TWI421235B - 新穎之藉光產生酸劑及使用其之光阻材料及圖型之形成方法 - Google Patents
新穎之藉光產生酸劑及使用其之光阻材料及圖型之形成方法 Download PDFInfo
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- TWI421235B TWI421235B TW096136322A TW96136322A TWI421235B TW I421235 B TWI421235 B TW I421235B TW 096136322 A TW096136322 A TW 096136322A TW 96136322 A TW96136322 A TW 96136322A TW I421235 B TWI421235 B TW I421235B
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- ADBIXYANGWRBQE-UHFFFAOYSA-N adamantane methoxycarbonyl difluoromethanesulfonate Chemical compound FC(S(=O)(=O)OC(=O)OC)F.C12CC3CC(CC(C1)C3)C2 ADBIXYANGWRBQE-UHFFFAOYSA-N 0.000 description 14
- 239000007864 aqueous solution Substances 0.000 description 14
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 14
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- GAHLDCFJILJGKK-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-1,2-diphenylhydrazine Chemical compound C1=CC(C(C)(C)C)=CC=C1N(C=1C=CC=CC=1)NC1=CC=CC=C1 GAHLDCFJILJGKK-UHFFFAOYSA-N 0.000 description 13
- PUKFLHPSERHMCY-UHFFFAOYSA-N 1,1,3,3,3-pentafluoro-2-hydroxypropane-1-sulfonic acid Chemical group FC(F)(F)C(O)C(F)(F)S(O)(=O)=O PUKFLHPSERHMCY-UHFFFAOYSA-N 0.000 description 12
- QQMYPHGEZLNMAJ-UHFFFAOYSA-N 2-(cyclohexanecarbonyloxy)-1,1,3,3,3-pentafluoropropane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(C(F)(F)F)OC(=O)C1CCCCC1 QQMYPHGEZLNMAJ-UHFFFAOYSA-N 0.000 description 12
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- YDOPMIAANRCTID-UHFFFAOYSA-N 2-(adamantane-1-carbonyloxy)-1,1,3,3,3-pentafluoropropane-1-sulfonic acid Chemical compound C1C(C2)CC3CC2CC1(C(=O)OC(C(F)(F)S(=O)(=O)O)C(F)(F)F)C3 YDOPMIAANRCTID-UHFFFAOYSA-N 0.000 description 8
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- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- DYFFAVRFJWYYQO-UHFFFAOYSA-N n-methyl-n-phenylaniline Chemical compound C=1C=CC=CC=1N(C)C1=CC=CC=C1 DYFFAVRFJWYYQO-UHFFFAOYSA-N 0.000 description 1
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- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
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- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
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- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- NIRBLAKHONNXRC-UHFFFAOYSA-N oxolan-2-ylmethyl 3-[bis(2-hydroxyethyl)amino]propanoate Chemical compound OCCN(CCO)CCC(=O)OCC1CCCO1 NIRBLAKHONNXRC-UHFFFAOYSA-N 0.000 description 1
- NHMSEQJTGVEMKN-UHFFFAOYSA-N oxolan-2-ylmethyl 3-morpholin-4-ylpropanoate Chemical compound C1CCOC1COC(=O)CCN1CCOCC1 NHMSEQJTGVEMKN-UHFFFAOYSA-N 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- GTLACDSXYULKMZ-UHFFFAOYSA-N pentafluoroethane Chemical compound FC(F)C(F)(F)F GTLACDSXYULKMZ-UHFFFAOYSA-N 0.000 description 1
- 229960004448 pentamidine Drugs 0.000 description 1
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- QZHDEAJFRJCDMF-UHFFFAOYSA-N perfluorohexanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F QZHDEAJFRJCDMF-UHFFFAOYSA-N 0.000 description 1
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- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
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- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
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- 125000001042 pteridinyl group Chemical class N1=C(N=CC2=NC=CN=C12)* 0.000 description 1
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- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 description 1
- 125000005554 pyridyloxy group Chemical group 0.000 description 1
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- YDVMDJMNQSRVIH-UHFFFAOYSA-N pyrrolidine-2,5-dione Chemical compound O=C1CCC(=O)N1.O=C1CCC(=O)N1 YDVMDJMNQSRVIH-UHFFFAOYSA-N 0.000 description 1
- 150000003235 pyrrolidines Chemical class 0.000 description 1
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- 125000002294 quinazolinyl group Chemical class N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
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- 238000001953 recrystallisation Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
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- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 229940035044 sorbitan monolaurate Drugs 0.000 description 1
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- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
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- 150000003460 sulfonic acids Chemical group 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- AIAWOMHTIRNUFX-UHFFFAOYSA-N tert-butyl 2-[2-[bis[2-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethoxy]ethyl]amino]ethoxy]acetate Chemical compound CC(C)(C)OC(=O)COCCN(CCOCC(=O)OC(C)(C)C)CCOCC(=O)OC(C)(C)C AIAWOMHTIRNUFX-UHFFFAOYSA-N 0.000 description 1
- MGFBHDYKJMJWOT-UHFFFAOYSA-N tert-butyl 2-[4-(N-anilinoanilino)phenoxy]acetate Chemical compound C(C)(C)(C)OC(=O)COC1=CC=C(C=C1)N(NC1=CC=CC=C1)C1=CC=CC=C1 MGFBHDYKJMJWOT-UHFFFAOYSA-N 0.000 description 1
- ONOMKCVPQZWEPH-UHFFFAOYSA-N tert-butyl 2-[4-[2,2-bis[4-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethoxy]phenyl]ethyl]phenoxy]acetate Chemical compound C1=CC(OCC(=O)OC(C)(C)C)=CC=C1CC(C=1C=CC(OCC(=O)OC(C)(C)C)=CC=1)C1=CC=C(OCC(=O)OC(C)(C)C)C=C1 ONOMKCVPQZWEPH-UHFFFAOYSA-N 0.000 description 1
- CQRKSIMXRJROQA-UHFFFAOYSA-N tert-butyl 2-[4-[2-[4-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethoxy]phenyl]propan-2-yl]phenoxy]acetate Chemical compound C1=CC(OCC(=O)OC(C)(C)C)=CC=C1C(C)(C)C1=CC=C(OCC(=O)OC(C)(C)C)C=C1 CQRKSIMXRJROQA-UHFFFAOYSA-N 0.000 description 1
- YEOMHINWERQWTE-UHFFFAOYSA-N tert-butyl 2-[4-[3,4-bis[4-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethoxy]phenyl]anthracen-2-yl]phenoxy]acetate Chemical compound C(C)(C)(C)OC(=O)COC1=CC=C(C=C1)C=1C(=C(C2=CC3=CC=CC=C3C=C2C=1)C1=CC=C(C=C1)OCC(=O)OC(C)(C)C)C1=CC=C(C=C1)OCC(=O)OC(C)(C)C YEOMHINWERQWTE-UHFFFAOYSA-N 0.000 description 1
