WO2012035920A1 - 露光装置 - Google Patents
露光装置 Download PDFInfo
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- WO2012035920A1 WO2012035920A1 PCT/JP2011/068576 JP2011068576W WO2012035920A1 WO 2012035920 A1 WO2012035920 A1 WO 2012035920A1 JP 2011068576 W JP2011068576 W JP 2011068576W WO 2012035920 A1 WO2012035920 A1 WO 2012035920A1
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- WIPO (PCT)
- Prior art keywords
- light
- exposure
- light source
- mask
- material film
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/20—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
- G02F1/133723—Polyimide, polyamide-imide
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
- G02F1/133757—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle with different alignment orientations
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
Definitions
- the present invention relates to an exposure apparatus for manufacturing an alignment material film of a liquid crystal display device for displaying a three-dimensional image by divided exposure, and in particular, a portion corresponding to each pixel of the liquid crystal display device in the alignment material film is divided into two to be different
- the present invention relates to an exposure apparatus that photo-aligns an alignment material film by exposing from a direction or by exposing a portion corresponding to each pixel from a different direction for each pixel adjacent in the width direction.
- liquid crystal used for, for example, a liquid crystal display or the like
- a liquid crystal composed of a plurality of benzene or cyclohexane molecules and rod-shaped molecules composed of modification groups at both ends is used as a liquid crystal used for, for example, a liquid crystal display or the like.
- the viewing angle and contrast of a liquid crystal display or the like are adjusted by aligning in various directions.
- an alignment film made of, for example, polyimide or the like is formed on the surface of a glass substrate that sandwiches liquid crystal, and the liquid crystal molecules are aligned with the alignment direction of the alignment film by sandwiching the liquid crystal between the alignment films. Are aligned in a predetermined direction.
- an alignment film When forming an alignment film on the surface of a glass substrate, for example, a polyimide solution is applied and baked on the glass substrate to form a polyimide film (alignment material film) of about several tens of nm, and then a cloth is wound around the surface.
- a manufacturing method in which the surface of the polyimide film (alignment material film) is rubbed in one direction by a rubbing roller for example, Patent Document 1 is employed.
- FIG. 9 is a schematic diagram showing exposure in conventional alignment division
- FIG. 9A is a side view showing alignment division exposure by a conventional exposure apparatus
- FIG. 9B is a perspective view.
- exposure light 11a and 12a are emitted from two light sources (first light source 11 and second light source 12) at different emission angles, respectively.
- 11a and 12a are transmitted through the mask 13 disposed between the first light source 11 and the second light source 12 and the exposure target member 2.
- FIG. 10 is a diagram showing a mask and an alignment film formed by one exposure in this alignment division type exposure apparatus. As shown in FIG.
- the mask 13 is composed of a frame body 130 and a pattern forming part 131 at the center thereof.
- the pattern forming part 131 includes first and second patterns.
- a plurality of light transmissive regions are arranged in one row to form a first light transmissive region group 131a and a second light transmissive region group 131b.
- the first light transmissive region group 131a and the second light transmissive region group 131b are spaced apart from each other in the scanning direction relative to the mask 13 of the alignment material film, and each of the plurality of light transmissive regions has a width of one picture element. It corresponds to the half area divided in the direction.
- the light transmissive regions of the first light transmissive region group 131a and the light transmissive regions of the second light transmissive region group 131b are arranged at an interval so as not to overlap in the scanning direction. .
- a plurality (six in FIG. 10B) of light transmission regions of the first and second light transmission region groups 131a and 131b are arranged in the scanning direction. Is formed. Then, by irradiating the exposure light 11a and 12a from the first and second light sources 11 and 12 from different directions to the different regions 131a and 131b of the mask 13, the light transmitted through the light transmission region is placed on the stage 15.
- the alignment material film on the surface of the supported exposure target member 2 is irradiated and exposed.
- a plurality of light transmission regions are obtained in each of the width direction that is the division direction of the picture elements and the length direction (scan direction) perpendicular thereto by one exposure.
- the alignment material film is exposed to the exposure light transmitted through the alignment layer, and the alignment film is formed so that a plurality of regions corresponding to the picture elements having the same alignment direction are aligned in the width direction and the length direction.
- the angles at which the exposure light beams 11a and 12a are inclined with respect to the exposure target surface are different, an alignment film oriented in two directions is obtained. Accordingly, the R (red), G (green), and B (blue) picture elements of a liquid crystal display or the like are divided into two regions and irradiated with exposure light 11a and 12a, respectively. Then, in one picture element such as a liquid crystal display, the alignment direction of the alignment film is two directions, and the liquid crystal molecules can be aligned in two directions. Thereby, a viewing angle of a liquid crystal display or the like can be widened. Further, in such an alignment division type exposure apparatus, instead of arranging a plurality of light transmission regions of the mask shown in FIG.
- each light transmission region extends in the scanning direction.
- Each light transmission region corresponds to a region including a plurality of pixels arranged in the scan direction, and light is continuously transmitted through this light transmission region, so that a region in which the alignment direction of the alignment film is aligned is belt-shaped in the scan direction. It is also formed to extend. Thereby, an alignment film having a different alignment direction is manufactured for each region to be a pixel adjacent in the width direction.
