IN2015DN01909A - - Google Patents
Info
- Publication number
- IN2015DN01909A IN2015DN01909A IN1909DEN2015A IN2015DN01909A IN 2015DN01909 A IN2015DN01909 A IN 2015DN01909A IN 1909DEN2015 A IN1909DEN2015 A IN 1909DEN2015A IN 2015DN01909 A IN2015DN01909 A IN 2015DN01909A
- Authority
- IN
- India
- Prior art keywords
- substrate base
- light
- substrate
- reflectance
- relation
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract 3
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012188116 | 2012-08-28 | ||
| PCT/JP2013/057062 WO2014034161A1 (ja) | 2012-08-28 | 2013-03-13 | 基板支持装置、及び露光装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN2015DN01909A true IN2015DN01909A (enExample) | 2015-08-07 |
Family
ID=50182989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN1909DEN2015 IN2015DN01909A (enExample) | 2012-08-28 | 2013-03-13 |
Country Status (7)
| Country | Link |
|---|---|
| JP (4) | JP6245174B2 (enExample) |
| KR (4) | KR101999497B1 (enExample) |
| CN (3) | CN107656427B (enExample) |
| HK (1) | HK1246408A1 (enExample) |
| IN (1) | IN2015DN01909A (enExample) |
| TW (4) | TWI729366B (enExample) |
| WO (1) | WO2014034161A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IN2015DN01909A (enExample) * | 2012-08-28 | 2015-08-07 | Nikon Corp | |
| KR102387648B1 (ko) * | 2014-04-01 | 2022-04-18 | 가부시키가이샤 니콘 | 노광 장치 |
| TWI709006B (zh) * | 2014-04-01 | 2020-11-01 | 日商尼康股份有限公司 | 圖案描繪裝置及圖案描繪方法 |
| KR102211609B1 (ko) * | 2014-09-04 | 2021-02-03 | 가부시키가이샤 니콘 | 처리 시스템 및 디바이스 제조 방법 |
| KR102345439B1 (ko) * | 2015-01-15 | 2021-12-30 | 삼성디스플레이 주식회사 | 롤투롤 노광 시스템 |
| JP6413784B2 (ja) * | 2015-01-19 | 2018-10-31 | 株式会社ニコン | 基板処理装置及びデバイス製造方法 |
| WO2016136974A1 (ja) * | 2015-02-27 | 2016-09-01 | 株式会社ニコン | 基板処理装置、デバイス製造システム及びデバイス製造方法 |
| CN107430272B (zh) * | 2015-03-20 | 2020-05-29 | 株式会社尼康 | 光束扫描装置、光束扫描方法、及描绘装置 |
| JP2017058494A (ja) * | 2015-09-16 | 2017-03-23 | 株式会社ニコン | パターン描画装置、パターン描画方法、基板処理装置、および、デバイス製造方法 |
| KR102220858B1 (ko) * | 2015-10-30 | 2021-02-26 | 가부시키가이샤 니콘 | 기판 처리 장치, 기판 처리 장치의 조정 방법, 디바이스 제조 시스템 및 디바이스 제조 방법 |
| JP6551175B2 (ja) * | 2015-11-10 | 2019-07-31 | 株式会社ニコン | 回転円筒体の計測装置、基板処理装置及びデバイス製造方法 |
| US9918375B2 (en) * | 2015-11-16 | 2018-03-13 | Kla-Tencor Corporation | Plasma based light source having a target material coated on a cylindrically-symmetric element |
| JP6589607B2 (ja) * | 2015-12-04 | 2019-10-16 | 株式会社ニコン | 描画装置および描画方法 |
| CN110031968B (zh) | 2016-03-30 | 2022-03-15 | 株式会社尼康 | 图案描绘装置、图案描绘方法、以及元件制造方法 |
| CN109154784B (zh) * | 2016-05-19 | 2021-06-11 | 株式会社尼康 | 基板支承装置、曝光装置、及图案化装置 |
| TWI736621B (zh) * | 2016-10-04 | 2021-08-21 | 日商尼康股份有限公司 | 圖案描繪裝置及圖案描繪方法 |
| JP6680330B2 (ja) * | 2018-09-14 | 2020-04-15 | 株式会社ニコン | パターン形成装置 |
| JP6587026B2 (ja) * | 2018-10-30 | 2019-10-09 | 株式会社ニコン | パターン露光装置 |
| CN112114499B (zh) * | 2019-06-19 | 2022-02-11 | 上海微电子装备（集团）股份有限公司 | 一种曝光装置、光刻设备及太阳能电池电极的制备方法 |
| JP6787447B2 (ja) * | 2019-06-27 | 2020-11-18 | 株式会社ニコン | 基板処理装置 |
| JP6750712B2 (ja) * | 2019-06-27 | 2020-09-02 | 株式会社ニコン | 基板処理装置、及びデバイス製造方法 |
