WO2012101927A1 - 荷電粒子線装置 - Google Patents
荷電粒子線装置 Download PDFInfo
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- WO2012101927A1 WO2012101927A1 PCT/JP2011/079166 JP2011079166W WO2012101927A1 WO 2012101927 A1 WO2012101927 A1 WO 2012101927A1 JP 2011079166 W JP2011079166 W JP 2011079166W WO 2012101927 A1 WO2012101927 A1 WO 2012101927A1
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- charged particle
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- 238000012937 correction Methods 0.000 claims abstract description 91
- 230000003287 optical effect Effects 0.000 claims description 36
- 230000000007 visual effect Effects 0.000 claims description 34
- 230000007246 mechanism Effects 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 description 39
- 201000009310 astigmatism Diseases 0.000 description 13
- 238000000034 method Methods 0.000 description 11
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- 238000007796 conventional method Methods 0.000 description 1
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- 238000012986 modification Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1478—Beam tilting means, i.e. for stereoscopy or for beam channelling
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1536—Image distortions due to scanning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20207—Tilt
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2611—Stereoscopic measurements and/or imaging
Definitions
- the present invention relates to a charged particle beam apparatus.
- Patent Document 1 Japanese Patent Laid-Open No. 2-33383
- JP 2010-9907 Patent Document 2
- Japanese Patent Application Laid-Open No. 2004-133867 discloses a method of obtaining a tilt image of a sample by tilting the charged particle beam above the objective lens, using the back-turning action off the axis of the objective lens, and irradiating the sample with the charged particle beam tilted. Is disclosed.
- cited document 2 discloses a technique for performing stereoscopic observation using a charged particle beam apparatus.
- the technique of this document uses an electromagnetic coil to scan a sample with a charged particle beam tilted by a left-right parallax angle, acquire left and right stereo pair images, and display them on a stereoscopic liquid crystal display or the like. It enables stereoscopic image observation in time (real time).
- JP-A 2010-16007 Patent Document 3
- Astigmatism correction the combination of a plurality of astigmatism correction values is evaluated, and the optimum astigmatism correction value is detected.
- correction is performed by moving the sample stage.
- the field of view is compared to when the sample is not tilted. Deviation occurs.
- the upper crossover of the objective lens located on the center of the optical axis is generally deviated from the optical axis by tilting the charged particle beam.
- a field shift occurs as a product of the shift amount and the objective lens reduction ratio.
- a tilt focus correction (dynamic focus) function is provided according to the sample tilt angle, compared to the prior art. It is possible to obtain a focused image over the entire observation field by continuously changing the focus using the image.
- a first object of the present invention is to provide a charged particle beam apparatus that can easily correct a field shift caused by tilting a primary charged particle beam.
- a second object of the present invention is to provide a charged particle beam apparatus in which a visual field shift is suppressed and a good stereoscopic image can be obtained.
- a third object of the present invention is to provide a charged particle beam apparatus capable of observing a predetermined position with a tilted charged particle beam even for an inclined sample.
- a charged particle source a plurality of lenses that converge a primary charged particle beam emitted from the charged particle source, and a scanning coil that scans the primary charged particle beam on a sample
- An objective lens that converges the primary charged particles and irradiates the sample
- a deflector that is arranged above the objective lens and tilts the primary charged particle beam.
- a charged particle beam apparatus that acquires a tilted image or a right-and-left parallax angle image of the sample by irradiating the sample with the primary charged particle beam tilted using a beam, between the objective lens and the deflector
- the aligner further includes a tilt angle of the deflector, the plurality of lens conditions, and a distance between the objective lens and the sample, and the primary charged particles
- the charged particle beam apparatus characterized by having a beam tilt field correction function to correct the vision shift of the sample generated in the tilt when.
- the primary charged particle beam is tilted with respect to the focal point of the objective lens during one line scanning on the sample corresponding to the surface inclination of the sample, and the visual field shift due to the primary charged particle beam.
- the charged particle beam apparatus is characterized by having a tilt focus correction function for simultaneously and continuously correcting the above.
- a charged particle source ; a sample stage; a plurality of lenses that converge a primary charged particle beam emitted from the charged particle source to form a crossover on an optical axis; and
- the charged particle beam apparatus comprising: an objective lens that irradiates a sample placed on a sample stage; and a deflector that is disposed between the objective lens and the crossover and tilts the primary charged particle beam.
