WO2007066661A1 - ポジ型ホトレジスト組成物及びこれを用いたホトレジストパターン形成方法 - Google Patents
ポジ型ホトレジスト組成物及びこれを用いたホトレジストパターン形成方法 Download PDFInfo
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- WO2007066661A1 WO2007066661A1 PCT/JP2006/324272 JP2006324272W WO2007066661A1 WO 2007066661 A1 WO2007066661 A1 WO 2007066661A1 JP 2006324272 W JP2006324272 W JP 2006324272W WO 2007066661 A1 WO2007066661 A1 WO 2007066661A1
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- WIPO (PCT)
- Prior art keywords
- photoresist composition
- alkali
- component
- positive photoresist
- acid
- Prior art date
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 68
- 239000000203 mixture Substances 0.000 title claims abstract description 66
- 238000000034 method Methods 0.000 title claims abstract description 32
- 150000001875 compounds Chemical class 0.000 claims abstract description 48
- 229920000178 Acrylic resin Polymers 0.000 claims abstract description 30
- 239000004925 Acrylic resin Substances 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 28
- 239000011347 resin Substances 0.000 claims abstract description 28
- 229920003986 novolac Polymers 0.000 claims abstract description 19
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical group [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000004014 plasticizer Substances 0.000 claims abstract description 9
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 26
- 230000009477 glass transition Effects 0.000 claims description 11
- 230000005855 radiation Effects 0.000 claims description 8
- 238000001312 dry etching Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 150000005215 alkyl ethers Chemical class 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 abstract description 16
- 239000003513 alkali Substances 0.000 abstract description 12
- 230000035945 sensitivity Effects 0.000 abstract description 5
- 230000035939 shock Effects 0.000 abstract description 4
- 238000005336 cracking Methods 0.000 abstract description 2
- -1 p-phenolphenol Chemical compound 0.000 description 47
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 19
- 229910052710 silicon Inorganic materials 0.000 description 19
- 239000010703 silicon Substances 0.000 description 19
- 238000000576 coating method Methods 0.000 description 12
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
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- 238000002360 preparation method Methods 0.000 description 9
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- 239000000126 substance Substances 0.000 description 9
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- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
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- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000011161 development Methods 0.000 description 6
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- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 5
- 229930192627 Naphthoquinone Natural products 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
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- 150000005846 sugar alcohols Polymers 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 4
- 239000007983 Tris buffer Substances 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- GGNQRNBDZQJCCN-UHFFFAOYSA-N hydroxyhydroquinone Natural products OC1=CC=C(O)C(O)=C1 GGNQRNBDZQJCCN-UHFFFAOYSA-N 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- ALVGSDOIXRPZFH-UHFFFAOYSA-N [(1-diazonioimino-3,4-dioxonaphthalen-2-ylidene)hydrazinylidene]azanide Chemical compound C1=CC=C2C(=N[N+]#N)C(=NN=[N-])C(=O)C(=O)C2=C1 ALVGSDOIXRPZFH-UHFFFAOYSA-N 0.000 description 3
- 229940022663 acetate Drugs 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
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- 244000309464 bull Species 0.000 description 3
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- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
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- 239000007789 gas Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 235000006408 oxalic acid Nutrition 0.000 description 3
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
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- 239000001294 propane Substances 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
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- 238000003756 stirring Methods 0.000 description 3
