TWI729366B - 圖案形成裝置 - Google Patents

圖案形成裝置 Download PDF

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Publication number
TWI729366B
TWI729366B TW108109820A TW108109820A TWI729366B TW I729366 B TWI729366 B TW I729366B TW 108109820 A TW108109820 A TW 108109820A TW 108109820 A TW108109820 A TW 108109820A TW I729366 B TWI729366 B TW I729366B
Authority
TW
Taiwan
Prior art keywords
pattern
light
substrate
outer peripheral
peripheral surface
Prior art date
Application number
TW108109820A
Other languages
English (en)
Chinese (zh)
Other versions
TW201926542A (zh
Inventor
加藤正紀
鬼頭義昭
堀正和
木內徹
Original Assignee
日商尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商尼康股份有限公司 filed Critical 日商尼康股份有限公司
Publication of TW201926542A publication Critical patent/TW201926542A/zh
Application granted granted Critical
Publication of TWI729366B publication Critical patent/TWI729366B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)
TW108109820A 2012-08-28 2013-04-12 圖案形成裝置 TWI729366B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012188116 2012-08-28
JPJP2012-188116 2012-08-28

Publications (2)

Publication Number Publication Date
TW201926542A TW201926542A (zh) 2019-07-01
TWI729366B true TWI729366B (zh) 2021-06-01

Family

ID=50182989

Family Applications (4)

Application Number Title Priority Date Filing Date
TW108109820A TWI729366B (zh) 2012-08-28 2013-04-12 圖案形成裝置
TW102112961A TWI581362B (zh) 2012-08-28 2013-04-12 A substrate supporting device, and an exposure device
TW107111761A TWI658535B (zh) 2012-08-28 2013-04-12 Pattern forming device
TW106108716A TWI624001B (zh) 2012-08-28 2013-04-12 Substrate support device

Family Applications After (3)

Application Number Title Priority Date Filing Date
TW102112961A TWI581362B (zh) 2012-08-28 2013-04-12 A substrate supporting device, and an exposure device
TW107111761A TWI658535B (zh) 2012-08-28 2013-04-12 Pattern forming device
TW106108716A TWI624001B (zh) 2012-08-28 2013-04-12 Substrate support device

Country Status (7)

Country Link
JP (4) JP6245174B2 (enExample)
KR (4) KR101999497B1 (enExample)
CN (3) CN107656427B (enExample)
HK (1) HK1246408A1 (enExample)
IN (1) IN2015DN01909A (enExample)
TW (4) TWI729366B (enExample)
WO (1) WO2014034161A1 (enExample)

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TWI709006B (zh) * 2014-04-01 2020-11-01 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
KR102211609B1 (ko) * 2014-09-04 2021-02-03 가부시키가이샤 니콘 처리 시스템 및 디바이스 제조 방법
KR102345439B1 (ko) * 2015-01-15 2021-12-30 삼성디스플레이 주식회사 롤투롤 노광 시스템
JP6413784B2 (ja) * 2015-01-19 2018-10-31 株式会社ニコン 基板処理装置及びデバイス製造方法
WO2016136974A1 (ja) * 2015-02-27 2016-09-01 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法
CN107430272B (zh) * 2015-03-20 2020-05-29 株式会社尼康 光束扫描装置、光束扫描方法、及描绘装置
JP2017058494A (ja) * 2015-09-16 2017-03-23 株式会社ニコン パターン描画装置、パターン描画方法、基板処理装置、および、デバイス製造方法
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JP6551175B2 (ja) * 2015-11-10 2019-07-31 株式会社ニコン 回転円筒体の計測装置、基板処理装置及びデバイス製造方法
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JP6589607B2 (ja) * 2015-12-04 2019-10-16 株式会社ニコン 描画装置および描画方法
CN110031968B (zh) 2016-03-30 2022-03-15 株式会社尼康 图案描绘装置、图案描绘方法、以及元件制造方法
CN109154784B (zh) * 2016-05-19 2021-06-11 株式会社尼康 基板支承装置、曝光装置、及图案化装置
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
JP6680330B2 (ja) * 2018-09-14 2020-04-15 株式会社ニコン パターン形成装置
JP6587026B2 (ja) * 2018-10-30 2019-10-09 株式会社ニコン パターン露光装置
CN112114499B (zh) * 2019-06-19 2022-02-11 上海微电子装备（集团）股份有限公司 一种曝光装置、光刻设备及太阳能电池电极的制备方法
JP6787447B2 (ja) * 2019-06-27 2020-11-18 株式会社ニコン 基板処理装置
JP6750712B2 (ja) * 2019-06-27 2020-09-02 株式会社ニコン 基板処理装置、及びデバイス製造方法
JP6996580B2 (ja) * 2020-03-05 2022-01-17 株式会社ニコン 基板処理方法
JP7570826B2 (ja) * 2020-05-25 2024-10-22 キヤノン株式会社 露光装置、露光方法、及び物品の製造方法
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EP4382870A1 (en) * 2022-12-08 2024-06-12 Kaunas University of Technology Anti-fogging incremental scales for optical encoders and fabrication method thereof

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Also Published As

Publication number Publication date
JPWO2014034161A1 (ja) 2016-08-08
CN104583874A (zh) 2015-04-29
TW201926542A (zh) 2019-07-01
JP2018189989A (ja) 2018-11-29
KR101812857B1 (ko) 2017-12-27
CN104583874B (zh) 2017-11-03
TW201828405A (zh) 2018-08-01
KR101999497B1 (ko) 2019-07-11
IN2015DN01909A (enExample) 2015-08-07
JP2018013805A (ja) 2018-01-25
CN106886133B (zh) 2018-06-29
WO2014034161A1 (ja) 2014-03-06
TW201409603A (zh) 2014-03-01
JP6558484B2 (ja) 2019-08-14
JP2017083855A (ja) 2017-05-18
KR101855612B1 (ko) 2018-05-04
JP6229785B2 (ja) 2017-11-15
KR20180035950A (ko) 2018-04-06
HK1246408A1 (zh) 2018-09-07
JP6414308B2 (ja) 2018-10-31
CN107656427B (zh) 2020-07-03
KR20180112115A (ko) 2018-10-11
KR20160143892A (ko) 2016-12-14
KR101907365B1 (ko) 2018-10-11
TW201727818A (zh) 2017-08-01
TWI581362B (zh) 2017-05-01
JP6245174B2 (ja) 2017-12-13
CN106886133A (zh) 2017-06-23
HK1207694A1 (en) 2016-02-05
TWI658535B (zh) 2019-05-01
CN107656427A (zh) 2018-02-02
KR20150048113A (ko) 2015-05-06
TWI624001B (zh) 2018-05-11

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