24.
- wire bonds 24 of the outermost edge LEDs in a given set or string of LEDs 22 can be disposed within retention material 14.
- device can contain many strings of LEDs 22 of any number, for example, less than four or more than four LEDs 22 can be electrically connected in series, parallel, and/or combinations of series and parallel arrangements.
- Strings of LEDs 22 can comprise diodes of the same and/or different colors, or wavelength bins, and different colors of phosphors can be used in the filling material 58 disposed over LEDS 22 that are the same or different colors in order to achieve emitted light of a desired color temperature or color point.
- LEDs 22 can attach to conductive pad 70 or intervening layers (e.g., layers 68 and/or protective layer P, described below) disposed between LED 22 and conductive pad 70 using any die attach technique or materials as known in art and mentioned above, for example epoxy or metal-to-metal die attach techniques and materials.
- LEDs 22 can be arranged, disposed, or mounted over an electrically and/or thermally conductive pad 70.
- Conductive pad 70 can be electrically and/or thermally conductive and can comprise any suitable electrically and/or thermally conducting material.
- conductive pad 70 comprises a layer of Cu or a Cu substrate.
- LEDs 22 can be electrically connected to first and second conductive traces 64 and 66.
- One of first and second conductive traces 64 and 66 can comprise an anode and the other a cathode.
- Conductive traces 64 and 66 can also comprise a layer of electrically conductive Cu or Cu substrate.
- conductive pad 70 and traces 64 and 66 can comprise the same Cu substrate from which traces 64 and 66 have been singulated or separated from pad 70 via etching or other removal method.
- an electrically insulating solder mask 72 can be applied such that it is at least partially disposed between conductive pad 70 and respective conductive traces 64 and 66.
- Solder mask 72 can comprise a white material for reflecting light from LED device 50.
- One or more layers of material can be disposed between LEDs 22 and conductive pad 70.
- one or more layers of material can be disposed over conductive traces 64 and 66.
- a first intervening layer or substrate of material 68 can be disposed between LEDs 22 and conductive pad 70 and disposed over traces 64 and 66.
- First layer of material 68 can comprise a layer of reflective Ag or Ag-alloy material for maximizing brightness of light emitted from LED device 50. That is, first layer of material 68 can comprise a Ag or Ag-containing substrate adapted to increase brightness of device 50.
- One or more additional layers of material can be disposed between first layer 68 and conductive pad 70 and/or first layer 68 and traces 64 and 66, for example, a layer of Ni can be disposed therebetween for providing a barrier between the Cu of pad and traces 70, 64, and 66 and the Ag of layer 68.
- a protective layer P can be at least partially disposed over and/or adjacent to Ag components within device 50, for example, over first layer 68 of material which can coat conductive pad 70 and traces 64 and 68.
- Protective layer P can provide a barrier over the Ag coated components thereby preventing such components from being physically or electrically degraded via tarnishing, oxidizing, corroding, or other degrading phenomenon caused when harmful chemical, vaporous, or atmospheric complexes C permeate filling material 58.
- protective layer P can comprise an inorganic coating or inorganic oxide coating such as a Si- containing inorganic oxide layer which can repel or prevent complexes C from reaching vulnerable components within LED device 50 as shown by the broken lines and arrows.
- protective layer P can comprise an inorganic coating or inorganic oxide coating selected from the group consisting of, but not limited to, organosilicate glass, organosilicate solution, organosilicate dispersion, organosilicate sol-gel, Si-containing spin- on glass (SOG) materials, spin-on polymer materials, and/or spin-on dielectric materials.
- Protective layer P can comprise SOG materials optimized by implementing novel application and/or curing techniques. That is, SOG materials can be, but do not have to be applied by spin-on techniques.
- SOG materials can also be applied via novel application methods such as dispensing, dipping, painting, screen printing, brushing, and spraying such materials which achieve the unexpected result of protecting LED components within device 50 from undesirable chemical components or complexes C capable of permeating LED device 50 without cracking and/or shrinking, and while maintaining good adhesion within device 50.
- SOG materials can be cured via novel curing schedules including curing at temperatures that are less than approximately 300 °C such that LED device 50 and/or components within LED device 50 (e.g., retention material 56 or encapsulant) are not damaged by the curing temperature.
- Figure 4 further illustrates a cross-section of submount 52 over which LEDs 22 can be mounted or otherwise arranged.
- Submount 52 can comprise, for example, conductive pad 70, first and second conductive traces 64 and 66, and solder mask 72 at least partially disposed between conductive pad 70 and each of conductive traces 64 and/or 66.
- Conductive traces 64, 66 and conductive pad 70 can be coated with a first layer 68, for example Ag.
- Protective layer P can be disposed over Ag as shown, or similar to any of the embodiments illustrated in Figures 5 to 13.
- Submount 52 can further comprise a dielectric layer 74, and a core layer 76. Solder mask 72 can directly adhere to portions of dielectric layer 74.
- submount 52 can comprise a MCPCB, for example, those available and manufactured by The Bergquist Company of Chanhassan, MN. Any suitable submount 52 can be used, however.
- Core layer 76 can comprise a conductive metal layer, for example copper or aluminum.
- Dielectric layer 74 can comprise an electrically insulating but thermally conductive material to assist with heat dissipation through submount 52.
- device 50 can comprise a package which does not require or use any secondary optics to keep harmful elements from degrading conductive pad 70.
- devices, components and methods disclosed herein provide for improved or optimized chemical resistance and improved chemical properties where zero or minimum loss of brightness occurs, even in the presence of harmful chemicals and can be applicable to any SMD type device or multi-array device disclosed herein. Such improvements can prevent Ag coated components from tarnishing, darkening, corroding, or otherwise degrading.
- protective layer P can least partially comprise an inorganic material for increasing chemical resistance of the substrate.
- Such inorganic material of protective layer P can comprise an inorganic coating, an inorganic film with an organic matrix material, and/or an inorganic oxide coating having a thickness ranging from approximately 1 nm to 100 pm.
- protective layer P thickness between approximately 1 nm and 100 pm is also contemplated herein, for example, thicknesses ranging between approximately 10 nm and 50 nm; 50 nm and 200 nm; 200 nm and 400 nm; 400 and 600 nm; 600 and 800 nm; 800 nm and 1 pm; 1 pm and 5 pm; 5 pm and 10 pm; 10 pm and 50 pm; and 50 pm and 100 pm are contemplated.
- Protective layer P can also comprise a thickness ranging from approximately 1 nm to 100 nm, 100 nm to 500 nm, and 0.5 pm to 20 pm are also contemplated herein.
- one or more additional processing techniques or steps can optionally be performed during manufacture of devices described herein for improving adhesion between one or more layers within the devices.
- Such optionally processing steps can be used and applied to devices previously shown and described, as well as those in Figures 5 through 13 described hereinbelow.
- such optional techniques can be performed to one or more surfaces prior to deposition or application of one or more adjacent surfaces within a device.
- surfaces or layers such as, for example and without limitation, Cu surfaces (e.g., inner portion 30 of elements 14, 16, and/or 18 of device 10 and/or surfaces of conductive pad 70, traces 64 and 66 of device 50), Ag surfaces (e.g., outer portion 32 of elements 14, 16, and/or 18 of device 10, layer of material 68 of device 50), and/or surfaces of protective layer P.
