WO2019218605A1 - 掩膜板 - Google Patents

掩膜板 Download PDF

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Publication number
WO2019218605A1
WO2019218605A1 PCT/CN2018/113113 CN2018113113W WO2019218605A1 WO 2019218605 A1 WO2019218605 A1 WO 2019218605A1 CN 2018113113 W CN2018113113 W CN 2018113113W WO 2019218605 A1 WO2019218605 A1 WO 2019218605A1
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WO
WIPO (PCT)
Prior art keywords
mask
sub
groove
masks
vapor deposition
Prior art date
Application number
PCT/CN2018/113113
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English (en)
French (fr)
Inventor
王梦凡
王国兵
苏倩
李金库
康梦华
叶訢
Original Assignee
昆山国显光电有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 昆山国显光电有限公司 filed Critical 昆山国显光电有限公司
Priority to US16/424,493 priority Critical patent/US11326245B2/en
Publication of WO2019218605A1 publication Critical patent/WO2019218605A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Definitions

  • the present disclosure relates to the field of display technology, and in particular to a mask.
  • OLED Organic Light-Emitting Diode
  • LCD liquid crystal display
  • a mask for vacuum evaporation is a vital component, and the mask can control the position where the organic material is deposited on the substrate.
  • the mask mainly includes a common metal mask (CMM) and a precision metal mask (FMM), the CMM is used for vapor deposition of a common layer, and the FMM is used for vapor deposition of a light-emitting layer.
  • CMM common metal mask
  • FMM precision metal mask
  • the inventors have found that when the mask is used in the prior art, the profiled area is prone to wrinkles, resulting in a decrease in the precision of the pixel evaporation position of the subsequent display screen.
  • the present disclosure provides a mask for solving the problem of wrinkles when the mask is stretched, and improving the accuracy of the pixel evaporation position of the subsequent display screen.
  • the present disclosure provides a mask.
  • the mask plate includes: a mask body; at least one sub-mask disposed on the mask body, the sub-mask includes an evaporation zone and a shielding portion, wherein the sub-mask In the thickness direction, the shielding portion is provided with at least one groove whose depth is smaller than the thickness of the mask body.
  • the shielding portion has a vapor deposition surface and a glass surface, the vapor deposition surface is disposed facing the evaporation source, the glass surface is disposed away from the evaporation source, and the groove is opened in the steaming Plated surface.
  • the number of the grooves is one, and the bottom wall of the groove is a vapor deposition surface of the shielding portion.
  • the number of the grooves is at least two, and a spacing is provided between each adjacent two of the grooves on a plane of the sub-mask.
  • the shielding portion has a vapor deposition surface and a glass surface, the vapor deposition surface is disposed facing the evaporation source, the glass surface is disposed away from the evaporation source, and the groove is opened in the glass surface.
  • the shielding portion has a vapor deposition surface and a glass surface, the vapor deposition surface is disposed facing the evaporation source, the glass surface is disposed away from the evaporation source, and the at least one groove includes the first a groove and a second groove, the first groove is formed on the vapor deposition surface, and the second groove is formed on the glass surface, along the thickness direction of the shielding portion, the first concave There is a spacing between the bottom wall of the groove and the bottom wall of the second groove.
  • the first groove has a first projection on a plane of the sub-mask
  • the second groove has a second projection
  • the first projection and the second The projections at least partially overlap.
  • the first groove has a first projection on a plane of the sub-mask
  • the second groove has a second projection
  • the first projection and the second Projection has no overlapping areas.
  • the depth of the first groove is greater than or equal to the depth of the second groove.
  • the depth of the first groove and the second groove are both half of the thickness of the mask body, or the first groove and the second groove The depth of the grooves is greater than half the thickness of the mask body.
  • the cross-sectional shape of the groove is polygonal or circular or elliptical.
  • the mask body has a first centerline and a second centerline, the first centerline being perpendicular to the second centerline;
  • the mask body is provided with two sets of the sub-masks, each set of the sub-masks comprising at least one of the sub-masks, and between each adjacent two of the sub-masks The spacing, the two sets of the sub-masks are axisymmetric with respect to the first centerline, and the two sets of the sub-masks are axisymmetric with respect to the second centerline.
  • the mask body has a center line, and the mask body is provided with a row of sub-masks, and the shielding portions of the sub-masks on the same side of the center line are backed. Set to or toward the centerline.
  • the mask body has a center line
  • the mask body is provided with a row of sub-masks
  • the sub-mask on the same side of the center line includes a plurality of sub-masks a plate
  • each of the sub-set masks includes two adjacent sub-masks
  • the shielding portions of the adjacent two sub-masks are oppositely disposed.
  • the mask body has a center line, and the mask body is provided with a plurality of rows of masks, and the shielding portions of the sub-masks on the same side of the center line are Set back or facing the centerline.
  • the mask body has a center line
  • the mask body is provided with a plurality of rows of masks
  • the sub-masks on the same side of the center line include a plurality of sub-groups.
  • a mask each of the sub-set masks includes two adjacent sub-masks, and the shielding portions of the adjacent two sub-masks are oppositely disposed.
  • the mask body has a first centerline and a second centerline, the first centerline is perpendicular to the second centerline, and the sub-mask is about the first centerline Or the second centerline is symmetrical.
  • the mask further includes a mask frame, the mask body being fixedly coupled to the mask frame.
  • the mask provided by the present disclosure has a groove formed in the shielding portion, and the depth of the single groove is smaller than the thickness of the mask body (the groove does not penetrate the mask body in the thickness direction), thereby ensuring that the shielding portion is not
  • the pixel is vapor-deposited onto the substrate, and the thickness of the shielding portion is reduced, so that the weight of the shielding portion is reduced, the weight difference between the weight of the shielding portion and the vapor deposition portion is small, and the stress concentration of the shielding portion is reduced, thereby
  • the mask body is evenly stressed during the process of stretching, which further reduces the wrinkle phenomenon of the mask body during the web process.
  • FIG. 1 is a schematic structural view of a mask according to an embodiment of the present disclosure
  • FIG. 2 is a schematic structural view of a mask according to another embodiment of the present disclosure.
  • FIG. 3 is a schematic structural view of a mask according to still another embodiment of the present disclosure.
  • FIG. 4 is a schematic structural view of a mask according to still another embodiment of the present disclosure.
  • FIG. 5 is a schematic structural view of a mask according to still another embodiment of the present disclosure.
  • FIG. 6 is a cross-sectional view of a longitudinal section of a shielding portion of a mask according to an embodiment of the present disclosure
  • FIG. 7 is a cross-sectional view of a longitudinal section of a shielding portion of a mask according to another embodiment of the present disclosure.
  • FIG. 8 is a cross-sectional view of a longitudinal section of a shielding portion of a mask according to still another embodiment of the present disclosure.
  • FIG. 9 is a cross-sectional view of a longitudinal section of a shielding portion of a mask according to still another embodiment of the present disclosure.
  • the root cause of such a problem is that the slotted screen body needs to be in the manufacturing process. Opening at the corresponding position, that is, there is a shielding portion on the mask plate (that is, a region where the vapor deposition hole is not provided), since the structure of the shielding portion and the vapor deposition region are largely different, the stress is concentrated on the shielding portion, and the stress is blocked. When the parts are concentrated, the force of the entire mask is uneven, and the wrinkles are caused by the uneven force.
  • an embodiment of the present disclosure provides a mask 100 including a mask body 10, wherein at least one sub-mask 101 is disposed in the mask body 10, and each sub-mask
  • the plate 101 includes a vapor deposition zone 11 and a shielding portion 12 for forming a shaped screen grooved area.
  • the shielding portion 12 is provided with at least one groove 121 (see FIG. 6). The depth of the groove 121 is smaller than the thickness of the mask body 10.
  • the mask 100 provided in this embodiment has a recess 121 in the shielding portion 12, and the depth of the recess 121 is smaller than the thickness of the mask main body 10 (the recess 121 does not penetrate the mask main body 10 in the thickness direction). Therefore, it is ensured that the shielding portion 12 does not have the pixel vapor deposition on the substrate, and the thickness of the shielding portion 12 is reduced, so that the weight of the shielding portion 12 is reduced, and the weight of the shielding portion 12 and the weight of the vapor deposition portion 11 are different. Small, the stress concentration of the shielding portion 12 is reduced, so that the mask body 10 is uniformly stressed during the web laying process, and the wrinkle phenomenon of the mask main body 10 during the web stretching process is further reduced.
  • the shape of the mask body 10 is not limited, and may be a regular rectangular or circular shape. In other embodiments, other irregular shapes, such as a quadrangular mask, may also be used.
  • the shape of the sub-mask 101 is not limited, and may be rectangular, in which case the vapor deposition zone 11 has an opening, and the opening is formed on one side or a plurality of sides of the vapor deposition zone 11.
  • the shape of the shielding portion 12 of the sub-mask 101 is also not limited, and may be an arc-shaped shielding portion 12 or a polygonal shielding portion 12.
  • At least two sub-masks 101 are disposed on the mask body 10, and a spacing is provided between each adjacent two sub-masks 101.
  • the mask body 10 has two sets of sub-masks 101. Each set of sub-masks 101 includes at least one sub-mask 101.
  • the mask body 10 has a first center line and a second center line, and the first center The line is perpendicular to the second centerline, the two sets of sub-masks 101 are axisymmetric about the first centerline, and the two sets of sub-masks 101 are axisymmetric about the second centerline.
  • the two sets of sub-masks 101 are axially symmetrically arranged with respect to the first center line and the second center line, the number of the shielding portions 12 located on both sides of the first center line and the second center line is the same, and the mask body is at this time. 10
  • the first center line and the second center line are evenly stressed, which further reduces the wrinkles of the position of the shielding portion 12, and the precision of the netting is improved, so that the pixel display position of the subsequent display screen is more accurate, and The display effect of the open area (ie, the shaped area) of the subsequent display screen is also improved.
  • a mask mask 101 is disposed on the mask body 10, and the first center is connected to the center of the left and right sides of the mask body 10 in FIG.
  • the shielding portions 12 of the sub-mask 101 on the same side of the second center line are disposed facing away from the second center line.
  • a row of sub-masks 101 is disposed on the mask body 10, and the center of the left and right sides of the mask body 10 in FIG.
  • the shielding portions 12 of the sub-mask 101 on the same side of the second center line are disposed facing the second center line.
  • the center line when the connection between the centers of the upper and lower sides is the second center line, the sub-mask 101 on the same side of the second center line may be provided with a plurality of sub-group sub-masks 101, and each sub-sub-mask 101 includes The two sub-masks 101 adjacent to each other, the shielding portions 12 of the two sub-masks 101 of each sub-group of the sub-mask 101 are oppositely disposed.
  • a plurality of rows of masks 101 are disposed on the mask body 10, and the center of the left and right sides of the mask body 10 in FIG.
  • the shielding portions 12 of the sub-mask 101 on the same side of the second center line are disposed facing the second center line.
  • the shielding portions 12 of the sub-mask 101 located on the same side of the second center line may also be disposed away from the second center line.
  • the sub-mask 101 in each row on the same side of the second center line may also be disposed to include a plurality of sub-group sub-masks 101, each of the sub-sub-masks 101 including two adjacent sub-masks
  • the mask 101, the shielding portions 12 of the two sub-masks 101 of each sub-group sub-mask 101 are oppositely disposed.
