JP2016533316A - 耐破壊性を有する多層基体、および耐破壊性を有する多層基体を含む物品 - Google Patents
耐破壊性を有する多層基体、および耐破壊性を有する多層基体を含む物品 Download PDFInfo
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- JP2016533316A JP2016533316A JP2016542805A JP2016542805A JP2016533316A JP 2016533316 A JP2016533316 A JP 2016533316A JP 2016542805 A JP2016542805 A JP 2016542805A JP 2016542805 A JP2016542805 A JP 2016542805A JP 2016533316 A JP2016533316 A JP 2016533316A
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Images
Classifications
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- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
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- C01B21/00—Nitrogen; Compounds thereof
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- C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
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- C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
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- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
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- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
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- C01B21/0823—Silicon oxynitrides
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
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- C01B21/0825—Aluminium oxynitrides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
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- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
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Abstract
Description
本明細書に別様で記載されたように、基体100は、物品および/または装置において、ハウジング基体またはカバー基体として用いられ得る(例えば、ディスプレイ)。ディスプレイにおいて用いられる場合には、基体100はタッチモジュールの一部を構成し得る。物品および/または装置においてハウジング基体として用いられる基体100は、ハウジングの側面、後面、および/または前面の少なくとも一部を構成し得る。
CT=(CS・DOL)/(t−2DOL)…(1)
式中、tは、ガラス物品の厚さであり、マイクロメートル(μm)で表される。本開示の様々なセクションにおいて、中心張力CTおよび圧縮応力CSは、本明細書においてはメガパスカル(MPa)で表され、厚さtはマイクロメートル(μm)またはミリメートル(mm)で表され、層の深さDOLはマイクロメートル(μm)で表される。DOCが用いられる場合には、これもマイクロメートル(μm)で表され得る。
CS(da)≒CSs−da(ma’)…(7)
一部の実施形態では、深さdaは約3μm〜約8μmの範囲内(即ち、3μm≦da≦8μm)である。別の実施形態では3μm≦da≦10μmである。更に他の実施形態では3μm≦da≦12μmである。
本明細書に記載される層200の実施形態は、基体100および/または多層基体10に、耐スクラッチ性、耐破壊性、または耐損傷性を付与するために用いられ得る。任意に、層200は、基体100および/または多層基体10の光学特性を改善するために用いられ得る。層200のこれらの属性は、組み合わせて用いられ得る。従って、層200は、本明細書においては“耐スクラッチ”層、“耐破壊”層、またはより一般的に“耐損傷”層と称され得る。層200は連続層または不連続層であり得る。
1以上の実施形態において、多層基体10は、バーコビッチ圧子硬さ試験によって、約50nm以上または約100nm以上(例えば、約100nm〜約300nm、約100nm〜約400nm、約100nm〜約500nm、約100nm〜約600nm、約200nm〜約300nm、約200nm〜約400nm、約200nm〜約500nm、または約200nm〜約600nm)の押し込み深さに沿って測定された、約8GPaより高い硬さを有する。1以上の実施形態では、多層基体10は、上記の押し込み深さに沿って、約16GPa以上、約17GPa以上、約18GPa以上、約19GPa以上、約20GPa以上、約22GPa以上の硬さを有する。1以上の特定の実施形態では、多層基体10は、バーコビッチ圧子硬さ試験によって、約50nm以上または約100nm以上(例えば、約100nm〜約300nm、約100nm〜約400nm、約100nm〜約500nm、約100nm〜約600nm、約200nm〜約300nm、約200nm〜約400nm、約200nm〜約500nm、または約200nm〜約600nm)の押し込み深さに沿って測定された、約15GPa〜約25GPa、約16GPa〜約25GPa、約18GPa〜約25GPa、約20GPa〜約25GPa、約22GPa〜約25GPa、約23GPa〜約25GPaの範囲内、並びに、それらの間の全範囲および部分的な範囲内の測定された硬さを示し得る。幾つかの事例では、多層基体10の硬さは、層200の存在に起因して、下にある基体100の硬さより高い。