- Cu surfaces e.g., inner portion 30 of elements 14, 16, and/or 18 of device 10 and/or surfaces of conductive pad 70, traces 64 and 66 of device 50
- Ag surfaces e.g., outer portion 32 of elements 14, 16, and/or 18 of device 10, layer of material 68 of device 50
- surfaces of protective layer P e.g., one or more of these surfaces can be physically, chemically, or thermally prepared or treated to improve adhesion between the treated surface and adjacent surface(s) or adjacent layer(s).
- Optional processing steps that are physical in nature can comprise, for example and without limitation, sandblasting, plasma etching, brushing, lapping, sanding, burnishing, grinding, and/or any suitable form of surface roughening (e.g., physically texturizing the surface) to improve adhesion between one or more layers or surfaces within devices shown and described herein.
- Optional processing steps that are chemical in nature can comprise, for example and without limitation, chemical etching, applying solvents, applying organic solvents, applying acids, applying bases, vapor degreasing, priming, or any suitable chemically process for treating a surface to improve adhesion between one or more layers or surfaces within devices shown and described herein.
- Optional thermal processing steps can comprise, without limitation, prebaking, preheating, or any suitable thermal treatment that improves adhesion between one or more layers or surfaces within devices shown and described herein.
- Figures 5 to 13 are cross-sections of previously described LED device 10 which illustrate various locations or placement of protective layer P within and/or over different surfaces of device 10.
- the location of protective layer P shown and described in Figures 5 to 13 are equally applicable to device 50 ( Figures 3 and 4) as well as any other LED component or embodiment (e.g., downset see Figure 13, through-hole, TV backlighting downset component), however, for illustration purposes only device 10 has been illustrated in such numerous embodiments.
- At least one protective layer P can be used within the LED device for improving chemical resistance of the device by providing a barrier of protection against chemical complexes C ( Figures 2, 4).
- protective layer P can prevent Ag components from tarnishing, corroding, darkening and/or degrading thereby retaining brightness and optical properties of LED device even in the presence of complexes C ( Figures 2, 4).
- Figures 5 to 13 illustrate a protective coating or layer P which can be applied directly and/or indirectly over the Ag coated thermal and electrical components 14 and 16, 18 at different locations with respect to device components and/or at different stages of production of device 10.
- the placement of protective layer P can be dictated by the order of processing steps. For example, if the LED chip 22 or wire bonds 24 are installed before protective layer P is applied, protective layer P will usually coat the LED chips 22 and wire bonds as well as the Ag surface. Other processing steps may involve the masking or removal of protective layer P.
- protective layer P All processing sequences and therefore placements of protective layer P are contemplated and are not limited to such exemplary sequences and/or locations as described herein.
- Two or more protective layers for example, a first and a second protective layer, P1 and P2, respectively, can be used within device 10 for protecting against harmful chemical complexes which may permeate device 10 and degrade components of device 10 (See Figure 8).
- the number of protective layers shown herein may be limited to two, however, any suitable number of protective layers can be applied at any step in the production process and/or at any location within device 10, and such application steps and/or locations are contemplated herein.
- protective layer P can at least partially comprise inorganic material such as an inorganic coating, an inorganic film with an organic matrix material, and/or an inorganic oxide coating having a thickness ranging from approximately 1 nm to 100 pm. Any sub-range of thickness between approximately 1 nm and 100 pm is contemplated.
- Protective layer P can be delivered and/or applied in any form to device 10, such as but not limited to application of a solution, dispersion, sol-gel, SOG material (e.g., in solution form), spin-on polymer material, spin-on dielectric material (e.g., as a flowable oxide) or combinations thereof.
- Protection layer P can provide protection against undesired chemicals, chemical vapors, and chemical complexes C ( Figures 2, 4) serving as an anti-oxidation, anti-corrosion layer over Ag and Cu, and substrates containing such metals.
- protective layer P can be applied, deposited, or otherwise disposed over electrical and thermal elements 16, 18, and 14 before the processing step of molding the device body 12 about the leadframe components. That is, protective layer P can extend to a location at least partially within a portion of the molded plastic body 12 such that it contacts one or more surfaces of body 12. In one aspect, protective layer P can be disposed between one or more portions of body 12 as illustrated. Protective layer P can also be disposed between LED 22 and outer portion 32 of thermal element 14. As previously described, outer portion 32 can comprise a layer of Ag (or Ag-alloy coating or plating) over which protective layer P can provide a protective barrier for protecting against complexes which can tarnish, oxidize, or corrode the Ag.
- Ag Ag-alloy coating or plating
- Protective layer P can retain optical properties (e.g., brightness) of device 10 despite exposure to undesired chemical complexes which may permeate the device.
- Protective layer P may also optionally be applied such that it fully extends over floor 34 of cavity 26 and within portions of body 12 such that layer P extends over isolating portions 20 of body as well as Ag coated components (e.g., over outer portions 32 of elements 14, 16, and 18).
- Figure 6 illustrates an embodiment of device 10 where protective layer P has been deposited after the processing step of molding the body 12, but prior to the LED die attach step, wire bonding step, and/or application of encapsulant 28 step.
- protective layer P can extend to a location within device 10 that is below LED 22 and along at least a portion of cavity floor 34.
- Protective layer P can extend between upper surfaces of thermal element 14 and LED 22.
- protective layer P can be disposed over the entire surface of cavity floor 34, thus, disposed over surfaces of each of thermal and electrical elements 14, 16, and 18 and isolating portions 20 of body 12.
- protective layer P can optionally extend along one or more side walls of reflector cavity 26 as indicated.
- additional processing steps such as masking and/or etching protective layer P may be employed and are contemplated herein.
- Figure 7 illustrates an embodiment of device 10 where protective layer P can be applied after the processing step of wire bonding but before the processing step of application of encapsulant 28.
- protective layer P can at least partially coat surfaces of wire bonds 24, LED 22, walls of cavity 26, cavity floor 34, and surfaces of thermal element 14 and electrical elements 16 and 18 (e.g., outer portions 32 of elements 14, 16, and 18).
- Figure 8 illustrates an embodiment where more than one protective layer can be applied, for example, a first protective layer P1 and a second protective layer P2.
- First and second protective layers P1 and P2 can be applied at any processing step during production of LED device 10 (and/or device 50), thereby assuming the placement illustrated and described in any of Figures 2, 4, and 5 to 13 (e.g., the only difference being application of more than one protective layer P).
- Each of first and second protective layers P1 and P2 can comprise inorganic material incorporated into an inorganic coating, inorganic oxide coating, or Si-containing coating as previously described.
- Protective layers P1 and P2 can comprise any thickness ranging from approximately 1 nm to 100 pm.
- First and second layers P1 and P2 can be applied as shown over outer portions 32 of thermal and electrical elements 14, 16, and 18 before die attaching LED 22. First and second layers P1 and P2 can optionally extend up side walls of reflector cavity 26 as shown.
- Figure 9 illustrates another embodiment of device 10, where protective layer P has been applied after the processing step of die attach but before the step of applying encapsulant 28. That is, protective layer P can be located such that it extends about the side and upper surfaces of LED 22, and over portions of wire bond 24, where wire bond 24 attaches to LED 22 (e.g., at wire bond ball). Protective layer P can also be disposed entirely over floor 34 of cavity over outer portions 32 of elements 14, 16, and 18 as well as isolating portions 20 of body 12. Protective layer P can optionally extend up side walls of cavity 26. Notably, protective layer P can, but does not need to comprise a uniform thickness. For example, wetting properties of layer P tend to create thicker areas, or fillets around features within LED device 10. For example, layer P may be thicker in areas T surrounding LED 22 as indicated. Thinner areas of protective layer P are also contemplated.
