TWI678286B - 抗斷裂之分層基板及包括其之物品 - Google Patents
抗斷裂之分層基板及包括其之物品 Download PDFInfo
- Publication number
- TWI678286B TWI678286B TW103131605A TW103131605A TWI678286B TW I678286 B TWI678286 B TW I678286B TW 103131605 A TW103131605 A TW 103131605A TW 103131605 A TW103131605 A TW 103131605A TW I678286 B TWI678286 B TW I678286B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- layer
- glass
- layered
- layered substrate
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 664
- 239000011521 glass Substances 0.000 claims abstract description 200
- 239000002241 glass-ceramic Substances 0.000 claims abstract description 11
- 239000013078 crystal Substances 0.000 claims abstract description 7
- 238000012360 testing method Methods 0.000 claims description 80
- 239000000203 mixture Substances 0.000 claims description 50
- 238000007373 indentation Methods 0.000 claims description 47
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 36
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 33
- 229910052751 metal Inorganic materials 0.000 claims description 31
- 239000002184 metal Substances 0.000 claims description 31
- 238000002834 transmittance Methods 0.000 claims description 31
- 229910052783 alkali metal Inorganic materials 0.000 claims description 20
- 229910052782 aluminium Inorganic materials 0.000 claims description 19
- 150000001340 alkali metals Chemical class 0.000 claims description 18
- 239000010426 asphalt Substances 0.000 claims description 18
- 229910052710 silicon Inorganic materials 0.000 claims description 18
- 229910052796 boron Inorganic materials 0.000 claims description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 12
- 239000005354 aluminosilicate glass Substances 0.000 claims description 9
- 229910052718 tin Inorganic materials 0.000 claims description 9
- 239000005345 chemically strengthened glass Substances 0.000 claims description 8
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 229910052735 hafnium Inorganic materials 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 229910052720 vanadium Inorganic materials 0.000 claims description 5
- 229910052727 yttrium Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 239000005388 borosilicate glass Substances 0.000 claims description 4
- 239000005361 soda-lime glass Substances 0.000 claims description 3
- 230000002968 anti-fracture Effects 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 65
- 229910052594 sapphire Inorganic materials 0.000 abstract description 11
- 239000010980 sapphire Substances 0.000 abstract description 11
- 239000010410 layer Substances 0.000 description 469
- 230000035882 stress Effects 0.000 description 96
- 239000000463 material Substances 0.000 description 61
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 60
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 46
- 238000000151 deposition Methods 0.000 description 43
- 230000008021 deposition Effects 0.000 description 42
- 229910052760 oxygen Inorganic materials 0.000 description 36
- 239000006058 strengthened glass Substances 0.000 description 32
- 238000005299 abrasion Methods 0.000 description 30
- 229910052786 argon Inorganic materials 0.000 description 30
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 30
- 238000007906 compression Methods 0.000 description 30
- 239000001301 oxygen Substances 0.000 description 30
- 230000006835 compression Effects 0.000 description 29
- 238000009826 distribution Methods 0.000 description 27
- 229910017105 AlOxNy Inorganic materials 0.000 description 26
- 230000008569 process Effects 0.000 description 26
- 150000002500 ions Chemical class 0.000 description 24
- 229910052757 nitrogen Inorganic materials 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 22
- 238000005259 measurement Methods 0.000 description 20
- 239000005341 toughened glass Substances 0.000 description 20
- 238000004544 sputter deposition Methods 0.000 description 18
- 238000010884 ion-beam technique Methods 0.000 description 16
- 238000005342 ion exchange Methods 0.000 description 15
- 229910020286 SiOxNy Inorganic materials 0.000 description 14
- 239000010432 diamond Substances 0.000 description 14
- 229910003460 diamond Inorganic materials 0.000 description 14
