WO2005037698A1 - 接着テープの剥離装置 - Google Patents
接着テープの剥離装置 Download PDFInfo
- Publication number
- WO2005037698A1 WO2005037698A1 PCT/JP2004/014820 JP2004014820W WO2005037698A1 WO 2005037698 A1 WO2005037698 A1 WO 2005037698A1 JP 2004014820 W JP2004014820 W JP 2004014820W WO 2005037698 A1 WO2005037698 A1 WO 2005037698A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- tape
- peeling
- adhesive tape
- adhesive
- wafer
- Prior art date
Links
- 239000002390 adhesive tape Substances 0.000 title claims abstract description 72
- 238000010438 heat treatment Methods 0.000 claims abstract description 45
- 238000001816 cooling Methods 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 12
- 239000012790 adhesive layer Substances 0.000 claims description 10
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 abstract description 17
- 235000012431 wafers Nutrition 0.000 description 98
- 238000000034 method Methods 0.000 description 29
- 238000004804 winding Methods 0.000 description 27
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 8
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 7
- 239000010410 layer Substances 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- -1 polyethylene Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 241000255925 Diptera Species 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C63/00—Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
- B29C63/0004—Component parts, details or accessories; Auxiliary operations
- B29C63/0013—Removing old coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H37/00—Article or web delivery apparatus incorporating devices for performing specified auxiliary operations
- B65H37/002—Web delivery apparatus, the web serving as support for articles, material or another web
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2701/00—Handled material; Storage means
- B65H2701/10—Handled articles or webs
- B65H2701/19—Specific article or web
- B65H2701/192—Labels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
- H01L2221/68395—Separation by peeling using peeling wheel
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1911—Heating or cooling delaminating means [e.g., melting means, freezing means, etc.]
Definitions
- the present invention relates to an apparatus for peeling an adhesive tape such as a surface protection tape, which is singulated into chip sizes and attached to the surface of a plate-like member such as a semiconductor wafer, by force of the plate-like member.
- wafer a semiconductor wafer
- the semiconductor chip is manufactured by polishing the back surface of the wafer in order to make it uniform or to remove an oxide film generated during circuit formation, and then dicing (singulation) the wafer into circuits. are doing.
- Patent Document 1 JP-A-1116862
- Patent Document 2 JP-A-8-230093
- the peeling device described in Patent Document 1 uses a wafer from a surface before dicing. Since the protective tape is peeled off, dicing is performed on the wafer from which the surface protective tape has been peeled off, and there is a possibility that the chips generated by dicing adhere to the circuit pattern and cause the above problem. there were.
- a surface protective tape formed by providing an adhesive layer on a heat-shrinkable substrate is attached to a plate-like member, and then the surface protective tape is peeled off.
- the singulated surface protective tape shrinks and bends to reduce the contact area with those plate-like members, thereby reducing This facilitates peeling of the surface protection tape from the plate member.
- the present invention has been made in view of the above problems, and an object of the present invention is to remove an adhesive tape that can easily and efficiently peel an individualized adhesive tape from a plate-like member. It is to provide a device.
- the invention according to claim 1 provides an apparatus for peeling an adhesive tape, which has been singulated into chips and attached to the surface of a plate member, from the plate member, Release tape supply means for feeding a release tape to the plate-like member set thereon,
- Release tape applying means for applying the release tape fed out by the release tape supply means to the entire surface of the adhesive tape applied to the surface of the plate-like member;
- Tape peeling means for peeling the adhesive tape adhered to the peeling tape by the heating means together with the peeling tape from the plate member
- the invention according to claim 2 is the invention according to claim 1, wherein a continuous sheet tape is used as the release tape, and the release tape attaching means and the tape peeling means are provided by a common roller unit. It is characterized by comprising.
- the invention according to claim 3 is the invention according to claim 1, wherein a tape pre-cut according to the surface shape of the plate-like member is used as the release tape, and the tape is bonded to an end of the release tape. It is characterized in that the adhesive tape is peeled off together with a peeling tape by a plate-like member by gripping the second adhesive tape thus peeled off by a peeling head and pulling it.
- a fourth aspect of the present invention is characterized in that, in the first aspect of the present invention, the adhesive tape is formed by providing a pressure-sensitive adhesive layer on a heat-shrinkable substrate.
- the invention according to claim 5 is the invention according to claim 4, wherein the pressure-sensitive adhesive layer of the adhesive tape is formed of a UV-curable pressure-sensitive adhesive, and an ultraviolet irradiation means for irradiating the adhesive tape with ultraviolet light. It is characterized by having been provided.
- the invention according to claim 6 is characterized in that, in the invention according to claim 1, cooling means for cooling the peeling tape and the adhesive tape heated by the heating means is provided.
- the individualized adhesive tape adheres to the peeling tape, so that the adhesive tape is peeled.
- the individualized adhesive tape can also be easily peeled off the plate-shaped member, and these series of steps are peeled off.
- a peeling device including a tape supply unit, a peeling tape attaching unit, a heating unit, a tape peeling unit, and a collecting unit, the peeling operation of the adhesive tape can be performed efficiently.