- Figure 10 illustrates an embodiment of device 10 where protective layer P has been applied after die attachment of LED 22 but prior to application of encapsulant 28.
- protective layer P can be located and applied subsequently over a first layer 80.
- First layer 80 can comprise any type of coating or layer, for example, an adhesion coating or layer, a light-affecting coating or layer, or another protective barrier coating or layer such as an inorganic coating or oxide.
- first layer 80 comprises a layer of light-affecting material such as a layer of encapsulant containing phosphor material that emits light of a desired color point when activated by light from the LED 22.
- First layer 80 can be disposed between portions of LED 22 and protective layer P, between outer portions 32 of elements 14, 16, and 18 and protective layer P, and/or between isolating portions 20 of body 12 and protective layer P.
- LED chip 22 can comprise a horizontally structured (i.e., both contacts on the same side, a bottom side) chip that is directly attached (e.g., no wire bonds) to electrical elements 16 and 18. That is, electrical contacts or bond pads (not shown) disposed on a bottom surface of LED 22 could directly attach to electrical elements 16 and 18 via electrically conductive die attach adhesive (e.g., silicone, epoxy, or conductive silver (Ag) epoxy) such that the electrical contacts of LED 22 electrically communicate directly to elements 16 and 18 without the need for wire bonds 24.
- First layer 80 can then be applied over LED 22 and can comprise a layer of encapsulant containing phosphor.
- Protective layer P can then be applied over each of LED chip 22 and first layer 80 as indicated.
- Figures 11 and 2 illustrate further embodiments of device 10, where protective layer P has been applied after and/or during the processing step of application (e.g., dispensing) of encapsulant 28.
- protective layer P can be disposed over an upper surface of encapsulant 28.
- Protective layer P can optionally extend over external surfaces of device 10, for example, over top surface 40 of body 12.
- Protective layer P can be disposed at a location such that complexes C ( Figure 2) can be repelled before permeating any portion of encapsulant 28.
- Figure 12 illustrates protective layer P applied during the processing step of application of encapsulant 28.
- protective layer P can be disposed between portions of encapsulant 28, such that undesirable complexes C ( Figure 2) can be prevented from reaching Ag coated components (e.g., outer portion 32 of elements 14, 16, and 18) thereby preventing any potential damage, corrosion, or darkening that may occur to the Ag components. That is, protective layer P can be disposed between layers or portions of encapsulant 28 or between two or more separate encapsulation steps. This can advantageously allow device 10 to incur approximately zero, or minimal, brightness loss during operation, even in the presence of harmful chemicals, chemical vapors, oxygen, or moisture.
- Figure 13 illustrates a further embodiment of device 10.
- Device 10 can comprise two electrical elements 16 and 18 to which LED 22 can electrically connect. Tab portions 36 and 38 can bend inwardly towards each other thereby adapting either a J-bend.
- LED 22 can comprise a vertically structured device with a first electrical contact or bond pad on a bottom surface and a second electrical contact or bond pad on the opposing top surface.
- the first electrical contact can electrically and physically connect with first electrical element 16 via a die attach adhesive (e.g., silicone, flux, solder, epoxy, etc.) and second electrical contact can electrically and physically connect to second electrical element 18 via wire bond 24.
- a die attach adhesive e.g., silicone, flux, solder, epoxy, etc.
- LED device 10 comprises a downset or recessed type of package where LED 22 and/or at least a first electrical element can be on a different plane than other components of the LED package or device (e.g., on a different plane from second electrical element 18).
- protective layer P can be applied in any of the locations shown in Figures 5-12. For illustrations purposes, protective layer P is shown as applied before attaching and wire bonding LED 22. However, any suitable sequence for placing and/or location of protective layer P is contemplated, for example, along one or more sidewalls of device 10 and/or applied in combination with other layers.
- Protective layer P can be applied such that it is disposed over a portion of body 12 (e.g., between 16 and 18) and can be subsequently removed as shown via optional masking and/or etching steps if desired.
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Cited By (7)
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---|---|---|---|---|
US9240530B2 (en) | 2012-02-13 | 2016-01-19 | Cree, Inc. | Light emitter devices having improved chemical and physical resistance and related methods |
US9343441B2 (en) | 2012-02-13 | 2016-05-17 | Cree, Inc. | Light emitter devices having improved light output and related methods |
US9496466B2 (en) | 2011-12-06 | 2016-11-15 | Cree, Inc. | Light emitter devices and methods, utilizing light emitting diodes (LEDs), for improved light extraction |
US10008637B2 (en) | 2011-12-06 | 2018-06-26 | Cree, Inc. | Light emitter devices and methods with reduced dimensions and improved light output |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012080085A (ja) * | 2010-09-10 | 2012-04-19 | Nichia Chem Ind Ltd | 支持体及びそれを用いた発光装置 |
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US9590155B2 (en) * | 2012-06-06 | 2017-03-07 | Cree, Inc. | Light emitting devices and substrates with improved plating |
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KR102188500B1 (ko) | 2014-07-28 | 2020-12-09 | 삼성전자주식회사 | 발광다이오드 패키지 및 이를 이용한 조명장치 |
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WO2016194405A1 (ja) | 2015-05-29 | 2016-12-08 | シチズン電子株式会社 | 発光装置およびその製造方法 |
