TWI690107B - 掩膜板及掩膜元件 - Google Patents

掩膜板及掩膜元件 Download PDF

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Publication number
TWI690107B
TWI690107B TW107140470A TW107140470A TWI690107B TW I690107 B TWI690107 B TW I690107B TW 107140470 A TW107140470 A TW 107140470A TW 107140470 A TW107140470 A TW 107140470A TW I690107 B TWI690107 B TW I690107B
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TW
Taiwan
Prior art keywords
sub
mask
groove
mask plate
vapor deposition
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TW107140470A
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English (en)
Chinese (zh)
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TW201907600A (zh
Inventor
李金庫
康夢華
王夢凡
Original Assignee
大陸商昆山國顯光電有限公司
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Publication of TW201907600A publication Critical patent/TW201907600A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
TW107140470A 2018-05-14 2018-11-14 掩膜板及掩膜元件 TWI690107B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201810454597.5A CN108642440B (zh) 2018-05-14 2018-05-14 掩膜板及掩膜组件
??201810454597.5 2018-05-14
CN201810454597.5 2018-05-14

Publications (2)

Publication Number Publication Date
TW201907600A TW201907600A (zh) 2019-02-16
TWI690107B true TWI690107B (zh) 2020-04-01

Family

ID=63755074

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107140470A TWI690107B (zh) 2018-05-14 2018-11-14 掩膜板及掩膜元件

Country Status (7)

Country Link
US (1) US20210355572A1 (enExample)
EP (1) EP3623495A4 (enExample)
JP (1) JP7029477B2 (enExample)
KR (1) KR102257213B1 (enExample)
CN (1) CN108642440B (enExample)
TW (1) TWI690107B (enExample)
WO (1) WO2019218536A1 (enExample)

Families Citing this family (35)

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US11326245B2 (en) 2018-05-14 2022-05-10 Kunshan Go-Visionox Opto-Electronics Co., Ltd. Masks for fabrication of organic lighting-emitting diode devices
CN208266253U (zh) * 2018-05-14 2018-12-21 昆山国显光电有限公司 掩膜板
CN109207920B (zh) * 2018-11-12 2021-02-09 京东方科技集团股份有限公司 掩模版
CN110760791A (zh) * 2019-02-28 2020-02-07 云谷（固安）科技有限公司 掩膜板及掩膜组件
CN109943804A (zh) * 2019-03-28 2019-06-28 京东方科技集团股份有限公司 一种沉积掩膜板
CN110018610A (zh) * 2019-04-25 2019-07-16 武汉天马微电子有限公司 掩模板、显示面板、显示面板的制作方法和显示装置
CN110004407B (zh) * 2019-05-21 2021-03-02 京东方科技集团股份有限公司 掩膜版组件及其制备方法
CN110364639B (zh) * 2019-07-15 2022-03-22 云谷（固安）科技有限公司 显示面板及其制作方法、掩膜板
CN110331377B (zh) * 2019-07-24 2021-10-29 京东方科技集团股份有限公司 掩膜片及其制作方法、开口掩膜板及其使用方法、薄膜沉积设备
CN110423983B (zh) * 2019-08-30 2021-11-16 京东方科技集团股份有限公司 掩膜版
CN110699637B (zh) * 2019-10-17 2021-03-23 昆山国显光电有限公司 掩膜版的制作方法、掩膜版和显示面板的制作方法
CN210916231U (zh) * 2019-10-18 2020-07-03 昆山国显光电有限公司 一种掩膜版
CN110629158B (zh) * 2019-10-31 2021-01-05 昆山国显光电有限公司 一种掩膜版
CN110846614B (zh) 2019-11-21 2022-03-25 昆山国显光电有限公司 一种掩膜版和蒸镀系统
KR20210094261A (ko) * 2020-01-21 2021-07-29 엘지이노텍 주식회사 Oled 화소 증착을 위한 금속 재질의 증착용 마스크
TWI749533B (zh) * 2020-04-23 2021-12-11 旭暉應用材料股份有限公司 金屬掩膜
CN113621913A (zh) * 2020-05-08 2021-11-09 上海和辉光电股份有限公司 金属掩膜板
CN111647846B (zh) 2020-05-29 2022-02-22 昆山国显光电有限公司 支撑条及掩膜版
CN111549316B (zh) * 2020-06-22 2022-07-15 京东方科技集团股份有限公司 蒸镀用掩膜版
CN111809147B (zh) * 2020-08-17 2023-04-18 昆山国显光电有限公司 掩膜板及蒸镀装置
CN111926291A (zh) * 2020-08-31 2020-11-13 合肥维信诺科技有限公司 掩膜板及掩膜板组件
KR20220055538A (ko) * 2020-10-26 2022-05-04 삼성디스플레이 주식회사 마스크 어셈블리 및 마스크 어셈블리의 제작 방법
CN112662994B (zh) * 2020-12-04 2023-04-25 合肥维信诺科技有限公司 掩膜版及其制备方法
TWI757041B (zh) * 2021-01-08 2022-03-01 達運精密工業股份有限公司 遮罩
CN113215529B (zh) * 2021-04-30 2023-05-12 合肥维信诺科技有限公司 精密掩膜板和掩膜板组件
KR102827235B1 (ko) * 2021-06-14 2025-07-01 삼성디스플레이 주식회사 마스크 및 그 마스크의 제조 방법
CN113832431B (zh) * 2021-11-02 2025-01-07 京东方科技集团股份有限公司 掩膜板及掩膜板结构
CN114032499A (zh) * 2021-11-18 2022-02-11 昆山国显光电有限公司 精密掩膜板和掩膜板
CN114134460B (zh) * 2021-11-29 2023-06-06 昆山国显光电有限公司 掩膜板
CN114107897A (zh) * 2021-11-29 2022-03-01 合肥维信诺科技有限公司 掩膜板及掩膜组件
US20230374646A1 (en) * 2022-05-17 2023-11-23 Samsung Display Co., Ltd. Mask for depositing emission layer, method of manufacturing the mask, and display apparatus manufactured using the mask
CN114645246B (zh) * 2022-05-23 2022-10-21 浙江众凌科技有限公司 一种金属遮罩
CN115433900B (zh) * 2022-09-29 2024-02-20 昆山国显光电有限公司 掩膜板和蒸镀装置
CN115449747B (zh) * 2022-10-19 2024-02-13 云谷（固安）科技有限公司 精密掩模版及其制作方法
CN116657099A (zh) * 2023-05-31 2023-08-29 京东方科技集团股份有限公司 遮挡用金属掩膜板、张网组件、掩膜板以及显示面板

