JP4502746B2 - Liquid crystal substrate holder and manufacturing method thereof - Google Patents

Description

  The present invention relates to a liquid crystal substrate holder such as an exposure apparatus for manufacturing a liquid crystal display, and in particular, a liquid crystal that does not impair the accuracy of exposure, alignment, or focus adjustment due to reflection of illumination light transmitted through a transparent or translucent liquid crystal substrate. The present invention relates to a substrate holder and a method for manufacturing the same.

  Conventionally, a liquid crystal substrate holding disk used in an exposure apparatus for manufacturing a liquid crystal display has a base material made of an aluminum-based metal anodized, a base material made of stainless steel, anodized ceramic, or an anodized ceramic. A material in which a material such as TiC was coated was used.

  FIG. 6A is a perspective view showing a schematic view of a chuck which is an example of a conventional liquid crystal substrate holding disk.

  Conventionally, as shown in FIG. 6A, the liquid crystal substrate holder 11 has a support surface 12 for holding the transparent or translucent liquid crystal substrate 6 on the upper surface of the base 14 and an unsupported lower than the support surface 12. The liquid crystal substrate 6 is held, and illumination light for exposure or illumination light is applied for alignment or focus adjustment. And since a part of illumination light irradiated to the liquid crystal substrate 6 permeate | transmits the liquid crystal substrate 6, and reaches | attains the liquid crystal substrate holding | maintenance board 11, in order to suppress reflection of irradiation light as much as possible, the support surface 12 is formed. As a result, the area of the liquid crystal substrate holding plate 11 in contact with the liquid crystal substrate 6 is reduced, and most of the irradiation light is reflected by the surface of the non-supporting surface 12 of the liquid crystal substrate holding plate 11.

  Since these liquid crystal substrate holders 11 are required to be held with high accuracy over time, generally, ceramics having high rigidity are frequently used. In particular, black ceramics have been used for the liquid crystal substrate holding plate 11 mounted on an exposure apparatus for manufacturing a liquid crystal display.

An example is shown in FIG. FIG. 6B is an enlarged cross-sectional view of a part of the liquid crystal substrate holding disk of FIG. As shown in the figure, a coating layer 17 made of ceramic is formed on the surfaces of the support surface 12 and the non-support surface 13, and more specifically, the reflectance of the substrate 14 having a roughened surface. A first coating layer (not shown) made of low SiC and a second coating layer (not shown) made of a transparent material Al ₂ O ₃ having a smooth surface on the first coating layer. (See Patent Document 1).

  Furthermore, a method of reducing the reflectance by forming a coating layer 17 of an amorphous hard carbon film on the surfaces of the support surface 12 and the non-support surface 13 has been proposed (see Patent Document 2).

  By the way, as a method for lowering the reflectance described above, generally, the color of the ceramic forming the liquid crystal substrate holding plate 11 is black, which absorbs light more easily than white or milky white ceramics that easily reflect light. Although it is known that the ceramics to be exhibited are suitable, alumina that is particularly inexpensive and low in processing cost has been desired.

As an example of alumina exhibiting black, Patent Document 3 discloses a black alumina sintered body containing Al ₂ O ₃ as a main component and components of Mn ₂ O ₃ , Fe ₂ O ₃ , CoO, and Cr ₂ O _3. Proposed. Patent Document 4 proposes a black low thermal expansion ceramic sintered body containing 0 to 2.5% by weight of Li ₂ O. Furthermore, Patent Document 4 proposes a colored ceramic containing Al ₂ O ₃ as a main component and containing Fe ₂ O ₃ , Co ₂ O ₃ , and CuO components.

In Patent Document 6, a transparent film such as a resin film containing glaze or a conductive substance or glass is formed on the surface of the liquid crystal device holding plate 11 using black alumina ceramic. Means have been proposed for reducing the reflectance by roughening the surface.
Japanese Patent Laid-Open No. 5-205997 JP-A-9-45753 JP-A-5-238810 JP 2001-19540 A JP-A-5-254922 JP 2004-128325 A

  However, if a part of the illumination light incident on the liquid crystal substrate 6 is reflected by the surface of the liquid crystal substrate holding plate 11 and enters the specific portion of the liquid crystal substrate 6 again, an unnecessary portion of the resist that is not etched is exposed. Then, the accuracy of alignment and focus adjustment is lowered, or the irradiated light is transmitted through the liquid crystal substrate 6 and reflected by the surface of the liquid crystal substrate holding plate 11, and the same image as the exposed image is seen from the lower surface of the liquid crystal substrate 6. There have been problems such as double exposure due to the irradiation, and out-of-focus that increases the line width. In particular, since the liquid crystal substrate 6 is transparent or translucent glass, incident light is easily transmitted.

