TWI700974B - 配線基板的製造方法 - Google Patents
配線基板的製造方法 Download PDFInfo
- Publication number
- TWI700974B TWI700974B TW103120347A TW103120347A TWI700974B TW I700974 B TWI700974 B TW I700974B TW 103120347 A TW103120347 A TW 103120347A TW 103120347 A TW103120347 A TW 103120347A TW I700974 B TWI700974 B TW I700974B
- Authority
- TW
- Taiwan
- Prior art keywords
- solder mask
- exposed
- thickness
- solder
- area
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 399
- 230000008569 process Effects 0.000 title claims abstract description 331
- 239000000758 substrate Substances 0.000 title claims abstract description 52
- 229910000679 solder Inorganic materials 0.000 claims abstract description 493
- 238000004519 manufacturing process Methods 0.000 claims abstract description 118
- 239000010409 thin film Substances 0.000 claims abstract description 61
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 31
- 239000001301 oxygen Substances 0.000 claims description 31
- 229910052760 oxygen Inorganic materials 0.000 claims description 31
- 239000010410 layer Substances 0.000 description 258
- 239000004020 conductor Substances 0.000 description 60
- 239000007788 liquid Substances 0.000 description 56
- 239000000693 micelle Substances 0.000 description 33
- 239000000243 solution Substances 0.000 description 31
- 230000003287 optical effect Effects 0.000 description 30
- 239000000945 filler Substances 0.000 description 28
- 239000007864 aqueous solution Substances 0.000 description 19
- 239000010408 film Substances 0.000 description 18
- 239000007921 spray Substances 0.000 description 16
- 238000011049 filling Methods 0.000 description 15
- 230000003746 surface roughness Effects 0.000 description 13
- 229920001187 thermosetting polymer Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 10
- 238000010586 diagram Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 150000007514 bases Chemical class 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- 230000004907 flux Effects 0.000 description 9
- 238000005406 washing Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 239000011256 inorganic filler Substances 0.000 description 8
- 229910003475 inorganic filler Inorganic materials 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
- 239000000654 additive Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- 239000004115 Sodium Silicate Substances 0.000 description 6
- -1 photoinitiator Substances 0.000 description 6
- 235000019795 sodium metasilicate Nutrition 0.000 description 6
- 229910052911 sodium silicate Inorganic materials 0.000 description 6
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 230000002411 adverse Effects 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 230000018109 developmental process Effects 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 5
- 239000003292 glue Substances 0.000 description 5
- 238000009413 insulation Methods 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 229910000029 sodium carbonate Inorganic materials 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 208000034189 Sclerosis Diseases 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000004026 adhesive bonding Methods 0.000 description 3
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 3
- 150000008041 alkali metal carbonates Chemical class 0.000 description 3
- 229910000318 alkali metal phosphate Inorganic materials 0.000 description 3
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 3
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 3
- 229960001231 choline Drugs 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 3
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- VPBGSHVAOCURMM-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate prop-2-enoic acid Chemical compound C(C=C)(=O)OCC(COC(C=C)=O)(COC(C=C)=O)CO.C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C(O)C(CC)(CO)CO VPBGSHVAOCURMM-UHFFFAOYSA-N 0.000 description 1
