SE9904295L - Device for Hybrid Plasma Processing - Google Patents

Device for Hybrid Plasma Processing

Info

Publication number
SE9904295L
SE9904295L SE9904295A SE9904295A SE9904295L SE 9904295 L SE9904295 L SE 9904295L SE 9904295 A SE9904295 A SE 9904295A SE 9904295 A SE9904295 A SE 9904295A SE 9904295 L SE9904295 L SE 9904295L
Authority
SE
Sweden
Prior art keywords
plasma
hollow cathode
plasma reactor
microwave
cathode
Prior art date
Application number
SE9904295A
Other languages
English (en)
Other versions
SE9904295D0 (sv
SE521904C2 (sv
Inventor
Ladislav Bardos
Hana Barankova
Original Assignee
Ladislav Bardos
Hana Barankova
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ladislav Bardos, Hana Barankova filed Critical Ladislav Bardos
Priority to SE9904295A priority Critical patent/SE521904C2/sv
Publication of SE9904295D0 publication Critical patent/SE9904295D0/sv
Priority to US10/130,709 priority patent/US6899054B1/en
Priority to JP2001540573A priority patent/JP2003515433A/ja
Priority to AU15671/01A priority patent/AU1567101A/en
Priority to PCT/SE2000/002315 priority patent/WO2001039560A1/en
Priority to EP00978187A priority patent/EP1236381A1/en
Publication of SE9904295L publication Critical patent/SE9904295L/sv
Publication of SE521904C2 publication Critical patent/SE521904C2/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SE9904295A 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling SE521904C2 (sv)

Priority Applications (6)

Application Number Priority Date Filing Date Title
SE9904295A SE521904C2 (sv) 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling
US10/130,709 US6899054B1 (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
JP2001540573A JP2003515433A (ja) 1999-11-26 2000-11-23 ハイブリッドプラズマ処理装置
AU15671/01A AU1567101A (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
PCT/SE2000/002315 WO2001039560A1 (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
EP00978187A EP1236381A1 (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9904295A SE521904C2 (sv) 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling

Publications (3)

Publication Number Publication Date
SE9904295D0 SE9904295D0 (sv) 1999-11-26
SE9904295L true SE9904295L (sv) 2001-05-27
SE521904C2 SE521904C2 (sv) 2003-12-16

Family

ID=20417874

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9904295A SE521904C2 (sv) 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling

Country Status (6)

Country Link
US (1) US6899054B1 (sv)
EP (1) EP1236381A1 (sv)
JP (1) JP2003515433A (sv)
AU (1) AU1567101A (sv)
SE (1) SE521904C2 (sv)
WO (1) WO2001039560A1 (sv)

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TWI615504B (zh) * 2016-09-13 2018-02-21 Zhang yu shun 遠端電漿增強化學氣相沈積系統之電漿產生裝置
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Also Published As

Publication number Publication date
WO2001039560A1 (en) 2001-05-31
SE9904295D0 (sv) 1999-11-26
AU1567101A (en) 2001-06-04
JP2003515433A (ja) 2003-05-07
US6899054B1 (en) 2005-05-31
EP1236381A1 (en) 2002-09-04
SE521904C2 (sv) 2003-12-16

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