WO2021027794A1 - 掩膜板组件 - Google Patents
掩膜板组件 Download PDFInfo
- Publication number
- WO2021027794A1 WO2021027794A1 PCT/CN2020/108324 CN2020108324W WO2021027794A1 WO 2021027794 A1 WO2021027794 A1 WO 2021027794A1 CN 2020108324 W CN2020108324 W CN 2020108324W WO 2021027794 A1 WO2021027794 A1 WO 2021027794A1
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- WIPO (PCT)
- Prior art keywords
- mask
- frame
- group
- support
- support bars
- Prior art date
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- 230000008093 supporting effect Effects 0.000 claims description 35
- 230000002093 peripheral effect Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 13
- 230000008020 evaporation Effects 0.000 description 12
- 238000001704 evaporation Methods 0.000 description 12
- 239000000463 material Substances 0.000 description 10
- 238000000059 patterning Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
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- 230000009286 beneficial effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000007665 sagging Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Definitions
- the present disclosure relates to the field of semiconductor technology, and more particularly to a mask assembly.
- the mask assembly can be used in the manufacture of organic light emitting diode display devices, for example.
- OLED Organic Light-Emitting Diode, organic light-emitting diode
- OLED Organic Light-Emitting Diode, organic light-emitting diode
- the mainstream manufacturing process of OLED devices is to evaporate the luminescent material using a metal mask assembly, and the metal mask assembly for evaporation is assembled by fixing the mesh mask to a metal frame through a process such as mesh welding.
- a process such as mesh welding.
- a mask assembly in one aspect, includes a mesh mask, a frame, and at least one support bar.
- the frame is connected with the periphery of the mesh mask to support the mesh mask.
- the support bar has a first end and a second end, the first end is fixed to one side of the frame, the second end is fixed to the other side of the frame, and the support bar is connected to the The frame supports the mesh mask together.
- the mesh mask includes: at least one first rib extending along the first direction; and at least one second rib extending along the Extend in the second direction, the second direction and the first direction cross each other, and the at least one second rib and the at least one first rib cross each other; wherein, the orthographic projection of the support bar on the reference plane Fall into the orthographic projection of a rib corresponding to the support bar on the reference plane; the one rib is a first rib or a second rib; the reference plane is the same as the mesh mask Plane parallel to the board.
- the at least one supporting bar includes a first group of supporting bars extending along the first direction and/or a second group of supporting bars extending along the second direction, the first group of supporting bars
- Each of the support bars and the second set of support bars includes one or more support bars.
- the orthographic projection of the inner circumference of the frame on the reference plane is a rectangular shape, the rectangle has long sides and short sides; the at least one support bar includes a line parallel to the rectangle
- the first group of support bars extending in the direction of the short side or the second group of support bars extending in the direction parallel to the long side of the rectangle, the first group of supporting bars and the second group of supporting bars each include one or more supports Article.
- the first group of support bars includes a plurality of support bars symmetrically distributed with respect to the symmetry axis of the long side; or, the second group of support bars includes a symmetry axis with respect to the short side Multiple support bars symmetrically distributed.
- the orthographic projection of the inner circumference of the frame on the reference plane is a rectangular shape, the rectangle has long sides and short sides;
- the at least one support bar includes a line parallel to the rectangle
- a first group of support bars extending in the direction of the short side and a second group of support bars extending in a direction parallel to the long side of the rectangle, each of the first group of supporting bars and the second group of supporting bars includes one or more supports Article.
- the first group of support bars includes a plurality of support bars symmetrically distributed with respect to the symmetry axis of the long side; and, the second group of support bars includes a symmetry axis with respect to the short side Multiple support bars symmetrically distributed.
- the first direction is parallel to the short side of the rectangle; and/or, the second direction is parallel to the long side of the rectangle.
- the frame has at least one first accommodating groove and at least one second accommodating groove; the first ends of one or more of the support bars are arranged in a first accommodating groove, and one or more The second end of the support bar is arranged in a second containing groove.