US20160379854A1 (en) * | 2015-06-29 | 2016-12-29 | Varian Semiconductor Equipment Associates, Inc. | Vacuum Compatible LED Substrate Heater |
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US11459613B2 (en) | 2015-09-11 | 2022-10-04 | The Brigham And Women's Hospital, Inc. | Methods of characterizing resistance to modulators of Cereblon |
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DE102018119444A1 (de) * | 2018-08-09 | 2020-02-13 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement mit multifunktionalerAbdeckschicht und entsprechendes Herstellungsverfahren |
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US20200243735A1 (en) * | 2019-01-29 | 2020-07-30 | Prilit Optronics, Inc. | Microled display and a method of forming the same |
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CN112786759A (zh) * | 2019-11-08 | 2021-05-11 | 宁波安芯美半导体有限公司 | 发光二极管基板、制备方法及发光二极管灯泡 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009170825A (ja) * | 2008-01-19 | 2009-07-30 | Nichia Corp | 発光装置及びその製造方法 |
KR20100079970A (ko) * | 2008-12-31 | 2010-07-08 | 서울반도체 주식회사 | 광원 패키지 |
KR20100086955A (ko) * | 2009-01-23 | 2010-08-02 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 프라이머 조성물 및 그것을 이용한 광 반도체 장치 |
US20110031513A1 (en) * | 2009-08-04 | 2011-02-10 | Advanced Optoelectronic Technology, Inc. | Waterproof smd led module and method of manufacturing the same |
US20110204398A1 (en) * | 2010-02-19 | 2011-08-25 | Asahi Glass Company, Limited | Substrate for mounting light-emitting element and light-emitting device |
Family Cites Families (218)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3288728A (en) | 1966-02-18 | 1966-11-29 | Union Carbide Corp | Para-xylylene copolymers |
US3609475A (en) * | 1970-05-04 | 1971-09-28 | Hewlett Packard Co | Light-emitting diode package with dual-colored plastic encapsulation |
JPS48102585A (zh) | 1972-04-04 | 1973-12-22 | ||
JPS5867077A (ja) | 1981-10-19 | 1983-04-21 | Toshiba Corp | 半導体装置用リ−ドフレ−ムの製造方法 |
USH445H (en) | 1985-11-29 | 1988-03-01 | American Telephone and Telegraph Company, AT&T Technologies, Incorporated | Method of forming light emitting device with direct contact lens |
US4866005A (en) | 1987-10-26 | 1989-09-12 | North Carolina State University | Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide |
US5027168A (en) | 1988-12-14 | 1991-06-25 | Cree Research, Inc. | Blue light emitting diode formed in silicon carbide |
US4918497A (en) | 1988-12-14 | 1990-04-17 | Cree Research, Inc. | Blue light emitting diode formed in silicon carbide |
US4966862A (en) | 1989-08-28 | 1990-10-30 | Cree Research, Inc. | Method of production of light emitting diodes |
US4946547A (en) | 1989-10-13 | 1990-08-07 | Cree Research, Inc. | Method of preparing silicon carbide surfaces for crystal growth |
US5210051A (en) | 1990-03-27 | 1993-05-11 | Cree Research, Inc. | High efficiency light emitting diodes from bipolar gallium nitride |
US5200022A (en) | 1990-10-03 | 1993-04-06 | Cree Research, Inc. | Method of improving mechanically prepared substrate surfaces of alpha silicon carbide for deposition of beta silicon carbide thereon and resulting product |
US5359345A (en) | 1992-08-05 | 1994-10-25 | Cree Research, Inc. | Shuttered and cycled light emitting diode display and method of producing the same |
US5416342A (en) | 1993-06-23 | 1995-05-16 | Cree Research, Inc. | Blue light-emitting diode with high external quantum efficiency |
US5338944A (en) | 1993-09-22 | 1994-08-16 | Cree Research, Inc. | Blue light-emitting diode with degenerate junction structure |
US5393993A (en) | 1993-12-13 | 1995-02-28 | Cree Research, Inc. | Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices |
US5604135A (en) | 1994-08-12 | 1997-02-18 | Cree Research, Inc. | Method of forming green light emitting diode in silicon carbide |
US5523589A (en) | 1994-09-20 | 1996-06-04 | Cree Research, Inc. | Vertical geometry light emitting diode with group III nitride active layer and extended lifetime |
US5631190A (en) | 1994-10-07 | 1997-05-20 | Cree Research, Inc. | Method for producing high efficiency light-emitting diodes and resulting diode structures |
EP0740184A3 (en) * | 1995-04-28 | 1998-07-29 | Canon Kabushiki Kaisha | Liquid crystal device, process for producing same and liquid crystal apparatus |
US5739554A (en) | 1995-05-08 | 1998-04-14 | Cree Research, Inc. | Double heterojunction light emitting diode with gallium nitride active layer |
US6600175B1 (en) | 1996-03-26 | 2003-07-29 | Advanced Technology Materials, Inc. | Solid state white light emitter and display using same |
KR100629544B1 (ko) | 1996-06-26 | 2006-09-27 | 오스람 게젤샤프트 미트 베쉬랭크터 하프퉁 | 발광 변환 소자를 포함하는 발광 반도체 소자 |
EP0910931B1 (en) * | 1996-07-10 | 2001-09-19 | International Business Machines Corporation | Siloxane and siloxane derivatives as encapsulants for organic light emitting devices |
US20020008799A1 (en) * | 2000-07-10 | 2002-01-24 | Hitachi, Ltd. | Liquid crystal display unit |
DE19861398B4 (de) | 1997-10-03 | 2010-12-09 | Rohm Co. Ltd., Kyoto | Licht abstrahlende Halbleitervorrichtung |
US6201262B1 (en) | 1997-10-07 | 2001-03-13 | Cree, Inc. | Group III nitride photonic devices on silicon carbide substrates with conductive buffer interlay structure |
US6252254B1 (en) | 1998-02-06 | 2001-06-26 | General Electric Company | Light emitting device with phosphor composition |
US5959316A (en) | 1998-09-01 | 1999-09-28 | Hewlett-Packard Company | Multiple encapsulation of phosphor-LED devices |
US6696703B2 (en) | 1999-09-27 | 2004-02-24 | Lumileds Lighting U.S., Llc | Thin film phosphor-converted light emitting diode device |
US6350041B1 (en) | 1999-12-03 | 2002-02-26 | Cree Lighting Company | High output radial dispersing lamp using a solid state light source |
US6514782B1 (en) * | 1999-12-22 | 2003-02-04 | Lumileds Lighting, U.S., Llc | Method of making a III-nitride light-emitting device with increased light generating capability |
JP2001291406A (ja) | 2000-04-07 | 2001-10-19 | Yamada Shomei Kk | 照明灯 |