- PTSAQPIPJAFBDO-UHFFFAOYSA-N tert-butyl 2-[ethyl-[2-[(2-methylpropan-2-yl)oxycarbonyloxy]ethyl]amino]ethyl carbonate Chemical compound CC(C)(C)OC(=O)OCCN(CC)CCOC(=O)OC(C)(C)C PTSAQPIPJAFBDO-UHFFFAOYSA-N 0.000 description 1
- XULQYKHYHOXCJI-UHFFFAOYSA-N tert-butyl 2-piperidin-1-ylethyl carbonate Chemical compound CC(C)(C)OC(=O)OCCN1CCCCC1 XULQYKHYHOXCJI-UHFFFAOYSA-N 0.000 description 1
- PBVOCQZCRVMWPF-UHFFFAOYSA-N tert-butyl 4,4-bis[4-(1-ethoxyethoxy)phenyl]pentanoate Chemical compound C1=CC(OC(C)OCC)=CC=C1C(C)(CCC(=O)OC(C)(C)C)C1=CC=C(OC(C)OCC)C=C1 PBVOCQZCRVMWPF-UHFFFAOYSA-N 0.000 description 1
- AREFMLYKPYFFOQ-UHFFFAOYSA-N tert-butyl 4,4-bis[4-(1-ethoxypropoxy)phenyl]pentanoate Chemical compound C1=CC(OC(CC)OCC)=CC=C1C(C)(CCC(=O)OC(C)(C)C)C1=CC=C(OC(CC)OCC)C=C1 AREFMLYKPYFFOQ-UHFFFAOYSA-N 0.000 description 1
- DBAPPZGLSIVHGY-UHFFFAOYSA-N tert-butyl 4,4-bis[4-[(2-methylpropan-2-yl)oxycarbonyloxy]phenyl]pentanoate Chemical compound C=1C=C(OC(=O)OC(C)(C)C)C=CC=1C(C)(CCC(=O)OC(C)(C)C)C1=CC=C(OC(=O)OC(C)(C)C)C=C1 DBAPPZGLSIVHGY-UHFFFAOYSA-N 0.000 description 1
- AKJRRBTZNZTZKN-UHFFFAOYSA-N tert-butyl 9h-fluorene-9-carboxylate Chemical compound C1=CC=C2C(C(=O)OC(C)(C)C)C3=CC=CC=C3C2=C1 AKJRRBTZNZTZKN-UHFFFAOYSA-N 0.000 description 1
- ZEVANMMQFKWNLQ-UHFFFAOYSA-N tert-butyl [4-[2-[4-[(2-methylpropan-2-yl)oxycarbonyloxy]phenyl]propan-2-yl]phenyl] carbonate Chemical compound C1=CC(OC(=O)OC(C)(C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)OC(C)(C)C)C=C1 ZEVANMMQFKWNLQ-UHFFFAOYSA-N 0.000 description 1
- CROWJIMGVQLMPG-UHFFFAOYSA-N tert-butyl benzimidazole-1-carboxylate Chemical compound C1=CC=C2N(C(=O)OC(C)(C)C)C=NC2=C1 CROWJIMGVQLMPG-UHFFFAOYSA-N 0.000 description 1
- WIURVMHVEPTKHB-UHFFFAOYSA-N tert-butyl n,n-dicyclohexylcarbamate Chemical compound C1CCCCC1N(C(=O)OC(C)(C)C)C1CCCCC1 WIURVMHVEPTKHB-UHFFFAOYSA-N 0.000 description 1
- SCSLUABEVMLYEA-UHFFFAOYSA-N tert-butyl pentanoate Chemical compound CCCCC(=O)OC(C)(C)C SCSLUABEVMLYEA-UHFFFAOYSA-N 0.000 description 1
- 229960002180 tetracycline Drugs 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical compound C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007979 thiazole derivatives Chemical class 0.000 description 1
- HNKJADCVZUBCPG-UHFFFAOYSA-N thioanisole Chemical compound CSC1=CC=CC=C1 HNKJADCVZUBCPG-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 125000002827 triflate group Chemical group FC(S(=O)(=O)O*)(F)F 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical class OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- AVCVDUDESCZFHJ-UHFFFAOYSA-N triphenylphosphane;hydrochloride Chemical compound [Cl-].C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 AVCVDUDESCZFHJ-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- MILOMCIWZLGIEE-UHFFFAOYSA-N tris(4-methylphenyl)phosphane;hydrochloride Chemical compound [Cl-].C1=CC(C)=CC=C1[PH+](C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 MILOMCIWZLGIEE-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-O tris(4-methylphenyl)phosphanium Chemical compound C1=CC(C)=CC=C1[PH+](C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-O 0.000 description 1
- UQHFPPSBVOIUFM-UHFFFAOYSA-N tris(4-tert-butylphenyl)phosphane Chemical compound C1=CC(C(C)(C)C)=CC=C1P(C=1C=CC(=CC=1)C(C)(C)C)C1=CC=C(C(C)(C)C)C=C1 UQHFPPSBVOIUFM-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-M valerate Chemical compound CCCCC([O-])=O NQPDZGIKBAWPEJ-UHFFFAOYSA-M 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/46—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings substituted on the ring sulfur atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C309/07—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton
- C07C309/12—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing esterified hydroxy groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
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Description
本發明係關於可適用於光阻材料之光酸產生劑等之新穎光酸產生劑及使用其之光阻材料及圖型之形成方法。
近年,隨著LSI之高集積化及高速度化,在尋求圖型尺度精細化的過程中,遠紫外線微影蝕刻及真空紫外線微影蝕刻可望成為下一世代之精細加工技術。其中又以ArF準分子雷射光為光源之光微影蝕刻係0.13μm以下之超精細加工所不可或缺的技術。
ArF微影係從130nm node之裝置製作開始局部使用,然後從90nm node裝置開始成為主要的微影技術。其次當初使用F2
雷射之157nm微影可望成為下一個45nm node之微影技術,但是因各種問題造成開發延遲,因此在投影透鏡與晶圓之間插入水、乙二醇、甘油等折射率高於空氣之液體,投影透鏡之開口數(NA)可設計為1.0以上,可達成高解像度之ArF微影受矚目(參照例如非專利文獻1:Journal of Photopolymer Science and Technology Vol.17,No.4,p587(2004))。
ArF微影係精密且為了防止昂貴之光學系材料劣化,而要求在較少曝光量下可發揮充分之解像性之高感度的光阻材料,為了實現此構想,其對策,最平常是選擇波長193nm下為高透明性之各成份。例如基底樹脂係提案聚丙烯酸及其衍生物、降冰片烯-馬來酸酐交互聚合物、聚降冰片烯及開環複分解聚合物、開環複分解聚合物氫化物等,在提高樹脂單體之透明性而言,可得到某種程度的效果。
對於光酸產生劑也進行種種檢討。以往用於以KrF準分子雷射光為光源之化學增幅型光阻材料之產生烷或芳烴磺酸之光酸產生劑,作為上述ArF化學增幅型光阻材料之成份使用時,得知切斷樹脂之酸不穩定基之酸強度不足,完全無法解像,或低感度,不適合製造裝置。
因此,ArF化學增幅型光阻材料之光酸產生劑一般使用產生酸強度高之全氟烷磺酸者。這些產生全氟烷磺酸之光酸產生劑係已經作為KrF光阻材料被開發,例如有專利文獻1:日本特開2000-122296號公報或專利文獻2:日本特開平11-282168號公報中記載產生全氟己烷磺酸、全氟辛烷磺酸、全氟-4-乙基環己烷磺酸、全氟丁烷磺酸的光酸產生劑。另外,新穎之酸產生劑例如專利文獻3~5:日本特開2002-214774號公報、日本特開2003-140332號公報、美國專利公開公報第2002/0197558號說明書中提案產生全氟烷基醚磺酸的酸產生劑。
全氟辛烷磺酸或其衍生物係取其前字母而成為PFOS為人所知,其中來自C-F鍵之安定性(非分解性)或來自疏水性、親油性之生態濃縮性、蓄積性已造成問題。美國環保署(EPA)在最重要新穎利用規則(Significant New Use Rule)中制定PFOS相關之13物質,同樣對於75種物質在光阻領域之利用也制定免除項目。另外對於全氟烷磺酸,或其衍生物之183均質也提案適用最重要最新穎利用規則。
為了解決這種PFOS之相關問題,各公司開發降低氟取代率之部份氟取代烷基磺酸。例如專利文獻6:日本特表2004-531749號公報中揭示α,α-二氟烯與硫化合物而開發α,α-二氟烷磺酸鹽,藉由曝光產生此磺酸之光酸產生劑,具體而言,含有二(4-第三丁基苯基)碘鎓=1,1-二氟-2-(1-萘基)乙烷磺酸鹽的光阻材料,專利文獻7:日本特開2004-2252號公報中揭示α,α,β,β-四氟-α-碘烷與硫化合物開發α,α,β,β-四氟烷磺酸鹽及產生此磺酸之光酸產生劑及光阻材料。專利文獻3:日本特開2002-214774號公報中雖無記載合成方法,但是說明書中揭示具有二氟磺基乙酸烷酯(1-(烷氧基羰基)-1,1-二氟甲烷磺酸鹽)、二氟磺基乙酸醯胺(1-胺基甲醯基-1,1-二氟甲烷磺酸鹽)等之光酸產生劑,專利文獻8:日本特開2005-266766號公報揭示含有:具有由全氟伸烷基二磺醯基二氟化物所衍生之磺醯基醯胺結構,產生部份氟化烷磺酸之化合物的感光性組成物。
雖然上述專利文獻之物質皆降低氟取代率,但是基本骨架係不具有不易分解之烴骨架,而且不具有酯基等容易分解之取代基,因此缺乏分解性,使烷磺酸之大小變化之分子設計受限,也具有含氟之起始物質昂貴等問題。
