CN108642440B - 掩膜板及掩膜组件 - Google Patents

掩膜板及掩膜组件 Download PDF

Info

Publication number
CN108642440B
CN108642440B CN201810454597.5A CN201810454597A CN108642440B CN 108642440 B CN108642440 B CN 108642440B CN 201810454597 A CN201810454597 A CN 201810454597A CN 108642440 B CN108642440 B CN 108642440B
Authority
CN
China
Prior art keywords
mask plate
groove
vapor deposition
sub
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201810454597.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN108642440A (zh
Inventor
李金库
康梦华
王梦凡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunshan Guoxian Photoelectric Co Ltd
Original Assignee
Kunshan Guoxian Photoelectric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to CN201810454597.5A priority Critical patent/CN108642440B/zh
Application filed by Kunshan Guoxian Photoelectric Co Ltd filed Critical Kunshan Guoxian Photoelectric Co Ltd
Priority to JP2019568386A priority patent/JP7029477B2/ja
Priority to KR1020207001822A priority patent/KR102257213B1/ko
Priority to PCT/CN2018/103296 priority patent/WO2019218536A1/zh
Priority to EP18918475.7A priority patent/EP3623495A4/en
Priority to US16/331,987 priority patent/US20210355572A1/en
Publication of CN108642440A publication Critical patent/CN108642440A/zh
Priority to TW107140470A priority patent/TWI690107B/zh
Application granted granted Critical
Publication of CN108642440B publication Critical patent/CN108642440B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN201810454597.5A 2018-05-14 2018-05-14 掩膜板及掩膜组件 Active CN108642440B (zh)

Priority Applications (7)

Application Number Priority Date Filing Date Title
CN201810454597.5A CN108642440B (zh) 2018-05-14 2018-05-14 掩膜板及掩膜组件
KR1020207001822A KR102257213B1 (ko) 2018-05-14 2018-08-30 마스크 및 마스크 어셈블리
PCT/CN2018/103296 WO2019218536A1 (zh) 2018-05-14 2018-08-30 掩膜板及掩膜组件
EP18918475.7A EP3623495A4 (en) 2018-05-14 2018-08-30 MASK PLATE AND MASK ARRANGEMENT
JP2019568386A JP7029477B2 (ja) 2018-05-14 2018-08-30 マスク及びマスクコンポーネント
US16/331,987 US20210355572A1 (en) 2018-05-14 2018-08-30 Mask and mask assembly
TW107140470A TWI690107B (zh) 2018-05-14 2018-11-14 掩膜板及掩膜元件

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810454597.5A CN108642440B (zh) 2018-05-14 2018-05-14 掩膜板及掩膜组件

Publications (2)

Publication Number Publication Date
CN108642440A CN108642440A (zh) 2018-10-12
CN108642440B true CN108642440B (zh) 2019-09-17

Family

ID=63755074

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810454597.5A Active CN108642440B (zh) 2018-05-14 2018-05-14 掩膜板及掩膜组件

Country Status (7)

