WO2012137837A1 - 多価カルボン酸樹脂およびその組成物 - Google Patents
多価カルボン酸樹脂およびその組成物 Download PDFInfo
- Publication number
- WO2012137837A1 WO2012137837A1 PCT/JP2012/059239 JP2012059239W WO2012137837A1 WO 2012137837 A1 WO2012137837 A1 WO 2012137837A1 JP 2012059239 W JP2012059239 W JP 2012059239W WO 2012137837 A1 WO2012137837 A1 WO 2012137837A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carboxylic acid
- compound
- group
- molecule
- resin
- Prior art date
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 109
- 239000011347 resin Substances 0.000 title claims abstract description 109
- 239000000203 mixture Substances 0.000 title claims abstract description 74
- 239000002253 acid Substances 0.000 title claims abstract description 44
- 239000003822 epoxy resin Substances 0.000 claims abstract description 66
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 66
- 150000001875 compounds Chemical class 0.000 claims description 134
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 122
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 claims description 70
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 37
- 150000005846 sugar alcohols Polymers 0.000 claims description 35
- 125000002947 alkylene group Chemical group 0.000 claims description 31
- 125000004432 carbon atom Chemical group C* 0.000 claims description 27
- 229920002545 silicone oil Polymers 0.000 claims description 25
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 15
- 125000003158 alcohol group Chemical group 0.000 claims description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 11
- 239000004215 Carbon black (E152) Substances 0.000 claims description 10
- 229930195733 hydrocarbon Natural products 0.000 claims description 10
- 150000002430 hydrocarbons Chemical class 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 229920000728 polyester Polymers 0.000 claims description 9
- 238000007259 addition reaction Methods 0.000 claims description 4
- -1 siloxane structure Chemical group 0.000 abstract description 175
- 239000000463 material Substances 0.000 abstract description 52
- 230000003287 optical effect Effects 0.000 abstract description 43
- 230000001070 adhesive effect Effects 0.000 abstract description 31
- 239000003566 sealing material Substances 0.000 abstract description 29
- 239000004065 semiconductor Substances 0.000 abstract description 29
- 239000000853 adhesive Substances 0.000 abstract description 25
- 238000000576 coating method Methods 0.000 abstract description 6
- 239000012776 electronic material Substances 0.000 abstract description 6
- 239000012778 molding material Substances 0.000 abstract description 6
- 238000005266 casting Methods 0.000 abstract description 5
- 239000002648 laminated material Substances 0.000 abstract description 3
- 239000011342 resin composition Substances 0.000 abstract description 3
- 238000001723 curing Methods 0.000 description 71
- 239000000047 product Substances 0.000 description 52
- 239000003795 chemical substances by application Substances 0.000 description 34
- 238000005227 gel permeation chromatography Methods 0.000 description 29
- 239000007788 liquid Substances 0.000 description 26
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 25
- 239000002904 solvent Substances 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 21
- 125000003700 epoxy group Chemical group 0.000 description 21
- 238000003786 synthesis reaction Methods 0.000 description 21
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 19
- 239000011521 glass Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 19
- 239000010408 film Substances 0.000 description 18
- 229920003986 novolac Polymers 0.000 description 17
- 239000000758 substrate Substances 0.000 description 16
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 15
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- 239000004593 Epoxy Substances 0.000 description 14
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 14
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 14
- 229920001296 polysiloxane Polymers 0.000 description 14
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 13
- 229910052698 phosphorus Inorganic materials 0.000 description 13
- 239000011574 phosphorus Substances 0.000 description 13
- 238000012360 testing method Methods 0.000 description 13
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 12
- 229910002012 Aerosil® Inorganic materials 0.000 description 11
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 11
- 238000007789 sealing Methods 0.000 description 11
- 150000003377 silicon compounds Chemical class 0.000 description 11
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- 229910019142 PO4 Inorganic materials 0.000 description 10
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 10
- 239000010452 phosphate Substances 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 9
- 229920005906 polyester polyol Polymers 0.000 description 9
- 229910001868 water Inorganic materials 0.000 description 9
- 150000001735 carboxylic acids Chemical class 0.000 description 8
- 239000007822 coupling agent Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 7
- 230000001476 alcoholic effect Effects 0.000 description 7
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 7
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 125000004122 cyclic group Chemical group 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 125000000623 heterocyclic group Chemical group 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 6
- 229920000515 polycarbonate Polymers 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 6
- 239000012945 sealing adhesive Substances 0.000 description 6
- 125000005372 silanol group Chemical group 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- PFANXOISJYKQRP-UHFFFAOYSA-N 2-tert-butyl-4-[1-(5-tert-butyl-4-hydroxy-2-methylphenyl)butyl]-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(CCC)C1=CC(C(C)(C)C)=C(O)C=C1C PFANXOISJYKQRP-UHFFFAOYSA-N 0.000 description 5
- OLQWMCSSZKNOLQ-UHFFFAOYSA-N 3-(2,5-dioxooxolan-3-yl)oxolane-2,5-dione Chemical compound O=C1OC(=O)CC1C1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- 239000004793 Polystyrene Substances 0.000 description 5
- 125000002723 alicyclic group Chemical group 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 5
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- 230000002093 peripheral effect Effects 0.000 description 5
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- 239000012321 sodium triacetoxyborohydride Substances 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- 229910052725 zinc Inorganic materials 0.000 description 5
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 4
- OLQWMCSSZKNOLQ-ZXZARUISSA-N (3s)-3-[(3r)-2,5-dioxooxolan-3-yl]oxolane-2,5-dione Chemical compound O=C1OC(=O)C[C@H]1[C@@H]1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-ZXZARUISSA-N 0.000 description 4
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 4
- ICKWICRCANNIBI-UHFFFAOYSA-N 2,4-di-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C(C(C)(C)C)=C1 ICKWICRCANNIBI-UHFFFAOYSA-N 0.000 description 4
- QCBSYPYHCJMQGB-UHFFFAOYSA-N 2-ethyl-1,3,5-triazine Chemical compound CCC1=NC=NC=N1 QCBSYPYHCJMQGB-UHFFFAOYSA-N 0.000 description 4
- JUUIRFQGSUFDPY-UHFFFAOYSA-N 3-ethylhept-2-ene Chemical group CCCCC(CC)=CC JUUIRFQGSUFDPY-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
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- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 239000007983 Tris buffer Substances 0.000 description 4
- 230000006750 UV protection Effects 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- 239000003963 antioxidant agent Substances 0.000 description 4
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 150000004714 phosphonium salts Chemical class 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
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- 239000002994 raw material Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 239000011135 tin Substances 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- JBCJMTUHAXHILC-UHFFFAOYSA-N zinc;octanoic acid Chemical compound [Zn+2].CCCCCCCC(O)=O JBCJMTUHAXHILC-UHFFFAOYSA-N 0.000 description 4
- FWHUTKPMCKSUCV-UHFFFAOYSA-N 1,3-dioxo-3a,4,5,6,7,7a-hexahydro-2-benzofuran-5-carboxylic acid Chemical compound C1C(C(=O)O)CCC2C(=O)OC(=O)C12 FWHUTKPMCKSUCV-UHFFFAOYSA-N 0.000 description 3
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 3
- LJMPOXUWPWEILS-UHFFFAOYSA-N 3a,4,4a,7a,8,8a-hexahydrofuro[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1C2C(=O)OC(=O)C2CC2C(=O)OC(=O)C21 LJMPOXUWPWEILS-UHFFFAOYSA-N 0.000 description 3
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 3
- LQOPXMZSGSTGMF-UHFFFAOYSA-N 6004-79-1 Chemical compound C1CC2C3C(=O)OC(=O)C3C1C2 LQOPXMZSGSTGMF-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000002841 Lewis acid Substances 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 3
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- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000003078 antioxidant effect Effects 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
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- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 3
- 239000008116 calcium stearate Substances 0.000 description 3
- 235000013539 calcium stearate Nutrition 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
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- 150000001896 cresols Chemical class 0.000 description 3
- OZEHOHQZIRILDX-UHFFFAOYSA-N ctk1b7797 Chemical compound O=C1OC(=O)C2C1C1(C)CC2CC1 OZEHOHQZIRILDX-UHFFFAOYSA-N 0.000 description 3
- INSRQEMEVAMETL-UHFFFAOYSA-N decane-1,1-diol Chemical compound CCCCCCCCCC(O)O INSRQEMEVAMETL-UHFFFAOYSA-N 0.000 description 3
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 3
- 239000002657 fibrous material Substances 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 238000013007 heat curing Methods 0.000 description 3
- 150000002391 heterocyclic compounds Chemical class 0.000 description 3
- WJLUBOLDZCQZEV-UHFFFAOYSA-M hexadecyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CCCCCCCCCCCCCCCC[N+](C)(C)C WJLUBOLDZCQZEV-UHFFFAOYSA-M 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 150000007517 lewis acids Chemical class 0.000 description 3
- 239000004611 light stabiliser Substances 0.000 description 3
- SGLXWMAOOWXVAM-UHFFFAOYSA-L manganese(2+);octanoate Chemical compound [Mn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O SGLXWMAOOWXVAM-UHFFFAOYSA-L 0.000 description 3
- ZUZLIXGTXQBUDC-UHFFFAOYSA-N methyltrioctylammonium Chemical compound CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC ZUZLIXGTXQBUDC-UHFFFAOYSA-N 0.000 description 3
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- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 1
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- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
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- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- DCAFJGSRSBLEPX-UHFFFAOYSA-N tris(2,3-dibutylphenyl) phosphite Chemical compound CCCCC1=CC=CC(OP(OC=2C(=C(CCCC)C=CC=2)CCCC)OC=2C(=C(CCCC)C=CC=2)CCCC)=C1CCCC DCAFJGSRSBLEPX-UHFFFAOYSA-N 0.000 description 1
- OOZKMYBQDPXENQ-UHFFFAOYSA-N tris(2,3-diethylphenyl) phosphite Chemical compound CCC1=CC=CC(OP(OC=2C(=C(CC)C=CC=2)CC)OC=2C(=C(CC)C=CC=2)CC)=C1CC OOZKMYBQDPXENQ-UHFFFAOYSA-N 0.000 description 1
- WTLBZVNBAKMVDP-UHFFFAOYSA-N tris(2-butoxyethyl) phosphate Chemical compound CCCCOCCOP(=O)(OCCOCCCC)OCCOCCCC WTLBZVNBAKMVDP-UHFFFAOYSA-N 0.000 description 1
- QFGXDXGDZKTYFD-UHFFFAOYSA-N tris[2,3-di(propan-2-yl)phenyl] phosphite Chemical compound CC(C)C1=CC=CC(OP(OC=2C(=C(C(C)C)C=CC=2)C(C)C)OC=2C(=C(C(C)C)C=CC=2)C(C)C)=C1C(C)C QFGXDXGDZKTYFD-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000811 xylitol Substances 0.000 description 1
- HEBKCHPVOIAQTA-SCDXWVJYSA-N xylitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)CO HEBKCHPVOIAQTA-SCDXWVJYSA-N 0.000 description 1
- 229960002675 xylitol Drugs 0.000 description 1
- 235000010447 xylitol Nutrition 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
- C08G63/695—Polyesters containing atoms other than carbon, hydrogen and oxygen containing silicon
- C08G63/6954—Polyesters containing atoms other than carbon, hydrogen and oxygen containing silicon derived from polxycarboxylic acids and polyhydroxy compounds
- C08G63/6956—Dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
- C08G63/695—Polyesters containing atoms other than carbon, hydrogen and oxygen containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4085—Curing agents not provided for by the groups C08G59/42 - C08G59/66 silicon containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/445—Block-or graft-polymers containing polysiloxane sequences containing polyester sequences
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/10—Block or graft copolymers containing polysiloxane sequences
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
Definitions
- the present invention relates to a polyvalent carboxylic acid resin suitable for use in electrical and electronic materials, particularly for optical semiconductors, and a polyvalent carboxylic acid composition containing the same.
- Epoxy resins can be cured to obtain cured products with excellent adhesion, mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, etc., so paints, adhesives, composite materials, molding materials It is used in a wide range of fields such as casting materials, various coating materials and resists.
- curing agent used for an epoxy resin an amine compound, a carboxylic acid compound, a carboxylic acid anhydride, a phenol compound, a thiol compound etc. are mentioned as a general thing, for example.
- various carboxylic acid compounds and carboxylic acid anhydrides are used for applications such as when the cured product requires high transparency and heat resistance, or when an appropriate pot life is required.
- the carboxylic acid compound has a strong intermolecular hydrogen bond and is not only crystallized, but also has a very poor compatibility with other resins, and therefore, its use is avoided.
- a liquid epoxy resin composition using a bisphenol type epoxy resin, an alicyclic epoxy resin, etc. as a resin for sealing an optical semiconductor such as an LED (Light Emitting Diode) is excellent in mechanical strength and adhesive strength. It was used (refer patent document 1).
- LEDs have been used in fields that require high brightness, such as automotive headlamps and lighting applications. Accordingly, resins that encapsulate optical semiconductor elements are particularly resistant to UV and heat. It has come to be required.
- bisphenol-type epoxy resins and alicyclic epoxy resins have sufficient UV resistance and heat resistance as described above, and may not be used in fields where high luminance is required.
- a silicone resin sealing material using an unsaturated hydrocarbon group-containing organopolysiloxane and an organohydrogenpolysiloxane is used (see Patent Document 2). ).
- a sealing material using such a silicone resin has excellent UV resistance and heat resistance, it has problems such as low adhesion to the base material and sticking of the sealing surface. It was.
- a condensate with excellent UV resistance and heat resistance and good adhesion is being developed using a condensate of a silicon compound having an epoxy group and a liquid carboxylic acid anhydride. (See Patent Document 3 and Patent Document 4).
- Carboxylic anhydrides used in such applications include hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, tetrahydro and the like because they are colorless and transparent, are liquid at room temperature, and are easy to handle.
- Carboxylic anhydrides such as phthalic anhydride, methyltetrahydrophthalic anhydride, norbornane-2,3-dicarboxylic anhydride, methylnorbornane-2,3-dicarboxylic anhydride, and mixtures thereof are used.
- these carboxylic acid anhydrides are often low molecular weight compounds.
- volatilization of the carboxylic acid anhydride during thermal curing becomes a problem.
- the volatilization of the carboxylic acid anhydride is not only due to the problem of the curing failure of the epoxy resin composition due to the absence of the required amount of the carboxylic acid anhydride (curing agent) in the curing reaction, but also due to its harmfulness.
- the impact on the environment is also significant, such as adverse effects on the environment, production line contamination, and air pollution.
- studies have been made on a silicone skeleton carboxylic acid compound that has low volatility and is liquid at room temperature.
- the strength of the cured product that can be satisfied cannot be obtained, there is a problem such as generation of cracks during lead-free solder reflow when used as an optical semiconductor sealing material (see Patent Document 5).
- the present invention is liquid at room temperature, has low volatility at high temperature, and particularly has a low volatility during the curing process as a curing agent for epoxy resin, giving a cured product having excellent transparency (colorless and transparent) and curability.
- An object of the present invention is to provide a polyvalent carboxylic acid resin whose cured product is excellent in mechanical strength.
- a silicone oil having a specific skeleton a polyhydric alcohol compound having two or more hydroxyl groups in the molecule, and two or more carboxylic acids in the molecule.
- a polyvalent carboxylic acid resin obtained by reacting a compound having an anhydride group (if necessary, a compound having one carboxylic anhydride group in the molecule) as a curing agent for the epoxy resin Has been found to be solved, and the present invention has been completed.
- the present invention (1) Both-end carbinol-modified silicone oil (a) represented by the following formula (1), a polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule, and two or more carboxylic acid anhydrides in the molecule A polyvalent carboxylic acid resin (A) obtained by subjecting a compound (c) having a physical group to an addition reaction.
- each R 1 independently represents an alkylene group having 1 to 10 carbon atoms or an alkylene group containing an ether bond having 1 to 10 carbon atoms, and each R 2 independently represents a methyl group or a phenyl group.
- N represents an average value of 1 to 100.
- Both-end carbinol-modified silicone oil (a) represented by the following formula (1), a polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule, and two or more carboxylic acid anhydrides in the molecule A polyvalent carboxylic acid resin (A) obtained by subjecting a compound (c) having a physical group to a compound (d) having one carboxylic anhydride group in the molecule.
- each R 1 independently represents an alkylene group having 1 to 10 carbon atoms or an alkylene group containing an ether bond having 1 to 10 carbon atoms, and each R 2 independently represents a methyl group or a phenyl group.
- N represents an average value of 1 to 100.
- R 3 and R 4 each independently represent an alkylene group having 1 to 10 carbon atoms, and m represents an average value of 1 to 100
- Any of (1) to (5), wherein the compound (c) having two or more carboxylic anhydride groups in the molecule is at least one selected from the group consisting of the following formulas (3) to (5):
- a polyvalent carboxylic acid composition comprising the polyvalent carboxylic acid resin (A) according to any one of (7) and an epoxy resin (B).
- a light emitting diode comprising the cured product according to (9). About.