- 230000009467 reduction Effects 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- 229910052708 sodium Inorganic materials 0.000 description 11
- 238000002310 reflectometry Methods 0.000 description 10
- 230000007547 defect Effects 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 9
- 238000000231 atomic layer deposition Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 7
- 238000007654 immersion Methods 0.000 description 7
- 239000006060 molten glass Substances 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 230000004083 survival effect Effects 0.000 description 5
- 238000010998 test method Methods 0.000 description 5
- 229910018068 Li 2 O Inorganic materials 0.000 description 4
- 229910006404 SnO 2 Inorganic materials 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000005407 aluminoborosilicate glass Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- -1 alkali metal cations Chemical class 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 239000002223 garnet Substances 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 239000004576 sand Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 238000005728 strengthening Methods 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 238000002207 thermal evaporation Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000006126 MAS system Substances 0.000 description 2
- 229910020068 MgAl Inorganic materials 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000003426 chemical strengthening reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000009863 impact test Methods 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 230000000116 mitigating effect Effects 0.000 description 2
- 238000001579 optical reflectometry Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000003678 scratch resistant effect Effects 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 229910052596 spinel Inorganic materials 0.000 description 2
- 239000011029 spinel Substances 0.000 description 2
- 238000007655 standard test method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000001429 visible spectrum Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- BXVSAYBZSGIURM-UHFFFAOYSA-N 2-phenoxy-4h-1,3,2$l^{5}-benzodioxaphosphinine 2-oxide Chemical compound O1CC2=CC=CC=C2OP1(=O)OC1=CC=CC=C1 BXVSAYBZSGIURM-UHFFFAOYSA-N 0.000 description 1
- 229910017109 AlON Inorganic materials 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- 239000006125 LAS system Substances 0.000 description 1
- 229910008556 Li2O—Al2O3—SiO2 Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- CNLWCVNCHLKFHK-UHFFFAOYSA-N aluminum;lithium;dioxido(oxo)silane Chemical compound [Li+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O CNLWCVNCHLKFHK-UHFFFAOYSA-N 0.000 description 1
- 230000003666 anti-fingerprint Effects 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 239000012237 artificial material Substances 0.000 description 1
- 238000007678 ball-on-ring test Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- WVMPCBWWBLZKPD-UHFFFAOYSA-N dilithium oxido-[oxido(oxo)silyl]oxy-oxosilane Chemical compound [Li+].[Li+].[O-][Si](=O)O[Si]([O-])=O WVMPCBWWBLZKPD-UHFFFAOYSA-N 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- SNICXCGAKADSCV-UHFFFAOYSA-N nicotine Chemical compound CN1CCCC1C1=CC=CN=C1 SNICXCGAKADSCV-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910000500 β-quartz Inorganic materials 0.000 description 1
- 229910052644 β-spodumene Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/0821—Oxynitrides of metals, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/0821—Oxynitrides of metals, boron or silicon
- C01B21/0823—Silicon oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/0821—Oxynitrides of metals, boron or silicon
- C01B21/0825—Aluminium oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/91—Coatings containing at least one layer having a composition gradient through its thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/0098—Tests specified by its name, e.g. Charpy, Brinnel, Mullen
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N3/40—Investigating hardness or rebound hardness
- G01N3/42—Investigating hardness or rebound hardness by performing impressions under a steady load by indentors, e.g. sphere, pyramid
