TWI643876B - 感光性樹脂組合物、由其形成之光固化圖案以及包含該圖案之影像顯示裝置 - Google Patents

感光性樹脂組合物、由其形成之光固化圖案以及包含該圖案之影像顯示裝置 Download PDF

Info

Publication number
TWI643876B
TWI643876B TW105136265A TW105136265A TWI643876B TW I643876 B TWI643876 B TW I643876B TW 105136265 A TW105136265 A TW 105136265A TW 105136265 A TW105136265 A TW 105136265A TW I643876 B TWI643876 B TW I643876B
Authority
TW
Taiwan
Prior art keywords
pattern
resin composition
photosensitive resin
carbon atoms
group
Prior art date
Application number
TW105136265A
Other languages
English (en)
Chinese (zh)
Other versions
TW201825535A (zh
Inventor
曺伯鉉
趙庸桓
崔碩均
Original Assignee
東友精細化工有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東友精細化工有限公司 filed Critical 東友精細化工有限公司
Publication of TW201825535A publication Critical patent/TW201825535A/zh
Application granted granted Critical
Publication of TWI643876B publication Critical patent/TWI643876B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
TW105136265A 2016-01-14 2016-11-08 感光性樹脂組合物、由其形成之光固化圖案以及包含該圖案之影像顯示裝置 TWI643876B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
??10-2016-0004944 2016-01-14
KR1020160004944A KR102031215B1 (ko) 2016-01-14 2016-01-14 감광성 수지 조성물, 이로 형성되는 광경화 패턴 및 이를 포함하는 화상 표시 장치

Publications (2)

Publication Number Publication Date
TW201825535A TW201825535A (zh) 2018-07-16
TWI643876B true TWI643876B (zh) 2018-12-11

Family

ID=59334622

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105136265A TWI643876B (zh) 2016-01-14 2016-11-08 感光性樹脂組合物、由其形成之光固化圖案以及包含該圖案之影像顯示裝置

Country Status (4)

Country Link
JP (1) JP6559720B2 (ko)
KR (1) KR102031215B1 (ko)
CN (1) CN106970504B (ko)
TW (1) TWI643876B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7051321B2 (ja) * 2017-07-21 2022-04-11 東京応化工業株式会社 感光性組成物、パターン形成方法、硬化物、及び表示装置
JP7079581B2 (ja) * 2017-08-31 2022-06-02 東京応化工業株式会社 感光性組成物、硬化物形成方法、硬化物、画像表示装置用パネル、及び画像表示装置
TWI741223B (zh) * 2017-10-20 2021-10-01 南韓商東友精細化工有限公司 著色分散液、含該著色分散液之著色感光性樹脂組合物、使用該組合物製造之圖案層、含該圖案層之彩色濾光片、及含該彩色濾光片之顯示裝置
KR102364239B1 (ko) * 2017-12-21 2022-02-16 동우 화인켐 주식회사 착색 감광성 조성물, 컬러필터 및 화상 표시 장치
CN110412829A (zh) * 2018-04-26 2019-11-05 东友精细化工有限公司 负型感光性树脂组合物、光固化图案及图像显示装置
CN110412830B (zh) * 2018-04-27 2023-02-17 东友精细化工有限公司 感光性树脂组合物、光固化图案及图像显示装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101630124A (zh) * 2008-07-17 2010-01-20 Jsr株式会社 着色层形成用感射线性组合物、滤色器和彩色液晶显示元件
TW201541190A (zh) * 2014-04-30 2015-11-01 Chi Mei Corp 彩色濾光片用之感光性樹脂組成物及其應用

