ES2138755T3 - Aparato para producir una descarga en arco lineal, para un tratamiento por plasma. - Google Patents
Aparato para producir una descarga en arco lineal, para un tratamiento por plasma.Info
- Publication number
- ES2138755T3 ES2138755T3 ES95937260T ES95937260T ES2138755T3 ES 2138755 T3 ES2138755 T3 ES 2138755T3 ES 95937260 T ES95937260 T ES 95937260T ES 95937260 T ES95937260 T ES 95937260T ES 2138755 T3 ES2138755 T3 ES 2138755T3
- Authority
- ES
- Spain
- Prior art keywords
- pct
- electrode
- electrode plate
- date
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
- H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Carbon And Carbon Compounds (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
SE PRESENTA UN APARATO PARA LA GENERACION DE UNA DESCARGA DE ARCO LINEAL PARA EL PROCESAMIENTO DE PLASMA, PARTICULARMENTE PARA EL PROCESAMIENTO SUPERFICIAL DE SUBSTRATOS SOLIDOS, INSTALADO EN UN REACTOR MANTENIDO A PRESIONES DE GAS POR DEBAJO DE 5 X 10 {SUP,4} PA Y ALIMENTADO POR UN GENERADOR DE CORRIENTE ALTERNA Y/O ENERGIA PULSANTE (10), Y QUE INCLUYE: AL MENOS UN PAR DE UNA PRIMERA ELECTRODOS (1) Y SEGUNDA PLACA DE ELECTRODOS (2) COLOCADAS DE FORMA OPUESTA ENTRE SI A UNA DISTANCIA QUE EXCEDE DE 0.4 MM Y CONECTADAS AL MISMO POLO DEL GENERADOR QUE TIENE UN POLO CONTRARIO CONECTADO A UN ELECTRODO CONTRARIO (3), UN CAMPO MAGNETICO PRODUCIDO POR IMANES (4) PARA EL DESARROLLO DE UNA ZONA CALIENTE LINEAL (5) SOBRE LA PRIMERA PLACA DE ELECTRODOS Y UNA ZONA CALIENTE LINEAL (6) SOBRE LA SEGUNDA PLACA DE ELECTRODOS, QUE TIENE UN COMPONENTE DE AL MENOS 10 {SUP,-3} TESLA A TRAVES DE LA HENDIDURA ENTRE ESTAS PLACAS DE ELECTRODOS, UN MEDIOAMBIENTE IONIZADO (7) QUE CONTIENE UN GAS DE TRABAJO (8) DISPUESTO ENTRE LAS PLACAS DE ELECTRODOS Y QUE TIENE CONTACTO ELECTRICO CON LAS PLACAS DE ELECTRODOS EN DONDE SE GENERA UNA DESCARGA DE ARCO (9) Y CON EL ELECTRODO CONTRARIO.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9403988A SE9403988L (sv) | 1994-11-18 | 1994-11-18 | Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2138755T3 true ES2138755T3 (es) | 2000-01-16 |
Family
ID=20396028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES95937260T Expired - Lifetime ES2138755T3 (es) | 1994-11-18 | 1995-10-20 | Aparato para producir una descarga en arco lineal, para un tratamiento por plasma. |
Country Status (13)
Country | Link |
---|---|
US (1) | US5908602A (es) |
EP (1) | EP0792572B1 (es) |
JP (1) | JP3652702B2 (es) |
KR (1) | KR100333800B1 (es) |
AT (1) | ATE182738T1 (es) |
AU (1) | AU688996B2 (es) |
CA (1) | CA2205576C (es) |
DE (1) | DE69511103T2 (es) |
DK (1) | DK0792572T3 (es) |
ES (1) | ES2138755T3 (es) |
NO (1) | NO309920B1 (es) |
SE (1) | SE9403988L (es) |
WO (1) | WO1996016531A1 (es) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19722624C2 (de) * | 1997-05-30 | 2001-08-09 | Je Plasmaconsult Gmbh | Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets |
SE511139C2 (sv) † | 1997-11-20 | 1999-08-09 | Hana Barankova | Plasmabearbetningsapparat med vridbara magneter |
SE516336C2 (sv) * | 1999-04-28 | 2001-12-17 | Hana Barankova | Apparat för plasmabehandling av ytor |
US7091605B2 (en) * | 2001-09-21 | 2006-08-15 | Eastman Kodak Company | Highly moisture-sensitive electronic device element and method for fabrication |
US6444945B1 (en) | 2001-03-28 | 2002-09-03 | Cp Films, Inc. | Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
US6764658B2 (en) * | 2002-01-08 | 2004-07-20 | Wisconsin Alumni Research Foundation | Plasma generator |
US20030168009A1 (en) * | 2002-03-08 | 2003-09-11 | Denes Ferencz S. | Plasma processing within low-dimension cavities |