  Therefore, there has been a demand for a liquid crystal substrate holding plate 11 having a low reflectance that does not expose unnecessary portions of the resist due to reflection of illumination light transmitted through the liquid crystal substrate 6.

  By the way, Patent Documents 2 and 4 using black alumina do not refer to the low reflectance as described above. If it is desired to reduce the reflectivity, the reflectivity can be reduced by improving the surface state of the reflecting surface. With the increase in size, the area of the non-support surface 13 that is technically difficult to finish to a mirror surface rather than the support surface 12 occupies a large area, so that the occurrence of blurring cannot be sufficiently suppressed.

On the other hand, the material characteristics of the ceramics of Patent Document 4 are Young's modulus of 165 GPa or less and specific rigidity of 68.5 GPa · cm ³ / g or less. The substrate 14 used for the liquid crystal substrate holding plate 11 of the exposure apparatus includes: In many cases, complicated processing such as mounting holes and grooves in other members is performed, and it is necessary to support the liquid crystal substrate 6 for the purpose of preventing deformation of the material when performing machining processing or the like. When the specific rigidity is low, there is a problem that high-precision machining is difficult.

  The present invention has been made in view of the above-described problems. Unnecessary portions of the resist are exposed by the reflection of the illumination light transmitted through the liquid crystal substrate 6, and without deteriorating the accuracy of alignment and focus adjustment. An object of the present invention is to provide an inexpensive and large-sized liquid crystal substrate holding plate capable of preventing high-precision and high-definition processing.

In order to solve the above-mentioned problems, a liquid crystal substrate holding disk according to the present invention has a support surface for holding a transparent or translucent liquid crystal substrate on the upper surface of a substrate, and a non-support surface that is lower than the support surface. In the holding plate, the base is formed of a black ceramic having a specific rigidity of 80 GPa · cm ³ / g or more, and a non-support surface is covered with a low reflectance resin film.

Coloration of the substrate and the resin film, color solid ^{(L *, a *, b} *) L * in is characterized in that it is 60 or less.

The substrate is formed of alumina containing at least one of TiO ₂ , CoO, MnO ₂ , and Fe ₂ O ₃ .

  The alumina has a purity of 90% or more.

  Next, according to the method for manufacturing a liquid crystal substrate holding disk of the present invention, a base made of black ceramics is prepared, and a support surface and a non-support surface for holding a transparent or translucent liquid crystal substrate by blasting the upper surface of the base And forming a low reflectance resin film on the upper surface of the substrate, and then removing the low reflectance resin film on the support surface.

  After removing the low-reflectance resin film on the support surface, re-heat treatment is performed at a heat treatment temperature of 100 ° C. or lower than the film formation temperature of the low-reflectance resin film.

According to the configuration of the present invention, since the specific rigidity of the substrate is formed of black ceramics with a power of 80 GPa · cm ³ / g or more and the non-support surface is coated with the low reflectance resin film, The panel can also reduce the total reflectivity of the irradiation light transmitted through the liquid crystal substrate, so that the irradiation light can be prevented from defocusing on the liquid crystal substrate, and high-definition exposure can be performed. Deformation is prevented and processing can be performed with high accuracy.

  Hereinafter, the best mode for carrying out the present invention will be described.

  1A and 1B are schematic views of a chuck which is an example of a liquid crystal substrate holding plate according to the present invention. FIG. 1A is a perspective view thereof, and FIG. 1B is an enlarged cross-sectional view of a part of the liquid crystal substrate holding plate. Each figure is shown. FIG. 2 is an enlarged perspective view showing a part of the support portion of the liquid crystal substrate holding disk according to the present invention.

The liquid crystal substrate holding disk 1 of the present invention comprises a flat substrate 4 made of black ceramics having a specific rigidity of 80 GPa · cm ³ / g or more, and a plurality of protrusions 200 are formed on the surface thereof. Consists of a support surface 2 that contacts and supports the liquid crystal substrate 6 and a non-support surface 3 that is lower than the support surface 2.