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- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 2
- OGRAOKJKVGDSFR-UHFFFAOYSA-N 2,3,5-trimethylphenol Chemical compound CC1=CC(C)=C(C)C(O)=C1 OGRAOKJKVGDSFR-UHFFFAOYSA-N 0.000 description 2
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- 125000004432 carbon atom Chemical group C* 0.000 description 2
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- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000007824 aliphatic compounds Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 230000003254 anti-foaming effect Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- IRERQBUNZFJFGC-UHFFFAOYSA-L azure blue Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[S-]S[S-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] IRERQBUNZFJFGC-UHFFFAOYSA-L 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 239000000981 basic dye Substances 0.000 description 1
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 1
- FHBGVWKGAUKZSG-UHFFFAOYSA-N benzene-1,4-diol;methane Chemical compound C.OC1=CC=C(O)C=C1 FHBGVWKGAUKZSG-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- 229940106691 bisphenol a Drugs 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 235000012730 carminic acid Nutrition 0.000 description 1
- NLMHXPDMNXMQBY-UHFFFAOYSA-L chembl260999 Chemical compound [Na+].[Na+].C1=CC(NC(=O)C)=CC=C1N=NC(C(=CC1=C2)S([O-])(=O)=O)=C(O)C1=CC=C2NC(=O)NC1=CC=C(C(O)=C(N=NC=2C=CC=CC=2)C(=C2)S([O-])(=O)=O)C2=C1 NLMHXPDMNXMQBY-UHFFFAOYSA-L 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- WTNDADANUZETTI-UHFFFAOYSA-N cyclohexane-1,2,4-tricarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)C(C(O)=O)C1 WTNDADANUZETTI-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- JBSLOWBPDRZSMB-BQYQJAHWSA-N dibutyl (e)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C\C(=O)OCCCC JBSLOWBPDRZSMB-BQYQJAHWSA-N 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- 239000000982 direct dye Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- PXJJSXABGXMUSU-UHFFFAOYSA-N disulfur dichloride Chemical compound ClSSCl PXJJSXABGXMUSU-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- IJFXRHURBJZNAO-UHFFFAOYSA-N meta--hydroxybenzoic acid Natural products OC(=O)C1=CC=CC(O)=C1 IJFXRHURBJZNAO-UHFFFAOYSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- YSGBMDFJWFIEDF-UHFFFAOYSA-N methyl 2-hydroxy-3-methylbutanoate Chemical compound COC(=O)C(O)C(C)C YSGBMDFJWFIEDF-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- MZYHMUONCNKCHE-UHFFFAOYSA-N naphthalene-1,2,3,4-tetracarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=C(C(O)=O)C(C(O)=O)=C21 MZYHMUONCNKCHE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- PMOWTIHVNWZYFI-UHFFFAOYSA-N o-Coumaric acid Natural products OC(=O)C=CC1=CC=CC=C1O PMOWTIHVNWZYFI-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001444 polymaleic acid Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- YIBXWXOYFGZLRU-UHFFFAOYSA-N syringic aldehyde Natural products CC12CCC(C3(CCC(=O)C(C)(C)C3CC=3)C)C=3C1(C)CCC2C1COC(C)(C)C(O)C(O)C1 YIBXWXOYFGZLRU-UHFFFAOYSA-N 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 235000013799 ultramarine blue Nutrition 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical compound [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Definitions
- the present invention relates to a positive object and a dielectric method suitable for a process in which a dry process is performed at a low temperature in the production of an S element such as a micro sensor or a through electrode. is there.
- the size of the package can be significantly increased by taking the terminal out of the chip with the through electrode. The advantage is that it can be reduced to
- At least one kind selected from () aka-soluble rack fat, () aka-soluble lacquer and aceto-soluble bisphenol, and (C) a quinonediazide compound are contained. Gist, and then, a gist pattern method using this position is provided.
- an ac-soluble lac which is used explicitly, for example, with a compound having an acid group (lower, simply, no) or an aldehyde.
- a compound having an acid group (lower, simply, no) or an aldehyde examples include No, No, No, No, No, No, No, No, No, No, No, 2 3 No, 2 4 No, 25 No, 25 No, 26 No, 3 4 Kino, 3 5 Kino, 2 3 5 Metino, 3 4 5 Metino,
- aldehydes include homoaldehyde, lahomaldehyde, la, benaldehyde, beardehyde, acetaldehyde, and the like.
- time contact is not particularly limited, for example, hydrochloric acid ,,,,, acid or the like is used.