- a mask stage 14 that supports a mask 13 is arranged on one light source side of two light sources. Therefore, in the conventional exposure apparatus, when it is necessary to reduce the angle at which the exposure light 11a is inclined with respect to the exposure target surface in the direction in which the alignment film is aligned, as shown in FIG. (Part A in FIG. 11) is located on the optical path of the exposure light 11a, and there is a problem that the alignment film cannot be exposed in a predetermined pattern due to interference with the exposure light 11a.
- the exposure lights 11a and 12a emitted from the first and second light sources 11 and 12 are close to the light source sides of the mask 13, respectively. Permeate the area. Therefore, when it is necessary to reduce the angle at which the exposure light 11a, 12a is inclined with respect to the exposure target surface, it is necessary to increase the distance between the first and second light sources 11, 12, and the exposure apparatus There is a problem of increasing the size.
- the present invention has been made in view of such problems, and in an exposure apparatus that manufactures an alignment material film used in a liquid crystal display device that displays a three-dimensional image by alignment division exposure, exposure light is an object to be exposed.
- An object of the present invention is to provide an exposure apparatus that can normally expose an alignment material film in a predetermined pattern even when it is necessary to reduce the angle of inclination with respect to the surface, and can be miniaturized.
- An exposure apparatus is an exposure apparatus that photo-aligns an alignment material film by dividing a portion corresponding to each pixel of a liquid crystal display device in the alignment material film into two in the width direction and exposing from different directions.
- First light transmitting region group in which first and second light sources that emit exposure light and a plurality of light transmitting regions that transmit the exposure light from the first and second light sources are arranged in one row, respectively.
- a mask on which the second light transmission region group is formed, and a mask support portion that is disposed on the first light source side and supports the mask, and the first and second light transmission region groups are
- the alignment material film is spaced apart in the scanning direction relative to the mask, and each of the plurality of light transmission regions corresponds to a half region divided in the width direction of one picture element.
- a light transmission region of the light transmission region group and the second light transmission region The light transmission regions of the group are arranged with a space therebetween so as not to overlap in the scanning direction, and exposure light from the first light source and the second light source is transmitted to the first and second light sources.
- a region corresponding to each divided region of each picture element in the alignment material film is irradiated so as to intersect each other on an optical path between the light source and the alignment material film.
- This exposure apparatus divides each picture element of a liquid crystal display device into two in the width direction and exposes the respective alignment directions to be different directions, and is suitable for forming an alignment film having a wide viewing angle. It is.
- Another exposure apparatus is an exposure in which the alignment material film is photo-aligned by dividing the portion corresponding to each pixel of the liquid crystal display device in the alignment material film into two in the width direction and exposing from different directions.
- a first light transmissive region group in which a first light source and a second light source that emit exposure light and a plurality of light transmissive regions that transmit the exposure light from the first light source are arranged in a row is provided.
- a first mask formed; a first mask support portion disposed on the second light source side to support the first mask; and a plurality of lights that transmit exposure light from the second light source.
- the first and second light transmission region groups each include a plurality of light transmission regions.
- the region corresponds to a half region divided in the width direction of one picture element, and exposure light from the first light source and the second light source is used as the first light source and the alignment material film.
- the region corresponding to each divided region of each picture element in the alignment material film is irradiated so as to cross each other on the optical path between the first and second alignment material films.
- This exposure apparatus divides each picture element of a liquid crystal display device into two in the width direction and exposes the respective alignment directions to be different directions, and is suitable for forming an alignment film having a wide viewing angle. It is.
- Still another exposure apparatus photo-aligns the alignment material film by exposing the alignment material film corresponding to each pixel of the liquid crystal display device from different directions for each pixel adjacent in the width direction.
- the first and second light sources that emit exposure light and the first light in which a plurality of light transmission regions that transmit the exposure light from the first and second light sources are arranged in one row, respectively.
- a mask formed with a transmissive region group and a second light transmissive region group; and a mask support portion disposed on the first light source side to support the mask, and the first and second light transmissive members.
- the group of regions is spaced apart in the scan direction relative to the mask of the alignment material film, and each of the plurality of light transmission regions corresponds to a region including a plurality of pixels arranged in the scan direction.
- Light transmission of one light transmission region group And the light transmissive regions of the second light transmissive region group are arranged with a space therebetween so as not to overlap in the scan direction, and from the first light source and the second light source Exposure light is irradiated on a region corresponding to a region including a plurality of pixels arranged in the scanning direction in the alignment material film by crossing each other on an optical path between the first and second light sources and the alignment material film. It is characterized by doing.
- This exposure apparatus exposes each pixel of a liquid crystal display device so that the alignment direction differs for each pixel adjacent in the width direction.
- a polarizing film used as a polarizing film for a 3D display It is also suitable for forming.
- Still another exposure apparatus photo-aligns the alignment material film by exposing the alignment material film corresponding to each pixel of the liquid crystal display device from different directions for each pixel adjacent in the width direction.
- a first light transmission region group in which first and second light sources that emit exposure light and a plurality of light transmission regions that transmit the exposure light from the first light source are arranged in a row.
- the first and second light transmission region groups are respectively Several light transmission regions correspond to a region including a plurality of pixels arranged in the scanning direction, and exposure light from the first light source and the second light source is converted into the first and second light sources. Irradiating a region corresponding to a region including a plurality of pixels arranged in the scanning direction in the alignment material film so as to intersect each other on an optical path between the alignment material film and the alignment material film.