DE10033502A1 (de) | 2000-07-10 | 2002-01-31 | Osram Opto Semiconductors Gmbh | Optoelektronisches Modul, Verfahren zu dessen Herstellung und dessen Verwendung |
JP2002050797A (ja) | 2000-07-31 | 2002-02-15 | Toshiba Corp | 半導体励起蛍光体発光装置およびその製造方法 |
AT410266B (de) | 2000-12-28 | 2003-03-25 | Tridonic Optoelectronics Gmbh | Lichtquelle mit einem lichtemittierenden element |
US6791119B2 (en) | 2001-02-01 | 2004-09-14 | Cree, Inc. | Light emitting diodes including modifications for light extraction |
US6949771B2 (en) * | 2001-04-25 | 2005-09-27 | Agilent Technologies, Inc. | Light source |
US6958497B2 (en) | 2001-05-30 | 2005-10-25 | Cree, Inc. | Group III nitride based light emitting diode structures with a quantum well and superlattice, group III nitride based quantum well structures and group III nitride based superlattice structures |
JP4789350B2 (ja) | 2001-06-11 | 2011-10-12 | シチズン電子株式会社 | 発光ダイオードの製造方法 |
JP3905343B2 (ja) | 2001-10-09 | 2007-04-18 | シチズン電子株式会社 | 発光ダイオード |
JP2003243704A (ja) | 2002-02-07 | 2003-08-29 | Lumileds Lighting Us Llc | 発光半導体デバイス及び方法 |
US20060191215A1 (en) * | 2002-03-22 | 2006-08-31 | Stark David H | Insulated glazing units and methods |
AU2003222058A1 (en) | 2002-03-22 | 2003-10-13 | The Government Of The United States Of America, Asrepresented By The Secretary, Department Of Health | Materials and methods for inhibiting wip-1 |
US7832177B2 (en) * | 2002-03-22 | 2010-11-16 | Electronics Packaging Solutions, Inc. | Insulated glazing units |
JP4226835B2 (ja) | 2002-03-29 | 2009-02-18 | 三星エスディアイ株式会社 | 発光素子、その製造方法およびこれを用いた表示装置 |
US7380961B2 (en) * | 2002-04-24 | 2008-06-03 | Moriyama Sangyo Kabushiki Kaisha | Light source coupler, illuminant device, patterned conductor, and method for manufacturing light source coupler |
JP4046118B2 (ja) | 2002-05-28 | 2008-02-13 | 松下電工株式会社 | 発光素子、それを用いた発光装置及び面発光照明装置 |
US7244965B2 (en) | 2002-09-04 | 2007-07-17 | Cree Inc, | Power surface mount light emitting die package |
AU2003276867A1 (en) | 2002-09-19 | 2004-04-08 | Cree, Inc. | Phosphor-coated light emitting diodes including tapered sidewalls, and fabrication methods therefor |
DE10245930A1 (de) | 2002-09-30 | 2004-04-08 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Bauelement-Modul |
US6717353B1 (en) | 2002-10-14 | 2004-04-06 | Lumileds Lighting U.S., Llc | Phosphor converted light emitting device |
US6936857B2 (en) | 2003-02-18 | 2005-08-30 | Gelcore, Llc | White light LED device |
KR20110137403A (ko) | 2003-02-26 | 2011-12-22 | 크리, 인코포레이티드 | 복합 백색 광원 및 그 제조 방법 |
JP4303550B2 (ja) | 2003-09-30 | 2009-07-29 | 豊田合成株式会社 | 発光装置 |
US7087936B2 (en) | 2003-04-30 | 2006-08-08 | Cree, Inc. | Methods of forming light-emitting devices having an antireflective layer that has a graded index of refraction |
US7005679B2 (en) | 2003-05-01 | 2006-02-28 | Cree, Inc. | Multiple component solid state white light |
US7157745B2 (en) * | 2004-04-09 | 2007-01-02 | Blonder Greg E | Illumination devices comprising white light emitting diodes and diode arrays and method and apparatus for making them |
EP1496551B1 (en) | 2003-07-09 | 2013-08-21 | Nichia Corporation | Light emitting diode, method of manufacturing the same and lighting equipment incorporating the same |
TWI264199B (en) | 2003-09-03 | 2006-10-11 | Chunghwa Telecom Co Ltd | Real-time optical-power monitoring system for Gigabit Ethernet |
JP4140042B2 (ja) | 2003-09-17 | 2008-08-27 | スタンレー電気株式会社 | 蛍光体を用いたled光源装置及びled光源装置を用いた車両前照灯 |
EP1529794A1 (en) | 2003-10-22 | 2005-05-11 | Interuniversitair Microelektronica Centrum Vzw | Method of preparing derivatives of polyarylene vinylene and method of preparing an electronic device including same |
US7095056B2 (en) | 2003-12-10 | 2006-08-22 | Sensor Electronic Technology, Inc. | White light emitting device and method |
JP2005252219A (ja) | 2004-02-06 | 2005-09-15 | Toyoda Gosei Co Ltd | 発光装置及び封止部材 |
US7250715B2 (en) | 2004-02-23 | 2007-07-31 | Philips Lumileds Lighting Company, Llc | Wavelength converted semiconductor light emitting devices |
TWI257184B (en) | 2004-03-24 | 2006-06-21 | Toshiba Lighting & Technology | Lighting apparatus |
US7868343B2 (en) | 2004-04-06 | 2011-01-11 | Cree, Inc. | Light-emitting devices having multiple encapsulation layers with at least one of the encapsulation layers including nanoparticles and methods of forming the same |
US7791061B2 (en) | 2004-05-18 | 2010-09-07 | Cree, Inc. | External extraction light emitting diode based upon crystallographic faceted surfaces |
US7456499B2 (en) | 2004-06-04 | 2008-11-25 | Cree, Inc. | Power light emitting die package with reflecting lens and the method of making the same |
TW200614548A (en) | 2004-07-09 | 2006-05-01 | Matsushita Electric Ind Co Ltd | Light-emitting device |
US7842526B2 (en) | 2004-09-09 | 2010-11-30 | Toyoda Gosei Co., Ltd. | Light emitting device and method of producing same |
JP5192811B2 (ja) | 2004-09-10 | 2013-05-08 | ソウル セミコンダクター カンパニー リミテッド | 多重モールド樹脂を有する発光ダイオードパッケージ |
US8134292B2 (en) | 2004-10-29 | 2012-03-13 | Ledengin, Inc. | Light emitting device with a thermal insulating and refractive index matching material |
US7772609B2 (en) * | 2004-10-29 | 2010-08-10 | Ledengin, Inc. (Cayman) | LED package with structure and materials for high heat dissipation |
JP2006135225A (ja) | 2004-11-09 | 2006-05-25 | Toshiba Corp | 発光装置 |
US7344902B2 (en) | 2004-11-15 | 2008-03-18 | Philips Lumileds Lighting Company, Llc | Overmolded lens over LED die |
US7452737B2 (en) | 2004-11-15 | 2008-11-18 | Philips Lumileds Lighting Company, Llc | Molded lens over LED die |
JP2006156668A (ja) | 2004-11-29 | 2006-06-15 | Nichia Chem Ind Ltd | 発光装置及びその製造方法 |
US20060124953A1 (en) | 2004-12-14 | 2006-06-15 | Negley Gerald H | Semiconductor light emitting device mounting substrates and packages including cavities and cover plates, and methods of packaging same |
JP2006179511A (ja) | 2004-12-20 | 2006-07-06 | Sumitomo Electric Ind Ltd | 発光装置 |
KR101114305B1 (ko) * | 2004-12-24 | 2012-03-08 | 쿄세라 코포레이션 | 발광 장치 및 조명 장치 |
TWI239671B (en) | 2004-12-30 | 2005-09-11 | Ind Tech Res Inst | LED applied with omnidirectional reflector |