- the individualized adhesive tape is continuously adhered to the continuous sheet tape so that the plate member Mosquitoes can be efficiently peeled off and collected.
- the peeling tape attaching means and the tape peeling means are constituted by a common roller unit, the structure of the peeling device can be simplified and the cost can be reduced.
- a tape precut according to the surface shape of the plate member is used as the release tape, and the second adhesive tape bonded to the end of the release tape is used. The adhesive tape can be easily and efficiently peeled off together with the peeling tape by holding and pulling the adhesive tape by the peeling head.
- the heat-shrinkable base material is heated when the adhesive tape is heated.
- the individual adhesive tapes that shrink and singulate are curved and the contact area with the plate-like member is reduced, so that each adhesive tape is easily peeled off by the plate-like member, and these easily adhere to the release tape. Then, the plate-like member peels off and is collected together with the release tape.
- the adhesive tape composed of an ultraviolet-curable adhesive when the adhesive tape composed of an ultraviolet-curable adhesive is irradiated with ultraviolet light by an ultraviolet irradiation means, the adhesive of the adhesive tape is cured.
- the adhesive force of the adhesive tape is weakened, and the individualized adhesive tapes are more easily peeled off by the plate-like member force, and these are easily peeled and collected together with the release tape.
- FIG. 1 is a side view of a peeling device according to Embodiment 1 of the present invention.
- FIG. 2 is a plan view of a peeling device according to Embodiment 1 of the present invention.
- FIG. 3 is a side view of a suction table portion of the peeling device according to Embodiment 1 of the present invention.
- FIG. 4 is a plan view of a suction table portion of the peeling device according to Embodiment 1 of the present invention.
- FIG. 5 is a cross-sectional view of a wafer having a surface protective tape adhered to the surface.
- FIG. 6 is a sectional view of a surface protection tape.
- FIG. 7 is an explanatory view showing a peeling method performed using the peeling apparatus according to Embodiment 1 of the present invention in the order of steps.
- FIG. 8 is an explanatory view showing a peeling method performed using the peeling apparatus according to Embodiment 1 of the present invention in the order of steps.
- FIG. 9 shows a peeling method performed by using the peeling apparatus according to Embodiment 1 of the present invention. It is explanatory drawing shown in order.
- FIG. 10 is an explanatory diagram showing a peeling method performed using the peeling apparatus according to Embodiment 1 of the present invention in the order of steps.
- ⁇ 11 ⁇ is an explanatory view showing, in order, a peeling method performed by using the peeling apparatus according to Embodiment 1 of the present invention.
- FIG. 12 is an explanatory view showing a peeling method performed using the peeling apparatus according to Embodiment 1 of the present invention in the order of the steps.
- FIG. 13 is an explanatory view showing a peeling method performed using the peeling apparatus according to the first embodiment of the present invention in the order of steps.
- FIG. 14 is an explanatory view showing a peeling method performed by using the peeling apparatus according to the first embodiment of the present invention in the order of steps.
- FIG. 15 is a cross-sectional view of a wafer having a surface protective tape adhered to a surface in a peeling method performed using the peeling device according to the first embodiment of the present invention.
- FIG. 16 is a cross-sectional view showing a state in which the peeling tape is attached to the surface protection tape on the wafer surface after heating in the peeling method performed using the peeling device according to the first embodiment of the present invention.
- FIG. 17 is a plan view of a peeling device according to Embodiment 2 of the present invention.
- FIG. 18 is an explanatory view showing a peeling method performed using the peeling apparatus according to Embodiment 3 of the present invention in the order of steps.
- FIG. 19 is an explanatory view showing a peeling method performed by using the peeling apparatus according to Embodiment 3 of the present invention in the order of steps.
- FIG. 20 is an explanatory diagram showing, in order, a peeling method performed using the peeling apparatus according to Embodiment 3 of the present invention.
- FIG. 21 is a cross-sectional view showing a state of the surface protective tape and the peeling tape after heating in a peeling method performed using the peeling device according to the third embodiment of the present invention.
- FIG. 22 is a cross-sectional view showing a state in which a peeling tape and a surface protection tape are peeled off by a wafer surface force in a peeling method performed using the peeling apparatus according to Embodiment 3 of the present invention.
- Heating Z cooling unit Heating means Z cooling means
- UV irradiation unit UV irradiation means
- FIG. 1 is a side view of the peeling device according to Embodiment 1 of the present invention
- FIG. 2 is a plan view of the peeling device
- FIG. 3 is a side view of a suction table portion of the peeling device
- FIG. FIG. 5 is a plan view
- FIG. 5 is a cross-sectional view of a wafer having a surface protective tape (adhesive tape) adhered to its surface
- FIG. 6 is a cross-sectional view of the surface protective tape (adhesive tape).
- the peeling device 1 removes the surface protection tape 2a, which is affixed to the surface of the wafer W and singulated as shown in FIG. It is a device for peeling.
- a surface protection tape 2 is adhered, and in this state, the back surface of the wafer W is polished.