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WO2002084689A1 (en) 2001-04-09 2002-10-24 Fujitsu Limited Partition wall forming method for plasma display panels using sandblast
CN103589996A (zh) * 2013-10-09 2014-02-19 昆山允升吉光电科技有限公司 一种掩模板
WO2016029610A1 (zh) * 2014-08-25 2016-03-03 京东方科技集团股份有限公司 掩膜板、掩膜板组、像素的制作方法及像素结构
CN205662587U (zh) * 2016-05-27 2016-10-26 合肥鑫晟光电科技有限公司 掩膜版、掩膜组件及显示装置
JP6086305B2 (ja) * 2013-01-11 2017-03-01 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
WO2017140052A1 (zh) * 2016-02-18 2017-08-24 京东方科技集团股份有限公司 掩模板罩及掩模板
CN107740040A (zh) * 2017-09-08 2018-02-27 上海天马有机发光显示技术有限公司 掩膜版组件及蒸镀装置
CN107815641A (zh) * 2017-10-25 2018-03-20 信利（惠州）智能显示有限公司 掩膜板
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KR102541449B1 (ko) * 2015-12-22 2023-06-09 삼성디스플레이 주식회사 박막 증착용 마스크 어셈블리
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CN107587106B (zh) * 2017-11-02 2024-12-17 京东方科技集团股份有限公司 掩模板、蒸镀掩模板组件、蒸镀设备及掩模板的制作方法
CN107994054B (zh) * 2017-11-07 2020-05-29 上海天马有机发光显示技术有限公司 一种有机电致发光显示面板、其制作方法及显示装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002084689A1 (en) 2001-04-09 2002-10-24 Fujitsu Limited Partition wall forming method for plasma display panels using sandblast
JP6086305B2 (ja) * 2013-01-11 2017-03-01 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
CN103589996A (zh) * 2013-10-09 2014-02-19 昆山允升吉光电科技有限公司 一种掩模板
WO2016029610A1 (zh) * 2014-08-25 2016-03-03 京东方科技集团股份有限公司 掩膜板、掩膜板组、像素的制作方法及像素结构
WO2017140052A1 (zh) * 2016-02-18 2017-08-24 京东方科技集团股份有限公司 掩模板罩及掩模板
CN205662587U (zh) * 2016-05-27 2016-10-26 合肥鑫晟光电科技有限公司 掩膜版、掩膜组件及显示装置
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CN107815641A (zh) * 2017-10-25 2018-03-20 信利（惠州）智能显示有限公司 掩膜板
CN108004504A (zh) * 2018-01-02 2018-05-08 京东方科技集团股份有限公司 一种掩膜板

Also Published As

Publication number Publication date
TW201907600A (zh) 2019-02-16
US20210355572A1 (en) 2021-11-18
EP3623495A4 (en) 2020-08-26
EP3623495A1 (en) 2020-03-18
JP7029477B2 (ja) 2022-03-03
CN108642440A (zh) 2018-10-12
KR102257213B1 (ko) 2021-05-27
WO2019218536A1 (zh) 2019-11-21
JP2020523478A (ja) 2020-08-06
KR20200013782A (ko) 2020-02-07
CN108642440B (zh) 2019-09-17

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