表1に示されるように、実施例AおよびB、並びに比較例CおよびDを調製した。実施例Aに従って、1mmの厚さと、110mmの長さと、56mmの幅とを各々が有する5個の強化されたガラス基体を設けることにより、5個のサンプルを作製した。このガラス基体はアルミノボロシリケートガラスを含み、このアルミノボロシリケートガラスは、少なくとも約50モル%のSiO2、約12モル%〜約22モル%のAl2O3、約4.5モル%〜約10モル%のB2O3、約10モル%〜約20モル%のNa2O、0モル%〜約5モル%のK2O、少なくとも約0.1モル%のMgO、ZnO、またはそれらの組合せを含み、0モル%≦MgO≦6および0≦ZnO≦6モル%である組成を有した。約350℃〜450℃の温度範囲内に加熱された溶融硝酸カリウム(KNO3)槽にガラス基体を3〜8時間にわたって浸漬するイオン交換プロセスを用いて、これらのガラス基体を、少なくとも約700MPaのCSおよび少なくとも約40μmのDOLを示すよう強化した。DCマグネトロンシステムを用いたイオンアシストDCスパッタリング法によって、各ガラス基体の片側にSi3N4層を堆積させた。この層は、約0.5mTorrの圧力で、約109.6℃の温度で、約60sccmの流量で流されたアルゴンの存在下で、2.1kWのDC電力を供給して、ターゲットからスパッタリングされた。イオンビームは、0.2kWの電力で、100sccmの窒素を用いて発生させた。実施例Aのサンプル上に得られたSi3N4層は、約2μmの厚さを有した。
実施例Eを9個のサンプルとして調製し、そのうち8個を、以下に示すように、バークレー社(Berkeley)の砂およびSiC粒子を用いて摩耗させた。1mmの厚さと、50mmの長さと、50mmの幅とを各々が有する9個の強化されたガラス基体を設けることにより、これらの9個のサンプルを調製した。用いられたガラス基体は、実施例1と同じ組成を有し、実施例1のガラス基体と同様の方法で強化され、同じCSおよびDOLを示した。DCマグネトロンシステムを用いたDCスパッタリングプロセスによって、各ガラス基体の片側にSi3N4層を形成した。この層は、約6.9×10−4Torrの圧力で、約75sccmの流量で流されたアルゴンの存在下で、4kWのDC電力を供給して、ターゲットからスパッタリングされた。イオンビームは、0.310kWの電力で、115sccmで流された窒素の存在下で発生させた。堆積速度は1.4Å/秒であり、合計堆積時間は230分とした。得られたSi3N4層は約2μmの厚さを有した。
本明細書において開示される多層基体の改善された耐スクラッチ性を、むき出しの基体と比較してより浅いスクラッチ深さおよびより狭いスクラッチ幅を示すことに関して示すために、実施例Fおよび比較例Gのそれぞれにつき3個のサンプルを調製した。
本明細書において開示される多層基体の改善された耐スクラッチ性を、むき出しの基体と比較してより浅いスクラッチ深さおよびより狭いスクラッチ幅を示すことに関して示すために、実施例Hおよび比較例Iに従った4個のサンプルを調製した。
本明細書において開示される多層基体の改善された機械的特性(例えば、スクラッチ深さ減少)および関連付けられた光学特性(例えば、無色の透過色および/または反射色)を示すために、実施例JおよびKを調製した。結果を表5および表6に示す。
携帯電話に組み付けた際の様々な基体および多層基体の耐破壊性を決定するために、143個のサンプルの携帯電話を調製した。表7は、各サンプルの属性を記載している。
Claims (10)
- 外側に面した表面を含む基体と、
前記外側に面した表面の上に配設された、AlOxNyを含む層と、
前記層の上または前記層と前記基体との間に配設された、SiO2およびAl2O3のうち一方を含む付加層と、
を備えた多層基体であって、
前記多層基体が、バーコビッチ圧子硬度試験によって、約100nm以上の押し込み深さに沿って測定された、少なくとも約12GPaの硬さを示し、
装置に組み付けられた前記多層基体は、前記装置を少なくとも100cmの高さから落下面上に落下させた際に、破壊に耐えることができる
ことを特徴とする多層基体。 - 前記基体が、非晶質の基体または結晶質の基体から選択された透明または不透明の基体を含む、請求項1記載の多層基体。
- 前記基体が、前記両側にある主表面のうち1以上の表面において、0.5%以上の平均破断ひずみを示す、請求項1または2記載の多層基体。
- 前記非晶質の基体が、ソーダ石灰ガラス、アルカリアルミノシリケートガラス、アルカリ含有ボロシリケートガラス、およびアルカリアルミノボロシリケートガラスからなる群から選択されたガラスを含む、請求項2または3記載の多層基体。
- 前記ガラスが化学的に強化されており、前記化学的に強化されたガラスの表面から、少なくとも10μmの層の深さ(DOL)まで、前記化学的に強化されたガラスの内部に延在する少なくとも250MPaの圧縮応力(CS)を有する圧縮応力(CS)層を含む、請求項4記載の多層基体。
- 前記層が、バーコビッチ圧子硬さ試験によって、約100nm以上の押し込み深さに沿って測定された、少なくとも約20GPaの硬さを示す、請求項1〜5のいずれか一項記載の多層基体。
- 前記層が、少なくとも約500nmの厚さを有する、請求項1〜6のいずれか一項記載の多層基体。
- 前記層が、金属酸化物、金属窒化物、金属酸窒化物、金属炭化物、金属ホウ化物、ダイヤモンドライクカーボン、またはそれらの組合せを含み、前記金属がB、Al、Si、Ti、V、Cr、Y、Zr、Nb、Mo、Sn、Hf、Ta、およびWからなる群から選択される、請求項1〜7のいずれか一項記載の多層基体。
- 前記多層基体が、少なくとも約85%、または約10%未満の透過率を示す、請求項1〜8のいずれか一項記載の多層基体。
- 前記SiO2およびAl2O3のうち他方を含む第2の付加層を更に備えた、請求項1〜9のいずれか一項記載の多層基体。
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018034402A (ja) * | 2016-08-31 | 2018-03-08 | 凸版印刷株式会社 | 積層体 |
KR20190104605A (ko) * | 2017-01-18 | 2019-09-10 | 코닝 인코포레이티드 | 공학적 응력 프로파일을 갖는 코팅된 유리-계 제품 및 그 제조방법 |
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Publication number | Priority date | Publication date | Assignee | Title |