- the wafer W is diced (singulated) together with the surface protection tape 2 for each circuit.
- 2a denotes a singulated surface protection tape
- W1 denotes a singulated wafer.
- the surface protection tape 2 has a configuration in which a pressure-sensitive adhesive layer 2B is applied to the surface of a heat-shrinkable base material 2A made of sufficiently stretched polyethylene, and is made of an acrylic resin.
- a pressure-sensitive adhesive layer 2B made of a pressure-sensitive adhesive adheres to the surface of the wafer W, the surface protection tape 2 is adhered to the surface of the wafer W.
- a release tape unit 20 which is a release tape supply means for feeding the release tape 3 to the wafer W set on the suction table 10;
- Heating means for heating together with the surface protection tape 2 (2a) the peeling tape 3 affixed to the entire surface of the surface protection tape 2 (2a) by the affixing Z release roller unit 30, and the peeling heated by the heating means A heating Z cooling unit 40 that integrates the tape 3 and cooling means for cooling the surface protection tape 2 (2a);
- a tape winding unit 50 which is a collecting means for collecting the surface protection tape 2 (2a) and the release tape 3 which have been peeled off by the aforesaid Z release roller unit 30 and the wafer W surface force;
- the cylindrical suction table 10 is fixed to the ring frame 11 via the dicing tape 4 on the side opposite to the surface to which the surface protection tape 2 is attached, and is separated into individual pieces together with the surface protection tape 2.
- the wafer W is positioned and placed on the wafer W, and the ring frame 11 and the wafers W are held by suctioning the lower surface.
- the release tape 3 is attached to the entire surface of the surface protection tape 2 attached to the surface of the wafer W by the attachment Z release roller unit 30. At this time, the release tape is used.
- the height of the ring frame 11 is set one step lower than the surface of the wafer W so that 3 does not adhere to the ring frame 11.
- a mouth-shaped peeling tape raw material 21 formed by winding a peeling tape 3 is rotatably supported, and a shaft of the peeling tape raw material 21 is provided. Is connected to a pulley 22.
- a torque motor Ml is disposed in the vicinity of the raw material tape 21 and an endless belt 24 is wound between the pulley 23 connected to the output shaft end of the torque motor Ml and the pulley 22. Is equipped.
- the release tape 3 a heat-sensitive adhesive tape in which a heat-sensitive adhesive layer is provided on a heat-resistant film such as polyethylene terephthalate is used, and the heat-sensitive adhesive layer is covered with a release paper 3a. ing.
- Another motor M2 is disposed below the torque motor Ml, and the output shaft of the motor M2 has a peeling tape 3a for winding the release paper 3a separated from the peeling tape 3. Paper winding shaft 25 is attached.
- the release tape unit 20 includes upper and lower roller pairs 26a, 26b for holding the release tape 3 fed from the release tape raw material 21 and separating the release paper 3a from the release tape 3; Guide rollers 27a-27d are provided to guide the release paper 3a separated from the release tape 3.
- one guide roller 27c constitutes a buffer roller which can move up and down along a guide groove 28 formed in the vertical direction, and this buffer roller 27c is always downwardly moved by a biasing means (not shown). It is urged to pull the release paper 3a to prevent it from loosening.
- Adhesion Z peeling roller unit Adhesion Z peeling roller unit:
- the Z-peeling roller unit 30 has two rollers 31 and 32 rotatably supported one above the other, which are arranged in parallel on a main body of the apparatus.
- the slide rail 33 is movably supported via a slide track 34.
- the attached Z-peeling roller unit 30 is reciprocated on the slide rail 33 in the direction indicated by an arrow by a moving uniaxial robot 35 (see FIG. 2) installed on the apparatus main body in parallel with the slide rail 33. .
- the affixing Z peeling roller unit 30 is supported so as to be able to move up and down along two guide shafts 36 arranged in the vertical direction.
- the cylinder 37 is moved up and down along the guide shaft 36.
- the release tape 3 from which the release paper 3a is separated is wound around the rollers 31 and 32 of the affixing Z release roller unit 30.
- Heating Z cooling unit
- the heating Z cooling unit 40 includes a heater main body 41 and cooling means (not shown) such as a cooling fan as heating means, and a pair of right and left slide rails 42 orthogonal to the slide rails 33. It is movably supported via a slide track 43 in a direction perpendicular to the plane of FIG. A slide cylinder 44 for reciprocating the heating Z cooling unit 40 along the slide rail 42 is provided in parallel with the slide rail 42 (see FIG. 2).
- the heater main body 41 is supported so as to be vertically movable along a plurality of guide shafts 45, and the heater main body 41 is vertically moved by a vertical cylinder 46. (See Figure 1).
- the tape winding unit 50 is disposed above the peeling tape unit 20.
- the tape winding unit 50 includes a feed roller 51 driven to rotate by a motor M3 and a feed roller 51.
- a pinch roller 52 that rotates in contact therewith, guide rollers 53 and 54 disposed on both sides of the pinch roller 52, and a release tape winding shaft 55 for winding the release tape 3 together with the surface protection tape 2 (2a) adhered thereto.