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
- H04M1/18—Telephone sets specially adapted for use in ships, mines, or other places exposed to adverse environment
- H04M1/185—Improving the shock resistance of the housing, e.g. by increasing the rigidity
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Signal Processing (AREA)
- Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361877371P | 2013-09-13 | 2013-09-13 | |
| US61/877,371 | 2013-09-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201515850A TW201515850A (zh) | 2015-05-01 |
| TWI678286B true TWI678286B (zh) | 2019-12-01 |
Family
ID=51662304
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103131605A TWI678286B (zh) | 2013-09-13 | 2014-09-12 | 抗斷裂之分層基板及包括其之物品 |
| TW108138571A TWI740247B (zh) | 2013-09-13 | 2014-09-12 | 抗斷裂之分層基板及包括其之物品 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108138571A TWI740247B (zh) | 2013-09-13 | 2014-09-12 | 抗斷裂之分層基板及包括其之物品 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10160688B2 (https=) |
| EP (2) | EP3044177B1 (https=) |
| JP (2) | JP6371396B2 (https=) |
| KR (1) | KR102227298B1 (https=) |
| CN (2) | CN105980323A (https=) |
| TW (2) | TWI678286B (https=) |
| WO (1) | WO2015038843A1 (https=) |
Families Citing this family (64)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9359251B2 (en) | 2012-02-29 | 2016-06-07 | Corning Incorporated | Ion exchanged glasses via non-error function compressive stress profiles |
| US9110230B2 (en) | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
| US9366784B2 (en) | 2013-05-07 | 2016-06-14 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US9684097B2 (en) | 2013-05-07 | 2017-06-20 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
| US9703011B2 (en) | 2013-05-07 | 2017-07-11 | Corning Incorporated | Scratch-resistant articles with a gradient layer |
| US9359261B2 (en) | 2013-05-07 | 2016-06-07 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US11079309B2 (en) | 2013-07-26 | 2021-08-03 | Corning Incorporated | Strengthened glass articles having improved survivability |
| US9517968B2 (en) * | 2014-02-24 | 2016-12-13 | Corning Incorporated | Strengthened glass with deep depth of compression |
| US9719165B2 (en) | 2014-03-19 | 2017-08-01 | Blue Wave Semiconductors, Inc. | Method of making ceramic glass |
| CN106103370B (zh) | 2014-03-21 | 2020-05-01 | 康宁股份有限公司 | 具有图案化涂层的制品 |
| US9335444B2 (en) | 2014-05-12 | 2016-05-10 | Corning Incorporated | Durable and scratch-resistant anti-reflective articles |
| US11267973B2 (en) | 2014-05-12 | 2022-03-08 | Corning Incorporated | Durable anti-reflective articles |
| TWI697403B (zh) | 2014-06-19 | 2020-07-01 | 美商康寧公司 | 無易碎應力分布曲線的玻璃 |
| JP6212000B2 (ja) * | 2014-07-02 | 2017-10-11 | 株式会社東芝 | 圧力センサ、並びに圧力センサを用いたマイクロフォン、血圧センサ、及びタッチパネル |
| US9790593B2 (en) | 2014-08-01 | 2017-10-17 | Corning Incorporated | Scratch-resistant materials and articles including the same |
| CN108046589A (zh) | 2014-10-08 | 2018-05-18 | 康宁股份有限公司 | 包含金属氧化物浓度梯度的玻璃和玻璃陶瓷 |
| US10150698B2 (en) | 2014-10-31 | 2018-12-11 | Corning Incorporated | Strengthened glass with ultra deep depth of compression |
| WO2016073539A1 (en) | 2014-11-04 | 2016-05-12 | Corning Incorporated | Deep non-frangible stress profiles and methods of making |
| DE102015213075A1 (de) * | 2015-07-13 | 2017-01-19 | Schott Ag | Asymmetrisch aufgebaute, auf beiden Oberflächenseiten chemisch vorgespannte Dünnglasscheibe, Verfahren zu deren Herstellung sowie deren Verwendung |
| US10579106B2 (en) * | 2015-07-21 | 2020-03-03 | Corning Incorporated | Glass articles exhibiting improved fracture performance |
| US11613103B2 (en) | 2015-07-21 | 2023-03-28 | Corning Incorporated | Glass articles exhibiting improved fracture performance |
| EP3770649A1 (en) | 2015-09-14 | 2021-01-27 | Corning Incorporated | High light transmission and scratch-resistant anti-reflective articles |
| TWI762083B (zh) | 2015-09-17 | 2022-04-21 | 美商康寧公司 | 特性量測經離子交換之含鋰化學強化玻璃的方法 |
| TWI697463B (zh) | 2015-12-11 | 2020-07-01 | 美商康寧公司 | 具有金屬氧化物濃度梯度之可熔融成形的玻璃基物件 |
| CN111423110A (zh) | 2016-04-08 | 2020-07-17 | 康宁股份有限公司 | 包含金属氧化物浓度梯度的玻璃基制品 |
| KR20200091500A (ko) | 2016-04-08 | 2020-07-30 | 코닝 인코포레이티드 | 두 영역을 포함하는 응력 프로파일을 포함하는 유리-계 물품, 및 제조 방법 |
