TWI765316B - 儲存器設備及儲存器設備的控制方法 - Google Patents
儲存器設備及儲存器設備的控制方法 Download PDFInfo
- Publication number
- TWI765316B TWI765316B TW109127283A TW109127283A TWI765316B TW I765316 B TWI765316 B TW I765316B TW 109127283 A TW109127283 A TW 109127283A TW 109127283 A TW109127283 A TW 109127283A TW I765316 B TWI765316 B TW I765316B
- Authority
- TW
- Taiwan
- Prior art keywords
- temperature
- semiconductor wafer
- prober
- storage device
- temperature control
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/04—Housings; Supporting members; Arrangements of terminals
- G01R1/0408—Test fixtures or contact fields; Connectors or connecting adaptors; Test clips; Test sockets
- G01R1/0433—Sockets for IC's or transistors
- G01R1/0441—Details
- G01R1/0458—Details related to environmental aspects, e.g. temperature
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
- B65G1/02—Storage devices
- B65G1/04—Storage devices mechanical
- B65G1/137—Storage devices mechanical with arrangements or automatic control means for selecting which articles are to be removed
- B65G1/1373—Storage devices mechanical with arrangements or automatic control means for selecting which articles are to be removed for fulfilling orders in warehouses
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2865—Holding devices, e.g. chucks; Handlers or transport devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2893—Handling, conveying or loading, e.g. belts, boats, vacuum fingers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0434—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0602—Temperature monitoring
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
- G11C2029/0403—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals during or with feedback to manufacture
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C7/00—Arrangements for writing information into, or reading information out from, a digital store
- G11C7/04—Arrangements for writing information into, or reading information out from, a digital store with means for avoiding disturbances due to temperature effects
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Environmental & Geological Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Test And Diagnosis Of Digital Computers (AREA)
- Control Of Temperature (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| WOPCT/JP2019/044931 | 2019-11-15 | ||
| PCT/JP2019/044931 WO2021095251A1 (ja) | 2019-11-15 | 2019-11-15 | ストレージデバイスおよび制御方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202127561A TW202127561A (zh) | 2021-07-16 |
| TWI765316B true TWI765316B (zh) | 2022-05-21 |
Family
ID=75912115
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109127283A TWI765316B (zh) | 2019-11-15 | 2020-08-12 | 儲存器設備及儲存器設備的控制方法 |
| TW111115173A TWI800355B (zh) | 2019-11-15 | 2020-08-12 | 儲存器設備及儲存器設備的控制方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW111115173A TWI800355B (zh) | 2019-11-15 | 2020-08-12 | 儲存器設備及儲存器設備的控制方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12384624B2 (https=) |
| EP (1) | EP4060721A4 (https=) |
| JP (1) | JP7293389B2 (https=) |
| CN (1) | CN114424331B (https=) |
| TW (2) | TWI765316B (https=) |
| WO (1) | WO2021095251A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112021007343T5 (de) | 2021-03-23 | 2024-05-02 | Kioxia Corporation | Speichersystem |
| CN116393387A (zh) * | 2023-04-10 | 2023-07-07 | 长鑫存储技术有限公司 | 探针卡管理装置及管理系统 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130056101A1 (en) * | 2005-10-11 | 2013-03-07 | Intermolecular, Inc. | Methods for discretized processing and process sequence integration of regions of a substrate |
| TW201926504A (zh) * | 2017-11-28 | 2019-07-01 | 台灣積體電路製造股份有限公司 | 用於控制晶圓均勻性的設備 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2082354B (en) | 1980-08-21 | 1984-04-11 | Burroughs Corp | Improvements in or relating to wafer-scale integrated circuits |
| US6288561B1 (en) * | 1988-05-16 | 2001-09-11 | Elm Technology Corporation | Method and apparatus for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus |
| KR0155158B1 (ko) * | 1989-07-25 | 1998-12-01 | 카자마 젠쥬 | 종형 처리 장치 및 처리방법 |
| JP2907971B2 (ja) * | 1990-08-14 | 1999-06-21 | 株式会社東芝 | 半導体素子用パターンの形成または試験方法 |
| JP3435410B2 (ja) * | 1996-05-09 | 2003-08-11 | 東京エレクトロン株式会社 | 低温試験装置及び低温試験方法 |