- a torque motor M4 is disposed in the vicinity of the winding shaft 55, and a pulley 56 connected to an output shaft end of the torque motor M4 and a pulley 57 connected to the peeling tape winding shaft 55 are disposed.
- An endless belt 58 is wound between them.
- the peeling tape 3 fed to the tape winding unit 50 via the roller 31 of the affixing Z peeling roller unit 30 and the surface protection tape 2 (2a) adhered thereto are formed by the guide roller. After passing through 53, it is pinched by a feed roller 51 and a pinch roller 52, further reaches a peeling tape winding shaft 55 through a guide roller 54, and is wound and collected by the peeling tape winding shaft 55.
- FIGS. 7 to 16 are explanatory views showing the peeling method in the order of the steps
- FIG. 15 is a cross-sectional view showing the state of the peeling tape adhered to the surface protective tape on the wafer surface
- FIG. 16 is a surface protective sheet after heating.
- FIG. 3 is a cross-sectional view showing a state of a tape and a release tape.
- the peeling method according to the present embodiment is a method of peeling the surface protective tape 2a attached to the surface of the wafer W and singulated into chip sizes similarly to the singulated wafer W1. Then, it is performed through the following peeling tape attaching step, heating Z cooling step, and tape peeling step.
- the wafer W having the surface protection tape 2 adhered to the surface is positioned so that the surface protection tape 2 side faces upward. It is suction-set together with the ring frame 11 via the dicing tape 4, and the surface protection tape 2 is diced into chips together with the wafer W by dicing.
- the attached Z-peeling roller unit 30 is waiting at the position shown in FIGS. 1 and 2, and the two rollers 31, 32 of the attached Z-peeling roller unit 30 are in the positions shown in FIG. Then, the peeling tape 3 stretched over them is made to stand by the side of the wafer W.
- the moving single-axis robot 35 is driven to move the sticking Z peeling roller unit 30 to the left in FIGS. 1 and 2 along the slide rail 33.
- the rollers 31, 32 of the unit 30 also move in the direction of the arrow to the position indicated by the dashed line in FIG.
- the motor M3 is in the locked state, and the rollers 31 and 32 move to move the peeling tape 3 from which the release paper 3a is separated from the raw material of the peeling tape 21 while pulling out the peeling tape 3.
- the peeling tape 3 stretched between the roller 32 and the roller pair 26a, 26b is positioned obliquely.
- the vertical cylinder 37 is driven to move the Z peeling roller unit 30 down along the guide shaft 36, and as shown in FIG. Adhere to one end.
- the peeling tape 3 is stuck to one end of the surface protection tape 2 (2a) stuck to the surface of the wafer W, and in this state, the moving uniaxial robot 35 is driven to stuck the Z peeling roller unit 30. Move it along the slide rail 33 to the right in Figs.
- rollers 31 and 32 of the affixing Z-peeling roller unit 30 also move in the direction of the arrow to the position indicated by the dashed line in FIG. 10, and the roller 32 applies the peeling tape 3 to a wedge and the surface protection tape 2 for W surface. (2a) is moved while being pressed, so that the release tape 3 is adhered to the entire surface of the surface protection tape 2 (see FIG. 15).
- the moving single-axis robot 35 is driven again, and the attaching Z peeling roller unit 30 is moved along the slide rail 33 as shown in FIG.
- the vertical cylinder 37 is driven to move the bonding Z-peeling roller unit 30 up along the guide shaft 36, and the roller 32 is also separated from the wafer W surface force.
- the rollers 31, 32 of the sticking Z-peeling roller unit 30 also move in the direction of the arrow to the position indicated by the dashed line in FIG.
- the slide cylinder 44 is driven to move the heating Z cooling unit 40 along the slide rail 42 downward in FIG. 2, and the heating Z cooling unit 40 is positioned above the wafer W.
- the vertical cylinder 46 of the heating Z cooling unit 40 is driven, and the heater main body 41 of the heating Z cooling unit 40 is moved down along the guide shaft 45, as shown in FIG.
- the heater body 41 is brought into contact with the peeling tape 3 adhered to the surface protection tape 2 (2a) on the surface of the Ueno W.
- the heater of the heater body 41 is energized to heat the release tape 3 and the surface protection tape 2 (2a) to a predetermined temperature.
- the heating temperature and heating time are determined by the force of the material of the surface protection tape 2, generally 40 to 200 ° C (preferably 70 to 130 ° C), and 0.5 to 120 seconds (preferably). Is about 110 seconds).
- the surface protective tape 2 is formed by applying the adhesive layer 2B to the surface of the heat-shrinkable base material 2A, when this is heated, The heat-shrinkable base material 2A shrinks, and the individualized surface protection tapes 2a are curved as shown in FIG. Therefore, the contact area of the individualized surface protection tapes 2a with respect to the surface of the wafer W (W1) is reduced, and the surface protection tapes 2a are more likely to peel off the surface of the wafer W (W1).