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KR20210068158A (ko) | 2016-04-08 | 2021-06-08 | 코닝 인코포레이티드 | 금속 산화물 농도 구배를 포함하는 유리-계 제품 |
US11453612B2 (en) * | 2016-04-20 | 2022-09-27 | Corning Incorporated | Glass-based articles including a metal oxide concentration gradient |
CN112299707A (zh) * | 2016-05-31 | 2021-02-02 | 康宁股份有限公司 | 展现出改进的破裂性能的玻璃制品 |
CN105948536B (zh) * | 2016-06-16 | 2019-02-26 | 深圳市东丽华科技有限公司 | 单一强化层玻璃及其制备方法 |
US10934209B2 (en) * | 2016-10-13 | 2021-03-02 | Corning Incorporated | Glass-based articles having improved fracture performance |
EP3562793A1 (en) * | 2016-12-30 | 2019-11-06 | Corning Incorporated | Coated articles with optical coatings having residual compressive stress |
JP6794866B2 (ja) * | 2017-02-15 | 2020-12-02 | Agc株式会社 | 化学強化ガラスおよびその製造方法 |
TWI752199B (zh) * | 2017-03-28 | 2022-01-11 | 美商康寧公司 | 具有保留製品強度與抗刮性之硬膜及裂紋減輕複合結構的玻璃基底製品 |
KR20180121253A (ko) * | 2017-04-28 | 2018-11-07 | 삼성전자주식회사 | 가전기기의 외장재와 이를 포함하는 가전기기 및 그 제조방법 |
CN109416482B (zh) * | 2017-06-15 | 2021-10-01 | 京东方科技集团股份有限公司 | 边缘场驱动液晶显示面板和确定边缘场驱动液晶显示面板中玻璃层的光轴方向的方法 |
US20190030861A1 (en) * | 2017-07-27 | 2019-01-31 | Corning Incorporated | Composite laminate with high depth of compression |
CN116143419A (zh) * | 2017-09-29 | 2023-05-23 | 康宁股份有限公司 | 具有硬度和强度的分级保护涂层的玻璃、玻璃陶瓷和陶瓷制品 |
US11523527B2 (en) * | 2017-10-03 | 2022-12-06 | Corning Incorporated | Glass-based articles having crack resistant stress profiles |
NL2020896B1 (en) | 2018-05-08 | 2019-11-14 | Corning Inc | Water-containing glass-based articles with high indentation cracking threshold |
US10756334B2 (en) | 2017-12-22 | 2020-08-25 | Lyten, Inc. | Structured composite materials |
CN112203795A (zh) * | 2018-05-22 | 2021-01-08 | 康宁股份有限公司 | 激光焊接经涂覆的基材 |
WO2020037042A1 (en) | 2018-08-17 | 2020-02-20 | Corning Incorporated | Inorganic oxide articles with thin, durable anti-reflective structures |
TW202026257A (zh) | 2018-11-16 | 2020-07-16 | 美商康寧公司 | 用於透過蒸氣處理而強化之玻璃成分及方法 |
TW202026261A (zh) * | 2018-11-16 | 2020-07-16 | 美商康寧公司 | 可水蒸氣強化無鹼玻璃組成物 |
CN117361875A (zh) | 2019-05-16 | 2024-01-09 | 康宁股份有限公司 | 具有蒸汽处理雾度抗性的玻璃组合物及其方法 |
CN110627378B (zh) * | 2019-10-15 | 2022-03-22 | Oppo广东移动通信有限公司 | 玻璃及其制备方法、壳体组件和电子设备 |
US11999649B2 (en) | 2020-08-04 | 2024-06-04 | Lyten, Inc. | Methods for manufacturing or reinforcing carbon-containing glass materials |
JP2024513421A (ja) | 2021-04-01 | 2024-03-25 | コーニング インコーポレイテッド | 残留強度を示す透明ガラスセラミック製品およびそれが設けられた表示装置 |
WO2024117514A1 (ko) * | 2022-12-02 | 2024-06-06 | 삼성전자주식회사 | 세라믹 글라스 및 이를 적용한 쿡탑 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10231147A (ja) * | 1998-01-12 | 1998-09-02 | Nippon Sheet Glass Co Ltd | 透明帯電防止ガラス板 |
JP2000113510A (ja) * | 1998-10-08 | 2000-04-21 | Sony Corp | 情報記録媒体 |
US20020032073A1 (en) * | 1998-02-11 | 2002-03-14 | Joseph J. Rogers | Highly durable and abrasion resistant composite diamond-like carbon decorative coatings with controllable color for metal substrates |
US20040028906A1 (en) * | 2000-01-04 | 2004-02-12 | Anderson Jerrel Charles | Diamond-like carbon coating on glass and plastic for added hardness and abrasion resistance |
