TWI566046B - 感光性樹脂組成物、圖案構造物、顯示裝置及間隔壁 - Google Patents

感光性樹脂組成物、圖案構造物、顯示裝置及間隔壁 Download PDF

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Publication number
TWI566046B
TWI566046B TW100139090A TW100139090A TWI566046B TW I566046 B TWI566046 B TW I566046B TW 100139090 A TW100139090 A TW 100139090A TW 100139090 A TW100139090 A TW 100139090A TW I566046 B TWI566046 B TW I566046B
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TW
Taiwan
Prior art keywords
group
photosensitive resin
resin composition
compound
weight
Prior art date
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TW100139090A
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English (en)
Chinese (zh)
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TW201229670A (en
Inventor
梶谷優
村上元彥
三木雅之
Original Assignee
住友化學股份有限公司
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Application filed by 住友化學股份有限公司 filed Critical 住友化學股份有限公司
Publication of TW201229670A publication Critical patent/TW201229670A/zh
Application granted granted Critical
Publication of TWI566046B publication Critical patent/TWI566046B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Nonlinear Science (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW100139090A 2010-10-29 2011-10-27 感光性樹脂組成物、圖案構造物、顯示裝置及間隔壁 TWI566046B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010243454 2010-10-29

Publications (2)

Publication Number Publication Date
TW201229670A TW201229670A (en) 2012-07-16
TWI566046B true TWI566046B (zh) 2017-01-11

Family

ID=45993767

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100139090A TWI566046B (zh) 2010-10-29 2011-10-27 感光性樹脂組成物、圖案構造物、顯示裝置及間隔壁

Country Status (5)

Country Link
JP (1) JP2012108499A (ja)
KR (1) KR20140007799A (ja)
CN (1) CN103189797A (ja)
TW (1) TWI566046B (ja)
WO (1) WO2012057058A1 (ja)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5835014B2 (ja) * 2011-03-31 2015-12-24 Jsr株式会社 画素パターンの形成方法及びカラーフィルタの製造方法
KR20140065351A (ko) * 2012-11-21 2014-05-29 신닛테츠 수미킨 가가쿠 가부시키가이샤 잉크젯 하지용 처리제
JP6123302B2 (ja) * 2013-01-15 2017-05-10 住友ベークライト株式会社 化学増幅型のネガ型フォトレジスト用樹脂組成物、硬化物および電子装置
JP6303549B2 (ja) * 2013-02-19 2018-04-04 Jsr株式会社 ネガ型感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
KR101511476B1 (ko) * 2014-02-28 2015-04-10 스미또모 가가꾸 가부시키가이샤 감광성 수지 조성물
JP6565904B2 (ja) 2014-04-25 2019-08-28 Ａｇｃ株式会社 ネガ型感光性樹脂組成物、隔壁、光学素子および光学素子の製造方法
JP6368558B2 (ja) * 2014-06-25 2018-08-01 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法及び高分子化合物
JP6425119B2 (ja) * 2014-08-05 2018-11-21 Ｔｉａｎｍａ Ｊａｐａｎ株式会社 機器および機器の製造方法
JP6706891B2 (ja) * 2014-09-16 2020-06-10 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
TWI566037B (zh) * 2015-04-17 2017-01-11 奇美實業股份有限公司 感光性樹脂組成物及其應用
WO2017002545A1 (ja) 2015-06-30 2017-01-05 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び電子デバイスの製造方法
EP3376286A1 (en) * 2015-11-10 2018-09-19 Asahi Glass Company, Limited Photosensitive composition for biochip for fluorescence analysis, method for manufacturing biochip for fluorescence analysis, and biochip for fluorescence analysis
KR102617582B1 (ko) * 2018-03-14 2023-12-27 도레이 카부시키가이샤 네거티브형 감광성 착색 조성물, 경화막, 그것을 이용한 터치 패널
JP2019184716A (ja) * 2018-04-04 2019-10-24 東京応化工業株式会社 撥液処理剤、及び被処理体の位置選択的撥液化方法
CN108919605B (zh) * 2018-07-27 2021-12-21 京东方科技集团股份有限公司 光阻组合物、像素界定层、其制备方法及应用
CN109100915B (zh) * 2018-08-23 2021-12-14 合肥鑫晟光电科技有限公司 一种光阻组合物、像素界定结构及其制作方法、显示面板
KR20210097737A (ko) 2018-11-26 2021-08-09 샌트랄 글래스 컴퍼니 리미티드 감광성 수지 조성물, 함불소 수지 경화물의 제조 방법, 함불소 수지, 함불소 수지막, 뱅크 및 표시 소자
WO2020111864A1 (ko) * 2018-11-30 2020-06-04 주식회사 엘지화학 광학 적층체
JPWO2022145187A1 (ja) * 2020-12-28 2022-07-07
CN114790257B (zh) * 2022-04-25 2023-06-23 大连大学 一种基于香豆素和稀土配合物的聚合物白光材料及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005315984A (ja) * 2004-04-27 2005-11-10 Asahi Glass Co Ltd レジスト組成物及びその塗膜
TW200916956A (en) * 2007-04-18 2009-04-16 Daikin Ind Ltd Repellent resist composition

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JP2002244294A (ja) * 2001-02-20 2002-08-30 Nippon Zeon Co Ltd レジスト組成物及びレジストパターン形成方法
JP2003262959A (ja) * 2002-03-11 2003-09-19 Fuji Photo Film Co Ltd ネガ型レジスト組成物
JP2004277494A (ja) * 2003-03-13 2004-10-07 Asahi Glass Co Ltd 含フッ素樹脂および感光性樹脂組成物
JP4513965B2 (ja) * 2004-03-31 2010-07-28 日本ゼオン株式会社 感放射線性樹脂組成物
JP2005284208A (ja) * 2004-03-31 2005-10-13 Nippon Zeon Co Ltd 感光性樹脂組成物及びパターン形成方法
JP4415737B2 (ja) * 2004-04-08 2010-02-17 旭硝子株式会社 感光性樹脂組成物及びその塗膜硬化物
JP4466184B2 (ja) * 2004-04-27 2010-05-26 旭硝子株式会社 感光性樹脂組成物及びその塗膜硬化物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005315984A (ja) * 2004-04-27 2005-11-10 Asahi Glass Co Ltd レジスト組成物及びその塗膜
TW200916956A (en) * 2007-04-18 2009-04-16 Daikin Ind Ltd Repellent resist composition

Also Published As

Publication number Publication date
KR20140007799A (ko) 2014-01-20
TW201229670A (en) 2012-07-16
CN103189797A (zh) 2013-07-03
WO2012057058A1 (ja) 2012-05-03
JP2012108499A (ja) 2012-06-07

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