  • the two sets of sub-masks 101 may be symmetrically disposed only with respect to one of the center lines, as shown in FIG.
  • the line connecting the centers of the left and right sides of the main body 10 is the first center line
  • the two sets of sub-masks 101 are only symmetrical about the first center line
  • the two centerlines are not axisymmetric.
  • the two sets of sub-masks 101 may also be axisymmetric only about the second centerline and not axisymmetric about the first centerline.
  • the number of sub-masks 101 can be chosen to be odd, in which case the sub-mask 101 is only symmetrical about one of the centerlines and asymmetric about the other centerline.
  • the mask 100 further includes a mask frame, a mask body 10 is fixedly connected to the mask frame, or a plurality of mask bodies 10 are arranged side by side and fixedly connected to the mask frame.
  • the mask 100 may be a general metal mask or a precision metal mask.
  • the shielding portion 12 has a vapor deposition surface 122 and a glass surface 122.
  • the vapor deposition surface 122 and the glass surface 123 are respectively located on opposite sides of the shielding portion 12, and the vapor deposition surface 122 faces the vapor deposition source, and the glass surface 123 faces away.
  • the evaporation source is set.
  • the groove 121 may be opened in the shielding portion 12 in one of three ways:
  • the groove 121 is only opened on the vapor deposition surface 122;
  • the groove 121 is only opened on the glass surface 123;
  • the groove 121 is simultaneously opened on the vapor deposition surface 122 and the glass surface 123.
  • the groove 121 is formed on the vapor deposition surface 122, that is, the groove 121 is formed only on the vapor deposition surface 122.
  • the number of the grooves 121 formed in the vapor deposition surface 122 is one, and the groove 121 is opened on the vapor deposition surface 122 in such a manner that the entire surface is half-cut (that is, the depth of the groove 121 is smaller than the shielding portion 12).
  • the groove 121 is disposed to cover the entire area of the vapor deposition surface 122, and the groove 121 may be disposed to cover most of the area of the vapor deposition surface 122, and the cross-sectional shape of the groove 121 may be a polygon, such as a triangle. Rectangular or pentagon, etc., can also be round or oval.
  • the bottom wall of the groove 121 is exactly the same size as the vapor deposition surface 122 of the shielding portion 12, and the bottom wall of the groove 121 can serve as the vapor deposition of the shielding portion 12. surface.
  • the number of the grooves 121 formed in the vapor deposition surface 122 is at least two, and the spacing between each adjacent two grooves 121 is on the plane of the sub-mask 101. At least two grooves 121 are opened on the vapor deposition surface 122 in a strip shape or a half shape.
  • the cross-sectional shape of the groove 121 is elongated; when the groove 121 is in the shape of a dot, the cross-sectional shape of the groove 121 is circular or elliptical.
  • the long side of the strip of the cross-section of the groove 121 extends in the direction of the long side of the mask body to further reduce the web fold of the mask. .
  • the groove 121 is simultaneously formed on the vapor deposition surface 122 and the glass surface 123 , that is, the groove 121 is formed on both the vapor deposition surface 122 and the glass surface 123 to further reduce the mask sheet.
  • the influence on the hardness of the mask 100 itself further reduces the wrinkles.
  • the groove 121 is only formed on the vapor deposition surface 122, the hardness of the vapor deposition surface 122 is smaller than the hardness of the glass surface 123. At this time, there is a risk of breakage to some extent, when the groove 121 is only opened on the glass surface 123. is also like this.
  • the groove 121 includes a first groove 124 having a bottom wall and a second groove 125 having a bottom wall.
  • the first groove 124 is formed on the vapor deposition surface 122
  • the second groove 125 is formed on the glass surface 123.
  • the first groove 124 and the second groove 125 are spaced apart from each other in the thickness direction of the shielding portion 12, that is, the bottom wall of the first groove 124 and the bottom wall of the second groove 125 are spaced apart to ensure any one.
  • the first groove 124 and any one of the second grooves 125 do not have a mutual communication in the thickness direction of the shielding portion 12, thereby preventing the occurrence of pixel evaporation onto the substrate.
  • the depths of the first groove 124 and the second groove 125 along the thickness direction of the shielding portion 12 may be the same or different, and the cross-sectional shapes of the first groove 124 and the second groove 125 may be the same or different. More specifically, the depth of the first groove 124 is greater than the depth of the second groove 125, or the depth of the first groove 124 is equal to the depth of the second groove 125. The depth of the first groove 124 and the second groove 125 are both half of the thickness of the mask body 10, or the depths of the first groove 124 and the second groove 125 are both greater than the thickness of the mask body 10. half.
  • the number of the first recess 124 and the second recess 125 is one.
  • each of the first grooves 124 has a first projection toward a plane of the sub-mask 101
  • each of the second grooves 125 has a second projection, a first projection and a second projection, facing a plane of the sub-mask 101.
  • the sum of the depths of the first groove 124 and the second groove 125 in the thickness direction of 12 is smaller than the thickness of the shielding portion 12.
  • the first groove 124 covers most or all of the area of the vapor deposition surface 122
  • the second groove 125 covers most or all of the glass surface 123
  • the first projection completely overlaps the second projection. It can be understood that in other embodiments, the first projection and the second projection may not completely overlap, and only a partial overlap may be adopted.
  • the number of the first groove 124 and the second groove 125 are both at least two. Specifically, each of the first grooves 124 has a first projection toward a plane of the sub-mask 101, and each of the second grooves 125 has a second projection, a first projection and a second projection, facing a plane of the sub-mask 101. At least partially overlapping, the sum of the depths of the first groove 124 and the second groove 125 in the thickness direction of the shielding portion 12 is smaller than the thickness of the shielding portion 12.
