JP5953512B2 - 光配向露光装置及び光配向露光方法 - Google Patents
光配向露光装置及び光配向露光方法 Download PDFInfo
- Publication number
- JP5953512B2 JP5953512B2 JP2012151630A JP2012151630A JP5953512B2 JP 5953512 B2 JP5953512 B2 JP 5953512B2 JP 2012151630 A JP2012151630 A JP 2012151630A JP 2012151630 A JP2012151630 A JP 2012151630A JP 5953512 B2 JP5953512 B2 JP 5953512B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- exposure
- divided
- exposure apparatus
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
- G02F1/133757—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle with different alignment orientations
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
M:マスク,M1:第1マスク,M2:第2マスク,M3:第3マスク,
B:被露光基板,Bs:被露光面,
P1:画素,Pa:単位画像領域,
Da1:第1分割領域,Da2:第2分割領域,DL:分割線,
10:基板走査手段,
11:第1露光装置,12:第2露光装置,13:第3露光装置,
20:集光手段,20a:単レンズ,
S:走査方向
Claims (5)
- 液晶表示素子の各単位画像領域を複数の分割領域に分割し、各分割領域の配向材料膜をそれぞれ異なる方向に光配向する光配向露光装置であって、
前記分割領域の一つである第1分割領域を単独でプロキシミティ露光するための第1マスク及び第1露光装置と、前記分割領域の一つであり前記第1分割領域に隣接する第2分割領域を単独でプロキシミティ露光するための第2マスク及び第2露光装置と、前記第1分割領域と前記第2分割領域の境界付近における前記第1分割領域側の領域を露光するための第3マスク及び第3露光装置を備え、
前記第3露光装置は、被露光面に対して前記第1露光装置と同じ光照射角度を備え、
前記第3マスクのマスク開口と被露光面との間に前記境界付近における前記第1分割領域側の領域にマスク透過光を集光させる集光手段を備えたことを特徴とする光配向露光装置。 - 複数の前記単位画像領域の配列方向であり且つ前記分割領域の分割線に沿って前記被露光面を有する基板を走査する基板走査手段を備え、
前記基板走査手段の走査方向に沿って、前記第1マスク及び前記第1露光装置、前記第2マスク及び前記第2露光装置、前記第3マスク及び前記第3露光装置を順次間隔を空けて配置し、
前記第1露光装置及び前記第2露光装置は、前記走査方向に沿った露光光で且つ被露光面に対して異なる角度の紫外線露光光を照射することを特徴とする請求項1記載の光配向露光装置。 - 前記集光手段は、前記第3マスクにおける複数のマスク開口の光透過側にそれぞれ単レンズを配置したマイクロレンズアレイであることを特徴とする請求項1又は2記載の光配向露光装置。
- 前記単位画像領域は、一画素内を複数色に分けたサブ画素であることを特徴とする請求項1〜3のいずれかに記載の光配向露光装置。
- 液晶表示素子の各単位画像領域を複数の分割領域に分割し、各分割領域の配向材料膜をそれぞれ異なる方向に光配向する光配向露光方法であって、
前記分割領域の一つである第1分割領域を、第1マスクを介して単独でプロキシミティ露光する第1露光工程と、前記分割領域の一つであり前記第1分割領域に隣接する第2分割領域を、第2マスクを介して単独でプロキシミティ露光する第2露光工程と、前記第1分割領域と前記第2分割領域の境界付近における前記第1分割領域側の領域を、第3マスクを介して露光する第3露光工程とを有し、
前記第3露光工程は、被露光面に対して前記第1露光工程と同じ光照射角度で露光を行い、前記第3マスクのマスク開口と被露光面との間に集光手段を配置して前記境界付近における前記第1分割領域側の領域にマスク透過光を集光させることを特徴とする光配向露光方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012151630A JP5953512B2 (ja) | 2012-07-05 | 2012-07-05 | 光配向露光装置及び光配向露光方法 |
KR20157000072A KR20150041778A (ko) | 2012-07-05 | 2013-03-29 | 광배향 노광장치 및 광배향 노광방법 |
CN201380034909.2A CN104395832B (zh) | 2012-07-05 | 2013-03-29 | 光取向曝光装置及光取向曝光方法 |
PCT/JP2013/059577 WO2014006944A1 (ja) | 2012-07-05 | 2013-03-29 | 光配向露光装置及び光配向露光方法 |
US14/412,917 US9207498B2 (en) | 2012-07-05 | 2013-03-29 | Photo-alignment exposure device and photo-alignment exposure method |
TW102115564A TWI582541B (zh) | 2012-07-05 | 2013-04-30 | Light alignment exposure device and optical alignment exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012151630A JP5953512B2 (ja) | 2012-07-05 | 2012-07-05 | 光配向露光装置及び光配向露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014016380A JP2014016380A (ja) | 2014-01-30 |
JP5953512B2 true JP5953512B2 (ja) | 2016-07-20 |
Family
ID=49881709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012151630A Active JP5953512B2 (ja) | 2012-07-05 | 2012-07-05 | 光配向露光装置及び光配向露光方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9207498B2 (ja) |
JP (1) | JP5953512B2 (ja) |
KR (1) | KR20150041778A (ja) |
CN (1) | CN104395832B (ja) |
TW (1) | TWI582541B (ja) |
WO (1) | WO2014006944A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6164142B2 (ja) * | 2014-03-31 | 2017-07-19 | 東芝ライテック株式会社 | 液晶パネルの製造装置及び液晶パネルの製造方法 |
US11269220B2 (en) * | 2016-06-14 | 2022-03-08 | Sharp Kabushiki Kaisha | Polarized-light irradiation device and method for manufacturing liquid crystal display device |