Country Link
US (1) US20210355572A1 (enExample)
EP (1) EP3623495A4 (enExample)
JP (1) JP7029477B2 (enExample)
KR (1) KR102257213B1 (enExample)
CN (1) CN108642440B (enExample)
TW (1) TWI690107B (enExample)
WO (1) WO2019218536A1 (enExample)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11326245B2 (en) 2018-05-14 2022-05-10 Kunshan Go-Visionox Opto-Electronics Co., Ltd. Masks for fabrication of organic lighting-emitting diode devices
CN208266253U (zh) * 2018-05-14 2018-12-21 昆山国显光电有限公司 掩膜板
CN109207920B (zh) * 2018-11-12 2021-02-09 京东方科技集团股份有限公司 掩模版
CN110760791A (zh) * 2019-02-28 2020-02-07 云谷（固安）科技有限公司 掩膜板及掩膜组件
CN109943804A (zh) * 2019-03-28 2019-06-28 京东方科技集团股份有限公司 一种沉积掩膜板
CN110018610A (zh) * 2019-04-25 2019-07-16 武汉天马微电子有限公司 掩模板、显示面板、显示面板的制作方法和显示装置
CN110004407B (zh) * 2019-05-21 2021-03-02 京东方科技集团股份有限公司 掩膜版组件及其制备方法
CN110364639B (zh) * 2019-07-15 2022-03-22 云谷（固安）科技有限公司 显示面板及其制作方法、掩膜板
CN110331377B (zh) * 2019-07-24 2021-10-29 京东方科技集团股份有限公司 掩膜片及其制作方法、开口掩膜板及其使用方法、薄膜沉积设备
CN110423983B (zh) * 2019-08-30 2021-11-16 京东方科技集团股份有限公司 掩膜版
CN110699637B (zh) * 2019-10-17 2021-03-23 昆山国显光电有限公司 掩膜版的制作方法、掩膜版和显示面板的制作方法
CN210916231U (zh) * 2019-10-18 2020-07-03 昆山国显光电有限公司 一种掩膜版
CN110629158B (zh) * 2019-10-31 2021-01-05 昆山国显光电有限公司 一种掩膜版
CN110846614B (zh) 2019-11-21 2022-03-25 昆山国显光电有限公司 一种掩膜版和蒸镀系统
KR20210094261A (ko) * 2020-01-21 2021-07-29 엘지이노텍 주식회사 Oled 화소 증착을 위한 금속 재질의 증착용 마스크
TWI749533B (zh) * 2020-04-23 2021-12-11 旭暉應用材料股份有限公司 金屬掩膜
CN113621913A (zh) * 2020-05-08 2021-11-09 上海和辉光电股份有限公司 金属掩膜板
CN111647846B (zh) 2020-05-29 2022-02-22 昆山国显光电有限公司 支撑条及掩膜版
CN111549316B (zh) * 2020-06-22 2022-07-15 京东方科技集团股份有限公司 蒸镀用掩膜版
CN111809147B (zh) * 2020-08-17 2023-04-18 昆山国显光电有限公司 掩膜板及蒸镀装置
CN111926291A (zh) * 2020-08-31 2020-11-13 合肥维信诺科技有限公司 掩膜板及掩膜板组件
KR20220055538A (ko) * 2020-10-26 2022-05-04 삼성디스플레이 주식회사 마스크 어셈블리 및 마스크 어셈블리의 제작 방법
CN112662994B (zh) * 2020-12-04 2023-04-25 合肥维信诺科技有限公司 掩膜版及其制备方法
TWI757041B (zh) * 2021-01-08 2022-03-01 達運精密工業股份有限公司 遮罩
CN113215529B (zh) * 2021-04-30 2023-05-12 合肥维信诺科技有限公司 精密掩膜板和掩膜板组件
KR102827235B1 (ko) * 2021-06-14 2025-07-01 삼성디스플레이 주식회사 마스크 및 그 마스크의 제조 방법
CN113832431B (zh) * 2021-11-02 2025-01-07 京东方科技集团股份有限公司 掩膜板及掩膜板结构
CN114032499A (zh) * 2021-11-18 2022-02-11 昆山国显光电有限公司 精密掩膜板和掩膜板
CN114134460B (zh) * 2021-11-29 2023-06-06 昆山国显光电有限公司 掩膜板
CN114107897A (zh) * 2021-11-29 2022-03-01 合肥维信诺科技有限公司 掩膜板及掩膜组件
US20230374646A1 (en) * 2022-05-17 2023-11-23 Samsung Display Co., Ltd. Mask for depositing emission layer, method of manufacturing the mask, and display apparatus manufactured using the mask
CN114645246B (zh) * 2022-05-23 2022-10-21 浙江众凌科技有限公司 一种金属遮罩
CN115433900B (zh) * 2022-09-29 2024-02-20 昆山国显光电有限公司 掩膜板和蒸镀装置
CN115449747B (zh) * 2022-10-19 2024-02-13 云谷（固安）科技有限公司 精密掩模版及其制作方法
CN116657099A (zh) * 2023-05-31 2023-08-29 京东方科技集团股份有限公司 遮挡用金属掩膜板、张网组件、掩膜板以及显示面板