- This exposure apparatus exposes each pixel of a liquid crystal display device so that the alignment direction differs for each pixel adjacent in the width direction.
- the intersection position of the exposure light from the first light source and the exposure light from the second light source is between the first and second light sources and the mask. .
- the intersection position of the exposure light from the first light source and the exposure light from the second light source is, for example, between the mask and the alignment material film.
- the exposure light from the first light source and the second light source intersects each other on the optical path between the first and second light sources and the alignment material film, and each picture on the alignment material film is obtained. Irradiation is performed on each elementary region or a region corresponding to a region including a plurality of pixels arranged in the scanning direction.
- the distance between light sources can be shortened. Therefore, the exposure apparatus of the present invention has a wider range in which the exposure light can be irradiated without interfering with the apparatus itself, and the angle at which the exposure light is inclined with respect to the exposure target surface is smaller than that of the conventional exposure apparatus.
- the alignment material film can be normally exposed.
- the entire apparatus can be miniaturized.
- (A) is a side view which shows orientation division
- (b) is a perspective view similarly.
- (A) is the top view which shows a mask in the exposure apparatus which concerns on 1st Embodiment of this invention
- (b) is the A section enlarged view which shows a part of light transmissive area
- (c) ) Is a view showing an alignment film formed by one exposure in the exposure apparatus according to the first embodiment of the present invention.
- the exposure apparatus which concerns on 1st Embodiment of this invention it is a schematic diagram which shows the relationship between a mask and exposure light.
- (A) And (b) is a figure which shows the modification of a mask in the exposure apparatus which concerns on 1st Embodiment of this invention
- (c) is the orientation formed with the mask of FIG. 4 (a) and (b). It is a figure which shows a film
- (A) is a side view which shows orientation division
- (b) is a perspective view similarly.
- it is a schematic diagram which shows the relationship between a mask and exposure light.
- (A) is a side view which shows orientation division
- (b) is a perspective view similarly.
- the exposure apparatus which concerns on 3rd Embodiment of this invention it is a top view which shows a mask.
- (A) is a side view which shows orientation division
- (b) is a perspective view similarly.
- (A) is a plan view showing a mask in a conventional exposure apparatus, (b) is an enlarged view of part A showing a part of a light transmission region group in FIG. 10 (a), and (c) is in a conventional exposure apparatus. It is a figure which shows the alignment film formed by one exposure.
- it is a schematic diagram which shows the relationship between a mask and exposure light.
- FIG. 1A is a side view showing alignment division exposure by the exposure apparatus according to the first embodiment of the present invention
- FIG. 1B is a perspective view
- 2A is a plan view showing a mask in the exposure apparatus according to the first embodiment of the present invention
- FIG. 2B is an enlarged view of part A showing a part of the light transmission region group in FIG. 2A
- FIG. 2 and FIG. 2C are diagrams showing alignment films formed by one exposure in the exposure apparatus according to the first embodiment of the present invention.
- FIG. 3 is a schematic diagram showing the relationship between the mask and the exposure light in the exposure apparatus according to the first embodiment.
- each light transmission region extends in the scan direction, and each light transmission region corresponds to a region including a plurality of pixels arranged in the scan direction, and the alignment direction is aligned by continuous exposure.
- the region is formed so as to extend in a strip shape in the scanning direction.
- the exposure apparatus 1 includes two light sources (a first light source 11 and a second light source 12) that emit exposure light 11a and 12a, and a mask 13 having a pattern formed on the surface. And the mask stage 14 that supports the mask 13.
- the exposure target member 2 supported on the stage 15, for example, a glass substrate having an alignment material film formed on the surface is irradiated with exposure light 11 a and 12 a.
- the exposure target member 2 is shown as being slightly larger than the mask 13, but the present invention is not limited by the size of the exposure target member 2.
- Each of the first and second light sources 11 and 12 is, for example, a light source that emits ultraviolet light.
- a mercury lamp, a xenon lamp, an excimer lamp, an ultraviolet LED, or the like is preferably used.
- the alignment material film on the surface of the exposure target member 2 is irradiated with the exposure light 11a and 12a with a predetermined light amount, respectively.
- a collimator lens and / or a reflecting mirror is disposed.
- the first and second light sources 11 and 12 can be configured to adjust the emission direction of the exposure light 11a and 12a, for example, by a control device (not shown), thereby adjusting the incident angle to the exposure target member 2.
- the exposure apparatus 1 of the present embodiment emits exposure light 11a and 12a from the first and second light sources 11 and 12 so as to intersect each other between the first and second light sources 11 and 12 and the mask 13.
- the exposure lights 11a and 12a in this embodiment are both linearly polarized exposure lights, for example, P-polarized light and S-polarized light, and do not interfere with each other even when they intersect on the optical path.
- the alignment directions of the liquid crystal molecules can be made different from each other.
- the alignment material films are adjacent in one pixel or in the width direction.
- the orientation angle of the alignment film is set to two directions for each pixel to widen the viewing angle of a liquid crystal display or the like.
- the mask 13 is composed of, for example, a frame body 130 and a pattern forming portion 131 at the center thereof.