| US11453612B2 (en) * | 2016-04-20 | 2022-09-27 | Corning Incorporated | Glass-based articles including a metal oxide concentration gradient |
| CN121135134A (zh) * | 2016-05-31 | 2025-12-16 | 康宁股份有限公司 | 展现出改进的破裂性能的玻璃制品 |
| CN105948536B (zh) * | 2016-06-16 | 2019-02-26 | 深圳市东丽华科技有限公司 | 单一强化层玻璃及其制备方法 |
| JP2018034402A (ja) * | 2016-08-31 | 2018-03-08 | 凸版印刷株式会社 | 積層体 |
| US10934209B2 (en) * | 2016-10-13 | 2021-03-02 | Corning Incorporated | Glass-based articles having improved fracture performance |
| KR102505252B1 (ko) * | 2016-12-30 | 2023-03-03 | 코닝 인코포레이티드 | 잔류 압축 응력을 갖는 광학 코팅(optical coating)이 있는 코팅된 제품 |
| JP7127058B2 (ja) * | 2017-01-18 | 2022-08-29 | コーニング インコーポレイテッド | 応力プロファイルが操作された被覆ガラス系物品およびその製造方法 |
| TWI749160B (zh) * | 2017-01-31 | 2021-12-11 | 美商康寧公司 | 具有工程應力分佈的塗層玻璃基底製品及包含其之消費性電子產品 |
| JP6794866B2 (ja) * | 2017-02-15 | 2020-12-02 | Ａｇｃ株式会社 | 化学強化ガラスおよびその製造方法 |
| TWI760445B (zh) * | 2017-02-28 | 2022-04-11 | 美商康寧公司 | 抗刮膜及其製造方法 |
| TWI752199B (zh) * | 2017-03-28 | 2022-01-11 | 美商康寧公司 | 具有保留製品強度與抗刮性之硬膜及裂紋減輕複合結構的玻璃基底製品 |
| EP3606881A4 (en) * | 2017-04-04 | 2021-01-06 | Corning Incorporated | MULTI-LAYER STRUCTURE AND ITS MANUFACTURING PROCESS |
| KR20180121253A (ko) * | 2017-04-28 | 2018-11-07 | 삼성전자주식회사 | 가전기기의 외장재와 이를 포함하는 가전기기 및 그 제조방법 |
| CN109416482B (zh) * | 2017-06-15 | 2021-10-01 | 京东方科技集团股份有限公司 | 边缘场驱动液晶显示面板和确定边缘场驱动液晶显示面板中玻璃层的光轴方向的方法 |
| US20190030861A1 (en) * | 2017-07-27 | 2019-01-31 | Corning Incorporated | Composite laminate with high depth of compression |
| CN116143419A (zh) * | 2017-09-29 | 2023-05-23 | 康宁股份有限公司 | 具有硬度和强度的分级保护涂层的玻璃、玻璃陶瓷和陶瓷制品 |
| US11523527B2 (en) * | 2017-10-03 | 2022-12-06 | Corning Incorporated | Glass-based articles having crack resistant stress profiles |
| NL2020896B1 (en) | 2018-05-08 | 2019-11-14 | Corning Inc | Water-containing glass-based articles with high indentation cracking threshold |
| US10756334B2 (en) | 2017-12-22 | 2020-08-25 | Lyten, Inc. | Structured composite materials |
| CN112203795A (zh) * | 2018-05-22 | 2021-01-08 | 康宁股份有限公司 | 激光焊接经涂覆的基材 |
| EP3802451B1 (en) * | 2018-06-08 | 2024-02-14 | Corning Incorporated | Fracture resistant stress profiles in glasses |
| EP3837223A1 (en) | 2018-08-17 | 2021-06-23 | Corning Incorporated | Inorganic oxide articles with thin, durable anti-reflective structures |
| TW202026261A (zh) * | 2018-11-16 | 2020-07-16 | 美商康寧公司 | 可水蒸氣強化無鹼玻璃組成物 |
| TWI891613B (zh) | 2018-11-16 | 2025-08-01 | 美商康寧公司 | 用於透過蒸氣處理而強化之玻璃成分及方法 |
| JP2020132498A (ja) * | 2019-02-22 | 2020-08-31 | Ａｇｃ株式会社 | 防汚層付きガラス基体および防汚層付きガラス基体の製造方法 |
| WO2020231961A1 (en) | 2019-05-16 | 2020-11-19 | Corning Incorporated | Glass compositions and methods with steam treatment haze resistance |
| US12122711B2 (en) | 2019-05-16 | 2024-10-22 | Corning Incorporated | Steam strengthenable glass compositions with low phosphorous content |
| US12404204B2 (en) | 2019-05-16 | 2025-09-02 | Corning Incorporated | Glasses with modified young's modulus profile |
| WO2020247245A1 (en) * | 2019-06-05 | 2020-12-10 | Corning Incorporated | Hardened optical windows for lidar applications at 850-950nm |
| CN110627378B (zh) * | 2019-10-15 | 2022-03-22 | Oppo广东移动通信有限公司 | 玻璃及其制备方法、壳体组件和电子设备 |
| US12147009B2 (en) | 2020-07-09 | 2024-11-19 | Corning Incorporated | Textured region to reduce specular reflectance including a low refractive index substrate with higher elevated surfaces and lower elevated surfaces and a high refractive index material disposed on the lower elevated surfaces |
| US11999649B2 (en) | 2020-08-04 | 2024-06-04 | Lyten, Inc. | Methods for manufacturing or reinforcing carbon-containing glass materials |
| JP7796396B2 (ja) * | 2020-11-26 | 2026-01-09 | 国立研究開発法人産業技術総合研究所 | 複合体及びその製造方法 |
| DE102020133286A1 (de) | 2020-12-14 | 2022-06-15 | Schott Ag | Semitransparente oder transparente Verschleißschutzschicht, Substrat mit derartiger Verschleißschutzschicht und Verfahren zu deren Herstellung |
| KR20240017342A (ko) | 2021-04-01 | 2024-02-07 | 코닝 인코포레이티드 | 유지된 강도를 갖는 투명 유리-세라믹 물품 및 이를 갖는 디스플레이 장치 |
| WO2024117514A1 (ko) * | 2022-12-02 | 2024-06-06 | 삼성전자주식회사 | 세라믹 글라스 및 이를 적용한 쿡탑 |
| KR20250120370A (ko) * | 2022-12-05 | 2025-08-08 | 코닝 인코포레이티드 | 코팅 유리 제품 |