US9793247B2 (en) | 2005-01-10 | 2017-10-17 | Cree, Inc. | Solid state lighting component |
US7821023B2 (en) * | 2005-01-10 | 2010-10-26 | Cree, Inc. | Solid state lighting component |
US9070850B2 (en) | 2007-10-31 | 2015-06-30 | Cree, Inc. | Light emitting diode package and method for fabricating same |
US7564180B2 (en) | 2005-01-10 | 2009-07-21 | Cree, Inc. | Light emission device and method utilizing multiple emitters and multiple phosphors |
US8125137B2 (en) | 2005-01-10 | 2012-02-28 | Cree, Inc. | Multi-chip light emitting device lamps for providing high-CRI warm white light and light fixtures including the same |
US7221044B2 (en) * | 2005-01-21 | 2007-05-22 | Ac Led Lighting, L.L.C. | Heterogeneous integrated high voltage DC/AC light emitter |
KR100619069B1 (ko) | 2005-02-16 | 2006-08-31 | 삼성전자주식회사 | 멀티칩 발광 다이오드 유닛, 이를 채용한 백라이트 유닛 및액정 표시 장치 |
TWI521748B (zh) | 2005-02-18 | 2016-02-11 | 日亞化學工業股份有限公司 | 具備控制配光特性用之透鏡之發光裝置 |
JP4679183B2 (ja) | 2005-03-07 | 2011-04-27 | シチズン電子株式会社 | 発光装置及び照明装置 |
JP4653671B2 (ja) | 2005-03-14 | 2011-03-16 | 株式会社東芝 | 発光装置 |
US20060221272A1 (en) | 2005-04-04 | 2006-10-05 | Negley Gerald H | Light emitting diode backlighting systems and methods that use more colors than display picture elements |
JP2007049114A (ja) | 2005-05-30 | 2007-02-22 | Sharp Corp | 発光装置とその製造方法 |
KR100665219B1 (ko) | 2005-07-14 | 2007-01-09 | 삼성전기주식회사 | 파장변환형 발광다이오드 패키지 |
US7646035B2 (en) | 2006-05-31 | 2010-01-12 | Cree, Inc. | Packaged light emitting devices including multiple index lenses and multiple index lenses for packaged light emitting devices |
US8563339B2 (en) | 2005-08-25 | 2013-10-22 | Cree, Inc. | System for and method for closed loop electrophoretic deposition of phosphor materials on semiconductor devices |
DE102005041064B4 (de) | 2005-08-30 | 2023-01-19 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Oberflächenmontierbares optoelektronisches Bauelement und Verfahren zu dessen Herstellung |
US7550319B2 (en) * | 2005-09-01 | 2009-06-23 | E. I. Du Pont De Nemours And Company | Low temperature co-fired ceramic (LTCC) tape compositions, light emitting diode (LED) modules, lighting devices and method of forming thereof |
JP2007204730A (ja) | 2005-09-06 | 2007-08-16 | Sharp Corp | 蛍光体及び発光装置 |
JP5219331B2 (ja) | 2005-09-13 | 2013-06-26 | 株式会社住田光学ガラス | 固体素子デバイスの製造方法 |
CN103925521A (zh) | 2005-12-21 | 2014-07-16 | 科锐公司 | 照明装置 |
US7213940B1 (en) | 2005-12-21 | 2007-05-08 | Led Lighting Fixtures, Inc. | Lighting device and lighting method |
WO2007084640A2 (en) | 2006-01-20 | 2007-07-26 | Cree Led Lighting Solutions, Inc. | Shifting spectral content in solid state light emitters by spatially separating lumiphor films |
KR100826426B1 (ko) | 2006-02-22 | 2008-04-29 | 삼성전기주식회사 | 발광다이오드 패키지 |
JP2007266343A (ja) | 2006-03-29 | 2007-10-11 | Toyoda Gosei Co Ltd | 発光装置 |
US8969908B2 (en) | 2006-04-04 | 2015-03-03 | Cree, Inc. | Uniform emission LED package |
JP2007281146A (ja) | 2006-04-05 | 2007-10-25 | Sharp Corp | 半導体発光装置 |
KR20090005194A (ko) * | 2006-04-18 | 2009-01-12 | 라미나 라이팅, 인크. | 피제어 색 혼합용 광 디바이스 |
US7655957B2 (en) | 2006-04-27 | 2010-02-02 | Cree, Inc. | Submounts for semiconductor light emitting device packages and semiconductor light emitting device packages including the same |
JP5233087B2 (ja) | 2006-06-28 | 2013-07-10 | 日亜化学工業株式会社 | 発光装置およびその製造方法、パッケージ、発光素子実装用の基板 |
KR100705552B1 (ko) | 2006-06-30 | 2007-04-09 | 서울반도체 주식회사 | 발광 다이오드 |
US7960819B2 (en) | 2006-07-13 | 2011-06-14 | Cree, Inc. | Leadframe-based packages for solid state emitting devices |
US8044418B2 (en) | 2006-07-13 | 2011-10-25 | Cree, Inc. | Leadframe-based packages for solid state light emitting devices |
JP5205724B2 (ja) * | 2006-08-04 | 2013-06-05 | 日亜化学工業株式会社 | 発光装置 |
CN101506969B (zh) | 2006-08-22 | 2011-08-31 | 三菱化学株式会社 | 半导体器件用部材、以及半导体器件用部材形成液和半导体器件用部材的制造方法、以及使用该方法制造的半导体器件用部材形成液、荧光体组合物、半导体发光器件、照明装置和图像显示装置 |
KR100835063B1 (ko) | 2006-10-02 | 2008-06-03 | 삼성전기주식회사 | Led를 이용한 면광원 발광장치 |
TWI496315B (zh) | 2006-11-13 | 2015-08-11 | Cree Inc | 照明裝置、被照明的殼體及照明方法 |
US8174187B2 (en) | 2007-01-15 | 2012-05-08 | Global Oled Technology Llc | Light-emitting device having improved light output |
JP5102051B2 (ja) | 2007-01-18 | 2012-12-19 | シチズン電子株式会社 | 半導体発光装置 |
US9159888B2 (en) | 2007-01-22 | 2015-10-13 | Cree, Inc. | Wafer level phosphor coating method and devices fabricated utilizing method |
US9024349B2 (en) | 2007-01-22 | 2015-05-05 | Cree, Inc. | Wafer level phosphor coating method and devices fabricated utilizing method |
US7709853B2 (en) | 2007-02-12 | 2010-05-04 | Cree, Inc. | Packaged semiconductor light emitting devices having multiple optical elements |
US7952544B2 (en) | 2007-02-15 | 2011-05-31 | Cree, Inc. | Partially filterless liquid crystal display devices and methods of operating the same |
EP2120271A4 (en) | 2007-03-01 | 2015-03-25 | Nec Lighting Ltd | LED ARRANGEMENT AND LIGHTING DEVICE |
WO2008111504A1 (ja) | 2007-03-12 | 2008-09-18 | Nichia Corporation | 高出力発光装置及びそれに用いるパッケージ |
US7638811B2 (en) | 2007-03-13 | 2009-12-29 | Cree, Inc. | Graded dielectric layer |
JP4276684B2 (ja) | 2007-03-27 | 2009-06-10 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
US20080258130A1 (en) | 2007-04-23 | 2008-10-23 | Bergmann Michael J | Beveled LED Chip with Transparent Substrate |
US7843060B2 (en) | 2007-06-11 | 2010-11-30 | Cree, Inc. | Droop-free high output light emitting devices and methods of fabricating and operating same |
US7999283B2 (en) | 2007-06-14 | 2011-08-16 | Cree, Inc. | Encapsulant with scatterer to tailor spatial emission pattern and color uniformity in light emitting diodes |
US7967476B2 (en) | 2007-07-04 | 2011-06-28 | Nichia Corporation | Light emitting device including protective glass film |
JP5630948B2 (ja) | 2007-07-04 | 2014-11-26 | 日亜化学工業株式会社 | 発光装置 |
US20090039375A1 (en) | 2007-08-07 | 2009-02-12 | Cree, Inc. | Semiconductor light emitting devices with separated wavelength conversion materials and methods of forming the same |
JP5578597B2 (ja) * | 2007-09-03 | 2014-08-27 | 独立行政法人物質・材料研究機構 | 蛍光体及びその製造方法、並びにそれを用いた発光装置 |