US20060115651A1 (en) * | 2004-11-30 | 2006-06-01 | Guardian Industries Corp. | Painted glass tiles, panels and the like and method for producing painted glass tiles and panels |
WO2009041528A1 (ja) * | 2007-09-26 | 2009-04-02 | Citizen Holdings Co., Ltd. | 時計用カバーガラス |
JP2012064765A (ja) * | 2010-09-16 | 2012-03-29 | Toppan Printing Co Ltd | 太陽電池バックシート |
JP5110723B1 (ja) * | 2012-03-28 | 2012-12-26 | 倉一 小川 | 透明断熱シート |
JP2016517381A (ja) * | 2013-03-06 | 2016-06-16 | ショット アクチエンゲゼルシャフトSchott AG | 耐引っかき性ガラス製品 |
Family Cites Families (107)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ZA724962B (en) | 1972-07-19 | 1973-10-31 | De Beers Ind Diamond | Improvements in indenters |
US4310595A (en) | 1980-10-31 | 1982-01-12 | Corning Glass Works | Peraluminious nepheline/kalsilite glass-ceramics |
US4995684A (en) | 1986-06-18 | 1991-02-26 | Raytheon Company | Impact resistant and tempered optical elements |
JPS63238260A (ja) | 1987-03-25 | 1988-10-04 | Unitika Ltd | 熱線反射膜の形成方法 |
US5178911A (en) | 1989-11-30 | 1993-01-12 | The President And Fellows Of Harvard College | Process for chemical vapor deposition of main group metal nitrides |
US5268217A (en) | 1990-09-27 | 1993-12-07 | Diamonex, Incorporated | Abrasion wear resistant coated substrate product |
JPH04250834A (ja) | 1991-01-07 | 1992-09-07 | Fuji Photo Film Co Ltd | 精密ろ過膜 |
US5234769A (en) | 1992-04-16 | 1993-08-10 | Deposition Sciences, Inc. | Wear resistant transparent dielectric coatings |
US5342681A (en) | 1992-08-28 | 1994-08-30 | Texas Instruments Incorporated | Absorbing, low reflecting coating for visible and infrared light |
EP0592986B1 (en) | 1992-10-12 | 1998-07-08 | Sumitomo Electric Industries, Limited | Ultra-thin film laminate |
FR2697242B1 (fr) | 1992-10-22 | 1994-12-16 | Saint Gobain Vitrage Int | Vitrage trempé chimique. |
US5557313A (en) | 1992-11-12 | 1996-09-17 | Tdk Corporation | Wear-resistant protective film for thermal head and method of producing the same |
JP2974879B2 (ja) | 1993-04-07 | 1999-11-10 | アルプス電気株式会社 | プラズマcvdによる合成方法 |
DE4445427C2 (de) | 1994-12-20 | 1997-04-30 | Schott Glaswerke | Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht |
FR2730990B1 (fr) | 1995-02-23 | 1997-04-04 | Saint Gobain Vitrage | Substrat transparent a revetement anti-reflets |
FR2759362B1 (fr) | 1997-02-10 | 1999-03-12 | Saint Gobain Vitrage | Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention |
GB9703616D0 (en) | 1997-02-21 | 1997-04-09 | Univ Paisley | Thin films |
US6495251B1 (en) | 1997-06-20 | 2002-12-17 | Ppg Industries Ohio, Inc. | Silicon oxynitride protective coatings |
JPH1177885A (ja) * | 1997-09-17 | 1999-03-23 | Osaka Prefecture | 表面改質プラスチック材料 |
EP1067407B1 (en) | 1998-02-24 | 2006-04-26 | Asahi Glass Co., Ltd. | Light absorption antireflective body and method of producing the same |
FR2781062B1 (fr) | 1998-07-09 | 2002-07-12 | Saint Gobain Vitrage | Vitrage a proprietes optiques et/ou energetiques electrocommandables |