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002084689A1 (en) * 2001-04-09 2002-10-24 Fujitsu Limited Partition wall forming method for plasma display panels using sandblast
CN205662587U (zh) * 2016-05-27 2016-10-26 合肥鑫晟光电科技有限公司 掩膜版、掩膜组件及显示装置
CN107740040A (zh) * 2017-09-08 2018-02-27 上海天马有机发光显示技术有限公司 掩膜版组件及蒸镀装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007039777A (ja) * 2005-08-05 2007-02-15 Tohoku Pioneer Corp 成膜用マスク、自発光パネルの製造方法、および自発光パネル
KR101117645B1 (ko) * 2009-02-05 2012-03-05 삼성모바일디스플레이주식회사 마스크 조립체 및 이를 이용한 평판표시장치용 증착 장치
JP6086305B2 (ja) * 2013-01-11 2017-03-01 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
CN103589996A (zh) * 2013-10-09 2014-02-19 昆山允升吉光电科技有限公司 一种掩模板
CN104330954B (zh) * 2014-08-25 2016-06-01 京东方科技集团股份有限公司 掩膜版、掩膜版组、像素的制作方法及像素结构
KR102541449B1 (ko) * 2015-12-22 2023-06-09 삼성디스플레이 주식회사 박막 증착용 마스크 어셈블리
CN105549321B (zh) * 2016-02-18 2020-01-31 京东方科技集团股份有限公司 一种掩模板罩及掩模板
WO2019038861A1 (ja) * 2017-08-23 2019-02-28 シャープ株式会社 蒸着マスク、表示パネルの製造方法、及び表示パネル
CN107815641B (zh) * 2017-10-25 2020-05-19 信利（惠州）智能显示有限公司 掩膜板
CN107587106B (zh) * 2017-11-02 2024-12-17 京东方科技集团股份有限公司 掩模板、蒸镀掩模板组件、蒸镀设备及掩模板的制作方法
CN107994054B (zh) * 2017-11-07 2020-05-29 上海天马有机发光显示技术有限公司 一种有机电致发光显示面板、其制作方法及显示装置
CN108004504B (zh) * 2018-01-02 2019-06-14 京东方科技集团股份有限公司 一种掩膜板

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002084689A1 (en) * 2001-04-09 2002-10-24 Fujitsu Limited Partition wall forming method for plasma display panels using sandblast
CN205662587U (zh) * 2016-05-27 2016-10-26 合肥鑫晟光电科技有限公司 掩膜版、掩膜组件及显示装置
CN107740040A (zh) * 2017-09-08 2018-02-27 上海天马有机发光显示技术有限公司 掩膜版组件及蒸镀装置

Also Published As

Publication number Publication date
TW201907600A (zh) 2019-02-16
US20210355572A1 (en) 2021-11-18
EP3623495A4 (en) 2020-08-26
EP3623495A1 (en) 2020-03-18
JP7029477B2 (ja) 2022-03-03
CN108642440A (zh) 2018-10-12
KR102257213B1 (ko) 2021-05-27
WO2019218536A1 (zh) 2019-11-21
JP2020523478A (ja) 2020-08-06
TWI690107B (zh) 2020-04-01
KR20200013782A (ko) 2020-02-07

Similar Documents

Publication Publication Date Title
CN108642440B (zh) 掩膜板及掩膜组件
CN110079763A (zh) 掩膜板及掩膜组件
JP7005672B2 (ja) 蒸着用マスク及びこれを用いたｏｌｅｄパネル
CN208266253U (zh) 掩膜板
KR101865215B1 (ko) 픽셀 구조 및 상기 픽셀 구조를 사용한 유기 발광 디스플레이
CN104576695B (zh) Oled像素排列结构及显示装置
CN110364558A (zh) 像素排布结构及显示面板
KR102791395B1 (ko) 화소 배열 구조 및 표시 패널
TWI706399B (zh) 顯示面板的像素排列結構及顯示裝置
CN104576696B (zh) 一种像素结构及采用该像素结构的有机发光显示器
US11882748B2 (en) Pixel structure and display panel
CN107731870A (zh) 有机发光二极管像素结构及包含其的显示面板、显示装置
WO2014180104A1 (zh) 显示基板及其驱动方法、显示装置
CN107706213A (zh) 一种oled显示面板及其像素排列结构
CN109671759A (zh) Oled像素结构
CN108559946A (zh) 掩膜组件、主掩膜板及配合掩膜板
CN104409474B (zh) 像素单元、像素结构及其制作方法
CN207781594U (zh) 一种像素结构及显示面板
CN108511493A (zh) 有机发光显示面板及其制作方法、有机发光显示装置
WO2016050012A1 (zh) 阵列基板、掩膜板和显示装置
US20160246087A1 (en) Liquid crystal display device, and motherboard of liquid crystal display panel and method for manufacturing the same
CN111383542A (zh) 像素结构和显示面板
CN104651778B (zh) 一种金属掩膜板及其制作出的有机电致发光显示器件
CN105529353A (zh) 显示器及其像素结构
CN107425045A (zh) 一种阵列基板、显示器件和阵列基板的制造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant