SE9904295L - Device for Hybrid Plasma Processing - Google Patents

Device for Hybrid Plasma Processing

Info

Publication number
SE9904295L
SE9904295L SE9904295A SE9904295A SE9904295L SE 9904295 L SE9904295 L SE 9904295L SE 9904295 A SE9904295 A SE 9904295A SE 9904295 A SE9904295 A SE 9904295A SE 9904295 L SE9904295 L SE 9904295L
Authority
SE
Sweden
Prior art keywords
plasma
hollow cathode
plasma reactor
microwave
cathode
Prior art date
Application number
SE9904295A
Other languages
English (en)
Other versions
SE9904295D0 (sv
SE521904C2 (sv
Inventor
Ladislav Bardos
Hana Barankova
Original Assignee
Ladislav Bardos
Hana Barankova
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ladislav Bardos, Hana Barankova filed Critical Ladislav Bardos
Priority to SE9904295A priority Critical patent/SE521904C2/sv
Publication of SE9904295D0 publication Critical patent/SE9904295D0/sv
Priority to AU15671/01A priority patent/AU1567101A/en
Priority to EP00978187A priority patent/EP1236381A1/en
Priority to PCT/SE2000/002315 priority patent/WO2001039560A1/en
Priority to US10/130,709 priority patent/US6899054B1/en
Priority to JP2001540573A priority patent/JP2003515433A/ja
Publication of SE9904295L publication Critical patent/SE9904295L/sv
Publication of SE521904C2 publication Critical patent/SE521904C2/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SE9904295A 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling SE521904C2 (sv)

Priority Applications (6)

Application Number Priority Date Filing Date Title
SE9904295A SE521904C2 (sv) 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling
AU15671/01A AU1567101A (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
EP00978187A EP1236381A1 (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
PCT/SE2000/002315 WO2001039560A1 (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
US10/130,709 US6899054B1 (en) 1999-11-26 2000-11-23 Device for hybrid plasma processing
JP2001540573A JP2003515433A (ja) 1999-11-26 2000-11-23 ハイブリッドプラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9904295A SE521904C2 (sv) 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling

Publications (3)

Publication Number Publication Date
SE9904295D0 SE9904295D0 (sv) 1999-11-26
SE9904295L true SE9904295L (sv) 2001-05-27
SE521904C2 SE521904C2 (sv) 2003-12-16

Family

ID=20417874

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9904295A SE521904C2 (sv) 1999-11-26 1999-11-26 Anordning för hybridplasmabehandling

Country Status (6)