- the vertical cylinder 46 is driven to move the heater body 41 of the heating Z cooling unit 40 upward along the guide shaft 45, and the heater body 41 is separated from the wafer W as shown in FIG.
- a cooling means such as a cooling fan (not shown).
- the slide cylinder 44 is driven to move the heated Z cooling unit 40 upward along the slide rail 42 in FIG.
- the upward force of the wafer W is also retracted.
- the moving uniaxial robot 35 is driven to move the sticking Z peeling roller unit 30 to the right in FIGS. 1 and 2 along the slide rail 33, and the sticking Z peeling roller unit 30
- the rollers 31, 32 move in the direction of the arrow from the chain line position to the solid line position in FIG. 14.
- the motor M3 and the torque motor M4 are simultaneously driven.
- the torque motor M In 4 since a predetermined tension is applied to the peeling tape 3, the rotation is transmitted to the tape winding shaft 55 via the pulley 56, the belt 58 and the pulley 57, and the tape winding is performed. Since the shaft 55 is rotationally driven, the peeling tape 3 is peeled off together with the surface protection tape 2 (2a) adhered to the wafer W.
- the individualized surface protection tapes 2a are curved and are easily peeled off from the surface of the wafer W. 2a adheres to the release tape 3 and is easily peeled off on the surface of the wafer W.
- the peeling tape 3 from which the surface force of the wafer W has been peeled off is wound around the tape winding shaft 55 of the tape winding unit 50 and collected together with the surface protection tape 2a adhered thereto.
- the peeling tape 3 attached to the entire surface of the surface protection tape 2 is heated together with the surface protection tape 2 (2a)
- the individualized surface protection tape 2a Since the surface protection tape 2a shrinks while adhering to the release tape 3, the force that can easily release the individualized surface protection tape 2a and the surface force of the wafer W can be easily obtained.
- the peeling device 1 including the Z peeling roller unit 30, the heating Z cooling unit 40, and the tape winding unit 50 the peeling operation of the surface protection tape 2 (2a) can be performed efficiently. .
- the individualized surface protection tape 2 a is continuously adhered to the continuous release tape 3 and the wafer W The surface force can be efficiently peeled off and recovered.
- the peeling tape attaching means and the tape peeling means are constituted by the common attaching Z peeling roller unit 30, the structure of the peeling device 1 can be simplified and the cost can be reduced.
- the heated release tape 3 and surface protection tape 2 (2a) are cooled, so that the operation time can be shortened and higher efficiency can be achieved.
- the peeling apparatus 1 In the peeling apparatus 1 according to the present embodiment, all the operations are performed automatically so that a part of the operation (for example, setting of the wafer W on the suction table 10) is performed manually. With such a configuration, it is possible to realize a fully automatic peeling apparatus.
- FIG. 17 is a plan view of the peeling device according to the present embodiment.
- the peeling device 1 includes a frame chuck unit for automatically taking in and out wafers (weno integrated with the ring frame 11) W into and from the frame cassette 71. 70 and a UV irradiation unit 80 for irradiating ultraviolet rays (UV) to the surface protection tape 2 (2a) in which the pressure-sensitive adhesive layer 2B shown in FIG. 6 is made of a UV-curable pressure-sensitive adhesive.
- the other configuration is the same as that of the peeling apparatus 1 according to the first embodiment.
- the suction table 10, the peeling tape unit 20, the sticking Z peeling roller unit 30, the heating Z cooling unit 40 and the tape winding are provided. Equipped with a take unit 50! / Puru.
- the frame chuck unit 70 takes out one of the plurality of wafers W stored in the frame cassette 71 at appropriate intervals in the vertical direction, and takes out one of the wafers W.
- the tape 2 (2a) is peeled off, and the wafer W from which the surface protection tape 2 (2a) has been peeled is stored in the frame cassette 71, and is moved up and down along the slide rail 72 which is vertically set up.
- a moving table 73 is provided.
- a pair of guide rails 74 are installed on the table 73 and extend in parallel with each other with a force toward the opening of the frame cassette 71.
- a pair of slide rails 75 are provided between the guide rails 74. Are installed in parallel!
- the slide rail 75 is provided with a slider 76 which can reciprocate on the slide rail 75 by a driving means (not shown).
- the slider 76 has a wafer W (actually, Is mounted with a frame chuck 77 for chucking the ring frame 11).
- the UV irradiation unit 80 is for irradiating the surface protection tape 2 (2a) adhered to the surface of the wafer W with ultraviolet light (UV).
- UV ultraviolet light
- the transport unit 90 includes a pair of parallel slide rails 92 arranged in a direction perpendicular to the slide rails 75, and the slide rails 92 A slider 93 is slidably provided.
- the slider 93 has a pair of parallel slide rails 94 orthogonal to the slide rail 92 slidably supported along the slider 93 in a vertical direction (a direction perpendicular to the plane of FIG. 17).
- the base end of an L-shaped support arm 95 that supports the suction arm 91 at the tip is slidably supported via a slider 96.
- the support arm 95 is provided with a mechanism (not shown) that can turn the suction arm 91 upside down.