- the polyvalent carboxylic acid resin having a polysiloxane structure is liquid, it is easy to handle, and a cured product having excellent heat resistance, hardness, transparency, and light resistance can be obtained.
- the polyvalent carboxylic acid composition containing the polyvalent carboxylic acid resin of the invention is useful in a wide range of applications such as electric / electronic materials, molding materials, casting materials, laminated materials, paints, adhesives, resists, etc. It is extremely useful as a material that requires optical characteristics, for example, as an adhesive or sealing material for optical semiconductors (LED products, etc.).
- the polyvalent carboxylic acid resin (A) of the present invention comprises a carbinol-modified silicone oil (a) at both ends, a polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule, and two or more in the molecule.
- Polysiloxane in the molecule obtained by performing an addition reaction with the compound (c) having a carboxylic acid anhydride group (and a compound (d) having one carboxylic acid anhydride group in the molecule if necessary)
- the polyhydric carboxylic acid resin of the present invention includes both terminal carbinol-modified silicone oil (a) described later, an alcoholic hydroxyl group of a polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule, and two in the molecule. It can be obtained by the addition reaction of the carboxylic acid anhydride group of the compound (c) having the above carboxylic acid anhydride group (and, if necessary, the compound (d) having one carboxylic acid anhydride group in the molecule). it can.
- both terminals carbinol-modified silicone oils (a) and / or having two or more hydroxyl groups in the molecule are polymerized as the same molecule.
- the both-terminal carbinol-modified silicone oil (a) which is a raw material for the polycarboxylic acid resin (A), a polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule,
- the compound (c) having two or more carboxylic acid anhydride groups and the compound (d) having one carboxylic acid anhydride group in the molecule will be described.
- Both terminal carbinol-modified silicone oil (a) is a silicone compound having an alcoholic hydroxyl group at both terminals represented by the following formula (1).
- each R 1 independently represents an alkylene group having 1 to 10 carbon atoms or an alkylene group containing an ether bond having 1 to 10 carbon atoms
- each R 2 independently represents a methyl group or a phenyl group.
- N represents an average value of 1 to 100.
- R 1 examples include methylene, ethylene, propylene, butylene, pentylene, straight-chain alkylene groups having 1 to 10 carbon atoms such as hexylene, heptylene, octylene, isopropylene, isobutylene, isopentylene,
- the following formula (11) such as an alkylene group having a branched chain of 1 to 10 carbon atoms, such as an ethoxyethylene group, a propoxyethylene group, a propoxypropylene group, and an ethoxypropylene group
- each R 5 independently represents an alkylene group having 1 to 5 carbon atoms.
- an alkylene group containing an ether bond having 1 to 10 carbon atoms are preferable.
- R 2 represent a methyl group or a phenyl group, which may be the same or different, but in order for the polyvalent carboxylic acid resin (A) to be liquid at room temperature, A group is desirable.
- n is an average value of 1 to 100, preferably 2 to 80, more preferably 5 to 30.
- Examples of the both-end carbinol-modified silicone oil (a) represented by the formula (1) include a silicone compound having alcoholic hydroxyl groups at both ends.
- Specific examples include X-22-160AS, KF6001, KF6002, KF6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.); BY16-201, BY16-004, SF8427 (all Toray Dow Corning Co., Ltd.); XF42-B0970, XF42-C3294 (both manufactured by Momentive Performance Materials Japan GK), etc., are all available from the market.
- These modified silicone oils having alcoholic hydroxyl groups at both ends can be used alone or in combination of two or more.
- X-22-160AS, KF6001, KF6002, BY16-201, or XF42-B0970 is preferable.
- polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule examples include a terminal alcohol polyester compound (b), a hydrocarbon polyhydric alcohol compound (f), and a terminal alcohol polycarbonate compound.
- R 3 and R 4 each independently represent an alkylene group having 1 to 10 carbon atoms, and m represents an average value of 1 to 100
- R 3 examples include linear alkylene groups having 1 to 10 carbon atoms such as ethylene, propylene, butylene, pentylene, hexylene, heptylene, octylene, isopropylene, ethylbutylpropylene, isobutylene, Examples thereof include an alkylene group having a branched chain having 1 to 10 carbon atoms such as isopentylene, neopentylene and diethylpentylene, and an alkylene group having a cyclic structure such as cyclopentanedimethylene and cyclohexanedimethylene.
- an alkylene group having a branched chain having 1 to 10 carbon atoms or an alkylene group having a cyclic structure is preferable, and in particular, ethylbutylpropylene, isobutylene, neopentylene, diethylpentylene, and cyclohexanedimethylene are the heat-resistant transparency of the cured product. It is preferable from the viewpoint.
- R 4 examples include linear alkylene groups having 1 to 10 carbon atoms such as ethylene, propylene, butylene, pentylene, hexylene, heptylene, octylene, isopropylene, ethylbutylpropylene, isobutylene, Examples thereof include an alkylene group having a branched chain having 1 to 10 carbon atoms such as isopentylene, neopentylene and diethylpentylene, and an alkylene group having a cyclic structure such as cyclopentanedimethylene and cyclohexanedimethylene.
- a linear alkylene group having 1 to 10 carbon atoms is preferable, and propylene, butylene, pentylene, and hexylene are particularly preferable from the viewpoint of adhesion of a cured product to a substrate.
- m is an average value of 1 to 100, preferably 2 to 40, more preferably 3 to 30.
- the weight average molecular weight (Mw) of the terminal alcohol polyester compound (b) is preferably 500 to 20000, more preferably 500 to 5000, and still more preferably 500 to 3000. If the weight average molecular weight is less than 500, the cured product hardness of the polyvalent carboxylic acid composition does not become too high, and there is no fear of cracking in a heat cycle test or the like, which is preferable. Moreover, if a weight average molecular weight is 20000 or less, there is no fear that stickiness of hardened
- the weight average molecular weight means a weight average molecular weight (Mw) calculated in terms of polystyrene based on a value measured under the following conditions using GPC (gel permeation chromatography).
- Mw weight average molecular weight
- GPC Manufacturer Shimadzu Corporation
- Column Guard column SHODEX GPC LF-G LF-804
- Flow rate 1.0 ml / min.
- Solvent THF (tetrahydrofuran)
- Detector RI (differential refraction detector)
- polyester polyols having an alcoholic hydroxyl group at the terminal examples include polyester polyols having an alcoholic hydroxyl group at the terminal. Specific examples thereof are polyester polyols such as Kyowapol 1000PA, 2000PA, 3000PA, 2000BA (all manufactured by Kyowa Hakko Chemical Co., Ltd.); Adeka New Ace Y9-10, YT-101 (all ADEKA ( Plaxel 220EB, 220EC (both manufactured by Daicel Chemical Industries); Polylite OD-X-286, OD-X-102, OD-X-355, OD-X-2330, OD-X-240, OD-X-668, OD-X-2554, OD-X-2108, OD-X-2376, OD-X-2044, OD-X-688, OD-X-2068, OD-X-2547, OD-X-2420, OD-X-2523, OD-X-2555 (all D HS Co., Ltd.); HS2H-201AP,
- the hydrocarbon polyhydric alcohol compound (f) is a hydrocarbon compound having two or more hydroxyl groups in the molecule, such as ethylene glycol, propylene glycol, propanediol, butanediol, dimethylethanol, pentanediol, neopentyl glycol, Hexanediol, dimethylbutanediol, heptanediol, dimethylpentanediol, diethylpropanediol, octanediol, dimethylhexanediol, diethylbutanediol, nonanediol, dimethylheptanediol, diethylpentanediol, decanediol, dimethyloctanediol, diethylhexanediol , Ethylbuty
- Hydrocarbon polyhydric alcohol compounds and cyclic hydrocarbon polyhydric alcohol compounds such as cyclopentanediol, cyclopentanedimethanol, cyclohexanediol, cyclohexanedimethanol, tricyclodecanediol, tricyclodecanedimethanol, norbornanediol, norbornanedimethanol Is mentioned.
- These hydrocarbon polyhydric alcohol compounds (f) can be used alone or in combination of two or more.
- propylene glycol, decanediol, diethylpentanediol, and tricyclodecane dimethanol are preferable from the viewpoint of the strength of the cured product and the transparency of the cured product.
- terminal alcohol polycarbonate compound will be described. Although it does not specifically limit as a terminal alcohol polycarbonate compound, For example, the polycarbonate compound etc. which have a hydroxyl group at the terminal shown by following formula (12) are mentioned.
- R 6 represents an alkylene group having 1 to 10 carbon atoms, and p represents an average value of 1 to 100
- R 6 examples include methylene, ethylene, propylene, butylene, pentylene, hexylene, heptylene, octylene and the like linear alkylene groups having 1 to 10 carbon atoms, isopropylene, ethylbutylpropylene, Examples thereof include alkylene groups having a branched chain of 1 to 10 carbon atoms such as isobutylene, isopentylene, neopentylene, diethylpentylene, and the like, and alkylene groups having a cyclic structure such as cyclopentanedimethylene and cyclohexanedimethylene.
- linear alkylene groups having 4 to 7 carbon atoms such as butylene, pentylene, hexylene, heptylene and the like are preferable from the viewpoint of workability because the viscosity of the terminal alcohol polycarbonate compound is not too high.
- a plurality of R 6 present in the formula (12) may be the same or different.
- p is an average value of 1 to 100, preferably 2 to 40, more preferably 3 to 30.
- the weight average molecular weight (Mw) of the terminal alcohol polycarbonate compound is preferably 500 to 20000, more preferably 500 to 5000, still more preferably 500 to 3000. If the weight average molecular weight is 500 or more, the cured product hardness of the polyvalent carboxylic acid composition does not become too high, and there is no fear of cracking in a heat cycle test or the like, which is preferable. Moreover, if a weight average molecular weight is 20000 or less, there is no fear that stickiness of hardened
- the weight average molecular weight means a weight average molecular weight (Mw) calculated in terms of polystyrene based on a value measured under the following conditions using GPC (gel permeation chromatography).
- Mw weight average molecular weight
- GPC Manufacturer Shimadzu Corporation
- Column Guard column SHODEX GPC LF-G LF-804
- Flow rate 1.0 ml / min.
- Solvent THF (tetrahydrofuran)
- Detector RI (differential refraction detector)
- the polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule can be used alone or in combination of two or more.
- the amount of the polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule is not particularly limited, but is preferably 0.5 to 200 with respect to 100 parts by weight of the carbinol-modified silicone oil (a) at both ends. Parts by weight, more preferably 5 to 50 parts by weight, still more preferably 10 to 30 parts by weight. If it is 0.5 parts by weight or more, it is preferable because the mechanical strength of the cured product is further improved, and if it is 200 parts by weight or less, the heat-resistant transparency of the cured product is further improved or obtained polyvalent carboxylic acid resin (A). This is preferable because the viscosity becomes more appropriate.
- the compound (c) having two or more carboxylic anhydride groups in the molecule is, for example, 1,2,3,4-butanetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic acid.
- the number of carboxylic acid anhydride groups in the same molecule of the compound (c) is two, so that it is difficult for the viscosity of the polyvalent carboxylic acid resin (A) to increase excessively.
- the compound (c) having two or more carboxylic anhydride groups in the molecule can be used alone or in combination. Among these, the heat resistance (heat-resistant transparency etc.) of the hardened
- 1,2,3,4-butanetetracarboxylic dianhydride 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 4- (2,5-dioxotetrahydrofuran-3-yl)- 1,2,3,4-Tetrahydronaphthalene-1,2-dicarboxylic anhydride is preferred, and 1,2,3,4-butanetetracarboxylic dianhydride is particularly preferred.
- Compound (d) having one carboxylic anhydride group in the molecule includes succinic acid anhydride, methyl succinic acid anhydride, ethyl succinic acid anhydride, 2,3-butanedicarboxylic acid anhydride, 2,4-pentanedicarboxylic acid.
- the compound (d) having one carboxylic anhydride group in the molecule can be used alone or in combination of two or more.
- the transparency (heat-resistant transparency, etc.) of the cured product obtained by curing the polyvalent carboxylic acid composition containing the polyvalent carboxylic acid resin (A) and the epoxy resin (B) is excellent.
- Hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, tetrahydrophthalic anhydride, norbornane-2,3-dicarboxylic anhydride, methylnorbornane-2,3-dicarboxylic anhydride, 1,2,4 -Cyclohexanetricarboxylic acid-1,2-anhydride is preferred.
- more preferred are methylhexahydrophthalic anhydride and 1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride, and particularly preferred is methylhexahydrophthalic anhydride.
- the amount of the compound (d) having one carboxylic anhydride group in the molecule is not particularly limited, but for 100 parts by weight of the compound (c) having two or more carboxylic anhydride groups in the molecule,
- the amount is preferably 5 to 1500 parts by weight, more preferably 50 to 1000 parts by weight, and still more preferably 100 to 800 parts by weight. If it is 5 parts by weight or more, it is preferable because excessive high molecular weight of the polyvalent carboxylic acid resin (A) can be suppressed and the viscosity is not excessively high, and the workability is improved. Since the mechanical strength of the cured product becomes good, it is preferable. From the viewpoint of the balance between the viscosity of the polyvalent carboxylic acid resin (A) and the cured product mechanical strength, it is particularly preferably 150 to 700 parts by weight.
- the amount of the compound (d) having one carboxylic acid anhydride group is the total alcohol of the carbinol-modified silicone oil (a) at both ends and the polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule.
- the total carboxylic acid anhydride group of the compound (c) having two or more carboxylic acid anhydride groups in the molecule and the compound (d) having one carboxylic acid anhydride group in the molecule is equivalent to 1 equivalent of the neutral hydroxyl group.
- the amount is preferably 0.5 to 2.0 equivalents, more preferably 0.8 to 1.5 equivalents. If it is 0.5 equivalent or more, it is preferable because the mechanical strength of the cured product is good, and if it is 2.0 equivalent or less, a large amount of carboxylic acid anhydride groups do not remain and storage stability becomes good.
- the polycarboxylic acid resin (A) of the present invention is produced by the above-described carbinol-modified silicone oil (a) having two terminals, a polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule, and two in the molecule.
- the compound (c) having one or more carboxylic acid anhydride groups can be charged and reacted.
- the compound (d) having one carboxylic acid anhydride group in the molecule is further charged. It can be carried out.
- the addition of the component (d) is preferable from the viewpoint of reaction control because an excessive increase in the molecular weight of the polyvalent carboxylic acid resin (A) is suppressed.
- the above compounds may be charged and reacted at once, or the respective compounds may be charged and reacted in a certain order.
- Production of the polyvalent carboxylic acid resin (A) of the present invention can be carried out in a solvent or without a solvent.
- the solvent include a carbinol-modified silicone oil (a) at both ends, a polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule, and a compound (c) having two or more carboxylic anhydride groups in the molecule. ),
- a solvent that does not react with the compound (d) having one carboxylic acid anhydride group in the molecule can be used without particular limitation.
- solvents examples include aprotic polar solvents such as dimethylformamide, dimethylacetamide, dimethyl sulfoxide, tetrahydrofuran and acetonitrile, ketones such as methyl ethyl ketone, cyclopentanone and methyl isobutyl ketone, toluene and xylene.
- aprotic polar solvents such as dimethylformamide, dimethylacetamide, dimethyl sulfoxide, tetrahydrofuran and acetonitrile
- ketones such as methyl ethyl ketone, cyclopentanone and methyl isobutyl ketone, toluene and xylene.
- An aromatic hydrocarbon etc. are mentioned, Among these, an aromatic hydrocarbon and ketones are preferable.
- These solvents may be used alone or in combination of two or more.
- the amount used in the case of using a solvent is as follows: carbinol-modified silicone oil at both ends (a), polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule, and two or more carboxylic anhydride groups in the molecule 0.5 to 300 parts by weight is preferable with respect to 100 parts by weight of the total of the compound (c) having a compound and the compound (d) having one carboxylic anhydride group in the molecule.
- the polyvalent carboxylic acid resin (A) of the present invention can be produced with or without a catalyst.
- a catalyst is used, usable catalysts are hydrochloric acid, sulfuric acid, methanesulfonic acid, trifluoromethanesulfonic acid, paratoluenesulfonic acid, nitric acid, trifluoroacetic acid, trichloroacetic acid and other acidic compounds, sodium hydroxide, potassium hydroxide, water Metal hydroxides such as calcium oxide and magnesium hydroxide, amine compounds such as triethylamine, tripropylamine and tributylamine, pyridine, dimethylaminopyridine, 1,8-diazabicyclo [5.4.0] undec-7-ene, Heterocyclic compounds such as imidazole, triazole, tetrazole, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydrox
- the amounts used are carbinol-modified silicone oil (a) at both ends, polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule, and two or more carboxylic anhydride groups in the molecule.
- the amount is preferably 0.05 to 10 parts by weight based on 100 parts by weight of the total amount of the compound (c) having a compound and the compound (d) having one carboxylic anhydride group in the molecule.
- a method for adding the catalyst it is added directly or used in a state dissolved in a soluble solvent or the like.