- the depths of the first receiving groove and the second receiving groove are greater than or equal to the thickness of the support bar.
- the inner peripheral side of the frame has a mask accommodating groove; the mesh mask is fixed at the mask accommodating groove.
- the number of the mask accommodating grooves is one, and one of the mask accommodating grooves is arranged around the inner peripheral side of the frame; or, the number of the mask accommodating grooves is multiple A plurality of the mask plate receiving grooves are sequentially spaced and arranged along the inner peripheral side of the frame.
- the first receiving groove and the second receiving groove are both located on a side of the mask plate receiving groove away from the mesh mask plate.
- the supporting bar contacts and supports a rib corresponding to the supporting bar in the mesh mask.
- the thickness of the support strips in a direction perpendicular to the plane of the mesh mask is 50 ⁇ m-100 ⁇ m.
- FIG. 1 is a bottom view of the structure of a mask assembly according to some embodiments
- FIG. 2 is a bottom view of the structure of another mask assembly according to some embodiments.
- FIG. 3 is a bottom view of the structure of still another mask assembly according to some embodiments.
- Figure 4 is a cross-sectional view taken along the line A-A' in Figure 1;
- Figure 5 is a cross-sectional view of another alternative structure to the structure shown in Figure 4;
- Figure 6 is a slot for accommodating support bars in a frame according to some embodiments.
- Fig. 7 is a groove for accommodating support bars in another frame according to some embodiments.
- the evaporation process is an important process.
- an evaporation process can be used to deposit the luminescent material layer.
- a mesh mask is required to realize the patterning of the structural layer (for example, the luminescent material layer). Therefore, the accuracy of the mesh mask is very important to the accuracy of the processed product.
- the metal mask assembly for vapor deposition can be assembled by fixing the mesh mask to the frame through a process such as mesh welding. In order to maintain a better flatness of the mesh mask, it is necessary to apply a netting force to it.
- the inventors of the present disclosure have discovered through research that the meshing force received by the mesh mask will reversely act on the frame, resulting in deformation of the frame, and this deformation will affect the meshing and evaporation precision of the mesh mask.
- the deformation of the frame is closely related to the opening force of the mesh mask. If you want to reduce the frame deformation, it is inevitable to reduce the netting force of the mesh mask. However, the reduction of the netting force will increase the sag of the mesh mask, which will make the netting and evaporation quality worse. Therefore, it is necessary to find a mask assembly structure that can simultaneously improve the sagging amount of the mesh mask and the deformation of the frame.
- the mask assembly 100 includes a mesh mask 10, a frame 20 and at least one support bar 30.
- the mesh mask 10 is one of the main parts of the mask assembly 100. In the evaporation process, it is necessary to form a pattern in the structure layer based on the shape of the mesh mask 10.
- the specific shape of the mesh mask 10 can be determined according to the desired pattern formed by the mask assembly 100. For simplicity, only a simple rectangular grid structure is shown in FIG. 1, but other embodiments of the present disclosure are not limited to this.
- the frame 20 is connected to the periphery of the mesh mask 10 to support the mesh mask 10.
- the specific connection between the frame 20 and the mesh mask 10 may include fixed installation such as welding.
- the mesh mask 10 can be fixed on the frame 20 after tensioning, and the frame 20 can support the mesh mask 10 and maintain the tension state of the mesh mask 10.
- At least one of the support bars 30 may have a first end 31 and a second end 32.
- the first end 31 is fixed to an edge 21 of the frame 20, and the second end 32 is fixed to the frame 20.
- the support bar 30 can support the mesh mask 10 together with the frame 20.
- the "one side” and “the other side” of the frame 20 for fixing the first end 31 and the second end 32 of the support bar 30 respectively do not specifically refer to Some edges of the frame 20 may be any edges of the frame 20.
- the two ends of the support bar 30 can be fixed to the upper and lower sides of the frame 20, or can be fixed to the left and right of the frame 20, respectively.
- the ends of different support bars 30 can be fixed to the same side of the frame 20 or can be fixed to different sides of the frame 20.