- the table 73 of the frame chuck unit 70 is moved along the slide rail 72.
- the movement of the table 73 is stopped, and the frame chuck 77 slides on the slide rail 75 against the frame cassette 71 so that the frame cassette 71 moves.
- the desired wafer W (actually, the ring frame 11) is chucked and taken out, and the wafer W integrated with the ring blem 11 is moved along the guide rail 74, and this is shown by the solid line in FIG. It is transported to the specified position indicated by.
- the transfer unit 90 is driven, and the suction arm 91 attached to the tip of the support arm 95 moves to the frame chuck unit 70 side along the slide rail 92, and 17 moves above the wafer W waiting at the solid line position in FIG. 17, and is moved down along the slider 93 to suck the ring frame 11 and support the wafer W therewith.
- the suction arm 91 moves up again and moves along the slide rail 92, and passes the wafer W above the UV irradiation unit 80, thereby adhering to the surface of the wafer W and applying the surface protection tape 2.
- (2a) is irradiated with ultraviolet rays (UV).
- the UV-curable pressure-sensitive adhesive of the surface protection tape 2 (2a) is cured, and the adhesive force of the surface protection tape 2 (2a) to the surface of the wafer W is weakened. At this time, the wafer W is supported with the surface side on which the surface protection tape 2 (2a) is stuck down.
- the suction arm 91 moves along the slide rail 92 of the transfer unit 90, and turns over the front and back of the wafer W.
- the wafer W is placed on the suction table 10 in the same manner as in the peeling apparatus 1 according to the first embodiment. Set it with the front side to which the protective tape 2 is attached facing up. Then, thereafter, as in the first embodiment, the surface protection tape 2 (2a) attached to the surface of the wafer W is peeled off from the wafer W and removed.
- the wafer W from which the singulated surface protection tape 2a has been peeled off and removed is sucked by the suction arm 91 and is positioned at a predetermined position on the guide rail 74 of the frame chuck unit 70 (see FIG. 17). (The position shown by the solid line), is transported along the guide rail 74 by the slider 76 in the direction of the frame cassette 71 while being chucked by the frame chuck 77, and stored in a predetermined location of the frame cassette 71. You.
- the surface protection tape 2 (2a) can be peeled off from the plurality of wafers W in a fully automatic manner, thereby saving labor and improving work efficiency. It comes out.
- the surface protection tape 2 (2a) is irradiated with ultraviolet rays by the UV irradiation unit 80.
- the UV-curable pressure-sensitive adhesive of the surface protection tape 2 (2a) is cured, the adhesive strength of the surface protection tape 2 (2a) is weakened, and the individualized surface protection tape 2a is replaced with the wafer W. Surface force It becomes more easily peeled off, and these are easily peeled off together with the release tape and recovered.
- FIGS. FIG. 18 to FIG. 20 are explanatory views showing, in the order of steps, a peeling method performed by using the peeling apparatus according to Embodiment 3 of the present invention
- FIG. 21 is a state of the surface protection tape and the peeling tape after heating.
- FIG. 22 is a cross-sectional view showing a state in which the peeling tape and the surface protection tape are peeled off from the wafer surface.
- the peeling method according to the present embodiment is similar to that of the first and second embodiments, except that the surface protection tape 2a affixed to the surface of the wafer W and singulated into chip sizes is used. Force, which is a method of peeling, is used as the peeling tape 3 according to the surface shape of the wafer W. The difference from the first and second embodiments is that a recut circular tape is used.
- the sheet-shaped release paper 3a wound around the raw release tape 61 is precut according to the surface shape of the wafer W.
- a plurality of circular release tapes 3 are temporarily attached at appropriate intervals, and the release paper 3a unwound from the raw release tape 61 is guided by rollers 62-65 and wound on a winding shaft 66.
- the surface protection tape 2 has a configuration in which an adhesive layer is applied to the surface of a heat-shrinkable base material as in the first embodiment, and the release tape 3 is made of a heat-resistant material such as polyethylene terephthalate.
- a heat-sensitive adhesive tape formed by providing a heat-sensitive adhesive layer on a film is used.
- the release paper 3a is stretched substantially horizontally above the wafer W by two rollers 63 and 64, and is temporarily attached to the lower surface of the release paper 3a.
- the peeled circular tape 3 is positioned above the wafer W.
- the heater main body 41 of the heating Z cooling unit 40 is moved downward, and as shown in FIG. 19, the heater main body 41 presses the peeling tape 3 against the eno and the surface protection tape 2 on the W surface.
- the release tape 3 and the surface protection tape 2 are heated to a predetermined temperature.
- the release tape 3 pre-cut in a circular shape is attached to the entire surface of the surface protection tape 2 on the surface of the wafer W.
- the surface protection tape 2 is formed by applying a pressure-sensitive adhesive layer to the surface of the heat-shrinkable base material, the heat-shrinkable base material shrinks when heated, and as shown in FIG. As shown, the individualized surface protection tapes 2a are curved. For this reason, the contact area of the individual surface protection tapes 2a singulated on the wafer W surface is reduced, and each surface protection tape 2a is easily peeled off from the wafer W surface.