- an alcoholic solvent such as methanol or ethanol or water means that an unreacted compound (c) having two or more carboxylic acid anhydride groups in the molecule or one carboxylic acid anhydride in the molecule. Since it reacts with the compound (d) having a physical group, it is preferable to avoid it.
- zinc carboxylate such as zinc octylate can be preferably used as a catalyst from the viewpoint of improving corrosion gas permeability and heat resistance, From the viewpoint of reducing the coloration of the resulting polycarboxylic acid composition, it is preferable to carry out the reaction without a catalyst.
- calcium stearate in order to obtain a cured product having excellent transparency and resistance to sulfidation, calcium stearate, zinc carboxylate (zinc 2-ethylhexanoate, zinc stearate, zinc behenate, zinc myristylate) and zinc phosphate ester ( Zinc compounds such as zinc octyl phosphate and zinc stearyl phosphate are preferably used.
- the reaction temperature during the production of the polyvalent carboxylic acid resin (A) of the present invention is usually 20 to 160 ° C., preferably 50 to 150 ° C., particularly preferably 60 to 145 ° C., although it depends on the amount of catalyst and the solvent used. is there.
- the total reaction time is usually 1 to 20 hours, preferably 3 to 18 hours.
- the reaction may be performed in two or more stages. For example, the reaction may be performed at 20 to 100 ° C. for 1 to 8 hours and then at 100 to 160 ° C. for 1 to 12 hours.
- the compound (d) having one carboxylic acid anhydride group in the molecule is often highly volatile, and when such a compound is used, after reacting at 20 to 100 ° C. in advance, 100 to 160 By reacting at °C, volatilization can be suppressed. Thereby, not only can the diffusion of harmful substances into the atmosphere be suppressed, but also the polyvalent carboxylic acid resin (A) as designed can be obtained.
- the catalyst When manufacturing using a catalyst, the catalyst can be removed by quenching and / or washing with water as necessary, but it can be left as it is and used as a curing accelerator for the polycarboxylic acid composition. You can also.
- Preferred solvents include ketones such as methyl ethyl ketone, methyl isobutyl ketone and cyclopentanone, esters such as ethyl acetate, butyl acetate, ethyl lactate and isopropyl butanoate, hydrocarbons such as hexane, cyclohexane, toluene and xylene. Can be illustrated.
- ketones such as methyl ethyl ketone, methyl isobutyl ketone and cyclopentanone
- esters such as ethyl acetate, butyl acetate, ethyl lactate and isopropyl butanoate
- hydrocarbons such as hexane, cyclohexane, toluene and xylene.
- the polyvalent carboxylic acid resin (A) of the present invention is usually a liquid having fluidity at 25 ° C.
- the molecular weight is preferably from 800 to 80,000, more preferably from 1,000 to 10,000, even more preferably from 1500 to 8,000, and particularly preferably from 3,000 to 8,000 as the weight average molecular weight measured by GPC. If the weight average molecular weight is 800 or more, the fluidity at 25 ° C. is improved and the compatibility with the epoxy resin is also improved.
- the weight average molecular weight is a polystyrene equivalent weight average molecular weight (Mw) measured using GPC (gel permeation chromatography) under the following conditions.
- the acid value (measured by the method described in JIS K-2501) of the produced polyvalent carboxylic acid resin (A) of the present invention is preferably 35 to 200 mgKOH / g, more preferably 50 to 180 mgKOH / g. Particularly preferred is 60 to 150 mg KOH / g.
- An acid value of 35 mgKOH / g or more is preferable because mechanical properties of the cured product are improved, and 150 mgKOH / g or less is preferable because the cured product does not become too hard and has an appropriate elastic modulus.
- the functional group equivalent of the polyvalent carboxylic acid resin (A) of the present invention is preferably 280 to 1600 g / eq, more preferably 350 to 1100 g / eq, and particularly preferably 400 to 950 g / eq.
- the viscosity of the polycarboxylic acid resin (A) of the present invention is preferably 50 to 800,000 mPa ⁇ s, more preferably 500 to 100,000 mPa ⁇ s, Particularly preferred is 800 to 30,000 mPa ⁇ s. If the viscosity is less than 50 mPa ⁇ s, the viscosity may be too low to be suitable for use as an optical semiconductor encapsulant, and if it exceeds 800,000 mPa ⁇ s, the viscosity may be too high and workability may be poor. is there.
- a preferred embodiment of the present invention for obtaining a polyvalent carboxylic acid resin (A) excellent in balance of transparency, curability and light resistance is (i) a polyvalent having two or more hydroxyl groups in the molecule.
- the amount of the alcohol compound (e) used is 5 to 50 parts by weight per 100 parts by weight of the carbinol-modified silicone oil (a) at both ends, and the compound (d) having one carboxylic anhydride group in the molecule.
- the amount is 50 to 1000 parts by weight with respect to 100 parts by weight of the compound (c) having two or more carboxylic anhydride groups in the molecule, and two ends of the carbinol-modified silicone oil (a) and two in the molecule.
- Many having more than one hydroxyl group Compound (c) having two or more carboxylic acid anhydride groups in the molecule and compound (d) having one carboxylic acid anhydride group in the molecule with respect to 1 equivalent of the total alcoholic hydroxyl group of the alcohol compound (e)
- the amount of the polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule is from 10 to 10 parts per 100 parts by weight of the carbinol-modified silicone oil (a) at both ends.
- the amount of the polyvalent carboxylic acid resin (A) described in (i) or (iii) the compound (d) having one carboxylic anhydride group in the molecule obtained by setting it to 30 parts by weight,
- the polyvalent carboxylic acid resin (A) according to (i) which is obtained by adding 100 to 800 parts by weight per 100 parts by weight of the compound (c) having two or more carboxylic acid anhydride groups.
- the amount of the polyhydric alcohol compound (e) having two or more hydroxyl groups in the molecule is 10 to 10 parts by weight based on 100 parts by weight of the both-end carbinol-modified silicone oil (a). 30 parts by weight and the amount of the compound (d) having one carboxylic anhydride group in the molecule is 100 parts by weight based on 100 parts by weight of the compound (c) having two or more carboxylic anhydride groups in the molecule.
- the polyvalent carboxylic acid resin (A) described in (i) which is obtained by setting the amount to ⁇ 800 parts by weight (particularly preferably 400 to 700 parts by weight).
- the polyvalent carboxylic acid composition of the present invention contains the polyvalent carboxylic acid resin (A) and the epoxy resin (B) of the present invention as essential components.
- the epoxy resin (B) include an epoxy resin that is a glycidyl etherified product of a phenol compound, an epoxy resin that is a glycidyl etherified product of various novolak resins, an alicyclic epoxy resin, an aliphatic epoxy resin, a heterocyclic epoxy resin, Glycidyl ester epoxy resins, glycidyl amine epoxy resins, epoxy resins obtained by glycidylation of halogenated phenols, condensates of silicon compounds having an epoxy group with other silicon compounds, polymerizable unsaturated compounds having an epoxy group Examples thereof include copolymers with other polymerizable unsaturated compounds.
- Examples of the epoxy resin that is a glycidyl etherified product of the phenol compound include 2- [4- (2,3-epoxypropoxy) phenyl] -2- [4- [1,1-bis [4- (2,3 -Hydroxy) phenyl] ethyl] phenyl] propane, bisphenol A, bisphenol F, bisphenol S, 4,4'-biphenol, tetramethyl bisphenol A, dimethyl bisphenol A, tetramethyl bisphenol F, dimethyl bisphenol F, tetramethyl bisphenol S, Dimethylbisphenol S, tetramethyl-4,4′-biphenol, dimethyl-4,4′-biphenol, 1- (4-hydroxyphenyl) -2- [4- (1,1-bis- (4-hydroxyphenyl) Ethyl) phenyl] propane, 2,2'-methylene -Bis (4-methyl-6-tert-butylphenol), 4,4'-butylidene-bis (3-methyl-6
- novolac resins such as a novolak resin, a phenol novolac resin containing a xylylene skeleton, a phenol novolak resin containing a dicyclopentadiene skeleton, a phenol novolak resin containing a biphenyl skeleton, and a phenol novolac resin containing a fluorene skeleton.
- Examples of the alicyclic epoxy resin include alicyclic rings having an aliphatic ring skeleton such as 3,4-epoxycyclohexylmethyl- (3,4-epoxy) cyclohexylcarboxylate and bis (3,4-epoxycyclohexylmethyl) adipate.
- An epoxy resin is mentioned.
- Examples of the aliphatic epoxy resin include glycidyl ethers of polyhydric alcohols such as 1,4-butanediol, 1,6-hexanediol, polyethylene glycol, and pentaerythritol.
- heterocyclic epoxy resin examples include heterocyclic epoxy resins having a heterocyclic ring such as an isocyanuric ring and a hydantoin ring.
- examples of the glycidyl ester-based epoxy resin include epoxy resins made of carboxylic acid esters such as hexahydrophthalic acid diglycidyl ester.
- examples of the glycidylamine epoxy resin include epoxy resins obtained by glycidylating amines such as aniline and toluidine.
- epoxy resins obtained by glycidylating halogenated phenols include brominated bisphenol A, brominated bisphenol F, brominated bisphenol S, brominated phenol novolak, brominated cresol novolac, chlorinated bisphenol S, chlorinated bisphenol A, and the like.
- An epoxy resin obtained by glycidylating any of the halogenated phenols include brominated bisphenol A, brominated bisphenol F, brominated bisphenol S, brominated phenol novolak, brominated cresol novolac, chlorinated bisphenol S, chlorinated bisphenol A, and the like.
- Examples of the condensate of the silicon compound having an epoxy group and another silicon compound include a hydrolysis condensate of an alkoxysilane compound having an epoxy group and an alkoxysilane having a methyl group or a phenyl group, or an epoxy group. It is a condensate of an alkoxysilane compound and a polydimethylsiloxane having a silanol group, a polydimethyldiphenylsiloxane having a silanol group, or a condensate obtained by using them in combination.
- alkoxysilane compound having an epoxy group examples include 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, and 3-glycidoxypropyltrimethoxysilane. , 3-glycidoxypropylmethyldimethoxysilane and the like.
- alkoxysilane compound having a methyl group or a phenyl group examples include methyltrimethoxysilane, methyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, dimethyldimethoxysilane, diphenyldimethoxysilane, and methylphenyldimethoxysilane. .
- Examples of the polydimethylsiloxane having a silanol group and the polydimethyldiphenylsiloxane having a silanol group include X-21-5841, KF-9701 (manufactured by Shin-Etsu Chemical Co., Ltd.) BY16-873, which are commercially available products.
- PRX413 Toray Dow Corning Co., Ltd.
- Marproof G-0115S, G-0130S, G-0250S are commercially available products.
- Examples of the polymerizable unsaturated compound having an epoxy group include glycidyl acrylate, glycidyl methacrylate, 4 -Vinyl-1-cyclohexene-1,2-epoxide and the like.
- Examples of other polymerizable unsaturated compounds include methyl (meth) acrylate, ether (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, styrene, vinylcyclohexane and the like.
- These epoxy resins may be used alone or in combination of two or more.
- the epoxy equivalent (measured by the method described in JIS K-7236) of the above-described epoxy resin (B) is 150 to 1500 g / eq is preferable, and 350 to 1100 g / eq is more preferable. If the epoxy equivalent is 300 g / eq or more, the cured product does not become too hard, and the occurrence of cracks such as cracks is suppressed, and if it is 1500 g / eq or less, surface stickiness hardly occurs.
- the weight average molecular weight is preferably 250 to 10,000, and more preferably 300 to 5,000.
- a weight average molecular weight of 250 or more is preferable because the toughness of the cured product is improved and cracks such as cracks are less likely to occur in a heat cycle test or the like.
- a weight average molecular weight of 10,000 or less is preferred because the viscosity is unlikely to increase and workability is improved.
- the epoxy resins (B) having the epoxy equivalent and the weight average molecular weight described above from the viewpoint of transparency, heat-resistant transparency, light-resistant transparency, heat cycle resistance, etc., silicon compounds having an epoxy group and other silicon compounds The condensate with is more preferred.
- the weight average molecular weight in this invention is a polystyrene conversion and weight average molecular weight (Mw) measured by GPC (gel permeation chromatography) on the following conditions.
- GPC gel permeation chromatography
- Various conditions of GPC Manufacturer Shimadzu Corporation
- Solvent THF (tetrahydrofuran)
- Detector RI (differential refraction detector)
- the epoxy resin (B) is preferably used in the range where the epoxy group is 0.5 to 3.0 equivalents relative to 1 equivalent of the carboxylic acid group in the polyvalent carboxylic acid resin (A). If it is 0.5 equivalent or more, the heat resistant transparency of the cured product is improved, and if it is 3.0 or less, the mechanical property of the cured product is improved.
- the polyvalent carboxylic acid resin (A) of the present invention can be used alone as a curing agent for an epoxy resin, but is mixed with a polyvalent carboxylic acid resin (A) and a curing accelerator for an epoxy resin. Use as a curing agent is also a preferred embodiment.
- the curing accelerator to be mixed with the polyvalent carboxylic acid resin (A) any of those capable of accelerating the curing reaction between the epoxy group and the carboxylic acid and carboxylic acid anhydride can be used.
- agent examples include ammonium salt-based curing accelerators, phosphonium salt-based curing accelerators, metal soap-based curing accelerators, imidazole-based curing accelerators, amine-based curing accelerators, phosphine-based curing accelerators, and phosphite-based agents.
- examples thereof include a curing accelerator and a Lewis acid curing accelerator.
- ammonium salt-based curing accelerator for the curing agent for polyvalent carboxylic acid composition used for encapsulating optical semiconductors such as white LED with high brightness, ammonium salt-based curing accelerator, phosphonium salt-based curing acceleration because of its excellent transparency Agents and metal soap curing accelerators are particularly excellent.
- ammonium salt curing accelerator include tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, trimethylethylammonium hydroxide, trimethylpropylammonium hydroxide, trimethylbutylammonium hydroxide.
- Trimethylcetylammonium hydroxide Trimethylcetylammonium hydroxide, trioctylmethylammonium hydroxide, tetramethylammonium chloride, tetramethylammonium bromide, tetramethylammonium iodide, tetramethylammonium acetate, trioctylmethylammonium acetate and the like.
- the phosphonium salt curing accelerator include ethyltriphenylphosphonium bromide, tetraphenylphosphonium tetraphenylborate, methyltributylphosphonium dimethylphosphate, methyltributylphosphonium diethylphosphate, and the like.
- the metal soap-based curing accelerator examples include tin octylate, cobalt octylate, zinc octylate, manganese octylate, calcium octylate, sodium octylate, and potassium octylate. These curing accelerators may be used alone or in combination of two or more. Among these curing accelerators, trimethyl cetyl ammonium hydroxide, methyl tributyl phosphonium dimethyl phosphate, tin octylate, zinc octylate, and manganese octylate are preferable.
- calcium stearate in order to obtain a cured product having excellent transparency and resistance to sulfidation, calcium stearate, zinc carboxylate (zinc 2-ethylhexanoate, zinc stearate, zinc behenate, zinc myristylate) and zinc phosphate ester ( Zinc compounds such as zinc octyl phosphate and zinc stearyl phosphate are preferably used.
- ammonium salt-based curing accelerators phosphonium salt-based curing accelerators, metal soap-based curing accelerators, imidazole-based curing accelerators, amine-based curing accelerators, and heterocyclic compound-based curing accelerators.
- a phosphine-based curing accelerator, a phosphite-based curing accelerator, a Lewis acid-based curing accelerator, or the like can be used.
- imidazole curing accelerator examples include 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenyl-4-methylimidazole, 1 -Benzyl-2-phenylimidazole, 1-benzyl-2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazole, 2,3-dihydro -1H-pyrrolo- [1,2-a] benzimidazole, 2,4-diamino-6 (2'-methylimidazole (1 ')) ethyl-s-triazine, 2,4-diamino-6 (2'- Undecylimidazole (1 ′)) ethyl-s-triazine
- Examples of the amine curing accelerator include triethylamine, tripropylamine, tributylamine and the like.
- Examples of the heterocyclic compound type curing accelerator include pyridine, dimethylaminopyridine, 1,8-diazabicyclo [5.4.0] undec-7-ene, imidazole, triazole, tetrazole and the like.
- Examples of the phosphine curing accelerator include triethylphosphine, tributylphosphine, triphenylphosphine, and the like.
- Examples of the phosphite curing accelerator include trimethyl phosphite and triethyl phosphite.
- Lewis acid curing accelerator examples include BF 3 monoethylamine, BF 3 diethylamine, BF 3 triethylamine, BF 3 benzylamine, BF 3 aniline, BF 3 piperazine, BF 3 piperidine, PF 5 ethyl amine, PF 5 butyl amine, and PF 5 Examples include laurylamine, PF 5 benzylamine, AsF 5 laurylamine and the like. These curing accelerators may be used alone or in combination of two or more. Which of these curing catalysts is used is appropriately selected depending on characteristics required for the obtained transparent resin composition, such as transparency, curing speed, and working conditions.