| US20260043728A1 (en) * | 2024-08-09 | 2026-02-12 | Kla Corporation | Device and method to calibrate or verify the displacement-measurement system of an instrumented indenter |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020032073A1 (en) * | 1998-02-11 | 2002-03-14 | Joseph J. Rogers | Highly durable and abrasion resistant composite diamond-like carbon decorative coatings with controllable color for metal substrates |
| US20040028906A1 (en) * | 2000-01-04 | 2004-02-12 | Anderson Jerrel Charles | Diamond-like carbon coating on glass and plastic for added hardness and abrasion resistance |
| US20060115651A1 (en) * | 2004-11-30 | 2006-06-01 | Guardian Industries Corp. | Painted glass tiles, panels and the like and method for producing painted glass tiles and panels |
| TW201226594A (en) * | 2010-12-27 | 2012-07-01 | jian-min Song | Diamond protected devices and associated methods |
| CN102807330A (zh) * | 2012-08-24 | 2012-12-05 | 福耀玻璃工业集团股份有限公司 | 一种高红外反射的低辐射镀膜玻璃及其夹层玻璃制品 |
| CN102942308A (zh) * | 2012-11-19 | 2013-02-27 | 天津市中环高科技有限公司 | 一种应用于透明材质的分层氮化硅SiNxOy成膜方法 |
Family Cites Families (110)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ZA724962B (en) | 1972-07-19 | 1973-10-31 | De Beers Ind Diamond | Improvements in indenters |
| US4310595A (en) | 1980-10-31 | 1982-01-12 | Corning Glass Works | Peraluminious nepheline/kalsilite glass-ceramics |
| US4995684A (en) | 1986-06-18 | 1991-02-26 | Raytheon Company | Impact resistant and tempered optical elements |
| JPS63238260A (ja) | 1987-03-25 | 1988-10-04 | Unitika Ltd | 熱線反射膜の形成方法 |
| US5178911A (en) | 1989-11-30 | 1993-01-12 | The President And Fellows Of Harvard College | Process for chemical vapor deposition of main group metal nitrides |
| US5268217A (en) | 1990-09-27 | 1993-12-07 | Diamonex, Incorporated | Abrasion wear resistant coated substrate product |
| US5234769A (en) | 1992-04-16 | 1993-08-10 | Deposition Sciences, Inc. | Wear resistant transparent dielectric coatings |
| US5342681A (en) | 1992-08-28 | 1994-08-30 | Texas Instruments Incorporated | Absorbing, low reflecting coating for visible and infrared light |
| EP0592986B1 (en) | 1992-10-12 | 1998-07-08 | Sumitomo Electric Industries, Limited | Ultra-thin film laminate |
| FR2697242B1 (fr) | 1992-10-22 | 1994-12-16 | Saint Gobain Vitrage Int | Vitrage trempé chimique. |
| US5557313A (en) | 1992-11-12 | 1996-09-17 | Tdk Corporation | Wear-resistant protective film for thermal head and method of producing the same |
| JP2974879B2 (ja) | 1993-04-07 | 1999-11-10 | アルプス電気株式会社 | プラズマｃｖｄによる合成方法 |
| DE4445427C2 (de) | 1994-12-20 | 1997-04-30 | Schott Glaswerke | Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht |
| FR2730990B1 (fr) | 1995-02-23 | 1997-04-04 | Saint Gobain Vitrage | Substrat transparent a revetement anti-reflets |
| FR2759362B1 (fr) | 1997-02-10 | 1999-03-12 | Saint Gobain Vitrage | Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention |
| GB9703616D0 (en) | 1997-02-21 | 1997-04-09 | Univ Paisley | Thin films |
| US6495251B1 (en) | 1997-06-20 | 2002-12-17 | Ppg Industries Ohio, Inc. | Silicon oxynitride protective coatings |
| JPH1177885A (ja) * | 1997-09-17 | 1999-03-23 | Osaka Prefecture | 表面改質プラスチック材料 |
| JPH10231147A (ja) | 1998-01-12 | 1998-09-02 | Nippon Sheet Glass Co Ltd | 透明帯電防止ガラス板 |
| EP1067407B1 (en) | 1998-02-24 | 2006-04-26 | Asahi Glass Co., Ltd. | Light absorption antireflective body and method of producing the same |
| FR2781062B1 (fr) | 1998-07-09 | 2002-07-12 | Saint Gobain Vitrage | Vitrage a proprietes optiques et/ou energetiques electrocommandables |
| JP2000113510A (ja) | 1998-10-08 | 2000-04-21 | Sony Corp | 情報記録媒体 |
| FR2784984B1 (fr) | 1998-10-22 | 2001-10-26 | Saint Gobain Vitrage | Substrat transparent muni d'un empilement de couches minces |
| DE69932594T2 (de) | 1998-11-30 | 2007-08-02 | Asahi Glass Co., Ltd. | Entspiegelungsfilm für fenster einer transportvorrichtung, glas mit entspiegelungsfilm, laminiertes glas und herstellungsverfahren |
| JP2000171601A (ja) | 1998-12-08 | 2000-06-23 | Sony Corp | 反射防止膜および表示装置 |
| JP2000171605A (ja) | 1998-12-08 | 2000-06-23 | Sony Corp | 反射防止膜および表示装置 |
| JP2001226147A (ja) * | 1998-12-28 | 2001-08-21 | Nippon Electric Glass Co Ltd | 導電性反射防止膜及びそれが被覆形成された陰極線管用ガラスパネル |
| US6303225B1 (en) | 2000-05-24 | 2001-10-16 | Guardian Industries Corporation | Hydrophilic coating including DLC on substrate |