- a field correction aligner is further provided between the lens and the deflector, and the field correction aligner is formed in a position different from the crossover by tilting the primary charged particle beam by the deflector. The tilt angle of the primary charged particle beam is corrected so that a positional deviation of a typical crossover from the optical axis coincides with the optical axis. That the charged particle beam apparatus.
- a charged particle source ; a sample stage; a tilt mechanism that tilts the stage; and a plurality of lenses that converge a primary charged particle beam emitted from the charged particle source to form a crossover on the optical axis;
- a scanning coil that scans the primary charged particle beam on a sample placed on the sample stage, an objective lens that converges the primary charged particles and irradiates the sample, and between the objective lens and the crossover
- the charged particle beam apparatus having a deflector that tilts the primary charged particle beam, a control CPU that controls these, and an image display device that is connected to the control CPU, the objective lens and the deflector
- a visual field aligner is further provided between the first charged particle beam and the surface of the sample placed on the sample stage tilted by the tilt mechanism.
- the control CPU scans the objective lens so that the scanning coil scans the primary charged particle beam in the tilt direction of the tilted sample stage.
- the primary charged particle beam is focused on the surface of the sample, and the field correction aligner tilts the primary charged particle beam by the deflector and the primary charged particle beam by the objective lens.
- the focal position By changing the focal position, the positional deviation of the virtual crossover formed at a position different from the crossover from the optical axis is made to coincide with the optical axis so that the tilt angle of the primary charged particle beam is corrected.
- the charged particle beam apparatus is characterized by being controlled to the above.
- the charged particle beam apparatus that can easily correct the visual field deviation caused by tilting the primary charged particle beam by having the aligner that corrects the visual field deviation, and the visual field deviation can be suppressed. It is possible to provide a charged particle beam apparatus capable of obtaining a favorable stereoscopic image.
- the tilted focus correction function that simultaneously and continuously corrects the visual field shift caused by the primary charged particle beam tilted with the focal point of the objective lens while the sample is scanned on the sample line in response to the surface tilt of the sample.
- a charged particle beam apparatus capable of observing a predetermined position with a tilted charged particle beam even if it is an inclined sample.
- FIG. 1 is an overall schematic configuration diagram of a scanning electron microscope that is an example of a charged particle beam apparatus according to a first embodiment. It is a figure for demonstrating the electron beam orbit at the time of tilt image observation. It is a figure for demonstrating the electron beam orbit at the time of stereoscopic image observation. It is a figure for demonstrating the mechanism of the visual field deviation generation
- the primary charged particle beam emitted from the charged particle source is converged by a plurality of lenses, the primary charged particle beam is tilted by an electromagnetic coil above the objective lens, and the objective lens is turned back.
- a charged particle beam apparatus that acquires a tilt image of a sample or a left-right parallax angle image by scanning the sample with a charged particle beam tilted by using an aligner disposed between the objective lens and the electromagnetic coil.
- the plurality of lens conditions, and a correction amount determined from the distance between the objective lens and the sample, and the visual field shift of the sample that occurs when the charged particle beam is tilted It is characterized by dynamic correction in conjunction with the lens focus change.
- FIG. 1 is a schematic configuration diagram of a scanning electron microscope which is an example of a charged particle beam apparatus according to the present embodiment. Although an example using an electron beam is described here, the present invention can also be applied to the case of using an ion beam. In addition, the same code
- a voltage is applied to the filament (cathode) 1 and the anode 3 by a high voltage control power source 20 controlled by the control CPU 40, and the primary electron beam 4 is drawn from the filament 1 with a predetermined emission current.
- components that are directly or indirectly connected to the control CPU 40 are controlled by the control CPU 40.
- An acceleration voltage is applied between the filament 1 and the anode 3 by a high-voltage control power source 20 controlled by the CPU 40, and the primary electron beam 4 emitted from the cathode (filament) 1 is accelerated and proceeds to the subsequent lens system.
- Reference numeral 2 denotes Wehnelt.
- the primary electron beam 4 is converged by the first and second converging lenses 5 and 6 controlled by the first and second lens control power supplies 21 and 22, and unnecessary regions of the primary electron beam are removed by the diaphragm plate 8. Later, the sample is converged as a minute spot on the sample 10 by the objective lens 7 controlled by the objective lens control power source 23.
- the primary electron beam 4 is two-dimensionally scanned on the sample 10 by a scanning coil 9 constituted by two upper and lower stages.
- Reference numeral 24 denotes a scanning coil control power source.
