SE9403988D0 - Apparat för alstring av en linjär vågurladdning för plasma bearbetning - Google Patents

Apparat för alstring av en linjär vågurladdning för plasma bearbetning

Info

Publication number
SE9403988D0
SE9403988D0 SE9403988A SE9403988A SE9403988D0 SE 9403988 D0 SE9403988 D0 SE 9403988D0 SE 9403988 A SE9403988 A SE 9403988A SE 9403988 A SE9403988 A SE 9403988A SE 9403988 D0 SE9403988 D0 SE 9403988D0
Authority
SE
Sweden
Prior art keywords
pct
electrode
electrode plate
date
plasma processing
Prior art date
Application number
SE9403988A
Other languages
English (en)
Other versions
SE503141C2 (sv
SE9403988L (sv
Inventor
Ladislav Bardos
Hana Barankova
Original Assignee
Ladislav Bardos
Hana Barankova
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ladislav Bardos, Hana Barankova filed Critical Ladislav Bardos
Priority to SE9403988A priority Critical patent/SE9403988L/sv
Publication of SE9403988D0 publication Critical patent/SE9403988D0/sv
Priority to AT95937260T priority patent/ATE182738T1/de
Priority to JP51676196A priority patent/JP3652702B2/ja
Priority to US08/836,708 priority patent/US5908602A/en
Priority to DE69511103T priority patent/DE69511103T2/de
Priority to CA002205576A priority patent/CA2205576C/en
Priority to PCT/SE1995/001248 priority patent/WO1996016531A1/en
Priority to KR1019970703347A priority patent/KR100333800B1/ko
Priority to DK95937260T priority patent/DK0792572T3/da
Priority to ES95937260T priority patent/ES2138755T3/es
Priority to EP95937260A priority patent/EP0792572B1/en
Priority to AU39420/95A priority patent/AU688996B2/en
Publication of SE503141C2 publication Critical patent/SE503141C2/sv
Publication of SE9403988L publication Critical patent/SE9403988L/sv
Priority to NO972280A priority patent/NO309920B1/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Carbon And Carbon Compounds (AREA)
SE9403988A 1994-11-18 1994-11-18 Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning SE9403988L (sv)

Priority Applications (13)

Application Number Priority Date Filing Date Title
SE9403988A SE9403988L (sv) 1994-11-18 1994-11-18 Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning
AU39420/95A AU688996B2 (en) 1994-11-18 1995-10-20 An apparatus for generation of a linear arc discharge for plasma processing
PCT/SE1995/001248 WO1996016531A1 (en) 1994-11-18 1995-10-20 An apparatus for generation of a linear arc discharge for plasma processing
DK95937260T DK0792572T3 (da) 1994-11-18 1995-10-20 Apparat til frembringelse af en lineær bueudladning til plasmabearbejdning
US08/836,708 US5908602A (en) 1994-11-18 1995-10-20 Apparatus for generation of a linear arc discharge for plasma processing
DE69511103T DE69511103T2 (de) 1994-11-18 1995-10-20 Vorrichtung zur erzeugung einer linearen bogenentladung für plasmabehandlung
CA002205576A CA2205576C (en) 1994-11-18 1995-10-20 An apparatus for generation of a linear arc discharge for plasma processing
AT95937260T ATE182738T1 (de) 1994-11-18 1995-10-20 Vorrichtung zur erzeugung einer linearen bogenentladung für plasmabehandlung
KR1019970703347A KR100333800B1 (ko) 1994-11-18 1995-10-20 플라즈마처리를 위한 선형 아크방전 발생장치
JP51676196A JP3652702B2 (ja) 1994-11-18 1995-10-20 プラズマ処理用線形アーク放電発生装置
ES95937260T ES2138755T3 (es) 1994-11-18 1995-10-20 Aparato para producir una descarga en arco lineal, para un tratamiento por plasma.
EP95937260A EP0792572B1 (en) 1994-11-18 1995-10-20 An apparatus for generation of a linear arc discharge for plasma processing
NO972280A NO309920B1 (no) 1994-11-18 1997-05-20 Lineær bueutladning ved plasmaprosessering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9403988A SE9403988L (sv) 1994-11-18 1994-11-18 Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning

Publications (3)

Publication Number Publication Date
SE9403988D0 true SE9403988D0 (sv) 1994-11-18
SE503141C2 SE503141C2 (sv) 1996-04-01
SE9403988L SE9403988L (sv) 1996-04-01