| LU90420B1 (fr) | 1999-07-20 | 2001-01-22 | Glaverbel | Couche pyrolitique d'oxynitrure d'aluminium et vitrage comportant cette couche |
| JP4250834B2 (ja) | 1999-10-29 | 2009-04-08 | ソニー株式会社 | 触媒スパッタリングによる薄膜形成方法 |
| JP2001192821A (ja) | 2000-01-07 | 2001-07-17 | Nippon Sheet Glass Co Ltd | 被膜を基体に被覆する方法およびその方法を用いた物品 |
| EP1148037A1 (de) | 2000-04-19 | 2001-10-24 | Blösch Holding AG | Herstellungsverfahren für eine Entspiegelungsschicht auf Uhrengläsern |
| JP2001303246A (ja) | 2000-04-27 | 2001-10-31 | Nippon Sheet Glass Co Ltd | 撥水性膜の成膜方法およびその方法により得られる撥水性膜が成膜された物品 |
| DE60122837T2 (de) | 2000-07-27 | 2007-09-06 | Asahi Glass Co., Ltd. | Mit Antireflexionsfilmen ausgestattetes Substrat und dessen Herstellungsverfahren |
| JP2002174810A (ja) | 2000-12-08 | 2002-06-21 | Hoya Corp | ディスプレイ用ガラス基板及びその製造方法並びにこれを用いたディスプレイ |
| JP4795588B2 (ja) | 2001-01-12 | 2011-10-19 | 株式会社東芝 | 窒化けい素製耐摩耗性部材 |
| US6875468B2 (en) | 2001-04-06 | 2005-04-05 | Rwe Solar Gmbh | Method and device for treating and/or coating a surface of an object |
| AUPR678701A0 (en) | 2001-08-03 | 2001-08-23 | Sola International Holdings Ltd | Scratch masking coatings for optical substrates |
| JP2003131011A (ja) | 2001-10-29 | 2003-05-08 | Nippon Electric Glass Co Ltd | 多層膜およびそれを用いた多層膜付き基体 |
| US6783253B2 (en) | 2002-03-21 | 2004-08-31 | Guardian Industries Corp. | First surface mirror with DLC coating |
| EP1362834A1 (fr) * | 2002-05-06 | 2003-11-19 | Glaverbel | Substrat transparent comportant une couche conductrice |
| US20050233091A1 (en) | 2002-05-08 | 2005-10-20 | Devendra Kumar | Plasma-assisted coating |
| FR2841894B1 (fr) | 2002-07-03 | 2006-03-10 | Saint Gobain | Substrat transparent comportant un revetement antireflet |
| US7015640B2 (en) | 2002-09-11 | 2006-03-21 | General Electric Company | Diffusion barrier coatings having graded compositions and devices incorporating the same |
| US6685637B1 (en) | 2002-10-11 | 2004-02-03 | Koninklijke Philips Electronics N.V. | Ultrasonic diagnostic imaging system with multiple language user interface |
| DK1594812T3 (da) | 2003-02-14 | 2008-07-28 | Agc Flat Glass Europe Sa | Vinduespanel, der bærer en coatingstabel |
| US20050037240A1 (en) | 2003-03-31 | 2005-02-17 | Daisaku Haoto | Protective coat and method for manufacturing thereof |
| FR2856627B1 (fr) * | 2003-06-26 | 2006-08-11 | Saint Gobain | Substrat transparent muni d'un revetement avec proprietes de resistance mecanique |
| DE10342398B4 (de) | 2003-09-13 | 2008-05-29 | Schott Ag | Schutzschicht für einen Körper sowie Verfahren zur Herstellung und Verwendung von Schutzschichten |
| DE10342397B4 (de) | 2003-09-13 | 2008-04-03 | Schott Ag | Transparente Schutzschicht für einen Körper und deren Verwendung |
| US7727917B2 (en) | 2003-10-24 | 2010-06-01 | Schott Ag | Lithia-alumina-silica containing glass compositions and glasses suitable for chemical tempering and articles made using the chemically tempered glass |
| FR2861853B1 (fr) | 2003-10-30 | 2006-02-24 | Soitec Silicon On Insulator | Substrat avec adaptation d'indice |
| JP2005274527A (ja) | 2004-03-26 | 2005-10-06 | Cimeo Precision Co Ltd | 時計用カバーガラス |
| JP4707656B2 (ja) | 2004-03-29 | 2011-06-22 | Ｈｏｙａ株式会社 | 反射防止膜を有する光学部材 |
| FR2869606B1 (fr) * | 2004-04-28 | 2007-02-23 | Saint Gobain | Vitrage muni d'un empilement de couches minces agissant sur le rayonnement solaire |
| KR20070083557A (ko) | 2004-09-23 | 2007-08-24 | 엘리먼트 씩스 (프티) 리미티드 | 다결정 연마 물질 및 그 제조방법 |
| EP1705162A1 (en) | 2005-03-23 | 2006-09-27 | EMPA Eidgenössische Materialprüfungs- und Forschungsanstalt | Coated substrate and process for the manufacture of a coated substrate |
| FR2889202B1 (fr) | 2005-08-01 | 2007-09-14 | Saint Gobain | Procede de depot d'une couche anti-rayure |
| US20070030569A1 (en) | 2005-08-04 | 2007-02-08 | Guardian Industries Corp. | Broad band antireflection coating and method of making same |
| DE102005040266A1 (de) | 2005-08-24 | 2007-03-01 | Schott Ag | Verfahren und Vorrichtung zur innenseitigen Plasmabehandlung von Hohlkörpern |
| US8304078B2 (en) | 2005-09-12 | 2012-11-06 | Saxon Glass Technologies, Inc. | Chemically strengthened lithium aluminosilicate glass having high strength effective to resist fracture upon flexing |
| JP4765069B2 (ja) | 2005-09-26 | 2011-09-07 | 国立大学法人東北大学 | 窒化物コーティング法 |