浸液曝光中,因曝光後之光阻晶圓上微小水滴殘留之缺陷造成光阻圖型不良,顯像後之光阻圖型產生崩壞,或形成T-top形狀等問題,因此,對於浸液微影,也要求可得到顯像後良好之光阻圖型之圖型的形成方法。
形成微細圖型時,光學對比不同之疏的圖型、密之圖型之尺寸差(疏密依存性)的問題嚴重。疏密依存性之改良時,使用產生低擴散性之酸的光酸產生劑等可達到某程度的目的,但是仍不能滿足。圖型規格要求更微細時,除了在感度、基板密著性、蝕刻耐性方面發揮優異的性能,且要求解像性不可劣化,根本改良疏密依存性。
〔專利文獻1〕特開2000-122296號公報〔專利文獻2〕特開平11-282168號公報〔專利文獻3〕特開2002-214774號公報〔專利文獻4〕特開2003-140332號公報〔專利文獻5〕美國專利申請公開第2002/0197558號明細書〔專利文獻6〕特表2004-531749號公報〔專利文獻7〕特開2004-2252號公報〔專利文獻7〕特開2005-266766號公報
〔非專利文獻1〕Journal of photopolymer Science and Technology Vol.17,No.4,p587(2004)
光酸產生劑之產生酸較佳為具有切斷光阻材料中之酸不穩定基所需之充分的酸強度,光阻材料中保存性良好,在光阻材料中具有適度的擴散,揮發性較少,對水之溶離較少,顯像後,剝離後之異物較少,微影用途結束後,不會對環境造成負擔,具有良好的分解性等,但是以往之光酸產生劑所產生的酸無法滿足這些條件。
使用以往之光酸產生劑之光阻材料無法解決解像性之劣化、疏密依存度、線邊緣粗糙度的問題。
本發明係解決上述以往之光酸產生劑的問題點者,特別是可抑制ArF液浸曝光時溶離至水中,且可抑制液浸曝光時產生特有的異物,可有效滿足疏密依存度、線邊緣粗糙度的問題等,本發明之目的係提供適合作為光阻材料之光酸產生劑之新穎光酸產生劑,使用其之光阻材料及圖型之形成方法。
本發明人等精心檢討上述問題,結果發現以工業上易取得之1,1,1,3,3,3-六氟-2-丙醇為出發原料,具有羰基、羧基或羧酸酯或內酯結構之1,1,3,3,3-五氟丙烯-2-醯氧基丙烷-1-磺酸鹽或具有1,1,3,3,3-五氟-2-芳基羰氧基丙烷-1-磺酸鹽之鎓鹽、肟、醯亞胺所代表之化合物可作為化學增幅型光阻材料用之光酸產生劑,遂完成本發明。
換言之,本發明係提供下述新穎光酸產生劑及其使用其之光阻材料及圖型之形成方法。
申請專利範圍第1項:一種化學增幅型光阻材料用之光酸產生劑,其特徵係感應紫外線、遠紫外線、電子線、EUV、X射線、準分子雷射、γ射線或同步加速放射線之高能量線,產生下述通式(1a)所示之磺酸者。
RC(=O)R1
-COOCH(CF3
)CF2
SO3 -
H+
(1a)
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造)。
申請專利範圍第2項:一種鋶鹽,其特徵係以下述通式(2)表示,RC(=O)-R1
-COOCH(CF3
)CF2
SO3 -
R2
R3
R4
S+
(2)
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。R2
、R3
及R4
係互相獨立表示取代或非取代之碳數1~10之直鏈狀、支鏈狀或環狀之烷基、烯基或氧代烷基、或取代或非取代之碳數6~18之芳基、芳烷基或芳氧烷基,或R2
、R3
及R4
之中任2個以上互相鍵結,可與式中之硫原子共同形成環)。
申請專利範圍第3項:一種鋶鹽,其特徵係以下述通式(2a)表示,RC(=O)-R1
-COOCH(CF3
)CF2
SO3 -
(R5
(O)n
)m
Ph’S+Ph2
(2a)
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。R5
係表示取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基或烯基、或取代或非取代之碳數6~14之芳基。m係表示1~5之整數,n係表示0(零)或1。Ph係表示苯基。Ph’係表示苯基之氫原子m個取代成R5
(O)n
-基之基)。
申請專利範圍第4項:一種碘鎓鹽,其特徵係以下述通式(2b)表示,RC(=O)-R1
-COOCH(CF3
)CF2
SO3 -
((R5
(O)n
)m
Ph’)2
I+
(2b)
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。R5
係表示取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基或烯基、或取代或非取代之碳數6~14之芳基。m係表示1~5之整數,n係表示0(零)或1。Ph’係表示苯基之氫原子m個取代成R5
(O)n
-基之基)。
申請專利範圍第5項:一種N-碘醯氧基醯亞胺化合物,其特徵係以下述通式(3a)表示,
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。X、Y係彼此獨立表示氫原子或取代或非取代之碳數1~6之烷基,或X及Y彼此鍵結可與這些鍵結之碳原子共同形成飽和或不飽和之碳數6~12之環。Z係表示單鍵、雙鍵、伸甲基或氧原子)。
申請專利範圍第6項:一種肟磺酸鹽化合物,其特徵係下述通式(3b)表示,
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。q表示0或1,但是q為0時,p表示取代或非取代之碳數1~20之烷基、或取代或非取代之碳數6~15之芳基,q為1時,p表示單鍵、取代或非取代之碳數1~20之伸烷基、或取代或非取代之碳數6~15之伸芳基。EWG為氰基、三氟甲基、全氟乙基、全氟丙基、5H-全氟戊基、6H-全氟己基、硝基或甲基,q為1時,彼此之EWG相互鍵結,可與其鍵結之碳原子共同形成碳數6的環)。
申請專利範圍第7項:一種光阻材料,其係由含有基底樹脂、酸產生劑及有機溶劑所構成之光阻材料,其特徵為該酸產生劑為產生申請專利範圍第1項之式(1a)表示之磺酸的光酸產生劑。
申請專利範圍第8項:如申請專利範圍第7項之光阻材料,其中基底樹脂為選自聚(甲基)丙烯酸及其衍生物、環烯烴衍生物-馬來酸酐交互聚合物、環烯烴衍生物與馬來酸酐與聚丙烯酸或其衍生物之3或4元以上的共聚物、環烯烴衍生物-α-三氟甲基丙烯酸衍生物共聚物、聚降冰片烯、開環複分解聚合物及開環複分解聚合物氫化物之一種或兩種以上的高分子聚合物。
申請專利範圍第9項:如申請專利範圍第7項之光阻材料,其中基底樹脂為含有矽原子之高分子結構體。
申請專利範圍第10項:如申請專利範圍第7項之光阻材料,其中基底樹脂為含有氟原子之高分子結構體。
申請專利範圍第11項:一種化學增幅正型光阻材料,其特徵係含有:申請專利範圍第8、9或10項之基底樹脂、產生申請專利範圍第1項之通式(1a)表示之磺酸的光酸產生劑及溶劑,該基底樹脂為不溶或難溶於顯像液,藉由酸之作用成為可溶於顯像液。
申請專利範圍第12項:如申請專利範圍第11項之化學增幅正型光阻材料,其係再添加抑制劑所成。
申請專利範圍第13項:如申請專利範圍第11或12項之化學增幅正型光阻材料,其係尚含有溶解阻止劑。
申請專利範圍第14項:一種圖型之形成方法,其特徵係包含:將申請專利範圍第7~13項中任一項之光阻材料塗佈於基板上的步驟;加熱處理後,介由光罩以波長300nm以下之高能量線進行曝光的步驟;必要時,於加熱處理後,使用顯像液進行顯像的步驟。
申請專利範圍第15項:如申請專利範圍第14項之圖型之形成方法,其係使用波長193nm之ArF準分子雷射,在塗佈光阻材料之基板與投影透鏡之間插入水、甘油、乙二醇等液體的液浸微影法。
本發明之光酸產生劑係因磺酸鹽上除了β位之醯氧基或芳基碳氧基外,尚具有羰基、羧基或羧酸酯結構或內酯結構,因此與光阻材料中之樹脂類的相溶性佳,可抑制酸擴散。這些產生磺酸之光酸產生劑可使用於裝置製作步驟之塗佈、曝光前燒結、曝光、曝光後燒結、顯像步驟。不僅可抑制ArF液浸曝光時溶離至水中,且晶圓上殘留之水的影響較少,可抑制缺陷。裝置製作後之光阻廢液處理時,β位之醯氧基或芳基碳氧基可被鹼水解,因此可轉變成低分子量之低蓄積性的化合物,且燃燒廢棄時,氟取代率低,因此燃燒性高。
本發明之光酸產生劑係鋶鹽、碘鎓鹽、肟磺酸鹽、磺醯氧基醯亞胺所代表之化合物,這些可感應紫外線、遠紫外線、電子線、EUV、X射線、準分子雷射、γ射線或同步加速放射線之高能量線,產生下述通式(1a)所示之磺酸者,可用於化學增幅型光阻材料用之光酸產生劑者。
RC(=O)R1
-COOCH(CF3
)CF2
SO3 -
H+
(1a)
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基,R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造)。
上述式(1a)之R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。上述R之取代基例如有羥基、烷氧基、芳氧基、氟原子、氯原子、溴原子、碘原子、羧基、烷氧羰基、醯胺基、羰基、醚鍵性氧原子等。此時R為烷基時,其氫原子之一個以上可被芳基取代,R為芳基時,其氫原子之一個以上可被烷基取代。
更具體而言,R例如有羥基、甲基、乙基、正丙基、異丙基、環丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、環戊基、正己基、環己基、正辛基、正癸基、正十二烷基、1-金剛烷基、2-金剛烷基、雙環〔2.2.1〕庚烯-2-基、1-金剛烷基甲基、2-金剛烷基甲基、苯基、4-甲氧基苯基、4-第三丁基苯基、4-聯苯基、1-萘基、2-萘基、10-蒽基、2-呋喃基、甲氧基、乙氧基、正丙氧基、異丙氧基、環丙氧基、正丁氧基、第二丁氧基、異丁氧基、第三丁氧基、正戊氧基、環戊氧基、正己氧基、環己氧基、正辛氧基、正癸氧基、正十二烷氧基、1-金剛烷氧基、2-金剛烷氧基、雙環〔2.2.1〕庚烯-2-氧基、1-金剛烷甲氧基、2-金剛烷甲氧基、苯氧基、4-甲氧基苯氧基、4-第三丁基苯氧基、4-聯苯氧基、1-萘氧基、2-萘氧基、10-蒽氧基、2-呋喃氧基、2,2,2-三氟乙氧基、1,1,1,3,3,3-六氟-2-丙氧基、2,2,3,3-四氟丙氧基等。其中較佳者為羥基、甲氧基、環己氧基、1-金剛烷甲氧基。
R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。R1
之取代基例如有羥基、烷氧基、芳氧基、氟原子、氯原子、溴原子、碘原子、羧基、烷氧羰基、醯胺基、羰基、醚鍵性氧原子等。具體而言,R1
例如有伸甲基、伸乙基、1,3-伸丙基、1,2-伸丙基、異丙叉基、1,4-伸丁基、1,6-伸己基、鄰-伸苯基、間-伸苯基、對-伸苯基、及下述所示結構者。下述結構式中,鍵結位置係以點線表示。
其中較佳者為伸乙基、1,3-伸丙基及下述所示結構者。
上述R與R1
相互鍵結時,例如有下述所示結構者。
具體之磺酸如下所示。
本發明之鋶鹽係以下述通式(2)表示者。
RC(=O)-R1
-COOCH(CF3
)CF2
SO3 -
R2
R3
R4
S+
(2)
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基,R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造,R2
、R3
及R4
係互相獨立表示取代或非取代之碳數1~10之直鏈狀、支鏈狀或環狀之烷基、烯基或氧代烷基、或取代或非取代之碳數6~18之芳基、芳烷基或芳氧烷基,或R2
、R3
及R4
之中任2個以上互相鍵結,可與式中之硫原子共同形成環)。
上述通式(2)之R、R1
係與上述相同。R2
、R3
及R4
係互相獨立表示取代或非取代之碳數1~10之直鏈狀、支鏈狀或環狀之烷基、烯基或氧代烷基、或取代或非取代之碳數6~18之芳基、芳烷基或芳氧基,或R2
、R3
及R4
之中2個以上互相鍵結,可與式中之硫原子共同形成環。具體而言,烷基例如有甲基、乙基、丙基、異丙基、正丁基、第二丁基、第三丁基、戊基、己基、庚基、辛基、環戊基、環己基、環庚基、環丙基甲基、4-甲基環己基、環己基甲基、降冰片基、金剛烷基等。烯基例如有乙烯基、烯丙基、丙烯基、丁烯基、己烯基、環己烯基等。氧代烷基例如有2-氧代環戊基、2-氧代環己基、2-氧代丙基、2-氧代乙基、2-環戊基-2-氧代乙基、2-環己基-2-氧代乙基、2-(4-甲基環己基)-2-氧代乙基等。芳基例如有苯基、萘基、噻嗯基等或4-羥基苯基、4-甲氧基苯基、3-甲氧基苯基、2-甲氧基苯基、4-乙氧基苯基、4-第三丁氧基苯基、3-第三丁氧苯基等之烷氧基苯基;2-甲基苯基、3-甲基苯基、4-甲基苯基、4-乙基苯基、4-第三丁基苯基、4-正丁基苯基、2,4-二甲基苯基等之烷基苯基;甲基萘基、乙基萘基等之烷基萘基;甲氧基萘基、乙氧基萘基等之烷氧基萘基;二甲基萘基、二乙基萘基等之二烷基萘基;二甲氧基萘基、二乙氧基萘基等之二烷氧基萘基等。芳烷基例如有苄基、1-苯基乙基、2-苯乙基等。芳基氧代烷基例如有2-苯基-2-氧代乙基、2-(1-萘基)-2-氧代乙基、2-(2-萘基)-2-氧代乙基等2-芳基-2-氧代乙基等。R2
、R3
及R4