- a secondary signal 12 such as secondary electrons generated from the sample 10 by irradiation of the primary electron beam travels to the lower part of the objective lens 7 and is then detected by the secondary signal detector 13.
- the signal detected by the secondary signal detector 13 is amplified by the signal amplifier 14 and then displayed on the image display device 41 as a sample image.
- an octupole astigmatism corrector 51 for correcting astigmatism in the X and Y directions is arranged.
- Reference numeral 32 denotes a control power supply for the astigmatism corrector.
- An astigmatism corrector aligner that corrects the axial deviation of the astigmatism corrector 52 is disposed in the vicinity of the astigmatism corrector 52 or at the same position.
- Reference numeral 33 denotes an aligner control power source for the astigmatism corrector.
- the sample 10 to be observed is placed on the sample stage 15, and the observation field of view can be changed by moving the sample stage 15.
- the movement of the sample stage 15 is performed manually or electrically.
- the movement direction is the Z direction in the optical axis direction, and the sample can be rotated not only in the three directions XYZ but also the optical axis as a rotation axis. It is also possible to tilt the sample 10 from a plane perpendicular to the angle 0 °.
- the sample stage was driven using the stage drive unit and the power source 16.
- FIG. 2 is a diagram for explaining an electron beam trajectory during tilt image observation
- FIG. 3 is a diagram for explaining an electron beam trajectory during stereoscopic image observation.
- a tilt (tilt) angle control deflector 53 is arranged at the same position on the upper stage of the scanning coil 9, and the tilted primary electron beam 4 is used for tilt image and stereoscopic image observation, and the objective lens 7 is moved back.
- the sample 10 is irradiated with the primary electron beam 4 tilted.
- Reference numeral 34 denotes an inclination angle control deflector control power source.
- FIG. 2 shows not only the central trajectory of the primary electron beam 4 but also the spread of the electron beam.
- the primary electron beam 4 drawn from the filament 1 and passed through the first converging lens 5 and the second converging lens 6 connects the crossover 100 on the optical axis, passes through the diaphragm plate 8, and is deflected by the tilt angle control deflector 53. Tilted.
- the tilted electron beam 61 passes off the axis of the objective lens 7 and is tilted from the optical axis by the swinging action of the objective lens 7 and irradiated onto the sample 10 to obtain a tilted image.
- the tilt angle control deflector 53 is used to set the optical axis as the target axis.
- Two left and right tilted electron beams 62 and 63 are formed, and left and right stereo pair images are acquired.
- the acquired image is subjected to image processing by the control CPU 40 and displayed on a stereoscopic display monitor (image display device 41) or the like, thereby enabling stereoscopic image observation.
- FIG. 4 is an explanatory view of the mechanism of occurrence of visual field shift due to electron beam tilt.
- the explanation will be made with an electron beam center trajectory that has not received a deflection signal for scanning.
- the electron beam that has passed through the second focusing lens 6 forms a crossover 100 above the deflection coil (scanning coil) 9 and the tilt angle control deflector 53.
- the sample 10 is deflected by the tilt angle control deflector 53 at an angle ⁇ 0 [rad] and is turned back by the objective lens 7. Is irradiated.
- the electron beam reaches the point is not on the optical axis, a point shifted from the optical axis by a distance [Delta] r i.
- M obj and ⁇ r 0 are as follows.
- the misalignment distance ⁇ r i varies depending on a, b, ⁇ i , particularly ⁇ i , and several tens of ⁇ m are generated even at ⁇ i of 10 ° or less. Even a few hundred times of observation is not negligible.
- a is the distance from the crossover to the objective lens
- b is the distance to the observation surface of the sample from the objective lens
- D 1 is the distance from the tilt angle control deflector 53 to the field correction aligner 54.
- FIG. 5 is a diagram for explaining a method of correcting the field deviation due to the electron beam tilt.
- the correction of the visual field deviation is performed by using the visual field correction aligner 54.
- the tilt electron beam deflected by the angle ⁇ 0 by the tilt angle control deflector 53 is deflected by the correction angle ⁇ 0 [rad], and is virtually crossed by the distance ⁇ r 0 from the optical axis. Over is corrected to coincide with the optical axis.
- Reference numeral 35 denotes a field correction aligner control power source. It should be noted that regarding the positional deviation of the virtual crossover from the optical axis, if the distance ⁇ r 0 is within ⁇ 200 ⁇ m, it can be regarded as coincident with the optical axis.
- the correction angle ⁇ 0 is obtained as follows from geometric calculation.