JP2019197187A (ja) * | 2018-05-11 | 2019-11-14 | 株式会社ブイ・テクノロジー | 露光装置および露光方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100319871B1 (ko) * | 1994-01-28 | 2002-08-21 | 삼성전자 주식회사 | 액정배향제어막및그제조방법,이를제조하기위한제조장치및제조장치에이용되는마스크의제조방법 |
JP4401538B2 (ja) | 1999-07-30 | 2010-01-20 | シャープ株式会社 | 液晶表示装置及びその製造方法 |
JP5302826B2 (ja) * | 1999-07-30 | 2013-10-02 | シャープ株式会社 | 液晶表示装置 |
JP2003161946A (ja) * | 2001-11-27 | 2003-06-06 | Fujitsu Display Technologies Corp | 液晶表示装置製造方法及び液晶表示装置 |
JP2005092137A (ja) * | 2003-09-19 | 2005-04-07 | Nikon Corp | 露光装置及び露光方法 |
JP4744518B2 (ja) | 2005-06-09 | 2011-08-10 | シャープ株式会社 | 液晶表示装置 |
JP4757308B2 (ja) * | 2005-12-02 | 2011-08-24 | シャープ株式会社 | 液晶表示装置の製造方法及び配向処理用露光装置 |
WO2007066596A1 (ja) * | 2005-12-09 | 2007-06-14 | Sharp Kabushiki Kaisha | 露光方法および露光装置 |
KR101448001B1 (ko) * | 2008-01-29 | 2014-10-13 | 삼성디스플레이 주식회사 | 액정 표시 장치 |
JP2012018256A (ja) * | 2010-07-07 | 2012-01-26 | Hitachi High-Technologies Corp | 液晶用配向膜露光方法及びその装置 |
KR101829454B1 (ko) * | 2010-07-30 | 2018-02-20 | 삼성디스플레이 주식회사 | 다수의 도메인을 갖는 단위화소들이 형성된 액정패널 |
JP5688730B2 (ja) | 2010-09-17 | 2015-03-25 | 株式会社ブイ・テクノロジー | 露光装置 |
JP5564695B2 (ja) * | 2010-10-01 | 2014-07-30 | 株式会社 エフケー光学研究所 | 光配向露光装置及び光配向露光方法 |
-
2012
- 2012-07-05 JP JP2012151630A patent/JP5953512B2/ja active Active
-
2013
- 2013-03-29 US US14/412,917 patent/US9207498B2/en not_active Expired - Fee Related
- 2013-03-29 CN CN201380034909.2A patent/CN104395832B/zh not_active Expired - Fee Related
- 2013-03-29 WO PCT/JP2013/059577 patent/WO2014006944A1/ja active Application Filing
- 2013-03-29 KR KR20157000072A patent/KR20150041778A/ko not_active Application Discontinuation
- 2013-04-30 TW TW102115564A patent/TWI582541B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN104395832A (zh) | 2015-03-04 |
KR20150041778A (ko) | 2015-04-17 |
TW201403250A (zh) | 2014-01-16 |
US9207498B2 (en) | 2015-12-08 |
US20150177568A1 (en) | 2015-06-25 |
TWI582541B (zh) | 2017-05-11 |
CN104395832B (zh) | 2016-08-17 |
WO2014006944A1 (ja) | 2014-01-09 |
JP2014016380A (ja) | 2014-01-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6078843B2 (ja) | 光配向露光方法及び光配向露光装置 | |
JP2011164639A (ja) | 配向処理方法および配向処理装置 | |
JP2008164729A (ja) | 光照射器及び光照射装置並びに露光方法 | |
JP5756813B2 (ja) | 基板露光方法 | |
KR102272435B1 (ko) | 편광광 조사장치 | |
JP5953512B2 (ja) | 光配向露光装置及び光配向露光方法 | |
US9217925B2 (en) | Method for producing pattern phase difference film, pattern phase difference film, and image display device | |
JP2011069994A (ja) | 偏光露光装置 | |
TW200819922A (en) | Pattern writing apparatus, pattern writing system and pattern writing method | |
JP7052242B2 (ja) | 露光装置 | |
JP6770164B2 (ja) | 撮像装置 | |
WO2012017837A1 (ja) | 露光装置 | |
JP2014038178A (ja) | 光配向露光装置 | |
JP5581017B2 (ja) | 露光方法、並びに露光装置 | |
TWI770239B (zh) | 曝光裝置及曝光方法 | |
JP2014052615A (ja) | 光配向露光用マスク、光配向露光装置 | |
JP4239640B2 (ja) | 露光装置およびこの露光装置を用いた液晶素子製造方法 | |
JP2010256685A (ja) | 露光方法、カラーフィルタ及び光配向膜基板 | |
JP2014194481A (ja) | 光配向露光装置 | |
JP2015049418A (ja) | パターン位相差フィルムの製造方法、露光装置及びマスク |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150625 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151222 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160106 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160412 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160509 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5953512 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |