HK1207694A1 - 襯底支承裝置及曝光裝置 - Google Patents

襯底支承裝置及曝光裝置

Info

Publication number
HK1207694A1
HK1207694A1 HK15108377.9A HK15108377A HK1207694A1 HK 1207694 A1 HK1207694 A1 HK 1207694A1 HK 15108377 A HK15108377 A HK 15108377A HK 1207694 A1 HK1207694 A1 HK 1207694A1
Authority
HK
Hong Kong
Prior art keywords
substrate support
exposure
support device
exposure device
substrate
Prior art date
Application number
HK15108377.9A
Other languages
English (en)
Inventor
加藤正紀
鬼頭義昭
堀正和
木內徹
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1207694A1 publication Critical patent/HK1207694A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
HK15108377.9A 2012-08-28 2015-08-28 襯底支承裝置及曝光裝置 HK1207694A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012188116 2012-08-28
PCT/JP2013/057062 WO2014034161A1 (ja) 2012-08-28 2013-03-13 基板支持装置、及び露光装置

Publications (1)

Publication Number Publication Date
HK1207694A1 true HK1207694A1 (zh) 2016-02-05

Family

ID=50182989

Family Applications (2)

Application Number Title Priority Date Filing Date
HK18105667.1A HK1246408A1 (zh) 2012-08-28 2015-08-28 圖案形成裝置
HK15108377.9A HK1207694A1 (zh) 2012-08-28 2015-08-28 襯底支承裝置及曝光裝置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
HK18105667.1A HK1246408A1 (zh) 2012-08-28 2015-08-28 圖案形成裝置

Country Status (7)

Country Link
JP (4) JP6245174B2 (zh)
KR (4) KR101999497B1 (zh)
CN (3) CN104583874B (zh)
HK (2) HK1246408A1 (zh)
IN (1) IN2015DN01909A (zh)
TW (4) TWI581362B (zh)
WO (1) WO2014034161A1 (zh)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101999497B1 (ko) * 2012-08-28 2019-07-11 가부시키가이샤 니콘 패턴 형성 장치
KR102387648B1 (ko) * 2014-04-01 2022-04-18 가부시키가이샤 니콘 노광 장치
TWI695235B (zh) * 2014-04-01 2020-06-01 日商尼康股份有限公司 圖案描繪裝置及元件製造方法
KR102086463B1 (ko) * 2014-09-04 2020-03-09 가부시키가이샤 니콘 처리 시스템 및 디바이스 제조 방법
KR102345439B1 (ko) * 2015-01-15 2021-12-30 삼성디스플레이 주식회사 롤투롤 노광 시스템
JP6413784B2 (ja) * 2015-01-19 2018-10-31 株式会社ニコン 基板処理装置及びデバイス製造方法
WO2016136974A1 (ja) * 2015-02-27 2016-09-01 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法
CN111638631B (zh) * 2015-03-20 2023-03-10 株式会社尼康 图案曝光装置、光束扫描装置、及图案描绘装置
JP2017058494A (ja) * 2015-09-16 2017-03-23 株式会社ニコン パターン描画装置、パターン描画方法、基板処理装置、および、デバイス製造方法
CN111781806B (zh) * 2015-10-30 2023-06-16 株式会社尼康 基板处理装置
JP6551175B2 (ja) * 2015-11-10 2019-07-31 株式会社ニコン 回転円筒体の計測装置、基板処理装置及びデバイス製造方法
US9918375B2 (en) * 2015-11-16 2018-03-13 Kla-Tencor Corporation Plasma based light source having a target material coated on a cylindrically-symmetric element
JP6589607B2 (ja) * 2015-12-04 2019-10-16 株式会社ニコン 描画装置および描画方法
TWI782698B (zh) 2016-03-30 2022-11-01 日商尼康股份有限公司 圖案描繪裝置、圖案描繪方法、以及元件製造方法
KR102379193B1 (ko) * 2016-05-19 2022-03-28 가부시키가이샤 니콘 기판 지지 장치, 노광 장치, 및 패터닝 장치
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
JP6680330B2 (ja) * 2018-09-14 2020-04-15 株式会社ニコン パターン形成装置
JP6587026B2 (ja) * 2018-10-30 2019-10-09 株式会社ニコン パターン露光装置
CN112114499B (zh) * 2019-06-19 2022-02-11 上海微电子装备（集团）股份有限公司 一种曝光装置、光刻设备及太阳能电池电极的制备方法
JP6787447B2 (ja) * 2019-06-27 2020-11-18 株式会社ニコン 基板処理装置
JP6996580B2 (ja) * 2020-03-05 2022-01-17 株式会社ニコン 基板処理方法
US20220244631A1 (en) * 2021-02-03 2022-08-04 Visera Technologies Company Limited Exposure mask

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776179A (en) * 1980-10-30 1982-05-13 Nippon Piston Ring Co Ltd Sliding member
JPS60134422A (ja) * 1983-12-23 1985-07-17 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法
JPS61220428A (ja) * 1985-03-27 1986-09-30 Hitachi Ltd 露光装置
JP3095514B2 (ja) * 1992-01-29 2000-10-03 キヤノン株式会社 基板保持盤
JPH08139168A (ja) * 1994-11-10 1996-05-31 Toto Ltd 露光用保持治具
JP2000012452A (ja) * 1998-06-18 2000-01-14 Nikon Corp 露光装置
JP2000187428A (ja) * 1998-12-22 2000-07-04 Sharp Corp 画像形成装置
JP4803901B2 (ja) 2001-05-22 2011-10-26 キヤノン株式会社 位置合わせ方法、露光装置、および半導体デバイス製造方法
JP2003094724A (ja) * 2001-09-21 2003-04-03 Fuji Photo Film Co Ltd 画像記録装置
JP2004128325A (ja) * 2002-10-04 2004-04-22 Toto Ltd 保持具
US7256811B2 (en) * 2002-10-25 2007-08-14 Kodak Graphic Communications Canada Company Method and apparatus for imaging with multiple exposure heads
CN101231477B (zh) * 2002-12-10 2010-11-17 株式会社尼康 曝光装置以及器件制造方法
JP2004317728A (ja) 2003-04-15 2004-11-11 Seiko Epson Corp アライメントマーク付き基板及びその製造方法並びに電気光学装置用基板及び電気光学装置
JP2005086072A (ja) 2003-09-10 2005-03-31 Nikon Corp アライメント方法、露光装置及び露光方法
US7121496B2 (en) * 2003-10-23 2006-10-17 Hewlett-Packard Development Company, L.P. Method and system for correcting web deformation during a roll-to-roll process
JP2005126769A (ja) * 2003-10-24 2005-05-19 Yoichi Yamagishi 黒色皮膜および黒色皮膜の形成方法
JP2005189366A (ja) * 2003-12-25 2005-07-14 Konica Minolta Medical & Graphic Inc シート状印刷版材料、印刷版及び画像記録装置
US7292308B2 (en) 2004-03-23 2007-11-06 Asml Holding N.V. System and method for patterning a flexible substrate in a lithography tool
JP2005322846A (ja) * 2004-05-11 2005-11-17 Pioneer Electronic Corp 露光装置及び該露光装置を用いた平面型表示装置の製造方法
JP2005347332A (ja) 2004-05-31 2005-12-15 Nikon Corp 位置計測装置、露光装置、デバイス製造方法
JP4502746B2 (ja) * 2004-08-26 2010-07-14 京セラ株式会社 液晶基板保持盤とその製造方法
JP2006098719A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 露光装置
JP2006330441A (ja) * 2005-05-27 2006-12-07 Nikon Corp 投影露光装置及びマイクロデバイスの製造方法
JP2007010785A (ja) * 2005-06-28 2007-01-18 Fujifilm Holdings Corp 永久パターン形成方法
US8383330B2 (en) * 2005-09-07 2013-02-26 Fujifilm Corporation Pattern exposure method and pattern exposure apparatus
JP4861778B2 (ja) * 2005-09-08 2012-01-25 富士フイルム株式会社 パターン露光方法及び装置
US20070084368A1 (en) * 2005-10-13 2007-04-19 Ryan Vest Dynamic UV-exposure and thermal development of relief image printing elements
JP4542495B2 (ja) * 2005-10-19 2010-09-15 株式会社目白プレシジョン 投影露光装置及びその投影露光方法
JP2007114357A (ja) * 2005-10-19 2007-05-10 Mejiro Precision:Kk 投影露光装置
JP4536033B2 (ja) * 2006-05-30 2010-09-01 三井金属鉱業株式会社 フレキシブルプリント配線基板の配線パターン検査方法および検査装置
NL1036125A1 (nl) 2007-11-08 2009-05-11 Asml Netherlands Bv Lithographic apparatus and method.
JP5294141B2 (ja) * 2008-03-25 2013-09-18 株式会社ニコン 表示素子の製造装置
NL1036682A1 (nl) * 2008-04-01 2009-10-02 Asml Netherlands Bv Lithographic apparatus and contamination detection method.
DE102008022792A1 (de) * 2008-05-08 2009-11-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Elektrostatisches Halteelement mit Antireflexbeschichtung, Vermessungsverfahren und Verwendung des Halteelementes
JPWO2010001537A1 (ja) 2008-06-30 2011-12-15 株式会社ニコン 表示素子の製造方法及び製造装置、薄膜トランジスタの製造方法及び製造装置、及び回路形成装置
NL2003299A (en) * 2008-08-28 2010-03-11 Asml Netherlands Bv Spectral purity filter and lithographic apparatus.
JP2010098143A (ja) 2008-10-16 2010-04-30 Canon Inc 露光装置およびデバイス製造方法
KR101168863B1 (ko) * 2009-02-23 2012-07-30 가부시키가이샤 소딕 착색 세라믹 진공 척 및 그 제조 방법
US8541163B2 (en) * 2009-06-05 2013-09-24 Nikon Corporation Transporting method, transporting apparatus, exposure method, and exposure apparatus
JP2011221536A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスク移動装置、露光装置、基板処理装置及びデバイス製造方法
JP5858631B2 (ja) * 2011-03-28 2016-02-10 テクノクオーツ株式会社 液晶基板保持盤の製造方法
KR101999497B1 (ko) * 2012-08-28 2019-07-11 가부시키가이샤 니콘 패턴 형성 장치