US20090065792A1 (en) | 2007-09-07 | 2009-03-12 | 3M Innovative Properties Company | Method of making an led device having a dome lens |
US7802901B2 (en) | 2007-09-25 | 2010-09-28 | Cree, Inc. | LED multi-chip lighting units and related methods |
CN101821544B (zh) | 2007-10-10 | 2012-11-28 | 科锐公司 | 照明装置及制造方法 |
US8866169B2 (en) | 2007-10-31 | 2014-10-21 | Cree, Inc. | LED package with increased feature sizes |
US9754926B2 (en) | 2011-01-31 | 2017-09-05 | Cree, Inc. | Light emitting diode (LED) arrays including direct die attach and related assemblies |
US9640737B2 (en) | 2011-01-31 | 2017-05-02 | Cree, Inc. | Horizontal light emitting diodes including phosphor particles |
EP2221885A4 (en) | 2007-11-19 | 2013-09-25 | Panasonic Corp | SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE |
JP2010074117A (ja) | 2007-12-07 | 2010-04-02 | Panasonic Electric Works Co Ltd | 発光装置 |
US8940561B2 (en) | 2008-01-15 | 2015-01-27 | Cree, Inc. | Systems and methods for application of optical materials to optical elements |
US8058088B2 (en) | 2008-01-15 | 2011-11-15 | Cree, Inc. | Phosphor coating systems and methods for light emitting structures and packaged light emitting diodes including phosphor coating |
US10008637B2 (en) | 2011-12-06 | 2018-06-26 | Cree, Inc. | Light emitter devices and methods with reduced dimensions and improved light output |
JP5349811B2 (ja) | 2008-02-06 | 2013-11-20 | シャープ株式会社 | 半導体発光装置 |
RU2508616C2 (ru) | 2008-02-27 | 2014-02-27 | Конинклейке Филипс Электроникс Н.В. | Осветительное устройство с сид и одним или более пропускающими окнами |
JP2009224536A (ja) | 2008-03-17 | 2009-10-01 | Citizen Holdings Co Ltd | Ledデバイスおよびその製造方法 |
US8637883B2 (en) | 2008-03-19 | 2014-01-28 | Cree, Inc. | Low index spacer layer in LED devices |
US7534635B1 (en) | 2008-03-24 | 2009-05-19 | General Electric Company | Getter precursors for hermetically sealed packaging |
JP5136963B2 (ja) * | 2008-03-24 | 2013-02-06 | 信越化学工業株式会社 | 硬化性シリコーンゴム組成物及び半導体装置 |
US7948076B2 (en) * | 2008-03-25 | 2011-05-24 | Bridge Semiconductor Corporation | Semiconductor chip assembly with post/base heat spreader and vertical signal routing |
KR101046079B1 (ko) | 2008-04-03 | 2011-07-01 | 삼성엘이디 주식회사 | Led 소자 및 이를 이용한 led 조명기구 |
WO2009148543A2 (en) * | 2008-05-29 | 2009-12-10 | Cree, Inc. | Light source with near field mixing |
JP5345363B2 (ja) | 2008-06-24 | 2013-11-20 | シャープ株式会社 | 発光装置 |
JP5289835B2 (ja) | 2008-06-25 | 2013-09-11 | シャープ株式会社 | 発光装置およびその製造方法 |
JP5195084B2 (ja) | 2008-06-30 | 2013-05-08 | Jsr株式会社 | 金属表面用コート材および発光装置、並びに金属表面保護方法 |
JP5245614B2 (ja) | 2008-07-29 | 2013-07-24 | 豊田合成株式会社 | 発光装置 |
US20100025699A1 (en) | 2008-07-30 | 2010-02-04 | Lustrous International Technology Ltd. | Light emitting diode chip package |
CA2733765C (en) | 2008-08-18 | 2017-03-28 | Semblant Global Limited | Halo-hydrocarbon polymer coating |
JP5025612B2 (ja) | 2008-10-06 | 2012-09-12 | 三菱電機株式会社 | Led光源及びそれを用いた発光体 |
US9425172B2 (en) * | 2008-10-24 | 2016-08-23 | Cree, Inc. | Light emitter array |
JP2010103404A (ja) | 2008-10-27 | 2010-05-06 | Sanyo Electric Co Ltd | 照明装置 |
US8288785B2 (en) | 2008-12-03 | 2012-10-16 | Seoul Semiconductor Co., Ltd. | Lead frame having light-reflecting layer, light emitting diode having the lead frame, and backlight unit having the light emitting diode |
JP2009076948A (ja) | 2009-01-14 | 2009-04-09 | Panasonic Corp | 光半導体装置用リードフレームおよびこれを用いた光半導体装置、並びにこれらの製造方法 |
JP2010199547A (ja) * | 2009-01-30 | 2010-09-09 | Nichia Corp | 発光装置及びその製造方法 |
KR101565749B1 (ko) | 2009-02-09 | 2015-11-13 | 삼성전자 주식회사 | 발광 장치의 제조 방법 |
WO2010093956A1 (en) | 2009-02-13 | 2010-08-19 | PerkinElmer LED Solutions, Inc. | Led illumination device |
JP5526823B2 (ja) * | 2009-02-24 | 2014-06-18 | 信越化学工業株式会社 | シリコーン樹脂で封止された光半導体装置 |
US8293548B2 (en) | 2009-03-04 | 2012-10-23 | Unilumin Group Co., Ltd. | LED light module for street lamp and method of manufacturing same |
JP5099376B2 (ja) | 2009-03-04 | 2012-12-19 | 豊田合成株式会社 | 発光装置の製造方法 |
CN101514806A (zh) | 2009-03-04 | 2009-08-26 | 深圳市洲明科技有限公司 | 路灯用led发光单元 |
JP2010239043A (ja) | 2009-03-31 | 2010-10-21 | Citizen Holdings Co Ltd | Led光源及びled光源の製造方法 |
KR101293649B1 (ko) | 2009-03-31 | 2013-08-13 | 도시바 라이텍쿠 가부시키가이샤 | 발광장치 및 조명장치 |
WO2010132526A2 (en) | 2009-05-13 | 2010-11-18 | Light Prescriptions Innovators, Llc | Dimmable led lamp |
US7855394B2 (en) | 2009-06-18 | 2010-12-21 | Bridgelux, Inc. | LED array package covered with a highly thermal conductive plate |
US9048404B2 (en) | 2009-07-06 | 2015-06-02 | Zhuo Sun | Thin flat solid state light source module |
JP5294414B2 (ja) | 2009-08-21 | 2013-09-18 | 信越化学工業株式会社 | オルガノポリシルメチレン組成物及びその硬化物 |
US8404538B2 (en) | 2009-10-02 | 2013-03-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Device with self aligned stressor and method of making same |
JP2011096793A (ja) | 2009-10-29 | 2011-05-12 | Nichia Corp | 発光装置 |
KR100986468B1 (ko) | 2009-11-19 | 2010-10-08 | 엘지이노텍 주식회사 | 렌즈 및 렌즈를 갖는 발광 장치 |
JP2011127011A (ja) | 2009-12-18 | 2011-06-30 | Sekisui Chem Co Ltd | 光半導体装置用封止剤及びそれを用いた光半導体装置 |
JP2011134508A (ja) | 2009-12-22 | 2011-07-07 | Panasonic Electric Works Co Ltd | 照明器具 |
US8420415B2 (en) | 2010-03-02 | 2013-04-16 | Micron Technology, Inc. | Method for forming a light conversion material |
KR20130028077A (ko) | 2010-03-03 | 2013-03-18 | 크리 인코포레이티드 | 형광체 분리를 통해 향상된 연색 지수를 갖는 에미터 |
US20110220920A1 (en) | 2010-03-09 | 2011-09-15 | Brian Thomas Collins | Methods of forming warm white light emitting devices having high color rendering index values and related light emitting devices |
US8643038B2 (en) | 2010-03-09 | 2014-02-04 | Cree, Inc. | Warm white LEDs having high color rendering index values and related luminophoric mediums |
JP5640632B2 (ja) | 2010-03-12 | 2014-12-17 | 旭硝子株式会社 | 発光装置 |
TW201138029A (en) * | 2010-03-26 | 2011-11-01 | Kyocera Corp | Light-reflecting substrate, substrate which can be mounted in light-emitting element, light-emitting device, and process for production of substrate which can be mounted in light-emitting element |