- a plurality of light transmission regions are arranged in a line in a direction perpendicular to the scanning direction, respectively, and the first light transmission region group 131a and A second light transmission region group 131b is formed.
- the first light transmission region group 131a and the second light transmission region group 131b are arranged apart from each other in the relative scanning direction with respect to the mask 13 of the alignment material film, as shown in FIG.
- each of the plurality of light transmission regions extends in the scanning direction, and corresponds to a region including a plurality of pixels arranged in the scanning direction.
- the light transmissive regions of the first light transmissive region group 131a and the light transmissive regions of the second light transmissive region group 131b are arranged at an interval so as not to overlap in the scanning direction.
- each light transmission region of the first light transmission region group 131a and each light transmission region of the second light transmission region group 131b are staggered along the direction perpendicular to the scan direction so as not to overlap with the scan direction. Are arranged in a shape.
- each light transmissive region of the first and second light transmissive region groups is an opening having a shape that transmits the exposure light 11a and 12a, or is a light transmissive member. Then, by irradiating the exposure light 11a and 12a from the first and second light sources 11 and 12 from different directions to the different regions 131a and 131b of the mask 13, the light transmitted through the light transmission region is placed on the stage 15. The alignment material film on the surface of the supported exposure target member 2 is irradiated and exposed.
- the light transmission region of the pattern forming unit 131 is the first light transmission region group 131 a corresponding to the exposure light 11 a emitted from the first light source 11.
- the second light transmission region group 131b formed on the second light source 12 side and corresponding to the exposure light 12a emitted from the second light source 12 is formed on the first light source 11 side. Therefore, in the present embodiment, as shown in FIG. 2C, the exposure region by the exposure light 11a from the first light source 11 and the exposure region by the exposure light 12a from the second light source 12 are separated from each other. It becomes the position.
- the mask stage 14 supports the frame body 130 of the mask 13 on the first light source 11 side.
- the light source on the mask stage 14 side is named the first light source, but the first and second names themselves are meaningless.
- the mask stage 14 is fixed to another member (not shown) in the exposure apparatus, or the mask stage 14 is configured to move in accordance with the exposure light irradiation area.
- the mask stage 14 can move in the horizontal direction in accordance with an angle at which the exposure light 11a and / or the exposure light 12a is inclined with respect to the exposure target surface of the exposure target member 2.
- the mask stage 14 is configured to be movable in the vertical direction.
- the stage 15 that supports the exposure target member 2 can be adjusted by, for example, computer control. After the exposure target member 2 is installed, the stage 15 is moved to expose the surface of the exposure target member 2. The light irradiation area can be moved. Thereby, the several area
- two exposure light beams 11 a and 12 a are transmitted through the mask 13 and irradiated onto the surface of the exposure target member 2.
- the exposure area by the light 11a and the exposure area by the exposure light 12a from the second light source 12 are spaced apart from each other. Therefore, the adjacent areas of the pixels cannot be exposed simultaneously, but the adjacent unexposed pixels are exposed by the other exposure light by exposing while moving the stage 15.
- the pixels adjacent to each other are exposed at different timings, and the exposure region by the exposure light 11a emitted from the first light source 11 and the exposure by the exposure light 12a emitted from the second light source 12 are exposed.
- An alignment film is formed adjacent to each other.
- the exposure apparatus 1 of the present embodiment converts the exposure light 11a and 12a from the first and second light sources 11 and 12 into light between the first and second light sources 11 and 12 and the mask 13.
- the light is emitted so as to cross each other on the road, and is transmitted through the pattern on the other light source side of the mask 13, and the surface of the exposure target member 2 is irradiated with two exposure lights separated from each other. Therefore, in this embodiment, the distance between the 1st light source 11 and the 2nd light source 12 can be shortened, and the whole apparatus can be reduced in size.
- the exposure target member 2 for example, a glass substrate having an alignment material film formed on the upper surface to a predetermined thickness is placed on the stage 15.
- the position of the exposure target member 2 is adjusted so that the exposure target surface of the alignment material film on the exposure target member 2 is parallel to the upper surface of the stage 15.
- the position of the exposure target member 2 is adjusted so that the exposure target portion of the alignment material film falls within the exposure light irradiation region.
- the position adjustment of the exposure target member 2 is preferably performed by, for example, moving the stage after the exposure target member 2 is set on the computer-controlled movable stage 15. Thereby, the several area
- the direction in which the alignment material film is aligned is determined for each region that becomes pixels arranged in the scan direction. Then, the emission direction of the exposure light from the first and second light sources 11 and 12 is determined so that the exposure light is irradiated to each divided region from a predetermined angle corresponding to the determined orientation direction. Next, the distance between the first light source 11 and the second light source 12 is adjusted so that a predetermined region of the alignment material film formed on the exposure target member 2 can be irradiated with the exposure light, and the mask stage. The position of the pattern of the light transmission region in the mask 13 is adjusted by adjusting the position 14. The mask 13 is selected according to the pattern for exposing the alignment material film.
- the exposure light 11 a emitted from the first light source 11 and the exposure light 12 a emitted from the second exposure light 12 intersect each other on the optical path until the pattern forming part 131 of the mask 12 is irradiated.