- curing accelerators are usually used in the range of 0.001 to 15 parts by weight with respect to 100 parts by weight of the polyvalent carboxylic acid resin (A).
- the polyvalent carboxylic acid composition of the present invention can be obtained by uniformly mixing the above components at room temperature or under heating. For example, mix thoroughly until uniform using an extruder, kneader, three rolls, universal mixer, planetary mixer, homomixer, homodisper, bead mill, etc., and if necessary, filter with SUS mesh etc. Prepared.
- polyvalent carboxylic acid resin (A) and the polyvalent carboxylic acid composition of the present invention another epoxy resin curing agent can be used in combination as necessary.
- the epoxy resin curing agent that can be used in combination include polyvalent carboxylic acids, carboxylic anhydrides, phenols, hydrazines, and mercaptans.
- polyvalent carboxylic acids examples include aliphatic polyvalent carboxylic acids, cycloaliphatic polyvalent carboxylic acids, aromatic polyvalent carboxylic acids, and heterocyclic polyvalent carboxylic acids.
- aliphatic polycarboxylic acid examples include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, 1,2,3-propanetricarboxylic acid, 1, Examples include 2,3,4-butanetetracarboxylic acid.
- cycloaliphatic polyvalent carboxylic acid examples include hexahydrophthalic acid, 1,3-adamantane diacetic acid, 1,3-adamantane dicarboxylic acid, tetrahydrophthalic acid, 2,3-norbornene dicarboxylic acid, 1,2,4 -Cyclohexanetricarboxylic acid, 1,3,5-cyclohexanetricarboxylic acid, 1,2,3-cyclohexanetricarboxylic acid, 1,2,4,6-cyclohexanetetracarboxylic acid and the like.
- aromatic polyvalent carboxylic acid examples include phthalic acid, isophthalic acid, terephthalic acid, 1,2-naphthalenedicarboxylic acid, 1,4-naphthalenedicarboxylic acid, 1,8-naphthalenedicarboxylic acid, and 2,3-naphthalenedicarboxylic acid.
- carboxylic acid anhydrides include aliphatic carboxylic acid anhydrides, cycloaliphatic carboxylic acid anhydrides, and aromatic carboxylic acid anhydrides.
- aliphatic carboxylic acid anhydride include succinic acid anhydride, methyl succinic acid anhydride, ethyl succinic acid anhydride, 2,3-butanedicarboxylic acid anhydride, 2,4-pentanedicarboxylic acid anhydride, 3,5- Examples include heptane dicarboxylic acid anhydride, 1,2,3,4-butanetetracarboxylic dianhydride, maleic acid anhydride, dodecyl succinic acid anhydride and the like.
- Cyclic aliphatic carboxylic acid anhydrides include hexahydrophthalic acid anhydride, methyl hexahydrophthalic acid anhydride, 1,3-cyclohexanedicarboxylic acid anhydride, hydrogenated nadic acid anhydride, hydrogenated methyl nadic acid anhydride, Bicyclo [2,2,2] octane-2,3-dicarboxylic anhydride, 1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, nadic acid Anhydride, methyl nadic anhydride, 4,5-dimethyl-4-cyclohex
- aromatic carboxylic anhydride examples include phthalic anhydride, isophthalic anhydride, terephthalic anhydride, trimellitic anhydride, pyromellitic anhydride, and the like.
- 5- (2,5-dioxotetrahydrofuryl) -3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, 4- (2,5-dioxotetrahydrofuran-3-yl) -1 examples thereof include compounds having an aliphatic carboxylic acid anhydride and a cyclic aliphatic carboxylic acid anhydride in the same compound such as 2,3,4-tetrahydronaphthalene-1,2-dicarboxylic acid anhydride.
- phenols examples include bisphenol A, bisphenol F, bisphenol S, 4,4′-biphenylphenol, tetramethyl bisphenol A, dimethyl bisphenol A, tetramethyl bisphenol F, dimethyl bisphenol F, tetramethyl bisphenol S, dimethyl bisphenol S.
- hydrazines examples include isophthalic acid dihydrazide, adipic acid dihydrazide, sebacic acid dihydrazide, dodecanedioic acid dihydrazide, 2,6-naphthalenedicarboxylic acid dihydrazide, and the like.
- Examples of the mercaptans include trimethylolpropane tris (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate), tris [(3 -Mercaptopropionyloxy) -ethyl], isocyanurate 1,4-bis (3-mercaptobutyryloxy) butane, pentaerythritol tetrakis (3-mercaptobutyrate), 1,3,5-tris (3-mercaptobutyl Oxyethyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione and the like.
- epoxy resin curing agents may be used alone or in combination of two or more.
- the proportion of the polyvalent carboxylic acid resin (A) in the total curing agent is 50% by weight or more.
- the amount used is preferably adjusted to 80% by weight or more.
- a coupling agent, a phosphor, an inorganic filler, highly heat conductive fine particles, a phosphorus compound filler as a flame retardant, a binder resin, etc. are added to the polyvalent carboxylic acid composition of the present invention as necessary. can do.
- Examples of coupling agents that can be used include 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, and 2- (3,4-epoxycyclohexyl) ethyl.
- Trimethoxysilane N- (2-aminoethyl) 3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) 3-aminopropylmethyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-mercaptopropyltri Methoxysilane, vinyltrimethoxysilane, N- (2- (vinylbenzylamino) ethyl) 3-aminopropyltrimethoxysilane hydrochloride, 3-methacryloxypropyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloro Silane coupling agents such as propyltrimethoxysilane; isopropyl (N-ethylaminoethylamino) titanate, isopropyl triisostearoyl titanate, titanium di (dioctyl pyrophosphate) oxyacetate
- the coupling agents may be used alone or in combination of two or more.
- the use of a coupling agent can be expected to improve the adhesion to the substrate and the hardness of the cured product.
- the coupling agent is usually contained in an amount of 0.05 to 20 parts by weight, preferably 0.1 to 10 parts by weight, if necessary, in the polyvalent carboxylic acid composition component of the present invention.
- phosphors examples include phosphors such as YAG phosphors, TAG phosphors, orthosilicate phosphors, thiogallate phosphors, and sulfide phosphors. Fluorescence can be imparted to the polyvalent carboxylic acid composition by adding a phosphor.
- inorganic fillers examples include powders of crystalline silica, fused silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, silicon nitride, boron nitride, zirconia, fosterite, steatite, spinel, titania, talc and the like. Or a bead obtained by spheroidizing these.
- an inorganic filler heat resistance and light resistance can be imparted, viscosity can be adjusted, and the like.
- an amount occupying 0 to 95 parts by weight in the polyvalent carboxylic acid composition of the present invention is used.
- Examples of the high thermal conductive fine particles that can be used include metal particles such as gold, silver, copper, iron, nickel, tin, aluminum, cobalt, and indium, and alloys thereof, metal oxides such as aluminum oxide, magnesium oxide, and titanium oxide, Examples thereof include metal nitrides such as boron nitride and aluminum nitride, carbon compounds such as graphite, diamond and carbon black, and metal-coated particles obtained by coating a resin layer with a metal layer.
- metal particles such as gold, silver, copper, iron, nickel, tin, aluminum, cobalt, and indium
- metal oxides such as aluminum oxide, magnesium oxide, and titanium oxide
- metal nitrides such as boron nitride and aluminum nitride
- carbon compounds such as graphite, diamond and carbon black
- metal-coated particles obtained by coating a resin layer with a metal layer.
- the phosphorus-containing compound that can be used may be a reactive type or an additive type.
- Examples of phosphorus-containing compounds include trimethyl phosphate, triethyl phosphate, tricresyl phosphate, trixylylenyl phosphate, cresyl diphenyl phosphate, cresyl-2,6-dixylylenyl phosphate, 1,3-phenylenebis (dixylyl).
- Phosphoric esters such as lenyl phosphate), 1,4-phenylenebis (dixylylenyl phosphate), 4,4′-biphenyl (dixylylenyl phosphate), 9,10-dihydro-9-oxa-10 -Phosphanphenanthrene-10-oxide, 10 (2,5-dihydroxyphenyl) -10H-9-oxa-10-phosphaphenanthrene-10-oxide, and other phosphanes, epoxy resin and active hydrogen of the phosphanes Phosphorus containing epoxy obtained by reaction Xyl compounds, red phosphorus, and the like.
- Phosphoric esters, phosphanes, or phosphorus-containing epoxy compounds are preferable, and 1,3-phenylenebis (dixylenyl phosphate), 1,4-phenylenebis (dixylylene). Nyl phosphate), 4,4′-biphenyl (dixylylenyl phosphate) or phosphorus-containing epoxy compounds are preferred.
- Binder resins that can be used include butyral resins, acetal resins, acrylic resins, epoxy-nylon resins, NBR-phenol resins, epoxy-NBR resins, polyamide resins, polyimide resins, and silicone resins. Although it is mentioned, it is not limited to these.
- the binder resin is usually contained in an amount of 0.05 to 50 parts by weight, preferably 0.05 to 20 parts by weight, if necessary, in the polyvalent carboxylic acid composition component of the present invention.
- the polyvalent carboxylic acid composition of the present invention includes a release agent such as stearic acid, palmitic acid, zinc stearate, and calcium stearate, a coloring agent such as a dye and a pigment, an antioxidant, a light stabilizer, and improved moisture resistance.
- a release agent such as stearic acid, palmitic acid, zinc stearate, and calcium stearate
- a coloring agent such as a dye and a pigment
- an antioxidant a light stabilizer
- improved moisture resistance such as a dye and a pigment
- Agent, thixotropy imparting agent, antifoaming agent, tackifier, impact resistance improving agent, ion trapping agent, antistatic agent, lubricant, leveling agent, surface tension reducing agent, antifoaming agent, anti-settling agent, surfactant Additives such as ultraviolet absorbers, various thermosetting resins, and other various resins can be added. These are added to the polyvalent carboxylic acid composition of the present invention by
- Examples of the light stabilizer that can be used include bis (1-undecanoxy-2,2,6,6-tetramethylpiperidin-4-yl) carbonate, tetrakis (1,2,2,6,6-pentamethyl-4).
- -Piperidyl) 1,2,3,4-butanetetracarboxylate
- tetrakis (2,2,6,6-totramethyl-4-piperidyl) 1,2,3,4-butanetetracarboxylate, 1,2 3,4-butanetetracarboxylic acid and 1,2,2,6,6-pentamethyl-4-piperidinol and 3,9-bis (2-hydroxy-1,1-dimethylethyl) -2,4,8,
- Mixed esterified product with 10-tetraoxaspiro [5.5] undecane, bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, 2,2,6,6, -tetramethy -4-piperidyl methacrylate, bis (2,
- the polyvalent carboxylic acid composition of the present invention is used for an optical material, particularly an optical semiconductor sealing agent, it is particularly preferable to contain a phosphorus compound as an antioxidant.
- the phosphorus compound is not particularly limited.
- 1,1,3-tris (2-methyl-4-ditridecyl phosphite-5-tert-butylphenyl) butane distearyl pentaerythritol diphosphite, bis (2,4-di-tert-butylphenyl) pentaerythritol diphosphite, bis (2,6-di-tert-butyl-4-methylphenyl) pentaerythritol diphosphite, phenylbisphenol A pentaerythritol diphosphite, Dicyclohexylpentaerythritol diphosphite, tris (diethylphenyl) phosphite, tris (di-isopropylphenyl) phosphite, tris (di-n-butylphenyl) phosphite, tris (2,4-di
- the commercially available phosphorus compounds are not particularly limited.
- Adeka Stab PEP-4C, Adeka Stub PEP-8, Adeka Stub PEP-24G, Adeka Stub PEP-36, Adeka Stub HP-10, Adeka Stub 2112, Adeka Stub 260 are manufactured by Adeka.
- the ratio of the phosphorus compound is 0.005 to 5% by weight, more preferably 0.01 to 4% by weight, still more preferably 0.1 to 2% by weight with respect to the polyvalent carboxylic acid resin (A). %.
- the polyvalent carboxylic acid composition of the present invention can contain a phenol compound as an antioxidant other than the phosphorus compound.
- the phenolic compound is not particularly limited, and examples thereof include 2,6-di-tert-butyl-4-methylphenol and n-octadecyl-3- (3,5-di-tert-butyl-4-hydroxyphenyl).
- the commercially available phenolic compounds are not particularly limited. , ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-60, ADK STAB AO-70, ADK STAB AO-80, ADK STAB AO-90, ADK STAB AO-330, Sumitizer GA-80 manufactured by Sumitomo Chemical Co., Ltd. , Sumilizer MDP-S, Sumil izer BBM-S, SumizerzGM, SumizerilGS (F), SumizerzGP, and the like.
- THINUVIN 328, THINUVIN 234, THINUVIN 326, THINUVIN 120, THINUVIN 477, THINUVIN 479, CHIMASSORB 2020FDL, CHIMASSORB 119FL and the like can be cited as those manufactured by Ciba Specialty Chemicals.
- the blending amount is not particularly limited, but it is preferably in the range of 0.005 to 5.0% by weight with respect to the polyvalent carboxylic acid composition of the present invention.
- the polyvalent carboxylic acid composition of the present invention is used for an optical material, particularly an optical semiconductor sealing agent
- a phosphor can be added as necessary.
- the phosphor has a function of forming white light by absorbing part of blue light emitted from a blue LED element and emitting wavelength-converted yellow light.
- the optical semiconductor is sealed.
- fluorescent substance A conventionally well-known fluorescent substance can be used, For example, rare earth element aluminate, thio gallate, orthosilicate, etc. are illustrated.
- phosphors such as a YAG phosphor, a TAG phosphor, an orthosilicate phosphor, a thiogallate phosphor, and a sulfide phosphor can be mentioned, and YAlO 3 : Ce, Y 3 Al 5 O1 2 : Ce, Y 4 Al 2 O 9 : Ce, Y 2 O 2 S: Eu, Sr 5 (PO 4 ) 3 Cl: Eu, (SrEu) O.Al 2 O 3 and the like are exemplified.
- the particle size of the phosphor those having a particle size known in this field are used, and the average particle size is preferably 1 to 250 ⁇ m, particularly preferably 2 to 50 ⁇ m. When these phosphors are used, the addition amount thereof is 1 to 80 parts by weight, preferably 5 to 60 parts by weight with respect to 100 parts by weight of the resin component.
- silica fine powder also called aerosil or aerosol
- An agent for imparting thixotropic properties can be added.
- silica fine powders examples include Aerosil® 50, Aerosil® 90, Aerosil® 130, Aerosil® 200, Aerosil® 300, Aerosil® 380, Aerosil® OX50, Aerosil® TT600, Aerosil® R972, Aerosil® R202, Aerosil® R202, Aerosil® R202, Aerosil® R202, Aerosil® R202, Aerosil® R805, RY200, RX200 (manufactured by Nippon Aerosil Co., Ltd.) and the like can be mentioned.
- the polyvalent carboxylic acid composition of the present invention can be used as a varnish or ink by mixing a solvent as necessary.
- the solvent is used as long as it has high solubility in each component such as the polyvalent carboxylic acid resin (A), epoxy resin (B), curing accelerator, and other additives of the present invention and does not react with them.
- alcohols such as methanol, ethanol, propanol and butanol
- ethylene glycol monomethyl ether ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, 3-methoxybutanol, 3-methyl- Glycol ethers such as 3-methoxybutanol, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether Alkylene glycol ether acetates such as acetate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, ethylethoxypropiolate; aromatic hydrocarbons such as benzene, toluene, xylene; acetone, methyl ethyl ketone, methyl isobutyl Ketones such as ketone,
- dimethylformamide, dimethylacetamide, dimethylsulfoxide, acetonitrile and the like can be used as the aprotic polar solvent.
- These solvents are usually contained in an amount of 2 to 98 parts by weight in the polyvalent carboxylic acid composition component of the present invention as required.
- the polyvalent carboxylic acid composition of the present invention when used as a varnish or ink using a solvent may be subjected to microfiltration using, for example, a 0.05 to 2 ⁇ m filter.
- the polyvalent carboxylic acid composition of the present invention is used as a sealing material for an optical semiconductor such as a high-intensity white LED or a die bond material
- a polyvalent carboxylic acid composition is prepared by thoroughly mixing other curing agents, curing accelerators, coupling materials, antioxidants, light stabilizers, phosphors, silica fine powders and the like. , Used as a sealing material, or as both a die bond material and a sealing material.
- a mixing method a kneader, a three-roll, a universal mixer, a planetary mixer, a homomixer, a homodisper, a bead mill or the like is used to mix at room temperature or warm.
- Optical semiconductor elements such as high-intensity white LEDs are generally GaAs, GaP, GaAlAs, GaAsP, AlGa, InP, GaN, InN, AlN, InGaN laminated on a substrate of sapphire, spinel, SiC, Si, ZnO or the like.
- Such a semiconductor chip is bonded to a lead frame, a heat sink, or a package using an adhesive (die bond material).
- a wire such as a gold wire is connected to pass an electric current.
