TWI658333B - Exposure device, exposure method, and article manufacturing method - Google Patents

Exposure device, exposure method, and article manufacturing method Download PDF

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Publication number
TWI658333B
TWI658333B TW106124165A TW106124165A TWI658333B TW I658333 B TWI658333 B TW I658333B TW 106124165 A TW106124165 A TW 106124165A TW 106124165 A TW106124165 A TW 106124165A TW I658333 B TWI658333 B TW I658333B
Authority
TW
Taiwan
Prior art keywords
slit
optical system
arc
curvature
substrate
Prior art date
Application number
TW106124165A
Other languages
English (en)
Chinese (zh)
Other versions
TW201807508A (zh
Inventor
大野文靖
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW201807508A publication Critical patent/TW201807508A/zh
Application granted granted Critical
Publication of TWI658333B publication Critical patent/TWI658333B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW106124165A 2016-08-24 2017-07-19 Exposure device, exposure method, and article manufacturing method TWI658333B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-163562 2016-08-24
JP2016163562A JP6771997B2 (ja) 2016-08-24 2016-08-24 露光装置、露光方法、および物品製造方法

Publications (2)

Publication Number Publication Date
TW201807508A TW201807508A (zh) 2018-03-01
TWI658333B true TWI658333B (zh) 2019-05-01

Family

ID=61303054

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106124165A TWI658333B (zh) 2016-08-24 2017-07-19 Exposure device, exposure method, and article manufacturing method

Country Status (4)

Country Link
JP (1) JP6771997B2 (enExample)
KR (1) KR102212723B1 (enExample)
CN (1) CN107783383B (enExample)
TW (1) TWI658333B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7204400B2 (ja) * 2018-09-28 2023-01-16 キヤノン株式会社 露光装置及び物品の製造方法
CN110412836A (zh) * 2019-07-31 2019-11-05 江苏盟星智能科技有限公司 一种激光直接成像曝光机及其成像方法

Citations (2)

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TW201022855A (en) * 2008-11-28 2010-06-16 Nikon Corp Correction unit, illumination optical system, exposure apparatus and device manufacturing method
TW201433826A (zh) * 2013-02-28 2014-09-01 Canon Kk 照明光學系統、曝光裝置、以及裝置之製造方法

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JPS5883836A (ja) * 1981-11-13 1983-05-19 Hitachi Ltd 円弧状照明光形成スリツト
JP2001085328A (ja) * 1993-06-11 2001-03-30 Nikon Corp 投影露光方法及び装置、並びに素子製造方法
JPH07273005A (ja) * 1994-03-29 1995-10-20 Nikon Corp 投影露光装置
JPH09283434A (ja) * 1996-04-15 1997-10-31 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
US5880834A (en) * 1996-10-16 1999-03-09 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Convex diffraction grating imaging spectrometer
JP3413160B2 (ja) * 2000-06-15 2003-06-03 キヤノン株式会社 照明装置及びそれを用いた走査型露光装置
KR20020001418A (ko) * 2000-06-28 2002-01-09 박종섭 노광 장비의 어퍼처
JP3652329B2 (ja) * 2002-06-28 2005-05-25 キヤノン株式会社 走査露光装置、走査露光方法、デバイス製造方法およびデバイス
JP2004266259A (ja) * 2003-02-10 2004-09-24 Nikon Corp 照明光学装置、露光装置および露光方法
KR20050002310A (ko) * 2003-06-30 2005-01-07 주식회사 하이닉스반도체 변형 조명계 노광장치 및 이를 이용한 감광막 패턴 형성방법
WO2006131242A1 (en) * 2005-06-10 2006-12-14 Carl Zeiss Smt Ag Multiple-use projection system
JP2007158225A (ja) * 2005-12-08 2007-06-21 Canon Inc 露光装置
JP2009164355A (ja) * 2008-01-07 2009-07-23 Canon Inc 走査露光装置およびデバイス製造方法
JP2010118403A (ja) * 2008-11-11 2010-05-27 Canon Inc 走査型露光装置、及びデバイスの製造方法
JP2010197517A (ja) * 2009-02-23 2010-09-09 Canon Inc 照明光学装置、露光装置およびデバイス製造方法
JP2011039172A (ja) 2009-08-07 2011-02-24 Canon Inc 露光装置およびデバイス製造方法
JP2011108697A (ja) * 2009-11-13 2011-06-02 Nikon Corp 露光量制御方法、露光方法、及びデバイス製造方法
JP2013238670A (ja) * 2012-05-11 2013-11-28 Canon Inc 露光装置、露光方法、デバイスの製造方法及び開口板
JP2014130297A (ja) * 2012-12-29 2014-07-10 Cerma Precision Inc 投影光学系、露光装置、スキャン露光装置及び表示パネルの製造方法
CN105093847B (zh) * 2015-08-04 2017-05-10 深圳市华星光电技术有限公司 曝光机

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201022855A (en) * 2008-11-28 2010-06-16 Nikon Corp Correction unit, illumination optical system, exposure apparatus and device manufacturing method
TW201433826A (zh) * 2013-02-28 2014-09-01 Canon Kk 照明光學系統、曝光裝置、以及裝置之製造方法

Also Published As

Publication number Publication date
CN107783383A (zh) 2018-03-09
KR20180022578A (ko) 2018-03-06
TW201807508A (zh) 2018-03-01
JP6771997B2 (ja) 2020-10-21
JP2018031873A (ja) 2018-03-01
CN107783383B (zh) 2020-06-09
KR102212723B1 (ko) 2021-02-05

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