| JP2007099557A (ja) | 2005-10-04 | 2007-04-19 | Nippon Electric Glass Co Ltd | 強化ガラス物品およびその製造方法 |
| JP4790396B2 (ja) | 2005-12-02 | 2011-10-12 | 学校法人東京理科大学 | 透明膜の製造方法 |
| FR2895522B1 (fr) | 2005-12-23 | 2008-04-11 | Saint Gobain | Substrat transparent comportant un revetement antireflet |
| FR2898295B1 (fr) | 2006-03-10 | 2013-08-09 | Saint Gobain | Substrat transparent antireflet presentant une couleur neutre en reflexion |
| DE102007033338B4 (de) | 2007-07-16 | 2010-06-02 | Schott Ag | Hartstoffbeschichteter Glas- oder Glaskeramik-Artikel und Verfahren zu dessen Herstellung sowie Verwendung des Glas- oder Glaskeramik-Artikels |
| JP5467490B2 (ja) | 2007-08-03 | 2014-04-09 | 日本電気硝子株式会社 | 強化ガラス基板の製造方法及び強化ガラス基板 |
| WO2009041528A1 (ja) * | 2007-09-26 | 2009-04-02 | Citizen Holdings Co., Ltd. | 時計用カバーガラス |
| CN101689376B (zh) | 2007-09-28 | 2012-07-11 | Hoya株式会社 | 磁盘用玻璃基板及其制造方法、磁盘 |
| JP2009116218A (ja) | 2007-11-09 | 2009-05-28 | Seiko Epson Corp | 反射防止膜、反射防止膜の形成方法、及び透光部材 |
| JP2011510903A (ja) * | 2008-02-08 | 2011-04-07 | コーニング インコーポレイテッド | 損傷耐性の化学強化された保護カバーガラス |
| JP2009265601A (ja) | 2008-03-31 | 2009-11-12 | Kyocera Corp | 多芯フェルールおよび多芯フェルールの製造方法 |
| WO2009131206A1 (ja) | 2008-04-24 | 2009-10-29 | 旭硝子株式会社 | 低反射ガラスおよびディスプレイ用保護板 |
| JP5444846B2 (ja) | 2008-05-30 | 2014-03-19 | 旭硝子株式会社 | ディスプレイ装置用ガラス板 |
| JP2011527661A (ja) | 2008-07-11 | 2011-11-04 | コーニング インコーポレイテッド | 民生用途のための圧縮面を有するガラス |
| US8187671B2 (en) | 2008-07-28 | 2012-05-29 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) | Method of making heat treated coated article using diamond-like carbon (DLC) coating and protective film including removal of protective film via blasting |
| WO2010014163A1 (en) | 2008-07-29 | 2010-02-04 | Corning Incorporated | Dual stage ion exchange for chemical strengthening of glass |
| KR20110050522A (ko) | 2008-08-21 | 2011-05-13 | 코닝 인코포레이티드 | 전자 장치용 내구성 유리 하우징/인클로저 |
| DE102008054139B4 (de) | 2008-10-31 | 2010-11-11 | Schott Ag | Glas- oder Glaskeramik-Substrat mit Kratzschutzbeschichtung, dessen Verwendung und Verfahren zu dessen Herstellung |
| US8341976B2 (en) | 2009-02-19 | 2013-01-01 | Corning Incorporated | Method of separating strengthened glass |
| JP5448064B2 (ja) | 2009-10-28 | 2014-03-19 | 日本電気硝子株式会社 | 強化板ガラス及びその製造方法 |
| WO2011065293A1 (ja) | 2009-11-25 | 2011-06-03 | 旭硝子株式会社 | ディスプレイカバーガラス用ガラス基板及びその製造方法 |
| US20110129648A1 (en) | 2009-11-30 | 2011-06-02 | Yabei Gu | Glass sheet article with double-tapered asymmetric edge |
| JP5589379B2 (ja) | 2009-12-25 | 2014-09-17 | 旭硝子株式会社 | ディスプレイカバーガラス用ガラス基板の製造方法 |
| KR101103041B1 (ko) | 2009-12-30 | 2012-01-05 | 미래나노텍(주) | 반사 방지 필름 및 그 제조방법 |
| DE102010009584B4 (de) | 2010-02-26 | 2015-01-08 | Schott Ag | Chemisch vorgespanntes Glas, Verfahren zu seiner Herstellung sowie Verwendung desselben |
| JP2010202514A (ja) | 2010-06-10 | 2010-09-16 | Hoya Corp | 携帯型液晶ディスプレイ用のガラス基板及びその製造方法並びにこれを用いた携帯型液晶ディスプレイ |
| JP5636837B2 (ja) | 2010-09-16 | 2014-12-10 | 凸版印刷株式会社 | 太陽電池バックシート |
| JP5255611B2 (ja) | 2010-09-17 | 2013-08-07 | Ｈｏｙａ株式会社 | ディスプレイ用ガラス基板及びその製造方法並びにこれを用いたディスプレイ |
| US8796165B2 (en) | 2010-11-30 | 2014-08-05 | Corning Incorporated | Alkaline earth alumino-borosilicate crack resistant glass |
| JP2012214356A (ja) * | 2010-12-29 | 2012-11-08 | Avanstrate Inc | カバーガラス及びその製造方法 |
| US8434951B2 (en) | 2011-01-10 | 2013-05-07 | Apple Inc. | Systems and methods for coupling a cover to an enclosure |
| EP2492251B1 (de) | 2011-02-23 | 2017-01-04 | Schott Ag | Substrat mit Antireflexionsbeschichtung und Verahren zu dessen Herstellung |
| US20120280373A1 (en) * | 2011-05-06 | 2012-11-08 | Jiangwei Feng | Active electronics on strengthened glass with alkali barrier |
| US20120327568A1 (en) | 2011-06-24 | 2012-12-27 | Anna-Katrina Shedletsky | Thin Film Coatings for Glass Members |
| DE102011081234A1 (de) | 2011-08-19 | 2013-02-21 | Schott Ag | Glaskeramik, die wenigstens teilweise mit einer Hartstoffschicht versehen ist |
| DE102011114669B3 (de) * | 2011-09-30 | 2012-10-18 | Arcon Flachglas-Veredlung Gmbh & Co. Kg | Schichtsystem für Sonnenschutzglas, Sonnenschutzglas und Verfahren zur Herstellung von Sonnenschutzglas |
| US20130127202A1 (en) | 2011-11-23 | 2013-05-23 | Shandon Dee Hart | Strengthened Glass and Glass Laminates Having Asymmetric Impact Resistance |
