WO2011118506A1 - 接着剤組成物、接着テープ、半導体ウエハの処理方法、及び、tsvウエハの製造方法 - Google Patents
接着剤組成物、接着テープ、半導体ウエハの処理方法、及び、tsvウエハの製造方法 Download PDFInfo
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- WO2011118506A1 WO2011118506A1 PCT/JP2011/056460 JP2011056460W WO2011118506A1 WO 2011118506 A1 WO2011118506 A1 WO 2011118506A1 JP 2011056460 W JP2011056460 W JP 2011056460W WO 2011118506 A1 WO2011118506 A1 WO 2011118506A1
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- adhesive composition
- adhesive tape
- semiconductor wafer
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/35—Heat-activated
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76898—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics formed through a semiconductor substrate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/408—Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68372—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to support a device or wafer when forming electrical connections thereto
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2852—Adhesive compositions
Definitions
- the present invention relates to an adhesive composition that has high adhesive force but can be easily peeled off and is excellent in heat resistance, an adhesive tape using the adhesive composition, and a semiconductor wafer using the adhesive tape.
- the present invention relates to a processing method and a TSV wafer manufacturing method.
- Adhesive compositions containing an adhesive component are widely used for binders such as adhesives, sealing agents, paints and coating agents, and pressure-sensitive adhesives such as pressure-sensitive adhesive tapes and self-supporting tapes.
- the performance required for these adhesive compositions varies depending on the application, but depending on the application, it may be required to exhibit adhesiveness only for the required time but to be easily peeled off thereafter.
- a thick film wafer cut from a high-purity silicon single crystal or the like is polished to a predetermined thickness to form a thin film wafer, and the thick film wafer is bonded to a support plate. It has been proposed to work efficiently by reinforcing.
- An adhesive tape called a dicing tape is also used when dicing a thin film wafer ground to a predetermined thickness into individual semiconductor chips.
- the adhesive composition used in such a semiconductor manufacturing process is firmly bonded during the process, but can be peeled off without damaging the obtained thin film wafer, semiconductor chip, etc. It is also called “high adhesion easy peeling”).
- TSV Three-dimensional stacking technology using a TSV (Through Si via) that has been dramatically improved in performance by stacking a plurality of semiconductor chips
- TSV can increase the density of semiconductor mounting, has an extremely fast access speed, and is excellent in releasing heat generated during use.
- a high-temperature processing process of 200 ° C. or higher, such as bumping a thin film wafer obtained by grinding, bump formation on the back surface, or reflow during three-dimensional lamination. It becomes. Therefore, the adhesive composition used in the TSV manufacturing process is required to have heat resistance capable of maintaining adhesion even at a high temperature of about 250 ° C. in addition to high adhesion and easy peeling.
- Patent Document 1 discloses a pressure-sensitive adhesive tape using a photo-curing pressure-sensitive adhesive that is cured by irradiation with light such as ultraviolet rays to reduce the adhesive force. . It is said that such an adhesive tape can reliably fix the semiconductor during the processing step and can be easily peeled off by irradiating ultraviolet rays or the like.
- the pressure-sensitive adhesive tape described in Patent Document 1 has insufficient reduction in adhesive strength after irradiation with ultraviolet rays and the like, and it has been difficult to peel the film without damaging the thin film wafer, the semiconductor chip, or the like.
- Patent Document 2 discloses a heat-peelable pressure-sensitive adhesive sheet having a pressure-sensitive adhesive layer containing thermally expandable microspheres.
- the heat-peelable pressure-sensitive adhesive sheet of Patent Document 2 is heated to a certain temperature or more, the thermally expandable microspheres expand, the entire pressure-sensitive adhesive layer is foamed and irregularities are formed on the surface, and the adhesion area with the adherend is reduced. Therefore, the adherend can be easily peeled off.
- the heat-expandable microspheres are expanded by heating, and fine irregularities are generated on the pressure-sensitive adhesive surface.
- Patent Document 3 describes a double-sided pressure-sensitive adhesive tape having an adhesive layer containing a gas generating agent that generates a gas by stimulation with an azo compound or the like.
- gas generated from the gas generating agent is released to the interface between the surface of the tape and the adherend, and at least a part of the adherend is peeled off by the pressure.
- the double-sided adhesive tape of patent document 3 is used, it can peel, without damaging a thin film wafer, a semiconductor chip, etc., and without the adhesive residue.
- the double-sided pressure-sensitive adhesive tape of Patent Document 3 also has a problem in terms of heat resistance, and it has been difficult to use it in the TSV manufacturing process.
- Non-Patent Document 1 TSV manufacturing processes use adhesives containing light absorber fine particles such as carbon black, and use laser-induced heat to decompose and separate adhesives.
- Non-Patent Document 1 In order to use the technique of Non-Patent Document 1, in addition to the facility problem that a laser irradiation device is required, fine particle powder is scattered due to decomposition of the adhesive by laser irradiation, and the production environment There was a problem of lowering the cleanliness.
- the present invention relates to an adhesive composition that has high adhesive force but can be easily peeled off and is excellent in heat resistance, an adhesive tape using the adhesive composition, and a semiconductor wafer using the adhesive tape. It is an object of the present invention to provide a processing method and a TSV wafer manufacturing method.
- the present invention is an adhesive composition containing an adhesive component and a tetrazole compound represented by the following general formula (1), general formula (2) or general formula (3) or a salt thereof.
- R 1 and R 2 represent hydrogen, a hydroxyl group, an amino group, an alkyl group having 1 to 7 carbon atoms, an alkylene group, a phenyl group, or a mercapto group.
- the alkyl group having 1 to 7 carbon atoms, an alkylene group, a phenyl group, or a mercapto group may be substituted. The present invention is described in detail below.
- the present inventors generate a gas (nitrogen gas) by irradiating light with the tetrazole compound represented by the above general formulas (1) to (3) or a salt thereof. It has been found that it has high heat resistance that does not decompose.
- An adhesive composition using these compounds and an adhesive component in combination has high adhesive strength and can be easily peeled off, and is excellent in heat resistance to such an extent that it can be used in a TSV manufacturing process. As a result, the present invention has been completed.
- the adhesive composition of the present invention contains an adhesive component.