- the semiconductor chip is sealed with a sealing material such as an epoxy resin in order to protect it from heat and moisture and play a role of a lens.
- the polyvalent carboxylic acid composition of the present invention can be used as this sealing material and die bond material. From the viewpoint of the process, it is convenient to use the polyvalent carboxylic acid composition of the present invention for both the die bond material and the sealing material.
- the polyvalent carboxylic acid composition of the present invention is applied by dispenser, potting, or screen printing, and then placed on the semiconductor chip. Then, the semiconductor chip can be bonded by heat curing.
- the heating methods such as hot air circulation, infrared rays and high frequency can be used.
- the heating conditions are preferably 80 to 230 ° C. for about 1 minute to 24 hours.
- post-curing is performed at 120 to 180 ° C. for 30 minutes to 10 hours. it can.
- a compression molding method or the like in which a semiconductor chip fixed on a substrate is immersed therein and heat-cured and then released from a mold is used.
- the injection method include dispenser, transfer molding, injection molding and the like.
- methods such as hot air circulation, infrared rays and high frequency can be used.
- the heating conditions are preferably 80 to 230 ° C. for about 1 minute to 24 hours.
- pre-curing is performed at 80 to 120 ° C. for 30 minutes to 5 hours, and then post-curing is performed at 120 to 80 ° C. for 30 minutes to 10 hours. it can.
- the polyvalent carboxylic acid resin (A) of the present invention has a specific structure, is liquid at room temperature (25 ° C.), has excellent epoxy resin curability, and is usually employed to cure the epoxy resin. Very low volatility in the area.
- the polyvalent carboxylic acid composition containing the polyvalent carboxylic acid resin (A) of the present invention can be used for various applications including optical component materials in which ordinary epoxy resin compositions are used.
- the optical material refers to general materials used for applications that allow light such as visible light, infrared light, ultraviolet light, X-rays, and lasers to pass through the material. More specifically, in addition to the optical semiconductor sealing material such as lamp type and SMD type, and the optical semiconductor die bond material, the following may be mentioned.
- It is a peripheral material for liquid crystal display devices such as a substrate material, a light guide plate, a prism sheet, a deflection plate, a retardation plate, a viewing angle correction film, an adhesive, and a film for a liquid crystal such as a polarizer protective film in the liquid crystal display field.
- color PDP plasma display
- antireflection films antireflection films
- optical correction films housing materials
- front glass protective films front glass replacement materials
- adhesives and LED displays that are expected as next-generation flat panel displays
- LED molding materials LED sealing materials, front glass protective films, front glass substitute materials, adhesives, and substrate materials for plasma addressed liquid crystal (PALC) displays, light guide plates, prism sheets, deflection plates , Phase difference plate, viewing angle correction film, adhesive, polarizer protective film, front glass protective film in organic EL (electroluminescence) display, front glass substitute material, adhesive, and various in field emission display (FED) Film substrate
- PLC plasma addressed liquid crystal
- VD video disc
- CD / CD-ROM CD-R / RW
- DVD-R / DVD-RAM MO / MD
- PD phase change disc
- disc substrate materials for optical cards Pickup lenses, protective films, sealing materials, adhesives and the like.
- optical equipment In the field of optical equipment, they are steel camera lens materials, finder prisms, target prisms, finder covers, and light receiving sensor parts. It is also a photographic lens and viewfinder for video cameras. Projection lenses for projection televisions, protective films, sealing materials, adhesives, and the like. These include lens materials, sealing materials, adhesives, and films for optical sensing devices.
- optical components In the field of optical components, they are fiber materials, lenses, waveguides, element sealing materials, adhesives and the like around optical switches in optical communication systems. Optical fiber materials, ferrules, sealing materials, adhesives, etc. around the optical connector. For optical passive components and optical circuit components, there are lenses, waveguides, LED sealing materials, CCD sealing materials, adhesives, and the like.
- OEIC optoelectronic integrated circuit
- automotive lamp reflectors In the field of automobiles and transport equipment, automotive lamp reflectors, bearing retainers, gear parts, anti-corrosion coatings, switch parts, headlamps, engine internal parts, electrical parts, various interior and exterior parts, drive engines, brake oil tanks, automobile protection Rusted steel plates, interior panels, interior materials, protective / bundling wireness, fuel hoses, automobile lamps, glass replacements.
- it is a multilayer glass for railway vehicles.
- they are toughness imparting agents for aircraft structural materials, engine peripheral members, protective / bundling wireness, and corrosion-resistant coatings.
- it In the construction field, it is interior / processing materials, electrical covers, sheets, glass interlayers, glass substitutes, and solar cell peripheral materials. For agriculture, it is a house covering film.
- Next generation optical / electronic functional organic materials include peripheral materials for organic EL elements, organic photorefractive elements, optical amplification elements that are light-to-light conversion devices, optical computing elements, substrate materials around organic solar cells, fiber materials, elements Sealing material, adhesive and the like.
- sealing agents potting, dipping, transfer mold sealing for capacitors, transistors, diodes, light-emitting diodes, ICs, LSIs, potting sealings for ICs, LSIs such as COB, COF, TAB, flip chip
- underfill for sealing, and sealing (reinforcing underfill) when mounting IC packages such as BGA and CSP.
- optical materials include general uses in which epoxy resin compositions are used.
- sealant including printed circuit boards and wire coatings
- additives to other resins and the like can be mentioned.
- the adhesive include civil engineering, architectural, automotive, general office, and medical adhesives, and electronic material adhesives.
- adhesives for electronic materials include interlayer adhesives for multilayer substrates such as build-up substrates, die bonding agents, semiconductor adhesives such as underfills, BGA reinforcing underfills, anisotropic conductive films ( ACF) and an adhesive for mounting such as anisotropic conductive paste (ACP).
- the cured product obtained from this is excellent in transparency, it is extremely useful as a curing agent for epoxy resins for sealing high-intensity white LEDs and other optical semiconductors.
- Other uses include raw materials such as polyimide resins, modifiers, plasticizers, lubricating oil raw materials, cyanate resin compositions for substrates, additives to other resins, raw materials for paint resins, toner resins, medicines, etc. Useful as an agrochemical intermediate.
- Example 1 A glass separable flask equipped with a stirrer, a Dimroth condenser and a thermometer, 47.1 parts carbinol-modified silicone X22-160AS (manufactured by Shin-Etsu Chemical Co., Ltd.), Adeka New Ace Y9- which is a polyester polyol 10 (made by ADEKA Co., Ltd., 11.8 parts of a polyester polyol in which R 3 is a neopentyl group and R 4 is a butyl group in the above formula (2)), Ricacid TDA-100 (4- (2,5-dioxotetrahydrofuran) -3-yl) -1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic acid anhydride (manufactured by Shin Nippon Rika Co., Ltd.) 7.4 parts, licacid MH (methylhexahydrophthalic acid anhydride, 12.5 parts of Nippon Nippon R
- Example 2 A glass separable flask equipped with a stirrer, a Dimroth condenser and a thermometer, 47.1 parts carbinol-modified silicone X22-160AS (manufactured by Shin-Etsu Chemical Co., Ltd.), Adeka New Ace Y9- which is a polyester polyol 10 (made by ADEKA Co., Ltd., 11.8 parts of a polyester polyol in which R 3 is a neopentyl group and R 4 is a butyl group in the above formula (2)), Ricacid BT-100 (butanetetracarboxylic dianhydride, Shin Nihon) 2.5 parts of Rika Co., Ltd.) and 16.6 parts of Guatemalacid MH (methylhexahydrophthalic anhydride, Shin Nippon Rika Co., Ltd.) were allowed to react at 140 ° C.
- carbinol-modified silicone X22-160AS manufactured by Shin-Etsu Chemical Co., Ltd.
- Example 3 A glass separable flask equipped with a stirrer, a Dimroth condenser and a thermometer, 47.1 parts carbinol-modified silicone X22-160AS (manufactured by Shin-Etsu Chemical Co., Ltd.), Adeka New Ace Y9- which is a polyester polyol 10 (made by ADEKA Co., Ltd., 11.8 parts of a polyester polyol in which R 3 is a neopentyl group and R 4 is a butyl group in the above formula (2)), Ricacid BT-100 (butanetetracarboxylic dianhydride, Shin Nihon) 4.9 parts of Rika Co., Ltd.) and 12.5 parts of Ricacid MH (methylhexahydrophthalic anhydride, Shin Nippon Rika Co., Ltd.) were allowed to react at 140 ° C.
- carbinol-modified silicone X22-160AS manufactured by Shin-Etsu Chemical Co., Ltd.
- Example 4 In a glass separable flask equipped with a stirrer, a Dimroth condenser, and a thermometer, 47.1 parts carbinol-modified silicone X22-160AS (manufactured by Shin-Etsu Chemical Co., Ltd.), 1,10- which is a hydrocarbon polyol. 11.8 parts of decanediol, 9.8 parts of Rikacid BT-100 (butanetetracarboxylic dianhydride, manufactured by Shin Nippon Rika Co., Ltd.), Rikacid MH (methylhexahydrophthalic anhydride, Shin Nippon Rika Co., Ltd.) 24.9 parts) were prepared and reacted at 140 ° C.
- the polyvalent carboxylic acid resin (A-4) of the present invention was obtained 90.8 parts of the polyvalent carboxylic acid resin (A-4) of the present invention.
- the acid value of the obtained compound was 89.3 mgKOH / g, the weight average molecular weight was 5604, the viscosity was 23296 mPa ⁇ s, and the appearance was a colorless transparent liquid.
- Example 5 In a glass separable flask equipped with a stirrer, a Dimroth condenser, and a thermometer, 47.1 parts carbinol-modified silicone X22-160AS (manufactured by Shin-Etsu Chemical Co., Ltd.), tricyclodecandi which is a hydrocarbon polyol 11.8 parts of methanol, 8.7 parts of Guatemalacid BT-100 (butanetetracarboxylic dianhydride, manufactured by Shin Nippon Rika Co., Ltd.), Guatemalacid MH (methylhexahydrophthalic anhydride, manufactured by Shin Nippon Rika Co., Ltd.) ) 22.2 parts were charged and reacted at 140 ° C.
- carbinol-modified silicone X22-160AS manufactured by Shin-Etsu Chemical Co., Ltd.
- tricyclodecandi which is a hydrocarbon polyol 11.8 parts of methanol
- 8.7 parts of Ricacid BT-100 butanet
- Example 6 In a glass separable flask equipped with a stirrer, a Dimroth condenser, and a thermometer, 47.1 parts of both-end carbinol-modified silicone X22-160AS (manufactured by Shin-Etsu Chemical Co., Ltd.) and 2,4-hydrocarbon polyol 2,4- 11.8 parts of diethylpentane-1,5-diol, 9.7 parts of Ricacid BT-100 (butanetetracarboxylic dianhydride, manufactured by Shin Nippon Rika Co., Ltd.), Rikacid MH (methylhexahydrophthalic anhydride, 24.9 parts (manufactured by Shin Nippon Chemical Co., Ltd.) were charged and reacted at 140 ° C.
- both-end carbinol-modified silicone X22-160AS manufactured by Shin-Etsu Chemical Co., Ltd.
- the acid value of the obtained compound was 81.1 mgKOH / g, the weight average molecular weight was 5203, the viscosity was 593920 mPa ⁇ s, and the appearance was a colorless transparent liquid.
- Polycarboxylic acid resins A-1 to A-6 obtained in Examples 1 to 6 and Comparative Example 1 include liquid acid anhydride compound Göcid MH (methylhexahydrophthalic anhydride, Shin Nippon The properties of Rika Co., Ltd.) are summarized in Table 1.
- Synthesis Example 1 (Synthesis of a condensate between a silicon compound having an epoxy group and another silicon compound) 394 parts of 2- (3,4 epoxycyclohexyl) ethyltrimethoxysilane, 475 parts of polydimethyldiphenylsiloxane having a silanol group with a molecular weight of 1700 (measured by GPC), 4 parts of 0.5% KOH methanol solution, and 36 parts of isopropyl alcohol The reaction vessel was charged and heated to 75 ° C. After raising the temperature, the reaction was carried out under reflux for 10 hours.
- Synthesis Example 2 (Synthesis of a condensate between a silicon compound having an epoxy group and another silicon compound) 197 parts of 2- (3,4 epoxycyclohexyl) ethyltrimethoxysilane, 534 parts of polydimethyldiphenylsiloxane having a silanol group with a molecular weight of 1700 (measured by GPC), 4 parts of 0.5% KOH methanol solution, and 36 parts of isopropyl alcohol The reaction vessel was charged and heated to 75 ° C. After raising the temperature, the reaction was carried out under reflux for 10 hours.
- Example 7 100 parts of the polycarboxylic acid resin (A-1) obtained in Example 1, 71 parts of the siloxane compound (B-1) having an epoxy group obtained in Synthesis Example 1 as an epoxy resin, obtained in Synthesis Example 2 71 parts of a siloxane compound (B-2) having an epoxy group was added, mixed and degassed for 5 minutes to obtain a polyvalent carboxylic acid composition.
- Example 8 100 parts of the polycarboxylic acid resin (A-2) obtained in Example 2 and 110 parts of the siloxane compound (B-1) having an epoxy group obtained in Synthesis Example 1 were added as an epoxy resin and mixed for 5 minutes. Defoaming was performed to obtain a polycarboxylic acid composition.
- Example 9 100 parts of the polycarboxylic acid resin (A-3) obtained in Example 3, 100 parts of the liquid carboxylic acid compound (A-7) obtained in Synthesis Example 3, and the epoxy obtained in Synthesis Example 1 as an epoxy resin 220 parts of the siloxane compound (B-1) having a group was added, mixed and degassed for 5 minutes to obtain a polyvalent carboxylic acid composition.
- Example 10 100 parts of the polyvalent carboxylic acid resin (A-4) obtained in Example 4, 100 parts of the liquid carboxylic acid compound (A-7) obtained in Synthesis Example 3, and the epoxy obtained in Synthesis Example 1 as an epoxy resin 121.5 parts of the siloxane compound (B-1) having a group and 121.5 parts of the siloxane compound (B-2) having an epoxy group obtained in Synthesis Example 2 were mixed, defoamed for 5 minutes, and mixed. A monovalent carboxylic acid composition was obtained.
- Example 11 100 parts of the polycarboxylic acid resin (A-5) obtained in Example 5, 100 parts of the liquid carboxylic acid compound (A-7) obtained in Synthesis Example 3, and the epoxy obtained in Synthesis Example 1 as an epoxy resin 206 parts of the siloxane compound (B-1) having a group was added, mixed and degassed for 5 minutes to obtain a polyvalent carboxylic acid composition.
- Example 12 100 parts of the polycarboxylic acid resin (A-6) obtained in Example 6, 100 parts of the liquid carboxylic acid compound (A-7) obtained in Synthesis Example 3, and the epoxy obtained in Synthesis Example 1 as an epoxy resin 210 parts of the siloxane compound (B-1) having a group was added, mixed and degassed for 5 minutes to obtain a polyvalent carboxylic acid composition.
- Comparative Example 2 Add 100 parts of the liquid carboxylic acid compound (A-7) obtained in Synthesis Example 3 and 100 parts of the siloxane compound (B-1) having an epoxy group obtained in Synthesis Example 1 as an epoxy resin, and mix for 5 minutes. Foaming was performed to obtain an epoxy resin composition.
- Viscosity after mixing The polycarboxylic acid compositions obtained in Examples 7 to 12 and Comparative Example 2 were subjected to vacuum degassing for 5 minutes, and then measured at 25 ° C. using an E-type viscometer.
- Durometer hardness The polyvalent carboxylic acid compositions obtained in Examples 7 to 12 and Comparative Example 2 were vacuum degassed for 5 minutes, and then poured into a mold using an aluminum foil so as to have a diameter of 30 mm and a height of 70 mm. The casting was cured at 120 ° C. for 3 hours after pre-curing at 120 ° C. for 1 hour to obtain a test piece for durometer hardness having a thickness of 7 mm.
- the durometer hardness (type A) of the obtained test piece was measured by the method described in JIS K-6253. (3) cured product transmittance; Glass substrates on which dams were made with heat-resistant tape so that the polyvalent carboxylic acid compositions obtained in Examples 7 to 12 and Comparative Example 2 were vacuum degassed for 5 minutes and then 30 mm ⁇ 20 mm ⁇ height 0.8 mm Cast gently on top. The cast was cured at 120 ° C. for 3 hours after pre-curing at 120 ° C. for 1 hour to obtain a test piece for transmittance having a thickness of 0.8 mm. The obtained specimen was measured for light transmittance at 400 nm under the following conditions.
- Spectrophotometer measurement conditions Manufacturer Hitachi High-Technologies Corporation Model: U-3300 Slit width: 2.0nm Scan speed: 120 nm / min (4) dent test;
- the polyvalent carboxylic acid compositions obtained in Examples 7 to 12 and Comparative Example 2 were vacuum degassed for 5 minutes, filled into a syringe, and mounted with a light emitting element having an emission wavelength of 450 nm using a precision discharge device.
