WO1997013266A3 - Procedes et electrodes de decharge pour la generation de plasmas sous pression d'une atmosphere et materiaux traites selon ces procedes - Google Patents

Procedes et electrodes de decharge pour la generation de plasmas sous pression d'une atmosphere et materiaux traites selon ces procedes Download PDF

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Publication number
WO1997013266A3
WO1997013266A3 PCT/US1996/020919 US9620919W WO9713266A3 WO 1997013266 A3 WO1997013266 A3 WO 1997013266A3 US 9620919 W US9620919 W US 9620919W WO 9713266 A3 WO9713266 A3 WO 9713266A3
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
methods
discharge
electrodes
generate
Prior art date
Application number
PCT/US1996/020919
Other languages
English (en)
Other versions
WO1997013266A2 (fr
Inventor
Paul D Spence
Original Assignee
Univ Tennessee Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Tennessee Res Corp filed Critical Univ Tennessee Res Corp
Priority to EP96945691A priority Critical patent/EP0801809A2/fr
Priority to AU14274/97A priority patent/AU715719B2/en
Publication of WO1997013266A2 publication Critical patent/WO1997013266A2/fr
Publication of WO1997013266A3 publication Critical patent/WO1997013266A3/fr

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018Glow discharge
    • H01J37/32027DC powered
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816Pressure
    • H01J37/32825Working under atmospheric pressure or higher
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S422/00Chemical apparatus and process disinfecting, deodorizing, preserving, or sterilizing
    • Y10S422/906Plasma or ion generation means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

La présente invention concerne deux procédés et les types correspondants d'électrodes pour la génération d'un plasma sous environ ou exactement une atmosphère. Ces procédés permettent de traiter correctement en un temps réduit différents produits bandes, films et objets tridimensionnels. Le premier procédé utilise une impulsion répétitive à tension asymétrique pour générer une décharge de plasma entre deux électrodes. L'impulsion de tension asymétrique permet de générer une décharge dans laquelle un substrat peut être exposé essentiellement à un plasma de nature soit positive, soit négative, suivant la polarité de tension utilisée. Un second procédé met en oeuvre la capacité d'entrefer d'une paire d'électrodes et un inducteur externe dans un circuit shunt pour constituer un circuit LC résonant. Ce circuit est piloté par une source de radiofréquences haute puissance fonctionnant entre 1 et 30 MHz générant ainsi une décharge uniforme entre la paire d'électrodes. Avec les deux procédés, on utilise des surfaces de décharge à température stabilisée ainsi qu'une alimentation en gaz à régulation de température, d'humidité et de débit. Le débitdu gaz est normalement suffisant pour créer une zone d'écoulement présentant une turbulence au niveau de la région de décharge où les matériaux sont traités. Les paires d'électrodes, que mettent en ÷uvre ces procédés, sont constituées d'une électrode à face métallique et d'une électrode recouverte d'un diélectrique. Une électrode ou les deux électrodes présentent une série d'orifices traversant la face d'électrode de façon à permettre l'alimentation en gaz. Le second procédé décrit ci-dessus peut également fonctionner avec une paire d'électrodes à face métallique, mais dans des conditions de fonctionnement plus restreintes.
PCT/US1996/020919 1995-06-19 1996-06-19 Procedes et electrodes de decharge pour la generation de plasmas sous pression d'une atmosphere et materiaux traites selon ces procedes WO1997013266A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP96945691A EP0801809A2 (fr) 1995-06-19 1996-06-19 Procedes et electrodes de decharge pour la generation de plasmas sous pression d'une atmosphere et materiaux traites selon ces procedes
AU14274/97A AU715719B2 (en) 1995-06-19 1996-06-19 Discharge methods and electrodes for generating plasmas at one atmosphere of pressure, and materials treated therewith

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49219395A 1995-06-19 1995-06-19
US08/492,193 1995-06-19

Publications (2)

Publication Number Publication Date
WO1997013266A2 WO1997013266A2 (fr) 1997-04-10
WO1997013266A3 true WO1997013266A3 (fr) 1997-05-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/020919 WO1997013266A2 (fr) 1995-06-19 1996-06-19 Procedes et electrodes de decharge pour la generation de plasmas sous pression d'une atmosphere et materiaux traites selon ces procedes

Country Status (5)

Country Link
US (3) US5895558A (fr)
EP (1) EP0801809A2 (fr)
AU (1) AU715719B2 (fr)
CA (1) CA2197978A1 (fr)
WO (1) WO1997013266A2 (fr)

Families Citing this family (143)

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US6059935A (en) 2000-05-09
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