WO1999040758A3 - Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma - Google Patents

Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma Download PDF

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Publication number
WO1999040758A3
WO1999040758A3 PCT/US1999/000480 US9900480W WO9940758A3 WO 1999040758 A3 WO1999040758 A3 WO 1999040758A3 US 9900480 W US9900480 W US 9900480W WO 9940758 A3 WO9940758 A3 WO 9940758A3
Authority
WO
Grant status
Application
Patent type
Prior art keywords
plasma
remote
workpiece
active species
exposure
Prior art date
Application number
PCT/US1999/000480
Other languages
French (fr)
Other versions
WO1999040758A2 (en )
WO1999040758A9 (en )
Inventor
J Reece Roth
Original Assignee
Univ Tennessee Res Corp
J Reece Roth
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Dielectric barrier discharges
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Dielectric barrier discharges
    • H05H2001/2412Dielectric barrier discharges the dielectric being interposed between the electrodes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00Test
    • H05H2240/10Test at atmospheric pressure
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00Test
    • H05H2240/20Non-thermal plasma

Abstract

An OAUGD plasma is generated using, for example, paraelectric or peristaltic electohydrodynamic (EHD) techniques, in the plasma generator of a remote-exposure reactor, wherein one or more active species, especially oxidizing species in the plasma are convected away from the plasma-generation region and directed towards a workpiece that is located outside of the plasma-generation region (e.g., within an optional remote-exposure chamber configured to the plasma generator). In this way, the workpiece can be subjected to the one or more active species without directly being subjected to either the plasma or to the electric fields used to generate the plasma. The plasma generator may have a set of flat panels arranged within an air baffle to convect the active species in a serpentine manner through the plasma generator. The remote-exposure reactor can also be configured as a portable backpack unit with tubing that is used to direct the active species onto the workpiece, rather than placing the workpiece within a remote-exposure chamber of the reactor.
PCT/US1999/000480 1998-01-08 1999-01-08 Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma WO1999040758A3 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US7077998 true 1998-01-08 1998-01-08
US60/070,779 1998-01-08
US8264598 true 1998-04-22 1998-04-22
US60/082,645 1998-04-22

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
AU4067799A AU4067799A (en) 1998-01-08 1999-01-08 Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma
US09362471 US6406759B1 (en) 1998-01-08 1999-07-28 Remote exposure of workpieces using a recirculated plasma
US10156394 US6676802B2 (en) 1998-01-08 2002-05-28 Remote exposure of workpieces using a plasma

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US09362471 Continuation US6406759B1 (en) 1998-01-08 1999-07-28 Remote exposure of workpieces using a recirculated plasma

Publications (3)

Publication Number Publication Date
WO1999040758A2 true WO1999040758A2 (en) 1999-08-12
WO1999040758A9 true WO1999040758A9 (en) 1999-10-21
WO1999040758A3 true true WO1999040758A3 (en) 2000-01-06

Family

ID=26751496

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/000480 WO1999040758A3 (en) 1998-01-08 1999-01-08 Remote exposure of workpieces using a one atmosphere uniform glow discharge plasma

Country Status (1)

Country Link
WO (1) WO1999040758A3 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0211354D0 (en) 2002-05-17 2002-06-26 Surface Innovations Ltd Atomisation of a precursor into an excitation medium for coating a remote substrate
GB0212848D0 (en) 2002-06-01 2002-07-17 Surface Innovations Ltd Introduction of liquid/solid slurry into an exciting medium
CN103187235B (en) * 2011-12-31 2016-04-20 北京北方微电子基地设备工艺研究中心有限责任公司 Discharging assembly of the substrate processing apparatus, the chamber means and equipment pecvd

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0063273A1 (en) * 1981-04-02 1982-10-27 The Perkin-Elmer Corporation Discharge system for plasma processing
US4381965A (en) * 1982-01-06 1983-05-03 Drytek, Inc. Multi-planar electrode plasma etching
JPH03219082A (en) * 1989-11-30 1991-09-26 Masuhiro Kokoma Blowoff-type surface treating device
WO1996038311A1 (en) * 1995-06-02 1996-12-05 The University Of Tennessee Research Corporation Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
US5610097A (en) * 1995-03-24 1997-03-11 Agency Of Industrial Science & Technology, Ministry Of International Trade & Industry Method for forming electrode on semiconductor
US5779991A (en) * 1996-11-12 1998-07-14 Eastern Digital Inc. Apparatus for destroying hazardous compounds in a gas stream

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0063273A1 (en) * 1981-04-02 1982-10-27 The Perkin-Elmer Corporation Discharge system for plasma processing
US4381965A (en) * 1982-01-06 1983-05-03 Drytek, Inc. Multi-planar electrode plasma etching
JPH03219082A (en) * 1989-11-30 1991-09-26 Masuhiro Kokoma Blowoff-type surface treating device
US5610097A (en) * 1995-03-24 1997-03-11 Agency Of Industrial Science & Technology, Ministry Of International Trade & Industry Method for forming electrode on semiconductor
WO1996038311A1 (en) * 1995-06-02 1996-12-05 The University Of Tennessee Research Corporation Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
US5779991A (en) * 1996-11-12 1998-07-14 Eastern Digital Inc. Apparatus for destroying hazardous compounds in a gas stream

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 015, no. 500 (C - 0895) 18 December 1991 (1991-12-18) *

Also Published As

Publication number Publication date Type
WO1999040758A2 (en) 1999-08-12 application
WO1999040758A9 (en) 1999-10-21 application

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