| KR20150040367A (ko) | 2011-12-16 | 2015-04-14 | 아사히 가라스 가부시키가이샤 | 디스플레이용 커버 유리, 디스플레이용 커버 유리의 제조 방법 |
| US9785299B2 (en) | 2012-01-03 | 2017-10-10 | Synaptics Incorporated | Structures and manufacturing methods for glass covered electronic devices |
| JP5110723B1 (ja) | 2012-03-28 | 2012-12-26 | 倉一 小川 | 透明断熱シート |
| WO2013160233A1 (en) | 2012-04-24 | 2013-10-31 | Empa Eidgenössische Materialprüfungs- Und Forschungsanstalt | Scratch resistant coating structure and use as optical filter or uv-blocking filter |
| EP2903823B1 (en) | 2012-10-03 | 2021-09-22 | Corning Incorporated | Surface-modified glass substrate |
| KR101949561B1 (ko) | 2012-10-12 | 2019-02-18 | 코닝 인코포레이티드 | 잔류 강도를 갖는 제품 |
| JP5307926B2 (ja) | 2012-10-22 | 2013-10-02 | 三菱樹脂株式会社 | 液晶表示装置 |
| US9623628B2 (en) * | 2013-01-10 | 2017-04-18 | Apple Inc. | Sapphire component with residual compressive stress |
| TWI637926B (zh) | 2013-02-08 | 2018-10-11 | 康寧公司 | 具抗反射與高硬度塗層之物品及其相關方法 |
| DE102013102221B4 (de) | 2013-03-06 | 2014-11-13 | Schott Ag | Kratzfester Glasgegenstand und Verfahren zur Herstellung kratzfester Oberflächen von Glasgegenständen |
| US9110230B2 (en) * | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
-
2014
- 2014-09-10 US US14/482,250 patent/US10160688B2/en active Active
- 2014-09-12 JP JP2016542805A patent/JP6371396B2/ja active Active
- 2014-09-12 CN CN201480062442.7A patent/CN105980323A/zh active Pending
- 2014-09-12 TW TW103131605A patent/TWI678286B/zh active
- 2014-09-12 TW TW108138571A patent/TWI740247B/zh active
- 2014-09-12 EP EP14781339.8A patent/EP3044177B1/en active Active
- 2014-09-12 CN CN202210005485.8A patent/CN114195402A/zh active Pending
- 2014-09-12 WO PCT/US2014/055295 patent/WO2015038843A1/en not_active Ceased
- 2014-09-12 KR KR1020167009765A patent/KR102227298B1/ko active Active
- 2014-09-12 EP EP23184889.6A patent/EP4246949A3/en active Pending
-
2018
- 2018-07-12 JP JP2018132166A patent/JP6815356B2/ja active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020032073A1 (en) * | 1998-02-11 | 2002-03-14 | Joseph J. Rogers | Highly durable and abrasion resistant composite diamond-like carbon decorative coatings with controllable color for metal substrates |
| US20040028906A1 (en) * | 2000-01-04 | 2004-02-12 | Anderson Jerrel Charles | Diamond-like carbon coating on glass and plastic for added hardness and abrasion resistance |
| US20060115651A1 (en) * | 2004-11-30 | 2006-06-01 | Guardian Industries Corp. | Painted glass tiles, panels and the like and method for producing painted glass tiles and panels |
| TW201226594A (en) * | 2010-12-27 | 2012-07-01 | jian-min Song | Diamond protected devices and associated methods |
| CN102807330A (zh) * | 2012-08-24 | 2012-12-05 | 福耀玻璃工业集团股份有限公司 | 一种高红外反射的低辐射镀膜玻璃及其夹层玻璃制品 |
| CN102942308A (zh) * | 2012-11-19 | 2013-02-27 | 天津市中环高科技有限公司 | 一种应用于透明材质的分层氮化硅SiNxOy成膜方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201515850A (zh) | 2015-05-01 |
| WO2015038843A1 (en) | 2015-03-19 |
| JP6815356B2 (ja) | 2021-01-20 |
| JP2016533316A (ja) | 2016-10-27 |
| EP4246949A2 (en) | 2023-09-20 |
| EP3044177B1 (en) | 2023-08-23 |
| KR102227298B1 (ko) | 2021-03-15 |
| US20150079398A1 (en) | 2015-03-19 |
| JP6371396B2 (ja) | 2018-08-08 |
| JP2018172278A (ja) | 2018-11-08 |
| EP3044177A1 (en) | 2016-07-20 |
| EP4246949A3 (en) | 2023-11-08 |
| TWI740247B (zh) | 2021-09-21 |
| CN105980323A (zh) | 2016-09-28 |
| KR20160056924A (ko) | 2016-05-20 |
| TW202026146A (zh) | 2020-07-16 |
| US10160688B2 (en) | 2018-12-25 |
| CN114195402A (zh) | 2022-03-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI678286B (zh) | 抗斷裂之分層基板及包括其之物品 | |
| TWI533017B (zh) | 具有保持光學性質之抗刮物件 | |
| TWI601970B (zh) | 耐久防刮之抗反射物件 | |
| CN110914212B (zh) | 用于保持制品强度和耐刮擦性的具有硬膜和裂纹减缓复合结构的基于玻璃的制品 | |
| TWI615368B (zh) | 具有低彈性模數層及保持強度之物件 | |
| TWI529407B (zh) | 具有多層光學薄膜之低色抗刮物件 | |
| TWI654152B (zh) | 具圖案化塗層的製品 | |
| KR102675982B1 (ko) | 감소된 스크래치 및 지문 가시성을 갖는 저 명암의 반사-방지 제품 | |
| US20190039946A1 (en) | Glass-film laminates with controlled failure strength | |
| CN116444170A (zh) | 光学涂层具有残留压缩应力的经涂覆的制品 | |
| CN105705473A (zh) | 具有聚合物耐划痕层的层叠体 | |
| CN110621628A (zh) | 硬涂覆的玻璃陶瓷制品 | |
| CN117836674A (zh) | 具有带延伸红外透射的薄、耐久性抗反射涂层的制品 | |
| CN120603794A (zh) | 经涂布的玻璃制品 |