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000095896A (ja) 1998-09-24 2000-04-04 Denki Kagaku Kogyo Kk 樹脂添加用粉末、それを用いた樹脂組成物と放熱スペーサ
JP2006284975A (ja) * 2005-04-01 2006-10-19 Jsr Corp 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子
JP4766268B2 (ja) * 2007-03-01 2011-09-07 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
WO2008111247A1 (ja) * 2007-03-12 2008-09-18 Fujifilm Corporation 感光性組成物、感光性フィルム、永久パターンの形成方法、及びプリント基板
JP5109903B2 (ja) * 2007-10-19 2012-12-26 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタ及び液晶表示素子
JP5516844B2 (ja) * 2008-03-24 2014-06-11 Ｊｓｒ株式会社 感放射線性樹脂組成物、スペーサーおよびその製造方法ならびに液晶表示素子
JP2010107755A (ja) * 2008-10-30 2010-05-13 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP5708066B2 (ja) * 2010-06-30 2015-04-30 Jsr株式会社 カラーフィルタ用着色組成物、カラーフィルタ及び表示素子
KR101495533B1 (ko) * 2010-12-21 2015-02-25 동우 화인켐 주식회사 스페이서 형성용 감광성 수지 조성물, 이를 이용하여 제조된 표시 장치용 스페이서 및 이를 포함하는 표시 장치
KR20140104766A (ko) * 2013-02-21 2014-08-29 동우 화인켐 주식회사 알칼리 가용성 수지 및 이를 포함하는 감광성 수지 조성물
KR101988256B1 (ko) * 2013-02-26 2019-06-12 동우 화인켐 주식회사 착색 감광성 수지 조성물
TWI647532B (zh) * 2014-07-01 2019-01-11 南韓商東友精細化工有限公司 光敏樹脂組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101630124A (zh) * 2008-07-17 2010-01-20 Jsr株式会社 着色层形成用感射线性组合物、滤色器和彩色液晶显示元件
TW201541190A (zh) * 2014-04-30 2015-11-01 Chi Mei Corp 彩色濾光片用之感光性樹脂組成物及其應用

Also Published As

Publication number Publication date
JP6559720B2 (ja) 2019-08-14
CN106970504A (zh) 2017-07-21
CN106970504B (zh) 2020-09-22
KR20170085383A (ko) 2017-07-24
KR102031215B1 (ko) 2019-10-11
JP2017126065A (ja) 2017-07-20
TW201825535A (zh) 2018-07-16

Similar Documents

Publication Publication Date Title
TWI643876B (zh) 感光性樹脂組合物、由其形成之光固化圖案以及包含該圖案之影像顯示裝置
JP5945295B2 (ja) スペーサ形成用感光性樹脂組成物及びそれから製造されるスペーサ
TW200811205A (en) Curing resin composition and forming method of curing coating film
TW201300949A (zh) 間隔物形成用感光性樹脂組合物、顯示裝置用間隔物及顯示裝置
JP2011145677A (ja) 感光性樹脂組成物
TW201632578A (zh) 負型感光性樹脂組成物
TWI614579B (zh) 負感光型樹脂組合物及由其製造的光固化圖案
JP5514566B2 (ja) 感光性樹脂組成物
JP6754742B2 (ja) 感光性樹脂組成物及びそれから製造される光硬化パターン
JP2007293241A (ja) フォトスペーサー形成用感光性樹脂組成物
KR102383697B1 (ko) 네가티브형 감광성 수지 조성물
KR20190111637A (ko) 감광성 수지 조성물
KR20180017836A (ko) 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치
JP2014197153A (ja) 感光性樹脂組成物
JP6571315B2 (ja) 透明画素形成用感光性樹脂組成物
KR20180073002A (ko) 네가티브형 감광성 수지 조성물 및 이로부터 형성된 광경화 패턴
JP2017173553A (ja) 感光性樹脂組成物
KR20180031131A (ko) 감광성 수지 조성물 및 이로부터 제조된 광경화 패턴
TWI693473B (zh) 感光性樹脂組合物及由其製造的光固化圖案
JP2020024410A (ja) 感光性樹脂組成物及びそれから形成された光硬化パターン
KR20160046093A (ko) 화소 형성용 감광성 수지 조성물
WO2021157596A1 (ja) 硬化性組成物、硬化物、電子デバイス、表示装置、光学部材、重合体、感光性組成物、パターンおよび化合物
CN113281965A (zh) 固化性树脂组合物、图案以及图像显示装置
JP2018031914A (ja) 感光性樹脂組成物
JP2017122822A (ja) 感光性樹脂組成物