WO2006064596A1 - Dispositif de nettoyage de substrat et procede de nettoyage - Google Patents

Dispositif de nettoyage de substrat et procede de nettoyage Download PDF

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Publication number
WO2006064596A1
WO2006064596A1 PCT/JP2005/016792 JP2005016792W WO2006064596A1 WO 2006064596 A1 WO2006064596 A1 WO 2006064596A1 JP 2005016792 W JP2005016792 W JP 2005016792W WO 2006064596 A1 WO2006064596 A1 WO 2006064596A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning
substrate
cleaning unit
sides
pair
Prior art date
Application number
PCT/JP2005/016792
Other languages
English (en)
Japanese (ja)
Inventor
Shigeru Sakata
Original Assignee
Shibaura Mechatronics Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corporation filed Critical Shibaura Mechatronics Corporation
Priority to CN2005800430066A priority Critical patent/CN101080283B/zh
Publication of WO2006064596A1 publication Critical patent/WO2006064596A1/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/041—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • B08B5/04—Cleaning by suction, with or without auxiliary action
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00—Gas-filled discharge tubes with solid cathode
    • H01J17/38—Cold-cathode tubes
    • H01J17/48—Cold-cathode tubes with more than one cathode or anode, e.g. sequence-discharge tube, counting tube, dekatron
    • H01J17/49—Display panels, e.g. with crossed electrodes, e.g. making use of direct current