- KIZQNNOULOCVDM-UHFFFAOYSA-M 2-hydroxyethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].C[N+](C)(C)CCO KIZQNNOULOCVDM-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052936 alkali metal sulfate Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- 235000019289 ammonium phosphates Nutrition 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4857—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09845—Stepped hole, via, edge, bump or conductor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09881—Coating only between conductors, i.e. flush with the conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0505—Double exposure of the same photosensitive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0588—Second resist used as pattern over first resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0594—Insulating resist or coating with special shaped edges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/14—Related to the order of processing steps
- H05K2203/1476—Same or similar kind of process performed in phases, e.g. coarse patterning followed by fine patterning
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Applications Claiming Priority (14)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013-125179 | 2013-06-14 | ||
JP2013125179 | 2013-06-14 | ||
JP2013-131839 | 2013-06-24 | ||
JP2013131839 | 2013-06-24 | ||
JP2013139706 | 2013-07-03 | ||
JP2013-139706 | 2013-07-03 | ||
JP2013-150824 | 2013-07-19 | ||
JP2013-150825 | 2013-07-19 | ||
JP2013150824 | 2013-07-19 | ||
JP2013150825 | 2013-07-19 | ||
JP2013-151335 | 2013-07-22 | ||
JP2013151335 | 2013-07-22 | ||
JP2014-111574 | 2014-05-29 | ||
JP2014111574 | 2014-05-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201513758A TW201513758A (zh) | 2015-04-01 |
TWI700974B true TWI700974B (zh) | 2020-08-01 |
Family
ID=52022186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103120347A TWI700974B (zh) | 2013-06-14 | 2014-06-12 | 配線基板的製造方法 |
Country Status (5)
Country | Link |
---|---|
JP (3) | JP6224531B2 (ko) |
KR (1) | KR102082641B1 (ko) |
CN (3) | CN107846786B (ko) |
TW (1) | TWI700974B (ko) |
WO (1) | WO2014199890A1 (ko) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016012702A (ja) * | 2014-06-30 | 2016-01-21 | ファナック株式会社 | ソルダコートの濡れ性と耐食性を両立させたプリント基板およびその製造方法 |
TWI645760B (zh) * | 2017-10-27 | 2018-12-21 | 南亞電路板股份有限公司 | 電路板及其製造方法 |
CN108289388A (zh) * | 2017-12-07 | 2018-07-17 | 江门崇达电路技术有限公司 | 一种预防上锡不良的pcb制作方法 |
JP7142604B2 (ja) | 2019-05-15 | 2022-09-27 | 日本特殊陶業株式会社 | 配線基板およびその製造方法 |
TWI731376B (zh) * | 2019-07-22 | 2021-06-21 | 頎邦科技股份有限公司 | 具有粗化防焊層的軟質線路基板及其製造方法 |
JP7498549B2 (ja) * | 2019-09-11 | 2024-06-12 | 太陽ホールディングス株式会社 | 積層硬化体、硬化性樹脂組成物、ドライフィルム、および、積層硬化体の製造方法 |
JP7498550B2 (ja) * | 2019-09-11 | 2024-06-12 | 太陽ホールディングス株式会社 | 積層硬化体、硬化性樹脂組成物、ドライフィルム、および、積層硬化体の製造方法 |
JP2021163851A (ja) * | 2020-03-31 | 2021-10-11 | 三菱製紙株式会社 | ソルダーレジストパターンの形成方法 |
KR20210129410A (ko) * | 2020-04-20 | 2021-10-28 | 엘지이노텍 주식회사 | 인쇄회로기판 및 이의 제조 방법 |
CN113747681B (zh) * | 2020-05-27 | 2023-01-17 | 庆鼎精密电子(淮安)有限公司 | 嵌埋元件的软硬结合电路板及其制作方法 |
US11551939B2 (en) * | 2020-09-02 | 2023-01-10 | Qualcomm Incorporated | Substrate comprising interconnects embedded in a solder resist layer |
KR20220039385A (ko) | 2020-09-22 | 2022-03-29 | 삼성전자주식회사 | 인터포저 및 이를 포함하는 반도체 패키지 |
US20220328394A1 (en) * | 2021-04-07 | 2022-10-13 | Mediatek Inc. | Three-dimensional pad structure and interconnection structure for electronic devices |
TWI780783B (zh) * | 2021-06-18 | 2022-10-11 | 大陸商律勝科技(蘇州)有限公司 | 印刷電路板之製造方法及具保護層之印刷電路板 |
CN116801482B (zh) * | 2022-03-18 | 2024-05-10 | 华为技术有限公司 | 电路板组件及其加工方法、电子设备 |
KR102674312B1 (ko) * | 2023-01-13 | 2024-06-12 | 엘지이노텍 주식회사 | 반도체 패키지 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11191670A (ja) * | 1997-12-25 | 1999-07-13 | Victor Co Of Japan Ltd | プリント配線基板及びその製造方法 |
JP2004140089A (ja) * | 2002-10-16 | 2004-05-13 | Dainippon Printing Co Ltd | 多層配線基板およびフリップチップ方式の半導体パッケージ |
TW200610117A (en) * | 2004-09-07 | 2006-03-16 | Siliconware Precision Industries Co Ltd | Bump structure of semiconductor package and fabrication method thereof |