Also Published As

Publication number Publication date
CN106886133A (zh) 2017-06-23
KR20180035950A (ko) 2018-04-06
HK1246408A1 (zh) 2018-09-07
TWI624001B (zh) 2018-05-11
CN107656427A (zh) 2018-02-02
TW201727818A (zh) 2017-08-01
JP6245174B2 (ja) 2017-12-13
IN2015DN01909A (zh) 2015-08-07
TW201828405A (zh) 2018-08-01
JP6414308B2 (ja) 2018-10-31
CN106886133B (zh) 2018-06-29
TW201926542A (zh) 2019-07-01
JP6229785B2 (ja) 2017-11-15
KR101907365B1 (ko) 2018-10-11
KR20160143892A (ko) 2016-12-14
KR101999497B1 (ko) 2019-07-11
TWI729366B (zh) 2021-06-01
TW201409603A (zh) 2014-03-01
JP2018189989A (ja) 2018-11-29
KR20180112115A (ko) 2018-10-11
CN104583874B (zh) 2017-11-03
JPWO2014034161A1 (ja) 2016-08-08
KR101812857B1 (ko) 2017-12-27
KR101855612B1 (ko) 2018-05-04
WO2014034161A1 (ja) 2014-03-06
CN104583874A (zh) 2015-04-29
JP6558484B2 (ja) 2019-08-14
JP2018013805A (ja) 2018-01-25
TWI658535B (zh) 2019-05-01
CN107656427B (zh) 2020-07-03
KR20150048113A (ko) 2015-05-06
JP2017083855A (ja) 2017-05-18
TWI581362B (zh) 2017-05-01

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PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20220313