Definitions

  • the present invention relates to a cleaning device and a cleaning method for cleaning an electrode formed on a substrate such as a liquid crystal panel.
  • a substrate such as a liquid crystal panel or a plasma display panel is provided with an electrode on a side portion of the substrate, and an electronic component such as a TCP (Tape Carrier Package) or an IC chip is applied to the electrode by a crimping device. Connect by pressure heating.
  • TCP Transmission Carrier Package
  • the electrode and the electronic component are usually electrically connected via an anisotropic conductive member. For this reason, in order to obtain an electrically conductive state at the connection portion, it is necessary that the electrode surface be contaminated by dust or the like.
  • the electrode is usually formed on the upper surface of the substrate. However, if an electronic component is crimped to the electrode and dust adheres to the lower surface of the substrate, the substrate may be damaged during the crimping. Therefore, before the anisotropic conductive member is attached to the electrode surface of the substrate, the electrode surface is cleaned by a cleaning device.
  • the cleaning device has a table for transporting the substrate along a predetermined direction, and a tape-like cleaning member is provided above the tape so as to be stretched between a supply reel and a take-up reel. And This cleaning member is dripped with a volatile solvent such as nozzle force alcohol, and the part soaked with this solvent is moved to a predetermined position and applied to the electrode surface at the edge of the substrate to be conveyed with a predetermined pressure. The electrode surface is cleaned by contact.
  • a volatile solvent such as nozzle force alcohol
  • electrodes may be formed on three or four sides of only two sides of the substrate.
  • the cleaning device conventionally, if one side of the substrate is cleaned by the cleaning device, the table on which the substrate is placed is sequentially rotated by 90 degrees to clean the remaining side of the substrate. Then things were done.
  • Such a conventional cleaning device is disclosed in Patent Document 1.
  • Patent Document 1 Japanese Patent Laid-Open No. 2003-53281
  • the cleaning operation has to be repeated four times in order to clean the substrate with a conventional cleaning device.
  • you clean one side of the board rotate this board 90 degrees and clean the side adjacent to the one side.
  • the tact time when cleaning a plurality of sides of a substrate, the tact time can be shortened as compared with the conventional case, and the force does not generate a rotational moment on the substrate and shift in the rotational direction.
  • the present invention is a cleaning device for cleaning the upper and lower surfaces of at least a pair of opposing sides of a substrate
  • a first cleaning unit for cleaning the upper and lower surfaces of one side of the substrate
  • a second cleaning unit disposed opposite to the first cleaning unit and cleaning the other side opposite to the one side of the substrate simultaneously with the one side;
  • Transport means for transporting the substrate between the opposing first cleaning unit and the second cleaning unit along a direction intersecting the opposing direction of the cleaning units;
  • a substrate cleaning apparatus comprising:
  • the present invention is a cleaning method for cleaning the upper and lower surfaces of at least a pair of opposing sides of a substrate
  • FIG. 1 is a front view showing a cleaning device of the present invention.
  • FIG. 2 is a side view showing the front surface of one of the pair of cleaning units.
  • FIG. 3 is an enlarged view showing an upper cleaning portion and a lower cleaning portion provided on the front surface of the cleaning unit.
  • FIG. 4 is a plan view of a substrate on which electrodes are formed on four sides.
  • FIG. 1 is a front view of a cleaning device showing an embodiment of the present invention
  • FIG. 2 is a side view
  • the cleaning device includes a base 101.
  • the first cleaning unit 100A is at one end in the width direction on the base 101
  • the second cleaning unit 100B is at the top of the other end, which is the width direction of the base 101.
  • the direction indicated by the arrow X in FIG. It can be moved along
  • a first X drive source 102a for driving the first cleaning unit 100A in the X direction is provided at one end in the width direction of the base 101, and the second cleaning unit 100B is installed in the X direction at the other end.
  • a second X drive source 102b that is driven in the direction is provided. Therefore, the pair of cleaning units 100A and 100B can adjust the distance between them.
  • the first X drive source 102a and the second X drive source 102b constitute interval adjusting means for adjusting the interval along the X direction of the pair of cleaning units 100A, 100B.
  • a support 103 is provided on the base 101 between the first cleaning unit 100A and the second cleaning unit 100B along the Y direction intersecting the X direction.
  • a mounting table 104 is provided on the upper surface of the support 103 so as to be movable in the longitudinal direction of the support 103, that is, in the Y direction.
  • the mounting table 104 is driven along the Y direction by a Y drive source 105 provided at one end in the longitudinal direction of the support 103.
  • a holding unit 106 On the upper surface of the mounting table 104, there is provided a holding unit 106 that sucks and holds the lower surface of the substrate W such as a liquid crystal panel or a plasma display panel.
  • the holding unit 106 is driven in the rotational direction by a ⁇ drive source (not shown).
  • the substrate W has a rectangular shape.
  • a plurality of electrodes 107 are provided at predetermined intervals on the upper surfaces of the four side edges W 1 to W 4.
  • the base plate W has a rectangular shape that is sufficiently larger than the holding portion 106, and the peripheral portion thereof is held with the outer peripheral surface force of the holding portion 106 protruding.
  • the first cleaning unit 100A and the second cleaning unit 100B will be described. Since the first and second cleaning units 100A and 100B have the same configuration, one of them will be described with reference to FIG. That is, the cleaning units 100A and 100B include a main body 1.
  • each of the cleaning units 11 and 12 has supply reels 13a and 13b and scooping reels 14a and 14b provided symmetrically in the vertical direction.
