JP6559720B2 - 感光性樹脂組成物、感光性樹脂組成物で製造される光硬化パターン、及び光硬化パターンを備える画像表示装置 - Google Patents

感光性樹脂組成物、感光性樹脂組成物で製造される光硬化パターン、及び光硬化パターンを備える画像表示装置 Download PDF

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JP6559720B2
JP6559720B2 JP2017000095A JP2017000095A JP6559720B2 JP 6559720 B2 JP6559720 B2 JP 6559720B2 JP 2017000095 A JP2017000095 A JP 2017000095A JP 2017000095 A JP2017000095 A JP 2017000095A JP 6559720 B2 JP6559720 B2 JP 6559720B2
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carbon atoms
pattern
resin composition
photosensitive resin
group
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JP2017126065A (ja
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伯鉉 ▲チョウ▼
伯鉉 ▲チョウ▼
庸桓 趙
庸桓 趙
碩均 崔
碩均 崔
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
JP2017000095A 2016-01-14 2017-01-04 感光性樹脂組成物、感光性樹脂組成物で製造される光硬化パターン、及び光硬化パターンを備える画像表示装置 Active JP6559720B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020160004944A KR102031215B1 (ko) 2016-01-14 2016-01-14 감광성 수지 조성물, 이로 형성되는 광경화 패턴 및 이를 포함하는 화상 표시 장치
KR10-2016-0004944 2016-01-14

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JP2017126065A JP2017126065A (ja) 2017-07-20
JP6559720B2 true JP6559720B2 (ja) 2019-08-14

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JP2017000095A Active JP6559720B2 (ja) 2016-01-14 2017-01-04 感光性樹脂組成物、感光性樹脂組成物で製造される光硬化パターン、及び光硬化パターンを備える画像表示装置

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JP (1) JP6559720B2 (ko)
KR (1) KR102031215B1 (ko)
CN (1) CN106970504B (ko)
TW (1) TWI643876B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7051321B2 (ja) * 2017-07-21 2022-04-11 東京応化工業株式会社 感光性組成物、パターン形成方法、硬化物、及び表示装置
JP7079581B2 (ja) * 2017-08-31 2022-06-02 東京応化工業株式会社 感光性組成物、硬化物形成方法、硬化物、画像表示装置用パネル、及び画像表示装置
TWI741223B (zh) * 2017-10-20 2021-10-01 南韓商東友精細化工有限公司 著色分散液、含該著色分散液之著色感光性樹脂組合物、使用該組合物製造之圖案層、含該圖案層之彩色濾光片、及含該彩色濾光片之顯示裝置
KR102364239B1 (ko) * 2017-12-21 2022-02-16 동우 화인켐 주식회사 착색 감광성 조성물, 컬러필터 및 화상 표시 장치
CN110412829A (zh) * 2018-04-26 2019-11-05 东友精细化工有限公司 负型感光性树脂组合物、光固化图案及图像显示装置
CN110412830B (zh) * 2018-04-27 2023-02-17 东友精细化工有限公司 感光性树脂组合物、光固化图案及图像显示装置

Family Cites Families (14)

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JP2000095896A (ja) 1998-09-24 2000-04-04 Denki Kagaku Kogyo Kk 樹脂添加用粉末、それを用いた樹脂組成物と放熱スペーサ
JP2006284975A (ja) * 2005-04-01 2006-10-19 Jsr Corp 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子
JP4766268B2 (ja) * 2007-03-01 2011-09-07 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
WO2008111247A1 (ja) * 2007-03-12 2008-09-18 Fujifilm Corporation 感光性組成物、感光性フィルム、永久パターンの形成方法、及びプリント基板
JP5109903B2 (ja) * 2007-10-19 2012-12-26 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタ及び液晶表示素子
JP5516844B2 (ja) * 2008-03-24 2014-06-11 Ｊｓｒ株式会社 感放射線性樹脂組成物、スペーサーおよびその製造方法ならびに液晶表示素子
JP5417994B2 (ja) * 2008-07-17 2014-02-19 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP2010107755A (ja) * 2008-10-30 2010-05-13 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP5708066B2 (ja) * 2010-06-30 2015-04-30 Jsr株式会社 カラーフィルタ用着色組成物、カラーフィルタ及び表示素子
KR101495533B1 (ko) * 2010-12-21 2015-02-25 동우 화인켐 주식회사 스페이서 형성용 감광성 수지 조성물, 이를 이용하여 제조된 표시 장치용 스페이서 및 이를 포함하는 표시 장치
KR20140104766A (ko) * 2013-02-21 2014-08-29 동우 화인켐 주식회사 알칼리 가용성 수지 및 이를 포함하는 감광성 수지 조성물
KR101988256B1 (ko) * 2013-02-26 2019-06-12 동우 화인켐 주식회사 착색 감광성 수지 조성물
TWI550354B (zh) * 2014-04-30 2016-09-21 奇美實業股份有限公司 彩色濾光片用之感光性樹脂組成物及其應用
TWI647532B (zh) * 2014-07-01 2019-01-11 南韓商東友精細化工有限公司 光敏樹脂組成物

Also Published As

Publication number Publication date
TW201825535A (zh) 2018-07-16
TWI643876B (zh) 2018-12-11
KR20170085383A (ko) 2017-07-24
CN106970504B (zh) 2020-09-22
CN106970504A (zh) 2017-07-21
KR102031215B1 (ko) 2019-10-11
JP2017126065A (ja) 2017-07-20

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