WO1999040758A3 - Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma - Google Patents

Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma Download PDF

Info

Publication number
WO1999040758A3
WO1999040758A3 PCT/US1999/000480 US9900480W WO9940758A3 WO 1999040758 A3 WO1999040758 A3 WO 1999040758A3 US 9900480 W US9900480 W US 9900480W WO 9940758 A3 WO9940758 A3 WO 9940758A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
remote
workpiece
active species
exposure
Prior art date
Application number
PCT/US1999/000480
Other languages
French (fr)
Other versions
WO1999040758A2 (en
WO1999040758A9 (en
Inventor
J Reece Roth
Original Assignee
Univ Tennessee Res Corp
J Reece Roth
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US7077998P priority Critical
Priority to US60/070,779 priority
Priority to US8264598P priority
Priority to US60/082,645 priority
Application filed by Univ Tennessee Res Corp, J Reece Roth filed Critical Univ Tennessee Res Corp
Priority claimed from US09/362,471 external-priority patent/US6406759B1/en
Publication of WO1999040758A2 publication Critical patent/WO1999040758A2/en
Publication of WO1999040758A9 publication Critical patent/WO1999040758A9/en
Publication of WO1999040758A3 publication Critical patent/WO1999040758A3/en

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Dielectric barrier discharges
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Dielectric barrier discharges
    • H05H2001/2412Dielectric barrier discharges the dielectric being interposed between the electrodes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00Test
    • H05H2240/10Test at atmospheric pressure
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00Test
    • H05H2240/20Non-thermal plasma

Abstract

An OAUGD plasma is generated using, for example, paraelectric or peristaltic electohydrodynamic (EHD) techniques, in the plasma generator of a remote-exposure reactor, wherein one or more active species, especially oxidizing species in the plasma are convected away from the plasma-generation region and directed towards a workpiece that is located outside of the plasma-generation region (e.g., within an optional remote-exposure chamber configured to the plasma generator). In this way, the workpiece can be subjected to the one or more active species without directly being subjected to either the plasma or to the electric fields used to generate the plasma. The plasma generator may have a set of flat panels arranged within an air baffle to convect the active species in a serpentine manner through the plasma generator. The remote-exposure reactor can also be configured as a portable backpack unit with tubing that is used to direct the active species onto the workpiece, rather than placing the workpiece within a remote-exposure chamber of the reactor.
PCT/US1999/000480 1998-01-08 1999-01-08 Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma WO1999040758A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US7077998P true 1998-01-08 1998-01-08
US60/070,779 1998-01-08
US8264598P true 1998-04-22 1998-04-22
US60/082,645 1998-04-22

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
AU40677/99A AU4067799A (en) 1998-01-08 1999-01-08 Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma
US09/362,471 US6406759B1 (en) 1998-01-08 1999-07-28 Remote exposure of workpieces using a recirculated plasma
US10/156,394 US6676802B2 (en) 1998-01-08 2002-05-28 Remote exposure of workpieces using a plasma

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US09/362,471 Continuation US6406759B1 (en) 1998-01-08 1999-07-28 Remote exposure of workpieces using a recirculated plasma

Publications (3)

Publication Number Publication Date
WO1999040758A2 WO1999040758A2 (en) 1999-08-12
WO1999040758A9 WO1999040758A9 (en) 1999-10-21
WO1999040758A3 true WO1999040758A3 (en) 2000-01-06

Family

ID=26751496

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/000480 WO1999040758A2 (en) 1998-01-08 1999-01-08 Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma

Country Status (2)

Country Link
AU (1) AU4067799A (en)
WO (1) WO1999040758A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0211354D0 (en) 2002-05-17 2002-06-26 Surface Innovations Ltd Atomisation of a precursor into an excitation medium for coating a remote substrate
GB0212848D0 (en) 2002-06-01 2002-07-17 Surface Innovations Ltd Introduction of liquid/solid slurry into an exciting medium
CN103187235B (en) * 2011-12-31 2016-04-20 北京北方微电子基地设备工艺研究中心有限责任公司 Discharging assembly of the substrate processing apparatus, the chamber means and equipment pecvd