- the extension directions of different support bars 30 may be the same or different.
- the sides of the frame 20 may be straight or curved.
- the support bars 30 can also play an auxiliary supporting role for the mesh mask 10, for example, the mesh mask 10
- the meshing force is reduced, thereby reducing the deformation of the frame 20 to improve the accuracy of patterning (for example, during the evaporation process) using the mask assembly 100, and avoiding defects such as color mixing and affecting product yield.
- the mesh mask 10 may include: at least one first rib 11 extending along a first direction (x direction as shown in FIG. 1); and along a second direction (as shown in FIG. 1) at least one second rib 12 extending in the y direction.
- the x direction and the y direction are perpendicular to each other, but the various embodiments of the present disclosure are not limited to this, as long as the second direction and the first direction cross each other. In this way, the at least one second rib 12 and the at least one first rib 11 can cross each other to form the mesh structure of the mesh mask plate 10.
- the evaporated material can be blocked by the first rib 11 and the second rib 12 but can pass through the mesh 13 between the first rib 11 and the second rib 12 to realize the evaporated material layer Patterning.
- the number of first ribs 11 in each embodiment of the present disclosure may be one or more; similarly, the number of second ribs 12 may be one or more.
- the mask assembly 100 may include one or more of the support bars 30, wherein at least one of the support bars 30 may be connected to the first rib 11 and the second rib 12 described above. A certain rib of the corresponding setting.
- the orthographic projection of the support bar 30 on the reference plane falls within the orthographic projection of a rib corresponding to the support bar 30 on the reference plane.
- a rib corresponding to the support bar 30 may be a first rib 11 or a second rib 12.
- the reference plane is a plane parallel to the mesh mask 10 (for example, the plane defined by the x direction and the y direction in FIG. 1 ).
- This arrangement can ensure that during the patterning process using the mask assembly 100, the support bar 30 will not block the mesh 13 between the first rib 11 and the second rib 12, thereby preventing the support bar 30 from affecting the mask assembly 100 The patterning accuracy.
- each support bar 30 is less than or equal to the width of the rib of the mesh mask 10 corresponding to the support bar 30. This can prevent the support bar 30 from exceeding the range of the corresponding rib of the mesh mask 10 in width, so that the support bar 30 can play a supporting role without hindering the normal operation of the mask assembly 100.
- the width of each support bar 30 may be on the order of millimeters, for example, in the range of 5 mm to 10 mm.
- the support bar 30 contacts and supports the ribs in the mesh mask 10 corresponding to the support bar 30. This can make the support bar 30 actually play a supporting role.
- the support bar 30 may have a substantially rectangular parallelepiped shape, and the orthographic projection of the support bar 30 on the reference plane has a uniform width, but the embodiment of the present disclosure is not limited to this, for example, in other implementations In an example, the width of the orthographic projection of the support bar 30 on the reference plane can also be changed to a certain extent.
- the mask assembly may only include one or more support bars extending in the same direction.
- two support bars 33, 34 are shown, and the two support bars (33, 34) both extend along the first direction (x).
- the two supporting bars (35, 36) shown both extend along the second direction (y).
- the mask assembly may include a first group of the supporting bars extending along a first direction and a second group of the supporting bars extending along a second direction.
- two supporting bars (33, 34) extending along a first direction (x) and two supporting bars extending along a second direction (y) are provided. (35, 36).
- the support bars (33, 34) extending along the first direction (x) can be seen as the first group of support bars
- the support bars (35, 36) extending along the second direction (y) can be seen Cheng is the second set of support bars mentioned above.
- the type of support bar can be selected according to factors such as the specific shape of the mesh mask 10, the size of the mesh force, and the material of the frame 20.
- two sets of support bars (such as the first set of support bars and the second set of support bars mentioned above) that cross each other are used to further increase the design flexibility of the compensation frame 20 in order to obtain better results.
- the support bars of the first group may include one or more support bars
- the support bars of the second group may include one or more support bars.
- the number of support bars is not limited, and the specific number of each group of support bars can be selected according to actual needs.
