JP5472275B2 - エキスパンド装置及び部品の製造方法 - Google Patents
エキスパンド装置及び部品の製造方法 Download PDFInfo
- Publication number
- JP5472275B2 JP5472275B2 JP2011273018A JP2011273018A JP5472275B2 JP 5472275 B2 JP5472275 B2 JP 5472275B2 JP 2011273018 A JP2011273018 A JP 2011273018A JP 2011273018 A JP2011273018 A JP 2011273018A JP 5472275 B2 JP5472275 B2 JP 5472275B2
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- Japan
- Prior art keywords
- adhesive tape
- heating table
- ring
- heating
- expanding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 95
- 239000002390 adhesive tape Substances 0.000 claims description 78
- 239000011810 insulating material Substances 0.000 claims description 33
- 230000002093 peripheral effect Effects 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 238000002474 experimental method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/12—Surface bonding means and/or assembly means with cutting, punching, piercing, severing or tearing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
Description
2…粘着テープ
3…保持リング
4…ウェーハ
4a…部品
5…加熱テーブル
6…ボールねじ
7…支持プレート
8…ロッド
9…連結ロッド
10…第1の断熱材
11…第2の断熱材
12…非加熱リング
12a…凹部
12b…環状垂直壁
13…枠材
14…保持装置
14a…第1の保持部材
14b…第2の保持部材
M…駆動装置
Claims (7)
- 粘着テープのウェーハが貼付されている部分を含む中央の第1の部分が上面に載置される加熱テーブルと、
前記加熱テーブルの外周縁を囲むように配置された非加熱リングと、
前記非加熱リングの上面に積層され、前記第1の部分の外側の第2の部分が直接または間接に載置される断熱材と、
前記粘着テープの前記第2の部分よりも外側の第3の部分を保持する保持装置と、
前記加熱テーブル及び非加熱リングを、前記保持装置に対して相対的に上下方向に駆動して前記粘着テープを拡張する駆動装置とを備える、エキスパンド装置。 - 前記非加熱リングの上面に前記粘着テープが接触しないように、前記非加熱リングの上面が前記加熱テーブルの上面よりも低くされている、請求項1に記載のエキスパンド装置。
- 前記非加熱リングが上面に凹部を有し、該凹部内に枠材が配置されている、請求項1に記載のエキスパンド装置。
- 前記非加熱リングが、前記加熱テーブルの外周縁に対して隙間を隔てて配置されている、請求項1〜3のいずれか1項に記載のエキスパンド装置。
- 前記加熱テーブルと、前記非加熱リングとを連結する連結部材をさらに備え、該連結部材の一部に、第2の断熱材が介在されている、請求項1〜4のいずれか1項に記載のエキスパンド装置。
- 前記加熱テーブルの上面が、拡張後の複数の部品が占める領域以下の大きさとされている、請求項1〜5のいずれか1項に記載のエキスパンド装置。
- 請求項1〜6のいずれか1項に記載のエキスパンド装置を用いた部品の製造方法であって、
前記粘着テープの上面に個々の部品に切断されたウェーハを貼付する工程と、
前記エキスパンド装置の前記加熱テーブル上に前記粘着テープの前記第1の部分が位置するように、かつ前記第2の部分が前記断熱材上に直接または間接に積層されるように、前記粘着テープを配置する工程と、
前記駆動装置により前記加熱テーブル及び前記非加熱リングを前記保持装置に対して相対的に下方に移動させ、前記複数個の部品同士を隔てる工程とを備える、部品の製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011273018A JP5472275B2 (ja) | 2011-12-14 | 2011-12-14 | エキスパンド装置及び部品の製造方法 |
TW101142932A TWI498995B (zh) | 2011-12-14 | 2012-11-16 | 擴展裝置及零件之製造方法 |
KR20120138005A KR101414086B1 (ko) | 2011-12-14 | 2012-11-30 | 익스팬드 장치 및 부품의 제조방법 |
CN201210509906.7A CN103165404B (zh) | 2011-12-14 | 2012-12-03 | 扩展装置及部件的制造方法 |
US13/707,644 US9101085B2 (en) | 2011-12-14 | 2012-12-07 | Expanding device and method for manufacturing components |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011273018A JP5472275B2 (ja) | 2011-12-14 | 2011-12-14 | エキスパンド装置及び部品の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013125809A JP2013125809A (ja) | 2013-06-24 |
JP5472275B2 true JP5472275B2 (ja) | 2014-04-16 |
Family
ID=48588392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011273018A Active JP5472275B2 (ja) | 2011-12-14 | 2011-12-14 | エキスパンド装置及び部品の製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9101085B2 (ja) |
JP (1) | JP5472275B2 (ja) |
KR (1) | KR101414086B1 (ja) |
CN (1) | CN103165404B (ja) |