- the average molecular weight of the Aka-soluble lac is not particularly limited, but is preferably -5.
- the glass (sometimes referred to below) is preferably below C for at least one of the following (minutes of acetic acid soluble and acetic acid soluble resin).
- a plastic having glass it is possible to secure the ability for dry etching even if low temperature dry and ching treatment is performed under C, especially 2 to C. Even when cooled from normal temperature to low temperature, cracks etc. do not occur.
- a common aqua-soluble aqua-soluble resin can be used as long as it satisfies the above requirements.
- the acetic acid has an average molecular weight of ⁇ 8, as long as it satisfies the above-mentioned glass requirements.
- the constituents derived from at least one polymerizable compound selected from (meth) aquaxte and its compounds among the alkanoic acids are preferred because the glass is low.
- the polymerizable compound include methyl (meth) act, chi (meta) act, pupy (meta) act, chi (meta) act, (meta) act, benz (meta) act.
- the dicationic compounds such as ling (meta) act, tetrad (meta) act, and the like are preferable 2-tochi-acting and mettochito-acting act. These can be used alone or in combination of two or more.
- a value of 2 to 9 is preferable, and a value of 3 to 8 is more preferable. If it exceeds 9, () the ability to dissolve in acetic acid rack deteriorates, and when it is pave, Therefore, a type 5-7 network with non-uniformity is generated on the surface, which tends to produce a uniform dist film.
- polymerizable substance composed of a (meth) acryl having a carboxylic group.
- examples of such polymerizable compounds include ac, metac, coutonic acid, and other carbons, ins, and itanoic acid and other dicarbons, 2 taku oki, 2 taku okiin, 2 taku oki, 2 Examples of such compounds include talc oxide and other groups, and talc conductors and other compounds having a steric structure. Preference is given to alk and methacrylic acid. These can be used alone or in combination of two or more.
- the composition is derived from a polymerizable compound composed of a (meth) actuator having a carboxy group, an acetic acid activator, 2 to 5, and more preferably 5 to 4. If 2, There is a case in which the disintegration property deteriorates, sufficient disintegration property in the developing solution cannot be obtained, and the disintegration property deteriorates to cause discoloration.
- the glass is calculated by calculating the glass and the theoretical glass. More specifically, the product of the constituent glass derived from the compatible material, multiplied by the number of copies occupied by the composition, is added, and the product is divided by to obtain the theoretical glass, which is under C. 002 This is the average molecule of ac-soluble activator OO ⁇ 8
- the dysto film cannot obtain sufficient properties for the drying process at a low temperature, and when it exceeds 8, the value may decrease.
- the acetic acid-soluble activator may contain another dicarboxylic acid compound as a monomer for the purpose of appropriately controlling physical and physical properties.
- other deer compatibility means the taste of deer composition other than the compatible composition.
- Actuators (meta) aqua type analogues such as 2 pp (meta) act, dicarbone type analogues such as dimethy
- Compatible quadruples such as beads, and compatible quadruples such as meta quads can be used. Each of these can be a combination of two or more.
- Aka-soluble Ac is preferred to be 5% or more, and more preferably 4%.
- Polymerization used in synthesizing alkanoic acids includes, for example, acetating methyl groups such as tanno and dicing. Tee, Ting Ming Tee, Ting Ting Ming Tee, etc.
- polymerization to be used when synthesizing aka-soluble oil usual radical initiation can be used, and for example, peroxyacids such as benzoiooki eoki such as 2 2 chit can be used.
- an acaosoluble resin can be used as another embodiment of the () agent.
- an aqua-soluble vinyl is a polymer composed of a vinyl-based material.
- examples thereof include ad, poact, pono and polymers thereof.
- methite is particularly preferable because it has a low glass content and cracking properties at low temperatures.
- the average molecular weight of Aka soluble vinyl is ⁇ 2, preferably 5 ⁇ .