Country Link
US (1) US6899054B1 (sv)
EP (1) EP1236381A1 (sv)
JP (1) JP2003515433A (sv)
AU (1) AU1567101A (sv)
SE (1) SE521904C2 (sv)
WO (1) WO2001039560A1 (sv)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10247888A1 (de) * 2002-10-14 2004-04-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Einrichtung zur Erzeugung von Plasmen durch Hochfrequenzentladungen
GB0309932D0 (en) * 2003-04-30 2003-06-04 Boc Group Plc Apparatus and method for forming a plasma
DE10341239B4 (de) * 2003-09-08 2006-05-24 Roth & Rau Ag ECR-Plasmaquelle mit linearer Plasmaaustrittsöffnung
ATE532203T1 (de) * 2004-08-27 2011-11-15 Fei Co Lokalisierte plasmabehandlung
CN100395371C (zh) * 2005-12-02 2008-06-18 太原理工大学 微波等离子体增强弧辉渗镀涂层的装置及工艺
DE102006037144B4 (de) * 2006-08-09 2010-05-20 Roth & Rau Ag ECR-Plasmaquelle
US20090255808A1 (en) * 2008-04-11 2009-10-15 Seagate Technology Llc Target for efficient use of precious deposition material
CA2765337C (en) * 2008-06-13 2016-05-17 Fablab Inc. A system and method for fabricating macroscopic objects, and nano-assembled objects obtained therewith
EA020763B9 (ru) 2008-08-04 2015-05-29 Эй-Джи-Си Флет Гласс Норт Эмерике, Инк. Источник плазмы и способы нанесения тонкопленочных покрытий с использованием плазменно-химического осаждения из газовой фазы
US8168268B2 (en) * 2008-12-12 2012-05-01 Ovishinsky Innovation, LLC Thin film deposition via a spatially-coordinated and time-synchronized process
DK2251454T3 (da) 2009-05-13 2014-10-13 Sio2 Medical Products Inc Coating og inspektion af beholder
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
RU2013137749A (ru) * 2011-01-13 2015-02-20 Риджентс Оф Дзе Юниверсити Оф Миннесота Системы осаждения наночастиц
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
KR101314666B1 (ko) * 2011-11-28 2013-10-04 최대규 하이브리드 플라즈마 반응기
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
CN103227090B (zh) * 2013-02-04 2016-04-06 深圳市劲拓自动化设备股份有限公司 一种线性等离子体源
JP2016518240A (ja) 2013-02-15 2016-06-23 リージェンツ オブ ザ ユニバーシティ オブ ミネソタ 粒子の官能化
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
KR102211788B1 (ko) 2013-03-11 2021-02-04 에스아이오2 메디컬 프로덕츠, 인크. 코팅된 패키징
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
US9427821B2 (en) * 2013-03-15 2016-08-30 Agilent Technologies, Inc. Integrated magnetron plasma torch, and related methods
US9431218B2 (en) 2013-03-15 2016-08-30 Tokyo Electron Limited Scalable and uniformity controllable diffusion plasma source
RU2532779C1 (ru) * 2013-04-19 2014-11-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Московский государственный технический университет имени Н.Э. Баумана" (МГТУ им. Н.Э. Баумана) Способ и устройство для ускоренного азотирования деталей машин с использованием импульсов электромагнитного поля
US10167556B2 (en) * 2014-03-14 2019-01-01 The Board Of Trustees Of The University Of Illinois Apparatus and method for depositing a coating on a substrate at atmospheric pressure
EP3122917B1 (en) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
US9550694B2 (en) * 2014-03-31 2017-01-24 Corning Incorporated Methods and apparatus for material processing using plasma thermal source
US9533909B2 (en) 2014-03-31 2017-01-03 Corning Incorporated Methods and apparatus for material processing using atmospheric thermal plasma reactor
CN107852805B (zh) 2014-12-05 2020-10-16 Agc玻璃欧洲公司 空心阴极等离子体源
KR102365939B1 (ko) 2014-12-05 2022-02-22 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 거대-입자 감소 코팅을 활용하는 플라즈마 소스 및 박막 코팅의 증착과 표면의 개질을 위해 거대-입자 감소 코팅을 활용하는 플라즈마 소스의 사용 방법
US20160200618A1 (en) 2015-01-08 2016-07-14 Corning Incorporated Method and apparatus for adding thermal energy to a glass melt
KR20180048694A (ko) 2015-08-18 2018-05-10 에스아이오2 메디컬 프로덕츠, 인크. 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
TWI615504B (zh) * 2016-09-13 2018-02-21 Zhang yu shun 遠端電漿增強化學氣相沈積系統之電漿產生裝置
EP3309815B1 (de) * 2016-10-12 2019-03-20 Meyer Burger (Germany) AG Plasmabehandlungsvorrichtung mit zwei, miteinander gekoppelten mikrowellenplasmaquellen sowie verfahren zum betreiben einer solchen plasmabehandlungsvorrichtung
SE1651742A1 (en) * 2016-12-27 2018-06-28 Methods and apparatuses for deposition of adherent carbon coatings on insulator surfaces
WO2019112148A1 (ko) * 2017-12-04 2019-06-13 포항공과대학교 산학협력단 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법
US10714329B2 (en) * 2018-09-28 2020-07-14 Taiwan Semiconductor Manufacturing Co., Ltd. Pre-clean for contacts
US11120973B2 (en) * 2019-05-10 2021-09-14 Applied Materials, Inc. Plasma processing apparatus and techniques
TWI801058B (zh) * 2021-12-23 2023-05-01 明遠精密科技股份有限公司 一種複合式電漿源及其運作方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5279669A (en) * 1991-12-13 1994-01-18 International Business Machines Corporation Plasma reactor for processing substrates comprising means for inducing electron cyclotron resonance (ECR) and ion cyclotron resonance (ICR) conditions
JPH07268622A (ja) * 1994-03-01 1995-10-17 Applied Sci & Technol Inc マイクロ波プラズマ付着源
TW285746B (sv) * 1994-10-26 1996-09-11 Matsushita Electric Ind Co Ltd
DE19505268C2 (de) 1995-02-16 1999-02-18 Fraunhofer Ges Forschung CVD-Verfahren zur Beschichtung von Substratoberflächen

Also Published As

Publication number Publication date
AU1567101A (en) 2001-06-04
US6899054B1 (en) 2005-05-31
SE9904295D0 (sv) 1999-11-26
SE521904C2 (sv) 2003-12-16
EP1236381A1 (en) 2002-09-04
JP2003515433A (ja) 2003-05-07
WO2001039560A1 (en) 2001-05-31

Similar Documents

Publication Publication Date Title
SE9904295D0 (sv) Device for Hybrid Plasma Processing
TW340295B (en) Plasma source and method and apparatus for processing at least a surface of an article with plasma
SE9403988L (sv) Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning
ATE270394T1 (de) Bandantriebverfahren und -system
WO2002019364A3 (en) Inductively coupled plasma using an internal inductive element
WO2000065631A3 (en) Apparatus and method for exposing a substrate to plasma radicals
AU4919199A (en) Electrochemiluminescence cell with floating reaction electrodes
ATE458261T1 (de) Plasmabehandlungsgerät
SE9501407L (sv) Anordning för lufttransport och/eller luftrening med hjälp av så kallad jonvind
Zhukov et al. Electric-arc generators with interelectrode inserts
EP1133901B8 (en) Plasma generator
JPS57177975A (en) Ion shower device
KR910017075A (ko) 진공용기로부터 산소를 배출하기 위한 방법 및 장치
GB0126419D0 (en) Microwave plasma generator
TW345621B (en) Light cube module
BR0309400A (pt) Usina de energia de célula de combustìvel
WO2003093536A3 (en) Hydrogen generation
WO1999040758A3 (en) Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma
KR20100015978A (ko) 플라즈마 발생기를 위한 전극
EP1308986A3 (en) Plasma etch reactor with dual sources for enhancing both etch selectivity and etch rate
JPH0722389A (ja) プラズマ処理装置
WO1980001906A1 (en) Water purification system employing ozone injection
JPS641226A (en) Plasma generator
CN118400855A (zh) 等离子体产生装置和等离子体处理设备
Bieniosek et al. Gas-jet Charge Stripper for the PET^ 3He^++ Linear Accelerator