TW (1) | TWI498995B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10008397B2 (en) * | 2014-09-05 | 2018-06-26 | Nexperia B.V. | Pneumatic wafer expansion |
JP6573072B2 (ja) * | 2015-08-27 | 2019-09-11 | 株式会社村田製作所 | フィルム拡張装置およびそれを用いた電子部品の製造方法 |
WO2018003602A1 (ja) * | 2016-06-28 | 2018-01-04 | リンテック株式会社 | 整列治具、整列方法及び転着方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03250751A (ja) * | 1990-02-28 | 1991-11-08 | Mitsubishi Electric Corp | ウエハエキスパンド装置 |
JPH08102452A (ja) * | 1994-09-30 | 1996-04-16 | Sharp Corp | 半導体チップ搭載シートの拡張装置 |
JP3955659B2 (ja) * | 1997-06-12 | 2007-08-08 | リンテック株式会社 | 電子部品のダイボンディング方法およびそれに使用されるダイボンディング装置 |
JP2002322436A (ja) * | 2001-04-25 | 2002-11-08 | Nitto Denko Corp | 被着物の加熱剥離方法及び被着物加熱剥離装置 |
JP3745260B2 (ja) * | 2001-10-02 | 2006-02-15 | ローム株式会社 | 半導体装置の製造方法 |
TWI225279B (en) * | 2002-03-11 | 2004-12-11 | Hitachi Ltd | Semiconductor device and its manufacturing method |
JP2004027562A (ja) | 2002-06-24 | 2004-01-29 | Daicel Polymer Ltd | 地下構造物用熱可塑性樹脂製蓋体、それを備えた地下構造物ならびにその蓋体の製造方法 |
JP2004221187A (ja) | 2003-01-10 | 2004-08-05 | Toshiba Corp | 半導体装置の製造装置及びその製造方法 |
JP4376072B2 (ja) * | 2004-01-16 | 2009-12-02 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
JP2005203695A (ja) * | 2004-01-19 | 2005-07-28 | Casio Micronics Co Ltd | 半導体装置およびその製造方法 |
JP4716668B2 (ja) * | 2004-04-21 | 2011-07-06 | 日東電工株式会社 | 被着物の加熱剥離方法及び被着物加熱剥離装置 |
CN100470729C (zh) * | 2004-05-24 | 2009-03-18 | 松下电器产业株式会社 | 晶片扩展装置、部件供给装置及晶片带的扩展方法 |
TW200727446A (en) * | 2005-03-28 | 2007-07-16 | Toshiba Kk | Stack type semiconductor device manufacturing method and stack type electronic component manufacturing method |
JP2007081352A (ja) | 2005-08-16 | 2007-03-29 | Hugle Electronics Inc | 傾斜振動式フィルムシート用エキスパンダ |
JP2007080984A (ja) * | 2005-09-13 | 2007-03-29 | Hugle Electronics Inc | エア吹き上げ式フィルムシート用エキスパンダ |
JP4714950B2 (ja) * | 2005-11-18 | 2011-07-06 | 株式会社東京精密 | エキスパンドリング、及び該エキスパンドリングを使用した基板の分割方法 |
JP2009064905A (ja) * | 2007-09-05 | 2009-03-26 | Disco Abrasive Syst Ltd | 拡張方法および拡張装置 |
JP5307384B2 (ja) * | 2007-12-03 | 2013-10-02 | 株式会社ディスコ | ウエーハの分割方法 |
TWM359789U (en) * | 2008-07-21 | 2009-06-21 | Beautrong Prec Mechtronics Co Ltd | A blue membrane expansion device |
JP5313036B2 (ja) * | 2009-05-11 | 2013-10-09 | 株式会社ディスコ | 粘着テープの拡張方法 |
JP2011018804A (ja) * | 2009-07-09 | 2011-01-27 | Sumitomo Bakelite Co Ltd | 半導体用フィルムおよび半導体装置の製造方法 |
-
2011
- 2011-12-14 JP JP2011273018A patent/JP5472275B2/ja active Active
-
2012
- 2012-11-16 TW TW101142932A patent/TWI498995B/zh active
- 2012-11-30 KR KR20120138005A patent/KR101414086B1/ko active IP Right Grant
- 2012-12-03 CN CN201210509906.7A patent/CN103165404B/zh active Active
- 2012-12-07 US US13/707,644 patent/US9101085B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US9101085B2 (en) | 2015-08-04 |
TWI498995B (zh) | 2015-09-01 |
KR101414086B1 (ko) | 2014-07-02 |
JP2013125809A (ja) | 2013-06-24 |
CN103165404B (zh) | 2016-01-06 |
TW201336015A (zh) | 2013-09-01 |
CN103165404A (zh) | 2013-06-19 |
US20130153132A1 (en) | 2013-06-20 |
KR20130069401A (ko) | 2013-06-26 |
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