  By the way, in the liquid crystal substrate holder 1, when the liquid crystal substrate 6 is supported on the surface and exposure is performed from above, lowering the reflectivity does not reduce the accuracy of alignment and focus adjustment, and the out of focus. It is considered preferable also from the viewpoint of preventing the above. Therefore, it is known that the surface of the liquid crystal substrate holding plate 1 should be black to reduce the reflectance. However, in the present invention, the non-support surface 3 is coated with the low reflectance resin 7. In addition, it is possible to sufficiently prevent out of focus.

  The material of the low reflectance resin film 7 may be polyimide or fluororesin, but preferably black fluororesin.

  Further, the total reflectance can be greatly reduced by coating the non-supporting surface 3 with a low reflectance resin film 7 having a thickness of 20 to 50 μm. Therefore, when the film thickness is less than 20 μm, it is difficult to form a film due to the characteristics of the film. When forming the substrate 4, both the support surface 2 and the non-support surface 3 are once coated and then the support surface 2. This is because the low-reflection resin film 7 coated thereon is removed by grinding or polishing, and at this time, the low-reflection resin film coated on the non-supporting surface may be peeled off simultaneously with the processing.

  On the other hand, if the film thickness is greater than 50 μm, internal stress is generated due to the difference in the coefficient of linear expansion from the substrate 4, making it difficult to form the film.

  The arithmetic average roughness (Ra) of the support surface 2 is preferably in the range of 0.3 to 1.2 μm. This is because the support surface 2 closest to the liquid crystal substrate 6 preferably has a low reflection. When the arithmetic average roughness (Ra) is a value smaller than 0.3 μm, the irradiation light is reflected. The total reflectance is increased, which causes blurring on the liquid crystal substrate 6. On the contrary, when the arithmetic average roughness is a value larger than 1.2 μm, the surface of the liquid crystal substrate 6 in contact with the support surface 2 may be damaged as well as the total reflectance. The value as a product of 6 will be spoiled. Therefore, the arithmetic average roughness (Ra) of the support surface 2 needs to be in the range of 0.3 to 1.2 μm, and preferably in the range of 0.6 to 1.0 μm.

Further, unlike the coating of SiC or Al ₂ O ₃ in Patent Documents 1 and 2 and the amorphous hard carbon film, the low reflectance resin film 7 can be formed without using a vacuum vessel. Stress can be sufficiently relaxed.

By the way, the black ceramics forming the substrate 4 is preferably formed from alumina containing TiO ₂ , CoO, MnO ₂ , and Fe ₂ O ₃ , and the alumina purity is 90% or more. It is formed by adding known SiO ₂ , MgO or the like conventionally used as a sintering aid. As preferable ranges, Fe ₂ O ₃ is 0.5 to 1.0% by weight, MnO ₂ is 4.0 to 5.5% by weight, CoO is 1.0 to 2.0% by weight, and TiO ₂ is 0.0% by weight. What is necessary is just to mix 5 to 1.0 weight%.

  As a result, the obtained alumina becomes black ceramics, and much of the illumination light transmitted through the liquid crystal substrate can be absorbed by the black surface with low reflectivity.

Furthermore, the purity of alumina is desirably 90% or more. If the purity is less than 90%, the Young's modulus is lowered, and the surface accuracy as the liquid crystal substrate holding disk 1 cannot be maintained. In particular, the specific rigidity (Young's modulus / specific gravity) is an important factor in the liquid crystal substrate holder 1, and the specific rigidity becomes a value smaller than 80 GPa · cm ³ / g. Not preferable. Since the alumina purity is 90% or higher and the material has a high specific rigidity, even if the support surface 1 is a liquid crystal substrate holding plate 11 having a size of □ 600 mm or more, for example, the flatness thereof is highly accurate to 10 μm or less. It can be finished.

  The substrate 4 can be made of a material having a high mechanical strength with a Young's modulus of 300 to 350 GPa, a Vickers hardness (HV1) of 12 to 14 GPa, and a three-point bending strength of 300 to 350 MPa.

Further, a dense alumina having a void occupancy of 4% or less, an average void diameter of 4 μm, and an apparent density of 3.8 to 3.9 g / cm ³ can be obtained. Here, if the void occupancy is 4% or less, the probability that the light wave incident by the void is reflected in various directions becomes low, and the diffuse reflectance can be reduced. Moreover, the same thing becomes possible, so that an average void diameter becomes small. Furthermore, it is preferable that the apparent density falls within the above range. If the apparent density is larger than the above range, the specific rigidity is lowered. If the apparent density is smaller, the Young's modulus is lowered, and the specific rigidity is similarly reduced.