FR2784984B1 (fr) | 1998-10-22 | 2001-10-26 | Saint Gobain Vitrage | Substrat transparent muni d'un empilement de couches minces |
WO2000033110A1 (fr) | 1998-11-30 | 2000-06-08 | Asahi Glass Company Ltd. | Film antireflet pour fenetre de materiel de transport, verre a film antireflet, verre feuillete et leur procede de production |
JP2000171605A (ja) | 1998-12-08 | 2000-06-23 | Sony Corp | 反射防止膜および表示装置 |
JP2000171601A (ja) | 1998-12-08 | 2000-06-23 | Sony Corp | 反射防止膜および表示装置 |
US6303225B1 (en) | 2000-05-24 | 2001-10-16 | Guardian Industries Corporation | Hydrophilic coating including DLC on substrate |
LU90420B1 (fr) | 1999-07-20 | 2001-01-22 | Glaverbel | Couche pyrolitique d'oxynitrure d'aluminium et vitrage comportant cette couche |
JP4250834B2 (ja) | 1999-10-29 | 2009-04-08 | ソニー株式会社 | 触媒スパッタリングによる薄膜形成方法 |
JP2001192821A (ja) | 2000-01-07 | 2001-07-17 | Nippon Sheet Glass Co Ltd | 被膜を基体に被覆する方法およびその方法を用いた物品 |
EP1148037A1 (de) | 2000-04-19 | 2001-10-24 | Blösch Holding AG | Herstellungsverfahren für eine Entspiegelungsschicht auf Uhrengläsern |
JP2001303246A (ja) | 2000-04-27 | 2001-10-31 | Nippon Sheet Glass Co Ltd | 撥水性膜の成膜方法およびその方法により得られる撥水性膜が成膜された物品 |
EP1176434B1 (en) | 2000-07-27 | 2006-09-06 | Asahi Glass Company Ltd. | Substrate provided with antireflection films and its production method |
JP2002174810A (ja) | 2000-12-08 | 2002-06-21 | Hoya Corp | ディスプレイ用ガラス基板及びその製造方法並びにこれを用いたディスプレイ |
JP4795588B2 (ja) | 2001-01-12 | 2011-10-19 | 株式会社東芝 | 窒化けい素製耐摩耗性部材 |
US6875468B2 (en) | 2001-04-06 | 2005-04-05 | Rwe Solar Gmbh | Method and device for treating and/or coating a surface of an object |
AUPR678701A0 (en) | 2001-08-03 | 2001-08-23 | Sola International Holdings Ltd | Scratch masking coatings for optical substrates |
JP2003131011A (ja) | 2001-10-29 | 2003-05-08 | Nippon Electric Glass Co Ltd | 多層膜およびそれを用いた多層膜付き基体 |
US6783253B2 (en) | 2002-03-21 | 2004-08-31 | Guardian Industries Corp. | First surface mirror with DLC coating |
EP1362834A1 (fr) * | 2002-05-06 | 2003-11-19 | Glaverbel | Substrat transparent comportant une couche conductrice |
US20050233091A1 (en) | 2002-05-08 | 2005-10-20 | Devendra Kumar | Plasma-assisted coating |
FR2841894B1 (fr) | 2002-07-03 | 2006-03-10 | Saint Gobain | Substrat transparent comportant un revetement antireflet |
US7015640B2 (en) | 2002-09-11 | 2006-03-21 | General Electric Company | Diffusion barrier coatings having graded compositions and devices incorporating the same |
US6685637B1 (en) | 2002-10-11 | 2004-02-03 | Koninklijke Philips Electronics N.V. | Ultrasonic diagnostic imaging system with multiple language user interface |
DK1594812T3 (da) | 2003-02-14 | 2008-07-28 | Agc Flat Glass Europe Sa | Vinduespanel, der bærer en coatingstabel |
TWI370700B (en) | 2003-03-31 | 2012-08-11 | Dainippon Printing Co Ltd | Protective coat and method for manufacturing thereof |
FR2856627B1 (fr) * | 2003-06-26 | 2006-08-11 | Saint Gobain | Substrat transparent muni d'un revetement avec proprietes de resistance mecanique |