| US6063640A (en) | 1997-03-18 | 2000-05-16 | Fujitsu Limited | Semiconductor wafer testing method with probe pin contact |
| SG98373A1 (en) * | 1998-11-25 | 2003-09-19 | Advantest Corp | Device testing apparatus |
| TW533316B (en) * | 1998-12-08 | 2003-05-21 | Advantest Corp | Testing device for electronic device |
| US6499121B1 (en) | 1999-03-01 | 2002-12-24 | Formfactor, Inc. | Distributed interface for parallel testing of multiple devices using a single tester channel |
| US6499777B1 (en) * | 1999-05-11 | 2002-12-31 | Matrix Integrated Systems, Inc. | End-effector with integrated cooling mechanism |
| DE10343525B4 (de) * | 2002-09-27 | 2011-06-16 | Qimonda Ag | Verfahren zum Betreiben von Halbleiterbausteinen, Steuervorrichtung für Halbleiterbausteine und Anordnung zum Betreiben von Speicherbausteinen |
| JP2005181222A (ja) * | 2003-12-22 | 2005-07-07 | Renesas Technology Corp | 半導体装置の製造方法 |
| JP2005228788A (ja) | 2004-02-10 | 2005-08-25 | Seiko Epson Corp | ウエーハとプローブカードとの位置合わせ方法、プローブ検査方法及びプローブ検査装置 |
| JP2006242766A (ja) * | 2005-03-03 | 2006-09-14 | Sanyo Electric Co Ltd | 品温測定装置 |
| JP2006250579A (ja) * | 2005-03-08 | 2006-09-21 | Denso Corp | 湿度センサの検査装置及び特性調整方法 |
| KR20060127662A (ko) | 2005-06-08 | 2006-12-13 | 삼성전자주식회사 | 반도체 설비의 사이드 스토리지 온도 제어 장치 |
| JP2007096190A (ja) | 2005-09-30 | 2007-04-12 | Seiko Epson Corp | プローブカードの針先研磨方法、及びプローブ装置 |
| JP2010512584A (ja) | 2006-12-06 | 2010-04-22 | フュージョン マルチシステムズ,インク.(ディービイエイ フュージョン−アイオー) | 空データトークン指令を有する要求デバイスからのデータを管理する装置、システムおよび方法 |
| JP4917981B2 (ja) | 2007-07-10 | 2012-04-18 | 東京エレクトロン株式会社 | 検査方法及び検査方法を記録したプログラム記録媒体 |
| JP5374246B2 (ja) | 2009-06-12 | 2013-12-25 | 学校法人慶應義塾 | 密封型半導体記録媒体及び密封型半導体記録装置 |
| JP4480796B1 (ja) * | 2009-09-02 | 2010-06-16 | 株式会社アドバンテスト | 試験装置、試験方法およびプログラム |
| TWI451106B (zh) * | 2012-03-26 | 2014-09-01 | Silicon Motion Inc | 晶圓測試系統及其測試方法 |
| JP2013221911A (ja) * | 2012-04-19 | 2013-10-28 | Seiko Epson Corp | ハンドラー、及び部品検査装置 |
| JP2014052785A (ja) * | 2012-09-06 | 2014-03-20 | Toshiba Corp | メモリシステム |
| US20150370245A1 (en) * | 2012-12-07 | 2015-12-24 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus, substrate processing method, semiconductor device manufacturing method, and control program |
| JP6205225B2 (ja) * | 2013-03-25 | 2017-09-27 | 東京エレクトロン株式会社 | 基板検査装置及び基板温度調整方法 |
| TWI628449B (zh) * | 2017-05-05 | 2018-07-01 | 漢民科技股份有限公司 | 晶圓針測裝置主動式預熱及預冷系統及晶圓檢測方法 |
| EP3659055A4 (en) | 2017-07-24 | 2021-04-28 | Cerebras Systems Inc. | DEVICE AND METHOD FOR MULTI-CHIP CONNECTION |
| JP6827385B2 (ja) * | 2017-08-03 | 2021-02-10 | 東京エレクトロン株式会社 | 検査システム |
| US10872789B2 (en) | 2017-09-28 | 2020-12-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wafer cooling system |
| JP7181068B2 (ja) * | 2018-11-30 | 2022-11-30 | 株式会社Screenホールディングス | 基板処理装置 |
| JP7274350B2 (ja) * | 2019-05-28 | 2023-05-16 | 東京エレクトロン株式会社 | 搬送システム、検査システム及び検査方法 |
| JP7267111B2 (ja) * | 2019-05-31 | 2023-05-01 | 東京エレクトロン株式会社 | 位置決め機構及び位置決め方法 |
-
2019
- 2019-11-15 WO PCT/JP2019/044931 patent/WO2021095251A1/ja not_active Ceased
- 2019-11-15 EP EP19952453.9A patent/EP4060721A4/en active Pending
- 2019-11-15 CN CN201980100500.3A patent/CN114424331B/zh active Active
- 2019-11-15 JP JP2021555761A patent/JP7293389B2/ja active Active
-
2020
- 2020-08-12 TW TW109127283A patent/TWI765316B/zh active
- 2020-08-12 TW TW111115173A patent/TWI800355B/zh active
-
2022
- 2022-03-14 US US17/694,532 patent/US12384624B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20130056101A1 (en) * | 2005-10-11 | 2013-03-07 | Intermolecular, Inc. | Methods for discretized processing and process sequence integration of regions of a substrate |
| TW201926504A (zh) * | 2017-11-28 | 2019-07-01 | 台灣積體電路製造股份有限公司 | 用於控制晶圓均勻性的設備 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202230579A (zh) | 2022-08-01 |
| CN114424331A (zh) | 2022-04-29 |
| TWI800355B (zh) | 2023-04-21 |
| EP4060721A1 (en) | 2022-09-21 |
| TW202127561A (zh) | 2021-07-16 |
| US12384624B2 (en) | 2025-08-12 |
| JP7293389B2 (ja) | 2023-06-19 |
| WO2021095251A1 (ja) | 2021-05-20 |
| US20220204270A1 (en) | 2022-06-30 |
| EP4060721A4 (en) | 2023-08-09 |
| CN114424331B (zh) | 2025-07-11 |
| JPWO2021095251A1 (https=) | 2021-05-20 |
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