  • the first projection completely overlaps the second projection. It can be understood that in other embodiments, the first projection and the second projection may not completely overlap, and only a partial overlap may be adopted.
  • the number of the first groove 124 and the second groove 125 may be the same or different, for example, the first groove 124 is two, the second groove 125 is also two, or the first The number of the grooves 124 is two, and the number of the second grooves 125 is three.
  • the number of the first recess 124 and the second recess 125 is one.
  • the first groove 124 has a first projection toward the plane of the sub-mask 101
  • the second groove 125 has a second projection toward the plane of the sub-mask 101.
  • the first projection and the second projection are alternately arranged, that is, There is no overlapping area between the first projection and the second projection.
  • first groove 124 and the second groove 125 are offset from each other on a plane where the sub-mask 101 is located, and the adjacent first concave can be disposed at this time.
  • the sum of the depths of the groove 124 and the second groove 125 is larger than the thickness of the shielding portion 12, and such a setting does not cause the shielding portion 12 to penetrate in the thickness direction, and the subsequent vapor deposition is not affected.
  • the number of the first groove 124 and the second groove 125 are both at least two, and the first groove 124 has a first projection toward the plane of the shielding portion 12, and the second groove The first projection and the second projection are offset from each other.
  • the sum of the depths of the adjacent first and second grooves 124 and 125 is greater than the thickness of the shielding portion 12 .
  • the difference between the weight of the shielding portion 12 and the weight of the vapor deposition zone 11 is small, and the stress concentration of the shielding portion 12 is lowered, so that the mask body 10 is evenly stressed during the web laying process, and the mask body 10 is reduced in the net.

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  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
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  • Physical Vapour Deposition (AREA)
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Abstract

一种掩膜板（100），包括：掩膜板主体（10）；设置于掩膜板主体（10）上的至少一个子掩膜板（101），子掩膜板（101）包括蒸镀区（11）和遮挡部（12），在子掩膜板（101）的厚度方向上，遮挡部（12）开设有至少一个凹槽（121），凹槽（121）的深度小于掩膜板主体（10）的厚度。