TW200621113A (en) * | 2004-10-18 | 2006-06-16 | Sharp Kk | Connection structure for connecting semiconductor element and wiring board, and semiconductor device |
JP2011192692A (ja) * | 2010-03-12 | 2011-09-29 | Mitsubishi Paper Mills Ltd | ソルダーレジストパターンの形成方法 |
JP3182371U (ja) * | 2012-02-10 | 2013-03-21 | 三菱製紙株式会社 | レジスト層の薄膜化処理装置 |
CN103109588A (zh) * | 2010-09-28 | 2013-05-15 | 三菱制纸株式会社 | 阻焊图案的形成方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS346263B1 (ko) | 1957-01-18 | 1959-07-18 | ||
JPS61256789A (ja) * | 1985-05-10 | 1986-11-14 | 株式会社日立製作所 | プリント配線板製造方法 |
JP2910261B2 (ja) * | 1991-02-13 | 1999-06-23 | 松下電器産業株式会社 | プリント配線板とその製造方法 |
JPH05226505A (ja) | 1992-02-18 | 1993-09-03 | Ibiden Co Ltd | プリント配線板 |
JP3182371B2 (ja) * | 1997-06-05 | 2001-07-03 | 三洋電機株式会社 | 空気調和機 |
JP2001135919A (ja) * | 1999-11-08 | 2001-05-18 | Sumitomo Metal Electronics Devices Inc | プラスチックパッケージの製造方法 |
JP3912405B2 (ja) * | 2003-11-11 | 2007-05-09 | 三菱化学株式会社 | 硬化性組成物、硬化物、カラーフィルタ及び液晶表示装置 |
US7326636B2 (en) * | 2005-05-24 | 2008-02-05 | Agilent Technologies, Inc. | Method and circuit structure employing a photo-imaged solder mask |
CN101945533B (zh) * | 2006-05-17 | 2013-04-03 | 三菱制纸株式会社 | 电路基板 |
JP5255545B2 (ja) | 2009-09-29 | 2013-08-07 | 三菱製紙株式会社 | ソルダーレジストの形成方法 |
KR101047139B1 (ko) * | 2009-11-11 | 2011-07-07 | 삼성전기주식회사 | 단층 보드온칩 패키지 기판 및 그 제조방법 |
JP5830925B2 (ja) | 2011-05-10 | 2015-12-09 | 日立化成株式会社 | プリント配線板の製造方法 |
-
2014
- 2014-06-05 WO PCT/JP2014/064929 patent/WO2014199890A1/ja active Application Filing
- 2014-06-05 CN CN201711315848.3A patent/CN107846786B/zh active Active
- 2014-06-05 CN CN201480033751.1A patent/CN105309053B/zh active Active
- 2014-06-05 CN CN201711315868.0A patent/CN107809854A/zh active Pending
- 2014-06-05 KR KR1020157030883A patent/KR102082641B1/ko active IP Right Grant
- 2014-06-10 JP JP2014119261A patent/JP6224531B2/ja active Active
- 2014-06-12 TW TW103120347A patent/TWI700974B/zh active
-
2017
- 2017-05-24 JP JP2017102667A patent/JP6416324B2/ja active Active
-
2018
- 2018-05-15 JP JP2018093702A patent/JP6514808B2/ja active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11191670A (ja) * | 1997-12-25 | 1999-07-13 | Victor Co Of Japan Ltd | プリント配線基板及びその製造方法 |
JP2004140089A (ja) * | 2002-10-16 | 2004-05-13 | Dainippon Printing Co Ltd | 多層配線基板およびフリップチップ方式の半導体パッケージ |
TW200610117A (en) * | 2004-09-07 | 2006-03-16 | Siliconware Precision Industries Co Ltd | Bump structure of semiconductor package and fabrication method thereof |
TW200621113A (en) * | 2004-10-18 | 2006-06-16 | Sharp Kk | Connection structure for connecting semiconductor element and wiring board, and semiconductor device |
JP2011192692A (ja) * | 2010-03-12 | 2011-09-29 | Mitsubishi Paper Mills Ltd | ソルダーレジストパターンの形成方法 |
CN103109588A (zh) * | 2010-09-28 | 2013-05-15 | 三菱制纸株式会社 | 阻焊图案的形成方法 |
JP3182371U (ja) * | 2012-02-10 | 2013-03-21 | 三菱製紙株式会社 | レジスト層の薄膜化処理装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20160020407A (ko) | 2016-02-23 |
JP6514808B2 (ja) | 2019-05-15 |
CN107846786B (zh) | 2021-03-05 |
JP2016006809A (ja) | 2016-01-14 |
JP6224531B2 (ja) | 2017-11-01 |
JP6416324B2 (ja) | 2018-10-31 |
CN107809854A (zh) | 2018-03-16 |
JP2017195380A (ja) | 2017-10-26 |
JP2018139319A (ja) | 2018-09-06 |
CN107846786A (zh) | 2018-03-27 |
KR102082641B1 (ko) | 2020-02-28 |
TW201513758A (zh) | 2015-04-01 |
CN105309053A (zh) | 2016-02-03 |
CN105309053B (zh) | 2018-03-09 |
WO2014199890A1 (ja) | 2014-12-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI700974B (zh) | 配線基板的製造方法 | |
JP6514807B2 (ja) | 配線基板の製造方法 | |
KR20200000700U (ko) | 프린트 배선판 | |
KR20140005664U (ko) | 프린트 배선판 | |
JP3209290U (ja) | プリント配線板 | |
JP7289852B2 (ja) | 半導体パッケージの製造方法及びそれに用いられる粘着シート | |
JP2015023184A (ja) | プリント配線板の製造方法 | |
JP2015015289A (ja) | プリント配線板の製造方法 | |
JP2011044563A (ja) | 回路基板およびその製造方法 | |
JP3202620U (ja) | レジスト層の薄膜化装置 | |
TWI675256B (zh) | 阻焊劑圖型之形成方法 | |
JP2006245466A (ja) | 半導体装置用基板、および半導体素子用bgaパッケージ | |
JP2006210770A (ja) | 半導体装置搭載用基板、および半導体素子用bgaパッケージ |