JPWO2021246444A1 - - Google Patents

Info

Publication number
JPWO2021246444A1
JPWO2021246444A1 JP2022528867A JP2022528867A JPWO2021246444A1 JP WO2021246444 A1 JPWO2021246444 A1 JP WO2021246444A1 JP 2022528867 A JP2022528867 A JP 2022528867A JP 2022528867 A JP2022528867 A JP 2022528867A JP WO2021246444 A1 JPWO2021246444 A1 JP WO2021246444A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022528867A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021246444A1 publication Critical patent/JPWO2021246444A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2022528867A 2020-06-03 2021-06-02 Pending JPWO2021246444A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020096905 2020-06-03
PCT/JP2021/021026 WO2021246444A1 (ja) 2020-06-03 2021-06-02 ポジ型感光性樹脂組成物、及び有機ｅｌ素子隔壁

Publications (1)

Publication Number Publication Date
JPWO2021246444A1 true JPWO2021246444A1 (ja) 2021-12-09

Family

ID=78831135

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2022528872A Pending JPWO2021246449A1 (ja) 2020-06-03 2021-06-02
JP2022528867A Pending JPWO2021246444A1 (ja) 2020-06-03 2021-06-02
JP2022528871A Pending JPWO2021246448A1 (ja) 2020-06-03 2021-06-02

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2022528872A Pending JPWO2021246449A1 (ja) 2020-06-03 2021-06-02

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022528871A Pending JPWO2021246448A1 (ja) 2020-06-03 2021-06-02

Country Status (3)

Country Link
JP (3) JPWO2021246449A1 (ja)
TW (3) TWI789776B (ja)
WO (3) WO2021246448A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024024669A1 (ja) * 2022-07-29 2024-02-01 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法及び電子デバイスの製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4205078B2 (ja) * 2005-05-26 2009-01-07 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP2008102277A (ja) * 2006-10-18 2008-05-01 Tokyo Ohka Kogyo Co Ltd 熱リソグラフィー用化学増幅型ポジ型レジスト組成物およびレジストパターン形成方法
JP5623897B2 (ja) * 2010-01-22 2014-11-12 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5814144B2 (ja) * 2012-01-30 2015-11-17 富士フイルム株式会社 感光性樹脂組成物、これを用いたパターンの製造方法
JP5904890B2 (ja) * 2012-07-02 2016-04-20 富士フイルム株式会社 感光性転写材料、硬化膜の製造方法、有機ｅｌ表示装置の製造方法、液晶表示装置の製造方法および静電容量型入力装置の製造方法
JP6038951B2 (ja) * 2012-11-21 2016-12-07 富士フイルム株式会社 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JP6094406B2 (ja) * 2013-07-11 2017-03-15 Jsr株式会社 感放射線性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法
WO2015125870A1 (ja) * 2014-02-20 2015-08-27 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、赤外線カットフィルター、並びに、固体撮像装置
JP2016071244A (ja) * 2014-09-30 2016-05-09 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、並びに、タッチパネル表示装置
JP6754367B2 (ja) * 2015-09-30 2020-09-09 富士フイルム株式会社 樹脂膜、着色感光性組成物、樹脂膜の製造方法、カラーフィルタ、遮光膜、固体撮像素子、及び、画像表示装置
CN109416510A (zh) * 2016-06-29 2019-03-01 富士胶片株式会社 正型感光性树脂组合物、正型平板印刷版原版及平板印刷版的制作方法
JP7283903B2 (ja) * 2016-11-09 2023-05-30 株式会社レゾナック ポジ型感光性樹脂組成物及びチタンブラック分散液
JP6891265B2 (ja) * 2017-03-31 2021-06-18 富士フイルム株式会社 着色膜及びその製造方法、固体撮像素子
WO2019021828A1 (ja) * 2017-07-25 2019-01-31 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、及び、発色組成物
JP7067271B2 (ja) * 2018-05-25 2022-05-16 信越化学工業株式会社 オニウム塩、化学増幅ポジ型レジスト組成物及びレジストパターン形成方法
JP7031537B2 (ja) * 2018-09-05 2022-03-08 信越化学工業株式会社 スルホニウム化合物、ポジ型レジスト組成物、及びレジストパターン形成方法

Also Published As

Publication number Publication date
TW202210938A (zh) 2022-03-16
WO2021246448A1 (ja) 2021-12-09
TWI810578B (zh) 2023-08-01
WO2021246449A1 (ja) 2021-12-09
WO2021246444A1 (ja) 2021-12-09
JPWO2021246448A1 (ja) 2021-12-09
TWI789776B (zh) 2023-01-11
JPWO2021246449A1 (ja) 2021-12-09
TWI775466B (zh) 2022-08-21
TW202204436A (zh) 2022-02-01
TW202210946A (zh) 2022-03-16

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