- the positions of the first and second light sources 11 and 12 are adjusted. Accordingly, the distance between the first light source 11 and the second light source 12 is smaller than that of a conventional exposure apparatus. Therefore, the range in which the exposure light 11a and 12a can be irradiated without interfering with the apparatus itself (for example, the mask stage 14 or the mask frame 130) is wide.
- Exposure light 11a and 12a emitted from each light source is transmitted or reflected by an optical member such as a collimator lens / and / or a mirror, for example, and travels toward the mask 13 with a predetermined light amount.
- the exposure light 11a emitted from the first light source 11 and the exposure light 12a emitted from the second light source 12 are crossed on the optical path until the pattern forming portion 131 of the mask 13 is irradiated.
- the exposure lights 11a and 12a travel toward the alignment material film without interfering with each other. Since the two exposure lights 11a and 12a intersect each other, even if the angle at which the exposure lights 11a and 12a are inclined with respect to the exposure target surface is reduced, the exposure lights 11a and 12a do not interfere with the mask stage or the like. It heads for 13 predetermined light irradiation area
- the exposure light beams 11a and 12a are irradiated to the corresponding light irradiation regions 131a and 131b of the pattern forming unit 131, the exposure light beams 11a and 12a are applied to the mask 13 corresponding to the pattern of the light transmission region of the pattern forming unit 131.
- the light transmitted through the mask 13 is directed toward the exposure target member 2.
- the exposure light 11a and the exposure light 12a are irradiated to regions separated from each other on the alignment material film.
- the irradiation areas of the exposure light 11a and the exposure light 12a are, for each light transmission area of the mask 13, for example, a pixel (configured by three picture elements R, G, B) such as a liquid crystal display.
- a pixel configured by three picture elements R, G, B
- the alignment material film is aligned in a predetermined direction according to the irradiation angle of the exposure light due to its photodecomposition characteristics. Therefore, the alignment material film in the irradiation region of the exposure light 11a is aligned in the first direction by the incident angle of the exposure light 11a, and the alignment material film in the irradiation region of the exposure light 12a is determined by the incident angle of the exposure light 12a. Orientation is in a second direction different from the first direction.
- the alignment film oriented in the first direction and the alignment film oriented in the second direction are formed so as to extend in a band shape in the scan direction, respectively.
- the exposure light 11a and 12a irradiated to the alignment material film can normally expose the alignment material film without interfering with the apparatus itself on the optical path.
- the exposure light 11a, 12a is continuously irradiated, for example, by moving the stage 15 by computer control, and moving the exposure target member 2 at a constant speed along the scanning direction, for example, exposure light.
- the exposure target member 2 is continuously exposed by continuously irradiating 11a and 12a.
- the adjacent unexposed pixels are eventually exposed with the other exposure light, and the exposure region by the exposure light 11a from the first light source 11 and the exposure region by the exposure light 12a from the second light source 12 are mutually connected. Adjacent alignment films are formed.
- the exposure target member 2 is discharged from the exposure apparatus 1 by moving the stage 15, for example.
- a band-like region having a uniform alignment direction is formed corresponding to each pixel aligned in the scan direction, and the alignment directions of adjacent pixels are different in the direction perpendicular to the scan direction.
- An alignment film is manufactured.
- the liquid crystal is sandwiched between the alignment films of the two produced glass substrates.
- the rod-like molecules of the liquid crystal are aligned in a predetermined direction according to the alignment direction of the alignment film.
- an alignment-divided liquid crystal display material with a wide viewing angle is completed.
- the polarizing film for 3D displays can be manufactured by the formation method of alignment films like this embodiment, for example.
- the alignment direction of the alignment material film can be made different for each pixel constituted by the above.
- the orientation direction in a film surface differs 90 degrees mutually, and the orientation film
- circularly polarized transmitted light having a rotation direction opposite to each other for each display column composed of a plurality of pixels and extending in the width direction of the film. Is emitted.
- These two circularly polarized transmitted lights can be used as display light for the right eye and the left eye of a 3D display, for example.
- the exposure apparatus 1 of the present embodiment emits the exposure light beams 11a and 12a so as to intersect each other on the optical path between the first and second light sources 11 and 12 and the mask 13. Even if the distance between the first light source 11 and the second light source 12 is close and the angle at which the exposure light 11a, 12a is inclined with respect to the exposure target surface is reduced, the alignment material film can be normally exposed. .
- each of the light transmission regions in the first and second light transmission region groups 131a and 131b of the mask 13 includes a plurality of pixels arranged in the scan direction, as shown in FIG. 2B.
- the present invention is not limited to this aspect, and can also be applied to the case where exposure is performed by intermittently irradiating exposure target members with exposure light. That is, for example, as shown in FIGS. 4A and 4B, a plurality of light transmission regions of the first and second light transmission region groups 131a and 131b are arranged along the scanning direction (FIG. 4B).
- each light transmission region corresponds to a region divided into two in the width direction perpendicular to the scanning direction of one picture element.
- region corresponding to several pixel can be exposed by one exposure.
- the stage 15 moves the exposure target member 2 to the first light source 11 side or the second light source 12 side, for example, horizontally at a constant speed along the scan direction, and the movement distance is the pattern in the scan direction.
- the exposure is performed by irradiating exposure light every time it moves by the length (in this modification, the length of six picture elements (see FIG. 4)).