DE10342397B4 (de) | 2003-09-13 | 2008-04-03 | Schott Ag | Transparente Schutzschicht für einen Körper und deren Verwendung |
DE10342398B4 (de) | 2003-09-13 | 2008-05-29 | Schott Ag | Schutzschicht für einen Körper sowie Verfahren zur Herstellung und Verwendung von Schutzschichten |
US7727917B2 (en) | 2003-10-24 | 2010-06-01 | Schott Ag | Lithia-alumina-silica containing glass compositions and glasses suitable for chemical tempering and articles made using the chemically tempered glass |
FR2861853B1 (fr) | 2003-10-30 | 2006-02-24 | Soitec Silicon On Insulator | Substrat avec adaptation d'indice |
JP2005274527A (ja) | 2004-03-26 | 2005-10-06 | Cimeo Precision Co Ltd | 時計用カバーガラス |
JP4707656B2 (ja) | 2004-03-29 | 2011-06-22 | Hoya株式会社 | 反射防止膜を有する光学部材 |
FR2869606B1 (fr) * | 2004-04-28 | 2007-02-23 | Saint Gobain | Vitrage muni d'un empilement de couches minces agissant sur le rayonnement solaire |
ZA200609062B (en) | 2004-09-23 | 2008-08-27 | Element Six Pty Ltd | Coated abrasive materials and method of manufacture |
EP1705162A1 (en) | 2005-03-23 | 2006-09-27 | EMPA Eidgenössische Materialprüfungs- und Forschungsanstalt | Coated substrate and process for the manufacture of a coated substrate |
FR2889202B1 (fr) | 2005-08-01 | 2007-09-14 | Saint Gobain | Procede de depot d'une couche anti-rayure |
US20070030569A1 (en) | 2005-08-04 | 2007-02-08 | Guardian Industries Corp. | Broad band antireflection coating and method of making same |
DE102005040266A1 (de) | 2005-08-24 | 2007-03-01 | Schott Ag | Verfahren und Vorrichtung zur innenseitigen Plasmabehandlung von Hohlkörpern |
US8304078B2 (en) | 2005-09-12 | 2012-11-06 | Saxon Glass Technologies, Inc. | Chemically strengthened lithium aluminosilicate glass having high strength effective to resist fracture upon flexing |
JP4765069B2 (ja) | 2005-09-26 | 2011-09-07 | 国立大学法人東北大学 | 窒化物コーティング法 |
JP2007099557A (ja) | 2005-10-04 | 2007-04-19 | Nippon Electric Glass Co Ltd | 強化ガラス物品およびその製造方法 |
JP4790396B2 (ja) | 2005-12-02 | 2011-10-12 | 学校法人東京理科大学 | 透明膜の製造方法 |
FR2895522B1 (fr) | 2005-12-23 | 2008-04-11 | Saint Gobain | Substrat transparent comportant un revetement antireflet |
FR2898295B1 (fr) | 2006-03-10 | 2013-08-09 | Saint Gobain | Substrat transparent antireflet presentant une couleur neutre en reflexion |
DE102007033338B4 (de) | 2007-07-16 | 2010-06-02 | Schott Ag | Hartstoffbeschichteter Glas- oder Glaskeramik-Artikel und Verfahren zu dessen Herstellung sowie Verwendung des Glas- oder Glaskeramik-Artikels |
JP5467490B2 (ja) | 2007-08-03 | 2014-04-09 | 日本電気硝子株式会社 | 強化ガラス基板の製造方法及び強化ガラス基板 |
CN102290056B (zh) | 2007-09-28 | 2014-12-03 | Hoya株式会社 | 磁盘用玻璃基板及其制造方法、磁盘 |
JP2009116218A (ja) | 2007-11-09 | 2009-05-28 | Seiko Epson Corp | 反射防止膜、反射防止膜の形成方法、及び透光部材 |
JP2011510903A (ja) * | 2008-02-08 | 2011-04-07 | コーニング インコーポレイテッド | 損傷耐性の化学強化された保護カバーガラス |
JP2009265601A (ja) | 2008-03-31 | 2009-11-12 | Kyocera Corp | 多芯フェルールおよび多芯フェルールの製造方法 |
JP5163742B2 (ja) | 2008-04-24 | 2013-03-13 | 旭硝子株式会社 | 低反射ガラスおよびディスプレイ用保護板 |
JP5444846B2 (ja) | 2008-05-30 | 2014-03-19 | 旭硝子株式会社 | ディスプレイ装置用ガラス板 |