- the charged particle beam was tilted above the objective lens, and the sample was observed by correcting the crossover virtually deviating from the optical axis to coincide with the optical axis.
- a tilt image at a desired position could be observed in the observation field even at a high magnification of 1000 times or more.
- the charged particle can be easily corrected even when the specimen is observed by tilting the primary electron beam by providing the aligner for visual field correction.
- a wire device can be provided. Further, even when a left and right stereo pair image is acquired using two left and right tilted charged particle beams with the optical axis as a target axis, a charged particle beam that suppresses a visual field shift and obtains a good stereoscopic image.
- An apparatus can be provided.
- FIG. 6 is a diagram for explaining a charged particle beam trajectory at the time of tilt beam observation of a surface tilt sample using the charged particle beam apparatus (scanning electron microscope) according to the present embodiment, and FIG. It is a signal time chart at the time of correction.
- tilt focus correction for continuously changing the focus in accordance with the sample surface tilt ⁇ is performed on the sample 10 with a large sample surface tilt ⁇ using the tilt axis movement of the sample stage 15 or the like.
- the sample stage 15 can be tilted at an angle of ⁇ 20 degrees to 90 degrees with respect to a horizontal plane (a plane perpendicular to the optical axis).
- Reference numeral 105 indicates the scanning direction of the primary electron beam.
- b min1 represents the minimum distance between the objective lens and the sample surface within the observation field when scanning the primary electrons
- b max1 represents the maximum distance.
- FIG. 7 shows various signal control diagrams at this time.
- I DEF is a deflection signal supplied from the scanning coil control power source 24 to the scanning coil 9 for scanning the primary electron beam
- I obj is an objective lens control power source for focusing the primary electron beam on the sample surface.
- the objective lens signal I Tilt_AL supplied to the lens is a field correction aligner control signal supplied from the field correction aligner control power source to the field correction aligner in order to correct the positional deviation from the virtual crossover optical axis.
- I Tilt indicates a tilt angle control deflector signal. Since the height position of the sample to be observed changes in accordance with the upper deflection signal I DEF , the middle objective lens signal I obj is changed by tilt focus correction.
- the visual field correction aligner control signal I Tilt_AL is also changed.
- the deflection signal I DEF advances (the primary electron beam is scanned 105 in the right direction in the drawing)
- the sample is lowered, so that the objective lens current I obj is reduced (objective) as a property of the objective lens.
- the lens focus characteristic is non-linear and has a tendency as shown in FIG.
- the signal I Tilt_AL of the field correction aligner gradually increases according to the equation (3) because b increases (b min1 ⁇ b max1 ). These are performed using the control CPU.
- the deflection signal I DEF is not changed in accordance with the sample tilt, the range in which the tilted sample is scanned is different from the scan range ( ⁇ L) when the sample tilt is not performed. Hence the magnification is also different.
- the field-of-view correction by the field-correction aligner 54 is not only inclined focus correction but also the tilt magnification correction is used at the same time, which makes it easier to use.
- the tilt magnification correction is a technique for preventing the image magnification from changing before and after the sample tilt, and is performed by changing the scanning range of the scanning coil 9 according to the sample tilt angle. The scanning range for correcting the tilt magnification is changed using the control CPU.
- FIG. 8 is a diagram for explaining a charged particle beam trajectory when tilt beam observation of a tilted sample is performed while tilt magnification correction is performed
- FIG. 9 is a signal time chart at the time of simultaneous correction of focus, field shift, and magnification. .
- a solid line indicates a case where magnification correction is performed
- a broken line indicates a case where magnification correction is not performed.
- the deflection signal I DEF is controlled on the sample surface tilted at the tilt angle ⁇ using the tilt magnification correction function, and scanning is performed in the same scanning range ⁇ L as before tilting. Looking at the change in the control signal at that time, the deflection width is increased on the left side of the optical axis and decreased on the right side with reference to the sample center height (b). However, the difference in the amount of change in the scanning width between the left and right is as small as less than 2%. Absent. At the same time, the focus correction and visual field deviation correction signals are also corrected.
- FIG. 10 shows an example of a user input screen in the scanning electron microscope according to the present embodiment. From the figure, the user can use the three functions of “beam tilt visual field correction”, “tilt focus correction”, and “tilt magnification correction”, which are visual field deviation corrections, by checking the check box 107. These functions can be used individually or in combination.
- a slider 109 is attached to “tilt focus correction” and “tilt magnification correction”, and the user determines the tilt angle of the sample.