中任2個以上彼此鍵結,介於硫原子形成環時,形成這些環狀結構之基,例如有1,4-丁烯、3-氧雜-1,5-戊烯等二價有機基。取代基例如具有丙烯醯氧基、甲基丙烯醯氧基等可聚合之取代基的芳基,具體例有4-丙烯醯氧基苯基、4-甲基丙烯醯氧基苯基、4-丙烯醯氧基-3,5-二甲基苯基、4-甲基丙烯醯氧基-3,5-二甲基苯基、4-乙烯氧基苯基、4-乙烯基苯基等。
更具體而言,以鋶陽離子表示時,例如有三苯基鋶、4-羥苯基二苯基鋶、雙(4-羥苯基)苯基鋶、三(4-羥苯基)鋶、4-第三丁氧苯基二苯基鋶、雙(4-第三丁氧苯基)苯基鋶、三(4-第三丁氧苯基)鋶、3-第三丁氧苯基二苯基鋶、雙(3-第三丁氧苯基)苯基鋶、三(3-第三丁氧苯基)鋶、3,4-二第三丁氧苯基二苯基鋶、雙(3,4-二第三丁氧苯基)苯基鋶、三(3,4-二第三丁氧苯基)苯基鋶、二苯基(4-硫苯氧基苯基)鋶、4-第三丁氧羰基甲氧基苯基二苯基鋶、三(4-第三丁氧羰基甲氧基苯基)鋶、(4-第三丁氧苯基)雙(4-二甲基胺苯基)鋶、三(4-二甲基胺苯基)鋶、2-萘基二苯基鋶、(4-羥苯-3,5-二甲基苯基)二苯基鋶、(4-正丁氧基-3,5-二甲基苯基)二苯基鋶、二甲基(2-萘基)鋶、4-羥苯基二甲基鋶、4-甲氧苯基二甲基鋶、三甲基鋶、2-氧代環己基環己甲基鋶、三萘基鋶、三苄基鋶、二苯基甲基鋶、二甲基苯基鋶、2-氧代-2-苯基乙基噻環戊鋶、二苯基2-噻嗯基鋶、4-正丁氧基萘基-1-噻環戊鋶、2-正丁氧基萘基-1-噻環戊鋶、4-甲氧基萘基-1-噻環戊鋶、2-甲氧基萘基-1-噻環戊鋶等。較佳為三苯基鋶、4-第三丁基苯基二苯基鋶、4-第三丁氧基苯基二苯基鋶、三(4-第三丁基苯基)鋶、4-第三丁氧基羰基甲基氧基苯基二苯基鋶等。尚有4-甲基丙烯醯氧基苯基二苯基鋶、4-丙烯醯氧基苯基二苯基鋶、4-甲基丙烯醯氧基苯基二甲基鋶、4-丙烯醯氧基苯基二甲基鋶、(4-甲基丙烯醯氧基-3,5-二甲基苯基)二苯基鋶、(4-丙烯醯氧基-3,5-二甲基苯基)二苯基鋶等。這些可聚合之鋶陽離子可參考日本特開平4-230645號公報、特開2005-84365號公報等,這些可聚合之鋶鹽可作為下述之高分子量物體之構成成份的單體使用。
此時,鋶鹽例如有下述通式(2a)表示者。
RC(=O)-R1
-COOCH(CF3
)CF2
SO3 -
(R5
(O)n
)m
Ph’S+Ph2
(2a)
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。R5
係表示取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基或烯基、或取代或非取代之碳數6~14之芳基。m係表示1~5之整數,n係表示0(零)或1。Ph係表示苯基。Ph’係表示苯基之氫原子m個取代成R5
(O)n
-基之基)。
上述通式(2a)之R、R1
係與上述相同,R5
-(O)n
-基之取代基無特別限定,但是較佳為苯基之4位或3位。更佳為4位。R5
例如有甲基、乙基、正丙基、第二丙基、環丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、環戊基、正己基、環己基、正辛基、正癸基、正十二烷基、三氟甲基、苯基、4-甲氧基苯基、4-第三丁基苯基、n=1時,例如有丙烯醯基、甲基丙烯醯基、乙烯基、烯丙基。m為1~5之整數,較佳為1。n為0(零)或1。
具體之鋶陽離子,例如有4-甲基苯基二苯基鋶、4-乙基苯基二苯基鋶、4-第三丁基苯基二苯基鋶、4-環己基苯基二苯基鋶、4-正己基苯基二苯基鋶、4-正辛基苯基二苯基鋶、4-甲氧基苯基二苯基鋶、4-乙氧基苯基二苯基鋶、4-第三丁氧基苯基二苯基鋶、4-環己氧基苯基二苯基鋶、4-正己氧基苯基二苯基鋶、4-正辛氧基苯基二苯基鋶、4-十二烷氧基苯基二苯基鋶、4-三氟甲基苯基二苯基鋶、4-三氟甲基氧基苯基二苯基鋶、4-第三丁氧基羰基甲基氧基苯基二苯基鋶、4-甲基丙烯醯氧基苯基二苯基鋶、4-丙烯醯氧基苯基二苯基鋶、(4-正己氧基-3,5-二甲基苯基)二苯基鋶、(4-甲基丙烯醯氧基-3,5-二甲基苯基)二苯基鋶、(4-丙烯醯氧基-3,5-二甲基苯基)二苯基鋶等。
本發明係提供碘鎓鹽,但是本發明之碘鎓鹽係以下述通式(2b)表示者。
RC(=O)-R1
-COOCH(CF3
)CF2
SO3 -
((R5
(O)n
)m
Ph’)2
I+
(2b)
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。R5
係表示取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基或烯基、或取代或非取代之碳數6~14之芳基。m係表示1~5之整數,n係表示0(零)或1,Ph’係與上述相同)。
上述通式(2b)之R、R1
、R5
、n、m係與上述相同。R5
-(O)n
-基之取代基無特別限定,但是較佳為苯基之4位或3位。更佳為4位。具體之碘鎓陽離子例如有雙(4-甲基苯基)碘鎓、雙(4-乙基苯基)碘鎓、雙(4-第三丁基苯基)碘鎓、雙(4-(1,1-二甲基苯基)苯基)碘鎓、4-甲氧基苯基苯基碘鎓、4-第三丁氧基苯基苯基碘鎓、4-丙烯醯氧基苯基苯基碘鎓、4-甲基丙烯醯氧基苯基苯基碘鎓等,其中較佳為雙(4-第三丁基苯基)碘鎓。
本發明也提供以下述通式(3a)表示之N-磺醯氧基醯亞胺化合物。
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。X、Y係彼此獨立表示氫原子或取代或非取代之碳數1~6之烷基,或X及Y彼此鍵結可與這些鍵結之碳原子共同形成飽和或不飽和之碳數6~12之環。Z係表示單鍵、雙鍵、伸甲基或氧原子)。
上述通式(3a)中之X、Y係彼此獨立表示氫原子或取代或非取代之碳數1~6之烷基,或X及Y彼此鍵結可與這些鍵結之碳原子共同形成飽和或不飽和之碳數6~12之環。Z係表示單鍵、雙鍵、伸甲基或氧原子。R、R1
係與上述相同。不含磺酸鹽部之醯亞胺骨架具體如下。醯亞胺骨架可參考日本特開2003-252855號公報。
本發明也提供以下述通式(3b)表示之肟磺酸鹽化合物。
(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基。R1
係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造。q表示0或1,但是q為0時,p表示取代或非取代之碳數1~20之烷基、或取代或非取代之碳數6~15之芳基,q為1時,p表示單鍵、取代或非取代之碳數1~20之伸烷基、或取代或非取代之碳數6~15之伸芳基。EWG為氰基、三氟甲基、全氟乙基、全氟丙基、5H-全氟戊基、6H-全氟己基、硝基或甲基,q為1時,彼此之EWG相互鍵結,可與其鍵結之碳原子共同形成碳數6的環)。
上述通式(3b)中之R、R1
係與上述相同。q為0時,p為取代或非取代之碳數1~20之烷基、取代或非取代之碳數6~15之芳基,q為1時,p為單鍵、取代或非取代之碳數1~20之伸烷基、或取代或非取代之碳數6~15之伸芳基。EWG為氰基、三氟甲基、全氟乙基、全氟丙基、5H-全氟戊基、6H-全氟己基、硝基或甲基,q為1時,彼此之EWG相互鍵結,與其鍵結之碳原子可共同形成碳數6的環。這些肟磺酸鹽之骨架係揭示於美國專利第6261738號公報之說明書、日本特開平9-95479號公報、特開平9-208554號公報、特開平9-230588號公報、日本專利第2906999號公報、特開平9-301948號公報、特開2000-314956號公報、特開2001-233842號公報、國際公開第2004/074242號公報。
不含磺酸鹽部位之具體的肟磺酸鹽骨架如下。
於茲說明本發明之產生上述通式(1a)表示之磺酸之光酸產生劑之一例,如上述通式(2)表示之鋶鹽的合成方法。
如後述所合成之三苯鋶1,1,3,3,3-五氟丙烯-2-羥基丙烷磺酸鹽與具有羧酸酯結構或內酯結構之脂肪族羧酸鹵化物或脂肪族羧酸酐、芳香族羧酸鹵化物或芳香族羧酸酐、脂肪族二羧酸酐或芳香族二羧酸酐,在鹼性條件下產生反應,可得到具有羧酸酯結構或內酯結構或具有羰基、羧基之上述通式(2)表示鋶鹽。
本發明之上述通式(2a)、(2b)之鋶鹽、碘鎓鹽可與上述相同方法合成。
合成本發明之上述通式(3a)、(3b)表示之醯亞胺磺酸鹽或肟磺酸鹽時,將具有1,1,3,3,3-五氟丙烯-2-羥基丙烷磺酸鹽部位之醯亞胺磺酸鹽或肟磺酸鹽與具有羧酸酯結構或內酯結構之脂肪族羧酸鹵化物或脂肪族羧酸酐、芳香族羧酸鹵化物或芳香族羧酸酐、脂肪族二羧酸酐或芳香族二羧酸酐,在鹼性條件下產生反應,可得到具有羧酸酯結構或內酯結構或具有羰基、羧基之醯亞胺磺酸鹽或肟磺酸鹽。
簡單敘述三苯鋶1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽之合成。
將中井等人以1,1,1,3,3,3-六氟-2-丙醇為出發原料所開發之1,1,3,3,3-五氟丙烯-2-基苯酸酯所代表之1,1,3,3,3-五氟丙烯-2-基脂肪族羧酸酯或芳香族羧酸酯與亞硫酸氫鈉或亞硫酸鈉與偶氮異丁腈或過氧化苯醯等之自由基引發劑存在下,並在作為溶劑之水或醇及其混合物中產生反應,可得到對應之1,1,3,3,3-五氟-2-醯氧基丙烷磺酸鹽或1,1,3,3,3-五氟-2-芳烴羰氧基丙烷磺酸鹽後,適當與鋶鹽進行離子交換可得到三苯鋶1,1,3,3,3-五氟-2-醯氧基丙烷磺酸鹽或三苯鋶1,1,3,3,3-五氟-2-芳烴羰氧基丙烷磺酸鹽,再使用氫氧化鈉、氫氧化鉀等之鹼,使磺酸鹽之羧酸酯部位水解或使用醇與鹼進行溶劑分解,可得到目的之三苯鋶1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽。
三苯鋶以外之鋶、碘鎓之合成也可同樣進行。
簡單敘述具有1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽部位之醯亞胺磺酸鹽或肟磺酸鹽之合成。
將1,1,3,3,3-五氟-2-醯氧基丙烷磺酸鹽或1,1,3,3,3-五氟-2-芳烴羰氧基丙烷磺酸鹽與亞硫醯氯、氧氯化磷、五氯化磷等氯化劑反應,可得到對應之磺醯基氯或磺酸酐,使用一般方法與N-羥基二羧基醯亞胺或肟類反應可得到1,1,3,3,3-五氟-2-醯氧基丙烷磺酸鹽或1,1,3,3,3-五氟-2-芳烴羰氧基丙烷磺酸鹽。接著進行醯氧基或芳烴羰氧基之水解,可得到目的中間原料之具有1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽部位之醯亞胺磺酸鹽或肟磺酸鹽。
原料之鋶鹽或碘鎓鹽可參考The Chemistry of sulfonium group Part l John-Wiley & Sons(1981),Advanced Photochemistry,Vol.17 John-Wiley & Sons(1992),J.Org.Chem.,1988.53.5571-5573或日本特開平8-311018號公報、特開平9-15848號公報、特開2001-122850號公報、特開平7-25846號公報、特開2001-181221號公報、特開2002-193887號公報、特開2002-193925號公報等來合成。具有可聚合之取代基之丙烯醯氧基或甲基丙烯醯氧基之鎓陽離子係以日本特開平4-230645號公報、特開2005-84365號公報等所記載之方法,將羥苯基二苯基鋶鹵化物在鹼性條件下,與丙烯醯氯或甲基丙烯醯氯反應來合成。
醯亞胺磺酸鹽或肟磺酸鹽之合成可參考上述日本特開2003-252855號公報、美國專利第6261738號說明書、特開平9-95479號公報、特開平9-208554號公報、特開平9-230588號公報、日本專利第2906999號公報、特開平9-301948號公報、特開平2000-314956號公報、特開平2001-233842號公報、國際公開2004/074242號公報。
本發明係第1為提供一種藉由高能量線照射產生上述通式(1a)表示之磺酸的化學增幅型光阻材料用之光酸產生劑。第2係提供可作為化學增幅型光阻材料用之光酸產生劑之鋶鹽、碘鎓鹽、二羧基醯亞胺磺酸鹽、肟磺酸鹽,第3係提供藉由高能量線照射而產生上述通式(1a)表示之磺酸之化學增幅型光阻材料用之光酸產生劑及藉由酸之作用使對鹼顯像液之溶解性產生變化之樹脂的光阻材料。
本發明之光阻材料係含有:(A)上述光酸產生劑(即產生式(1a)之磺酸的光酸產生劑)(B)有機溶劑(C)經由酸的作用使對鹼顯像液之溶解性產生變化之基底樹脂,必要時含有(D)抑制劑(Quencher),更必要時含有(E)上述光酸產生劑以外之光酸產生劑更必要時含有(F)有機酸衍生物及/或氟取代醇更必要時含有(G)重量平均分子量3,000以下之溶解阻止劑的化學增幅正型光阻材料,或含有:(A)上述光酸產生劑(B)有機溶劑(C’)鹼可溶性樹脂,藉由交聯劑成為鹼難溶之基底樹脂(H)因酸作用進行交聯之交聯劑,必要時含有(D)抑制劑,更必要時含有(E)上述光酸產生劑以外之光酸產生劑的化學增幅負型光阻材料。
本發明之(A)成份之光酸產生劑係如上所述,更具體例如有上述通式(2)、(2a)、(2b)、(3a)或(3b)之化合物,其添加量係對於光阻材料中之基底樹脂100份(質量份,以下相同),含有0.1~10質量份,較佳為1~7質量份。
本發明使用之(B)成份之有機溶劑,只要是可溶解基底樹脂、酸產生劑、其他添加劑等之有機溶劑即可。該有機溶劑例如有環己酮、甲基戊酮等之酮類;3-甲氧基丁醇、3-甲基-3-甲氧基丁醇、1-甲氧基-2-丙醇、1-乙氧基-2-丙醇等醇類;丙二醇單甲醚、乙二醇單甲醚、丙二醇單乙醚、乙二醇單乙醚、丙二醇二甲醚、二甘醇二甲醚等醚類;丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、乳酸乙酯、丙酮酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸第三丁酯、丙酸第三丁酯、丙二醇單第三丁醚乙酸酯等酯類;γ-丁內酯等內酯類,這些可單獨使用1種或2種以上混合使用,但不限於該溶劑。