Family

ID=20396028

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9403988A SE9403988L (sv) 1994-11-18 1994-11-18 Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning

Country Status (13)

Country Link
US (1) US5908602A (sv)
EP (1) EP0792572B1 (sv)
JP (1) JP3652702B2 (sv)
KR (1) KR100333800B1 (sv)
AT (1) ATE182738T1 (sv)
AU (1) AU688996B2 (sv)
CA (1) CA2205576C (sv)
DE (1) DE69511103T2 (sv)
DK (1) DK0792572T3 (sv)
ES (1) ES2138755T3 (sv)
NO (1) NO309920B1 (sv)
SE (1) SE9403988L (sv)
WO (1) WO1996016531A1 (sv)

Families Citing this family (34)

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DE19722624C2 (de) * 1997-05-30 2001-08-09 Je Plasmaconsult Gmbh Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets
SE511139C2 (sv) * 1997-11-20 1999-08-09 Hana Barankova Plasmabearbetningsapparat med vridbara magneter
SE516336C2 (sv) * 1999-04-28 2001-12-17 Hana Barankova Apparat för plasmabehandling av ytor
US7091605B2 (en) * 2001-09-21 2006-08-15 Eastman Kodak Company Highly moisture-sensitive electronic device element and method for fabrication
US6444945B1 (en) 2001-03-28 2002-09-03 Cp Films, Inc. Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
US6764658B2 (en) * 2002-01-08 2004-07-20 Wisconsin Alumni Research Foundation Plasma generator
US20030168009A1 (en) * 2002-03-08 2003-09-11 Denes Ferencz S. Plasma processing within low-dimension cavities
CN1754409B (zh) * 2002-08-30 2010-07-28 积水化学工业株式会社 等离子处理装置
US7411352B2 (en) * 2002-09-19 2008-08-12 Applied Process Technologies, Inc. Dual plasma beam sources and method
EP1554412B1 (en) * 2002-09-19 2013-08-14 General Plasma, Inc. Plasma enhanced chemical vapor deposition apparatus
JP3933035B2 (ja) * 2002-11-06 2007-06-20 富士ゼロックス株式会社 カーボンナノチューブの製造装置および製造方法
US7038389B2 (en) * 2003-05-02 2006-05-02 Applied Process Technologies, Inc. Magnetron plasma source
US7867366B1 (en) 2004-04-28 2011-01-11 Alameda Applied Sciences Corp. Coaxial plasma arc vapor deposition apparatus and method
US8038858B1 (en) 2004-04-28 2011-10-18 Alameda Applied Sciences Corp Coaxial plasma arc vapor deposition apparatus and method
DE102004043967B4 (de) * 2004-09-11 2010-01-07 Roth & Rau Ag Anordnung und Verfahren zur Plasmabehandlung eines Substrates
FR2912864B1 (fr) * 2007-02-15 2009-07-31 H E F Soc Par Actions Simplifi Dispositif pour generer un plasma froid dans une enceinte sous vide et utilisation du dispositif pour des traitements thermochimiques
KR101468077B1 (ko) * 2007-07-19 2014-12-05 엘아이지에이디피 주식회사 상압 플라즈마 처리장치
CA2765337C (en) 2008-06-13 2016-05-17 Fablab Inc. A system and method for fabricating macroscopic objects, and nano-assembled objects obtained therewith
EA030379B1 (ru) * 2008-08-04 2018-07-31 Эй-Джи-Си Флет Гласс Норт Эмерике, Инк. Способ нанесения тонкопленочных покрытий с использованием плазменно-химического осаждения из газовой фазы (варианты)
WO2011156876A1 (en) * 2010-06-18 2011-12-22 Mahle Metal Leve S/A Plasma processing device
WO2011156877A1 (en) * 2010-06-18 2011-12-22 Mahle Metal Leve S/A Plasma processing device
US8697198B2 (en) * 2011-03-31 2014-04-15 Veeco Ald Inc. Magnetic field assisted deposition
US9508532B2 (en) 2013-03-13 2016-11-29 Bb Plasma Design Ab Magnetron plasma apparatus
EP3228160B1 (en) 2014-12-05 2021-07-21 AGC Glass Europe SA Hollow cathode plasma source
JP6508746B2 (ja) 2014-12-05 2019-05-08 エージーシー フラット グラス ノース アメリカ，インコーポレイテッドＡｇｃ Ｆｌａｔ Ｇｌａｓｓ Ｎｏｒｔｈ Ａｍｅｒｉｃａ，Ｉｎｃ． マクロ粒子低減コーティングを利用したプラズマ源ならびにマクロ粒子低減コーティングを用いたプラズマ源を薄膜コーティングおよび表面改質に使用する方法
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
RU168090U1 (ru) * 2016-06-06 2017-01-18 Акционерное общество "Научно-исследовательский институт оптико-электронного приборостроения" АО "НИИ ОЭП" Плазменный источник светового излучения
RU168022U1 (ru) * 2016-06-15 2017-01-17 Акционерное общество "Научно-исследовательский институт оптико-электронного приборостроения" АО "НИИ ОЭП" Плазменный источник светового излучения
KR102332691B1 (ko) * 2017-08-07 2021-12-01 가스가 덴끼 가부시끼가이샤 표면개질장치
KR102216854B1 (ko) * 2019-09-30 2021-02-17 포항공과대학교 산학협력단 마이크로파 플라즈마를 이용한 아크 방전장치 및 아크 방전방법
FR3115180B1 (fr) * 2020-10-14 2022-11-04 Peter Choi Appareil de génération de plasma