- Examples of (C) quinone diazide compounds include () 2 3 4 Tohyl benzonon, 2 4 4 Tohyl benzonon, 2 4 6 Tohyl benzonon, 2 3 6 Tohyl benzonon, 2 3 4 Tohyl benzone. 2 Mechibe Non, 2 3 4 4 Tetra benzonon, 2 2 4 4 Tetra benzo non, 2 3 4 4 6 Penta benzo A 4 Penta benzo non, 2 2 3 4 5 Penta benzo non, 2 3 4 4 5 6 Xa benzo t R 5
- Benzonones such as benzo, (11) bis (2 4
- (Po) acanes such as den) bisno, (111) tos (4) methane, bis (4 KI 35 MET) 4 methane, bis (4 KI 25 MET) 4 methane, bis (4 KI) 3 5 meth
- Methane bis (5, 4, 3, 3) 4 Methane, bis (5 x 4 x 3 meth) 3 methane, bis (5 x 4 x 3 meth) 2 methane, bis (3 x 2 meth)
- Methanes are its methylated forms, such as () notokino, methino, hydroquinone, to ,, moth, gamethite, ga3methite, gallic acid ,, anogen, 444anobenzo. Acid groups Amino groups, () racks, gatsins, polymers of xanthine, or copolymers with these, etc., and toquinone 2 diazide 5 phon toquinone 2 diazide 4 phon, Examples thereof include compounds with quinonediazidophones such as otoanthraquinonediadiphosphonic acid, partial compounds, and partial compounds.
- the quinonediadiphones represented by the general formula () or (2) are more preferable.
- the toquinone 2 diazidos group has a group bonded at the 45 position.
- These compounds are dissolved by the agents that are usually used when used as a composition liquid and have good compatibility with the () acetic acid soluble rack of the film quality, and when used as the light component of the positiveist, It has excellent sensitivity, excellent cross-sectional shape, excellent heat resistance, and gives a composition free of foreign substances when used as a liquid.
- the quinonediadihonsten represented by the above () or (2) may be used, or two or more thereof may be used.
- toquinone ⁇ 2 diazide sk toquinone ⁇ 2 diazide 4 kh toquinone ⁇ 2 diazide 5 kh is preferable.
- the quinone diazide compound of the compound represented by the above () or (2) and other quinone diazide compounds may be used in combination, if necessary, within a range that does not impair the effects of Ming. it can.
- the quinonediazide compound may be contained singly or in combination of two or more. Also, this (C), It is desirable to mix it in the range of 5 to, and preferably to 5 with respect to the () portion of the alkanol-soluble rack. This 5
- At least at least one selected from () acetic acid-soluble lac fat, () acetic acid-soluble lacquer and acetic acid-soluble bisphenol, and (C) quinonediazide compound is dissolved in a suitable solvent, and It is preferable to use it in the form.
- solvents examples include Tingmetite, Tingte, Tingnoppite, Tingute such as Tingte, Tingdimetite, Tungingte, Tinging. Gingpitite, Tinging dichite, etc., Tinging diakites, Methicate, Tictinging, etc., Chinging acetate, Pinging methylate, Ping ateate, such as pine acid, pudding no puite ate, etc., acetone, methitone, quinone, methone, etc.
- Tingmetite Tingte
- Tingnoppite Tingute such as Tingte, Tingdimetite, Tungingte, Tinging.
- Gingpitite, Tinging dichite, etc. Tinging diakites, Methicate, Tictinging, etc.
- Chinging acetate Pinging methylate, Ping ateate, such as pine acid, pudding no puite ate, etc.,
- Cyclic teeth such as xanthane, 2, Pupionmethyc, 2 Pupionti, 2Ki2Methyluppionti, Tokiti, Okiti, 2Ki3Methimethan Methi, 3 Tokichia Tet, 3 Methyl 3 Toxicate
- esters chi, thio, acetomethyi, acetomethyi. These can be used alone or in combination of two or more.