US8322884B2 (en) | 2010-03-31 | 2012-12-04 | Abl Ip Holding Llc | Solid state lighting with selective matching of index of refraction |
KR20110111243A (ko) | 2010-04-02 | 2011-10-10 | 아사히 가라스 가부시키가이샤 | 발광 소자 탑재 기판 및 이 기판을 사용한 발광 장치 |
US8858022B2 (en) * | 2011-05-05 | 2014-10-14 | Ledengin, Inc. | Spot TIR lens system for small high-power emitter |
US8492777B2 (en) | 2010-04-09 | 2013-07-23 | Everlight Electronics Co., Ltd. | Light emitting diode package, lighting device and light emitting diode package substrate |
CN102214776B (zh) | 2010-04-09 | 2013-05-01 | 亿广科技(上海)有限公司 | 发光二极管封装结构、照明装置及发光二极管封装用基板 |
US8431942B2 (en) | 2010-05-07 | 2013-04-30 | Koninklijke Philips Electronics N.V. | LED package with a rounded square lens |
JP5429038B2 (ja) | 2010-05-14 | 2014-02-26 | 旭硝子株式会社 | 発光素子搭載用基板および発光装置 |
JP5596410B2 (ja) | 2010-05-18 | 2014-09-24 | スタンレー電気株式会社 | 半導体発光装置 |
JP2012019062A (ja) | 2010-07-08 | 2012-01-26 | Shin Etsu Chem Co Ltd | 発光半導体装置、実装基板及びそれらの製造方法 |
US8564000B2 (en) * | 2010-11-22 | 2013-10-22 | Cree, Inc. | Light emitting devices for light emitting diodes (LEDs) |
US8624271B2 (en) * | 2010-11-22 | 2014-01-07 | Cree, Inc. | Light emitting devices |
CN201918428U (zh) | 2010-12-28 | 2011-08-03 | 广州市鸿利光电股份有限公司 | 一种防止硫化的贴片led |
EP2472578B1 (en) | 2010-12-28 | 2020-06-03 | Nichia Corporation | Light emitting device |
US8809880B2 (en) * | 2011-02-16 | 2014-08-19 | Cree, Inc. | Light emitting diode (LED) chips and devices for providing failure mitigation in LED arrays |
US8729589B2 (en) * | 2011-02-16 | 2014-05-20 | Cree, Inc. | High voltage array light emitting diode (LED) devices and fixtures |
KR101850432B1 (ko) * | 2011-07-11 | 2018-04-19 | 엘지이노텍 주식회사 | 발광 모듈 |
US10686107B2 (en) * | 2011-07-21 | 2020-06-16 | Cree, Inc. | Light emitter devices and components with improved chemical resistance and related methods |
US10211380B2 (en) | 2011-07-21 | 2019-02-19 | Cree, Inc. | Light emitting devices and components having improved chemical resistance and related methods |
US10490712B2 (en) | 2011-07-21 | 2019-11-26 | Cree, Inc. | Light emitter device packages, components, and methods for improved chemical resistance and related methods |
CN104247060A (zh) | 2011-12-01 | 2014-12-24 | 克利公司 | 发光器件、具有改进的化学耐性的部件以及相关方法 |
US9496466B2 (en) | 2011-12-06 | 2016-11-15 | Cree, Inc. | Light emitter devices and methods, utilizing light emitting diodes (LEDs), for improved light extraction |
US8946747B2 (en) | 2012-02-13 | 2015-02-03 | Cree, Inc. | Lighting device including multiple encapsulant material layers |
US9343441B2 (en) | 2012-02-13 | 2016-05-17 | Cree, Inc. | Light emitter devices having improved light output and related methods |
US8957580B2 (en) | 2012-02-13 | 2015-02-17 | Cree, Inc. | Lighting device including multiple wavelength conversion material layers |
US9240530B2 (en) | 2012-02-13 | 2016-01-19 | Cree, Inc. | Light emitter devices having improved chemical and physical resistance and related methods |
US9583689B2 (en) * | 2013-07-12 | 2017-02-28 | Lite-On Opto Technology (Changzhou) Co., Ltd. | LED package |
JP6604543B2 (ja) * | 2013-08-09 | 2019-11-13 | 株式会社タムラ製作所 | 発光装置 |
US8940562B1 (en) | 2014-06-02 | 2015-01-27 | Atom Nanoelectronics, Inc | Fully-printed carbon nanotube thin film transistor backplanes for active matrix organic light emitting devices and liquid crystal displays |
-
2011
- 2011-12-01 US US13/309,177 patent/US10211380B2/en active Active
-
2012
- 2012-11-29 EP EP12863904.4A patent/EP2791982A4/en not_active Withdrawn
- 2012-11-29 CN CN201280068934.8A patent/CN104247055A/zh active Pending
- 2012-11-29 WO PCT/US2012/067055 patent/WO2013101385A1/en active Application Filing
-
2019
- 2019-01-31 US US16/263,191 patent/US11563156B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009170825A (ja) * | 2008-01-19 | 2009-07-30 | Nichia Corp | 発光装置及びその製造方法 |
KR20100079970A (ko) * | 2008-12-31 | 2010-07-08 | 서울반도체 주식회사 | 광원 패키지 |
KR20100086955A (ko) * | 2009-01-23 | 2010-08-02 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 프라이머 조성물 및 그것을 이용한 광 반도체 장치 |
US20110031513A1 (en) * | 2009-08-04 | 2011-02-10 | Advanced Optoelectronic Technology, Inc. | Waterproof smd led module and method of manufacturing the same |
US20110204398A1 (en) * | 2010-02-19 | 2011-08-25 | Asahi Glass Company, Limited | Substrate for mounting light-emitting element and light-emitting device |
Non-Patent Citations (1)
Title |
---|
See also references of EP2791982A4 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10211380B2 (en) | 2011-07-21 | 2019-02-19 | Cree, Inc. | Light emitting devices and components having improved chemical resistance and related methods |
US10490712B2 (en) | 2011-07-21 | 2019-11-26 | Cree, Inc. | Light emitter device packages, components, and methods for improved chemical resistance and related methods |
US10686107B2 (en) | 2011-07-21 | 2020-06-16 | Cree, Inc. | Light emitter devices and components with improved chemical resistance and related methods |
US11563156B2 (en) | 2011-07-21 | 2023-01-24 | Creeled, Inc. | Light emitting devices and components having improved chemical resistance and related methods |
US9496466B2 (en) | 2011-12-06 | 2016-11-15 | Cree, Inc. | Light emitter devices and methods, utilizing light emitting diodes (LEDs), for improved light extraction |
US10008637B2 (en) | 2011-12-06 | 2018-06-26 | Cree, Inc. | Light emitter devices and methods with reduced dimensions and improved light output |
US9240530B2 (en) | 2012-02-13 | 2016-01-19 | Cree, Inc. | Light emitter devices having improved chemical and physical resistance and related methods |
US9343441B2 (en) | 2012-02-13 | 2016-05-17 | Cree, Inc. | Light emitter devices having improved light output and related methods |
Also Published As
Publication number | Publication date |
---|---|
EP2791982A4 (en) | 2015-07-29 |
CN104247055A (zh) | 2014-12-24 |
EP2791982A1 (en) | 2014-10-22 |
US20190165228A1 (en) | 2019-05-30 |
US20130020590A1 (en) | 2013-01-24 |
US10211380B2 (en) | 2019-02-19 |
US11563156B2 (en) | 2023-01-24 |
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