TWI431049B - 使用具有難燃性之反應性化合物的活性能量線硬化型樹脂組成物及其硬化物 - Google Patents

使用具有難燃性之反應性化合物的活性能量線硬化型樹脂組成物及其硬化物 Download PDF

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Publication number
TWI431049B
TWI431049B TW098105225A TW98105225A TWI431049B TW I431049 B TWI431049 B TW I431049B TW 098105225 A TW098105225 A TW 098105225A TW 98105225 A TW98105225 A TW 98105225A TW I431049 B TWI431049 B TW I431049B
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TW
Taiwan
Prior art keywords
active energy
energy ray
resin composition
curable resin
meth
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TW098105225A
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English (en)
Chinese (zh)
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TW200946579A (en
Inventor
Kazuyoshi Yamamoto
Toru Kurihashi
Kouji Isobe
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Nippon Kayaku Kk
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Publication of TW200946579A publication Critical patent/TW200946579A/zh
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Publication of TWI431049B publication Critical patent/TWI431049B/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • C08K5/51Phosphorus bound to oxygen
    • C08K5/53Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5397Phosphine oxides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/062Copolymers with monomers not covered by C08L33/06
    • C08L33/068Copolymers with monomers not covered by C08L33/06 containing glycidyl groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10Homopolymers or copolymers of methacrylic acid esters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00Properties
    • C08L2201/02Flame or fire retardant/resistant
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/10Materials in mouldable or extrudable form for sealing or packing joints or covers
    • C09K2003/1034Materials or components characterised by specific properties
    • C09K2003/1062UV-curable materials

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
TW098105225A 2008-03-18 2009-02-19 使用具有難燃性之反應性化合物的活性能量線硬化型樹脂組成物及其硬化物 TWI431049B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008068909 2008-03-18

Publications (2)

Publication Number Publication Date
TW200946579A TW200946579A (en) 2009-11-16
TWI431049B true TWI431049B (zh) 2014-03-21

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TW098105225A TWI431049B (zh) 2008-03-18 2009-02-19 使用具有難燃性之反應性化合物的活性能量線硬化型樹脂組成物及其硬化物

Country Status (4)

Country Link
JP (1) JP5384149B2 (ja)
KR (1) KR101422085B1 (ja)
CN (1) CN101538348B (ja)
TW (1) TWI431049B (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5291488B2 (ja) * 2009-02-18 2013-09-18 京セラケミカル株式会社 感光性熱硬化型樹脂組成物、およびフレキシブルプリント配線板
JP5439988B2 (ja) * 2009-07-08 2014-03-12 Jsr株式会社 感放射線性樹脂組成物、感放射線性カバーレイおよびフレキシブルプリント配線板
WO2011083554A1 (ja) * 2010-01-05 2011-07-14 日本化薬株式会社 ホスフィンオキサイドを含むポリアミド又はポリイミド樹脂組成物並びにその硬化物
WO2011126066A1 (ja) * 2010-04-09 2011-10-13 日本化薬株式会社 光学レンズシート用エネルギー線硬化型樹脂組成物及びその硬化物
JP5654259B2 (ja) * 2010-05-11 2015-01-14 株式会社カネカ 新規な感光性樹脂組成物及びその利用
JP5764368B2 (ja) * 2011-04-05 2015-08-19 株式会社カネカ 新規な感光性樹脂組成物及びその利用
JP2012247560A (ja) * 2011-05-26 2012-12-13 Kyocera Chemical Corp アルカリ現像型の感光性樹脂組成物、並びにこれを用いた感光性フィルム及びレジスト
KR101447456B1 (ko) * 2011-12-28 2014-10-06 제일모직주식회사 포스피네이트계 난연제의 제조방법
TWI457353B (zh) * 2012-05-08 2014-10-21 Ind Tech Res Inst 高分子、高分子混摻物、與阻燃材料
JP6123547B2 (ja) * 2013-07-26 2017-05-10 日立化成株式会社 回路接続材料、回路接続構造体、回路接続構造体の製造方法、接着剤組成物、及び接着剤シート
KR101692003B1 (ko) * 2013-12-24 2017-01-03 코오롱인더스트리 주식회사 드라이 필름 포토 레지스트용 감광성 수지 조성물
JP6802799B2 (ja) * 2015-09-30 2020-12-23 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルムおよびそれを用いたプリント配線板
JP6224188B1 (ja) * 2016-08-08 2017-11-01 太陽インキ製造株式会社 半導体封止材
CN108912174B (zh) * 2018-06-22 2021-02-09 四川东材科技集团股份有限公司 一种阻燃双烷环型多元醇树脂及其制备方法
JP7131984B2 (ja) 2018-06-27 2022-09-06 キオクシア株式会社 パターン形成材料、パターン形成方法および半導体装置の製造方法
CN108929524A (zh) * 2018-09-05 2018-12-04 贵州省材料产业技术研究院 一种反应增容阻燃聚酯材料及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2558467C3 (de) * 1975-12-23 1978-06-22 Dynamit Nobel Ag, 5210 Troisdorf Kunststoff-Formmasse, insbesondere auf PVC-Basis, mit vermindertem Plate-out Effekt
JP3454544B2 (ja) * 1993-08-02 2003-10-06 日本化薬株式会社 (メタ)アクリル酸エステル、その製造方法、それを用いた硬化性樹脂組成物およびその硬化物
JP4066335B2 (ja) 2002-10-24 2008-03-26 株式会社カネカ 有機リン組成物およびそれを含有する難燃剤、難燃性樹脂組成物

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Publication number Publication date
JP2009256622A (ja) 2009-11-05
KR101422085B1 (ko) 2014-07-23
JP5384149B2 (ja) 2014-01-08
KR20090100258A (ko) 2009-09-23
CN101538348B (zh) 2012-11-07
TW200946579A (en) 2009-11-16
CN101538348A (zh) 2009-09-23

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