  • Each supply reel 13a, 13b is wound with a cleaning member 15 having a soft tape-like fabric force having excellent wear resistance.
  • Each cleaning member 15 is wound around each scraping reel 14a, 14b via first to third relay rollers 16a-16c and one scraping roller 17, respectively.
  • Motors 18a, 18b and 19a, 19b that apply appropriate tension to the cleaning member 15 are connected to the supply reels 13a, 13b and the scraping reels 14a, 14b, respectively.
  • Drive motors 21a and 21b for driving the scraping roller 17 are connected.
  • the cleaning member 15 of the upper cleaning unit 11 and the lower cleaning unit 12 is wound around the supply reels 13a and 13b by the actuating drive motors 21a and 21b. It has become.
  • Each motor is provided inside the main body 1, and each roller and reel are rotatably provided on the front surface of the main body 1.
  • pressing rollers 22a, 22 between the second relay roller 16b and the third relay roller 16c. b is provided. Each of the pressing rollers 22a and 22b is driven in a direction in which the upper and lower cylinders 23a and 23b are in contact with and separated from the plate surface of the base plate W. As a result, as shown in FIG. 3, the pressing rollers 22a and 22b press the cleaning member 15 against the side of the base plate W positioned and held by the holding portion 106 with a predetermined pressure from above and below. It will be.
  • An upper nozzle 24a and a lower nozzle 24b are arranged with the tip thereof facing downward at a portion between the first relay roller 16a and the second relay roller 16b of the cleaning member 15,
  • the Each nozzle 24a, 24b is connected to a container 25 containing a solvent such as alcohol via a supply tube 26.
  • a pump 27 is provided in the middle of the supply tube 26. The pump 27 is intermittently compressed along a predetermined direction by a roller that rotates in the middle of the tube 26, whereby the solvent in the container 25 is dropped from the nozzles 24a and 24b. It's like! /
  • the solvent is dropped from the upper nozzle 24a and the lower nozzle 24b to the cleaning member 15 by direct force. As a result, the solvent dropped from the nozzles 24a and 24b penetrates the cleaning member 15, respectively.
  • the drive motors 21a and 21b are driven, and the portion of the cleaning member 15 where the solvent is dropped is positioned between the pressing rollers 22a and 22b. Thereby, the side of the substrate W can be cleaned by the cleaning member 15.
  • a control device 29 is provided at the upper part of the main body 1.
  • the control device 29 controls the driving of the first and second X drive sources 102a and 102b and the Y drive source 105.
  • a suction duct 31 that constitutes suction means is disposed on the upstream side of the upper cleaning unit 11 in the transport direction of the substrate W so as to face the side portion of the substrate W.
  • This suction duct 31 is connected to a suction pump (not shown).
  • the first cleaning unit 100A and the second cleaning unit 100B are driven in the X direction by the first X drive source 102a and the second X drive source 102b, and are provided in front of these cleaning units 100A and 100B. Further, the interval between the pressing rollers 22a and 22b of the upper and lower cleaning portions 11 and 12 is set so as to be substantially the same as one width dimension of the substrate W indicated by B in FIG.
  • first cleaning unit 100A and the second cleaning unit 100B are positioned symmetrically according to the width dimension B of the substrate W with the holding portion 106 holding the substrate W as the center.
  • the Y drive source 105 is operated to drive the mounting table 104 in the Y direction, that is, so that the substrate W travels in the direction indicated by the arrow Y in FIGS.
  • the upper and lower cylinders 23a and 23b of the upper cleaning unit 11 and the lower cleaning unit 12 of each cleaning unit 100A and 100B are operated to drive the pair of pressing rollers 22a and 22b in the approaching direction.
  • the substrate W transported in the Y direction has a suction duct 31 before the upper surface and the lower surface of the pair of opposing sides Wl, W2 reach the position facing the pressing rollers 22a, 22b. Pass below. Accordingly, if dust adheres to both sides Wl and W2 of the substrate W, the dust is sucked and removed by the suction duct 31.
  • the substrate W held by the holding portion 106 of the mounting table 104 is prevented from shifting in the rotational direction, the pair of opposing side edges Wl and W2 of the substrate W are extended over the entire length. It can be reliably cleaned.
  • the pair of cleaning units 100A and 100B are driven in a direction in which the interval in the X direction is widened, and then placed. Move table 104 back in the Y direction. Next, the holding unit 106 is rotated 90 degrees so that the remaining pair of opposite sides W3 and W4 of the substrate W are positioned along the Y direction which is the transfer direction of the substrate W.
  • the distance between the pressing rollers 22a and 22b of the upper and lower cleaning portions 11 and 12 provided on the front surfaces of the pair of cleaning units 100A and 100B is substantially the same as the width dimension indicated by A in FIG. Set to be
  • the substrate W does not shift in the rotation direction, and therefore the pair of sides W3 and W4 can be reliably cleaned over the entire length. . Since the four side edges W1 to W4 of the substrate W can be cleaned in two cleaning steps, the cleaning force can be cleaned in half the tact time compared to cleaning one side at a time.
  • the case where electrodes are formed on four sides of the substrate has been described.
  • the case where electrodes are formed on three sides is also important. If electrodes are formed on at least a pair of opposite sides of one side, the cleaning device of the present invention can simultaneously clean the two sides, so the substrate is rotated. It is possible to clean the pair of sides reliably and efficiently without shifting in the direction.
  • Electrodes may be provided on the lower surface of the side opposite to or adjacent to the side, and electrodes may be provided on both upper and lower surfaces.
  • the present invention can be applied.
  • the tact time can be shortened as compared with the case of cleaning each side, and the substrate moves in the rotation direction during cleaning. Therefore, each side can be reliably cleaned.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