WO2004021748A1 (ja) * | 2002-08-30 | 2004-03-11 | Sekisui Chemical Co., Ltd. | プラズマ処理装置 |
WO2004027825A2 (en) * | 2002-09-19 | 2004-04-01 | Applied Process Technologies, Inc. | Beam plasma source |
US7411352B2 (en) * | 2002-09-19 | 2008-08-12 | Applied Process Technologies, Inc. | Dual plasma beam sources and method |
JP3933035B2 (ja) * | 2002-11-06 | 2007-06-20 | 富士ゼロックス株式会社 | カーボンナノチューブの製造装置および製造方法 |
US7038389B2 (en) * | 2003-05-02 | 2006-05-02 | Applied Process Technologies, Inc. | Magnetron plasma source |
US8038858B1 (en) | 2004-04-28 | 2011-10-18 | Alameda Applied Sciences Corp | Coaxial plasma arc vapor deposition apparatus and method |
US7867366B1 (en) | 2004-04-28 | 2011-01-11 | Alameda Applied Sciences Corp. | Coaxial plasma arc vapor deposition apparatus and method |
DE102004043967B4 (de) * | 2004-09-11 | 2010-01-07 | Roth & Rau Ag | Anordnung und Verfahren zur Plasmabehandlung eines Substrates |
FR2912864B1 (fr) * | 2007-02-15 | 2009-07-31 | H E F Soc Par Actions Simplifi | Dispositif pour generer un plasma froid dans une enceinte sous vide et utilisation du dispositif pour des traitements thermochimiques |
KR101468077B1 (ko) * | 2007-07-19 | 2014-12-05 | 엘아이지에이디피 주식회사 | 상압 플라즈마 처리장치 |
CA2765337C (en) | 2008-06-13 | 2016-05-17 | Fablab Inc. | A system and method for fabricating macroscopic objects, and nano-assembled objects obtained therewith |
EA030379B1 (ru) * | 2008-08-04 | 2018-07-31 | Эй-Джи-Си Флет Гласс Норт Эмерике, Инк. | Способ нанесения тонкопленочных покрытий с использованием плазменно-химического осаждения из газовой фазы (варианты) |
WO2011156876A1 (en) * | 2010-06-18 | 2011-12-22 | Mahle Metal Leve S/A | Plasma processing device |
DE112010005668T5 (de) * | 2010-06-18 | 2013-05-02 | Mahle International Gmbh | Plasma-Verarbeitungsvorrichtung |
US8697198B2 (en) * | 2011-03-31 | 2014-04-15 | Veeco Ald Inc. | Magnetic field assisted deposition |
US9508532B2 (en) | 2013-03-13 | 2016-11-29 | Bb Plasma Design Ab | Magnetron plasma apparatus |
BR112017011612A2 (pt) | 2014-12-05 | 2018-01-16 | Agc Glass Europe, S.A | fonte de plasma de cátodo oco |
JP6508746B2 (ja) | 2014-12-05 | 2019-05-08 | エージーシー フラット グラス ノース アメリカ,インコーポレイテッドAgc Flat Glass North America,Inc. | マクロ粒子低減コーティングを利用したプラズマ源ならびにマクロ粒子低減コーティングを用いたプラズマ源を薄膜コーティングおよび表面改質に使用する方法 |
US9721764B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Method of producing plasma by multiple-phase alternating or pulsed electrical current |
US9721765B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
US10242846B2 (en) | 2015-12-18 | 2019-03-26 | Agc Flat Glass North America, Inc. | Hollow cathode ion source |
US10573499B2 (en) | 2015-12-18 | 2020-02-25 | Agc Flat Glass North America, Inc. | Method of extracting and accelerating ions |
RU168090U1 (ru) * | 2016-06-06 | 2017-01-18 | Акционерное общество "Научно-исследовательский институт оптико-электронного приборостроения" АО "НИИ ОЭП" | Плазменный источник светового излучения |
RU168022U1 (ru) * | 2016-06-15 | 2017-01-17 | Акционерное общество "Научно-исследовательский институт оптико-электронного приборостроения" АО "НИИ ОЭП" | Плазменный источник светового излучения |
WO2019030804A1 (ja) * | 2017-08-07 | 2019-02-14 | 春日電機株式会社 | 表面改質装置 |
KR102216854B1 (ko) * | 2019-09-30 | 2021-02-17 | 포항공과대학교 산학협력단 | 마이크로파 플라즈마를 이용한 아크 방전장치 및 아크 방전방법 |
FR3115180B1 (fr) * | 2020-10-14 | 2022-11-04 | Peter Choi | Appareil de génération de plasma |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3562141A (en) * | 1968-02-23 | 1971-02-09 | John R Morley | Vacuum vapor deposition utilizing low voltage electron beam |