本發明係這些有機溶劑中,較佳為使用光阻成份中之酸產生劑之溶解性最優之二甘醇二甲醚及1-乙氧基-2-丙醇、丙二醇單甲醚乙酸酯、環己酮及其混合溶劑。
有機溶劑之使用量係對於基底樹脂100質量份,使用200至3,000質量份,特佳為400至2,000質量份。
本發明所使用之(C)成份或(C’)成份之基底樹脂係作為KrF準分子雷射光阻材料用,例如有聚羥基苯乙烯(PHS)及PHS與苯乙烯、(甲基)丙烯酸酯、其他聚合性烯烴化合物等共聚物,ArF準分子雷射光阻材料用,例如(甲基)丙烯酸酯系、環烯烴與馬來酸酐之交互共聚系及含有乙烯基醚類或(甲基)丙烯酸酯之共聚系、聚降冰片烯系、環烯烴開環複分解聚合系、環烯烴開環複分解聚合物氫化物等,F2
準分子雷射光阻材料用,例如有上所述KrF、ArF用聚合物之氟取代物等,但是不限於這些聚合系聚合物。具有可聚合之取代基之本發明之鋶鹽、碘鎓鹽,具體例如(4-丙烯醯氧基苯基)二苯基鋶陽離子、(4-甲基丙烯醯氧基苯基)二苯基鋶陽離子、(4-丙烯醯氧基苯基)苯基碘鎓陽離子、(4-甲基丙烯醯氧基苯基)苯基碘鎓陽離子等之鎓陽離子與環己烷二羧酸氫1-(二氟磺基甲基)-2,2,2-三氟乙酯等陰離子之組合的鋶鹽、碘鎓鹽可作為這些之基底樹脂的聚合成份使用。基底樹脂可單獨使用一種或將2種以上混合使用。正型光阻材料時,酚或羧基、或氟化烷醇之羥基以酸不穩定基取代,一般未曝光部之溶解速度會降低。
這些基底樹脂無特別限定,例如日本特開2000-159758號、特開2000-186118號、特開2000-309611號、特開2000-327633號、特開2000-330283號、特開2001-329052號、特開2002-202609號、特開2002-161116號、特開2003-2883號、特開2003-20313號、特開2003-26728號、特開2003-34706號、特開2003-64134號、特開2003-66612號、特開2003-113213號、特開2003-316027號、特開2003-321466號、特開2004-143153號、特開2004-124082號、特開2004-115486號、特開2004-62175號公報所記載者。
此時,特別是基底樹脂較佳為選自聚(甲基)丙烯酸及其衍生物、環烯烴衍生物-馬來酸酐交互聚合物、環烯烴衍生物與馬來酸酐與聚丙烯酸或其衍生物之3或4元以上之共聚物、環烯烴衍生物-α-三氟甲基丙烯酸共聚物、聚降冰片烯、開環複分解聚合物及開環複分解聚合物氫化物之一種或兩種以上之高分子聚合物。
基底樹脂較佳為含矽原子之高分子結構物或含氟原子之高分子結構物。
其例如有特開2005-8765號公報、特開2004-354417號公報、特開2004-352743號公報、特開2004-331854號公報、特開2004-331853號公報、特開2004-292781號公報、特開2004-252405號公報、特開2004-190036號公報、特開2004-115762號公報、特開2004-83873號公報、特開2004-59844號公報、特開2004-35671號公報、特開2004-83900號公報、特開2004-99689號公報、特開2004-145048號公報、特開2004-217533號公報、特開2004-231815號公報、特開2004-244439號公報、特開2004-256562號公報、特開2004-307447號公報、特開2004-323422號公報、特開2005-29527號公報、特開2005-29539號公報所記載者。
如上述,化學增幅正型光阻材料時,基底樹脂可使用具有酸不穩定基,不溶或難溶於顯像液,利用酸使此酸不穩定基分解成為可溶於顯像液者。此時基底樹脂之酸不穩定基可選擇各種酸不穩定基,但是較佳為以下述式(C1)、(C2)表示之碳數2~30之縮醛基、碳數4~30之三級烷基等。
上述式(C1)、(C2)中,R201
、R202
係氫原子或碳數1~20之直鏈狀、支鏈狀或環狀之烷基,可含有氧、硫、氮、氟等之雜原子,R203
、R204
、R205
、R206
係碳數1~20之直鏈狀、支鏈狀或環狀之烷基、碳數6~10之芳基或碳數7~10之芳烷基,可含有氧、硫、氮、氟等之雜原子。R201
與R202
、R201
與R203
、R202
與R203
、R204
與R205
、R204
與R206
、R205
與R206
各自鍵結,可與這些鍵結之碳原子共同形成碳數3~30之環。
上述式(C1)表示之縮醛基,具體例有甲氧基甲基、乙氧基甲基、丙氧基甲基、丁氧基甲基、異丙氧基甲基、第三丁氧基甲基、1-甲氧基乙基、1-甲氧基丙基、1-甲氧基丁基、1-乙氧基乙基、1-乙氧基丙基、1-乙氧基丁基、1-丙氧基乙基、1-丙氧基丙基、1-丙氧基丁基、1-環戊氧基乙基、1-環己氧基乙基、2-甲氧基異丙基、2-乙氧基異丙基、1-苯氧基乙基、1-苯甲氧基乙基、1-苯氧基丙基、1-苯甲氧基丙基、1-金剛烷氧基乙基、1-金剛烷氧基丙基、2-四氫呋喃基、2-四氫-2H-吡喃基、1-(2-環己烷羰氧基乙氧基)乙基、1-(2-環己烷羰氧基乙氧基)丙基、1-〔2-(1-金剛烷基羰氧基)乙氧基〕乙基、1-〔2-(1-金剛烷基羰氧基)乙氧基〕丙基,但是不限於這些例示者。
上述式(C2)表示之三級烷基,具體例有第三丁基、第三戊基、1-乙基-1-甲基丙基、1,1-二乙基丙基、1,1,2-三甲基丙基、1-金剛烷基-1-甲基乙基、1-甲基-1-(2-冰片基)乙基、1-甲基-1-(四氫呋喃-2-基)乙基、1-甲基-1-(7-氧雜降冰片烷-2-基)乙基、1-甲基環戊基、1-乙基環戊基、1-丙基環戊基、1-環戊基環戊基、1-環己基環戊基、1-(2-四氫呋喃基)環戊基、1-(7-氧雜降冰片烷-2-基)環戊基、1-甲基環己基、1-乙基環己基、1-環戊基環己基、1-環己基環己基、2-甲基-2-冰片基、2-乙基-2-冰片基、8-甲基-8-三環〔5.2.1.02,6
〕癸基、8-乙基-8-三環〔5.2.1.02,6
〕癸基、3-甲基-3-四環〔4.4.0.12,5
.17,10
〕十二烷基、3-乙基-3-四環〔4.4.0.12,5
.17,10
〕十二烷基、2-甲基-2-金剛烷基、2-乙基-2-金剛烷基、1-甲基-3-氧代-1-環己基、1-甲基-1-(四氫呋喃-2-基)乙基、5-羥基-2-甲基-2-金剛烷基、5-羥基-2-乙基-2-金剛烷基,但是不限於這些例示者。
又,基底樹脂之羥基之氫原子之1莫耳%以上為下述通式(C3a)或(C3b)表示之酸不穩定基可於分子間或分子內交聯。
上述式中,R207
、R208
為氫原子或碳數1~8之直鏈狀、支鏈狀或環狀之烷基。R207
與R208
鍵結可與這些鍵結之碳原子共同形成環,形成環時,R207
、R208
係表示碳數1~8之直鏈狀或支鏈狀之伸烷基。R209
為碳數1~10之直鏈狀、支鏈狀或環狀之伸烷基,b為0或1~10之整數。A為a+1價之碳數1~50之脂肪族或脂環飽和烴基、芳香族烴基或雜環基,這些基中可介於雜原子,或鍵結於該碳原子之氫原子的一部份可被羥基、羧基、羰基或氟原子所取代。B為-CO-O-、-NHCO-O-或-NHCONH-。a為1~7的整數。
又,上述通式(C3a)或(C3b)表示之交聯型縮醛基,具體例如下述式(C3-1)~(C3-8)所示者,但並不僅限於這些例示者。
基底樹脂之凝膠滲透色層分析法(GPC)之聚苯乙烯換算之重量平均分子量為2,000~100,000較佳,未達2,000時,會有成膜性及解像性降低的情形,超過100,000時,會有解像性降低,或圖型之形成會產生異物的情形。
含有酸不穩定基之單體單位對於這些基底樹脂之單體單位(構成單位)之比例係ArF準分子雷射光阻材料用之基底樹脂中,含有10~70莫耳%,較佳為20~60莫耳%,KrF準分子雷射光阻材料用之基底樹脂中,含有10~50莫耳%,較佳為20~40莫耳%。
上述含有酸不穩定基之單體單位以外之單體單位,在ArF準分子雷射光阻材料用之基底樹脂中,導入醇、氟取代醇、醚、內酯、酯、酸酐、羧酸等含有極性基之單體單位較佳。在KrF準分子雷射光阻材料用之基底樹脂中,除了未被導入酸不穩定基之4-羥基苯乙烯單位外,可導入苯乙烯、茚、4-乙醯氧基苯乙烯等。這些單體單位可單獨導入1種或導入2種以上。
(D)成份之抑制劑係可抑制因光酸產生劑所產生之酸擴散至光阻膜中之擴散速度的化合物較適合,添加這種抑制劑除了可容易調整光阻感度外,可抑制光阻膜中之酸的擴散速度,提高解像度,抑制曝光後之感度變化,或降低基板及環境之依存度,可提昇曝光寬容度及圖型之外形等。
這種抑制劑例如有1級、2級、3級之脂肪族胺類、混合胺類、芳香族胺類、雜環胺類、具有羧基之含氮化合物、具有磺醯基之含氮化合物、具有羥基之含氮化合物、具有羥苯基之含氮化合物、醇性含氮化合物、醯胺衍生物、醯亞胺衍生物、胺基甲酸酯衍生物、銨鹽等。
具體而言,1級之脂肪胺類例如有氨、甲胺、乙胺、正丙胺、異丙胺、正丁胺、異丁胺、第二丁胺、第三丁胺、戊胺、第三戊胺、環戊胺、己胺、環己胺、庚胺、辛胺、壬胺、癸胺、月桂胺、十六烷胺、甲二胺、乙二胺、四乙撐戊胺等;第2級之脂肪胺族類例如有二甲胺、二乙胺、二正丙胺、二異丙胺、二正丁胺、二異丁胺、二第二丁胺、二戊胺、二環戊胺、二己胺、二環己胺、二庚胺、二辛胺、二壬胺、二癸胺、二月桂胺、二(十六烷)胺、N,N-二甲基甲撐二胺、N,N-二甲基乙二胺、N,N-二甲基四乙撐戊胺等;第3級之脂肪族胺類例如有三甲胺、三乙胺、三正丙胺、三異丙胺、三正丁胺、三異丁胺、三第二丁胺、三戊胺、三環戊胺、三己胺、三環己胺、三庚胺、三辛胺、三壬胺、三癸胺、三月桂胺、三(十六烷)胺、N,N,N’,N’-四甲基甲二胺、N,N,N’,N’-四甲基乙二胺、N,N,N’,N’-四甲基四乙撐戊胺等。
又,混合胺類例如有二甲基乙胺、甲基乙基丙胺、苯甲胺、苯乙胺、苯甲基二甲胺等。芳香族胺類及雜環胺類之具體例有苯胺衍生物(例如苯胺、N-甲基苯胺、N-乙基苯胺、N-丙基苯胺、N,N-二甲基苯胺、N,N-雙(羥乙基)苯胺、2-甲基苯胺、3-甲基苯胺、4-甲基苯胺、乙基苯胺、丙基苯胺、二甲基苯胺、2,6-二異丙基苯胺、三甲基苯胺、2-硝基苯胺、3-硝基苯胺、4-硝基苯胺、2,4-二硝基苯胺、2,6-二硝基苯胺、3,5-二硝基苯胺、N,N-二甲基甲苯胺等)、二苯基(對甲苯基)胺、甲基二苯胺、三苯胺、苯二胺、萘胺、二胺基萘、吡咯衍生物(例如吡咯、2H-吡咯、1-甲基吡咯、2,4-二甲基吡咯、2,5-二甲基吡咯、N-甲基吡咯等)、噁唑衍生物(例如噁唑、異噁唑等)、噻唑衍生物(例如噻唑、異噻唑等)、咪唑衍生物(例如咪唑、4-甲基咪唑、4-甲基-2-苯基咪唑等)、吡唑衍生物、呋咱衍生物、吡咯啉衍生物(例如吡咯啉、2-甲基-1-吡咯啉等)、吡咯烷衍生物(例如吡咯烷、N-甲基吡咯烷、吡咯烷酮、N-甲基吡咯烷酮等)、咪唑啉衍生物、咪唑吡啶衍生物、吡啶衍生物(例如吡啶、甲基吡啶、乙基吡啶、丙基吡啶、丁基吡啶、4-(1-丁基戊基)吡啶、二甲基吡啶、三甲基吡啶、三乙基吡啶、苯基吡啶、3-甲基-2-苯基吡啶、4-第三丁基吡啶、二苯基吡啶、苯甲基吡啶、甲氧基吡啶、丁氧基吡啶、二甲氧基吡啶、1-甲基-2-吡啶、4-吡咯烷基吡啶、1-甲基-4-苯基吡啶、2-(1-乙基丙基)吡啶、胺基吡啶、二甲胺基吡啶等)、噠嗪衍生物、嘧啶衍生物、吡嗪衍生物、吡唑啉衍生物、吡唑烷衍生物、哌啶衍生物、哌嗪衍生物、嗎啉衍生物、吲哚衍生物、異吲哚衍生物、1H-吲唑衍生物、吲哚啉衍生物、喹啉衍生物(例如喹啉、3-喹啉腈等)、異喹啉衍生物、噌啉衍生物、喹唑啉衍生物、喹喔啉衍生物、酞嗪衍生物、嘌呤衍生物、蝶啶衍生物、咔唑衍生物、菲繞啉衍生物、吖啶衍生物、吩嗪衍生物、1,10-菲繞啉衍生物、腺嘌呤衍生物、腺苷衍生物、鳥嘌呤衍生物、鳥苷衍生物、尿嘧啶衍生物、尿苷衍生物等等。
又,具有羧基之含氮化合物,例如胺基苯甲酸、吲哚羧酸、胺基酸衍生物(例如菸酸、丙氨酸、精氨酸、天冬氨酸、枸椽酸、甘氨酸、組氨酸、異賴氨酸、甘氨醯白氨酸、白氨酸、蛋氨酸、苯基丙氨酸、蘇氨酸、賴氨酸、3-胺基吡嗪-2-羧酸、甲氧基丙氨酸)等;具有磺醯基之含氮化合物例如3-吡啶磺酸、對甲苯磺酸吡啶鎓等;具有羥基之含氮化合物、具有羥苯基之含氮化合物、醇性含氮化合物例如有2-羥基吡啶、胺基甲酚、2,4-喹啉二醇、3-吲哚甲醇氫化物、單乙醇胺、二乙醇胺、三乙醇胺、N-乙基二乙醇胺、N,N-二乙基乙醇胺、三異丙醇胺、2,2’-亞胺基二乙醇、2-胺基乙醇、3-胺基-1-丙醇、4-胺基-1-丁醇、4-(2-羥乙基)嗎啉、2-(2-羥乙基)吡啶、1-(2-羥乙基)哌嗪、1-〔2-(2-羥基乙氧基)乙基〕哌嗪、哌啶乙醇、1-(2-羥乙基)吡咯烷、1-(2-羥乙基)-2-吡咯烷酮、3-吡咯烷基-1,2-丙二醇、3-吡咯烷基-1,2-丙二醇、8-羥基久洛尼啶、3-奎寧環醇(quinuclidinol)、3-托品醇、1-甲基-2-吡咯烷乙醇、1-氮雜環丙烷乙醇、N-(2-羥乙基)酞醯亞胺、N-(2-羥乙基)異菸醯胺等。