| JP6996580B2 (ja) * | 2020-03-05 | 2022-01-17 | 株式会社ニコン | 基板処理方法 |
| JP7570826B2 (ja) * | 2020-05-25 | 2024-10-22 | キヤノン株式会社 | 露光装置、露光方法、及び物品の製造方法 |
| US20220244631A1 (en) * | 2021-02-03 | 2022-08-04 | Visera Technologies Company Limited | Exposure mask |
| EP4382870A1 (en) * | 2022-12-08 | 2024-06-12 | Kaunas University of Technology | Anti-fogging incremental scales for optical encoders and fabrication method thereof |
Family Cites Families (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60134422A (ja) * | 1983-12-23 | 1985-07-17 | Nippon Telegr & Teleph Corp <Ntt> | パタ−ン形成法 |
| JPS61220428A (ja) * | 1985-03-27 | 1986-09-30 | Hitachi Ltd | 露光装置 |
| JP3095514B2 (ja) * | 1992-01-29 | 2000-10-03 | キヤノン株式会社 | 基板保持盤 |
| JPH08139168A (ja) * | 1994-11-10 | 1996-05-31 | Toto Ltd | 露光用保持治具 |
| JP2000012452A (ja) * | 1998-06-18 | 2000-01-14 | Nikon Corp | 露光装置 |
| JP2000187428A (ja) * | 1998-12-22 | 2000-07-04 | Sharp Corp | 画像形成装置 |
| JP4803901B2 (ja) * | 2001-05-22 | 2011-10-26 | キヤノン株式会社 | 位置合わせ方法、露光装置、および半導体デバイス製造方法 |
| JP2003094724A (ja) * | 2001-09-21 | 2003-04-03 | Fuji Photo Film Co Ltd | 画像記録装置 |
| JP2004128325A (ja) * | 2002-10-04 | 2004-04-22 | Toto Ltd | 保持具 |
| US7256811B2 (en) * | 2002-10-25 | 2007-08-14 | Kodak Graphic Communications Canada Company | Method and apparatus for imaging with multiple exposure heads |
| CN101241317B (zh) * | 2002-12-10 | 2010-11-17 | 株式会社尼康 | 曝光装置以及器件制造方法 |
| JP2004317728A (ja) * | 2003-04-15 | 2004-11-11 | Seiko Epson Corp | アライメントマーク付き基板及びその製造方法並びに電気光学装置用基板及び電気光学装置 |
| JP2005086072A (ja) * | 2003-09-10 | 2005-03-31 | Nikon Corp | アライメント方法、露光装置及び露光方法 |
| US7121496B2 (en) * | 2003-10-23 | 2006-10-17 | Hewlett-Packard Development Company, L.P. | Method and system for correcting web deformation during a roll-to-roll process |
| JP2005126769A (ja) * | 2003-10-24 | 2005-05-19 | Yoichi Yamagishi | 黒色皮膜および黒色皮膜の形成方法 |
| JP2005189366A (ja) * | 2003-12-25 | 2005-07-14 | Konica Minolta Medical & Graphic Inc | シート状印刷版材料、印刷版及び画像記録装置 |
| US7292308B2 (en) * | 2004-03-23 | 2007-11-06 | Asml Holding N.V. | System and method for patterning a flexible substrate in a lithography tool |
| JP2005322846A (ja) * | 2004-05-11 | 2005-11-17 | Pioneer Electronic Corp | 露光装置及び該露光装置を用いた平面型表示装置の製造方法 |
| JP2005347332A (ja) * | 2004-05-31 | 2005-12-15 | Nikon Corp | 位置計測装置、露光装置、デバイス製造方法 |
| JP4502746B2 (ja) * | 2004-08-26 | 2010-07-14 | 京セラ株式会社 | 液晶基板保持盤とその製造方法 |
| JP2006098719A (ja) * | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 露光装置 |
| JP2006330441A (ja) * | 2005-05-27 | 2006-12-07 | Nikon Corp | 投影露光装置及びマイクロデバイスの製造方法 |
| JP2007010785A (ja) * | 2005-06-28 | 2007-01-18 | Fujifilm Holdings Corp | 永久パターン形成方法 |
| KR101420669B1 (ko) * | 2005-09-07 | 2014-07-17 | 후지필름 가부시키가이샤 | 패턴 노광 방법 및 패턴 노광 장치 |
| JP4861778B2 (ja) * | 2005-09-08 | 2012-01-25 | 富士フイルム株式会社 | パターン露光方法及び装置 |
| US20070084368A1 (en) * | 2005-10-13 | 2007-04-19 | Ryan Vest | Dynamic UV-exposure and thermal development of relief image printing elements |