- the release tape 3 separates from the release paper 3a and remains on the surface of the wafer W, and only the release paper 3a is opened.
- the rollers are guided by rollers 64 and 65 and wound on a winding shaft 66.
- one end of an adhesive tape 67 is adhered to one end of a peeling tape 3 adhered to the entire surface of the surface protection tape on the surface of the wafer W. As shown in the figure, it is folded back into a horizontal U-shape, and the other end is pinched by the stripping head 68 and moved in the direction of the arrow shown in the figure. These are pulled by 8 and these are sequentially separated and recovered from the wafer W surface force.
- the individualized surface protection tapes 2a are curved and the surface force of the wafer W is easily peeled off, and thus these surface protection tapes 2a are attached to the release tape 3. And easily peel off from the surface of the wafer.
- the individualized surface protection tape 2a can also be easily and efficiently peeled with a surface force of wafer W, similar to the first embodiment. The effect is obtained.
- the present invention is applicable to a method and an apparatus for peeling an adhesive tape such as a surface protection tape, which is singulated into chip sizes and affixed to the surface of a plate member, from the plate member. It can also be used in the fields of manufacturing optical devices and electronic components such as lenses, diodes, and wavelength conversion elements other than in the field of semiconductor manufacturing.
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/575,682 US20070074822A1 (en) | 2003-10-17 | 2004-10-07 | Apparatus for peeling adhesive tape |
EP04792118A EP1679276A1 (de) | 2003-10-17 | 2004-10-07 | Klebebandabziehvorrichtung |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003-357168 | 2003-10-17 | ||
JP2003357168A JP2006316078A (ja) | 2003-10-17 | 2003-10-17 | 接着テープの剥離方法及び剥離装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005037698A1 true WO2005037698A1 (ja) | 2005-04-28 |
Family
ID=34463238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/014820 WO2005037698A1 (ja) | 2003-10-17 | 2004-10-07 | 接着テープの剥離装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20070074822A1 (ja) |
EP (1) | EP1679276A1 (ja) |
JP (1) | JP2006316078A (ja) |
CN (1) | CN1867506A (ja) |
TW (1) | TW200518934A (ja) |
WO (1) | WO2005037698A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1777734A2 (en) * | 2005-10-14 | 2007-04-25 | Tokyo Seimitsu Co.,Ltd. | Method and apparatus for peeling a surface protective film |
EP1859917A2 (en) * | 2006-05-22 | 2007-11-28 | Tokyo Seimitsu Co.,Ltd. | Tape adhering method and tape adhering device |
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JP4262232B2 (ja) * | 2005-10-17 | 2009-05-13 | リンテック株式会社 | 測定装置 |
DE102008000461B3 (de) * | 2008-02-29 | 2009-07-30 | Foliotec Gmbh | Verfahren und Vorrichtung zum Abziehen einer Folie von einem plattenartigen Trägern oder einer Folie |
JP5075084B2 (ja) * | 2008-10-16 | 2012-11-14 | 日東電工株式会社 | 保護テープ貼付け方法および保護テープ貼付け装置 |
US8764026B2 (en) * | 2009-04-16 | 2014-07-01 | Suss Microtec Lithography, Gmbh | Device for centering wafers |
JP5547954B2 (ja) * | 2009-12-14 | 2014-07-16 | 日東電工株式会社 | 粘着テープ剥離方法およびその装置 |
JP2011204806A (ja) * | 2010-03-24 | 2011-10-13 | Nitto Denko Corp | ウエハの加工方法 |
US8574398B2 (en) | 2010-05-27 | 2013-11-05 | Suss Microtec Lithography, Gmbh | Apparatus and method for detaping an adhesive layer from the surface of ultra thin wafers |
JP5702983B2 (ja) * | 2010-10-12 | 2015-04-15 | 日東電工株式会社 | 両面粘着テープ貼付け方法および両面粘着テープ貼付け装置 |
US8921130B2 (en) * | 2012-03-14 | 2014-12-30 | Osram Sylvania Inc. | Methods for producing and placing wavelength converting structures |
JP5591859B2 (ja) * | 2012-03-23 | 2014-09-17 | 株式会社東芝 | 基板の分離方法及び分離装置 |
EP2877547A4 (en) * | 2012-07-26 | 2016-01-27 | 3M Innovative Properties Co | HEAT-SOAKING ADHESIVE ARTICLES |
KR102058512B1 (ko) * | 2012-07-26 | 2019-12-23 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 열 접합해제성 광학 물품 |