醯胺衍生物例如甲醯胺、N-甲基醯胺、N,N-二甲基甲醯胺、乙醯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、丙醯胺、苯醯胺等。醯亞胺衍生物例如有酞醯亞胺、琥珀醯亞胺、馬來醯亞胺等。胺基甲酸酯衍生物,例如N-第三丁氧羰基-N,N-二環己基胺、N-第三丁氧羰基苯並咪唑、噁唑啉二酮等。銨鹽類例如吡啶鎓=p-甲苯磺酸酯、三乙基銨=p-甲苯磺酸酯、三辛基銨=p-甲苯磺酸酯、三乙基銨=2,4,6-三異丙基苯磺酸酯、三辛基銨=2,4,6-三異丙基苯磺酸酯、三乙基銨=樟腦磺酸酯、三辛基銨=樟腦磺酸酯、四甲基銨氫氧化物、四乙基銨氫氧化物、四丁基銨氫氧化物、苄三甲基銨氫氧化物、四甲基銨=p-甲苯磺酸酯、四丁基銨=p-甲苯磺酸酯、苄基三甲基銨=p-甲苯磺酸酯、四甲基銨=樟腦磺酸酯、四丁基銨=樟腦磺酸酯、苄基三甲基銨=樟腦磺酸酯、四甲基銨=2,4,6-三異丙基苯磺酸酯、四丁基銨=2,4,6-三異丙基苯磺酸酯、苄基三甲基銨=2,4,6-三異丙基苯磺酸酯、四甲基銨=乙酸酯、四丁基銨=乙酸酯、苄基三甲基銨=乙酸酯、四甲基銨=苄酯、四丁基銨=苄酯、苄基三甲基銨=苄酯等。
又,可再添加1種或2種以上選自下述通式(Am-1)所示之胺化合物。
【化14】N(Rx)
k
(Ry)
3-k
(Am-1)
(式中,k為1、2或3。側鏈Rx可為相同或不同,可以下述通式(Rx-1)、(Rx-2)或(Rx-3)表示。側鏈Ry可相同或不同之氫原子或直鏈狀、支鏈狀或環狀之氫原子的一部份或全部可被氟原子所取代之碳數1~20的烷基,可含有醚基或羥基。Rx彼此鍵結可形成環)。
(式中,R301
、R303
、R306
為碳數1~4之直鏈狀或支鏈狀之伸烷基,R302
、R305
為氫原子、氫原子的一部份或全部可被氟原子所取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基,可含有1個或多個羥基、醚基、酯基或內酯環。R304
為單鍵、碳數1~4之直鏈狀或支鏈狀之伸烷基,R307
為氫原子之一部份或全部可被氟原子所取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基,可含有1個或多個羥基、醚基、酯基或內酯環)。
以上述通式(Am-1)表示之化合物,具體例如三(2-甲氧甲氧乙基)胺、三{2-(2-甲氧乙氧基)乙基}胺、三{2-(2-甲氧乙氧甲氧基)乙基}胺、三{2-(1-甲氧乙氧基)乙基}胺、三{2-(1-乙氧乙氧基)乙基}胺、三{2-(1-乙氧丙氧基)乙基}胺、三〔2-{2-(2-羥基乙氧基)乙氧基}乙基〕胺、4,7,13,16,21,24-六氧雜-1,10-二氮雜二環〔8.8.8〕二十六烷、4,7,13,18-四氧雜-1,10-二氮雜二環〔8.5.5〕二十烷、1,4,10,13-四氧雜-7,16-二氮雜二環十八烷、1-氮雜-12-冠-4、1-氮雜-15-冠-5、1-氮雜-18-冠-6、三(2-甲醯氧乙基)胺、三(2-乙醯氧乙基)胺、三(2-丙醯氧乙基)胺、三(2-丁醯氧乙基)胺、三(2-異丁醯氧乙基)胺、三(2-戊醯氧乙基)胺、三(2-己醯氧乙基)胺、N,N-雙(2-乙醯氧乙基)2-(乙醯氧乙醯氧基)乙胺、三(2-甲氧羰氧乙基)胺、三(2-第三丁氧羰氧乙基)胺、三〔2-(2-氧代丙氧基)乙基〕胺、三〔2-(甲氧羰甲基)氧乙基〕胺、三〔2-(第三丁氧羰甲基氧基)乙基〕胺、三〔2-(環己基氧基羰甲基氧基)乙基〕胺、三(2-甲氧羰乙基)胺、三(2-乙氧基羰乙基)胺、N,N-雙(2-羥乙基)2-(甲氧羰基)乙胺、N,N-雙(2-乙醯氧基乙基)2-(甲氧羰基)乙胺、N,N-雙(2-羥乙基)2-(乙氧羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(乙氧羰基)乙胺、N,N-雙(2-羥乙基)2-(2-甲氧乙氧羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(2-甲氧乙氧羰基)乙胺、N,N-雙(2-羥乙基)2-(2-羥基乙氧羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(2-乙醯氧乙氧羰基)乙胺、N,N-雙(2-羥乙基)2-〔(甲氧羰基)甲氧羰基〕乙胺、N,N-雙(2-乙醯氧乙基)2-〔(甲氧羰基)甲氧羰基〕乙胺、N,N-雙(2-羥乙基)2-(2-氧代丙氧羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(2-氧代丙氧羰基)乙胺、N,N-雙(2-羥乙基)2-(四氫糠氧基羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(四氫糠氧基羰基)乙胺、N,N-雙(2-羥乙基)2-〔2-(氧代四氫呋喃-3-基)氧羰基〕乙胺、N,N-雙(2-乙醯氧乙基)2-〔(2-氧代四氫呋喃-3-基)氧羰基〕乙胺、N,N-雙(2-羥乙基)2-(4-羥基丁氧羰基)乙胺、N,N-雙(2-甲醯氧乙基)2-(4-甲醯氧基丁氧羰基)乙胺、N,N-雙(2-甲醯氧乙基)2-(2-甲醯氧乙氧基羰基)乙胺、N,N-雙(2-甲氧乙基)2-(甲氧羰基)乙胺、N-(2-羥乙基)雙〔2-(甲氧羰基)乙基〕胺、N-(2-乙醯氧乙基)雙〔2-(甲氧羰基)乙基〕胺、N-(2-羥乙基)雙〔2-(乙氧羰基)乙基〕胺、N-(2-乙醯氧乙基)雙〔2-(乙氧羰基)乙基〕胺、N-(3-羥基-1-丙基)雙〔2-(甲氧羰基)乙基〕胺、N-(3-乙醯氧基-1-丙基)雙〔2-(甲氧羰基)乙基〕胺、N-(2-甲氧乙基)雙〔2-(甲氧羰基)乙基〕胺、N-丁基雙〔2-(甲氧羰基)乙基〕胺、N-丁基雙〔2-(2-甲氧乙氧羰基)乙基〕胺、N-甲基雙(2-乙醯氧乙基)胺、N-乙基雙(2-乙醯氧乙基)胺、N-甲基雙(2-三甲基乙醯氧乙基)胺、N-乙基雙〔2-(甲氧基羰氧基)乙基〕胺、N-乙基雙〔2-(第三丁氧羰氧基)乙基〕胺、三(甲氧羰甲基)胺、三(乙氧羰甲基)胺、N-丁基雙(甲氧羰甲基)胺、N-己基雙(甲氧羰甲基)胺、β-(二乙胺基)-δ-戊內醯胺,但不受此限。
又,可再添加1種或2種以上選自具有以下述通式(Am-2)所示之環狀結構的胺化合物。
(式中Rx係如上所述,R308
係碳數2~20之直鏈狀或支鏈狀之氫原子的一部份或全部可被氟原子所取代之伸烷基,可含有1個或多個羰基、醚基、酯基或硫醚)。
上述通式(Am-2)所示化合物之具體例,如1-〔2-(甲氧甲氧基)乙基〕吡咯烷、1-〔2-(甲氧甲氧基)乙基〕哌啶、4-〔2-(甲氧甲氧基)乙基〕嗎啉、1-〔2-〔2-(甲氧乙氧基)甲氧基〕乙基〕吡咯烷、1-〔2-〔2-(甲氧乙氧基)甲氧基〕乙基〕哌啶、4-〔2-〔2-(甲氧乙氧基)甲氧基〕乙基〕嗎啉、2-〔2-〔2-(甲氧乙氧基)甲氧基〕乙基嗎啉、2-{2-〔2-(2-甲氧乙氧基)乙氧基〕乙氧基}乙基嗎啉、2-{2-〔2-(2-丁氧乙氧基)乙氧基〕乙氧基}乙基嗎啉、乙酸2-(1-吡咯烷基)乙酯、乙酸2-哌啶基乙酯、乙酸2-嗎啉乙酯、甲酸2-(1-吡咯烷基)乙酯、丙酸2-哌啶基乙酯、乙醯氧乙酸2-嗎啉乙酯、甲氧基乙酸2-(1-吡咯烷基)乙酯、4-〔2-(甲氧羰氧基)乙基〕嗎啉、1-〔2-(第三丁氧羰氧基)乙基〕哌啶、4-〔2-(2-甲氧乙氧羰氧基)乙基〕嗎啉、3-(1-吡咯烷基)丙酸甲酯、3-吡啶基丙酸甲酯、3-嗎啉基丙酸甲酯、3-(硫基嗎啉基)丙酸甲酯、2-甲基-3-(1-吡咯烷基)丙酸甲酯、3-嗎啉基丙酸乙酯、3-哌啶基丙酸甲氧羰基甲酯、3-(1-吡咯烷基)丙酸2-羥乙酯、3-嗎啉基丙酸2-乙醯氧乙酯、3-(1-吡咯烷基)丙酸2-氧代四氫呋喃-3-酯、3-嗎啉基丙酸四氫糠酯、3-吡啶基丙酸縮水甘油酯、3-嗎啉基丙酸2-甲氧基乙酯、3-(1-吡咯烷基)丙酸2-(2-甲氧乙氧基)乙酯、3-嗎啉基丙酸丁酯、3-哌啶基丙酸環己酯、α-(1-吡咯烷基)甲基-γ-丁內酯、β-哌啶基-γ-丁內酯、β-嗎啉基-δ-戊內酯、1-吡咯烷基乙酸甲酯、哌啶基乙酸甲酯、嗎啉基乙酸甲酯、硫基嗎啉基乙酸甲酯、1-吡咯烷基乙酸乙酯、嗎啉基乙酸2-甲氧基乙酯、2-甲氧基乙酸2-嗎啉基乙酯、2-(2-甲氧基乙氧基)乙酸2-嗎啉基乙酯、2-〔2-(2-甲氧基乙氧基)乙氧基〕乙酸2-嗎啉基乙酯、己酸2-嗎啉基乙酯、辛酸2-嗎啉基乙酯、癸酸2-嗎啉基乙酯、月桂酸2-嗎啉基乙酯、肉荳蔻酸2-嗎啉基乙酯、棕櫚酸2-嗎啉基乙酯、硬脂酸2-嗎啉基乙酯、環己基羧酸2-嗎啉基乙酯、金剛烷羧酸2-嗎啉基乙酯等。
又,可添加以下述通式(Am-3)至(Am-6)所示含有氰基之胺化合物。
(式中Rx、R308
、k係與上述式(Am-1)相同,R309
、R310
係相同或不同之碳數1~4之直鏈狀或支鏈狀之伸烷基)。
含有氰基之胺化合物的具體例如3-(二乙胺基)丙腈、N,N-雙(2-羥乙基)-3-胺基丙腈、N,N-雙(2-乙醯氧乙基)-3-胺基丙腈、N,N-雙(2-甲醯氧乙基)-3-胺基丙腈、N,N-雙(2-甲氧乙基)-3-胺基丙腈、N,N-雙〔2-(甲氧甲氧基)乙基〕-3-胺基丙腈、N-(2-氰乙基)-N-(2-甲氧乙基)-3-胺基丙酸甲酯、N-(2-氰乙基)-N-(2-羥乙基)-3-胺基丙酸甲酯、N-(2-乙醯氧乙基)-N-(2-氰乙基)-3-胺基丙酸甲酯、N-(2-氰乙基)-N-乙基-3-胺基丙腈、N-(2-氰乙基)-N-(2-羥乙基)-3-胺基丙腈、N-(2-乙醯氧乙基)-N-(2-氰乙基)-3-胺基丙腈、N-(2-氰乙基)-N-(2-甲醯氧乙基)-3-胺基丙腈、N-(2-氰乙基)-N-(2-甲氧乙基)-3-胺基丙腈、N-(2-氰乙基)-N-〔2-(甲氧甲氧基)乙基〕-3-胺基丙腈、N-(2-氰乙基)-N-(3-羥基-1-丙基)-3-胺基丙腈、N-(3-乙醯基-1-丙基)-N-(2-氰乙基)-3-胺基丙腈、N-(2-氰乙基)-N-(3-甲醯氧基-1-丙基)-3-胺基丙腈、N-(2-氰乙基)-N-四氫糠基-3-胺基丙腈、N,N-雙(2-氰乙基)-3-胺基丙腈、二乙胺基乙腈、N,N-雙(2-羥乙基)胺基乙腈、N,N-雙(2-乙醯氧乙基)胺基乙腈、N,N-雙(2-甲醯氧乙基)胺基乙腈、N,N-雙(2-甲氧乙基)胺基乙腈、N,N-雙〔2-(甲氧甲氧基)乙基〕胺基乙腈、N-氰甲基-N-(2-甲氧乙基)-3-胺基丙酸甲酯、N-氰甲基-N-(2-羥乙基)-3-胺基丙酸甲酯、N-(2-乙醯氧乙基)-N-氰甲基-3-胺基丙酸甲酯、N-氰甲基-N-(2-羥乙基)胺基乙腈、N-(2-乙醯氧乙基)-N-(氰甲基)胺基乙腈、N-氰甲基-N-(2-甲醯氧乙基)胺基乙腈、N-氰甲基-N-(2-甲氧乙基)胺基乙腈、N-氰甲基-N-〔2-(甲氧甲氧基)乙基〕胺基乙腈、N-(氰甲基)-N-(3-羥基-1-丙基)胺基乙腈、N-(3-乙醯氧基-1-丙基)-N-(氰甲基)胺基乙腈、N-氰甲基-N-(3-甲醯氧基-1-丙基)胺基乙腈、N,N-雙(氰甲基)胺基乙腈、1-吡咯烷丙腈、1-哌啶丙腈、4-嗎啉丙腈、1-吡咯烷乙腈、1-哌啶乙腈、4-嗎啉乙腈、3-二乙胺基丙酸氰甲酯、N,N-雙(2-羥乙基)-3-胺基丙酸氰基甲酯、N,N-雙(2-乙醯氧乙基)-3-胺基丙酸氰甲酯、N,N-雙(2-甲醯氧乙基)-3-胺基丙酸氰甲酯、N,N-雙(2-甲氧乙基)-3-胺基丙酸氰甲酯、N,N-雙〔2-(甲氧甲氧基)乙基〕-3-胺基丙酸氰甲酯、3-二乙胺基丙酸(2-氰乙基)酯、N,N-雙(2-羥乙基)-3-胺基丙酸(2-氰乙基)酯、N,N-雙(2-乙醯氧乙基)-3-胺基丙酸(2-氰乙基)酯、N,N-雙(2-甲醯氧乙基)-3-胺基丙酸(2-氰乙基)酯、N,N-雙(2-甲氧乙基)-3-胺基丙酸(2-氰乙基)酯、N,N-雙〔2-(甲氧甲氧基)乙基〕-3-胺基丙酸(2-氰乙基)酯、1-吡咯烷丙酸氰甲酯、1-哌啶丙酸氰甲酯、4-嗎啉丙酸氰甲酯、1-吡咯烷丙酸(2-氰乙基)酯、1-哌啶丙酸(2-氰乙基)酯、4-嗎啉丙酸(2-氰乙基)酯。
又,可添加下述通式(Am-7)表示之具有咪唑骨架及極性官能基之胺化合物,
(式中,R311
為氫原子之一部份或全部可被氟原子所取代之碳數2~20之直鏈狀支鏈狀或環狀之具有極性官能基之烷基,極性官能基係含有1個或多個羥基、羰基、酯基、醚基、硫醚基、碳酸酯基、氰基、縮醛基。R312
、R313
及R314
為氫原子、碳數1~10之直鏈狀、支鏈狀或環狀的烷基、芳基或芳烷基)。
又,可添加下述通式(Am-8)表示之具有苯並咪唑骨架及極性官能基之胺化合物,
(式中,R315
為氫原子的一部份或全部可被氟原子所取代之碳數1~20之直鏈狀、支鏈狀或環狀之具有極性官能基之烷基,極性官能基係含有1個以上之酯基、縮醛基、氰基,其他為含有1個以上之羥基、羰基、酯基、醚基、硫醚基、碳酸酯基。R316
為氫原子、碳數1~10之直鏈狀、支鏈狀或環狀之烷基、芳基或芳烷基)。
又,例如可添加下述通式(Am-9)及(Am-10)所示具有極性官能基之含氮雜環化合物。
(式中,J為氮原子或≡C-R323
。K為氮原子或≡C-R324
。R317
為氫原子之一部份或全部可被氟原子所取代之碳數2~20之直鏈狀、支鏈狀或環狀之具有極性官能基的烷基,極性官能基為含有一個以上之羥基、羰基、酯基、醚基、硫醚基、碳酸酯基、氰基或縮醛基。R318
、R319
、R320
、R321
係氫原子、碳數1~10之直鏈狀、支鏈狀或環狀之烷基或芳基,或R318
與R319
、R320
與R321
可分別鍵結形成苯環、萘環或吡啶環。R322
為氫原子、碳數1~10之直鏈狀、支鏈狀或環狀之烷基或芳基。R323
、R324
為氫原子、碳數1~10之直鏈狀、支鏈狀或環狀之烷基或芳基。R322
與R324
可鍵結形成苯環或萘環)。
又,例如可添加下述通式(Am-11)~(Am-14)表示之具有芳香族羧酸酯結構之胺化合物。