- the two exposure light irradiation areas on the surface of the exposure target member 2 are separated by, for example, an integral multiple of the length of the picture element. That is, in this modification as well, as shown in FIG. 4C, the exposure area by the first light source 11 and the exposure area by the second light source 12 are spaced apart from each other, but the distance between them is By making an integer multiple of the length of the picture element, in the picture element where half the area has already been exposed by one light source, the exposure area by the other light source is made to match the remaining half area of the picture element with high accuracy. Can be exposed. As a result, a region to be a picture element is divided into two, and a plurality of regions in which alignment films having different alignment directions are formed in each divided region are manufactured in a matrix.
- the stage 15 is configured to be movable along the scanning direction by computer control.
- the exposure apparatus of the present invention is not limited to the aspect of the present embodiment.
- the direction of movement may also be controlled by a computer. That is, for example, in the case where step exposure is performed as in the above-described modification, when the formation of the alignment film at one exposure target portion is completed, the region where the pattern is formed is moved in the width direction, for example, the pixel dividing direction.
- the direction in which the stage 15 is moved can be controlled. Thereby, the exposure object parts adjacent in the width direction of the picture element are sequentially exposed.
- each exposure target part can be sequentially stepped exposed.
- FIG. 5A is a side view showing alignment division exposure by the exposure apparatus according to the second embodiment
- FIG. 5B is a perspective view
- FIG. 6 is a schematic diagram showing the relationship between the mask and the exposure light in the exposure apparatus according to the second embodiment.
- the exposure lights 11 a and 12 a emitted from the first and second light sources 11 and 12 are configured to intersect between the first and second light sources 11 and 12 and the mask 13.
- the first and second light sources 11 and 12 are such that the intersection position of the two exposure lights 11a and 12a is the mask 13 and the alignment material. The light is emitted so as to be between the films.
- the positions of the mask 13 and the mask stage 14 are further away from the exposure target member 2 than in the first embodiment.
- the positions of the mask 13 and the mask stage 14 are further away from the exposure target member 2 than in the first embodiment.
- it is the same as that of 1st Embodiment.
- the exposure lights 11a and 12a are emitted so as to intersect each other between the mask 13 and the alignment material film, as shown in FIG. 5, the first light source 11 and the second light source 12 The distance between them needs to be slightly larger than in the case of the first embodiment, but the entire apparatus can be reduced in size as compared with the prior art.
- the range in which the exposure light 11a, 12a can be irradiated without interfering with the apparatus itself is wider than that of the conventional exposure apparatus, and the exposure light 11a, 12a is the exposure target. Even if the angle of inclination with respect to the surface is reduced, the exposure light 11a, 12a is irradiated to the alignment material film without interfering with the mask stage or the like, and the alignment material film can be normally exposed.
- the region is configured to extend in the scanning direction, and the exposure target member 2 is continuously transmitted through each light transmission region while moving the exposure target member 2 at a constant speed along the scan direction, for example.
- a polarizing film for 3D display can be produced by obtaining an alignment film in which the alignment direction is aligned in a band-shaped region along the scanning direction. In this case, since there is no need to adjoin the two divided exposure areas to be picture elements, there is no limitation on the distance in the scanning direction between the two exposure light irradiation areas.
- the irradiation area of the exposure light 11a from the first light source 11 and the irradiation area of the exposure light 12a from the second light source 12 on the surface of the exposure target member 2 are separated from each other.
- these irradiations are performed, for example, as in the first embodiment.
- the distance between the regions is set to an integral multiple of the length of one picture element.
- exposure light is irradiated each time the target member moves by the length of the pattern in the scanning direction (the length of six picture elements when the mask 13 as shown in FIG. 4 is used), exposure is performed. It is possible to obtain an alignment film in which the exposure region by the light 11a and the exposure region by the exposure light 12a are adjacent to each other and half regions of one picture element are aligned in different directions. That is, also in this embodiment, an area divided into two of one picture element is exposed with a shifted timing. As a result, a region to be a picture element is divided into two, and a plurality of regions in which alignment films having different alignment directions are formed in each divided region are manufactured in a matrix.
- FIG. 7A is a side view showing alignment division exposure by the exposure apparatus according to the third embodiment
- FIG. 7B is a perspective view
- FIG. 8 is a plan view showing a mask in the exposure apparatus according to the third embodiment.
- the mask 13 in the first embodiment transmits the exposure light 11 a from the first light source 11 and the exposure light from the second light source 12.
- the first mask 13b is divided into the second mask 13b that transmits the light 12a. Accordingly, as shown in FIGS. 7B and 8, the first light that transmits the exposure light 11a from the first light source 11 is transmitted.
- the light transmission region group 131a is provided on the first mask 13a, and the second light transmission region group 131b that transmits the exposure light 12a from the second light source 12 is provided on the second mask 13b. Yes.
- the first and second light transmission region groups 131a and 131b are arranged in a row so as to be aligned in a direction perpendicular to the scanning direction.
- Each of the plurality of light transmission regions extends in the scanning direction, and corresponds to a region including a plurality of pixels arranged in the scanning direction.
