JPS641226A - Plasma generator - Google Patents

Plasma generator

Info

Publication number
JPS641226A
JPS641226A JP15716887A JP15716887A JPS641226A JP S641226 A JPS641226 A JP S641226A JP 15716887 A JP15716887 A JP 15716887A JP 15716887 A JP15716887 A JP 15716887A JP S641226 A JPS641226 A JP S641226A
Authority
JP
Japan
Prior art keywords
electrode
electrons
magnet
increased
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15716887A
Other languages
Japanese (ja)
Other versions
JPH011226A (en
Inventor
Kiyoshi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP62-157168A priority Critical patent/JPH011226A/en
Priority claimed from JP62-157168A external-priority patent/JPH011226A/en
Publication of JPS641226A publication Critical patent/JPS641226A/en
Publication of JPH011226A publication Critical patent/JPH011226A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To easily discharge, to prevent the discharge from concentrating, and to generate a stable plasma of high plasma density by providing a magnet near one electrode to use a magnetic field, thereby enhancing its ionization efficiency.
CONSTITUTION: A magnet 5 is provided at one electrode 3 of electrodes 2, 3 arranged oppositely in a vacuum vessel 1. The one electrode 3 is normally grounded. A high frequency power supply 7 is connected through a DC blocking capacitor 6 between the other electrode 2 and a ground, and a workpiece 4 to be treated is attached to the other electrode 2. Gas is fed from a gas inlet 9 into the vessel 1, and exhausted from an outlet 8. When a magnet 5 is provided near the one electrode 3, electrons directed toward the electrode is reduced by disturbing the quantity of the electrons which arrive at the electrode due to bending by its magnetic field. Thus, since the number of the electrons between the electrodes 2 and 3 is increased, its ionization efficiency is enhanced to easily discharge. Since the number of the electrons is increased, plasma density is increased.
COPYRIGHT: (C)1989,JPO&Japio
JP62-157168A 1987-06-23 plasma generator Pending JPH011226A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62-157168A JPH011226A (en) 1987-06-23 plasma generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62-157168A JPH011226A (en) 1987-06-23 plasma generator

Publications (2)

Publication Number Publication Date
JPS641226A true JPS641226A (en) 1989-01-05
JPH011226A JPH011226A (en) 1989-01-05

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0323627A (en) * 1989-06-21 1991-01-31 Matsushita Electric Ind Co Ltd Method and apparatus for plasma doping

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0323627A (en) * 1989-06-21 1991-01-31 Matsushita Electric Ind Co Ltd Method and apparatus for plasma doping

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