KR20110036828A (ko) | 2008-07-11 | 2011-04-11 | 코닝 인코포레이티드 | 소비자 어플리케이션용 압축 표면을 구비한 유리 |
US8187671B2 (en) | 2008-07-28 | 2012-05-29 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) | Method of making heat treated coated article using diamond-like carbon (DLC) coating and protective film including removal of protective film via blasting |
CN102137822B (zh) | 2008-07-29 | 2015-12-09 | 康宁股份有限公司 | 用于化学强化玻璃的双阶段离子交换 |
CN102123960A (zh) | 2008-08-21 | 2011-07-13 | 康宁股份有限公司 | 用于电子设备的耐久性玻璃机壳/封罩 |
DE102008054139B4 (de) | 2008-10-31 | 2010-11-11 | Schott Ag | Glas- oder Glaskeramik-Substrat mit Kratzschutzbeschichtung, dessen Verwendung und Verfahren zu dessen Herstellung |
US8341976B2 (en) | 2009-02-19 | 2013-01-01 | Corning Incorporated | Method of separating strengthened glass |
JP5448064B2 (ja) | 2009-10-28 | 2014-03-19 | 日本電気硝子株式会社 | 強化板ガラス及びその製造方法 |
JP5689075B2 (ja) | 2009-11-25 | 2015-03-25 | 旭硝子株式会社 | ディスプレイカバーガラス用ガラス基板及びその製造方法 |
US20110129648A1 (en) | 2009-11-30 | 2011-06-02 | Yabei Gu | Glass sheet article with double-tapered asymmetric edge |
JP5589379B2 (ja) | 2009-12-25 | 2014-09-17 | 旭硝子株式会社 | ディスプレイカバーガラス用ガラス基板の製造方法 |
KR101103041B1 (ko) | 2009-12-30 | 2012-01-05 | 미래나노텍(주) | 반사 방지 필름 및 그 제조방법 |
DE102010009584B4 (de) | 2010-02-26 | 2015-01-08 | Schott Ag | Chemisch vorgespanntes Glas, Verfahren zu seiner Herstellung sowie Verwendung desselben |
JP2010202514A (ja) | 2010-06-10 | 2010-09-16 | Hoya Corp | 携帯型液晶ディスプレイ用のガラス基板及びその製造方法並びにこれを用いた携帯型液晶ディスプレイ |
JP5255611B2 (ja) | 2010-09-17 | 2013-08-07 | Hoya株式会社 | ディスプレイ用ガラス基板及びその製造方法並びにこれを用いたディスプレイ |
US8796165B2 (en) | 2010-11-30 | 2014-08-05 | Corning Incorporated | Alkaline earth alumino-borosilicate crack resistant glass |
US20120164454A1 (en) * | 2010-12-27 | 2012-06-28 | Chien-Min Sung | Diamond Protected Devices and Associated Methods |
JP2012214356A (ja) * | 2010-12-29 | 2012-11-08 | Avanstrate Inc | カバーガラス及びその製造方法 |
US8434951B2 (en) | 2011-01-10 | 2013-05-07 | Apple Inc. | Systems and methods for coupling a cover to an enclosure |
DE202012013052U1 (de) | 2011-02-23 | 2014-09-29 | Schott Ag | Saphirglas-Scheibe mit Antireflexionsbeschichtung sowie deren Verwendung |
US20120280373A1 (en) * | 2011-05-06 | 2012-11-08 | Jiangwei Feng | Active electronics on strengthened glass with alkali barrier |
US20120327568A1 (en) | 2011-06-24 | 2012-12-27 | Anna-Katrina Shedletsky | Thin Film Coatings for Glass Members |
DE102011081234A1 (de) | 2011-08-19 | 2013-02-21 | Schott Ag | Glaskeramik, die wenigstens teilweise mit einer Hartstoffschicht versehen ist |
DE102011114669B3 (de) * | 2011-09-30 | 2012-10-18 | Arcon Flachglas-Veredlung Gmbh & Co. Kg | Schichtsystem für Sonnenschutzglas, Sonnenschutzglas und Verfahren zur Herstellung von Sonnenschutzglas |
US20130127202A1 (en) | 2011-11-23 | 2013-05-23 | Shandon Dee Hart | Strengthened Glass and Glass Laminates Having Asymmetric Impact Resistance |
KR101579023B1 (ko) | 2011-12-16 | 2015-12-18 | 아사히 가라스 가부시키가이샤 | 디스플레이용 커버 유리 |