- the adhesive component is not particularly limited, and may contain either a non-curable adhesive or a curable adhesive.
- peeling occurs in the peeling mechanism described in Patent Document 2 by irradiating the adhesive composition of the present invention with light. That is, when irradiated with light, a gas is generated from the tetrazole compound represented by the above general formulas (1) to (3) or a salt thereof, and the soft adhesive component is entirely foamed by the generated gas and the surface is uneven. As a result, a peeling stress is generated, and the adhesion area with the adherend is reduced and peeling occurs.
- the adhesive component contains a curable adhesive
- peeling occurs in the peeling mechanism described in Patent Document 3 by irradiating the adhesive composition of the present invention with light. That is, when irradiated with light, a gas is generated from the tetrazole compound represented by the general formulas (1) to (3) or a salt thereof, and the generated gas is transferred from the cured adhesive component to the interface with the adherend. And at least a part of the adherend is peeled off by the pressure.
- the non-curable adhesive is not particularly limited.
- a rubber adhesive an acrylic adhesive, a vinyl alkyl ether adhesive, a silicone adhesive, a polyester adhesive, a polyamide adhesive, and a urethane adhesive.
- Agents styrene / diene block copolymer adhesives, and the like.
- the curable adhesive is not particularly limited, and examples thereof include a photocurable adhesive and a thermosetting adhesive containing a polymerizable polymer as a main component and a photopolymerization initiator and a thermal polymerization initiator.
- Such photo-curing adhesives and thermosetting adhesives are uniformly and rapidly polymerized and integrated by light irradiation or heating so that the elastic modulus is significantly increased by polymerization curing. Thus, the adhesive strength is greatly reduced.
- a gas is generated from the tetrazole compound represented by the above general formulas (1) to (3) or a salt thereof in a hard cured product having an increased elastic modulus, most of the generated gas is released to the outside and released. The done gas peels off at least a part of the adhesive surface of the pressure-sensitive adhesive from the adherend and reduces the adhesive force.
- the polymerizable polymer is prepared by, for example, previously synthesizing a (meth) acrylic polymer having a functional group in the molecule (hereinafter referred to as a functional group-containing (meth) acrylic polymer) and reacting with the functional group in the molecule. It can obtain by making it react with the compound (henceforth a functional group containing unsaturated compound) which has a functional group to perform and a radically polymerizable unsaturated bond.
- the functional group-containing (meth) acrylic polymer is an acrylic polymer having a tackiness at room temperature, as in the case of general (meth) acrylic polymers, in which the alkyl group usually has 2 to 18 carbon atoms.
- a functional group-containing monomer, and, if necessary, another modifying monomer copolymerizable therewith by a conventional method It is obtained.
- the weight average molecular weight of the functional group-containing (meth) acrylic polymer is usually about 200,000 to 2,000,000.
- Examples of the functional group-containing monomer include carboxyl group-containing monomers such as acrylic acid and methacrylic acid, hydroxyl group-containing monomers such as hydroxyethyl acrylate and hydroxyethyl methacrylate, and epoxy such as glycidyl acrylate and glycidyl methacrylate.
- Examples thereof include group-containing monomers, isocyanate group-containing monomers such as isocyanate ethyl acrylate and isocyanate ethyl methacrylate, and amino group-containing monomers such as aminoethyl acrylate and aminoethyl methacrylate.
- Examples of other modifying monomers that can be copolymerized include various monomers used in general (meth) acrylic polymers such as vinyl acetate, acrylonitrile, and styrene.
- the functional group-containing unsaturated compound to be reacted with the functional group-containing (meth) acrylic polymer is the same as the functional group-containing monomer described above according to the functional group of the functional group-containing (meth) acrylic polymer. it can.
- the functional group of the functional group-containing (meth) acrylic polymer is a carboxyl group
- an epoxy group-containing monomer or an isocyanate group-containing monomer is used
- the functional group is a hydroxyl group
- an isocyanate group-containing monomer is used.
- the functional group is an epoxy group
- a carboxyl group-containing monomer or an amide group-containing monomer such as acrylamide is used
- the functional group is an amino group, an epoxy group-containing monomer is used.
- Examples of the photopolymerization initiator include those activated by irradiation with light having a wavelength of 250 to 800 nm.
- Examples of such a photopolymerization initiator include acetophenone derivative compounds such as methoxyacetophenone, Benzoin ether compounds such as benzoin propyl ether and benzoin isobutyl ether, ketal derivative compounds such as benzyldimethyl ketal and acetophenone diethyl ketal, phosphine oxide derivative compounds, bis ( ⁇ 5-cyclopentadienyl) titanocene derivative compounds, Benzophenone, Michler's ketone, chlorothioxanthone, todecylthioxanthone, dimethylthioxanthone, diethylthioxanthone, ⁇ -hydroxycyclohexyl phenyl ketone, 2-hydroxymethylphenyl group
- Examples include photo radical polymerization initiators such as lopan.
- thermal polymerization initiator examples include those that decompose by heat and generate active radicals that initiate polymerization and curing. Examples thereof include dicumyl peroxide, di-t-butyl peroxide, and t-butyl peroxybenzoale. T-butyl hydroperoxide, benzoyl peroxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide, paramentane hydroperoxide, di-t-butyl peroxide and the like.
- a thermal polymerization initiator having a thermal decomposition temperature of 200 ° C. or higher as the thermal polymerization initiator.
- thermal polymerization initiator having a high thermal decomposition temperature examples include cumene hydroperoxide, paramentane hydroperoxide, and di-t-butyl peroxide. Although it does not specifically limit as what is marketed among these thermal polymerization initiators, For example, perbutyl D, perbutyl H, perbutyl P, perpenta H (all are the NOF Corporation make) etc. are suitable. These thermal polymerization initiators may be used independently and 2 or more types may be used together.
- the photocurable adhesive and thermosetting adhesive preferably further contain a radical polymerizable polyfunctional oligomer or monomer.
- a radical polymerizable polyfunctional oligomer or monomer By containing a radically polymerizable polyfunctional oligomer or monomer, photocurability and thermosetting are improved.
- the polyfunctional oligomer or monomer preferably has a molecular weight of 10,000 or less, and more preferably has a molecular weight of 5000 or less so that the three-dimensional network of the pressure-sensitive adhesive layer can be efficiently formed by heating or light irradiation.