- the surface-mounted LED was cast so that the opening was flat. After pre-curing at 120 ° C. for 1 hour, it was cured at 150 ° C. for 3 hours to seal the surface-mounted LED.
- the liquid carboxylic acid anhydride, Jamaicacid MH of Comparative Example 1 shows a significant decrease in thermogravimetry under the condition of 120 ° C., while the polyvalent values of Examples 1 to 6
- the carboxylic acid resins A-1 to A-6 were in a liquid state, almost no weight reduction was observed.
- the durometer hardness (type A) of the cured product is small and the strength is inferior, whereas in Examples 7 to 12, the durometer hardness is high and the strength is excellent. I understood.
- the polyvalent carboxylic acid resin A-2 used in Example 8 was cloudy at room temperature, it was excellent in the transmittance of the cured product as in Examples 7 and 9-12.
- the polyvalent carboxylic acid resin of the present invention can be used as a curing agent for an epoxy resin by being contained together with the epoxy resin.
- a composition containing a polyvalent carboxylic acid resin and an epoxy resin is useful in a wide range of applications such as electric / electronic materials, molding materials, casting materials, laminated materials, paints, adhesives, resists, etc. It is extremely useful as a material that requires optical properties and adhesion to equipment, for example, an adhesive or sealing material for optical semiconductors (such as LED products).
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Abstract
Description
このような用途に用いられるカルボン酸無水物としては、無色透明であること、室温で液状であること、取り扱いが容易であること等の理由からヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、ノルボルナン-2,3-ジカルボン酸無水物、メチルノルボルナン-2,3-ジカルボン酸無水物等のカルボン酸無水物やこれらの混合物が用いられている。しかし、これらのカルボン酸無水物は低分子量の化合物が多い。したがって、該カルボン酸無水物を硬化剤とするエポキシ樹脂組成物においては、熱硬化時のカルボン酸無水物の揮発が問題となる。カルボン酸無水物の揮発は、硬化反応において、必要量のカルボン酸無水物(硬化剤)が存在しないことに起因するエポキシ樹脂組成物の硬化不良が起こるという問題だけでなく、その有害性による人体への悪影響、生産ラインの汚染、さらには大気汚染など、環境への影響も大きい。
そこで、揮発性が低く、室温にて液状である、シリコーン骨格カルボン酸化合物の検討がされている。しかしながら、満足できるような硬化物の強度が出せないため、光半導体封止材として用いた際の、鉛フリーハンダリフロー時におけるクラック発生等の問題を抱えている(特許文献5を参照)。
すなわち本発明は、
(1)
下記式(1)で表される両末端カルビノール変性シリコーンオイル(a)と、分子内に二つ以上の水酸基を有する多価アルコール化合物(e)と、分子内に二つ以上のカルボン酸無水物基を有する化合物(c)とを付加反応を行なうことで得られる、多価カルボン酸樹脂(A)。
(2)
下記式(1)で表される両末端カルビノール変性シリコーンオイル(a)と、分子内に二つ以上の水酸基を有する多価アルコール化合物(e)と、分子内に二つ以上のカルボン酸無水物基を有する化合物(c)と、分子内に一つのカルボン酸無水物基を有する化合物(d)とを付加反応を行なうことで得られる、多価カルボン酸樹脂(A)。
(3)
分子内に二つ以上の水酸基を有する多価アルコール化合物(e)が、末端アルコールポリエステル化合物(b)である、(1)又は(2)のいずれか一項に記載の多価カルボン酸樹脂(A)。
(4)
末端アルコールポリエステル化合物(b)が、式(2)で表される(3)に記載の多価カルボン酸樹脂(A)。
(5)
分子内に二つ以上の水酸基を有する多価アルコール化合物(e)が、炭化水素多価アルコール化合物(f)である、(1)又は(2)のいずれか一項に記載の多価カルボン酸樹脂(A)。
(6)
分子内に二つ以上のカルボン酸無水物基を有する化合物(c)が、下記式(3)~(5)からなる群から選択される一種以上である、(1)~(5)のいずれか一項に記載の多価カルボン酸樹脂(A)。
分子内に一つのカルボン酸無水物基を有する化合物(d)が、式(6)~(10)からなる群から選択される一種以上である、(2)~(6)のいずれか一項に記載の多価カルボン酸樹脂(A)。
(1)~(7)のいずれか一項に記載の多価カルボン酸樹脂(A)と、エポキシ樹脂(B)を含有することを特徴とする多価カルボン酸組成物。
(9)
(8)に記載の多価カルボン酸組成物を硬化してなる硬化物。
(10)
(9)に記載の硬化物を具備する発光ダイオード。
に関する。
両末端カルビノール変性シリコーンオイル(a)は下記式(1)で示される両末端にアルコール性水酸基を有するシリコーン化合物である。
で示すことができる炭素数1~10のエーテル結合を含むアルキレン基などが挙げられる。この中でも好ましいものとしては、プロポキシエチレン基、エトキシプロピレン基である。
分子内に二つ以上の水酸基を有する多価アルコール化合物(e)としては、例えば、末端アルコールポリエステル化合物(b)、炭化水素多価アルコール化合物(f)、末端アルコールポリカーボネート化合物が挙げられる。
GPCの各種条件
メーカー:島津製作所
カラム:ガードカラム SHODEX GPC LF-G LF-804(3本)
流速:1.0ml/min.
カラム温度:40℃
使用溶剤:THF(テトラヒドロフラン)
検出器:RI(示差屈折検出器)
炭化水素多価アルコール化合物(f)は分子中に二つ以上の水酸基を有する炭化水素化合物であり、例えば、エチレングリコール、プロピレングリコール、プロパンジオール、ブタンジオール、ジメチルエタノール、ペンタンジオール、ネオペンチルグリコール、ヘキサンジオール、ジメチルブタンジオール、ヘプタンジオール、ジメチルペンタンジオール、ジエチルプロパンジオール、オクタンジオール、ジメチルヘキサンジオール、ジエチルブタンジオール、ノナンジオール、ジメチルヘプタンジオール、ジエチルペンタンジオール、デカンジオール、ジメチルオクタンジオール、ジエチルヘキサンジオール、エチルブチルプロパンジオール、3-メチロール-1,5-ペンタンジオール、ジグリセリン、ジペンタエリスリトール等の鎖状炭化水素多価アルコール化合物や、シクロペンタンジオール、シクロペンタンジメタノール、シクロヘキサンジオール、シクロヘキサンジメタノール、トリシクロデカンジオール、トリシクロデカンジメタノール、ノルボルナンジオール、ノルボルナンジメタノール等の環状炭化水素多価アルコール化合物が挙げられる。これら炭化水素多価アルコール化合物(f)は1種又は2種以上を混合して用いることが出来る。これらの中でもプロピレングリコール、デカンジオール、ジエチルペンタンジオール、トリシクロデカンジメタノールが硬化物の強度、硬化物の透明性の観点から好ましい。
末端アルコールポリカーボネート化合物としては、特に限定されないが、例えば下記式(12)で示される、末端に水酸基を有するポリカーボネート化合物等が挙げられる。
GPCの各種条件
メーカー:島津製作所
カラム:ガードカラム SHODEX GPC LF-G LF-804(3本)
流速:1.0ml/min.
カラム温度:40℃
使用溶剤:THF(テトラヒドロフラン)
検出器:RI(示差屈折検出器)
分子内に二つ以上の水酸基を有する多価アルコール化合物(e)の使用量は、特に限定されないが、両末端カルビノール変性シリコーンオイル(a)100重量部に対し、好ましくは0.5~200重量部、より好ましくは5~50重量部、さらに好ましくは10~30重量部である。0.5重量部以上であれば硬化物の機械強度がより向上するため好ましく、200重量部以下であれば硬化物の耐熱透明性がより向上したり得られる多価カルボン酸樹脂(A)の粘度がより適切になるため好ましい。
分子内に二つ以上のカルボン酸無水物基を有する化合物(c)は、例えば、1,2,3,4-ブタンテトラカルボン酸二無水物、1,2,3,4-シクロブタンテトラカルボン酸二無水物、1,2,3,4-シクロペンタンテトラカルボン酸二無水物、1,2,4,5-シクロヘキサンテトラカルボン酸二無水物、ピロメリット酸無水物、5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸無水物、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸無水物等が挙げられる。
また、化合物(c)の同一分子内のカルボン酸無水物基の数は、二つであることが多価カルボン酸樹脂(A)の粘度の過度な増大が生じにくいため、粘度制御の観点から好ましい。
分子内に二つ以上のカルボン酸無水物基を有する化合物(c)は1種又は2種以上混合して用いることができる。この中でも、多価カルボン酸樹脂(A)と後述するエポキシ樹脂(B)を含有する多価カルボン酸組成物を硬化してなる硬化物の耐熱性(耐熱透明性等)が優れるものとなることから、1,2,3,4-ブタンテトラカルボン酸二無水物、1,2,4,5-シクロヘキサンテトラカルボン酸二無水物、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸無水物が好ましく、特に1,2,3,4-ブタンテトラカルボン酸二無水物が好ましい。
分子内に一つのカルボン酸無水物基を有する化合物(d)は、コハク酸無水物、メチルコハク酸無水物、エチルコハク酸無水物、2,3-ブタンジカルボン酸無水物、2,4-ペンタンジカルボン酸無水物、3,5-ヘプタンジカルボン酸無水物等の飽和脂肪族カルボン酸無水物、マレイン酸無水物、ドデシルコハク酸無水物等の不飽和脂肪族カルボン酸無水物、ヘキサヒドロフタル酸無水物、メチルヘキサヒドロフタル酸無水物、1,3-シクロヘキサンジカルボン酸無水物、ノルボルナン-2,3-ジカルボン酸無水物、メチルノルボルナン-2,3-ジカルボン酸無水物、ナジック酸無水物、メチルナジック酸無水物、ビシクロ[2,2,2]オクタン-2,3-ジカルボン酸無水物、1,2,4-シクロヘキサントリカルボン酸-1,2-無水物等の環状飽和脂肪族カルボン酸無水物、テトラヒドロフタル酸無水物、メチルテトラヒドロフタル酸無水物、ナジック酸無水物、メチルナジック酸無水物、4,5-ジメチル-4-シクロヘキセン-1,2-ジカルボン酸無水物、ビシクロ[2.2.2]-5-オクテン-2,3-ジカルボン酸無水物等の環状不飽和脂肪族カルボン酸無水物、フタル酸無水物、イソフタル酸無水物、テレフタル酸無水物、トリメリット酸無水物等の芳香族カルボン酸無水物等が挙げられる。
分子内に一つのカルボン酸無水物基を有する化合物(d)は1種又は2種以上混合して用いることができる。この中でも、多価カルボン酸樹脂(A)とエポキシ樹脂(B)とを含有する多価カルボン酸組成物を硬化してなる硬化物の透明性(耐熱透明性等)を優れるものとすることから、ヘキサヒドロフタル酸無水物、メチルヘキサヒドロフタル酸無水物、テトラヒドロフタル酸無水物、ノルボルナン-2,3-ジカルボン酸無水物、メチルノルボルナン-2,3-ジカルボン酸無水物、1,2,4-シクロヘキサントリカルボン酸-1,2-無水物が好ましい。ここで、より好ましくはメチルヘキサヒドロフタル酸無水物、1,2,4-シクロヘキサントリカルボン酸-1,2-無水物であり、特に好ましくはメチルヘキサヒドロフタル酸無水物である。
この場合において、上記各化合物を一度に纏めて仕込んで反応させても構わないし、上記各化合物を一定の順序に従って仕込んで反応させても構わない。
これらの溶剤は1種又は2種以上を混合して用いても良い。溶剤を用いる場合の使用量は、両末端カルビノール変性シリコーンオイル(a)、分子内に二つ以上の水酸基を有する多価アルコール化合物(e)、分子内に二つ以上のカルボン酸無水物基を有する化合物(c)、分子内に一つのカルボン酸無水物基を有する化合物(d)の合計100重量部に対して、0.5~300重量部が好ましい。
ここで、無溶剤で製造したほうが、製造の簡便性の観点からは好ましい。
触媒を用いる場合、1種または2種以上を混合して用いることもできる。
触媒を用いる場合の使用量は、両末端カルビノール変性シリコーンオイル(a)、分子内に二つ以上の水酸基を有する多価アルコール化合物(e)、分子内に二つ以上のカルボン酸無水物基を有する化合物(c)、分子内に一つのカルボン酸無水物基を有する化合物(d)の合計100重量部に対して、0.05~10重量部が好ましい。
触媒の添加方法は、直接添加するか、可溶性の溶剤等に溶解させた状態で使用する。この際、メタノール、エタノール等のアルコール性の溶媒や水を用いることは、未反応の、分子内に二つ以上のカルボン酸無水物基を有する化合物(c)や分子内に一つのカルボン酸無水物基を有する化合物(d)と反応してしまうため、避けることが好ましい。
本発明においては、得られる多価カルボン酸組成物の硬化物において、耐腐食ガス透過性、耐熱性を向上させる観点からはオクチル酸亜鉛等のカルボン酸亜鉛を触媒として好ましく使用することができ、得られる多価カルボン酸組成物の着色を低減させる観点からは無触媒で反応を行うことが好ましい。
中でも、透明性、耐硫化性に優れる硬化物を得るために、特にステアリン酸カルシウム、カルボン酸亜鉛(2-エチルヘキサン酸亜鉛、ステアリン酸亜鉛、ベヘン酸亜鉛、ミスチリン酸亜鉛)やリン酸エステル亜鉛(オクチルリン酸亜鉛、ステアリルリン酸亜鉛等)等の亜鉛化合物が好ましく使用できる。
水洗工程を行なう場合、使用している溶剤の種類によっては水と分離可能な溶剤を加えることが好ましい。好ましい溶剤としては例えばメチルエチルケトン、メチルイソブチルケトン、シクロペンタノンのようなケトン類、酢酸エチル、酢酸ブチル、乳酸エチル、ブタン酸イソプロピルなどのエステル類、ヘキサン、シクロヘキサン、トルエン、キシレンのような炭化水素等が例示できる。
反応や水洗に溶剤を用いた場合、減圧濃縮などによって除くことができる。
重量平均分子量はGPC(ゲルパーミエーションクロマトグラフィー)を用いて下記条件下測定されたポリスチレン換算の重量平均分子量(Mw)である。
GPCの各種条件
メーカー:島津製作所
カラム:ガードカラム SHODEX GPC LF-G LF-804(3本)
流速:1.0ml/min.
カラム温度:40℃
使用溶剤:THF(テトラヒドロフラン)
検出器:RI(示差屈折検出器)
また、本発明の多価カルボン酸樹脂(A)の官能基当量は、280~1600g/eqのものが好ましく、350~1100g/eqのものがより好ましく、特に400~950g/eqが好ましい。
また、より好ましい実施形態は、(ii)分子内に二つ以上の水酸基を有する多価アルコール化合物(e)の使用量を、両末端カルビノール変性シリコーンオイル(a)100重量部に対し10~30重量部とすることで得られる(i)に記載の多価カルボン酸樹脂(A)又は(iii)分子内に一つのカルボン酸無水物基を有する化合物(d)の使用量を、分子内に二つ以上のカルボン酸無水物基を有する化合物(c)100重量部に対し100~800重量部とすることで得られる(i)に記載の多価カルボン酸樹脂(A)である。
そして、特に好ましい実施形態は、(iv)分子内に二つ以上の水酸基を有する多価アルコール化合物(e)の使用量を両末端カルビノール変性シリコーンオイル(a)100重量部に対し、10~30重量部とし、かつ分子内に一つのカルボン酸無水物基を有する化合物(d)の使用量を分子内に二つ以上のカルボン酸無水物基を有する化合物(c)100重量部に対し100~800重量部(特に好ましくは400~700重量部)とすることで得られる(i)記載の多価カルボン酸樹脂(A)である。
本発明の多価カルボン酸組成物は、本発明の多価カルボン酸樹脂(A)とエポキシ樹脂(B)を必須成分とする。
エポキシ樹脂(B)としては、例えばフェノール化合物のグリシジルエーテル化物であるエポキシ樹脂、各種ノボラック樹脂のグリシジルエーテル化物であるエポキシ樹脂、脂環式エポキシ樹脂、脂肪族系エポキシ樹脂、複素環式エポキシ樹脂、グリシジルエステル系エポキシ樹脂、グリシジルアミン系エポキシ樹脂、ハロゲン化フェノール類をグリシジル化したエポキシ樹脂、エポキシ基をもつケイ素化合物とそれ以外のケイ素化合物との縮合物、エポキシ基を持つ重合性不飽和化合物とそれ以外の他の重合性不飽和化合物との共重合体等が挙げられる。
前記脂肪族系エポキシ樹脂としては、例えば1,4-ブタンジオール、1,6-ヘキサンジオール、ポリエチレングリコール、ペンタエリスリトール等の多価アルコールのグリシジルエーテル類が挙げられる。
前記複素環式エポキシ樹脂としては、例えばイソシアヌル環、ヒダントイン環等の複素環を有する複素環式エポキシ樹脂が挙げられる。
前記グリシジルエステル系エポキシ樹脂としては、例えばヘキサヒドロフタル酸ジグリシジルエステル等のカルボン酸エステル類からなるエポキシ樹脂が挙げられる。
前記グリシジルアミン系エポキシ樹脂としては、例えばアニリン、トルイジン等のアミン類をグリシジル化したエポキシ樹脂が挙げられる。
前記ハロゲン化フェノール類をグリシジル化したエポキシ樹脂としては、例えばブロム化ビスフェノールA、ブロム化ビスフェノールF、ブロム化ビスフェノールS、ブロム化フェノールノボラック、ブロム化クレゾールノボラック、クロル化ビスフェノールS、クロル化ビスフェノールA等のハロゲン化フェノール類をグリシジル化したエポキシ樹脂が挙げられる。
また、重量平均分子量は250~10000のものが好ましく、300~5000のものがさらに好ましい。重量平均分子量が250以上であれば、硬化物の靭性が向上し、例えばヒートサイクル試験などにおいてクラック等のひび割れが発生し難くなり好ましい。重量平均分子量が10000以下であれば粘度が高くなり難く、作業性が向上し好ましい。
前記したエポキシ当量と重量平均分子量であるエポキシ樹脂(B)の中でも、透明性、耐熱透明性、耐光透明性、耐ヒートサイクル性等の観点から、エポキシ基をもつケイ素化合物とそれ以外のケイ素化合物との縮合物がさらに好ましい。
なお、本発明における重量平均分子量とは、GPC(ゲルパーミエーションクロマトグラフィー)を用いて、下記条件等で測定されたポリスチレン換算、重量平均分子量(Mw)の事である。
GPCの各種条件
メーカー:島津製作所
カラム:ガードカラム SHODEX GPC LF-G LF-804(3本)
流速:1.0ml/min.
