TWI500442B - Separation device - Google Patents

Separation device Download PDF

Info

Publication number
TWI500442B
TWI500442B TW100119564A TW100119564A TWI500442B TW I500442 B TWI500442 B TW I500442B TW 100119564 A TW100119564 A TW 100119564A TW 100119564 A TW100119564 A TW 100119564A TW I500442 B TWI500442 B TW I500442B
Authority
TW
Taiwan
Prior art keywords
plate
crucible
waste liquid
restriction
water tank
Prior art date
Application number
TW100119564A
Other languages
English (en)
Chinese (zh)
Other versions
TW201208753A (en
Inventor
Hirotaka Ishiguro
Miki Yoshida
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of TW201208753A publication Critical patent/TW201208753A/zh
Application granted granted Critical
Publication of TWI500442B publication Critical patent/TWI500442B/zh

Links

Landscapes

  • Electrostatic Separation (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Water Treatment By Sorption (AREA)
TW100119564A 2010-07-20 2011-06-03 Separation device TWI500442B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010163279A JP5638300B2 (ja) 2010-07-20 2010-07-20 分離装置

Publications (2)

Publication Number Publication Date
TW201208753A TW201208753A (en) 2012-03-01
TWI500442B true TWI500442B (zh) 2015-09-21

Family

ID=45511731

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100119564A TWI500442B (zh) 2010-07-20 2011-06-03 Separation device

Country Status (3)

Country Link
JP (1) JP5638300B2 (ja)
CN (1) CN102335639B (ja)
TW (1) TWI500442B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012081385A (ja) * 2010-10-07 2012-04-26 Disco Corp 分離装置
JP5868150B2 (ja) * 2011-12-06 2016-02-24 株式会社ディスコ 廃液処理装置
JP6078236B2 (ja) * 2012-06-01 2017-02-08 株式会社ディスコ 加工廃液処理装置
JP6093566B2 (ja) * 2012-12-26 2017-03-08 株式会社ディスコ 廃液処理装置
JP6328978B2 (ja) * 2014-04-02 2018-05-23 株式会社ディスコ 廃液処理装置
JP2020510529A (ja) * 2017-03-14 2020-04-09 ナショナル・リサーチ・カウンシル・オブ・カナダNational Research Council Of Canada 相分離のための電気吸着キャビテーションデバイス及び方法
JP7245068B2 (ja) * 2019-02-15 2023-03-23 株式会社ディスコ 廃液処理装置
CN114950736A (zh) * 2022-02-25 2022-08-30 长沙理工大学 太阳能板清洗用静电吸附尘水分离装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5263177A (en) * 1975-11-19 1977-05-25 Shimizu Construction Co Ltd Method and apparatus for separating muddy water
JPH11253838A (ja) * 1998-03-10 1999-09-21 Ishikawajima Hanyoki Service Co Ltd シリコンウエハー製造工程における微粒混合液体の固液分離方法及び装置
TWI232127B (en) * 2003-03-26 2005-05-11 Sanyo Electric Co Water treating apparatus and water treating method using such apparatus
WO2008048656A2 (en) * 2006-10-18 2008-04-24 Kinetico Incorporated Electroregeneration apparatus and water treatment method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4372837A (en) * 1979-10-16 1983-02-08 Petrolite Corporation Radial flow electrofilter
US6126803A (en) * 1998-10-19 2000-10-03 Dow Corning Corporation Method for removing particulate from a liquid silicon containing compound
JP3076839B2 (ja) * 1999-01-20 2000-08-14 工業技術院長 分散液中の微粒子の分離方法、微粒子の分級方法及び微粒子の吸着力測定方法、並びにそれらの方法の実施のための装置
NO20014148A (no) * 2001-08-27 2003-02-03 Elkem As Fremgangsmåte for fjerning av forurensinger fra silisiuminneholdende residuer
US6433205B1 (en) * 2002-01-15 2002-08-13 Dow Corning Corporation Magnetic separation for silicon-containing materials
JP4668830B2 (ja) * 2005-12-22 2011-04-13 株式会社ブンリ ダーティー液処理装置
JP2007283248A (ja) * 2006-04-19 2007-11-01 Sharp Corp 分離回収装置および分離回収方法
JP2008115040A (ja) * 2006-11-02 2008-05-22 Sharp Corp シリコン再生装置、シリコン再生方法
JP5459943B2 (ja) * 2007-08-29 2014-04-02 株式会社ブンリ 濾過装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5263177A (en) * 1975-11-19 1977-05-25 Shimizu Construction Co Ltd Method and apparatus for separating muddy water
JPH11253838A (ja) * 1998-03-10 1999-09-21 Ishikawajima Hanyoki Service Co Ltd シリコンウエハー製造工程における微粒混合液体の固液分離方法及び装置
TWI232127B (en) * 2003-03-26 2005-05-11 Sanyo Electric Co Water treating apparatus and water treating method using such apparatus
WO2008048656A2 (en) * 2006-10-18 2008-04-24 Kinetico Incorporated Electroregeneration apparatus and water treatment method

Also Published As

Publication number Publication date
CN102335639A (zh) 2012-02-01
JP2012024661A (ja) 2012-02-09
TW201208753A (en) 2012-03-01
CN102335639B (zh) 2015-11-18
JP5638300B2 (ja) 2014-12-10

Similar Documents

Publication Publication Date Title
TWI500442B (zh) Separation device
JP5868150B2 (ja) 廃液処理装置
JP4854224B2 (ja) 混合流体分離装置及びその方法
US20120261339A1 (en) Recycling method and device for recycling waste water containing slurry from a semi-conductor treatment process, in particular from a chemico-mechanical polishing process
JP2009535191A (ja) 吸収剤の電気化学的再生装置
KR20010071479A (ko) 화학적 및 기계적 평탄화에 사용된 물 및 슬러리 연마재의회수 방법 및 장치
US10493384B2 (en) Filtration system
JP2009023061A (ja) 金属イオン成分の除去・低減方法及び装置
TWI613004B (zh) 冷卻劑再生裝置及冷卻劑再生方法
US9795903B2 (en) Industrial filtration apparatus
TWI537219B (zh) 回收碳化矽粒子的非化學方法與系統
JP6328978B2 (ja) 廃液処理装置
JP2541525B2 (ja) 半導体基板処理装置
JP2010082791A (ja) 加工廃液処理装置のフィルターユニット
JP2013123781A (ja) 加工廃液処理装置
US7959816B2 (en) Wet-processing apparatus and method of fabricating display panel
JP4346447B2 (ja) クーラント濾過装置
JP3932455B2 (ja) 微粒子分離処理システム
JP3546360B2 (ja) 有機溶剤分離装置
JP2003340458A (ja) 機能水の回収方法
JPWO2015005392A1 (ja) 水に混入した放射性物質を水から除去する方法
TWI826319B (zh) 高濃度污染土壤深度清洗技術
JP2009061559A (ja) 廃液処理方法およびその装置
JP6206708B2 (ja) クーラント清浄装置
JPH10165716A (ja) 流動層濾過器