  Note that the liquid crystal substrate 6 supported by the liquid crystal substrate holding plate 1 is adsorbed thereto by a known adsorbing means. For example, when used in the atmosphere, the liquid crystal substrate 6 can be sucked by vacuum suction. Alternatively, it may be simply placed and the liquid crystal substrate is mechanically attached and held.

  By the way, the coloring of the base 4 and the low-reflectance resin film 7 needs to be black ceramics and black resins, respectively. The black type refers to a dark color close to black. Any coloration such as brown, reddish brown, green brown, ultramarine blue, red bean color may be used. The thing of the color tone which exhibits black is preferable.

As the black system, the L ^* a ^* b ^* color system that is most widely used for color difference measurement in color management in the Japanese industrial field may be used. Here, it is preferable to use the color tone of the black ceramic used in the present invention having a lightness index in the above L ^* a ^* b ^* color system in the range of L ^* <60. If the lightness index is in a range where L ^* is larger than 60, the reflectivity is high, and even in the configuration of the present invention, it is affected by the reflection from the non-supporting surface 3 and is totally blurred. Become a statue. Therefore, more preferably, the brightness index is in the range of L ^* <40.

In the L ^* a ^* b ^* color system, L ^* indicates a lightness index, that is, the degree of brightness perception, and a ^* and b ^* are perceptual chromaticity indices, that is, two attributes of hue and saturation. It shows the attributes of visual perception that are considered together. Hue a ^* and b ^* not very relevant to the factors influencing the reflectance, it is known that it affects the most a lightness index L ^*, what is the lightness index L ^* It is sufficient to pay attention to whether the value is a value, and since the dependence of the perceptual chromaticity index of a ^* b ^{* in} that case is low, it can be understood that the color tone may be close to that of black.

In the present invention, tristimulus values are measured according to JIS K 5600-4-5 using a color difference gloss meter (Σ90) manufactured by Nippon Denshoku Co., Ltd., and CIE 1976 (L ^* , a ^* , b ^* ) color. Calculate the color coordinates of the space.

  In addition, since there is no material to compare this time, it conformed to the following JIS K 5600-4-5.

L ^* : Index representing lightness (0 to 100). 0 is the darkest value and 100 is the brightest value a ^* : red is on the + side, green is on the-side, 0 is an achromatic color, and the saturation is higher as the absolute value is larger b ^* : yellow is on the + side -Side is blue, 0 represents an achromatic color, and the higher the absolute value, the higher the saturation. As the irradiation light used when exposing the liquid crystal substrate 6, irradiation light in the ultraviolet region is often used, Generally, it may be considered in the wavelength region of 400 nm or less in the ultraviolet region, but for safety reasons, irradiation light in the wavelength region up to 450 nm may be included, and the total reflectance is 10% with the irradiation light of 450 nm or less. It is desired that the liquid crystal substrate 6 be out of focus.

  According to the present invention, since it is not necessary to coat the support surface 2 processed with high accuracy with a material having low reflectance, there is no deterioration in accuracy due to the coating layer, and there is no problem due to peeling of the coating layer. The flatness of the liquid crystal substrate 6 adsorbed on the liquid crystal substrate 6 can be held while being supported with high accuracy.

  Next, the manufacturing method of this invention is demonstrated.

First, SiO ₂ , MgO or the like conventionally used as a sintering aid is added to 90% by weight or more of Al ₂ O ₃ , and in order to further blacken, Fe ₂ O ₃ , MnO ₂ , CoO, TiO ₂ are added. After mixing and pulverizing in a wet manner, spray drying and granulation are performed using a spray dryer to produce a secondary material. The obtained secondary raw material is molded into a desired shape at a pressure in the range of 80 to 200 MPa by CIP molding or mechanical press molding.

  Next, alumina ceramics are obtained by firing in an oxidizing atmosphere so that the maximum temperature is in the range of 1400 to 1700 ° C. Then, after the plate-like body of the substrate 4 is formed, the upper surface is finished so that the arithmetic average roughness is in the range of 1.2 μm or less, and then the support surface 2 that holds the transparent or translucent liquid crystal substrate 6 by the blasting process is formed. The support surface 3 is formed.

  And the formation method of the support surface 2 and the non-support surface 3 should just be formed by grinding processing or blast processing, and finishes the arithmetic mean roughness (Ra) in the range of 1-2 micrometers by making the surface into a rough state. The surface can be used. Within this range, even if the reflected light is reversely applied to the back surface of the liquid crystal substrate, the resist film on the wafer surface is exposed and does not hinder alignment or focus adjustment.

  By the way, when the arithmetic average roughness (Ra) is a value larger than 2 μm, it is necessary to make the abrasive grains coarse and large, but in this case, the mask pattern at the time of blasting cannot be made fine. And the pattern was broken. On the other hand, when the arithmetic average roughness (Ra) is a value smaller than 1 μm, it is necessary to make the abrasive grains of the blast fine, so that there is a problem that it takes time for processing. Therefore, the abrasive grains used for blasting may be in the range of # 200 to # 1000, and the surface of the non-supporting surface 3 obtained as a result is 1.0 to 2.0 μm in terms of arithmetic average roughness (Ra). It becomes the range.

  Next, after the low reflectance resin film 7 is formed on the entire surface, the low reflectance resin film 7 on the support surface 2 is removed. Specifically, an example of a method for forming the low-reflectance resin film 7 is introduced. The supporting surface 2 and the non-supporting surface 3 are degreased with a solvent such as xylene or by an air baking means, and then blasted with a shot blaster or the like. After forming a metal sprayed layer directly or by spraying means on the blasted surface, an undercoat resin coating is applied using a spray gun.

  After that, undercoating is performed by touch-drying under a predetermined drying condition (250 ° C / 30 minutes) in a heating furnace such as a hot-air circulating electric furnace, and a low-reflectivity resin film 7 for overcoating is applied on the surface of the undercoating paint using a spray gun Then, it is baked in a predetermined baking condition (400 ° C./30 to 60 minutes) in the heating furnace, and is overcoated for natural cooling. Thereafter, each support surface 2 that is a surface that reflects the illumination light is processed with high precision at the same time as the removal of the low-reflectance resin film 7 by grinding or lapping, and the non-support surface 3 other than the support surface 2 The low reflectance resin film 7 remains.

  Further, in the method for manufacturing the liquid crystal substrate holding disk of the present invention, after removing the low reflectance resin film 7 on the support surface 2, the heat treatment temperature is 100 ° C. or lower than the film formation temperature of the low reflectance resin film 7. Reheat treatment may be performed.

  When this method is added, the low reflectivity resin film 7 is melted by heat treatment at the end of the support surface 2 as shown in FIG. Further, since the cross section of the low reflectance resin film 7 does not serve as a mounting surface with the liquid crystal substrate 6, the reflectance can be easily controlled.

  The substrate 4 of the liquid crystal substrate holding disk 1 of the present invention may have any shape as long as it is suitable for holding the liquid crystal substrate 6 regardless of the shape of a disc or a square plate. Absent.

  Examples of the present invention will be described below.

(Experimental example 1)
91% by weight of Al ₂ O ₃ for blackening, Fe ₂ O ₃ : 0.7% by weight, MnO ₂ : 4.7% by weight, CoO: 1.6% by weight, TiO ₂ : 0.8% by weight % As a sintering aid, SiO ₂ and MgO were further added and mixed in a wet manner, and spray drying was performed using a spray dryer. Then, after mixing and pulverizing in a wet state, spray drying and granulation are performed using a spray dryer to produce a secondary raw material. The obtained secondary raw material was molded into a plate-like body at a pressure of 80 MPa by CIP molding. Next, after firing in an oxidizing atmosphere at 1430 ° C. to obtain an alumina sintered body, a disk of φ100 mm × 15 mm is manufactured.

  Then, the surface of the disk is finished into four types of arithmetic average roughness (Ra) of 0.12 μm, 0.33 μm, 0.63 μm, and 1.30 μm, and the upper surface of the base is blasted to support and non-support The surface is formed, the top surface of the support surface is φ0.8 mm in area, the pitch is 6 mm, the height is 0.5 mm, and the entire surface is prepared. For samples having a low-reflectance resin film, samples prepared by removing the low-reflectance resin film on the support surface were prepared. In addition, as the low reflectance resin film, two types of black fluororesin and polyimide resin were coated and baked at 400 ° C.