カラム温度:40℃
使用溶剤:THF(テトラヒドロフラン)
検出器:RI(示差屈折検出器)
中でも、透明性、耐硫化性に優れる硬化物を得るために、特にステアリン酸カルシウム、カルボン酸亜鉛(2-エチルヘキサン酸亜鉛、ステアリン酸亜鉛、ベヘン酸亜鉛、ミスチリン酸亜鉛)やリン酸エステル亜鉛(オクチルリン酸亜鉛、ステアリルリン酸亜鉛等)等の亜鉛化合物が好ましく使用できる。
複素環化合物系硬化促進剤としては、例えばピリジン、ジメチルアミノピリジン、1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン、イミダゾール、トリアゾール、テトラゾール等が挙げられる。
ホスフィン系硬化促進剤としては、例えばトリエチルホスフィン、トリブチルホスフィン、トリフェニルホスフィン等が挙げられる。
ホスファイト系硬化促進剤としては、例えばトリメチルホスファイト、トリエチルホスファイト等が挙げられる。
ルイス酸系硬化促進剤としては、例えばBF3モノエチルアミン、BF3ジエチルアミン、BF3トリエチルアミン、BF3ベンジルアミン、BF3アニリン、BF3ピペラジン、BF3ピペリジン、PF5エチルアミン、PF5ブチルアミン、PF5ラウリルアミン、PF5ベンジルアミン、AsF5ラウリルアミン等が挙げられる。これら硬化促進剤は1種又は2種以上を混合して用いても良い。これら硬化触媒のどれを用いるかは、例えば透明性、硬化速度、作業条件といった得られる透明樹脂組成物に要求される特性によって適宜選択される。
併用できるエポキシ樹脂硬化剤としては、例えば、多価カルボン酸類、カルボン酸無水物類、フェノール類、ヒドラジン類、メルカプタン類等が挙げられる。
前記脂肪族多価カルボン酸としては、例えばシュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、1,2,3-プロパントリカルボン酸、1,2,3,4-ブタンテトラカルボン酸等が挙げられる。
前記環状脂肪族多価カルボン酸としては、例えばヘキサヒドロフタル酸、1,3-アダマンタン二酢酸、1,3-アダマンタンジカルボン酸、テトラヒドロフタル酸、2,3-ノルボルネンジカルボン酸、1,2,4-シクロヘキサントリカルボン酸、1,3,5-シクロヘキサントリカルボン酸、1,2,3-シクロヘキサントリカルボン酸、1,2,4,6-シクロヘキサンテトラカルボン酸等が挙げられる。
前記芳香族多価カルボン酸としては、例えばフタル酸、イソフタル酸、テレフタル酸、1,2-ナフタレンジカルボン酸、1,4-ナフタレンジカルボン酸、1,8-ナフタレンジカルボン酸、2,3-ナフタレンジカルボン酸、2,6-ナフタレンジカルボン酸、9,10-アントラセンジカルボン酸、4,4’-ベンゾフェノンジカルボン酸、2,2’-ビフェニルジカルボン酸、3,3’-ビフェニルジカルボン酸、4,4’-ビフェニルジカルボン酸、3,3’-ビフェニルエーテルジカルボン酸、4,4’-ビフェニルエーテルジカルボン酸、4,4’-ビナフチルジカルボン酸、ヘミメリット酸、トリメリット酸、トリメシン酸、1,2,4-ナフタレントリカルボン酸、2,5,7-ナフタレントリカルボン酸、メロファン酸、プレーニト酸、ピロメリット酸、3,3’4,4’-ベンゾフェノンテトラカルボン酸、2,2’3,3’-ベンゾフェノンテトラカルボン酸、2,3,3’,4’-ベンゾフェノンテトラカルボン酸、3,3’4,4’-ビフェニルテトラカルボン酸、2,2’,3,3’-ビフェニルテトラカルボン酸、2,3,3’,4’-ビフェニルテトラカルボン酸、4,4’-オキシジフタル酸、3,3’4,4’-ジフェニルメタンテトラカルボン酸、1,4,5,8-ナフタレンテトラカルボン酸、1,2,5,6-ナフタレンテトラカルボン酸、2,3,6,7-ナフタレンテトラカルボン酸、アントラセンテトラカルボン酸等が挙げられる。
前記複素環多価カルボン酸としては、例えばトリス(2-カルボキシエチル)イソシアヌレート、トリス(3-カルボキシプロピル)イソシアヌレート等が挙げられる。
前記脂肪族カルボン酸無水物としては、例えばコハク酸無水物、メチルコハク酸無水物、エチルコハク酸無水物、2,3-ブタンジカルボン酸無水物、2,4-ペンタンジカルボン酸無水物、3,5-ヘプタンジカルボン酸無水物、1,2,3,4-ブタンテトラカルボン酸二無水物、マレイン酸無水物、ドデシルコハク酸無水物等が挙げられる。
環状脂肪族カルボン酸無水物としては、ヘキサヒドロフタル酸無水物、メチルヘキサヒドロフタル酸無水物、1,3-シクロヘキサンジカルボン酸無水物、水素添加ナジック酸無水物、水素添加メチルナジック酸無水物、ビシクロ[2,2,2]オクタン-2,3-ジカルボン酸無水物、1,2,4-シクロヘキサントリカルボン酸-1,2-無水物、1,2,3,4-シクロブタンテトラカルボン酸二無水物、1,2,3,4-シクロペンタンテトラカルボン酸二無水物、1,2,4,5-シクロヘキサンテトラカルボン酸二無水物、テトラヒドロフタル酸無水物、メチルテトラヒドロフタル酸無水物、ナジック酸無水物、メチルナジック酸無水物、4,5-ジメチル-4-シクロヘキセン-1,2-ジカルボン酸無水物、ビシクロ[2.2.2]-5-オクテン-2,3-ジカルボン酸無水物等が挙げられる。
前記芳香族カルボン酸無水物としては、例えばフタル酸無水物、イソフタル酸無水物、テレフタル酸無水物、トリメリット酸無水物、ピロメリット酸無水物等が挙げられる。
その他、5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸無水物、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸無水物等の同一化合物内に脂肪族カルボン酸無水物、環状脂肪族カルボン酸無水物を持つ化合物等が挙げられる。
使用できるカップリング剤としては、例えば3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、N-(2-アミノエチル)3-アミノプロピルメチルジメトキシシラン、N-(2-アミノエチル)3-アミノプロピルメチルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、3-メルカプトプロピルトリメトキシシラン、ビニルトリメトキシシラン、N-(2-(ビニルベンジルアミノ)エチル)3-アミノプロピルトリメトキシシラン塩酸塩、3-メタクリロキシプロピルトリメトキシシラン、3-クロロプロピルメチルジメトキシシラン、3-クロロプロピルトリメトキシシラン等のシラン系カップリング剤;イソプロピル(N-エチルアミノエチルアミノ)チタネート、イソプロピルトリイソステアロイルチタネート、チタニウムジ(ジオクチルピロフォスフェート)オキシアセテート、テトライソプロピルジ(ジオクチルフォスファイト)チタネート、ネオアルコキシトリ(p-N-(β-アミノエチル)アミノフェニル)チタネート等のチタン系カップリング剤;Zr-アセチルアセトネート、Zr-メタクリレート、Zr-プロピオネート、ネオアルコキシジルコネート、ネオアルコキシトリスネオデカノイルジルコネート、ネオアルコキシトリス(ドデカノイル)ベンゼンスルフォニルジルコネート、ネオアルコキシトリス(エチレンジアミノエチル)ジルコネート、ネオアルコキシトリス(m-アミノフェニル)ジルコネート、アンモニウムジルコニウムカーボネート、Al-アセチルアセトネート、Al-メタクリレート、Al-プロピオネート等のジルコニウム、或いはアルミニウム系カップリング剤等が挙げられる。
これらカップリング剤は1種又は2種以上を混合して用いても良い。
カップリング剤を使用する事により基材との密着性の向上や、硬化物の硬度の向上が見込める。カップリング剤は、本発明の多価カルボン酸組成物成分中において通常0.05~20重量部、好ましくは0.1~10重量部が必要に応じて含有される。
上記リン含有化合物の含有量は、リン含有化合物/エポキシ樹脂=0.1~0.6(重量比)が好ましい。0.1以上であれば難燃性が十分となり好ましく、0.6以下であれば硬化物の吸湿性、誘電特性に悪影響が及ぶことながなく好ましい。
これら溶剤は、本発明の多価カルボン酸組成物成分中において通常2~98重量部が必要に応じて含有される。溶剤を用いてワニス又はインクとした場合の本発明の多価カルボン酸組成物は、必要により、例えば0.05~2μmのフィルターを用いて精密濾過を行ってもよい。
加熱条件は例えば80~230℃で1分~24時間程度が好ましい。加熱硬化の際に発生する内部応力を低減する目的で、例えば80~120℃、30分~5時間予備硬化させた後に、120~180℃、30分~10時間の条件で後硬化させることができる。
注入方法としては、ディスペンサー、トランスファー成形、射出成形等が挙げられる。
加熱は、熱風循環式、赤外線、高周波等の方法が使用できる。加熱条件は例えば80~230℃で1分~24時間程度が好ましい。加熱硬化の際に発生する内部応力を低減する目的で、例えば80~120℃、30分~5時間予備硬化させた後に、120~80℃、30分~10時間の条件で後硬化させることができる。
光学用材料とは、可視光、赤外線、紫外線、X線、レーザーなどの光をその材料中を通過させる用途に用いる材料一般を示す。より具体的には、ランプタイプ、SMDタイプ等の光半導体封止材、光半導体ダイボンド材の他、以下のようなものが挙げられる。液晶ディスプレイ分野における基板材料、導光板、プリズムシート、偏向板、位相差板、視野角補正フィルム、接着剤、偏光子保護フィルムなどの液晶用フィルムなどの液晶表示装置周辺材料である。また、次世代フラットパネルディスプレイとして期待されるカラーPDP(プラズマディスプレイ)の封止材、反射防止フィルム、光学補正フィルム、ハウジング材、前面ガラスの保護フィルム、前面ガラス代替材料、接着剤、またLED表示装置に使用されるLEDのモールド材、LEDの封止材、前面ガラスの保護フィルム、前面ガラス代替材料、接着剤、またプラズマアドレス液晶(PALC)ディスプレイにおける基板材料、導光板、プリズムシート、偏向板、位相差板、視野角補正フィルム、接着剤、偏光子保護フィルム、また有機EL(エレクトロルミネッセンス)ディスプレイにおける前面ガラスの保護フィルム、前面ガラス代替材料、接着剤、またフィールドエミッションディスプレイ(FED)における各種フィルム基板、前面ガラスの保護フィルム、前面ガラス代替材料、接着剤である。光記録分野では、VD(ビデオディスク)、CD/CD-ROM、CD-R/RW、DVD-R/DVD-RAM、MO/MD、PD(相変化ディスク)、光カード用のディスク基板材料、ピックアップレンズ、保護フィルム、封止材、接着剤などである。
○重量平均分子量:GPC法により、下記条件下測定されたポリスチレン換算、重量平均分子量を算出した。
GPCの各種条件
メーカー:島津製作所
カラム:ガードカラム SHODEX GPC LF-G LF-804(3本)
流速:1.0ml/min.