Description

掩膜板 技术领域
本公开涉及显示技术领域，特别是涉及一种掩膜板。
背景技术
有机发光二极管(Organic Light-Emitting Diode，OLED)又称为有机电激光显示或有机发光半导体。OLED具有驱动电压低、主动发光、视角宽、效率高、响应速度快、易实现全彩色大面积壁挂式显示和柔性显示的许多特点而逐渐取代液晶显示器(Liquid Crystal Display，LCD)显示。
在OLED制造技术中，真空蒸镀用的掩膜板是至关重要的部件，掩膜板可以控制有机材料沉积在基板上的位置。掩膜板主要包括通用金属掩膜板(Common Metal Mask，CMM)及精密金属掩膜板(Fine Metal Mask，FMM)，CMM用于蒸镀共通层，FMM用于蒸镀发光层。
发明人发现，采用现有技术中的掩膜板张网时异形区容易出现褶皱，导致后续显示屏像素蒸镀位置精度降低。
发明内容
基于此，本公开提供了一种掩膜板，解决了掩膜板张网时出现褶皱的问题，提高了后续显示屏像素蒸镀位置的精度。
为实现以上目的，本公开提供了一种掩膜板。所述掩膜板包括：掩膜板主体；设置于所述掩膜板主体上的至少一个子掩膜板，所述子掩膜板包括蒸镀区和遮挡部，在所述子掩膜板的厚度方向上，所述遮挡部开设有至少一个凹槽，所述凹槽的深度小于所述掩膜板主体的厚度。
在其中一个实施例中，所述遮挡部具有蒸镀面与玻璃面，所述蒸镀面面向蒸镀源设置，所述玻璃面背向蒸镀源设置，所述凹槽开设于所述蒸镀面。
在其中一个实施例中，所述凹槽的数量为一个，所述凹槽的底壁为所述遮挡部的蒸镀面。
在其中一个实施例中，所述凹槽的数量为至少两个，在所述子掩膜板所在平面上，每相邻两个所述凹槽之间具有间距。
在其中一个实施例中，所述遮挡部具有蒸镀面与玻璃面，所述蒸镀面面向蒸镀源设置，所述玻璃面背向蒸镀源设置，所述凹槽开设于所述玻璃面。
在其中一个实施例中，所述遮挡部具有蒸镀面与玻璃面，所述蒸镀面面向蒸镀源设置，所述玻璃面背向蒸镀源设置，所述至少一个凹槽包括第一凹槽与第二凹槽，所述第一凹槽开设于所述蒸镀面，所述第二凹槽开设于所述玻璃面，沿所述遮挡部的厚度方向上，所述第一凹槽的底壁与所述第二凹槽的底壁之间具有间距。
在其中一个实施例中，在所述子掩膜板所在平面上，所述第一凹槽具有第一投影，所述第二凹槽具有第二投影，所述第一投影与所述第二投影至少部分重叠。
在其中一个实施例中，在所述子掩膜板所在平面上，所述第一凹槽具有第一投影，所述第二凹槽具有第二投影，所述第一投影与所述第二投影无重叠区域。
在其中一个实施例中，所述第一凹槽的深度大于或等于所述第二凹槽的深度。
在其中一个实施例中，所述第一凹槽的与所述第二凹槽的深度均为所述掩膜板主体的厚度的一半，或者所述第一凹槽的与所述第二凹槽的深度均大于所述掩膜板主体的厚度的一半。
在其中一个实施例中，所述凹槽的横截面形状为多边形或圆形或椭圆形。
在其中一个实施例中，所述掩膜板主体具有第一中心线与第二中心线，所述第一中心线与所述第二中心线垂直；
所述掩膜板主体上设置有两组所述子掩膜板，每组所述子掩膜板包括至少一个所述子掩膜板，每相邻两个所述子掩膜板之间具有间距，两组所述子掩膜板关于所述第一中心线轴对称，且两组所述子掩膜板关于所述第二中心线轴对称。
在其中一个实施例中，所述掩膜板主体具有一中心线，所述掩膜板主体上设有一排子掩膜板，位于所述中心线同侧的子掩膜板的遮挡部均背向或面向所述中心线设置。
在其中一个实施例中，所述掩膜板主体具有中心线，所述掩膜板主体上设有一排子掩膜板，位于所述中心线同侧的子掩膜板包括多个子组掩膜板，每个所述子组掩膜板包括相邻的两个子掩膜板，所述相邻的两个子掩膜板的遮挡部相对设置。
在其中一个实施例中，所述掩膜板主体具有一中心线，所述掩膜板主体上设有多排子掩膜板，位于所述中心线同侧的子掩膜板的遮挡部均背向或面向所述中心线设置。
在其中一个实施例中，所述掩膜板主体具有一中心线，所述掩膜板主体上设有多排子掩膜板，位于所述中心线同侧的子掩膜板包括多个子组掩膜板，每个所述子组掩膜板包括相邻的两个子掩膜板，所述相邻的两个子掩膜板的遮挡部相对设置。
在其中一个实施例中，所述掩膜板主体具有第一中心线与第二中心线，所述第一中心线与所述第二中心线垂直，所述子掩膜板关于第一中心线或第二中心线对称。
在其中一个实施例中，所述掩膜板还包括掩膜板框架，所述掩膜板主体固定连接于所述掩膜板框架。
本公开提供的掩膜板，由于在遮挡部开设有凹槽，且单个凹槽的深度小于掩膜板主体的厚度(凹槽沿厚度方向并非贯穿掩膜板主体)，既保证了遮挡部不会存在像素蒸镀到基板上，又减少了遮挡部的厚度，从而使遮挡部的重量减小，使遮挡部的重量与蒸镀区的重量差距小，降低了遮挡部的应力集中，从而使掩膜板主体在张网过程中受力均匀，进一步降低了掩膜板主体在张网过程中的褶皱现象。
附图说明
图1为根据本公开的一个实施例的掩膜板的结构示意图；
图2为根据本公开的另一个实施例的掩膜板的结构示意图；
图3为根据本公开的又一个实施例的掩膜板的结构示意图；
图4为根据本公开的又一个实施例的掩膜板的结构示意图；
图5为根据本公开的又一个实施例的掩膜板的结构示意图；
图6为根据本公开的一个实施例的掩膜板的遮挡部的纵剖面的剖视图；
图7为根据本公开的另一个实施例的掩膜板的遮挡部的纵剖面的剖视图；
图8为根据本公开的又一个实施例的掩膜板的遮挡部的纵剖面的剖视图；
图9为根据本公开的又一个实施例的掩膜板的遮挡部的纵剖面的剖视图。
具体实施方式
为了便于理解本公开，下面将参照相关附图对本公开进行更全面的描述。附图中给出了本公开的较佳实施例。但是，本公开可以以许多不同的形式来实现，并不限于本文所描述的实施例。相反地，提供这些实施例的目的是使对本公开的公开内容的理解更加透彻全面。