- the number of radically polymerizable unsaturated bonds in the molecule is 2 to 20.
- the polyfunctional oligomer or monomer is, for example, trimethylolpropane triacrylate, tetramethylolmethane tetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate or the same methacrylate as described above. And the like.
- Other examples include 1,4-butylene glycol diacrylate, 1,6-hexanediol diacrylate, polyethylene glycol diacrylate, commercially available oligoester acrylate, and methacrylates similar to those described above. These polyfunctional oligomers or monomers may be used alone or in combination of two or more.
- the adhesive composition of the present invention contains a tetrazole compound represented by the above general formulas (1) to (3).
- the tetrazole compounds represented by the above general formulas (1) to (3) generate gas (nitrogen gas) when irradiated with light, and have high heat resistance that does not decompose even at a high temperature of about 200 ° C.
- R 1 and R 2 represent hydrogen, a hydroxyl group, an amino group, or an alkyl group having 1 to 7 carbon atoms, an alkene group, a phenyl group, or a mercapto group.
- the alkyl group having 1 to 7 carbon atoms, alkene group, phenyl group or mercapto group may be substituted.
- examples of the substituent include an amino group, an alkyl group, an alkene group, a phenyl group, and a mercapto group.
- the maximum value of the molar extinction coefficient (hereinafter also referred to as “ ⁇ max (250-400)”) at a wavelength of 250 to 400 nm is 100 or more.
- a tetrazole compound having a weight residual ratio (hereinafter also simply referred to as “weight residual ratio”) of 80% or more when heated from 100 ° C. to 200 ° C. measured using a thermobalance is extremely heat resistant.
- gas nitrogen gas
- a tetrazole compound having a maximum molar extinction coefficient at a wavelength of 270 to 400 nm (hereinafter also referred to as “ ⁇ max (270-400)”) of 100 or more is more preferable.
- the molar extinction coefficient means that 10 mg of a tetrazole compound is weighed and dissolved in a mixed solvent of 5 mL of methyl alcohol and 5 mL of a 1N aqueous sodium hydroxide solution. -3000) is used to measure an absorption spectrum in the wavelength range of 200 to 600 nm according to the following formula, and the absorbance in the obtained absorption spectrum is used to mean a value obtained by calculation using the following formula.
- ⁇ A / c ⁇ d (In the formula, ⁇ represents the molar extinction coefficient, A represents the absorbance, c represents the molar concentration, and d represents the cell thickness.)
- the maximum value of the molar extinction coefficient at a wavelength of 250 to 400 nm is 100 or more as long as the molar extinction coefficient at any wavelength between the wavelengths of 250 nm and 400 nm is 100 or more. It is not necessary that a peak of the molar extinction coefficient exists between wavelengths of 250 nm to 400 nm.
- the weight residual rate is determined by, for example, weighing 5 to 10 mg of a tetrazole compound in an aluminum pan of a thermobalance (eg, TG / DTA6200 manufactured by SII), in an air atmosphere (flow rate 200 mL / min), and a rate of temperature increase of 5 ° C./min. It can be obtained by measuring the weight reduction rate when the temperature is raised from room temperature (30 ° C.) to 400 ° C. under the condition of minutes. Here, “from 100 ° C.” is used to eliminate the influence of water adsorbed on the tetrazole compound.
- a thermobalance eg, TG / DTA6200 manufactured by SII
- the salt of the tetrazole compound represented by the general formulas (1) to (3) also has a skeleton derived from the tetrazole compound represented by the general formula (1) to (3), light is irradiated. Nitrogen gas can be generated easily.
- the salt of the tetrazole compound represented by the general formulas (1) to (3) is not particularly limited, and examples thereof include sodium salt, potassium salt, ammonium salt and the like.
- the salt is represented by the following general formulas (1 ′) to (3 ′).
- the salt of the tetrazole compound represented by the general formulas (1 ′) to (3 ′) is obtained by simply mixing the tetrazole compound represented by the general formulas (1) to (3) and the basic compound in a container. Thus, it can be easily prepared without going through a complicated synthetic route.
- the basic compound is not particularly limited, and examples thereof include amines, hydrazine compounds, quaternary ammonium hydroxide salts, and phosphine compounds.
- the amine is not particularly limited, and any of primary amines, secondary amines, and tertiary amines can be used. Among these, the basic compound is preferably a monoalkylamine or a dialkylamine.
- the polarity of the obtained salt of the tetrazole compound represented by the general formulas (1 ′) to (3 ′) can be reduced, and the solubility with the adhesive component Can be increased. More preferably, it is a monoalkylamine or dialkylamine having 6 to 12 carbon atoms.
- the adhesive component contains a curable adhesive whose elastic modulus is increased by stimulation
- the tetrazole compound represented by the general formulas (1) to (3) or a salt thereof is dissolved in the adhesive component.
- the tetrazole compounds represented by the above general formulas (1) to (3) or salts thereof are dissolved in the adhesive, these compounds themselves do not become the core of foaming, and almost all of the generated gas is bonded. Since it is released from the agent component to the interface with the adherend, more reliable peeling can be performed. Accordingly, salts of tetrazole compounds represented by the above general formulas (1 ') to (3') having higher solubility are preferable.
- the tetrazole compound represented by the above general formula (1) or a salt thereof is not particularly limited. Specifically, for example, 1H-tetrazole, 5-phenyl-1H-tetrazole, 5-amino-1H-tetrazole, 5-methyl -1H-tetrazole, 1-methyl-5-mercaptotetrazole, 1-methyl-5-ethyl-tetrazole, 1- (dimethylaminoethyl) -5-mercaptotetrazole, 1H-5 hydroxy-tetrazole, 1-methyl-5 Ethyltetrazole, 1-propyl-5-methyl-tetrazole, 1-phenyl-5-hydroxytetrazole, 1-phenyl-5-mercaptotetrazole, 1- (p-ethoxyphenyl) -5-mercaptotetrazole, 1- (4- Benzamide) -5-mercaptotetrazole, 5-tolylte Razole, 5-phenyl
- the tetrazole compound represented by the above general formula (2) or a salt thereof is not particularly limited. Specifically, for example, 5,5′-bistetrazole diammonium salt, 5,5′-bistetrazole disodium salt, 5 , 5'-bistetrazole dipiperadium salt and the like.
