JPWO2022145187A1 - - Google Patents
Info
- Publication number
- JPWO2022145187A1 JPWO2022145187A1 JP2022572962A JP2022572962A JPWO2022145187A1 JP WO2022145187 A1 JPWO2022145187 A1 JP WO2022145187A1 JP 2022572962 A JP2022572962 A JP 2022572962A JP 2022572962 A JP2022572962 A JP 2022572962A JP WO2022145187 A1 JPWO2022145187 A1 JP WO2022145187A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020219137 | 2020-12-28 | ||
PCT/JP2021/045202 WO2022145187A1 (ja) | 2020-12-28 | 2021-12-08 | 感光性樹脂組成物及び有機el素子隔壁 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022145187A1 true JPWO2022145187A1 (ja) | 2022-07-07 |
Family
ID=82260415
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022572962A Pending JPWO2022145187A1 (ja) | 2020-12-28 | 2021-12-08 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2022145187A1 (ja) |
TW (1) | TWI797892B (ja) |
WO (1) | WO2022145187A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117169182B (zh) * | 2023-08-30 | 2024-03-15 | 广州沙艾生物科技有限公司 | 一种干细胞治疗制剂体外效力检测方法及其应用 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012057058A1 (ja) * | 2010-10-29 | 2012-05-03 | 住友化学株式会社 | 感光性樹脂組成物、パターン構造物、表示装置および隔壁 |
JP6700020B2 (ja) * | 2015-10-21 | 2020-05-27 | 昭和電工株式会社 | ポジ型感光性樹脂組成物 |
TWI683182B (zh) * | 2017-04-07 | 2020-01-21 | 日商昭和電工股份有限公司 | 感光性樹脂組成物及輻射線微影構造物之製造方法 |
JP6576386B2 (ja) * | 2017-04-07 | 2019-09-18 | 昭和電工株式会社 | 感光性樹脂組成物 |
JP6689434B1 (ja) * | 2019-02-06 | 2020-04-28 | 昭和電工株式会社 | 感光性樹脂組成物、有機el素子隔壁、及び有機el素子 |
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2021
- 2021-12-08 WO PCT/JP2021/045202 patent/WO2022145187A1/ja active Application Filing
- 2021-12-08 JP JP2022572962A patent/JPWO2022145187A1/ja active Pending
- 2021-12-16 TW TW110147123A patent/TWI797892B/zh active
Also Published As
Publication number | Publication date |
---|---|
TWI797892B (zh) | 2023-04-01 |
WO2022145187A1 (ja) | 2022-07-07 |
TW202238266A (zh) | 2022-10-01 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20230907 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231207 |