- Each of the first mask 13a and the second mask 13b is supported by a mask stage 14, so that each of the first mask 13a and the second mask 13b can be moved independently. Yes. That is, in the present embodiment, as shown in FIG. 7, the mask stage 14 that supports the first mask 13a is disposed on the second light source 12 side, and the mask stage that supports the second mask 13b. 14 is arranged on the first light source 11 side. About another structure, it is the same as that of 1st Embodiment.
- the distance between the first light source 11 and the second light source 12 can be reduced, the entire apparatus can be downsized, and the exposure light 11a, 12a can be irradiated without interfering with the apparatus itself (for example, the mask stage 14 or the mask frame 130), and even if the angle at which the exposure light 11a, 12a is inclined with respect to the exposure target surface is reduced,
- the alignment material film can be normally exposed.
- the mask 13 is further divided into a first mask 13a and a second mask 13b, and each is supported by the mask stage 14 so as to be independently movable.
- the amount of exposure light applied to the exposure target member 2 can be adjusted.
- the mask 13a or the mask 13b that transmits the target exposure light is moved by the mask stage 14 to perform exposure.
- the position and amount of light can be adjusted.
- each light of the first and second light transmission region groups 131a and 131b.
- the transmission region is configured to extend in the scanning direction, and the exposure target member 2 is exposed to the exposure target member 2 by continuously transmitting the exposure light to each light transmission region while moving the exposure target member 2 at a constant speed along the scanning direction, for example.
- a polarizing film for a 3D display can be manufactured by obtaining an alignment film in which alignment directions are aligned in a band-shaped region along the scanning direction by continuously irradiating light and exposing.
- a plurality of light transmission regions of the first and second light transmission region groups 131a and 131b are provided along the scanning direction. It is possible to perform step exposure by dividing each light transmission region into two regions in the width direction perpendicular to the scanning direction of one picture element. A plurality of regions in which alignment films having different alignment directions are formed in a region can be manufactured in a matrix.
- the exposure apparatus of the present invention divides a portion corresponding to each picture element of the liquid crystal display device in the alignment material film into two parts and exposes from different directions, or a portion corresponding to each pixel for each pixel adjacent in the width direction.
- the alignment material film is photo-aligned by exposing from different directions.
- the exposure apparatus of the present invention can normally divide and expose the alignment material film in a predetermined pattern when manufacturing the alignment material film of the liquid crystal display device that displays a three-dimensional image.
- 1 exposure apparatus, 11: first light source, 12: second light source, 11a: exposure light (from the first light source), 12a: exposure light (from the second light source), 13: mask, 13a : 1st mask, 13b: 2nd mask, 130: Frame, 131: Pattern formation part, 131a: 1st light transmission area group, 131b: 2nd light transmission area group, 14: Mask stage, 15 : Stage, 2: Exposure target member
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Abstract
Description
Claims (6)
- 配向材料膜における液晶表示装置の各絵素に対応する部分をその幅方向に2分割して異なる方向から露光することにより、配向材料膜を光配向させる露光装置において、露光光を出射する第1及び第2の光源と、前記第1及び第2の光源からの露光光を透過させる複数個の光透過領域が夫々1列に配列した第1の光透過領域群及び第2の光透過領域群が形成されたマスクと、前記第1の光源側に配置され前記マスクを支持するマスク支持部と、を有し、前記第1及び第2の光透過領域群は前記配向材料膜の前記マスクに対する相対的スキャン方向に離隔して配置され、夫々複数個の光透過領域が1絵素の幅方向に分割された半分の領域に対応していて、前記第1の光透過領域群の光透過領域と前記第2の光透過領域群の光透過領域とは、前記スキャン方向に重ならないように相互間に間隔をおいて配列されており、前記第1の光源及び前記第2の光源からの露光光を前記第1及び第2の光源と前記配向材料膜との間の光路上で互いに交差させて前記配向材料膜における各絵素の各分割領域に対応する領域に照射することを特徴とする露光装置。
