IN2015DN01909A - - Google Patents

Info

Publication number
IN2015DN01909A
IN2015DN01909A IN1909DEN2015A IN2015DN01909A IN 2015DN01909 A IN2015DN01909 A IN 2015DN01909A IN 1909DEN2015 A IN1909DEN2015 A IN 1909DEN2015A IN 2015DN01909 A IN2015DN01909 A IN 2015DN01909A
Authority
IN
India
Prior art keywords
substrate base
light
substrate
reflectance
relation
Prior art date
Application number
Inventor
Masaki Kato
Yoshiaki Kito
Masakazu Hori
Tohru Kiuchi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of IN2015DN01909A publication Critical patent/IN2015DN01909A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
  • Laminated Bodies (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

Provided are: a substrate base provided with a surface for supporting in a flat state or a curved state having a prescribed curve a flexible and transmissive substrate to be optically treated; and a film formed on the surface of the substrate base and having a reflectance of 50% or less in relation to the light (ultraviolet rays for exposure visible light for alignment etc.) used in the optical treatment.
IN1909DEN2015 2012-08-28 2013-03-13 IN2015DN01909A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012188116 2012-08-28
PCT/JP2013/057062 WO2014034161A1 (en) 2012-08-28 2013-03-13 Substrate support device and exposure device

Publications (1)

Publication Number Publication Date
IN2015DN01909A true IN2015DN01909A (en) 2015-08-07

Family

ID=50182989

Family Applications (1)

Application Number Title Priority Date Filing Date
IN1909DEN2015 IN2015DN01909A (en) 2012-08-28 2013-03-13

Country Status (7)

Country Link
JP (4) JP6245174B2 (en)
KR (4) KR101812857B1 (en)
CN (3) CN106886133B (en)
HK (2) HK1246408A1 (en)
IN (1) IN2015DN01909A (en)
TW (4) TWI658535B (en)
WO (1) WO2014034161A1 (en)

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JP6413784B2 (en) * 2015-01-19 2018-10-31 株式会社ニコン Substrate processing apparatus and device manufacturing method
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KR102169506B1 (en) * 2015-03-20 2020-10-23 가부시키가이샤 니콘 Beam scanning device, beam scanning method, and pattern drawing device
JP2017058494A (en) * 2015-09-16 2017-03-23 株式会社ニコン Pattern drawing device, pattern drawing method, substrate treatment device and device manufacturing method
WO2017073608A1 (en) * 2015-10-30 2017-05-04 株式会社ニコン Substrate processing apparatus, substrate processing apparatus adjustment method, device production system, and device production method
JP6551175B2 (en) * 2015-11-10 2019-07-31 株式会社ニコン Rotating cylindrical body measuring apparatus, substrate processing apparatus, and device manufacturing method
US9918375B2 (en) * 2015-11-16 2018-03-13 Kla-Tencor Corporation Plasma based light source having a target material coated on a cylindrically-symmetric element
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US11143862B2 (en) 2016-03-30 2021-10-12 Nikon Corporation Pattern drawing device, pattern drawing method, and method for manufacturing device
JP7114459B2 (en) * 2016-05-19 2022-08-08 株式会社ニコン patterning device
TWI736621B (en) * 2016-10-04 2021-08-21 日商尼康股份有限公司 Pattern drawing device and pattern drawing method
JP6680330B2 (en) * 2018-09-14 2020-04-15 株式会社ニコン Pattern forming equipment
JP6587026B2 (en) * 2018-10-30 2019-10-09 株式会社ニコン Pattern exposure equipment
CN112114499B (en) * 2019-06-19 2022-02-11 上海微电子装备（集团）股份有限公司 Exposure device, photoetching equipment and preparation method of solar cell electrode
JP6787447B2 (en) * 2019-06-27 2020-11-18 株式会社ニコン Board processing equipment
JP6996580B2 (en) * 2020-03-05 2022-01-17 株式会社ニコン Board processing method
US20220244631A1 (en) * 2021-02-03 2022-08-04 Visera Technologies Company Limited Exposure mask
EP4382870A1 (en) * 2022-12-08 2024-06-12 Kaunas University of Technology Anti-fogging incremental scales for optical encoders and fabrication method thereof

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Also Published As

Publication number Publication date
TW201828405A (en) 2018-08-01
KR20160143892A (en) 2016-12-14
TWI658535B (en) 2019-05-01
TW201727818A (en) 2017-08-01
WO2014034161A1 (en) 2014-03-06
CN104583874A (en) 2015-04-29
KR101999497B1 (en) 2019-07-11
TWI729366B (en) 2021-06-01
CN104583874B (en) 2017-11-03
JP2018013805A (en) 2018-01-25
KR20180035950A (en) 2018-04-06
JP2017083855A (en) 2017-05-18
HK1207694A1 (en) 2016-02-05
JP6229785B2 (en) 2017-11-15
TWI624001B (en) 2018-05-11
CN107656427A (en) 2018-02-02
KR20150048113A (en) 2015-05-06
KR101812857B1 (en) 2017-12-27
CN106886133A (en) 2017-06-23
JP2018189989A (en) 2018-11-29
JPWO2014034161A1 (en) 2016-08-08
JP6558484B2 (en) 2019-08-14
TW201926542A (en) 2019-07-01
KR20180112115A (en) 2018-10-11
JP6245174B2 (en) 2017-12-13
CN106886133B (en) 2018-06-29
CN107656427B (en) 2020-07-03
KR101907365B1 (en) 2018-10-11
JP6414308B2 (en) 2018-10-31
TW201409603A (en) 2014-03-01
KR101855612B1 (en) 2018-05-04
HK1246408A1 (en) 2018-09-07
TWI581362B (en) 2017-05-01

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