- tetrazole compound represented by the general formula (3) or a salt thereof is not particularly limited, specifically, for example, 5,5-azobis-1H-tetrazole, 5,5-azobis-1H-tetrazole and guanidine And compounds such as 5,5-1H-azobistetrazole and methylguanidine.
- ⁇ max (250-400) is 100 or more
- ⁇ max (270-400) is 100 or more
- weight Tetrazole compounds having a residual ratio of 80% or more include, for example, 5-phenyl-1H-tetrazole (a compound of the following formula (4), ⁇ max (250-400) is 401, ⁇ max (270-400) is 401, Weight residual ratio is 98%), 4,5 ditetrazolyl- [1,2,3] triazole (compound of the following formula (5), ⁇ max (250-400) is 629, ⁇ max (270-400) is 605, (Weight residual ratio is 85%), 1- (p-ethoxyphenyl) -5-mercaptotetrazole (compound of the following formula (6), ⁇ max (250-400) is 718, ⁇ ma x (270-400) is 718, weight residual ratio is 83%), 1- (4-benzyl-1H-tetrazole (a compound of the following formula (4), ⁇
- ⁇ max (270-400) is less than 100
- ⁇ max (250-400) is 100 or more
- tetrazole compounds having a weight residual ratio of 80% or more include bistetrazole piperazine salts (compounds of the following formula (14), ⁇ max (250-400) is 606, weight residual ratio is 98%), and bistetrazole ammonium salts.
- bistetrazole disodium salt compound of the following formula (16), ⁇ max (250-400) is 320 , 100% by weight residual ratio
- the compounds of bistetrazole monohydrate formula (17), epsilon max (250-400) is 402, The amount residual ratio 98%), compound of bistetrazole monoammonium (formula (18), epsilon max (250-400) is 506, the weight residual ratio 97%), 5-aminotetrazole monohydrate (formula ( 19), ⁇ max (250-400) is 299, weight residual ratio is 83%), 5-aminomethyl-1H-tetrazole (compound of the following formula (20), ⁇ max (250-400) is 282, Weight residual ratio is 82%).
- 1-methyl-5-mercaptotetrazole (compound of the following formula (21), ⁇ max (250-400) is 364, ⁇ max (270-400) is 364, weight residual ratio is 80%), 5 , 5-azobis-1H-tetrazole and a diguanidine salt (ABG, compound of the following formula (22), ⁇ max (250-400) is 938, ⁇ max (270-400) is 938, weight residual ratio is 55%), 1- (m-acetaminophenyl) -5-mercaptotetrazole (compound of the following formula (23), ⁇ max (250-400) is 276, ⁇ max (270-400) is 756, weight residual ratio is 47%) the compound of 1- (4-hydroxyphenyl) -5-mercaptotetrazole (formula (24), epsilon max (250-400) is 576, epsilon max 270-400) is 576, 44% by weight residual ratio), 1-phenyl
- the content of the tetrazole compound represented by the general formulas (1) to (3) or a salt thereof is preferably 5 parts by weight with respect to 100 parts by weight of the adhesive component, and 50 parts by weight with respect to the preferable upper limit.
- the content of the tetrazole compound represented by the general formulas (1) to (3) or a salt thereof is less than 5 parts by weight, generation of nitrogen gas due to light irradiation is reduced and sufficient peeling cannot be performed. If the amount exceeds 50 parts by weight, the adhesive component may not be dissolved and the adhesive strength may be reduced.
- a more preferable lower limit of the content of the tetrazole compound represented by the general formulas (1) to (3) or a salt thereof is 10 parts by weight, and a more preferable upper limit is 30 parts by weight.
- the adhesive composition of the present invention may contain a photosensitizer.
- the photosensitizer has an effect of amplifying light stimulation to the tetrazole compounds represented by the above general formulas (1) to (3) or salts thereof, and thus releases a gas by irradiation with less light. be able to.
- gas can be emitted by light in a wider wavelength region.
- the photosensitizer is not particularly limited as long as it has excellent heat resistance.
- the photosensitizer excellent in heat resistance include polycyclic aromatic compounds having at least one alkoxy group.
- a substituted alkoxy polycyclic aromatic compound having an alkoxy group partially substituted with a glycidyl group or a hydroxyl group is preferable.
- These photosensitizers have high resistance to sublimation and can be used at high temperatures.
- the solubility in the adhesive component is increased, and bleeding out can be prevented.
- the polycyclic aromatic compound is preferably an anthracene derivative.
- the alkoxy group preferably has 1 to 18 carbon atoms, and more preferably has 1 to 8 carbon atoms.
- polycyclic aromatic compound having at least one alkoxy group examples include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 2-tbutyl-9,10-dimethoxyanthracene, 2, 3-dimethyl-9,10-dimethoxyanthracene, 9-methoxy-10-methylanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 2-tbutyl-9,10-di Ethoxyanthracene, 2,3-dimethyl-9,10-diethoxyanthracene, 9-ethoxy-10-methylanthracene, 9,10-dipropoxyanthracene, 2-ethyl-9,10-dipropoxyanthracene, 2-tbutyl -9,10-dipropoxyanthracene, 2,3-dimethyl-9, 0-dipropoxyanthracene
- the substituted alkoxy polycyclic aromatic compound having an alkoxy group partially substituted with a glycidyl group or a hydroxyl group includes, for example, 9,10-di (glycidyloxy) anthracene, 2-ethyl-9,10-di (glycidyloxy) ) Anthracene, 2-tbutyl-9,10-di (glycidyloxy) anthracene, 2,3-dimethyl-9,10-di (glycidyloxy) anthracene, 9- (glycidyloxy) -10-methylanthracene, 9, 10-di (2-vinyloxyethoxy) anthracene, 2-ethyl-9,10-di (2-vinyloxyethoxy) anthracene, 2-tbutyl-9,10-di (2-vinyloxyethoxy) anthracene, 2 , 3-Dimethyl-9,10-di (2-vinyloxyeth
- the content of the photosensitizer is preferably 0.05 parts by weight and preferably 10 parts by weight with respect to 100 parts by weight of the adhesive component.
- the content of the photosensitizer is less than 0.05 parts by weight, a sufficient sensitizing effect may not be obtained.
- the content exceeds 10 parts by weight the residue derived from the photosensitizer increases. , Sufficient peeling may not be performed.
- the minimum with more preferable content of the said photosensitizer is 0.1 weight part, and a more preferable upper limit is 5 weight part.
- the adhesive composition of the present invention appropriately contains various polyfunctional compounds blended in general pressure-sensitive adhesives such as isocyanate compounds, melamine compounds, and epoxy compounds as needed for the purpose of adjusting the cohesive force as pressure-sensitive adhesives. You may contain.
- the adhesive composition of the present invention may contain known additives such as a plasticizer, a resin, a surfactant, a wax, and a fine particle filler.
- the adhesive composition of the present invention has high adhesive strength, it can be easily peeled off by light irradiation or heating. Moreover, since it is excellent also in heat resistance, it can be used for applications in which high-temperature treatment at 200 ° C. or higher, such as fixing a wafer to a support plate in the TSV manufacturing process, is performed.
- the adhesive composition of the present invention can be used for various adhesive products.
- the adhesive product for example, an adhesive, an adhesive, a paint, a coating agent, a sealing agent, or the like using the adhesive composition of the present invention as a binder resin, or the adhesive composition of the present invention as an adhesive.
- the adhesive tape include single-sided adhesive tape, double-sided adhesive tape, and non-support tape (self-supporting tape).
- An adhesive tape having an adhesive layer made of the adhesive composition of the present invention on one surface of the substrate is also one aspect of the present invention.
- the adhesive tape which has the adhesive layer which consists of an adhesive composition of this invention on both surfaces of a base material is also one of this invention.
- the adhesive tape of the present invention is, for example, a back grinding tape, a dicing tape when processing a semiconductor wafer, a brittle member such as an ultrathin glass substrate, a support tape for a member that easily warps such as a plastic film, a coreless FPC substrate, etc. Can be suitably used.
- the base material is, for example, a sheet made of a transparent resin such as acrylic, olefin, polycarbonate, vinyl chloride, ABS, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), nylon, urethane, polyimide, or a network structure. And a sheet having a hole and the like.
- the adhesive tape of the present invention can be used, for example, when bonding a support plate for the purpose of protecting a semiconductor wafer when a semiconductor wafer is subjected to chemical treatment, heat treatment, or heat generation. After these processes are completed, the support plate can be easily peeled from the semiconductor wafer by irradiating light.
- the step of bonding the semiconductor wafer and the support plate using the adhesive tape of the present invention the step of subjecting the semiconductor wafer to chemical treatment, heat treatment, or heat generation treatment while being bonded to the support plate, and the above
- a semiconductor wafer processing method comprising a step of irradiating the adhesive tape with light after the treatment to generate a gas from the tetrazole compound in the adhesive layer, and a step of peeling the support plate and the adhesive tape from the semiconductor wafer.
- the adhesive tape of the present invention can be used, for example, when bonding a support plate for the purpose of protecting a semiconductor wafer when forming a through-hole having electrodes on the semiconductor wafer. After these processes are completed, the support plate can be easily peeled from the semiconductor wafer by irradiating light.
- the step of bonding the semiconductor wafer having a groove with the support plate using the adhesive tape of the present invention and the surface opposite to the side of the semiconductor wafer bonded to the support plate are ground to penetrate the groove.
- a TSV wafer manufacturing method including a process and a process of peeling the support plate and the adhesive tape from the semiconductor wafer is also one aspect of the present invention.
- Example 1 A reactor equipped with a thermometer, a stirrer, and a cooling tube was prepared, and in this reactor, 94 parts by weight of 2-ethylhexyl acrylate, 1 part by weight of acrylic acid, 5 parts by weight of 2-hydroxyethyl acrylate, lauryl mercapcaptan 0 After adding 0.01 parts by weight and 180 parts by weight of ethyl acetate, the reactor was heated to start refluxing. Subsequently, 0.01 parts by weight of 1,1-bis (t-hexylperoxy) -3,3,5-trimethylcyclohexane was added as a polymerization initiator in the reactor, and polymerization was started under reflux. It was.
- the resin solid content of 100 parts by weight of the ethyl acetate solution containing the acrylic copolymer thus obtained is reacted by adding 3.5 parts by weight of 2-isocyanatoethyl methacrylate, and further the resin of the ethyl acetate solution after the reaction.
- 0.1 parts by weight of a photopolymerization initiator (Esacure One, manufactured by Nippon Shibel Hegner) and 2.5 parts by weight of a polyisocyanate-based crosslinking agent (Coronate L45, manufactured by Nippon Polyurethane) are mixed and bonded to 100 parts by weight of solid content.
- An ethyl acetate solution of agent (1) was prepared.
- the obtained adhesive composition was applied on one side of a transparent polyethylene terephthalate film having a thickness of 50 ⁇ m and subjected to corona treatment on both sides with a doctor knife so that the thickness of the dry film was 30 ⁇ m.
- the coating solution was dried by heating for 5 minutes.
- the adhesive composition was applied on the other surface of the polyethylene naphthalate with a doctor knife so that the thickness of the dried film was 30 ⁇ m, and the coating solution was dried by heating at 110 ° C. for 5 minutes. .
- static curing was performed at 40 ° C. for 3 days to obtain an adhesive tape having an adhesive layer on both sides.
- Example 2 to 28 An adhesive composition and an adhesive tape were obtained in the same manner as in Example 1 except that the tetrazole compounds shown in Tables 1 and 2 were used instead of 5-phenyl-1H-tetrazole.
- the obtained adhesive composition was applied on one side of a transparent polyethylene terephthalate film having a thickness of 50 ⁇ m and subjected to corona treatment on both sides with a doctor knife so that the thickness of the dry film was 30 ⁇ m.
- the coating solution was dried by heating for 5 minutes.
- the adhesive composition was applied on the other surface of the polyethylene naphthalate with a doctor knife so that the thickness of the dried film was 30 ⁇ m, and the coating solution was dried by heating at 110 ° C. for 5 minutes. .
- static curing was performed at 40 ° C. for 3 days to obtain an adhesive tape having an adhesive layer on both sides.
- ⁇ A / c ⁇ d (In the formula, ⁇ represents the molar extinction coefficient, A represents the absorbance, c represents the molar concentration, and d represents the cell thickness.) Within the wavelength range of 250 to 400 nm, the wavelength region where the molar extinction coefficient was 100 or more, the molar extinction coefficient was the maximum value, and the wavelength where the molar extinction coefficient was the maximum value were determined.
- Adhesive evaluation after heat treatment of adhesive tape peelability evaluation
- An adhesive tape cut into a circle having a diameter of 20 cm was attached to a silicon wafer having a diameter of 20 cm and a thickness of about 750 ⁇ m.
- a glass plate having a diameter of 20 cm and a thickness of 1 mm was attached to the surface opposite to the surface attached to the silicon wafer.
- the laminate was heated at 200 ° C. for 1 hour and then returned to room temperature.
- For adhesion evaluation visually observe the heated surface, place the silicon wafer on the suction table so that the glass is on the top surface, and then pull the glass edge with a suction cup to observe the entire surface.
- the present invention relates to an adhesive composition that has high adhesive force but can be easily peeled off and is excellent in heat resistance, an adhesive tape using the adhesive composition, and a semiconductor wafer using the adhesive tape. It is an object of the present invention to provide a processing method and a TSV wafer manufacturing method.
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Abstract
Description
これらの接着剤組成物に求められる性能はその用途により様々であるが、用途によっては、必要な間だけ接着性を示すがその後は容易に剥がせることが要求されることがある。
このようなTSVの製造では、研削して得た薄膜ウエハをバンピングしたり、裏面にバンプ形成したり、3次元積層時にリフローを行ったりする等の200℃以上の高温処理プロセスを行うことが必要となる。従って、TSVの製造工程に用いる接着剤組成物には、高接着易剥離に加えて、250℃程度の高温化でも接着性を維持できる耐熱性が求められる。
以下に本発明を詳述する。
上記接着剤成分は特に限定されず、非硬化型の接着剤、硬化型の接着剤のいずれを含有するものであってもよい。
上記接着剤成分が非硬化型の接着剤を含有する場合には、本発明の接着剤組成物に光を照射することにより特許文献2に記載された態様の剥離機構で剥離が生じる。即ち、光を照射することにより上記一般式(1)~(3)で表されるテトラゾール化合物又はその塩から気体が発生し、発生した気体により柔らかい接着剤成分の全体が発泡して表面に凹凸が形成されることにより剥離応力が発生し、また被着体との接着面積が減少して剥離する。
なかでも、糊残りを生ずることなく確実な剥離を行うことができることから、刺激により弾性率が上昇する硬化型の接着剤を含有することが好ましい。
このような光硬化型接着剤や熱硬化型接着剤は、光の照射又は加熱により接着剤の全体が均一にかつ速やかに重合架橋して一体化するため、重合硬化による弾性率の上昇が著しくなり、接着力が大きく低下する。また、弾性率の上昇した硬い硬化物中で上記一般式(1)~(3)で表されるテトラゾール化合物又はその塩から気体を発生させると、発生した気体の大半は外部に放出され、放出された気体は、被着体から粘着剤の接着面の少なくとも一部を剥がし接着力を低下させる。
ただし、本発明の接着剤組成物が高い耐熱性を発揮するためには、上記熱重合開始剤は、熱分解温度が200℃以上である熱重合開始剤を用いることが好ましい。このような熱分解温度が高い熱重合開始剤は、クメンハイドロパーオキサイド、パラメンタンハイドロパーオキサイド、ジ-t-ブチルパーオキサイド等が挙げられる。
これらの熱重合開始剤のうち市販されているものとしては特に限定されないが、例えば、パーブチルD、パーブチルH、パーブチルP、パーペンタH(以上いずれも日油社製)等が好適である。これら熱重合開始剤は、単独で用いられてもよく、2種以上が併用されてもよい。
上記多官能オリゴマー又はモノマーは、分子量が1万以下であるものが好ましく、より好ましくは加熱又は光の照射による粘着剤層の三次元網状化が効率よくなされるように、その分子量が5000以下でかつ分子内のラジカル重合性の不飽和結合の数が2~20個のものである。
上記一般式(1)~(3)中、R1、R2は、水素、水酸基、アミノ基、又は炭素数が1~7のアルキル基、アルケン基、フェニル基、メルカプト基を表す。上記炭素数が1~7のアルキル基、アルケン基、フェニル基、又は、メルカプト基は、置換されていてもよい。上記アルキル基等が置換されたものである場合、該置換基は、例えば、アミノ基、アルキル基、アルケン基、フェニル基、メルカプト基等が挙げられる。
ε=A/c×d
(式中εはモル吸光係数を表し、Aは吸光度を表し、cはモル濃度を表し、dはセル厚みを表す。)
なお、本明細書において、波長250~400nmにおけるモル吸光係数の最大値が100以上であるとは、波長250nm~400nmの間のいずれかの波長におけるモル吸光係数の値が100以上であればよく、波長250nm~400nmの間にモル吸光係数のピークが存在する必要はない。