- a charged particle beam apparatus capable of observing a predetermined position is provided by providing a field correction aligner, so that even a tilted sample that performs tilted focus correction suppresses displacement. Can be provided. Furthermore, a perspective image with high dimensional accuracy can be obtained by providing the tilt focus correction function.
- this invention is not limited to an above-described Example, Various modifications are included.
- the above-described embodiments have been described in detail for easy understanding of the present invention, and are not necessarily limited to those having all the configurations described.
- a part of the configuration of a certain embodiment can be replaced with the configuration of another embodiment, and the configuration of another embodiment can be added to the configuration of a certain embodiment.
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Abstract
Description
本発明の他の目的、特徴及び利点は添付図面に関する以下の本発明の実施例の記載から明らかになるであろう。
走査コイル9上段の同位置には、チルト(傾斜)角制御用偏向器53が配置され、チルト像および立体像観察時には、一次電子線4を傾斜させ、対物レンズ7の振り戻し作用を用いて、試料10に一次電子線4をチルトさせて照射する。符号34は傾斜角制御用偏向器制御電源である。
例えば、上記した実施例は本発明を分かりやすく説明するために詳細に説明したものであり、必ずしも説明した全ての構成を備えるものに限定されるものではない。また、ある実施例の構成の一部を他の実施例の構成に置き換えることも可能であり、また、ある実施例の構成に他の実施例の構成を加えることも可能である。また、各実施例の構成の一部について、他の構成の追加・削除・置換をすることが可能である。
2 ウェネルト
3 陽極
4 一次電子線
5 第一収束レンズ
6 第二収束レンズ
7 対物レンズ
8 絞り板
9 走査コイル
10 試料
12 二次信号
13 二次信号用検出器
14 信号増幅器
15 試料ステージ
16 ステージ駆動ユニットおよび電源
20 高圧制御電源
21 第一収束レンズ制御電源
22 第二収束レンズ制御電源
23 対物レンズ制御電源
24 走査コイル制御電源
32 非点補正器用制御電源
33 非点補正器用アライナー制御電源
34 傾斜角制御用偏向器制御電源
35 視野補正用アライナー制御電源
40 制御CPU
41 表示モニター
51 非点補正器
52 非点補正器用アライナー
53 傾斜(チルト)角制御用偏向器
54 視野補正用アライナー
61 チルト電子線
62 左側チルト電子線
63 右側チルト電子線
100 クロスオーバ
105 スキャン方向
107 チェックボックス
109 スライダ
Claims (10)
- 荷電粒子源と、前記荷電粒子源から放出される一次荷電粒子線を収束する複数のレンズと、前記一次荷電粒子線を試料上で走査する走査コイルと、前記一次荷電粒子を収束して前記試料に照射する対物レンズと、前記対物レンズよりも上段に配置され、前記一次荷電粒子線をチルトさせる偏向器とを有し、前記対物レンズの振り戻を用いてチルトさせた前記一次荷電粒子線を前記試料に照射することにより、前記試料のチルト像、もしくは左右視差角像を取得する荷電粒子線装置において、
前記対物レンズと前記偏向器の間にアライナーが更に備えられ、
前記アライナーは、前記偏向器のチルト角、前記複数のレンズ条件、前記対物レンズと前記試料までの距離を用いて、前記一次荷電粒子線のチルト時に発生する前記試料の視野ずれを補正するビームチルト視野補正機能を有することを特徴とする荷電粒子線装置。 - 請求項1記載の荷電粒子線装置において、
前記試料の表面傾斜に対応して、前記一次荷電粒子線が前記試料上を1ライン走査中に前記対物レンズの焦点とチルトした前記一次荷電粒子線による視野ずれを同時、連続的に補正する傾斜焦点補正機能を有することを特徴とする荷電粒子線装置。 - 請求項2記載の荷電粒子線装置において、
前記対物レンズの焦点補正とチルトした前記一次荷電粒子線による視野ずれ補正と同時に走査幅を変更し、前記試料表面傾斜を行わない場合と同等の領域を走査する傾斜倍率補正機能を有することを特徴とする荷電粒子線装置。 - 請求項3記載の荷電粒子線装置において、
更に、画像表示装置を備え、
前記画像表示装置は、ビームチルト視野補正、傾斜焦点補正、傾斜倍率補正の3つの内の少なくとも一つを実行可能とする入力手段を含むGUI画面を表示するものであることを特徴とする荷電粒子線装置。 - 荷電粒子源と、試料ステージと、前記荷電粒子源から放出される一次荷電粒子線を収束して光軸上にクロスオーバを形成する複数のレンズと、前記一次荷電粒子を収束して前記試料ステージに載置される試料に照射する対物レンズと、前記対物レンズと前記クロスオーバとの間に配置され、前記一次荷電粒子線をチルトさせる偏向器とを有する荷電粒子線装置において、
前記対物レンズと前記偏向器の間に視野補正用アライナーが更に備えられ、
前記視野補正用アライナーは、前記偏向器により前記一次荷電粒子線をチルトすることにより前記クロスオーバとは異なる位置に形成される仮想的なクロスオーバの前記光軸からの位置ずれが前記光軸と一致するように前記一次荷電粒子線のチルト角度を補正するものであることを特徴とする荷電粒子線装置。 - 請求項5記載の荷電粒子線装置において、
前記一致は、±200μm以内の範囲を許容することを特徴とする荷電粒子線装置。 - 請求項5記載の荷電粒子線装置において、
前記チルト角度の補正角度は、前記偏向器によりチルトされる前記一次荷電粒子線のチルト角度と、前記偏向器と前記視野補正用アライナーとの間の距離と、前記視野補正用アライナーと前記対物レンズとの間の距離と、前記複数のレンズにより形成される前記一次荷電粒子線のクロスオーバと前記対物レンズとの間の距離とを用いて決定されることを特徴とする荷電粒子線装置。 - 請求項5記載の荷電粒子線装置において、
前記一次荷電粒子線は、前記偏向器により前記光軸を対称軸として左右にチルトして2本の一次荷電粒子線とされ、前記試料の左右のステレオペア画像取得用として用いられるものであることを特徴とする荷電粒子線装置。 - 荷電粒子源と、試料ステージと、前記ステージを傾斜させる傾斜機構と、前記荷電粒子源から放出される一次荷電粒子線を収束して光軸上にクロスオーバを形成する複数のレンズと、前記一次荷電粒子線を前記試料ステージに載置される試料上で走査する走査コイルと、前記一次荷電粒子を収束して前記試料に照射する対物レンズと、前記対物レンズと前記クロスオーバとの間に配置され、前記一次荷電粒子線をチルトさせる偏向器と、これらを制御する制御CPUと、前記制御CPUに接続された画像表示装置とを有する荷電粒子線装置において、
前記対物レンズと前記偏向器の間に視野補正用アライナーが更に備えられ、
前記傾斜機構を用いて傾斜させた前記試料ステージに載置される前記試料の表面に前記一次荷電粒子線を照射してチルト像を観察する際に、
前記制御CPUは、
前記走査コイルが、傾いた前記試料ステージの傾斜方向に前記一次荷電粒子線を走査するように、かつ、
前記対物レンズが、走査される前記一次荷電粒子線が前記試料の表面において焦点を結ぶように、かつ、
前記視野補正用アライナーが、前記偏向器により前記一次荷電粒子線をチルトすること及び前記対物レンズにより前記一次荷電粒子線の焦点位置を変更することにより前記クロスオーバとは異なる位置に形成される仮想的なクロスオーバの前記光軸からの位置ずれを前記光軸と一致させ前記一次荷電粒子線のチルト角度を補正するように制御するものであることを特徴とする荷電粒子線装置。 - 請求項9記載の荷電粒子線装置において、
前記制御CPUは、更に、
前記傾斜前と等しい走査範囲にて走査を行うように前記走査コイルを制御するものであることを特徴とする荷電粒子線装置。
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JP5698157B2 (ja) | 2012-01-06 | 2015-04-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置および傾斜観察画像表示方法 |
JP6022344B2 (ja) * | 2012-12-21 | 2016-11-09 | 株式会社日立ハイテクノロジーズ | 演算装置及び荷電粒子線応用装置 |
JP6165643B2 (ja) * | 2014-01-23 | 2017-07-19 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置、荷電粒子ビーム装置の制御方法及び断面加工観察装置 |
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JP6930431B2 (ja) * | 2018-01-10 | 2021-09-01 | 株式会社ニューフレアテクノロジー | アパーチャのアライメント方法及びマルチ荷電粒子ビーム描画装置 |
JP7047523B2 (ja) * | 2018-03-26 | 2022-04-05 | 株式会社島津製作所 | 荷電粒子ビーム軸合わせ装置、荷電粒子ビーム照射装置および荷電粒子ビーム軸合わせ方法 |
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