(式中,R325
為碳數6~20之芳基或碳數4~20之雜芳基,氫原子之一部份或全部可被鹵原子、碳數1~20之直鏈狀、支鏈狀或環狀之烷基、碳數6~20之芳基、碳數7~20之芳烷基、碳數1~10之烷氧基、碳數1~10之醯氧基、或碳數1~10之烷硫基所取代。R326
為CO2
R327
、OR328
或氰基。R327
為一部份之伸甲基可被氧原子取代之碳數1~10之烷基。R328
係一部份之伸甲基可被氧原子取代之碳數1~10之烷基或醯基。R329
為單鍵、伸甲基、伸乙基、硫原子或-O(CH2
CH2
O)h
-基。h=0、1、2、3或4。R330
為氫原子、甲基、乙基或苯基。T為氮原子或CR331
。U為氮原子或CR332
。V為氮原子或CR333
。R331
、R332
、R333
係各自獨立為氫原子、甲基或苯基,或R331
與R332
或R332
與R333
可鍵結形成碳數6~20之芳香環或碳數2~20之雜芳香環)。
又,可添加下述通式(Am-15)表示之具有7-氧雜降冰片烷-2-羧酸酯結構之胺化合物。
(式中,R334
為氫或碳數1~10之直鏈狀、支鏈狀或環狀之烷基。R335
及R336
係各自獨立為含有一個或多個醚基、羰基、酯基、醇、硫醚、腈、胺、亞胺、醯胺等極性官能基之碳數1~20之烷基、碳數6~20之芳基、碳數7~20之芳烷基,且氫原子之一部份可被鹵原子所取代。R335
與R336
可鍵結形成碳數2~20之雜環或雜芳香環)。
又,這些抑制劑可單獨使用1種或將2種以上組合使用,其添加量係對於基底樹脂100質量份時,添加0.001~2質量份,更佳為0.01~1質量份。添加量低於0.001質量份時,無法顯現添加效果,超過2質量份時,有時會造成感度過度降低。
又,本發明之式(1a)之光酸產生劑以外,添加(E)成份之光酸產生劑時,只要藉由紫外線、遠紫外線、電子線、EUV、X射線、準分子雷射、γ射線、同步輻射線等高能量線照射,產生酸之化合物即可。較佳之光酸產生劑例如有鋶鹽、碘鎓鹽、磺醯基重氮甲烷、N-磺醯氧基二羧基醯亞胺、O-芳基磺醯基肟、O-烷基磺醯基肟等之光酸產生劑等。如下詳述,其可單獨或將2種以上混合使用。
鋶鹽為鋶陽離子與磺酸鹽或雙(取代烷基磺醯基)醯亞胺、三(取代烷基磺醯基)甲基金屬的鹽,鋶陽離子例如有三苯鋶、4-第三丁氧苯基二苯鋶、雙(4-第三丁氧苯基)苯鋶、三(4-第三丁氧苯基)鋶、3-第三丁氧苯基二苯鋶、雙(3-第三丁氧苯基)苯鋶、三(3-第三丁氧苯基)鋶、3,4-二第三丁氧苯基二苯鋶、雙(3,4-二第三丁氧苯基)苯鋶、三(3,4-二第三丁氧苯基)鋶、二苯基(4-硫苯氧苯基)鋶、4-第三丁氧羰基甲氧苯基二苯鋶、三(4-第三丁氧羰基甲氧苯基)鋶、(4-第三丁氧苯基)雙(4-二甲胺基苯基)鋶、三(4-二甲胺基苯基)鋶、4-甲基苯基二苯鋶、4-第三丁苯基二苯基鋶、雙(4-甲基苯基)、雙(4-第三丁基苯基)苯基鋶、三(4-甲基苯基)鋶、三(4-第三丁基苯基)鋶、三(苯基甲基)鋶、2-萘基二苯基鋶、二甲基(2-萘基)鋶、4-羥苯基二甲基鋶、4-甲氧基苯基二甲基鋶、三甲基鋶、2-氧代環己基環己基甲基鋶、三萘基鋶、三苄基鋶、二苯基甲基鋶、二甲基苯基鋶、2-氧代丙基噻環戊鋶、2-氧代丁基噻環戊鋶、2-氧代-3,3-二甲基丁基噻環戊鋶、2-氧代-2-苯基乙基噻環戊鎓、4-正丁氧基萘基-1-噻環戊鋶、2-正丁氧基萘基-1-噻環戊鋶等;磺酸鹽例如有三氟甲烷磺酸鹽、五氟乙烷磺酸鹽、七氟丙烷磺酸鹽、九氟丁烷磺酸鹽、十三氟己烷磺酸鹽、全氟(4-乙基環己烷)磺酸鹽、十七氟辛烷磺酸鹽、2,2,2-三氟乙烷磺酸鹽、五氟苯磺酸鹽、4-(三氟甲基)苯磺酸鹽、4-氟苯磺酸鹽、均三甲苯磺酸鹽、2,4,6-三異丙基苯磺酸鹽、甲苯磺酸鹽、苯磺酸鹽、4-(對-甲苯磺醯氧基)苯磺酸鹽、6-(對-甲苯磺醯氧基)萘-2-磺酸鹽、4-(對-甲苯磺醯氧基)萘-1-磺酸鹽、5-(對-甲苯磺醯氧基)萘-1-磺酸鹽、8-(對-甲苯磺醯氧基)萘-1-磺酸鹽、萘磺酸鹽、樟腦磺酸鹽、辛烷磺酸鹽、十二烷基苯磺酸鹽、丁烷磺酸鹽、甲烷磺酸鹽、1,1-二氟-2-萘基-乙烷磺酸鹽、1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸鹽、1,1,2,2-四氟-2-(四環〔4.4.0.12,5
.17,10
〕十二烷-3-烯-8-基)乙烷磺酸鹽、2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽等;雙(取代烷基磺醯基)醯亞胺例如有雙(三氟甲基磺醯基)醯亞胺、雙(五氟乙基磺醯基)醯亞胺、雙(七氟丙基磺醯基)醯亞胺、全氟(1,3-丙烯雙磺醯基)醯亞胺等,三(取代烷基磺醯基)甲基化物例如有三(三氟甲基磺醯基)甲基化物,這些組合之鋶鹽。
碘鎓鹽係碘鎓陽離子與磺酸鹽或雙(取代烷基磺醯基)醯亞胺、三(取代烷基磺醯基)甲基化物之鹽,例如有二苯基碘鎓、雙(4-第三丁基苯基)碘鎓、4-第三丁氧基苯基苯基碘鎓、4-甲氧基苯基苯基碘鎓等;磺酸鹽例如有三氟甲烷磺酸鹽、五氟乙烷磺酸鹽、七氟丙烷磺酸鹽、九氟丁烷磺酸鹽、十三氟己烷磺酸鹽、全氟(4-乙基環己烷)磺酸鹽、十七氟辛烷磺酸鹽、2,2,2-三氟乙烷磺酸鹽、五氟苯磺酸鹽、4-(三氟甲基)苯磺酸鹽、4-氟苯磺酸鹽、均三甲苯磺酸鹽、2,4,6-三異丙基苯磺酸鹽、甲苯磺酸鹽、苯磺酸鹽、4-(對-甲苯磺醯氧基)苯磺酸鹽、6-(對-甲苯磺醯氧基)萘-2-磺酸鹽、4-(對-甲苯磺醯氧基)萘-1-磺酸鹽、5-(對-甲苯磺醯氧基)萘-1-磺酸鹽、8-(對-甲苯磺醯氧基)萘-1-磺酸鹽、萘磺酸鹽、樟腦磺酸鹽、辛烷磺酸鹽、十二烷基苯磺酸鹽、丁烷磺酸鹽、甲烷磺酸鹽、1,1-二氟-2-萘基-乙烷磺酸鹽、1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸鹽、1,1,2,2-四氟-2-(四環〔4.4.0.12,5
.17,10
)十二烷-3-烯-8-基)乙烷磺酸鹽、2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽等;雙(取代烷基磺醯基)醯亞胺例如有雙(三氟甲基磺醯基)醯亞胺、雙(五氟乙基磺醯基)醯亞胺、雙(七氟丙基磺醯基)醯亞胺、全氟(1,3-丙烯雙磺醯基)醯亞胺等,三(取代烷基磺醯基)甲基化物例如有三(三氟甲基磺醯基)甲基化物,這些組合之碘鎓鹽。
磺醯基重氮甲烷例如有雙(乙基磺醯基)重氮甲烷、雙(1-甲基丙基磺醯基)重氮甲烷、雙(2-甲基丙基磺醯基)重氮甲烷、雙(1,1-二甲基乙基磺醯基)重氮甲烷、雙(環己基磺醯基)重氮甲烷、雙(全氟異丙基磺醯基)重氮甲烷、雙(苯基磺醯基)重氮甲烷、雙(4-甲基苯基磺醯基)重氮甲烷、雙(2,4-二甲基苯基磺醯基)重氮甲烷、雙(4-乙醯氧基苯基磺醯基)重氮甲烷、雙(4-(甲烷磺醯氧基)苯基磺醯基)重氮甲烷、雙(4-(對-甲苯磺醯氧基)苯基磺醯基)重氮甲烷、雙(4-正己氧基)苯基磺醯基)重氮甲烷、雙(2-甲基-4-正己氧基苯基磺醯基)重氮甲烷、雙(2,5-二甲基-4-正己氧基苯基磺醯基)重氮甲烷、雙(3,5-二甲基-4-正己氧基苯基磺醯基)重氮甲烷、雙(2-甲基-5-異丙基-4-正己氧基苯基磺醯基)重氮甲烷、雙(2-萘基磺醯基)重氮甲烷、4-甲基苯基磺醯基苯甲醯基重氮甲烷、第三丁基羰基-4-甲基苯基磺醯基重氮甲烷、2-萘基磺醯基苯甲醯基重氮甲烷、4-甲基苯基磺醯基-2-萘甲醯基重氮甲烷、甲基磺醯基苯甲醯基重氮甲烷、第三丁氧基羰基-4-甲基苯基磺醯基重氮甲烷等之雙磺醯基重氮甲烷與磺醯基羰基重氮甲烷。
N-磺醯氧基二羧基醯亞胺型光酸產生劑,例如有琥珀酸醯亞胺、萘二羧基醯亞胺、苯二甲酸醯亞胺、環己基二羧基醯亞胺、5-降冰片烯-2,3-二羧基醯亞胺、7-氧雜雙環〔2.2.1〕-5-庚烯-2,3-二羧基醯亞胺等之醯亞胺骨架與三氟甲烷磺酸鹽、五氟乙烷磺酸鹽、七氟丙烷磺酸鹽、九氟丁烷磺酸鹽、十三氟己烷磺酸鹽、全氟(4-乙基環己烷)磺酸鹽、十七氟辛烷磺酸鹽、2,2,2-三氟乙烷磺酸鹽、五氟苯磺酸鹽、4-(三氟甲基)苯磺酸鹽、4-氟苯磺酸鹽、均三甲苯磺酸鹽、2,4,6-三異丙基苯磺酸鹽、甲苯磺酸鹽、苯磺酸鹽、4-(對-甲苯磺醯氧基)苯磺酸鹽、6-(對-甲苯磺醯氧基)萘-2-磺酸鹽、4-(對-甲苯磺醯氧基)萘-1-磺酸鹽、5-(對-甲苯磺醯氧基)萘-1-磺酸鹽、8-(對-甲苯磺醯氧基)萘-1-磺酸鹽、萘磺酸鹽、樟腦磺酸鹽、辛烷磺酸鹽、十二烷基苯磺酸鹽、丁烷磺酸鹽、甲烷磺酸鹽、1,1-二氟-2-萘基-乙烷磺酸鹽、1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸鹽、1,1,2,2-四氟-2-(四環〔4.4.0.12,5
.17,10
〕十二烷-3-烯-8-基)乙烷磺酸鹽、2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽等組合之化合物等。
苯偶因磺酸鹽型光酸產生劑,例如有苯偶因甲苯磺醯、苯偶因甲磺醯、苯偶因丁烷磺酸鹽等。
苯三酚三磺酸鹽型光酸產生劑,例如有苯三酚、間苯三酚、鄰苯二酚、間苯二酚、對苯二酚之全部羥基以三氟甲烷磺酸鹽、五氟乙烷磺酸鹽、七氟丙烷磺酸鹽、九氟丁烷磺酸鹽、十三氟己烷磺酸鹽、全氟(4-乙基環己烷)磺酸鹽、十七氟辛烷磺酸鹽、2,2,2-三氟乙烷磺酸鹽、五氟苯磺酸鹽、4-(三氟甲基)苯磺酸鹽、4-氟苯磺酸鹽、均三甲苯磺酸鹽、2,4,6-三異丙基苯磺酸鹽、甲苯磺酸鹽、苯磺酸鹽、4-(對-甲苯磺醯氧基)苯磺酸鹽、6-(對-甲苯磺醯氧基)萘-2-磺酸鹽、4-(對-甲苯磺醯氧基)萘-1-磺酸鹽、5-(對-甲苯磺醯氧基)萘-1-磺酸鹽、8-(對-甲苯磺醯氧基)萘-1-磺酸鹽、萘磺酸鹽、樟腦磺酸鹽、辛烷磺酸鹽、十二烷基苯磺酸鹽、丁烷磺酸鹽、甲烷磺酸鹽、1,1-二氟-2-萘基-乙烷磺酸鹽、1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸鹽、1,1,2,2-四氟-2-(四環〔4.4.0.12,5
.17,10
〕十二烷-3-烯-8-基)乙烷磺酸鹽、2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽等取代之化合物。
硝基苯甲基磺酸鹽型光酸產生劑,例如有2,4-二硝基苯甲基磺酸鹽、2-硝基苯甲基磺酸鹽、2,6-二硝基苯甲基磺酸鹽,磺酸鹽之具體例有三氟甲烷磺酸鹽、五氟乙烷磺酸鹽、七氟丙烷磺酸鹽、九氟丁烷磺酸鹽、十三氟己烷磺酸鹽、全氟(4-乙基環己烷)磺酸鹽、十七氟辛烷磺酸鹽、2,2,2-三氟乙烷磺酸鹽、五氟苯磺酸鹽、4-(三氟甲基)苯磺酸鹽、4-氟苯磺酸鹽、均三甲苯磺酸鹽、2,4,6-三異丙基苯磺酸鹽、甲苯磺酸鹽、苯磺酸鹽、4-(對-甲苯磺醯氧基)苯磺酸鹽、6-(對-甲苯磺醯氧基)萘-2-磺酸鹽、4-(對-甲苯磺醯氧基)萘-1-磺酸鹽、5-(對-甲苯磺醯氧基)萘-1-磺酸鹽、8-(對-甲苯磺醯氧基)萘-1-磺酸鹽、萘磺酸鹽、樟腦磺酸鹽、辛烷磺酸鹽、十二烷基苯磺酸鹽、丁烷磺酸鹽、甲烷磺酸鹽、1,1-二氟-2-萘基-乙烷磺酸鹽、1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸鹽、1,1,2,2-四氟-2-(四環〔4.4.0.12,5
.17,10
〕十二烷-3-烯-8-基)乙烷磺酸鹽、2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽等。也可使用苄基側之硝基被三氟甲基取代之化合物。
磺酸型光酸產生劑例如有雙(苯基磺醯基)甲烷、雙(4-甲基苯基磺醯基)甲烷、雙(2-萘基磺醯基)甲烷、2,2-雙(苯基磺醯基)丙烷、2,2-雙(4-甲基苯基磺醯基)丙烷、2,2-雙(2-萘基磺醯基)丙烷、2-甲基-2-(對-甲苯磺醯基)苯丙酮、2-(環己基羰基)-2-(對-甲苯磺醯基)丙烷、2,4-二甲基-2-(對-甲苯磺醯基)戊烷-3-酮等。
O-芳基磺醯基肟化合物或O-烷基磺醯基肟化合物(肟磺酸鹽)例如有乙二肟衍生物型之光酸產生劑、介由噻吩或環己二烯,共軛系較長之肟磺酸鹽型光酸產生劑、以三氟甲基等電子吸引基增加化合物之安定性的肟磺酸鹽、使用苯基乙腈、取代乙腈衍生物之肟磺酸鹽、雙肟磺酸鹽等。
乙二肟衍生物型之光酸產生劑例如雙-O-(對-甲苯磺醯基)-α-二甲基乙二肟、雙-O-(對-甲苯磺醯基)-α-二苯基乙二肟、雙-O-(對-甲苯磺醯基)-α-二環己基乙二肟、雙-O-(對-甲苯磺醯基)-2,3-戊二酮乙二肟、雙-O-(正丁烷磺醯基)-α-二甲基乙二肟、雙-O-(正丁烷磺醯基)-α-二苯基乙二肟、雙-O-(正丁烷磺醯基)-α-二環己基乙二肟、雙-O-(甲烷磺醯基)-α-二甲基乙二肟、雙-O-(三氟甲烷磺醯基)-α-二甲基乙二肟、雙-O-(2,2,2-三氟乙烷磺醯基)-α-二甲基乙二肟、雙-O-(10-樟腦磺醯基)-α-二甲基乙二肟、雙-O-(苯磺醯基)-α-二甲基乙二肟、雙-O-(4-氟苯磺醯基)-α-二甲基乙二肟、雙-O-(4-三氟甲基苯磺醯基)-α-二甲基乙二肟、雙-O-(二甲苯磺醯基)-α-二甲基乙二肟、雙-O-(三氟甲烷磺醯基)-環己二酮二肟、雙-O-(2,2,2-三氟乙烷磺醯基)-環己二酮二肟、雙-O-(10-樟腦磺醯基)-環己二酮二肟、雙-O-(苯磺醯基)-環己二酮二肟、雙-O-(4-氟苯磺醯基)-環己二酮二肟、雙-O-(4-(三氟甲基)苯磺醯基)-環己二酮二肟、雙-O-(二甲苯磺醯基)-環己二酮二肟等。又,例如上述骨架中被2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽所取代之化合物等。
