WO2008078686A1 - オキシムエステル化合物及び該化合物を含有する光重合開始剤 - Google Patents
オキシムエステル化合物及び該化合物を含有する光重合開始剤 Download PDFInfo
- Publication number
- WO2008078686A1 WO2008078686A1 PCT/JP2007/074668 JP2007074668W WO2008078686A1 WO 2008078686 A1 WO2008078686 A1 WO 2008078686A1 JP 2007074668 W JP2007074668 W JP 2007074668W WO 2008078686 A1 WO2008078686 A1 WO 2008078686A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- independently represent
- compound
- carbon atoms
- conr12r13
- cor11
- Prior art date
Links
- -1 Oxime ester compound Chemical class 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 title 1
- 239000003999 initiator Substances 0.000 title 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 4
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 125000004430 oxygen atom Chemical group O* 0.000 abstract 1
- 229910052711 selenium Inorganic materials 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 125000004434 sulfur atom Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
- C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/62—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
- C07C323/63—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton the carbon skeleton being further substituted by nitrogen atoms, not being part of nitro or nitroso groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C391/00—Compounds containing selenium
- C07C391/02—Compounds containing selenium having selenium atoms bound to carbon atoms of six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
- C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
- C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
- C07C2603/18—Fluorenes; Hydrogenated fluorenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
- C07C2603/24—Anthracenes; Hydrogenated anthracenes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Indole Compounds (AREA)
- Other In-Based Heterocyclic Compounds (AREA)
- Furan Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerization Catalysts (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07859948.7A EP2128132B1 (en) | 2006-12-27 | 2007-12-21 | Oxime ester compound and photopolymerization initiator containing the same |
US12/513,473 US8133656B2 (en) | 2006-12-27 | 2007-12-21 | Oxime ester compound and photopolymerization initiator containing the same |
CN2007800403335A CN101528682B (zh) | 2006-12-27 | 2007-12-21 | 肟酯化合物和含有该化合物的光聚合引发剂 |
JP2008551083A JP5179379B2 (ja) | 2006-12-27 | 2007-12-21 | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006351995 | 2006-12-27 | ||
JP2006-351995 | 2006-12-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008078686A1 true WO2008078686A1 (ja) | 2008-07-03 |
Family
ID=39562475
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/074668 WO2008078686A1 (ja) | 2006-12-27 | 2007-12-21 | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8133656B2 (ja) |
EP (1) | EP2128132B1 (ja) |
JP (1) | JP5179379B2 (ja) |
KR (1) | KR101471644B1 (ja) |
CN (1) | CN101528682B (ja) |
TW (1) | TWI411598B (ja) |
WO (1) | WO2008078686A1 (ja) |
Cited By (25)
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WO2008078678A1 (ja) | 2006-12-27 | 2008-07-03 | Adeka Corporation | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
JP2010085929A (ja) * | 2008-10-02 | 2010-04-15 | Jsr Corp | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
JP2010150215A (ja) * | 2008-12-26 | 2010-07-08 | Toyo Ink Mfg Co Ltd | 光重合開始剤、重合性組成物、および重合物の製造方法 |
CN101840155A (zh) * | 2009-03-16 | 2010-09-22 | 东友精细化工有限公司 | 短波长激光曝光装置用着色感光性树脂组合物、采用其的滤色片和液晶显示装置 |
JP2010215575A (ja) * | 2009-03-18 | 2010-09-30 | Toyo Ink Mfg Co Ltd | 新規オキシムエステル化合物およびそれを含んでなるラジカル重合開始剤および重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法 |
WO2010093210A3 (ko) * | 2009-02-13 | 2010-12-02 | 주식회사 엘지화학 | 광활성 화합물 및 이를 포함하는 감광성 수지 조성물 |
JP2011080036A (ja) * | 2009-09-08 | 2011-04-21 | Nippon Steel Chem Co Ltd | 光重合開始剤及び感光性組成物 |
CN102086171A (zh) * | 2009-11-27 | 2011-06-08 | 株式会社艾迪科 | 肟酯化合物及含有该化合物的光聚合引发剂 |
EP2433927A1 (en) * | 2009-05-19 | 2012-03-28 | Changzhou Tronly New Electronic Materials Co., Ltd | Ketoxime ester photoinitiator |
KR20140075588A (ko) | 2012-12-11 | 2014-06-19 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물, 표시 소자용 경화막, 표시 소자용 경화막의 형성 방법 및 표시 소자 |
US9051397B2 (en) | 2010-10-05 | 2015-06-09 | Basf Se | Oxime ester |
WO2015108386A1 (ko) | 2014-01-17 | 2015-07-23 | 주식회사 삼양사 | 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
KR20160091721A (ko) | 2015-01-26 | 2016-08-03 | 주식회사 삼양사 | 신규한 디옥심에스테르 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
KR20160096960A (ko) | 2015-02-06 | 2016-08-17 | 주식회사 삼양사 | 신규한 옥심에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
KR20160121623A (ko) | 2015-04-09 | 2016-10-20 | 주식회사 삼양사 | 신규한 플루오렌일 옥심 에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
WO2016192611A1 (zh) * | 2015-06-03 | 2016-12-08 | 江苏和成新材料有限公司 | 肟酯类化合物及其合成方法及应用 |
KR20160144161A (ko) | 2015-06-08 | 2016-12-16 | 주식회사 삼양사 | 신규한 플루오란텐 옥심 에스테르 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
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JPS6121104A (ja) * | 1984-07-10 | 1986-01-29 | Adeka Argus Chem Co Ltd | 光重合開始剤 |
US5019482A (en) | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
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WO2006018405A1 (en) | 2004-08-18 | 2006-02-23 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators |
EP1826200A2 (en) | 2006-02-24 | 2007-08-29 | FUJIFILM Corporation | Oxime derivative, photopolymerisable composition, colour filter and process for producing the same |
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- 2007-12-21 WO PCT/JP2007/074668 patent/WO2008078686A1/ja active Application Filing
- 2007-12-21 KR KR1020097008477A patent/KR101471644B1/ko active IP Right Grant
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Also Published As
Publication number | Publication date |
---|---|
EP2128132A1 (en) | 2009-12-02 |
TW200900378A (en) | 2009-01-01 |
TWI411598B (zh) | 2013-10-11 |
CN101528682B (zh) | 2012-08-08 |
KR101471644B1 (ko) | 2014-12-10 |
JPWO2008078686A1 (ja) | 2010-04-22 |
EP2128132A4 (en) | 2012-04-25 |
CN101528682A (zh) | 2009-09-09 |
US8133656B2 (en) | 2012-03-13 |
KR20090093933A (ko) | 2009-09-02 |
JP5179379B2 (ja) | 2013-04-10 |
EP2128132B1 (en) | 2014-01-15 |
US20100075254A1 (en) | 2010-03-25 |
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