US9785299B2 (en) | 2012-01-03 | 2017-10-10 | Synaptics Incorporated | Structures and manufacturing methods for glass covered electronic devices |
WO2013160233A1 (en) | 2012-04-24 | 2013-10-31 | Empa Eidgenössische Materialprüfungs- Und Forschungsanstalt | Scratch resistant coating structure and use as optical filter or uv-blocking filter |
CN102807330B (zh) | 2012-08-24 | 2015-04-22 | 福耀玻璃工业集团股份有限公司 | 一种高红外反射的低辐射镀膜玻璃及其夹层玻璃制品 |
CN104718071B (zh) | 2012-10-03 | 2018-09-04 | 康宁股份有限公司 | 表面改进的玻璃基材 |
EP2906418B1 (en) | 2012-10-12 | 2021-05-26 | Corning Incorporated | Articles having retained strength |
JP5307926B2 (ja) | 2012-10-22 | 2013-10-02 | 三菱樹脂株式会社 | 液晶表示装置 |
CN102942308A (zh) * | 2012-11-19 | 2013-02-27 | 天津市中环高科技有限公司 | 一种应用于透明材质的分层氮化硅SiNxOy成膜方法 |
US9623628B2 (en) * | 2013-01-10 | 2017-04-18 | Apple Inc. | Sapphire component with residual compressive stress |
US9703010B2 (en) | 2013-02-08 | 2017-07-11 | Corning Incorporated | Articles with anti-reflective high-hardness coatings and related methods |
US9110230B2 (en) * | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
-
2014
- 2014-09-10 US US14/482,250 patent/US10160688B2/en active Active
- 2014-09-12 EP EP23184889.6A patent/EP4246949A3/en active Pending
- 2014-09-12 KR KR1020167009765A patent/KR102227298B1/ko active IP Right Grant
- 2014-09-12 EP EP14781339.8A patent/EP3044177B1/en active Active
- 2014-09-12 CN CN202210005485.8A patent/CN114195402A/zh active Pending
- 2014-09-12 TW TW103131605A patent/TWI678286B/zh active
- 2014-09-12 JP JP2016542805A patent/JP6371396B2/ja active Active
- 2014-09-12 WO PCT/US2014/055295 patent/WO2015038843A1/en active Application Filing
- 2014-09-12 TW TW108138571A patent/TWI740247B/zh active
- 2014-09-12 CN CN201480062442.7A patent/CN105980323A/zh active Pending
-
2018
- 2018-07-12 JP JP2018132166A patent/JP6815356B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10231147A (ja) * | 1998-01-12 | 1998-09-02 | Nippon Sheet Glass Co Ltd | 透明帯電防止ガラス板 |
US20020032073A1 (en) * | 1998-02-11 | 2002-03-14 | Joseph J. Rogers | Highly durable and abrasion resistant composite diamond-like carbon decorative coatings with controllable color for metal substrates |
JP2000113510A (ja) * | 1998-10-08 | 2000-04-21 | Sony Corp | 情報記録媒体 |
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Also Published As
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EP4246949A2 (en) | 2023-09-20 |
TW201515850A (zh) | 2015-05-01 |
TWI678286B (zh) | 2019-12-01 |
TWI740247B (zh) | 2021-09-21 |
EP4246949A3 (en) | 2023-11-08 |
CN114195402A (zh) | 2022-03-18 |
JP2018172278A (ja) | 2018-11-08 |
CN105980323A (zh) | 2016-09-28 |
EP3044177A1 (en) | 2016-07-20 |
US20150079398A1 (en) | 2015-03-19 |
KR102227298B1 (ko) | 2021-03-15 |
TW202026146A (zh) | 2020-07-16 |
WO2015038843A1 (en) | 2015-03-19 |
JP6815356B2 (ja) | 2021-01-20 |
JP6371396B2 (ja) | 2018-08-08 |
KR20160056924A (ko) | 2016-05-20 |
EP3044177B1 (en) | 2023-08-23 |
US10160688B2 (en) | 2018-12-25 |
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