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0063273A1 (en) * 1981-04-02 1982-10-27 The Perkin-Elmer Corporation Discharge system for plasma processing
US4381965A (en) * 1982-01-06 1983-05-03 Drytek, Inc. Multi-planar electrode plasma etching
JPH03219082A (en) * 1989-11-30 1991-09-26 Masuhiro Kokoma Blowoff-type surface treating device
WO1996038311A1 (en) * 1995-06-02 1996-12-05 The University Of Tennessee Research Corporation Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
US5610097A (en) * 1995-03-24 1997-03-11 Agency Of Industrial Science & Technology, Ministry Of International Trade & Industry Method for forming electrode on semiconductor
US5779991A (en) * 1996-11-12 1998-07-14 Eastern Digital Inc. Apparatus for destroying hazardous compounds in a gas stream

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0063273A1 (en) * 1981-04-02 1982-10-27 The Perkin-Elmer Corporation Discharge system for plasma processing
US4381965A (en) * 1982-01-06 1983-05-03 Drytek, Inc. Multi-planar electrode plasma etching
JPH03219082A (en) * 1989-11-30 1991-09-26 Masuhiro Kokoma Blowoff-type surface treating device
US5610097A (en) * 1995-03-24 1997-03-11 Agency Of Industrial Science & Technology, Ministry Of International Trade & Industry Method for forming electrode on semiconductor
WO1996038311A1 (en) * 1995-06-02 1996-12-05 The University Of Tennessee Research Corporation Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
US5779991A (en) * 1996-11-12 1998-07-14 Eastern Digital Inc. Apparatus for destroying hazardous compounds in a gas stream

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 015, no. 500 (C - 0895) 18 December 1991 (1991-12-18) *

Also Published As

Publication number Publication date
AU4067799A (en) 1999-08-23
WO1999040758A2 (en) 1999-08-12
WO1999040758A9 (en) 1999-10-21

Similar Documents

Publication Publication Date Title
US7719200B2 (en) Plasma generator
TWI225897B (en) Method for forming thin film, article having thin film, optical film, dielectric coated electrode, and plasma discharge processor
TW451000B (en) Plasma treatment method and apparatus thereof
TW534975B (en) Muzzle brake
TW451286B (en) Apparatus and methods for upgraded substrate processing system with microwave plasma source
TW585934B (en) Surface-treated shower head for use in a substrate processing chamber
TW432466B (en) Plasma processing apparatus
TW538480B (en) Heating configuration for use in thermal processing chambers
TW448240B (en) Method for microwave plasma substrate heating
TW416112B (en) Rapid thermal processing (RTP) system with gas driven rotating substrate
TW587272B (en) Wafer area pressure control for plasma confinement
TW514996B (en) Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
AP1241A (en) Gasification reactor apparatus.
TW353764B (en) Heating device of CVD device
TW388071B (en) Apparatus for improved remote microwave plasma source for use with substrate processing systems
TW279240B (en) Parallel-plate icp source/rf bias electrode head
TW418423B (en) Chamber having improved process monitoring window
TW384289B (en) Xanthine compounds having terminally aminated alkynol side chains
TWI282821B (en) Processing apparatus and method
TW376547B (en) Method and apparatus for plasma processing
TWI229013B (en) Chemical reaction apparatus and power supply system
TW452601B (en) Sputtering device and sputtering method
CA2428332A1 (en) Method of inactivating microorganisms in a fluid using ultraviolet radiation
JPH03143930A (en) Method and apparatus for continuous surface treatment of sheet
AU2003259043A1 (en) Nonthermal plasma air treatment system

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 09362471

Country of ref document: US

AK Designated states

Kind code of ref document: A2

Designated state(s): AU CA JP KR RU US

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)

Free format text: (EXCEPT US)

121 Ep: the epo has been informed by wipo that ep was designated in this application
AL Designated countries for regional patents

Kind code of ref document: C2

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

COP Corrected version of pamphlet

Free format text: PAGES 1/7-7/7, DRAWINGS, REPLACED BY NEW PAGES 1/7-7/7

AK Designated states

Kind code of ref document: C2

Designated state(s): AU CA JP KR RU US

AL Designated countries for regional patents

Kind code of ref document: A3

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

AK Designated states

Kind code of ref document: A3

Designated state(s): AU CA JP KR RU US

NENP Non-entry into the national phase in:

Ref country code: KR

WWE Wipo information: entry into national phase

Ref document number: 200004847

Country of ref document: ZA

122 Ep: pct application non-entry in european phase
WWE Wipo information: entry into national phase

Ref document number: 10156394

Country of ref document: US