  Furthermore, after removing the low reflectance resin film, a sample to be reheated at a heat treatment temperature of 280 ° C. or less was also prepared.

  A 0.5 mm liquid crystal substrate coated with a resist was placed on each sample and irradiated with 400 nm exposure, and it was confirmed whether a 1 μm line could be normally exposed to the resist.

The results are shown in Table 1.

  If the target line width is 1 ± 0.1 μm and the light is normally exposed, mark “◯”. The line is out of focus and thickened outside the range of 1 ± 0.1 μm, or double lines are exposed. What was done was made into "x".

  For reference, a 30 mm × 8 mm disk is manufactured. Then, the surface of the disk was finished into four types of arithmetic average roughness (Ra) of 0.12 μm, 0.33 μm, 0.63 μm, and 1.30 μm, and further finished to arithmetic average roughness (Ra) of 1.30 μm. The surface was covered with a black fluororesin and a polyimide resin as a low-reflectance resin film, and a total of six types of samples were irradiated with light of 360 nm to 740 nm, and the reflectance was measured. These reflectances were measured in the wavelength range of 360 nm to 740 nm using a Minolta spectrophotometer CM-3700d apparatus.

Further, if the alumina is manufactured by the same manufacturing method as this Lot, the material has a Young's modulus of 314 GPa, a three-point bending strength of 324 MPa, a Vickers hardness (Hv1) of 12.7 GPa, and an apparent density of 3.86 g / cm ³ . The characteristics were obtained, and the specific rigidity was 81.3 GPa · cm ³ / g, and a material capable of high-precision machining could be obtained.

  ADVANTAGE OF THE INVENTION According to this invention, the liquid crystal substrate holding | maintenance board suitable for hold | maintaining a transparent or semi-transparent liquid crystal substrate without the blurring by irradiated light can be provided.

  Moreover, it can be expected as a light absorbing material that makes total reflection light low reflection.

1A and 1B are schematic views of a chuck which is an example of a liquid crystal substrate holding plate according to the present invention, in which FIG. 1A is a perspective view and FIG. 2B is an enlarged cross-sectional view of a part of the liquid crystal substrate holding plate. ing. In the liquid crystal substrate holding plate according to the present invention, (a) is an exploded perspective sectional view, and (b) is an enlarged view thereof. It is a graph which shows the measurement data of the reflectance by the base | substrate of this invention. It is a figure which shows the schematic of the chuck | zipper which is an example of the conventional liquid crystal substrate holding | maintenance board, (a) is the perspective view, (b) has shown sectional drawing to which a part of said liquid crystal substrate holding board was expanded, respectively. .

Explanation of symbols

DESCRIPTION OF SYMBOLS 1, 11 ... Liquid crystal substrate holding disk 2, 12 ... Support surface 3, 13 ... Non-support surface 4, 14 ... Base | substrate 5 ... Liquid crystal substrate holding device 6 ... Liquid crystal substrate 7 ... Resin film | membrane 17 ... Covering layer

Claims (6)

In a liquid crystal substrate holder having a support surface for holding a transparent or translucent liquid crystal substrate on the upper surface of the substrate and a non-support surface that is lower than the support surface, the substrate is a black having a specific rigidity of 80 GPa · cm ³ / g or more. A liquid crystal substrate holding plate, characterized in that it is made of a ceramic and has a non-supporting surface coated with a low reflectance resin film. Coloration of the substrate and the resin film, color solid ^{(L *, a *, b} *) liquid crystal substrate holding plate according to claim 1, wherein the L ^* is 60 or less in the. _3. The liquid crystal substrate holding disk according to claim 1, wherein the substrate is made of alumina containing at least one of TiO ₂ , CoO, MnO ₂ , and Fe ₂ O ₃ . The liquid crystal substrate holder according to any one of claims 1 to 3, wherein the alumina has a purity of 90% or more. A base made of black ceramics is prepared, and the upper surface of the base is blasted to form a support surface and a non-support surface for holding a transparent or translucent liquid crystal substrate, and a low reflectance resin film is formed on the upper surface of the substrate Thereafter, the low reflectance resin film on the support surface is removed. 6. The liquid crystal substrate holding device according to claim 5, wherein after the low-reflectance resin film on the support surface is removed, re-heat treatment is performed at a heat treatment temperature of 100 ° C. or lower than the film formation temperature of the low-reflectance resin film. Board manufacturing method.

Images