なお、ここで「100℃から」としたのは、テトラゾール化合物に吸着した水の影響を排除するためである。
上記一般式(1)~(3)で表されるテトラゾール化合物の塩は特に限定されず、例えば、ナトリウム塩、カリウム塩、アンモニウム塩等が挙げられる。
上記一般式(1)~(3)で表されるテトラゾール化合物が塩の状態で存在する場合、その塩は、以下の一般式(1’)~(3’)で表される。
上記塩基性化合物は特に限定されないが、例えば、アミン、ヒドラジン化合物、水酸化四級アンモニウム塩、ホスフィン化合物等が挙げられる。
上記アミンは特に限定されず、一級アミン、二級アミン及び三級アミンのいずれをも用いることができる。
なかでも上記塩基性化合物は、モノアルキルアミン又はジアルキルアミンが好適である。モノアルキルアミン又はジアルキルアミンを用いた場合には、得られる上記一般式(1’)~(3’)で表されるテトラゾール化合物の塩の極性を低極性化でき、接着剤成分との溶解性を高めることできる。より好ましくは、炭素数6~12のモノアルキルアミン又はジアルキルアミンである。
上記光増感剤は、上記一般式(1)~(3)で表されるテトラゾール化合物又はその塩への光による刺激を増幅する効果を有することから、より少ない光の照射により気体を放出させることができる。また、より広い波長領域の光により気体を放出させることができる。
耐熱性に優れた光増感剤は、例えば、アルコキシ基を少なくとも1つ以上有する多環芳香族化合物が挙げられる。なかでも、一部がグリシジル基又は水酸基で置換されたアルコキシ基を有する置換アルコキシ多環芳香族化合物が好適である。これらの光増感剤は、耐昇華性が高く、高温下で使用することができる。また、アルコキシ基の一部がグリシジル基や水酸基で置換されることにより、上記接着剤成分への溶解性が高まり、ブリードアウトを防止することができる。
本発明の接着剤組成物は、可塑剤、樹脂、界面活性剤、ワックス、微粒子充填剤等の公知の添加剤を含有してもよい。
上記接着性製品としては、例えば、本発明の接着剤組成物をバインダー樹脂として用いた接着剤、粘着剤、塗料、コーティング剤、シーリング剤等、又は、本発明の接着剤組成物を粘着剤として用いた片面粘着テープ、両面粘着テープ、ノンサポートテープ(自立テープ)等の粘着テープ等が挙げられる。
基材の両面に、本発明の接着剤組成物からなる接着層を有する接着テープもまた、本発明の1つである。
本発明の接着テープは、例えば、半導体ウエハを加工する際のバックグラインドテープ、ダイシングテープや、極薄ガラス基板等の脆弱部材、プラスチックスフィルム、コアレスFPC基板等の反り易い部材の支持用テープ等に好適に用いることができる。
上記基材は、例えば、アクリル、オレフィン、ポリカーボネート、塩化ビニル、ABS、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ナイロン、ウレタン、ポリイミド等の透明な樹脂からなるシート、網目状の構造を有するシート、孔が開けられたシート等が挙げられる。
本発明の接着テープを用いて半導体ウエハと支持板とを貼り合わせる工程と、支持板に貼り合わせた状態で上記半導体ウエハに薬液処理、加熱処理、又は、発熱を伴う処理を施す工程と、上記処理後に、上記接着テープに光を照射して接着層中のテトラゾール化合物から気体を発生させる工程と、上記半導体ウエハから上記支持板と接着テープとを剥離する工程とを有する半導体ウエハの処理方法もまた、本発明の1つである。
本発明の接着テープを用いて溝部を有する半導体ウエハと支持板とを貼り合わせる工程と、上記半導体ウエハの上記支持板に接着した側とは反対の面を研削して、溝部を貫通させて貫通孔を形成する工程と、上記半導体ウエハの貫通孔の周辺に電極部を作製する工程と、上記電極部作製後に、上記接着テープに光を照射して接着層中のテトラゾール化合物から気体を発生させる工程と、上記半導体ウエハから上記支持板と接着テープとを剥離する工程とを有するTSVウエハの製造方法もまた、本発明の1つである。
温度計、攪拌機、冷却管を備えた反応器を用意し、この反応器内に、2-エチルヘキシルアクリレート94重量部、アクリル酸1重量部、2-ヒドロキシエチルアクリレート5重量部、ラウリルメルカプカプタン0.01重量部と、酢酸エチル180重量部を加えた後、反応器を加熱して還流を開始した。続いて、上記反応器内に、重合開始剤として1,1-ビス(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサン0.01重量部を添加し、還流下で重合を開始させた。次に、重合開始から1時間後及び2時間後にも、1,1-ビス(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサンを0.01重量部ずつ添加し、更に、重合開始から4時間後にt-ヘキシルパーオキシピバレートを0.05重量部添加して重合反応を継続させた。そして、重合開始から8時間後に、固形分55重量%、重量平均分子量60万のアクリル共重合体を得た。
得られたアクリル共重合体を含む酢酸エチル溶液の樹脂固形分100重量部に対して、2-イソシアナトエチルメタクリレート3.5重量部を加えて反応させ、更に、反応後の酢酸エチル溶液の樹脂固形分100重量部に対して、光重合開始剤(エサキュアワン、日本シイベルヘグナー社製)0.1重量部、ポリイソシアネート系架橋剤(コロネートL45、日本ポリウレタン社製)2.5重量部を混合し接着剤(1)の酢酸エチル溶液を調製した。
5-フェニル-1H-テトラゾールの代わりに、表1、2に記載されたテトラゾール化合物を用いた以外は実施例1と同様にして接着剤組成物及び接着テープを得た。
5-フェニル-1H-テトラゾールを配合しなかった以外は、実施例1と同様にして接着剤組成物及び接着テープを得た。
5-フェニル-1H-テトラゾール20重量部の代わりに、2,2’-アゾビス-(N-ブチル-2-メチルプロピオンアミド)20重量部、9,10-ジグリシジルオキシアントラセン1重量部の代わりにジエチルチオキサントン3重量部を配合した以外は、実施例1と同様にして接着剤組成物及び接着テープを得た。
温度計、攪拌機、冷却管を備えた反応器を用意し、この反応器内に、2-エチルヘキシルアクリレート94重量部、アクリル酸1重量部、2-ヒドロキシエチルアクリレート5重量部、ラウリルメルカプカプタン0.01重量部と、酢酸エチル180重量部を加えた後、反応器を加熱して還流を開始した。続いて、上記反応器内に、重合開始剤として1,1-ビス(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサン0.01重量部を添加し、還流下で重合を開始させた。次に、重合開始から1時間後及び2時間後にも、1,1-ビス(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサンを0.01重量部ずつ添加し、更に、重合開始から4時間後にt-ヘキシルパーオキシピバレートを0.05重量部添加して重合反応を継続させた。そして、重合開始から8時間後に、固形分55重量%、重量平均分子量60万のアクリル共重合体を得た。