需要说明的是，当元件被称为“固定于”另一个元件，它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件，它可以是直接连接到另一个元件或者可能同时存在居中元件。本文所使用的术语“垂直的”、“水平的”、“左”、“右”以及类似的表述只是为了说明的目的。
除非另有定义，本文所使用的所有的技术和科学术语与属于本公开的技术领域的技术人员通常理解的含义相同。本文中在本公开的说明书中所使用的术语只是为了描述具体的实施例的目的，不是旨在于限制本公开。本文所使用的术语“及/或”包括一个或多个相关的所列项目的任意的和所有的组合。
正如背景技术中所述，采用现有技术中的掩膜板，会出现张网时褶皱的问题，发明人研究发现，出现这种问题的根本原因在于，开槽屏体在制作过程中需要在相应位置进行开口， 即在掩膜板上存在遮挡部(即没有设置蒸镀孔的区域)，由于遮挡部与蒸镀区的结构存在较大区别，应力会集中在遮挡部，当应力在遮挡部集中时，则整个掩膜板的受力不均，在受力不均的驱使下会导致褶皱的发生。
参阅图1-图3，基于以上原因，本公开实施例提供一种掩膜板100，包括掩膜板主体10，在掩膜板主体10设置有至少一个子掩膜板101，每个子掩膜板101包括蒸镀区11与遮挡部12，遮挡部12用于形成异形屏开槽区，在子掩膜板101的厚度方向上，遮挡部12开设有至少一个凹槽121(参阅图6)，凹槽121的深度小于掩膜板主体10的厚度。
本实施例提供的掩膜板100，由于在遮挡部12开设有凹槽121，且凹槽121的深度小于掩膜板主体10的厚度(凹槽121沿厚度方向并非贯穿掩膜板主体10)，既保证了遮挡部12不会存在像素蒸镀到基板上，又减少了遮挡部12的厚度，从而使遮挡部12的重量减小，使遮挡部12的重量与蒸镀区11的重量差距小，降低了遮挡部12的应力集中，从而使掩膜板主体10在张网过程中受力均匀，进一步降低了掩膜板主体10在张网过程中的褶皱现象。
在本实施例中，掩膜板主体10的形状不受限定，如可以为规则的长方体状或圆形，在其他实施例中，也可以选用其他不规则的形状，如类四边形的掩膜板主体10，其中相对的两条边为直线，另外相对的两条边为弧形的异形。此外，子掩膜板101的形状也不受限定，如可以为长方形，此时蒸镀区11具有开口部，开口部开设于蒸镀区11的一条边或者多条边上。子掩膜板101的遮挡部12的形状也不受限定，如可以为弧形遮挡部12，也可以为多边形遮挡部12。
具体地，掩膜板主体10上设置有至少两个子掩膜板101，每相邻两个子掩膜板101之间具有间距。
掩膜板主体10上具有两组子掩膜板101，每组子掩膜板101包括至少一个子掩膜板101，掩膜板主体10具有第一中心线与第二中心线，第一中心线与第二中心线垂直，两组子掩膜板101关于第一中心线轴对称，且两组子掩膜板101关于第二中心线轴对称。
由于两组子掩膜板101关于第一中心线与第二中心线均轴对称设置，因此位于第一中心线与第二中心线两侧的遮挡部12的数量相同，此时掩膜板主体10在张网时第一中心线与第二中心线两侧受力均匀，进一步降低了遮挡部12位置的褶皱，张网精度提高，从而也使得后续显示屏像素蒸镀位置精度较高，且也提高了后续显示屏的开口区(即异形区)的显示效果。
在其中一个实施例中，继续参阅图1，在掩膜板主体10上设置有一排子掩膜板101，当以图1中的掩膜板主体10的左右两边中心的连线为第一中心线，上下两边中心的连线为第二中心线时，位于第二中心线同侧的子掩膜板101的遮挡部12均背向第二中心线设置。
在另一个实施例中，继续参阅图2，在掩膜板主体10上设置有一排子掩膜板101，当以 图2中的掩膜板主体10的左右两边中心的连线为第一中心线，上下两边中心的连线为第二中心线时，位于第二中心线同侧的子掩膜板101的遮挡部12均面向第二中心线设置。
在另一个实施例中，继续参阅图3，在掩膜板主体10上设置有一排子掩膜板101时，当以图3中的掩膜板主体10的左右两边中心的连线为第一中心线，上下两边中心的连线为第二中心线时，位于第二中心线同侧的子掩膜板101可以设置包括多个子组子掩膜板101，每子组子掩膜板101包括相邻的两个子掩膜板101，每子组子掩膜板101的两个子掩膜板101的遮挡部12相对设置。
在又一个实施例中，参阅图4，在掩膜板主体10上设置有多排子掩膜板101，当以图4中的掩膜板主体10的左右两边中心的连线为第一中心线，上下两边中心的连线为第二中心线时，且位于第二中心线同侧的子掩膜板101的遮挡部12均面向第二中心线设置。在另一个实施例中，还可以设置位于第二中心线同侧的子掩膜板101的遮挡部12均背向第二中心线设置。在另一实施例中，还可以设置每排中位于第二中心线同侧的子掩膜板101包括多个子组子掩膜板101，每个子组子掩膜板101包括相邻的两个子掩膜板101，每个子组子掩膜板101的两个子掩膜板101的遮挡部12相对设置。
参阅图5，在其他实施例中，当两组子掩膜板101的总和仍然为偶数时，两组子掩膜板101可以只相对于其中一条中心线对称设置，当以图5中的掩膜板主体10的左右两边中心的连线为第一中心线，上下两边中心的连线为第二中心线时，此时两组子掩膜板101只关于第一中心线轴对称，而关于第二中心线并非轴对称。在另一个实施例中，两组子掩膜板101也可以只关于第二中心线轴对称，而关于第一中心线并非轴对称。
在其他实施例中，子掩膜板101的数量可以选择为奇数，此时子掩膜板101只关于其中一条中心线对称，而关于另一条中心线非对称。
在另一些实施例中，还可以设置两组子掩膜板101关于第一中心线与第二中心线均不对称设置。
在本实施例中，掩膜板100还包括掩膜板框架，一个掩膜板主体10固定连接于掩膜板框架，或者多个掩膜板主体10并排排列固定连接于掩膜板框架。优选地，掩膜板100可以为通用金属掩膜板或精密金属掩膜板。
具体地，遮挡部12具有蒸镀面122与玻璃面122，蒸镀面122与玻璃面123分别位于遮挡部12相背的两侧，蒸镀面122面向蒸镀源设置，玻璃面123背向蒸镀源设置。