| JP4542495B2 (ja) * | 2005-10-19 | 2010-09-15 | 株式会社目白プレシジョン | 投影露光装置及びその投影露光方法 |
| JP2007114357A (ja) * | 2005-10-19 | 2007-05-10 | Mejiro Precision:Kk | 投影露光装置 |
| JP4536033B2 (ja) * | 2006-05-30 | 2010-09-01 | 三井金属鉱業株式会社 | フレキシブルプリント配線基板の配線パターン検査方法および検査装置 |
| NL1036125A1 (nl) * | 2007-11-08 | 2009-05-11 | Asml Netherlands Bv | Lithographic apparatus and method. |
| JP5294141B2 (ja) * | 2008-03-25 | 2013-09-18 | 株式会社ニコン | 表示素子の製造装置 |
| NL1036682A1 (nl) * | 2008-04-01 | 2009-10-02 | Asml Netherlands Bv | Lithographic apparatus and contamination detection method. |
| DE102008022792A1 (de) * | 2008-05-08 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Elektrostatisches Halteelement mit Antireflexbeschichtung, Vermessungsverfahren und Verwendung des Halteelementes |
| KR20110028473A (ko) | 2008-06-30 | 2011-03-18 | 가부시키가이샤 니콘 | 표시 소자의 제조 방법 및 제조 장치, 박막 트랜지스터의 제조 방법 및 제조 장치, 및 회로 형성 장치 |
| NL2003299A (en) * | 2008-08-28 | 2010-03-11 | Asml Netherlands Bv | Spectral purity filter and lithographic apparatus. |
| JP2010098143A (ja) * | 2008-10-16 | 2010-04-30 | Canon Inc | 露光装置およびデバイス製造方法 |
| US8899564B2 (en) * | 2009-02-23 | 2014-12-02 | Sodick Co., Ltd. | Colored ceramic vacuum chuck and manufacturing method thereof |
| US8541163B2 (en) * | 2009-06-05 | 2013-09-24 | Nikon Corporation | Transporting method, transporting apparatus, exposure method, and exposure apparatus |
| JP2011221536A (ja) * | 2010-04-13 | 2011-11-04 | Nikon Corp | マスク移動装置、露光装置、基板処理装置及びデバイス製造方法 |
| JP5858631B2 (ja) * | 2011-03-28 | 2016-02-10 | テクノクオーツ株式会社 | 液晶基板保持盤の製造方法 |
| IN2015DN01909A (enExample) * | 2012-08-28 | 2015-08-07 | Nikon Corp |
-
2013
- 2013-03-13 IN IN1909DEN2015 patent/IN2015DN01909A/en unknown
- 2013-03-13 CN CN201710905028.3A patent/CN107656427B/zh active Active
- 2013-03-13 JP JP2014532821A patent/JP6245174B2/ja active Active
- 2013-03-13 CN CN201611044499.1A patent/CN106886133B/zh active Active
- 2013-03-13 KR KR1020187028577A patent/KR101999497B1/ko active Active
- 2013-03-13 CN CN201380043800.5A patent/CN104583874B/zh active Active
- 2013-03-13 WO PCT/JP2013/057062 patent/WO2014034161A1/ja not_active Ceased
- 2013-03-13 KR KR1020157003652A patent/KR101812857B1/ko active Active
- 2013-03-13 KR KR1020187009198A patent/KR101907365B1/ko active Active
- 2013-03-13 KR KR1020167034212A patent/KR101855612B1/ko active Active
- 2013-04-12 TW TW108109820A patent/TWI729366B/zh active
- 2013-04-12 TW TW102112961A patent/TWI581362B/zh active
- 2013-04-12 TW TW107111761A patent/TWI658535B/zh active
- 2013-04-12 TW TW106108716A patent/TWI624001B/zh active
-
2015
- 2015-08-28 HK HK18105667.1A patent/HK1246408A1/zh unknown
-
2016
- 2016-12-01 JP JP2016234202A patent/JP6229785B2/ja active Active
-
2017
- 2017-10-03 JP JP2017193366A patent/JP6414308B2/ja active Active
-
2018
- 2018-08-14 JP JP2018152568A patent/JP6558484B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2014034161A1 (ja) | 2016-08-08 |
| CN104583874A (zh) | 2015-04-29 |