- the composition of 004 can be blended if necessary.
- the composition of 004 can be blended if necessary.
- a functional ramping agent is effective.
- a functional ramping agent means a reactive ramping agent such as, a metaquine, an isocyanate, and a chelating group, and is a specific example. Examples include toxic acid, tacupitotoxyl, bitoacetoxylan, bitotoxylan, gupupitotoxylan, and j (3 4k) chitotoxyl. That is, (2) below 2 is preferable for Aka-soluble racks.
- carboxylic acid such as carboxylic acid, benzoic acid, citric acid, etc. Sat, benzoic acid, benzoic acid, 2 digit, 3 digit, 4 digit, 5 digit, arginine acid, etc.
- the dose of the substance for adjusting the solubility for the above-mentioned aqueous solution can be adjusted according to the application and method, and is not particularly limited as long as it can be mixed in the composition. However, it is 6 below, preferably 4 below.
- coloring agents examples thereof include mosquito, ana, tac, bentonite, sodium ketone, and powdered glass.
- examples include lead, white, yellow lead, red lead, ultramarine, navy blue, titanium oxide, titanium, cumulus, red iron oxide, carbon rack, etc.
- examples of such dyes are Sen and Metai.
- examples of the viscosity adjustment include bentonite, lizard, and powder of aluminum. To the extent that these do not impair the qualitative characteristics of the composition, preferably, 5 down.
- a desired solution is formed by applying a solution of a positive electrode prepared as in (005) (5) on the ingot and then removing it by heating.
- the spin method, the spin method, the screen method, and the appetitor method can be adopted.
- the composition Although it varies depending on the pest of the cyst, the composition, the composition, the thickness, etc., it is usually 7 to 3 C, preferably 8 to 2 C, and about 2 to 6.
- irradiated by the radiation it emits light by irradiating radiation, for example, external rays and visible rays with a length of 3 to 5 through a predetermined tanned disk.
- radiation for example, external rays and visible rays with a length of 3 to 5 through a predetermined tanned disk.
- rays of radiation low-pressure mercury, high-pressure mercury, ultra-high-pressure mercury, metallized lamp, angussa, etc. can be used.
- radiation means ultraviolet rays, visible rays, external rays, X rays, electron rays, and the like. It depends on the radiation irradiation, composition, composition, thickness, etc., but for high pressure mercury,
- an acetic acid solution is used as a developing solution to dissolve and remove unnecessary portions, and only the radiation component remains.
- the image liquid for example, sodium, potassium hydroxide, sodium carbonate, sodium, metacarbonate, ana, cyanine, phosphorus, cyanine, Pupines, tothane, methityan, methitanoan, totanoan, tetramethianum, tetrathianium, pi, gin, 8 h 5 4 7 decene, 5 h 4 3 It is possible to use an aqueous solution of Acai such as 5.
- an aqueous solution obtained by appropriately adding the solubility of methano, tano, etc. to the aqueous solution of the above-mentioned aka.
- aqueous solution obtained by appropriately adding the solubility of methano, tano, etc.
- it is usually between 3 and 3, and it may be due to differences in development, dipping, de-coating, and imaging methods.
- Rinse with running water for 3 to 9 use a gun, etc. or dry in the bath.
- a mixture of azo () and azo laczo (weight: 64) was mixed, and then phon was added to the mixture to condense it by the method (3) to obtain zolac fat. Fractionation was applied to this, and a region was obtained to obtain a rack resin having a weight average molecular weight of 5. Let this fat be a rack ().
- thermometer After replacing the position, the thermometer, and the glass, I started by inserting two pumping meters as. Then, the dose of the drug was raised to 8C. Polymerization as 2 2
- methotite was used, and aceto-soluble biomethitepo obtained by high-temperature gas-phase reaction was used, and a positiveist (P 4) was prepared by the same procedure.
- a positiveist (P 5) was prepared by the same procedure as the preparation, except that Acu () was used.