更具体地，凹槽121可以采用以下三种方式中的一种开设于遮挡部12：
一、凹槽121只开设于蒸镀面122；
二、凹槽121只开设于玻璃面123；
三、凹槽121同时开设于蒸镀面122与玻璃面123。
参阅图6，在其中一个实施例中，凹槽121开设于蒸镀面122，即只在蒸镀面122开设有凹槽121。
具体地，开设在蒸镀面122的凹槽121数量为一个，这个凹槽121采用整面半刻(即凹槽121的深度小于遮挡部12)的方式开设于蒸镀面122。在本实施例中，设置凹槽121覆盖蒸镀面122的全部区域，也可以设置凹槽121覆盖蒸镀面122的大部分区域，且凹槽121的横截面形状可以采用多边形，如三角形、长方形或者五边形等，还可以采用圆形或者椭圆形。当凹槽121覆盖蒸镀面122的全部区域时，凹槽121的底壁与遮挡部12的蒸镀面122的大小完全相同，此时凹槽121的底壁可以充当遮挡部12的蒸镀面。
参阅图7，在另一个实施例中，开设在蒸镀面122的凹槽121的数量为至少两个，在子掩膜板101所在平面上，每相邻两个凹槽121之间具有间距，至少两个凹槽121采用条状半刻或点状半刻的方式开设于蒸镀面122。当凹槽121采用条状半刻时，凹槽121的横截面形状为长条状；当凹槽121采用点状半刻时，凹槽121的横截面形状为圆形或椭圆形。在其他实施例中，当凹槽121采用条状半刻时，凹槽121的横截面的条形的长边沿掩膜板主体长边的方向延伸，以进一步减小掩膜板的张网褶皱。
参阅图8，在又一个实施例中，凹槽121同时开设于蒸镀面122与玻璃面123，即在蒸镀面122与玻璃面123均开设有凹槽121，进一步降低了掩膜板张网后，对掩膜板100自身的硬度的影响，进而进一步减小褶皱。如当凹槽121只开设在蒸镀面122时，蒸镀面122的硬度会小于玻璃面123的硬度，此时在一定程度上存在折断的风险，当凹槽121只开设在玻璃面123时也是如此。
具体地，凹槽121包括具有底壁的第一凹槽124与具有底壁的第二凹槽125，第一凹槽124开设于蒸镀面122，第二凹槽125开设于玻璃面123，第一凹槽124与第二凹槽125沿遮挡部12的厚度方向相互隔离的设置，即第一凹槽124的底壁与第二凹槽125的底壁之间具有间距，以保证任何一个第一凹槽124与任何一个第二凹槽125在遮挡部12的厚度方向上不存在相互连通的情况，从而避免像素蒸镀到基板上的情况发生。
具体地，第一凹槽124与第二凹槽125沿遮挡部12厚度方向的深度可以相同也可以不同，且第一凹槽124与第二凹槽125的横截面形状可以相同也可以不同。更具体地，第一凹槽124的深度大于第二凹槽125的深度，或者第一凹槽124的深度与第二凹槽125的深度相等。且第一凹槽124与第二凹槽125的深度均为掩膜板主体10的厚度的一半，或者第一凹槽124与第二凹槽125的深度均大于掩膜板主体10的厚度的一半。
继续参阅图8，在本实施例中，第一凹槽124与第二凹槽125的数量均为一个。具体地， 每个第一凹槽124朝向子掩膜板101所在平面具有第一投影，每个第二凹槽125朝向子掩膜板101所在平面具有第二投影，第一投影与第二投影至少部分重叠，第一凹槽124与第二凹槽125沿12厚度方向的深度之和小于遮挡部12的厚度。
具体地，第一凹槽124覆盖蒸镀面122的大部分区域或全部区域，第二凹槽125覆盖玻璃面123的大部分区域或全部区域，第一投影与第二投影完全重叠。可以理解的是，在其他实施例中，第一投影与第二投影也可不完全重叠，采用只有部分重叠的方式即可。
在又一个实施例中，第一凹槽124与第二凹槽125的数量均为至少两个。具体地，每个第一凹槽124朝向子掩膜板101所在平面具有第一投影，每个第二凹槽125朝向子掩膜板101所在平面具有第二投影，第一投影与第二投影至少部分重叠，第一凹槽124与第二凹槽125沿遮挡部12厚度方向的深度之和小于遮挡部12的厚度。
具体地，第一投影与第二投影完全重叠。可以理解的是，在其他实施例中，第一投影与第二投影也可不完全重叠，只采用部分重叠的方式即可。
在本实施例中，第一凹槽124与第二凹槽125的数量可以相同也可以不同，如第一凹槽124为两个，第二凹槽125的数量也为两个，或者第一凹槽124的数量为两个，第二凹槽125的数量为三个。
在又一个实施例中，第一凹槽124与第二凹槽125的数量均为一个。第一凹槽124朝向子掩膜板101所在平面具有第一投影，第二凹槽125朝向子掩膜板101所在平面具有第二投影，第一投影与第二投影交错设置，也就是说，第一投影与第二投影没有重叠区域。
可以理解的是，当第一投影与第二投影交错设置时，第一凹槽124与第二凹槽125在子掩膜板101所在的平面上相互错开，此时可以设置相邻第一凹槽124与第二凹槽125的深度之和大于遮挡部12的厚度，如此设置并不会导致遮挡部12在厚度方向上贯通的情况发生，则也不会对后续的蒸镀产生影响。
参阅图9，在又一个实施例中，第一凹槽124与第二凹槽125的数量均为至少两个，第一凹槽124朝向遮挡部12所在平面具有第一投影，第二凹槽125朝向遮挡部12所在平面具有第二投影，第一投影与第二投影相互错开，此时也可以设置相邻第一凹槽124与第二凹槽125的深度之和大于遮挡部12的厚度，如此设置并不会导致遮挡部12在厚度方向上贯通的情况发生，则也不会对后续的蒸镀产生影响。
本公开以上实施例提供的掩膜板，至少具有以下有益效果：
遮挡部12的重量与蒸镀区11的重量差距小，降低了遮挡部12的应力集中，从而使掩膜板主体10在张网过程中受力均匀，降低了掩膜板主体10在张网过程中的褶皱现象；当两组子掩膜板101关于第一中心线与第二中心线均轴对称设置时，掩膜板主体10在张网时第一中 心线与第二中心线两侧受力均匀，进一步降低了遮挡部12位置的褶皱；当凹槽121同时开设在蒸镀面122与玻璃面123时，进一步降低了掩膜板张网后，对掩膜板100自身的硬度的影响，进而进一步减小褶皱。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本公开的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对本公开的范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本公开构思的前提下，还可以做出若干变形和改进，这些都属于本公开的保护范围。因此，本公开的保护范围应以所附权利要求为准。