| TW201926542A (zh) | 2019-07-01 |
| JP2018189989A (ja) | 2018-11-29 |
| KR101812857B1 (ko) | 2017-12-27 |
| CN104583874B (zh) | 2017-11-03 |
| TW201828405A (zh) | 2018-08-01 |
| KR101999497B1 (ko) | 2019-07-11 |
| JP2018013805A (ja) | 2018-01-25 |
| CN106886133B (zh) | 2018-06-29 |
| WO2014034161A1 (ja) | 2014-03-06 |
| TW201409603A (zh) | 2014-03-01 |
| JP6558484B2 (ja) | 2019-08-14 |
| TWI729366B (zh) | 2021-06-01 |
| JP2017083855A (ja) | 2017-05-18 |
| KR101855612B1 (ko) | 2018-05-04 |
| JP6229785B2 (ja) | 2017-11-15 |
| KR20180035950A (ko) | 2018-04-06 |
| HK1246408A1 (zh) | 2018-09-07 |
| JP6414308B2 (ja) | 2018-10-31 |
| CN107656427B (zh) | 2020-07-03 |
| KR20180112115A (ko) | 2018-10-11 |
| KR20160143892A (ko) | 2016-12-14 |
| KR101907365B1 (ko) | 2018-10-11 |
| TW201727818A (zh) | 2017-08-01 |
| TWI581362B (zh) | 2017-05-01 |
| JP6245174B2 (ja) | 2017-12-13 |
| CN106886133A (zh) | 2017-06-23 |
| HK1207694A1 (en) | 2016-02-05 |
| TWI658535B (zh) | 2019-05-01 |
| CN107656427A (zh) | 2018-02-02 |
| KR20150048113A (ko) | 2015-05-06 |
| TWI624001B (zh) | 2018-05-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| IN2015DN01909A (enExample) | ||
| MX354435B (es) | Encristalado de iluminacion con deflector incorporado. | |
| JP2016206630A5 (ja) | 表示装置 | |
| TW200942984A (en) | Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby | |
| TW200834125A (en) | Light-diffusion optical film and its production method, prism sheet, and surface light source device | |
| JP2017509931A5 (enExample) | ||
| CA2882777C (en) | Security element and security document | |
| WO2011088216A3 (en) | Illumination device having viscoelastic lightguide | |
| MY168834A (en) | A spectrally selective panel | |
| MY167536A (en) | Optical film | |
| NL1035496A1 (nl) | Lichtgeleidingsplaat eenheid, oppervlaklichtbron inrichting en vloeibaar kristal display inrichting. | |
| EP2857890A4 (en) | SUPERFICIAL LIGHT SOURCE DEVICE AND CORNER BACKLIGHT MODULE | |
| GB201104581D0 (en) | Improvements in or relating to photopatterning | |
| GB2507453A (en) | Planar front illumination system having a light guide with micro lenses formed thereon and method of manufacturing the same | |
| MX2018016029A (es) | Guias de luz con revestimiento de baja refraccion para usarlas en el agua. | |
| WO2008114507A1 (ja) | 面状照明装置およびそれを用いた液晶表示装置 | |
| BR112012027191B1 (pt) | folha micromoldada para módulo de luz de fundo | |
| WO2010022937A8 (en) | Optical sheet and optical sheet manufacturing method | |
| GB201015117D0 (en) | Authentication of articles | |
| AR108704A1 (es) | Filtro óptico y método para la manufactura de un filtro óptico | |
| IN2015DN01732A (enExample) | ||
| BR112014017484A8 (pt) | película flexível com relevo na superfície e uso da mesma em sistemas óticos eletroativos | |
| FR2968333B1 (fr) | Dispositif d'eclairage pour piscine. | |
| WO2009041321A1 (ja) | 光学フィルム、偏光板および画像表示装置 | |
| GB201220683D0 (en) | Light guide plate and liquid crystal display apparatus using the same |