- the orthographic projection of the inner circumference of the frame 20 on the reference plane is a rectangular shape, the rectangle has a long side 24 and a short side 23, as shown in FIG. 1, the mask assembly 100 It may include a first set of the support bars (33, 34) extending in a direction parallel to the short side 23 of the frame 20; or, as shown in FIG. 2, the mask assembly 200 may include A second group of the support bars (35, 36) extending in the direction of the long side 24 of the frame.
- the orthographic projection of the inner circumference of the frame 20 on the reference plane is also a rectangular shape, the rectangle has a long side 24 and a short side 23, and the mask
- the assembly includes a first group of the support bars (33, 34) extending in a direction parallel to the short side 23 of the frame 20 and a second group of supporting bars (33, 34) extending in a direction parallel to the long side 24 of the frame.
- the orthographic projection of the inner circumference of the frame 20 on the reference plane is a rectangular structure, and the two ends of each support bar 30 are respectively fixed to two opposite sides of the frame 20 (for example, Upper and lower sides or left and right sides).
- the stability of this structure is better, and the effect of the support bar to support and compensate for frame deformation is also better.
- these support bars when there are multiple support bars extending in a direction parallel to the short side 23 of the frame 20, these support bars may be symmetrically distributed along the symmetry axis X1 of the long side 24; similarly In the case that there are multiple support bars extending in a direction parallel to the long side 24 of the frame 20, these support bars may also be distributed symmetrically along the symmetry axis Y1 of the short side 23.
- the above-mentioned first direction x is parallel to the short side 23 of the rectangle.
- This arrangement allows the support bars 30 along the short sides 23 parallel to the rectangle to be parallel to the ribs extending in the first direction x in the mesh mask 10, thereby achieving a stable support effect and improving the mask.
- the patterning accuracy of the component is parallel to the short side 23 of the rectangle.
- the aforementioned second direction y is parallel to the long side 24 of the rectangle.
- This arrangement enables the support bars 30 along the long sides 24 parallel to the rectangle to be parallel to the ribs extending in the second direction y in the mesh mask 10, so as to achieve a stable support effect and help improve the mask.
- the patterning accuracy of the component is not limited to the above-dimensionality.
- the first direction x is parallel to the short side 23 of the rectangle
- the second direction y is parallel to the long side 24 of the rectangle. It is so arranged that the support strip 30 along the long side 24 parallel to the rectangle and the rib extending in the second direction y of the mesh mask 10 can be parallel to each other, and make the long side 24 parallel to the rectangle.
- the supporting bars 30 of the mesh mask 10 can be parallel to the ribs extending in the second direction y, so that a more stable supporting effect can be achieved, and the patterning accuracy of the mask assembly can be improved.
- FIG. 4 is a cross-sectional view taken along the line A-A' in FIG. 1;
- FIG. 5 is a cross-sectional view of another alternative structure of the structure shown in FIG.
- the frame has at least one first receiving groove 27 and at least one second receiving groove 28.
- One or more first ends 31 of the support bar 30 may be disposed in a first receiving groove 27 on the frame 20, and one or more second ends 32 of the support bar 30 may be disposed in the In a second receiving groove 28 on the frame 20.
- the inner peripheral side of the frame 20 has a mask plate receiving groove 26, and the mesh mask plate 10 is fixed at the mask plate receiving groove 26.
- the mesh mask 10 is embedded in the mask accommodating groove 26 on the inner peripheral side of the frame 20.
- the number of the mask accommodating groove 26 may be one, for example, the mask accommodating groove 26 may be a groove surrounding the inner peripheral side of the frame 20, and the groove is on the side facing the upper surface 25 of the frame 20 It may be open (or it is said that the side of the mask plate receiving groove 26 away from the support bar 30 is open).
- the number of the mask accommodating grooves 26 may also be multiple.
- the plurality of mask accommodating grooves 26 may be arranged to be arranged at intervals along the inner peripheral side of the frame.