カラム温度:40℃
使用溶剤:THF(テトラヒドロフラン)
検出器:RI(示差屈折検出器)
○酸価:JIS K-2501に記載の方法で測定した。
○エポキシ当量:JIS K-7236に記載の方法で測定した。
○粘度:25℃においてE型粘度計を使用して測定した。
○熱重量減少:島津製作所製TG/DTA6200を用い、30℃から20℃/分で昇温させ、120℃まで加熱し、120℃で60分保持した後の重量減少率を測定した。空気流量は200ml/minで行った。
撹拌装置、ジムロートコンデンサ、温度計を設置したガラス製セパラブルフラスコに、両末端カルビノール変性シリコーンX22-160AS(信越化学工業(株)製)47.1部、ポリエステルポリオールであるアデカニューエースY9-10(ADEKA(株)製、上記式(2)においてR3がネオペンチル基でR4がブチル基であるポリエステルポリオール)11.8部、リカシッドTDA-100(4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸無水物、新日本理化(株)製)7.4部、リカシッドMH(メチルヘキサヒドロフタル酸無水物、新日本理化(株)製)12.5部を仕込み、140℃で10時間反応させ、本発明の多価カルボン酸樹脂(A-1)78.5部を得た。この時にGPC測定において、リカシッドTDA-100および、リカシッドMHのピークは消失していた。得られた化合物の酸価は86.8mgKOH/g、重量平均分子量は3483、粘度は、20480mPa・s、外観は無色透明液体であった。
撹拌装置、ジムロートコンデンサ、温度計を設置したガラス製セパラブルフラスコに、両末端カルビノール変性シリコーンX22-160AS(信越化学工業(株)製)47.1部、ポリエステルポリオールであるアデカニューエースY9-10(ADEKA(株)製、上記式(2)においてR3がネオペンチル基でR4がブチル基であるポリエステルポリオール)11.8部、リカシッドBT-100(ブタンテトラカルボン酸二無水物、新日本理化(株)製)2.5部、リカシッドMH(メチルヘキサヒドロフタル酸無水物、新日本理化(株)製)16.6部を仕込み、140℃で10時間反応させ、本発明の多価カルボン酸樹脂(A-2)77.5部を得た。この時にGPC測定において、リカシッドBT-100および、リカシッドMHのピークは消失していた。この多価カルボン酸樹脂は、反応終了時は無色透明の液体であったが、反応液の温度が下がるにつれて外観は白濁した液体になった。得られた化合物の酸価は76.7mgKOH/g、重量平均分子量は3452、粘度は、5730mPa・sであった。
撹拌装置、ジムロートコンデンサ、温度計を設置したガラス製セパラブルフラスコに、両末端カルビノール変性シリコーンX22-160AS(信越化学工業(株)製)47.1部、ポリエステルポリオールであるアデカニューエースY9-10(ADEKA(株)製、上記式(2)においてR3がネオペンチル基でR4がブチル基であるポリエステルポリオール)11.8部、リカシッドBT-100(ブタンテトラカルボン酸二無水物、新日本理化(株)製)4.9部、リカシッドMH(メチルヘキサヒドロフタル酸無水物、新日本理化(株)製)12.5部を仕込み、140℃で10時間反応させ、本発明の多価カルボン酸樹脂(A-3)74.0部を得た。この時にGPC測定において、リカシッドBT-100および、リカシッドMHのピークは消失していた。得られた化合物の酸価は79.9mgKOH/g、重量平均分子量は6960、粘度は18600mPa・s、外観は無色透明液体であった。
撹拌装置、ジムロートコンデンサ、温度計を設置したガラス製セパラブルフラスコに、両末端カルビノール変性シリコーンX22-160AS(信越化学工業(株)製)47.1部、炭化水素ポリオールである1,10-デカンジオール11.8部、リカシッドBT-100(ブタンテトラカルボン酸二無水物、新日本理化(株)製)9.8部、リカシッドMH(メチルヘキサヒドロフタル酸無水物、新日本理化(株)製)24.9部を仕込み、140℃で10時間反応させ、本発明の多価カルボン酸樹脂(A-4)90.8部を得た。この時にGPC測定において、リカシッドBT-100および、リカシッドMHのピークは消失していた。得られた化合物の酸価は89.3mgKOH/g、重量平均分子量は5604、粘度は23296mPa・s、外観は無色透明液体であった。
撹拌装置、ジムロートコンデンサ、温度計を設置したガラス製セパラブルフラスコに、両末端カルビノール変性シリコーンX22-160AS(信越化学工業(株)製)47.1部、炭化水素ポリオールであるトリシクロデカンジメタノール11.8部、リカシッドBT-100(ブタンテトラカルボン酸二無水物、新日本理化(株)製)8.7部、リカシッドMH(メチルヘキサヒドロフタル酸無水物、新日本理化(株)製)22.2部を仕込み、140℃で10時間反応させ、本発明の多価カルボン酸樹脂(A-5)87.1部を得た。この時にGPC測定において、リカシッドBT-100および、リカシッドMHのピークは消失していた。得られた化合物の酸価は79.1mgKOH/g、重量平均分子量は4777、外観は無色透明液体であったが、粘度が高いため粘度測定はできなかった。
撹拌装置、ジムロートコンデンサ、温度計を設置したガラス製セパラブルフラスコに、両末端カルビノール変性シリコーンX22-160AS(信越化学工業(株)製)47.1部、炭化水素ポリオールである2,4-ジエチルペンタン-1,5-ジオール11.8部、リカシッドBT-100(ブタンテトラカルボン酸二無水物、新日本理化(株)製)9.7部、リカシッドMH(メチルヘキサヒドロフタル酸無水物、新日本理化(株)製)24.9部を仕込み、140℃で10時間反応させ、本発明の多価カルボン酸樹脂(A-6)90.7部を得た。この時にGPC測定において、リカシッドBT-100および、リカシッドMHのピークは消失していた。得られた化合物の酸価は81.1mgKOH/g、重量平均分子量は5203、粘度は593920mPa・s、外観は無色透明液体であった。
実施例1~6で得られた多価カルボン酸樹脂A-1~A-6と、比較例1として、液状酸無水物化合物であるリカシッドMH(メチルヘキサヒドロフタル酸無水物、新日本理化(株)製)の性状を表1にまとめた。
2-(3,4エポキシシクロヘキシル)エチルトリメトキシシラン394部、分子量1700(GPC測定値)のシラノール基をもつポリジメチルジフェニルシロキサン475部、0.5%KOHメタノール溶液4部、イソプロピルアルコール36部を反応容器に仕込み、75℃に昇温した。昇温後、還流下にて10時間反応させた。反応後、メタノールを656部追加後、50%蒸留水メタノール溶液172.8部を60分かけて滴下し、還流下さらに10時間反応させた。反応終了後、5%第1水素ナトリウムリン酸水溶液で中和後、80℃でメタノールの蒸留回収を行った。その後、洗浄のために、メチルイソブチルケトン(MIBK)780部を添加後、水洗を3回繰り返した。次いで有機相を減圧下、100℃で溶媒を除去することによりエポキシ基を有するシロキサン化合物(B-1)731部を得た。得られた化合物のエポキシ当量は491g/eq、重量平均分子量は2090、外観は無色透明であった。
2-(3,4エポキシシクロヘキシル)エチルトリメトキシシラン197部、分子量1700(GPC測定値)のシラノール基をもつポリジメチルジフェニルシロキサン534部、0.5%KOHメタノール溶液4部、イソプロピルアルコール36部を反応容器に仕込み、75℃に昇温した。昇温後、還流下にて10時間反応させた。反応後、メタノールを576部追加後、50%蒸留水メタノール溶液86.4部を60分かけて滴下し、還流下さらに10時間反応させた。反応終了後、5%第1水素ナトリウムリン酸水溶液で中和後、80℃でメタノールの蒸留回収を行った。その後、洗浄のために、MIBK660部を添加後、水洗を3回繰り返した。次いで有機相を減圧下、100℃で溶媒を除去することによりエポキシ基を有するシロキサン化合物(B-2)648部を得た。得られた化合物のエポキシ当量は857g/eq、重量平均分子量は1860、外観は無色透明であった。
両末端カルビノール変性シリコーンX22-160AS(信越化学工業(株)製)50部、リカシッドMH(メチルヘキサヒドロフタル酸無水物、新日本理化(株)製)15.4部を反応容器に仕込み、80℃に昇温し、4時間後にGPCを測定したところリカシッドMHのピークが消失していた。その後さらに2時間反応させることによりカルボン酸化合物(A-7)65.0部を得た。得られた化合物の酸価は80.0mgKOH/g、重量平均分子量は1700、粘度は750mPa・sであった。
実施例1で得られた多価カルボン酸樹脂(A-1)100部、エポキシ樹脂として合成例1で得られたエポキシ基を有するシロキサン化合物(B-1)71部、合成例2で得られたエポキシ基を有するシロキサン化合物(B-2)71部を入れ、混合、5分間脱泡を行い、多価カルボン酸組成物を得た。
実施例2で得られた多価カルボン酸樹脂(A-2)100部、エポキシ樹脂として合成例1で得られたエポキシ基を有するシロキサン化合物(B-1)110部を入れ、混合、5分間脱泡を行い、多価カルボン酸組成物を得た。
実施例3で得られた多価カルボン酸樹脂(A-3)100部、合成例3で得られた液状カルボン酸化合物(A-7)100部、エポキシ樹脂として合成例1で得られたエポキシ基を有するシロキサン化合物(B-1)220部を入れ、混合、5分間脱泡を行い、多価カルボン酸組成物を得た。
実施例4で得られた多価カルボン酸樹脂(A-4)100部、合成例3で得られた液状カルボン酸化合物(A-7)100部、エポキシ樹脂として合成例1で得られたエポキシ基を有するシロキサン化合物(B-1)121.5部、合成例2で得られたエポキシ基を有するシロキサン化合物(B-2)121.5部を入れ、混合、5分間脱泡を行い、多価カルボン酸組成物を得た。
実施例5で得られた多価カルボン酸樹脂(A-5)100部、合成例3で得られた液状カルボン酸化合物(A-7)100部、エポキシ樹脂として合成例1で得られたエポキシ基を有するシロキサン化合物(B-1)206部を入れ、混合、5分間脱泡を行い、多価カルボン酸組成物を得た。
実施例6で得られた多価カルボン酸樹脂(A-6)100部、合成例3で得られた液状カルボン酸化合物(A-7)100部、エポキシ樹脂として合成例1で得られたエポキシ基を有するシロキサン化合物(B-1)210部を入れ、混合、5分間脱泡を行い、多価カルボン酸組成物を得た。
合成例3で得られた液状カルボン酸化合物(A-7)100部、エポキシ樹脂として合成例1で得られたエポキシ基を有するシロキサン化合物(B-1)100部を入れ、混合、5分間脱泡を行い、エポキシ樹脂組成物を得た。
実施例7~12、比較例2で得られた多価カルボン酸組成物の配合比とその硬化物の、デュロメータ硬さ、透過率、硬化物揮発に伴う硬化物の凹み、表面タックの結果を表2に示す。表2における試験は以下のように行った。
実施例7~12、比較例2で得られた多価カルボン酸組成物を真空脱泡5分間実施後、25℃においてE型粘度計を使用して測定した。
(2)デュロメータ硬さ;
実施例7~12、比較例2で得られた多価カルボン酸組成物を真空脱泡5分間実施後、直径30mm、高さ70mmになるように、アルミフォイルを用いた型に注型した。その注型物を、120℃×1時間の予備硬化の後150℃×3時間で硬化させ、厚さ7mmのデュロメータ硬さ用試験片を得た。得られた試験片をJIS K-6253に記載の方法でデュロメータ硬さ(タイプA)を測定した。
(3)硬化物透過率;
実施例7~12、比較例2で得られた多価カルボン酸組成物を真空脱泡5分間実施後、30mm×20mm×高さ0.8mmになるように耐熱テープでダムを作成したガラス基板上に静かに注型した。その注型物を、120℃×1時間の予備硬化の後150℃×3時間で硬化させ、厚さ0.8mmの透過率用試験片を得た。得られた試験片を下記条件にて400nmの光線透過率を測定した。
分光光計測定条件
メーカー:株式会社日立ハイテクノロジーズ
機種:U-3300
スリット幅:2.0nm
スキャン速度:120nm/分
(4)凹み試験;
実施例7~12、比較例2で得られた多価カルボン酸組成物を真空脱泡5分間実施後、シリンジに充填し精密吐出装置を使用して、発光波長450nmを持つ発光素子を搭載した表面実装型LEDに開口部が平面になるように注型した。120℃×1時間の予備硬化の後、150℃×3時間で硬化し、表面実装型LEDを封止した。このように封止した後の硬化剤の揮発に伴う樹脂表面の凹みの有無を目視で評価した。表中、○;凹みが認められない、△;凹みが多少認められる、×;凹みが多く認められる。
(5)表面タック;
前記硬化物透過率用試験と同様の試験片を作成し、その試験片の表面タック性(表面のベタツキ)を指触にて確認した。表中、○;ベタツキがない、×;ベタツキがある。
なお、本出願は、2011年4月7日付で出願された日本特許出願(特願2011-85067)に基づいており、その全体が引用により援用される。また、ここに引用されるすべての参照は全体として取り込まれる。
Claims (10)
- 分子内に二つ以上の水酸基を有する多価アルコール化合物(e)が、末端アルコールポリエステル化合物(b)である、請求項1又は請求項2のいずれか一項に記載の多価カルボン酸樹脂(A)。
- 分子内に二つ以上の水酸基を有する多価アルコール化合物(e)が、炭化水素多価アルコール化合物(f)である、請求項1又は請求項2のいずれか一項に記載の多価カルボン酸樹脂(A)。
- 請求項1~請求項7のいずれか一項に記載の多価カルボン酸樹脂(A)と、エポキシ樹脂(B)を含有することを特徴とする多価カルボン酸組成物。
- 請求項8に記載の多価カルボン酸組成物を硬化してなる硬化物。
- 請求項9に記載の硬化物を具備する発光ダイオード。
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CN201280017507.7A CN103476826B (zh) | 2011-04-07 | 2012-04-04 | 多元羧酸树脂及其组合物 |
JP2013508907A JP5948317B2 (ja) | 2011-04-07 | 2012-04-04 | 多価カルボン酸樹脂およびその組成物 |
KR1020137026399A KR20140022828A (ko) | 2011-04-07 | 2012-04-04 | 다가 카르복실산 수지 및 그 조성물 |
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Cited By (6)
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WO2013035740A1 (ja) * | 2011-09-09 | 2013-03-14 | 日本化薬株式会社 | 光半導体素子封止用硬化性樹脂組成物およびその硬化物 |
WO2014208619A1 (ja) * | 2013-06-26 | 2014-12-31 | 日本化薬株式会社 | エポキシ基含有ポリオルガノシロキサンおよびそれを含有する硬化性樹脂組成物 |
JP2015067652A (ja) * | 2013-09-27 | 2015-04-13 | 住友理工株式会社 | 表面親水性シリコーン部材および表面親水性シリコーン部材の製造方法 |
WO2015056723A1 (ja) * | 2013-10-16 | 2015-04-23 | 日本化薬株式会社 | 硬化性樹脂組成物およびその硬化物 |
JP2018030999A (ja) * | 2017-08-04 | 2018-03-01 | 日本化薬株式会社 | 硬化性樹脂組成物およびその硬化物 |
WO2023167020A1 (ja) | 2022-03-02 | 2023-09-07 | 信越化学工業株式会社 | 水酸基含有有機ケイ素化合物 |
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US9926338B2 (en) * | 2015-05-27 | 2018-03-27 | Wacker Chemical Corporation | Carboxylic acid functional siloxanes of defined structure |
TWI746707B (zh) * | 2017-01-31 | 2021-11-21 | 日商日本化藥股份有限公司 | 反應性多元羧酸化合物、使用該化合物的活性能量線硬化型樹脂組成物、該組成物的硬化物及該硬化物的用途 |
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JP7236813B2 (ja) * | 2017-04-28 | 2023-03-10 | 日本化薬株式会社 | 反応性ポリカルボン酸化合物、それを用いた活性エネルギー線硬化型樹脂組成物、その硬化物及びその用途 |
JP7236817B2 (ja) * | 2017-06-19 | 2023-03-10 | 日本化薬株式会社 | 反応性ポリカルボン酸化合物、それを用いた活性エネルギー線硬化型樹脂組成物、その硬化物及びその用途 |
KR20210042085A (ko) * | 2018-08-10 | 2021-04-16 | 도레이 카부시키가이샤 | 폴리실록산-폴리알킬렌 글리콜 블록 공중합체 및 그 제조 방법 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6362363A (ja) * | 1986-09-03 | 1988-03-18 | Nitto Electric Ind Co Ltd | 光半導体装置 |
JPH0551558A (ja) * | 1991-02-14 | 1993-03-02 | Nippon Paint Co Ltd | 塗料用樹脂組成物 |
JPH06100762A (ja) * | 1992-09-21 | 1994-04-12 | Nippon Kayaku Co Ltd | エポキシ樹脂組成物 |
WO2010071168A1 (ja) * | 2008-12-19 | 2010-06-24 | 日本化薬株式会社 | カルボン酸化合物及びそれを含有するエポキシ樹脂組成物 |
WO2011043400A1 (ja) * | 2009-10-06 | 2011-04-14 | 日本化薬株式会社 | 多価カルボン酸組成物およびその製造方法、ならびに該多価カルボン酸組成物を含有してなる硬化性樹脂組成物 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05226700A (ja) * | 1992-02-12 | 1993-09-03 | Hitachi Chem Co Ltd | 発光ダイオード封止用エポキシ樹脂組成物及び該組成物で封止された発光ダイオード |
US6664015B1 (en) * | 2002-06-12 | 2003-12-16 | Xerox Corporation | Sulfonated polyester-siloxane resin |
JP5109873B2 (ja) * | 2008-08-27 | 2012-12-26 | 日油株式会社 | 熱硬化性樹脂組成物 |
-
2012
- 2012-04-04 WO PCT/JP2012/059239 patent/WO2012137837A1/ja active Application Filing
- 2012-04-04 CN CN201280017507.7A patent/CN103476826B/zh not_active Expired - Fee Related
- 2012-04-04 KR KR1020137026399A patent/KR20140022828A/ko not_active Application Discontinuation
- 2012-04-04 JP JP2013508907A patent/JP5948317B2/ja active Active
- 2012-04-06 TW TW101112202A patent/TWI512016B/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6362363A (ja) * | 1986-09-03 | 1988-03-18 | Nitto Electric Ind Co Ltd | 光半導体装置 |
JPH0551558A (ja) * | 1991-02-14 | 1993-03-02 | Nippon Paint Co Ltd | 塗料用樹脂組成物 |
JPH06100762A (ja) * | 1992-09-21 | 1994-04-12 | Nippon Kayaku Co Ltd | エポキシ樹脂組成物 |
WO2010071168A1 (ja) * | 2008-12-19 | 2010-06-24 | 日本化薬株式会社 | カルボン酸化合物及びそれを含有するエポキシ樹脂組成物 |
WO2011043400A1 (ja) * | 2009-10-06 | 2011-04-14 | 日本化薬株式会社 | 多価カルボン酸組成物およびその製造方法、ならびに該多価カルボン酸組成物を含有してなる硬化性樹脂組成物 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013035740A1 (ja) * | 2011-09-09 | 2013-03-14 | 日本化薬株式会社 | 光半導体素子封止用硬化性樹脂組成物およびその硬化物 |
JPWO2013035740A1 (ja) * | 2011-09-09 | 2015-03-23 | 日本化薬株式会社 | 光半導体素子封止用硬化性樹脂組成物およびその硬化物 |
WO2014208619A1 (ja) * | 2013-06-26 | 2014-12-31 | 日本化薬株式会社 | エポキシ基含有ポリオルガノシロキサンおよびそれを含有する硬化性樹脂組成物 |
JP2015067652A (ja) * | 2013-09-27 | 2015-04-13 | 住友理工株式会社 | 表面親水性シリコーン部材および表面親水性シリコーン部材の製造方法 |
WO2015056723A1 (ja) * | 2013-10-16 | 2015-04-23 | 日本化薬株式会社 | 硬化性樹脂組成物およびその硬化物 |
JPWO2015056723A1 (ja) * | 2013-10-16 | 2017-03-09 | 日本化薬株式会社 | 硬化性樹脂組成物およびその硬化物 |
JP2018030999A (ja) * | 2017-08-04 | 2018-03-01 | 日本化薬株式会社 | 硬化性樹脂組成物およびその硬化物 |
WO2023167020A1 (ja) | 2022-03-02 | 2023-09-07 | 信越化学工業株式会社 | 水酸基含有有機ケイ素化合物 |
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CN103476826B (zh) | 2015-10-14 |
JPWO2012137837A1 (ja) | 2014-07-28 |
TWI512016B (zh) | 2015-12-11 |
TW201245288A (en) | 2012-11-16 |
CN103476826A (zh) | 2013-12-25 |
KR20140022828A (ko) | 2014-02-25 |
JP5948317B2 (ja) | 2016-07-06 |
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