US4521286A (en) * | 1983-03-09 | 1985-06-04 | Unisearch Limited | Hollow cathode sputter etcher |
FR2581244B1 (fr) * | 1985-04-29 | 1987-07-10 | Centre Nat Rech Scient | Source d'ions du type triode a une seule chambre d'ionisation a excitation haute frequence et a confinement magnetique du type multipolaire |
CS246982B1 (en) * | 1985-06-17 | 1986-11-13 | Ladislav Bardos | Method and apparatus for producing chemically active environment for plasma chemical reactions namely for deposition of thin layers |
DE3606959A1 (de) * | 1986-03-04 | 1987-09-10 | Leybold Heraeus Gmbh & Co Kg | Vorrichtung zur plasmabehandlung von substraten in einer durch hochfrequenz angeregten plasmaentladung |
DE3774098D1 (de) * | 1986-12-29 | 1991-11-28 | Sumitomo Metal Ind | Plasmageraet. |
NL8701530A (nl) * | 1987-06-30 | 1989-01-16 | Stichting Fund Ond Material | Werkwijze voor het behandelen van oppervlakken van substraten met behulp van een plasma en reactor voor het uitvoeren van die werkwijze. |
US5185132A (en) * | 1989-12-07 | 1993-02-09 | Research Development Corporation Of Japan | Atomspheric plasma reaction method and apparatus therefor |
US5133986A (en) * | 1990-10-05 | 1992-07-28 | International Business Machines Corporation | Plasma enhanced chemical vapor processing system using hollow cathode effect |
US5279723A (en) * | 1992-07-30 | 1994-01-18 | As Represented By The United States Department Of Energy | Filtered cathodic arc source |
DE4235953C2 (de) * | 1992-10-23 | 1998-07-02 | Fraunhofer Ges Forschung | Sputterquelle mit einer linearen Hohlkathode zum reaktiven Beschichten von Substraten |
SE501888C2 (sv) * | 1993-10-18 | 1995-06-12 | Ladislav Bardos | En metod och en apparat för generering av en urladdning i egna ångor från en radiofrekvenselektrod för kontinuerlig självförstoftning av elektroden |
-
1994
- 1994-11-18 SE SE9403988A patent/SE9403988L/ not_active IP Right Cessation
-
1995
- 1995-10-20 AT AT95937260T patent/ATE182738T1/de not_active IP Right Cessation
- 1995-10-20 ES ES95937260T patent/ES2138755T3/es not_active Expired - Lifetime
- 1995-10-20 CA CA002205576A patent/CA2205576C/en not_active Expired - Fee Related
- 1995-10-20 DK DK95937260T patent/DK0792572T3/da active
- 1995-10-20 EP EP95937260A patent/EP0792572B1/en not_active Expired - Lifetime
- 1995-10-20 JP JP51676196A patent/JP3652702B2/ja not_active Expired - Fee Related
- 1995-10-20 US US08/836,708 patent/US5908602A/en not_active Expired - Lifetime
- 1995-10-20 AU AU39420/95A patent/AU688996B2/en not_active Ceased
- 1995-10-20 DE DE69511103T patent/DE69511103T2/de not_active Expired - Lifetime
- 1995-10-20 WO PCT/SE1995/001248 patent/WO1996016531A1/en active IP Right Grant
- 1995-10-20 KR KR1019970703347A patent/KR100333800B1/ko not_active IP Right Cessation
-
1997
- 1997-05-20 NO NO972280A patent/NO309920B1/no not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP3652702B2 (ja) | 2005-05-25 |
NO309920B1 (no) | 2001-04-17 |
US5908602A (en) | 1999-06-01 |
EP0792572B1 (en) | 1999-07-28 |
SE503141C2 (sv) | 1996-04-01 |
DK0792572T3 (da) | 2000-03-13 |
NO972280L (no) | 1997-07-10 |
DE69511103T2 (de) | 2000-04-13 |
NO972280D0 (no) | 1997-05-20 |
WO1996016531A1 (en) | 1996-05-30 |
KR100333800B1 (ko) | 2002-11-27 |
AU3942095A (en) | 1996-06-17 |
SE9403988L (sv) | 1996-04-01 |
DE69511103D1 (de) | 1999-09-02 |
AU688996B2 (en) | 1998-03-19 |
CA2205576A1 (en) | 1996-05-30 |
CA2205576C (en) | 2005-09-20 |
EP0792572A1 (en) | 1997-09-03 |
JPH10509833A (ja) | 1998-09-22 |
SE9403988D0 (sv) | 1994-11-18 |
ATE182738T1 (de) | 1999-08-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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