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US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
US4521286A (en) * 1983-03-09 1985-06-04 Unisearch Limited Hollow cathode sputter etcher
FR2581244B1 (fr) * 1985-04-29 1987-07-10 Centre Nat Rech Scient Source d'ions du type triode a une seule chambre d'ionisation a excitation haute frequence et a confinement magnetique du type multipolaire
CS246982B1 (en) * 1985-06-17 1986-11-13 Ladislav Bardos Method and apparatus for producing chemically active environment for plasma chemical reactions namely for deposition of thin layers
DE3606959A1 (de) * 1986-03-04 1987-09-10 Leybold Heraeus Gmbh & Co Kg Vorrichtung zur plasmabehandlung von substraten in einer durch hochfrequenz angeregten plasmaentladung
DE3774098D1 (de) * 1986-12-29 1991-11-28 Sumitomo Metal Ind Plasmageraet.
NL8701530A (nl) * 1987-06-30 1989-01-16 Stichting Fund Ond Material Werkwijze voor het behandelen van oppervlakken van substraten met behulp van een plasma en reactor voor het uitvoeren van die werkwijze.
DE69032691T2 (de) * 1989-12-07 1999-06-10 Japan Science & Tech Corp Verfahren und Gerät zur Plasmabehandlung unter atmosphärischem Druck
US5133986A (en) * 1990-10-05 1992-07-28 International Business Machines Corporation Plasma enhanced chemical vapor processing system using hollow cathode effect
US5279723A (en) * 1992-07-30 1994-01-18 As Represented By The United States Department Of Energy Filtered cathodic arc source
DE4235953C2 (de) * 1992-10-23 1998-07-02 Fraunhofer Ges Forschung Sputterquelle mit einer linearen Hohlkathode zum reaktiven Beschichten von Substraten
SE501888C2 (sv) * 1993-10-18 1995-06-12 Ladislav Bardos En metod och en apparat för generering av en urladdning i egna ångor från en radiofrekvenselektrod för kontinuerlig självförstoftning av elektroden

Also Published As

Publication number Publication date
EP0792572B1 (en) 1999-07-28
ATE182738T1 (de) 1999-08-15
CA2205576A1 (en) 1996-05-30
AU3942095A (en) 1996-06-17
NO309920B1 (no) 2001-04-17
ES2138755T3 (es) 2000-01-16
JP3652702B2 (ja) 2005-05-25
KR100333800B1 (ko) 2002-11-27
DK0792572T3 (da) 2000-03-13
DE69511103T2 (de) 2000-04-13
US5908602A (en) 1999-06-01
NO972280L (no) 1997-07-10
SE503141C2 (sv) 1996-04-01
JPH10509833A (ja) 1998-09-22
SE9403988L (sv) 1996-04-01
AU688996B2 (en) 1998-03-19
NO972280D0 (no) 1997-05-20
CA2205576C (en) 2005-09-20
DE69511103D1 (de) 1999-09-02
WO1996016531A1 (en) 1996-05-30
EP0792572A1 (en) 1997-09-03

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