DE102012020095B4 (de) * | 2012-10-12 | 2016-05-19 | Cotesa Gmbh | Trenneinrichtung |
JP6085179B2 (ja) * | 2013-01-25 | 2017-02-22 | リンテック株式会社 | 分離装置及び分離方法 |
JP5958447B2 (ja) | 2013-11-06 | 2016-08-02 | カシオ計算機株式会社 | 印面形成装置、印面形成方法および印面形成システム |
CN106469767B (zh) * | 2015-08-18 | 2017-12-01 | 江苏诚睿达光电有限公司 | 一种基于串联滚压的有机硅树脂光转换体贴合封装led的装备系统 |
JP6670683B2 (ja) * | 2016-06-07 | 2020-03-25 | 株式会社Screenラミナテック | キャリア基板と樹脂層からなるワークの分離方法および分離装置 |
EP3546952B1 (en) * | 2018-03-26 | 2024-03-06 | Roche Diagnostics GmbH | Method for unsealing an opening of a laboratory sample container, method for handling a laboratory sample container, laboratory apparatus and laboratory automation system |
TWI708536B (zh) * | 2019-11-25 | 2020-10-21 | 欣興電子股份有限公司 | 移除局部蓋體的裝置及移除局部蓋體的方法 |
US11889742B2 (en) * | 2020-11-04 | 2024-01-30 | Samsung Display Co., Ltd. | Apparatus of manufacturing display device and method of manufacturing display device |
CN112590358A (zh) * | 2020-12-24 | 2021-04-02 | 查芳振 | 一种通过填充夹持的pvc广告字无残留分离装置 |
CN113099716B (zh) * | 2021-04-16 | 2022-06-07 | 东莞市沃德精密机械有限公司 | 一种柔性件的贴装方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05116837A (ja) * | 1991-10-22 | 1993-05-14 | Takatori Corp | ウエハー表面保護テープ剥し装置 |
JPH11163105A (ja) * | 1997-11-28 | 1999-06-18 | Lintec Corp | シート剥離装置および方法 |
JP2003209073A (ja) * | 2002-01-17 | 2003-07-25 | Lintec Corp | 半導体ウエハの加工方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5106450A (en) * | 1990-12-20 | 1992-04-21 | International Business Machines Corporation | Dry film resist transport and lamination system for semiconductor wafers |
US5466325A (en) * | 1993-06-02 | 1995-11-14 | Nitto Denko Corporation | Resist removing method, and curable pressure-sensitive adhesive, adhesive sheets and apparatus used for the method |
US5810962A (en) * | 1996-09-30 | 1998-09-22 | Magnatech Computer Services, Inc. | Apparatus and process for removing computer diskette labels |
JP3993918B2 (ja) * | 1997-08-25 | 2007-10-17 | 富士通株式会社 | 半導体装置の製造方法 |
US6554044B2 (en) * | 2000-01-28 | 2003-04-29 | Fargo Electronics Inc. | Laminator peel-off bar |
-
2003
- 2003-10-17 JP JP2003357168A patent/JP2006316078A/ja active Pending
-
2004
- 2004-10-07 CN CN200480030449.7A patent/CN1867506A/zh active Pending
- 2004-10-07 WO PCT/JP2004/014820 patent/WO2005037698A1/ja not_active Application Discontinuation
- 2004-10-07 EP EP04792118A patent/EP1679276A1/de not_active Withdrawn
- 2004-10-07 US US10/575,682 patent/US20070074822A1/en not_active Abandoned
- 2004-10-15 TW TW093131460A patent/TW200518934A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05116837A (ja) * | 1991-10-22 | 1993-05-14 | Takatori Corp | ウエハー表面保護テープ剥し装置 |
JPH11163105A (ja) * | 1997-11-28 | 1999-06-18 | Lintec Corp | シート剥離装置および方法 |
JP2003209073A (ja) * | 2002-01-17 | 2003-07-25 | Lintec Corp | 半導体ウエハの加工方法 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1777734A2 (en) * | 2005-10-14 | 2007-04-25 | Tokyo Seimitsu Co.,Ltd. | Method and apparatus for peeling a surface protective film |
EP1777734A3 (en) * | 2005-10-14 | 2007-12-12 | Tokyo Seimitsu Co.,Ltd. | Method and apparatus for peeling a surface protective film |
US7521384B2 (en) | 2005-10-14 | 2009-04-21 | Tokyo Seimitsu Co., Ltd. | Method and apparatus for peeling surface protective film |
EP1859917A2 (en) * | 2006-05-22 | 2007-11-28 | Tokyo Seimitsu Co.,Ltd. | Tape adhering method and tape adhering device |
EP1859917A3 (en) * | 2006-05-22 | 2008-05-28 | Tokyo Seimitsu Co.,Ltd. | Tape adhering method and tape adhering device |
KR100881450B1 (ko) | 2006-05-22 | 2009-02-06 | 도쿄 세이미츄 코퍼레이션 리미티드 | 테이프 부착 방법 및 테이프 부착 장치 |
US8440040B2 (en) | 2006-05-22 | 2013-05-14 | Tokyo Seimitsu Co., Ltd. | Tape adhering method and tape adhering device |
Also Published As
Publication number | Publication date |
---|---|
JP2006316078A (ja) | 2006-11-24 |
CN1867506A (zh) | 2006-11-22 |
US20070074822A1 (en) | 2007-04-05 |
TW200518934A (en) | 2005-06-16 |
EP1679276A1 (de) | 2006-07-12 |
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