Claims (18)

  1. 一种掩膜板，包括：
    掩膜板主体；
    设置于所述掩膜板主体上的至少一个子掩膜板，所述子掩膜板包括蒸镀区和遮挡部，在所述子掩膜板的厚度方向上，所述遮挡部开设有至少一个凹槽，所述凹槽的深度小于所述掩膜板主体的厚度。
  2. 根据权利要求1所述的掩膜板，其中，所述遮挡部具有蒸镀面与玻璃面，所述蒸镀面面向蒸镀源设置，所述玻璃面背向蒸镀源设置，所述凹槽开设于所述蒸镀面。
  3. 根据权利要求2所述的掩膜板，其中，所述凹槽的数量为一个，所述凹槽的底壁为所述遮挡部的蒸镀面。
  4. 根据权利要求2所述的掩膜板，其中，所述凹槽的数量为至少两个，在所述子掩膜板所在平面上，每相邻两个所述凹槽之间具有间距。
  5. 根据权利要求1所述的掩膜板，其中，所述遮挡部具有蒸镀面与玻璃面，所述蒸镀面面向蒸镀源设置，所述玻璃面背向蒸镀源设置，所述凹槽开设于所述玻璃面。
  6. 根据权利要求1所述的掩膜板，其中，所述遮挡部具有蒸镀面与玻璃面，所述蒸镀面面向蒸镀源设置，所述玻璃面背向蒸镀源设置，所述至少一个凹槽包括第一凹槽与第二凹槽，所述第一凹槽开设于所述蒸镀面，所述第二凹槽开设于所述玻璃面，沿所述遮挡部的厚度方向上，所述第一凹槽的底壁与所述第二凹槽的底壁之间具有间距。
  7. 根据权利要求6所述的掩膜板，其中，在所述子掩膜板所在平面上，所述第一凹槽具有第一投影，所述第二凹槽具有第二投影，所述第一投影与所述第二投影至少部分重叠。
  8. 根据权利要求6所述的掩膜板，其中，在所述子掩膜板所在平面上，所述第一凹槽具有第一投影，所述第二凹槽具有第二投影，所述第一投影与所述第二投影无重叠区域。
  9. 根据权利要求6所述的掩膜板，其中，所述第一凹槽的深度大于或等于所述第二凹槽的深度。
  10. 根据权利要求6所述的掩膜板，其中，所述第一凹槽的与所述第二凹槽的深度均为所述掩膜板主体的厚度的一半，或者所述第一凹槽的与所述第二凹槽的深度均大于所述掩膜板主体的厚度的一半。
  11. 根据权利要求1所述的掩膜板，其中，所述凹槽的横截面形状为多边形或圆形或椭圆形。
  12. 根据权利要求1所述的掩膜板，其中，所述掩膜板主体具有第一中心线与第二中心线，所述第一中心线与所述第二中心线垂直；
    所述掩膜板主体上设置有两组所述子掩膜板，每组所述子掩膜板包括至少一个所述子掩膜板，每相邻两个所述子掩膜板之间具有间距，两组所述子掩膜板关于所述第一中心线轴对称，且两组所述子掩膜板关于所述第二中心线轴对称。
  13. 根据权利要求1所述的掩膜板，其中，所述掩膜板主体具有一中心线，所述掩膜板主体上设有一排子掩膜板，位于所述中心线同侧的子掩膜板的遮挡部均背向或面向所述中心线设置。
  14. 根据权利要求1所述的掩膜板，其中，所述掩膜板主体具有中心线，所述掩膜板主体上设有一排子掩膜板，位于所述中心线同侧的子掩膜板包括多个子组掩膜板，每个所述子组掩膜板包括相邻的两个子掩膜板，所述相邻的两个子掩膜板的遮挡部相对设置。
  15. 根据权利要求1所述的掩膜板，其中，所述掩膜板主体具有一中心线，所述掩膜板主体上设有多排子掩膜板，位于所述中心线同侧的子掩膜板的遮挡部均背向或面向所述中心线设置。
  16. 根据权利要求1所述的掩膜板，其中，所述掩膜板主体具有一中心线，所述掩膜板主体上设有多排子掩膜板，位于所述中心线同侧的子掩膜板包括多个子组掩膜板，每个所述子组掩膜板包括相邻的两个子掩膜板，所述相邻的两个子掩膜板的遮挡部相对设置。
  17. 根据权利要求1所述的掩膜板，其中，所述掩膜板主体具有第一中心线与第二中心线，所述第一中心线与所述第二中心线垂直，所述子掩膜板关于第一中心线或第二中心线对称。
  18. 根据权利要求1所述的掩膜板，其中，所述掩膜板还包括掩膜板框架，所述掩膜板主体固定连接于所述掩膜板框架。
PCT/CN2018/113113 2018-05-14 2018-10-31 掩膜板 WO2019218605A1 (zh)

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CN109943804A (zh) * 2019-03-28 2019-06-28 京东方科技集团股份有限公司 一种沉积掩膜板
CN111778475A (zh) * 2019-04-04 2020-10-16 陕西坤同半导体科技有限公司 掩膜板
CN110158026B (zh) * 2019-04-19 2021-05-11 昆山国显光电有限公司 掩膜版和掩膜版的张网方法
CN110018610A (zh) * 2019-04-25 2019-07-16 武汉天马微电子有限公司 掩模板、显示面板、显示面板的制作方法和显示装置
CN110331377B (zh) * 2019-07-24 2021-10-29 京东方科技集团股份有限公司 掩膜片及其制作方法、开口掩膜板及其使用方法、薄膜沉积设备
CN110629158B (zh) * 2019-10-31 2021-01-05 昆山国显光电有限公司 一种掩膜版
CN111549316B (zh) * 2020-06-22 2022-07-15 京东方科技集团股份有限公司 蒸镀用掩膜版

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