得られたアクリル系粘着剤100重量部(固形分)に対して、マイクロスフェアF-50D(松本油脂社製)50重量部を混合して接着剤組成物を得た。
実施例及び比較例で用いたテトラゾール化合物、及び、実施例及び比較例で得られた接着テープについて、以下の方法により評価を行った。
結果を表1、2に示した。
10mgのテトラゾール化合物を秤量し、5mLのメチルアルコールと5mLの1規定水酸化ナトリウム水溶液との混合溶媒に溶解し、得られた溶液について日立製作所製U-3000を用いて吸収スペクトルを測定した。得られた吸収スペクトルにおける吸光度を用いて、下記式に従いモル吸光係数を求めた。
ε=A/c×d
(式中εはモル吸光係数を表し、Aは吸光度、cはモル濃度を表し、dはセル厚みを表す。)
波長250~400nmの範囲内において、モル吸光係数が100以上となる波長域、モル吸光係数が最大値、及び、モル吸光係数が最大値となる波長を求めた。
熱天秤(SII社製、TG/DTA6200)のアルミパンに5~10mgのテトラゾール化合物を秤量し、空気雰囲気中(流量200mL/分)、昇温速度5℃/分の条件で常温(30℃)から400℃まで昇温したときの重量減少率を測定した。
直径20cmの円形に切断した接着テープを、直径20cm、厚さ約750μmのシリコンウエハに貼り付けた。シリコンウエハに貼り付けた面と反対の面に、直径20cm、厚さ1mmのガラス板を貼りつけた。
接着性評価として、ガラスが上面になるようにシリコンウエハを吸着台に設置した後、ガラス端部を吸盤で引っ張り、全くガラスが剥離できなかった場合を「○」と、比較的軽く剥離できた場合を「△」と、ほとんど抵抗なく剥離できた場合を「×」と評価した。
直径20cmの円形に切断した接着テープを、直径20cm、厚さ約750μmのシリコンウエハに貼り付けた。シリコンウエハに貼り付けた面と反対の面に、直径20cm、厚さ1mmのガラス板を貼りつけた。この積層体を、200℃、1時間加熱した後、室温に戻した。
接着性評価として、加熱後の表面を目視にて観察し、ガラスが上面になるようにシリコンウエハを吸着台に設置した後、ガラス端部を吸盤で引っ張った時に、全面に渡って浮きがみとめられず、かつ、引っ張っても全く剥離できなかった場合を「◎」、浮きが全体の面積の3%以下であり、かつ、引っ張っても剥離できなかった場合を「○」、浮きが全体の面積の3%以上、10%以下であるが、引っ張っても剥離できなかった場合を「△」、容易に剥離できた場合を「×」と評価した。
同様の評価を、200℃、4時間の熱処理を行った場合についても行った。
Claims (11)
- テトラゾール化合物は、波長250~400nmにおけるモル吸光係数の最大値が100以上であり、かつ、熱天秤を用いて測定した100℃から200℃に加熱したときの重量残存率が80%以上であることを特徴とする請求項1記載の接着剤組成物。
- テトラゾール化合物は、波長270~400nmにおけるモル吸光係数の最大値が100以上であり、かつ、熱天秤を用いて測定した100℃から200℃に加熱したときの重量残存率が80%以上であることを特徴とする請求項1記載の接着剤組成物。
- 接着剤成分は、刺激により弾性率が上昇する硬化型の接着剤を含有することを特徴とする請求項1、2又は3記載の接着剤組成物。
- 光増感剤を含有することを特徴とする請求項1、2、3又は4記載の接着剤組成物。
- 光増感剤は、アルコキシ基を少なくとも1つ以上有する多環芳香族化合物であることを特徴とする請求項5記載の接着剤組成物。
- 光増感剤は、一部がグリシジル基又は水酸基で置換されたアルコキシ基を有する置換アルコキシ多環芳香族化合物であることを特徴とする請求項5記載の接着剤組成物。
- 基材の一方の面に、請求項1、2、3、4、5、6又は7記載の接着剤組成物からなる接着層を有することを特徴とする接着テープ。
- 基材の両面に、請求項1、2、3、4、5、6又は7記載の接着剤組成物からなる接着層を有することを特徴とする接着テープ。
- 請求項9記載の接着テープを用いて半導体ウエハと支持板とを貼り合わせる工程と、
支持板に貼り合わせた状態で前記半導体ウエハに薬液処理、加熱処理、又は、発熱を伴う処理を施す工程と、
前記処理後に、前記接着テープに光を照射して接着層中のテトラゾール化合物から気体を発生させる工程と、
前記半導体ウエハから前記支持板と接着テープとを剥離する工程とを有する
ことを特徴とする半導体ウエハの処理方法。 - 請求項9記載の接着テープを用いて溝部を有する半導体ウエハと支持板とを貼り合わせる工程と、
前記半導体ウエハの前記支持板に接着した側とは反対の面を研削して、溝部を貫通させて貫通孔を形成する工程と、
前記半導体ウエハの貫通孔の周辺に電極部を作製する工程と、
前記電極部作製後に、前記接着テープに光を照射して接着層中のテトラゾール化合物から気体を発生させる工程と、
前記半導体ウエハから前記支持板と接着テープとを剥離する工程とを有する
ことを特徴とするTSVウエハの製造方法。
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WO2022138703A1 (ja) * | 2020-12-25 | 2022-06-30 | 大日本印刷株式会社 | 気体発生剤、粘着組成物、及び粘着シート |
KR20230122603A (ko) | 2020-12-25 | 2023-08-22 | 다이니폰 인사츠 가부시키가이샤 | 기체 발생제, 점착 조성물 및 점착 시트 |
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US20130071658A1 (en) | 2013-03-21 |
JP5688391B2 (ja) | 2015-03-25 |
TW201529773A (zh) | 2015-08-01 |
JP2011246725A (ja) | 2011-12-08 |
JP5075272B2 (ja) | 2012-11-21 |
TWI490293B (zh) | 2015-07-01 |
JP4846067B2 (ja) | 2011-12-28 |
CN102822306A (zh) | 2012-12-12 |
KR20130007611A (ko) | 2013-01-18 |
JP2012255154A (ja) | 2012-12-27 |
TWI534222B (zh) | 2016-05-21 |
JPWO2011118506A1 (ja) | 2013-07-04 |
CN102822306B (zh) | 2015-02-11 |
EP2551323A1 (en) | 2013-01-30 |
TW201144393A (en) | 2011-12-16 |
JP2012067317A (ja) | 2012-04-05 |
JP4904434B2 (ja) | 2012-03-28 |
KR101578575B1 (ko) | 2015-12-17 |
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