JPWO2021246449A1 - - Google Patents
Info
- Publication number
- JPWO2021246449A1 JPWO2021246449A1 JP2022528872A JP2022528872A JPWO2021246449A1 JP WO2021246449 A1 JPWO2021246449 A1 JP WO2021246449A1 JP 2022528872 A JP2022528872 A JP 2022528872A JP 2022528872 A JP2022528872 A JP 2022528872A JP WO2021246449 A1 JPWO2021246449 A1 JP WO2021246449A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020096905 | 2020-06-03 | ||
PCT/JP2021/021047 WO2021246449A1 (ja) | 2020-06-03 | 2021-06-02 | ポジ型感光性樹脂組成物、及び有機el素子隔壁 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021246449A1 true JPWO2021246449A1 (ja) | 2021-12-09 |
Family
ID=78831135
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022528872A Pending JPWO2021246449A1 (ja) | 2020-06-03 | 2021-06-02 | |
JP2022528867A Pending JPWO2021246444A1 (ja) | 2020-06-03 | 2021-06-02 | |
JP2022528871A Pending JPWO2021246448A1 (ja) | 2020-06-03 | 2021-06-02 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022528867A Pending JPWO2021246444A1 (ja) | 2020-06-03 | 2021-06-02 | |
JP2022528871A Pending JPWO2021246448A1 (ja) | 2020-06-03 | 2021-06-02 |
Country Status (3)
Country | Link |
---|---|
JP (3) | JPWO2021246449A1 (ja) |
TW (3) | TWI789776B (ja) |
WO (3) | WO2021246448A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024024669A1 (ja) * | 2022-07-29 | 2024-02-01 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法及び電子デバイスの製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4205078B2 (ja) * | 2005-05-26 | 2009-01-07 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
JP2008102277A (ja) * | 2006-10-18 | 2008-05-01 | Tokyo Ohka Kogyo Co Ltd | 熱リソグラフィー用化学増幅型ポジ型レジスト組成物およびレジストパターン形成方法 |
JP5623897B2 (ja) * | 2010-01-22 | 2014-11-12 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機el表示装置、及び、液晶表示装置 |
JP5814144B2 (ja) * | 2012-01-30 | 2015-11-17 | 富士フイルム株式会社 | 感光性樹脂組成物、これを用いたパターンの製造方法 |
JP5904890B2 (ja) * | 2012-07-02 | 2016-04-20 | 富士フイルム株式会社 | 感光性転写材料、硬化膜の製造方法、有機el表示装置の製造方法、液晶表示装置の製造方法および静電容量型入力装置の製造方法 |
JP6038951B2 (ja) * | 2012-11-21 | 2016-12-07 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機el表示装置および液晶表示装置 |
JP6094406B2 (ja) * | 2013-07-11 | 2017-03-15 | Jsr株式会社 | 感放射線性樹脂組成物、硬化膜、発光素子、波長変換フィルムおよび発光層の形成方法 |
WO2015125870A1 (ja) * | 2014-02-20 | 2015-08-27 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機el表示装置、赤外線カットフィルター、並びに、固体撮像装置 |
JP2016071244A (ja) * | 2014-09-30 | 2016-05-09 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機el表示装置、並びに、タッチパネル表示装置 |
JP6754367B2 (ja) * | 2015-09-30 | 2020-09-09 | 富士フイルム株式会社 | 樹脂膜、着色感光性組成物、樹脂膜の製造方法、カラーフィルタ、遮光膜、固体撮像素子、及び、画像表示装置 |
CN109416510A (zh) * | 2016-06-29 | 2019-03-01 | 富士胶片株式会社 | 正型感光性树脂组合物、正型平板印刷版原版及平板印刷版的制作方法 |
JP7283903B2 (ja) * | 2016-11-09 | 2023-05-30 | 株式会社レゾナック | ポジ型感光性樹脂組成物及びチタンブラック分散液 |
JP6891265B2 (ja) * | 2017-03-31 | 2021-06-18 | 富士フイルム株式会社 | 着色膜及びその製造方法、固体撮像素子 |
WO2019021828A1 (ja) * | 2017-07-25 | 2019-01-31 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の作製方法、及び、発色組成物 |
JP7067271B2 (ja) * | 2018-05-25 | 2022-05-16 | 信越化学工業株式会社 | オニウム塩、化学増幅ポジ型レジスト組成物及びレジストパターン形成方法 |
JP7031537B2 (ja) * | 2018-09-05 | 2022-03-08 | 信越化学工業株式会社 | スルホニウム化合物、ポジ型レジスト組成物、及びレジストパターン形成方法 |
-
2021
- 2021-06-02 JP JP2022528872A patent/JPWO2021246449A1/ja active Pending
- 2021-06-02 TW TW110119943A patent/TWI789776B/zh active
- 2021-06-02 TW TW110119990A patent/TWI810578B/zh active
- 2021-06-02 WO PCT/JP2021/021043 patent/WO2021246448A1/ja active Application Filing
- 2021-06-02 JP JP2022528867A patent/JPWO2021246444A1/ja active Pending
- 2021-06-02 WO PCT/JP2021/021026 patent/WO2021246444A1/ja active Application Filing
- 2021-06-02 TW TW110120014A patent/TWI775466B/zh active
- 2021-06-02 WO PCT/JP2021/021047 patent/WO2021246449A1/ja active Application Filing
- 2021-06-02 JP JP2022528871A patent/JPWO2021246448A1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
TW202210938A (zh) | 2022-03-16 |
WO2021246448A1 (ja) | 2021-12-09 |
TWI810578B (zh) | 2023-08-01 |
JPWO2021246444A1 (ja) | 2021-12-09 |
WO2021246449A1 (ja) | 2021-12-09 |
WO2021246444A1 (ja) | 2021-12-09 |
JPWO2021246448A1 (ja) | 2021-12-09 |
TWI789776B (zh) | 2023-01-11 |
TWI775466B (zh) | 2022-08-21 |
TW202204436A (zh) | 2022-02-01 |
TW202210946A (zh) | 2022-03-16 |
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