TWI730129B - 半導體裝置之製造方法 - Google Patents

半導體裝置之製造方法 Download PDF

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Publication number
TWI730129B
TWI730129B TW106121451A TW106121451A TWI730129B TW I730129 B TWI730129 B TW I730129B TW 106121451 A TW106121451 A TW 106121451A TW 106121451 A TW106121451 A TW 106121451A TW I730129 B TWI730129 B TW I730129B
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TW
Taiwan
Prior art keywords
sheet
semiconductor
accommodating
arrangement
jig
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TW106121451A
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English (en)
Chinese (zh)
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TW201810507A (zh
Inventor
岡本也
山田忠知
毛受利彰
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日商琳得科股份有限公司
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Application filed by 日商琳得科股份有限公司 filed Critical 日商琳得科股份有限公司
Publication of TW201810507A publication Critical patent/TW201810507A/zh
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Publication of TWI730129B publication Critical patent/TWI730129B/zh

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW106121451A 2016-06-28 2017-06-27 半導體裝置之製造方法 TWI730129B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016128012 2016-06-28
JP2016-128012 2016-06-28

Publications (2)

Publication Number Publication Date
TW201810507A TW201810507A (zh) 2018-03-16
TWI730129B true TWI730129B (zh) 2021-06-11

Family

ID=60785211

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106121451A TWI730129B (zh) 2016-06-28 2017-06-27 半導體裝置之製造方法

Country Status (5)

Country Link
JP (1) JP6983775B2 (ja)
KR (1) KR102413733B1 (ja)
CN (1) CN109417045B (ja)
TW (1) TWI730129B (ja)
WO (1) WO2018003602A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7250468B6 (ja) * 2018-10-12 2023-04-25 三井化学株式会社 電子装置の製造方法および粘着性フィルム
JP7154962B2 (ja) * 2018-11-09 2022-10-18 株式会社ディスコ 板状物加工方法
JPWO2020158767A1 (ja) * 2019-01-31 2021-12-02 リンテック株式会社 エキスパンド方法及び半導体装置の製造方法
TW202135276A (zh) * 2019-10-29 2021-09-16 日商東京威力科創股份有限公司 附有晶片之基板的製造方法及基板處理裝置
KR102601746B1 (ko) * 2020-08-31 2023-11-13 연세대학교 산학협력단 Led 디스플레이 제조 방법
US11942352B2 (en) 2020-08-31 2024-03-26 Industry-Academic Cooperation Foundation, Yonsei University Manufacturing method of LED display
US20240128304A1 (en) * 2021-02-25 2024-04-18 Dongwoo Fine-Chem Co., Ltd. Led lighting device and method for manufacturing the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0794535A (ja) * 1993-09-20 1995-04-07 Nec Corp 半導体ペレット位置決め装置
JP2011096961A (ja) * 2009-11-02 2011-05-12 Citizen Electronics Co Ltd Led素子の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6461033A (en) * 1987-09-01 1989-03-08 Sumitomo Electric Industries Device for mounting chip
JPH03177030A (ja) * 1989-12-05 1991-08-01 Matsushita Electron Corp チップ位置決め装置
JP2003179125A (ja) * 2001-12-10 2003-06-27 Hitachi Ltd 半導体装置の製造方法および分離整列治具
JP2005203695A (ja) * 2004-01-19 2005-07-28 Casio Micronics Co Ltd 半導体装置およびその製造方法
JP4566626B2 (ja) * 2004-06-09 2010-10-20 株式会社石川製作所 半導体基板の分断方法および半導体チップの選択転写方法
WO2010058646A1 (ja) 2008-11-21 2010-05-27 インターナショナル・ビジネス・マシーンズ・コーポレーション 半導体パッケージおよびその製造方法
JP5912274B2 (ja) 2011-03-28 2016-04-27 株式会社東京精密 チップ分割離間装置、及びチップ分割離間方法
JP5472275B2 (ja) * 2011-12-14 2014-04-16 株式会社村田製作所 エキスパンド装置及び部品の製造方法
US9082940B2 (en) * 2012-06-29 2015-07-14 Nitto Denko Corporation Encapsulating layer-covered semiconductor element, producing method thereof, and semiconductor device
JP6371641B2 (ja) * 2014-09-02 2018-08-08 リンテック株式会社 整列装置および整列方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0794535A (ja) * 1993-09-20 1995-04-07 Nec Corp 半導体ペレット位置決め装置
JP2011096961A (ja) * 2009-11-02 2011-05-12 Citizen Electronics Co Ltd Led素子の製造方法

Also Published As

Publication number Publication date
WO2018003602A1 (ja) 2018-01-04
KR20190021223A (ko) 2019-03-05
CN109417045B (zh) 2023-06-23
TW201810507A (zh) 2018-03-16
CN109417045A (zh) 2019-03-01
KR102413733B1 (ko) 2022-06-27
JPWO2018003602A1 (ja) 2019-04-11
JP6983775B2 (ja) 2021-12-17

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