- 配向材料膜における液晶表示装置の各絵素に対応する部分をその幅方向に2分割して異なる方向から露光することにより、配向材料膜を光配向させる露光装置において、露光光を出射する第1及び第2の光源と、前記第1の光源からの露光光を透過させる複数個の光透過領域が1列に配置された第1の光透過領域群が形成された第1のマスクと、前記第2の光源側に配置され前記第1のマスクを支持する第1のマスク支持部と、前記第2の光源からの露光光を透過させる複数個の光透過領域が1列に配置された第2の光透過領域群が形成された第2のマスクと、前記第1の光源側に配置され前記第2のマスクを支持する第2のマスク支持部と、を有し、前記第1及び第2の光透過領域群は、夫々複数個の光透過領域が1絵素の幅方向に分割された半分の領域に対応していて、前記第1の光源及び前記第2の光源からの露光光を前記第1及び第2の光源と前記配向材料膜との間の光路上で互いに交差させて前記配向材料膜における各絵素の各分割領域に対応する領域に照射することを特徴とする露光装置。
- 配向材料膜における液晶表示装置の各画素に対応する部分をその幅方向に隣接する画素ごとに異なる方向から露光することにより、配向材料膜を光配向させる露光装置において、露光光を出射する第1及び第2の光源と、前記第1及び第2の光源からの露光光を透過させる複数個の光透過領域が夫々1列に配列した第1の光透過領域群及び第2の光透過領域群が形成されたマスクと、前記第1の光源側に配置され前記マスクを支持するマスク支持部と、を有し、前記第1及び第2の光透過領域群は前記配向材料膜の前記マスクに対する相対的スキャン方向に離隔して配置され、夫々複数個の光透過領域が前記スキャン方向に並ぶ複数個の画素を含む領域に対応していて、前記第1の光透過領域群の光透過領域と前記第2の光透過領域群の光透過領域とは、前記スキャン方向に重ならないように相互間に間隔をおいて配列されており、前記第1の光源及び前記第2の光源からの露光光を前記第1及び第2の光源と前記配向材料膜との間の光路上で互いに交差させて前記配向材料膜における前記スキャン方向に並ぶ複数個の画素を含む領域に対応する領域に照射することを特徴とする露光装置。
- 配向材料膜における液晶表示装置の各画素に対応する部分をその幅方向に隣接する画素ごとに異なる方向から露光することにより、配向材料膜を光配向させる露光装置において、露光光を出射する第1及び第2の光源と、前記第1の光源からの露光光を透過させる複数個の光透過領域が1列に配置された第1の光透過領域群が形成された第1のマスクと、前記第2の光源側に配置され前記第1のマスクを支持する第1のマスク支持部と、前記第2の光源からの露光光を透過させる複数個の光透過領域が1列に配置された第2の光透過領域群が形成された第2のマスクと、前記第1の光源側に配置され前記第2のマスクを支持する第2のマスク支持部と、を有し、前記第1及び第2の光透過領域群は、夫々複数個の光透過領域が前記スキャン方向に並ぶ複数個の画素を含む領域に対応していて、前記第1の光源及び前記第2の光源からの露光光を前記第1及び第2の光源と前記配向材料膜との間の光路上で互いに交差させて前記配向材料膜における前記スキャン方向に並ぶ複数個の画素を含む領域に対応する領域に照射することを特徴とする露光装置。
- 前記第1の光源からの露光光と前記第2の光源からの露光光の交差位置は、前記第1及び第2の光源と前記マスクとの間であることを特徴とする請求項1乃至4のいずれか1項に記載の露光装置。
- 前記第1の光源からの露光光と前記第2の光源からの露光光の交差位置は、前記マスクと前記配向材料膜との間であることを特徴とする請求項1乃至4のいずれか1項に記載の露光装置。
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US13/824,263 US9063376B2 (en) | 2010-09-17 | 2011-08-16 | Exposure device of an alignment material film |
KR1020137009619A KR101790824B1 (ko) | 2010-09-17 | 2011-08-16 | 노광 장치 |
CN201180044697.7A CN103210344B (zh) | 2010-09-17 | 2011-08-16 | 曝光装置 |
US14/640,697 US9427915B2 (en) | 2010-09-17 | 2015-03-06 | Exposure device |
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JP2010208773A JP5688730B2 (ja) | 2010-09-17 | 2010-09-17 | 露光装置 |
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US13/824,263 A-371-Of-International US9063376B2 (en) | 2010-09-17 | 2011-08-16 | Exposure device of an alignment material film |
US14/640,697 Continuation US9427915B2 (en) | 2010-09-17 | 2015-03-06 | Exposure device |
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JP5629941B2 (ja) * | 2011-02-23 | 2014-11-26 | 株式会社ブイ・テクノロジー | スキャン露光装置 |
KR101829778B1 (ko) * | 2011-06-29 | 2018-02-20 | 삼성디스플레이 주식회사 | 노광 장치 및 액정 표시 장치의 제조 방법 |
TW201314374A (zh) * | 2011-09-30 | 2013-04-01 | Chimei Innolux Corp | 配向膜之光配向裝置及配向膜製造方法及液晶顯示裝置製造方法 |
JP6078843B2 (ja) * | 2012-07-05 | 2017-02-15 | 株式会社ブイ・テクノロジー | 光配向露光方法及び光配向露光装置 |
JP5953512B2 (ja) | 2012-07-05 | 2016-07-20 | 株式会社ブイ・テクノロジー | 光配向露光装置及び光配向露光方法 |
CN104965388B (zh) * | 2015-07-06 | 2019-05-31 | 深圳市华星光电技术有限公司 | 用于光配向的光罩及光配向方法 |
JP6660144B2 (ja) * | 2015-10-23 | 2020-03-04 | 株式会社ブイ・テクノロジー | 光照射装置 |
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- 2011-08-16 CN CN201180044697.7A patent/CN103210344B/zh not_active Expired - Fee Related
- 2011-08-16 WO PCT/JP2011/068576 patent/WO2012035920A1/ja active Application Filing
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Also Published As
Publication number | Publication date |
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JP5688730B2 (ja) | 2015-03-25 |
US9063376B2 (en) | 2015-06-23 |
US20150174820A1 (en) | 2015-06-25 |
KR20130106841A (ko) | 2013-09-30 |
CN103210344A (zh) | 2013-07-17 |
US20130169917A1 (en) | 2013-07-04 |
CN103210344B (zh) | 2015-11-25 |
US9427915B2 (en) | 2016-08-30 |
TW201222164A (en) | 2012-06-01 |
TWI536116B (zh) | 2016-06-01 |
JP2012063652A (ja) | 2012-03-29 |
KR101790824B1 (ko) | 2017-10-26 |
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