- the ends of one or more ribs in the mesh mask 10 may be arranged in a corresponding mask receiving groove 26.
- the support bar 30 may be located below the mesh mask 10.
- the first end 31 of the support bar 30 may be provided on the frame 20 and located below the mask receiving groove 26.
- the second end 32 of the support bar 30 may be disposed in the second receiving groove 28 on the frame 20 and located below the mask plate receiving groove 26.
- the first receiving groove 27 and the second receiving groove 28 are located on the same side of the mask receiving groove 26, as described in the first A receiving groove 27 and the second receiving groove 28 are both located on a side of the mask plate receiving groove 26 away from the mesh mask plate 10.
- the mesh mask 10 is fixed on the upper surface of the frame 20 (the surface of the frame 20 facing upward when the mask assembly is working) 25.
- the support bar 30 is also It can be located under the mesh mask 10, for example, the first end 31 of the support bar 30 can be received in the first receiving groove 27 on the frame 20, and the second end 32 of the support bar 30 can be received in the Said frame 20 in the second receiving groove 28.
- the mesh mask 10 since the mesh mask 10 is fixed to the upper surface 25 of the frame 20, the position of the support bar 30 can be closer to the upper surface 25 of the frame 20 compared to the example shown in FIG. 4.
- FIGS. 1 to 3 all adopt a bottom view. Due to the shielding relationship, whether the mesh mask 10 is fixed to the mask accommodating groove 26 on the inner peripheral side of the frame 20 or to the upper surface 25 of the frame 20, the bottom view shown in FIG. 1 is the same. Therefore, the bottom views corresponding to the cross-sectional views of FIGS. 4 and 5 can be regarded as FIG. 1.
- the depth of the first receiving groove 27 and the second receiving groove 28 may be greater than or equal to the thickness of the support bar 30 in a direction perpendicular to the reference plane.
- FIGS. 6 and 7 schematically show two different examples of cross-sectional views taken along the line BB' in FIG. 1 .
- Figure 6 corresponds to Figure 5
- Figure 7 corresponds to Figure 4.
- the first receiving groove 27 (or the second receiving groove 28) is located below the mask plate receiving groove 26.
- the first receiving groove 27 (or the second receiving groove 28) is located close to the upper surface 25 of the frame 20.
- the depth of the first receiving groove 27 and the second receiving groove 28 in the direction perpendicular to the reference plane is desirably consistent with the thickness of the support bar 30 in the direction perpendicular to the reference plane. This can make the support bar 30 better support the mesh mask 10.
- the above-mentioned depth of the first receiving groove 27 and the second receiving groove 28 may be slightly larger than the above-mentioned thickness of the support bar 30, for example, the first receiving groove 27 and the second receiving groove The aforementioned depth of the receiving groove 28 may be greater than the aforementioned thickness of the support bar 30 within 10 microns.
- the thickness of the support bar 30 in a direction perpendicular to the plane of the mesh mask 10 may be between 50 ⁇ m and 100 ⁇ m. With this arrangement, not only can the support bar 30 better support the mesh mask 10, but it can also avoid that the vapor deposition material is blocked by the support bar and cannot be effectively formed on the structure because the thickness of the support bar 30 is too large. Layer situation.
- the thickness of the support bar in each embodiment of the present disclosure is not limited to this, that is, according to different evaporation requirements, the support bar 30 may also have other thicknesses.
- the mesh mask 10, the frame 20, and the support bars 30 may be made of metal materials (for example, the mesh mask 10 and the support bars 30 may be made of silver, aluminum, etc.), or Made of any other material that can withstand the tension of the net.
- the mask assembly 100, 200, 300 may be used for patterning in an evaporation process, but the embodiments of the present disclosure are not limited thereto, and the mask assembly may also be used for other purposes.
