TWI618905B - Substrate processing device - Google Patents
Substrate processing device Download PDFInfo
- Publication number
- TWI618905B TWI618905B TW104139421A TW104139421A TWI618905B TW I618905 B TWI618905 B TW I618905B TW 104139421 A TW104139421 A TW 104139421A TW 104139421 A TW104139421 A TW 104139421A TW I618905 B TWI618905 B TW I618905B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- gas supply
- gas
- processing chamber
- supply unit
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Solid Materials (AREA)
- Coating Apparatus (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015014155 | 2015-01-28 | ||
JP2015184630A JP6209572B2 (ja) | 2015-01-28 | 2015-09-18 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201706548A TW201706548A (zh) | 2017-02-16 |
TWI618905B true TWI618905B (zh) | 2018-03-21 |
Family
ID=56686152
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104139421A TWI618905B (zh) | 2015-01-28 | 2015-11-26 | Substrate processing device |
Country Status (3)
Country | Link |
---|---|
JP (2) | JP6209572B2 (ja) |
CN (1) | CN105826168B (ja) |
TW (1) | TWI618905B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108807215B (zh) * | 2017-04-28 | 2021-01-29 | 苏州均晟豪智能科技有限公司 | 处理装置 |
CN107065433B (zh) * | 2017-05-08 | 2021-01-26 | 京东方科技集团股份有限公司 | 干燥装置 |
JP7031831B1 (ja) | 2021-03-16 | 2022-03-08 | 株式会社アルフテクノ | 乾燥装置 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW369669B (en) * | 1997-03-31 | 1999-09-11 | Nec Lcd Technologies Ltd | Substrate drying device and method |
JP2002022359A (ja) * | 2000-07-07 | 2002-01-23 | Matsushita Electric Ind Co Ltd | 基板の乾燥装置 |
JP3754905B2 (ja) * | 2001-09-10 | 2006-03-15 | 東京エレクトロン株式会社 | 基板乾燥装置 |
TWI285136B (en) * | 2005-03-30 | 2007-08-11 | Dainippon Screen Mfg | Substrate processing equipment |
JP2008029922A (ja) * | 2006-07-26 | 2008-02-14 | Shibaura Mechatronics Corp | 基板の処理装置 |
TWI321641B (ja) * | 2003-06-27 | 2010-03-11 | Tokyo Ohka Kogyo Co Ltd | |
CN201561627U (zh) * | 2009-12-17 | 2010-08-25 | 无锡尚德太阳能电力有限公司 | 硅片吹干系统 |
TWI372318B (en) * | 2006-12-22 | 2012-09-11 | Tokyo Electron Ltd | Decompression drying device |
JP2013045877A (ja) * | 2011-08-24 | 2013-03-04 | Tokyo Electron Ltd | 基板処理装置 |
CN203672080U (zh) * | 2014-01-06 | 2014-06-25 | 宇宙电路板设备(深圳)有限公司 | 触控面板用烘干装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5919273Y2 (ja) * | 1979-10-03 | 1984-06-04 | 株式会社阪田商会 | 乾燥装置 |
JP4382306B2 (ja) * | 2001-07-05 | 2009-12-09 | Nec液晶テクノロジー株式会社 | 薬液塗布方法及びその塗布装置 |
JP4229670B2 (ja) * | 2002-09-30 | 2009-02-25 | 株式会社日本設計工業 | 薄板状材の搬送方法及び装置 |
-
2015
- 2015-09-18 JP JP2015184630A patent/JP6209572B2/ja active Active
- 2015-11-26 TW TW104139421A patent/TWI618905B/zh active
-
2016
- 2016-01-25 CN CN201610046871.6A patent/CN105826168B/zh active Active
-
2017
- 2017-09-11 JP JP2017173697A patent/JP6495986B2/ja active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW369669B (en) * | 1997-03-31 | 1999-09-11 | Nec Lcd Technologies Ltd | Substrate drying device and method |
JP2002022359A (ja) * | 2000-07-07 | 2002-01-23 | Matsushita Electric Ind Co Ltd | 基板の乾燥装置 |
JP3754905B2 (ja) * | 2001-09-10 | 2006-03-15 | 東京エレクトロン株式会社 | 基板乾燥装置 |
TWI321641B (ja) * | 2003-06-27 | 2010-03-11 | Tokyo Ohka Kogyo Co Ltd | |
TWI285136B (en) * | 2005-03-30 | 2007-08-11 | Dainippon Screen Mfg | Substrate processing equipment |
JP2008029922A (ja) * | 2006-07-26 | 2008-02-14 | Shibaura Mechatronics Corp | 基板の処理装置 |
TWI372318B (en) * | 2006-12-22 | 2012-09-11 | Tokyo Electron Ltd | Decompression drying device |
CN201561627U (zh) * | 2009-12-17 | 2010-08-25 | 无锡尚德太阳能电力有限公司 | 硅片吹干系统 |
JP2013045877A (ja) * | 2011-08-24 | 2013-03-04 | Tokyo Electron Ltd | 基板処理装置 |
CN203672080U (zh) * | 2014-01-06 | 2014-06-25 | 宇宙电路板设备(深圳)有限公司 | 触控面板用烘干装置 |
Also Published As
Publication number | Publication date |
---|---|
JP6495986B2 (ja) | 2019-04-03 |
JP2016145702A (ja) | 2016-08-12 |
CN105826168A (zh) | 2016-08-03 |
CN105826168B (zh) | 2018-10-26 |
TW201706548A (zh) | 2017-02-16 |
JP6209572B2 (ja) | 2017-10-04 |
JP2017211178A (ja) | 2017-11-30 |
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