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- Spectroscopy & Molecular Physics (AREA)
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
Claims
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JP2007549137A JP4865729B2 (ja) | 2005-12-06 | 2006-12-05 | 基板加工方法 |
US12/095,208 US20090291393A1 (en) | 2005-12-06 | 2006-12-05 | Positive photoresist composition and method of forming photoresist pattern using the same |
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US (1) | US20090291393A1 (ja) |
JP (1) | JP4865729B2 (ja) |
KR (1) | KR20080049141A (ja) |
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WO (1) | WO2007066661A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010015079A (ja) * | 2008-07-07 | 2010-01-21 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物 |
WO2010013642A1 (ja) * | 2008-07-29 | 2010-02-04 | 東亞合成株式会社 | 導電性高分子のパターン形成方法 |
WO2010073948A1 (ja) * | 2008-12-26 | 2010-07-01 | 日立化成工業株式会社 | ポジ型感光性樹脂組成物、レジストパターンの製造方法、半導体装置及び電子デバイス |
US11822242B2 (en) | 2019-11-14 | 2023-11-21 | Merck Patent Gmbh | DNQ-type photoresist composition including alkali-soluble acrylic resins |
Families Citing this family (6)
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KR100968626B1 (ko) | 2008-05-27 | 2010-07-08 | 삼성전기주식회사 | 하우징, 이를 구비한 수소발생장치 및 연료전지 발전시스템 |
KR20110121301A (ko) * | 2010-04-30 | 2011-11-07 | 삼성전자주식회사 | 포토레지스트 조성물, 이를 이용한 패턴 형성 방법 및 박막 트랜지스터 기판의 제조 방법 |
JP5710769B2 (ja) * | 2012-07-10 | 2015-04-30 | 株式会社 マイクロプロセス | 感光性樹脂組成物、感光性ドライフィルム、パターン形成方法、プリント配線板およびその製造方法 |
JP5686217B1 (ja) * | 2014-04-30 | 2015-03-18 | 住友ベークライト株式会社 | 感光性樹脂材料および樹脂膜 |
SG11201900622UA (en) * | 2016-10-12 | 2019-04-29 | Ridgefield Acquisition | Chemically amplified positive photoresist composition and pattern forming method using same |
TWI753105B (zh) * | 2017-02-22 | 2022-01-21 | 日商信越化學工業股份有限公司 | 圖型形成方法 |
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JP2010015079A (ja) * | 2008-07-07 | 2010-01-21 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物 |
WO2010013642A1 (ja) * | 2008-07-29 | 2010-02-04 | 東亞合成株式会社 | 導電性高分子のパターン形成方法 |
JP5375825B2 (ja) * | 2008-07-29 | 2013-12-25 | 東亞合成株式会社 | 導電性高分子のパターン形成方法及び基板の製造方法 |
WO2010073948A1 (ja) * | 2008-12-26 | 2010-07-01 | 日立化成工業株式会社 | ポジ型感光性樹脂組成物、レジストパターンの製造方法、半導体装置及び電子デバイス |
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JP5158212B2 (ja) * | 2008-12-26 | 2013-03-06 | 日立化成株式会社 | ポジ型感光性樹脂組成物、レジストパターンの製造方法、半導体装置及び電子デバイス |
US8461699B2 (en) | 2008-12-26 | 2013-06-11 | Hitachi Chemical Company, Ltd. | Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device |
US11822242B2 (en) | 2019-11-14 | 2023-11-21 | Merck Patent Gmbh | DNQ-type photoresist composition including alkali-soluble acrylic resins |
Also Published As
Publication number | Publication date |
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JP4865729B2 (ja) | 2012-02-01 |
US20090291393A1 (en) | 2009-11-26 |
TWI344580B (ja) | 2011-07-01 |
KR20080049141A (ko) | 2008-06-03 |
JPWO2007066661A1 (ja) | 2009-05-21 |
TW200739265A (en) | 2007-10-16 |
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