HK1246408A1 - 圖案形成裝置 - Google Patents

圖案形成裝置

Info

Publication number
HK1246408A1
HK1246408A1 HK18105667.1A HK18105667A HK1246408A1 HK 1246408 A1 HK1246408 A1 HK 1246408A1 HK 18105667 A HK18105667 A HK 18105667A HK 1246408 A1 HK1246408 A1 HK 1246408A1
Authority
HK
Hong Kong
Prior art keywords
forming device
pattern forming
pattern
forming
Prior art date
Application number
HK18105667.1A
Other languages
English (en)
Inventor
加藤正紀
鬼頭義昭
堀正和
木內徹
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1246408A1 publication Critical patent/HK1246408A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)
HK18105667.1A 2012-08-28 2015-08-28 圖案形成裝置 HK1246408A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012188116 2012-08-28

Publications (1)

Publication Number Publication Date
HK1246408A1 true HK1246408A1 (zh) 2018-09-07

Family

ID=50182989

Family Applications (2)

Application Number Title Priority Date Filing Date
HK15108377.9A HK1207694A1 (zh) 2012-08-28 2015-08-28 襯底支承裝置及曝光裝置
HK18105667.1A HK1246408A1 (zh) 2012-08-28 2015-08-28 圖案形成裝置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
HK15108377.9A HK1207694A1 (zh) 2012-08-28 2015-08-28 襯底支承裝置及曝光裝置

Country Status (7)

Country Link
JP (4) JP6245174B2 (zh)
KR (4) KR101999497B1 (zh)
CN (3) CN106886133B (zh)
HK (2) HK1207694A1 (zh)
IN (1) IN2015DN01909A (zh)
TW (4) TWI624001B (zh)
WO (1) WO2014034161A1 (zh)

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CN106886133B (zh) * 2012-08-28 2018-06-29 株式会社尼康 图案形成装置及衬底支承装置
TWI674484B (zh) * 2014-04-01 2019-10-11 日商尼康股份有限公司 基板處理方法
WO2015152217A1 (ja) * 2014-04-01 2015-10-08 株式会社ニコン 基板処理装置、デバイス製造方法及び基板処理装置の調整方法
TWI692830B (zh) * 2014-09-04 2020-05-01 日商尼康股份有限公司 處理系統
KR102345439B1 (ko) * 2015-01-15 2021-12-30 삼성디스플레이 주식회사 롤투롤 노광 시스템
JP6413784B2 (ja) * 2015-01-19 2018-10-31 株式会社ニコン 基板処理装置及びデバイス製造方法
TWI720911B (zh) * 2015-02-27 2021-03-01 日商尼康股份有限公司 圖案描繪裝置
WO2016152758A1 (ja) * 2015-03-20 2016-09-29 株式会社ニコン ビーム走査装置、ビーム走査方法、および描画装置
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CN111781807B (zh) * 2015-10-30 2024-01-12 株式会社尼康 基板处理装置及元件制造方法
JP6551175B2 (ja) * 2015-11-10 2019-07-31 株式会社ニコン 回転円筒体の計測装置、基板処理装置及びデバイス製造方法
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JP6589607B2 (ja) * 2015-12-04 2019-10-16 株式会社ニコン 描画装置および描画方法
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KR102379193B1 (ko) * 2016-05-19 2022-03-28 가부시키가이샤 니콘 기판 지지 장치, 노광 장치, 및 패터닝 장치
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
JP6680330B2 (ja) * 2018-09-14 2020-04-15 株式会社ニコン パターン形成装置
JP6587026B2 (ja) * 2018-10-30 2019-10-09 株式会社ニコン パターン露光装置
CN112114499B (zh) * 2019-06-19 2022-02-11 上海微电子装备（集团）股份有限公司 一种曝光装置、光刻设备及太阳能电池电极的制备方法
JP6787447B2 (ja) * 2019-06-27 2020-11-18 株式会社ニコン 基板処理装置
JP6996580B2 (ja) * 2020-03-05 2022-01-17 株式会社ニコン 基板処理方法
US20220244631A1 (en) * 2021-02-03 2022-08-04 Visera Technologies Company Limited Exposure mask
EP4382870A1 (en) * 2022-12-08 2024-06-12 Kaunas University of Technology Anti-fogging incremental scales for optical encoders and fabrication method thereof

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Also Published As

Publication number Publication date
KR101999497B1 (ko) 2019-07-11
JP6414308B2 (ja) 2018-10-31
TW201409603A (zh) 2014-03-01
KR101812857B1 (ko) 2017-12-27
TWI581362B (zh) 2017-05-01
WO2014034161A1 (ja) 2014-03-06
IN2015DN01909A (zh) 2015-08-07
TWI658535B (zh) 2019-05-01
CN104583874B (zh) 2017-11-03
CN106886133A (zh) 2017-06-23
TW201828405A (zh) 2018-08-01
JPWO2014034161A1 (ja) 2016-08-08
JP2018189989A (ja) 2018-11-29
CN104583874A (zh) 2015-04-29
TW201926542A (zh) 2019-07-01
JP6245174B2 (ja) 2017-12-13
KR20180112115A (ko) 2018-10-11
JP2017083855A (ja) 2017-05-18
CN107656427A (zh) 2018-02-02
JP6558484B2 (ja) 2019-08-14
KR101907365B1 (ko) 2018-10-11
JP6229785B2 (ja) 2017-11-15
CN106886133B (zh) 2018-06-29
KR20150048113A (ko) 2015-05-06
KR101855612B1 (ko) 2018-05-04
KR20180035950A (ko) 2018-04-06
KR20160143892A (ko) 2016-12-14
TWI729366B (zh) 2021-06-01
TW201727818A (zh) 2017-08-01
TWI624001B (zh) 2018-05-11
HK1207694A1 (zh) 2016-02-05
CN107656427B (zh) 2020-07-03
JP2018013805A (ja) 2018-01-25

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