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Abstract
Description
Claims (15)
- 一种掩模板组件,包括:网状掩模板;框架,所述框架与所述网状掩模板的四周相连接以支撑所述网状掩模板;以及,至少一个支撑条,所述支撑条具有第一端和第二端,所述第一端固定于所述框架的一个边部,所述第二端固定于所述框架的另一边部,所述支撑条与所述框架一起支撑所述网状掩模板。
- 根据权利要求1所述的掩模板组件,其中,所述网状掩模板包括:至少一条第一肋,所述至少一条第一肋沿着第一方向延伸;以及至少一条第二肋,所述至少一条第二肋沿着第二方向延伸,所述第二方向与所述第一方向相互交叉,所述至少一条第二肋与所述至少一条第一肋相互交叉;其中,所述支撑条在参考平面上的正投影落入到与所述支撑条对应的一条肋在所述参考平面上的正投影内;所述一条肋为一条第一肋或一条第二肋;所述参考平面为与所述网状掩膜板平行的平面。
- 根据权利要求2所述的掩模板组件,其中,所述至少一个支撑条包括沿着所述第一方向延伸的第一组支撑条和/或沿着所述第二方向延伸的第二组支撑条,第一组支撑条和第二组支撑条均包括一个或多个支撑条。
- 根据权利要求2所述的掩模板组件,其中,所述框架的内周在所述参考平面上的正投影为矩形形状,所述矩形具有长边和短边;所述至少一个支撑条包括沿着平行于所述矩形的短边的方向延伸的第一组支撑条或者沿着平行于所述矩形的长边的方向延伸的第二组支撑条,第一组支撑条和第二组支撑条均包括一个或多个支撑条。
- 根据权利要求4所述的掩模板组件,其中,所述第一组支撑条包括相对于所述长边的对称轴对称分布的多个支撑条;或者,所述第二组支撑条包括相对于所述短边的对称轴对称分布的多个支撑条。
- 根据权利要求2所述的掩模板组件,其中,所述框架的内周在所述参考平面上的正投影为矩形形状,所述矩形具有长边和短边;所述至少一个支撑条包括沿着平行于所述矩形的短边的方向延伸的第一组支撑条以及沿着平行于所述矩形的长边的方向延伸的第二组支撑条,第一 组支撑条和第二组支撑条均包括一个或多个支撑条。
- 根据权利要求6所述的掩模板组件,其中,所述第一组支撑条包括相对于所述长边的对称轴对称分布的多个支撑条;且,所述第二组支撑条包括相对于所述短边的对称轴对称分布的多个支撑条。
- 根据权利要求4~7中任一项所述的掩模板组件,其中,所述第一方向平行于所述矩形的短边;和/或,所述第二方向平行于所述矩形的长边。
- 根据权利要求1~8中任一项所述的掩模板组件,其中,所述框架具有至少一个第一容纳槽和至少一个第二容纳槽;一个或多个所述支撑条的第一端设置于一个第一容纳槽中,一个或多个所述支撑条的第二端设置于一个第二容纳槽中。
- 根据权利要求9所述的掩模板组件,其中,在垂直于所述参考平面的方向上,所述第一容纳槽和第二容纳槽的深度大于或等于所述支撑条的厚度。
- 根据权利要求9或10所述的掩模板组件,其中,所述框架内周侧具有掩模板容纳槽;所述网状掩模板固定于所述掩模板容纳槽处。
- 根据权利要求11所述的掩模板组件,其中,所述掩膜板容纳槽的数量为一个,一个所述掩膜板容纳槽环绕所述框架的内周侧设置;或者,所述掩膜板容纳槽的数量为多个,多个所述掩膜板容纳槽沿所述框架的内周侧依次间隔设置。
- 根据权利要求11或12所述的掩模板组件,其中,在垂直于所述参考平面的方向上,所述第一容纳槽和所述第二容纳槽均位于所述掩模板容纳槽的远离所述网状掩模板的一侧。
- 根据权利要求2~13中任一项所述的掩模板组件,其中,所述支撑条接触并支撑所述网状掩模板中与所述支撑条对应的一条肋。
- 根据权利要求1~14中任一项所述的掩模板组件,其中,所述支撑条在垂直于所述网状掩模板所在平面的方向上的厚度为50微米~100微米。
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