L’invention concerne un dispositif de nettoyage pour nettoyer les surfaces supérieure et inférieure d’au moins une paire de côtés opposés d’un substrat. Le dispositif de nettoyage comprend un premier module de nettoyage (100A) pour nettoyer les surfaces supérieure et inférieure d’un premier côté du substrat, un deuxième module de nettoyage (100B) placé à l’opposé du premier module de nettoyage et nettoyant l’autre côté opposé au premier côté lorsque celui-ci est nettoyé, et une table de positionnement (104) pour transporter le substrat entre le premier module de nettoyage et le deuxième module de nettoyage, dans la direction coupant la direction en regard des substrats.
PCT/JP2005/016792 2004-12-14 2005-09-13 Dispositif de nettoyage de substrat et procede de nettoyage WO2006064596A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2005800430066A CN101080283B (zh) 2004-12-14 2005-09-13 基板的清扫装置和清扫方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004361718A JP4402579B2 (ja) 2004-12-14 2004-12-14 基板の清掃装置及び清掃方法
JP2004-361718 2004-12-14

Publications (1)

Publication Number Publication Date
WO2006064596A1 true WO2006064596A1 (fr) 2006-06-22

Family

ID=36587660

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2005/016792 WO2006064596A1 (fr) 2004-12-14 2005-09-13 Dispositif de nettoyage de substrat et procede de nettoyage

Country Status (4)

Country Link
JP (1) JP4402579B2 (fr)
KR (1) KR20070085666A (fr)
CN (1) CN101080283B (fr)
WO (1) WO2006064596A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009157247A (ja) * 2007-12-27 2009-07-16 Orc Mfg Co Ltd 露光装置
CN102909185A (zh) * 2012-10-26 2013-02-06 世成电子(深圳)有限公司 一种清洁机
CN103611694A (zh) * 2013-11-22 2014-03-05 日商株式会社雷恩工业 工件表面擦拭装置和工件表面擦拭方法
TWI626091B (zh) * 2016-10-28 2018-06-11 旭東機械工業股份有限公司 板邊清洗系統
CN109013425A (zh) * 2018-09-10 2018-12-18 山东联诚电力工程有限公司 一种叠合板清洁系统及方法
CN113284424A (zh) * 2021-07-26 2021-08-20 深圳鼎晶科技有限公司 定位装置及贴附载台

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05228450A (ja) * 1992-02-19 1993-09-07 Hitachi Ltd 枠の洗浄装置
JPH10113627A (ja) * 1996-08-23 1998-05-06 Toshiba Corp 超音波洗浄装置及び超音波洗浄方法
JP2002307022A (ja) * 2001-04-16 2002-10-22 Shibaura Mechatronics Corp 基板清掃装置およびその方法
JP2003053281A (ja) * 2001-08-21 2003-02-25 Shibaura Mechatronics Corp 基板清掃装置および基板清掃方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0193197A (ja) * 1987-10-05 1989-04-12 Fujitsu Ltd 基板洗浄機構
JP3452711B2 (ja) * 1995-11-16 2003-09-29 大日本スクリーン製造株式会社 基板端縁処理装置
JP3379512B2 (ja) * 1999-06-30 2003-02-24 セイコーエプソン株式会社 洗浄装置、洗浄方法および液晶装置の製造方法
JP4099292B2 (ja) * 1999-07-01 2008-06-11 芝浦メカトロニクス株式会社 基板のクリーニング装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05228450A (ja) * 1992-02-19 1993-09-07 Hitachi Ltd 枠の洗浄装置
JPH10113627A (ja) * 1996-08-23 1998-05-06 Toshiba Corp 超音波洗浄装置及び超音波洗浄方法
JP2002307022A (ja) * 2001-04-16 2002-10-22 Shibaura Mechatronics Corp 基板清掃装置およびその方法
JP2003053281A (ja) * 2001-08-21 2003-02-25 Shibaura Mechatronics Corp 基板清掃装置および基板清掃方法

Also Published As

Publication number Publication date
CN101080283B (zh) 2012-04-04
CN101080283A (zh) 2007-11-28
JP2006167554A (ja) 2006-06-29
JP4402579B2 (ja) 2010-01-20
KR20070085666A (ko) 2007-08-27

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