介於噻吩或環己二烯之共軛系較長之肟磺酸鹽型光酸產生劑,例如有(5-(對-甲苯磺醯基)肟基-5H-噻吩-2-基亞基)苯基乙腈、(5-(10-樟腦磺醯基)肟基-5H-噻吩-2-基亞基)苯基乙腈、(5-正辛烷磺醯基肟基-5H-噻吩-2-基亞基)苯基乙腈、(5-(對-甲苯磺醯基)肟基-5H-噻吩-2-基亞基)(2-甲基苯基)乙腈、(5-(10-樟腦磺醯基)肟基-5H-噻吩-2-基亞基)(2-甲基苯基)乙腈、(5-正辛烷磺醯基肟基-5H-噻吩-2-基亞基)(2-甲苯基)乙腈、(5-(4-(對-甲苯磺醯基氧基)苯磺醯基)肟基-5H-噻吩-2-基亞基)苯基乙腈、(5-(2,5-雙(對-甲苯磺醯基氧基)苯磺醯基)肟基-5H-噻吩-2-基亞基)苯基乙腈等,又上述骨架中被2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽所取代之化合物。
以如三氟甲基等電子吸引基增加化合物安定性之肟磺酸酯型酸產生劑,例如2,2,2-三氟-1-苯乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-苯乙酮=O-(10-樟腦磺醯基)肟、2,2,2-三氟-1-苯乙酮=O-(4-甲氧苯磺醯基)肟、2,2,2-三氟-1-苯乙酮=O-(1-萘基磺醯基)肟、2,2,2-三氟-1-苯乙酮=O-(2-萘基磺醯基)肟、2,2,2-三氟-1-苯乙酮=O-(2,4,6-三甲基苯基磺醯基)肟、2,2,2-三氟-1-(4-甲基苯基)乙酮=O-(10-樟腦磺醯基)肟、2,2,2-三氟-1-(4-甲基苯基)乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-(2-甲基苯基)乙酮=O-(10(樟腦磺醯基)肟、2,2,2-三氟-1-(2,4-二甲基苯基)乙酮=O-(10-樟腦磺醯基)肟、2,2,2-三氟-1-(2,4-二甲基苯基)乙酮=O-(1-萘基磺醯基)肟、2,2,2-三氟-1-(2,4-二甲基苯基)乙酮=O-(2-萘基磺醯基)肟、2,2,2-三氟-1-(2,4,6-三甲基苯基)乙酮=O-(10-樟腦磺醯基)肟、2,2,2-三氟-1-(2,4,6-三甲基苯基)乙酮=O-(1-萘基磺醯基)肟、2,2,2-三氟-1-(2,4,6-三甲基苯基)乙酮=O-(2-萘基磺醯基)肟、2,2,2-三氟-1-(4-甲氧苯基)乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-(4-甲基硫苯基)乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-(3,4-二甲氧苯基)乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-(4-甲氧苯基)乙酮=O-(4-甲基苯基磺醯基)肟、2,2,2-三氟-1-(4-甲氧苯基)乙酮=O-(4-甲氧苯基磺醯基)肟、2,2,2-三氟-1-(4-甲氧苯基)乙酮=O-(4-十二烷基苯基磺醯基)肟、2,2,2-三氟-1-(4-甲氧苯基)乙酮=O-(辛基磺醯基)肟、2,2,2-三氟-1-(4-硫代甲基苯基)乙酮=O-(4-甲氧苯基磺醯基)肟、2,2,2-三氟-1-(4-硫代甲基苯基)乙酮=O-(4-十二烷基苯基磺醯基)肟、2,2,2-三氟-1-(4-硫代甲基苯基)乙酮=O-(辛基磺醯基)肟、2,2,2-三氟-1-(4-硫代甲基苯基)乙酮=O-(2-萘基磺醯基)肟、2,2,2-三氟-1-(2-甲基苯基)乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-(4-甲基苯基)乙酮=O-(苯基磺醯基)肟、2,2,2-三氟-1-(4-氯苯基)乙酮=O-(苯基磺醯基)肟、2,2,3,3,4,4,4-七氟-1-苯基丁酮=O-(10-樟腦磺醯基)肟、2,2,2-三氟-1-(1-萘基)乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-(2-萘基)乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-(4-苄基苯基)乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-(4-(苯基-1,4-二氧雜-丁-1-基)苯基)乙酮=O-(甲基磺醯基)肟、2,2,2-三氟-1-(1-萘基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(2-萘基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(4-苄基苯基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(4-甲基磺醯基苯基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(4-甲基磺醯氧基苯乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(4-甲基羰氧苯基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(6H,7H-5,8-二氧代萘-2-基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(4-甲氧羰基甲氧苯基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(4-(甲氧羰基)-(4-胺基-1-氧雜-戊-1-基)苯基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(3,5-二甲基-4-乙氧苯基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(4-苄氧基苯基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(2-硫代苯基)乙酮=O-(丙基磺酸酯)肟及2,2,2-三氟-1-(1-二氧雜噻吩-2-基)乙酮=O-(丙基磺酸酯)肟、2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(三氟甲烷磺醯肟基)乙基)苯氧基)丙氧基)苯基)乙酮=O-(三氟甲烷磺醯基)肟、2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(1-丙烷磺醯基肟基)乙基)苯氧基)丙氧基)苯基)乙酮=O-(丙基磺醯基)肟、2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(1-丁烷磺醯基肟基)乙基)苯氧基)丙氧基)苯基)乙酮=O-(丁基磺醯基)肟、2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(4-(4-甲基苯基磺醯基氧基)苯基磺醯基肟基)乙基)苯氧基)丙氧基)苯基)乙酮=O-(4-(4-甲基苯基磺醯基氧基)苯基磺醯基)肟、2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(2,5-雙(4-甲基苯基磺醯基氧基)苯磺醯基氧基)苯基磺醯基肟基)乙基)苯氧基)丙氧基)苯基)乙酮=O-(2,5-雙(4-甲基苯基磺醯基氧基)苯磺醯基氧基)苯基磺醯基)肟等,又上述骨架中被2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽所取代之化合物。
又,例如下述式(Ox-1)所示之肟磺酸鹽。
(上述式中,R401
為取代或無取代之碳數1~10之鹵烷基磺醯基、鹵苯磺醯基。R402
為碳數1~11之鹵烷基。Ar401
為取代或無取代之芳香族基或雜芳香族基)。
具體例如有2-〔2,2,3,3,4,4,5,5-八氟-1-(九氟丁基磺醯基肟基)-戊基〕-芴、2-〔2,2,3,3,4,4-五氟-1-(九氟丁基磺醯基肟基)-丁基〕-芴、2-〔2,2,3,3,4,4,5,5,6,6-十氟-1-(九氟丁基磺醯基肟基)-己基〕-芴、2-〔2,2,3,3,4,4,5,5-八氟-1-(九氟丁基磺醯基肟基)-戊基〕-4-聯苯、2-〔2,2,3,3,4,4-五氟-1-(九氟丁基磺醯基肟基)-丁基〕-4-聯苯、2-〔2,2,3,3,4,4,5,5,6,6-十氟-1-(九氟丁基磺醯基肟基)-己基〕-4-聯苯等,上述骨架中被2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽所取代之化合物。
使用取代乙腈衍生物之肟磺酸酯型,例如α-(p-甲苯磺醯基肟基)-苯基乙腈、α-(p-氯苯磺醯基肟基)-苯基乙腈、α-(4-硝基苯磺醯基肟基)-苯基乙腈、α-(4-硝基-2-三氟甲基苯磺醯基肟基)-苯基乙腈、α-(苯磺醯基肟基)-4-氯苯基乙腈、α-(苯磺醯基肟基)-2,4-二氯苯基乙腈、α-(苯磺醯基肟基)-2,6-二氯苯基乙腈、α-(苯磺醯基肟基)-4-甲氧苯基乙腈、α-(2-氯苯磺醯基肟基)-4-甲氧苯基乙腈、α-(苯磺醯基肟基)-2-噻吩基乙腈、α-(4-十二烷基苯磺醯基肟基)-苯基乙腈、α-(4-甲苯磺醯基肟基)-4-甲氧苯基)乙腈、α-(十二烷基苯磺醯基肟基)-4-甲氧苯基)乙腈、α-(甲苯基肟基)-3-噻吩基乙腈、α-(甲基磺醯基肟基)-1-環戊烯基乙腈、α-(乙基磺醯基肟基)-1-環戊烯基乙腈、α-(異丙基磺醯基肟基)-1-環戊烯基乙腈、α-(n-丁基磺醯基肟基)-1-環戊烯基乙腈、α-(乙基磺醯基肟基)-1-環己烯基乙腈、α-(異丙基磺醯基肟基)-1-環己烯基乙腈、α-(n-丁基磺醯基肟基)-1-環己烯基乙腈等。又,上述骨架中被2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽所取代之化合物。
又,雙肟磺酸酯例如有雙(α-(對-甲苯磺醯基氧基)亞胺基)-對-伸苯二乙腈、雙(α-(苯磺醯基氧基)亞胺基)-對-伸苯二乙腈、雙(α-(甲烷磺醯氧基)亞胺基)-對-伸苯二乙腈、雙(α-(丁烷磺醯氧基)亞胺基)-對-伸苯二乙腈、雙(α-(10-樟腦磺醯氧基)亞胺基)-對-伸苯二乙腈、雙(α-(三氟甲烷磺醯氧基)亞胺基)-對-伸苯二乙腈、雙(α-(4-甲氧苯磺醯基氧基)亞胺基)-對-伸苯二乙腈、雙(α-(對-甲苯磺醯基氧基)亞胺基)-m-伸苯二乙腈、雙(α-(苯磺醯基氧基)亞胺基)-m-伸苯二乙腈、雙(α-(甲烷磺醯氧基)亞胺基)-m-伸苯二乙腈、雙(α-(丁烷磺醯氧基)亞胺基)-m-伸苯二乙腈、雙(α-(10-樟腦磺醯氧基)亞胺基)-m-伸苯二乙腈、雙(α-(三氟甲烷磺醯氧基)亞胺基)-m-伸苯二乙腈、雙(α-(4-甲氧基苯磺醯基氧基)亞胺基)-m-伸苯二乙腈等,又,例如上述骨架中被2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-(4-苯基苯醯氧基)丙烷磺酸鹽、1,1,3,3,3-五氟-2-戊醯氧丙烷磺酸鹽、2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-呋喃醯氧基丙烷磺酸鹽、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、2-(4-第三丁基苯醯氧)-1,1,3,3,3-五氟丙烷磺酸鹽、2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸鹽、2-乙醯氧基-1,1,3,3,3-五氟丙烷磺酸鹽、1,1,3,3,3-五氟-2-羥基丙烷磺酸鹽、1,1,3,3,3-五氟-2-甲醯氧基丙烷磺酸鹽、1,1-二氟-2-甲醯氧基乙烷磺酸鹽、金剛烷甲氧羰基二氟甲烷磺酸鹽、1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸鹽、甲氧羰基二氟甲烷磺酸鹽、1-(六氫-2-氧代-3,5-甲-2H-環戊〔b〕呋喃-6-基氧羰基)二氟甲烷磺酸鹽、4-氧代-1-金剛烷氧羰基二氟甲烷磺酸鹽所取代之化合物。
KrF準分子雷射用之光阻材料使用上述(E)成份之光酸產生劑時,較佳為鋶鹽、雙磺醯基重氮甲烷、N-磺醯氧基二羧基醯亞胺、肟-O-磺酸鹽。具體而言,例如三苯基鋶=對-甲苯磺酸酯、三苯基鋶=樟腦磺酸酯、三苯基鋶=五氟苯磺酸酯、三苯基鋶=九氟丁烷磺酸酯、三苯基鋶=4-(對-甲苯磺醯基氧基)苯磺酸酯、三苯基鋶=2,4,6-三異丙基苯磺酸酯、4-第三丁氧苯基二苯基鋶=對-甲苯磺酸酯、4-第三丁氧苯基二苯基鋶=樟腦磺酸酯、4-第三丁氧苯基二苯基鋶=4-(對-甲苯磺醯基氧基)苯磺酸酯、4-第三丁基苯基二苯基鋶=樟腦磺酸酯、三(4-甲基苯基)鋶=樟腦磺酸酯、三(4-第三丁基苯基)鋶=樟腦磺酸酯、雙(第三丁基磺醯基)重氮甲烷、雙(環己基磺醯基)重氮甲烷、雙(2,4-二甲基苯基磺醯基)重氮甲烷、雙(4-正己基氧基苯基磺醯基)重氮甲烷、雙(2-甲基-4-正己基氧基苯基磺醯基)重氮甲烷、雙(2,5-二甲基-4-正己基氧基苯基磺醯基)重氮甲烷、雙(3,5-二甲基-4-正己基氧基苯基磺醯基)重氮甲烷、雙(2-甲基-5-異丙基-4-正己氧基)苯基磺醯基重氮甲烷、雙(4-第三丁基苯基磺醯基)重氮甲烷、N-樟腦磺醯基氧基-5-降冰片烯-2,3-二羧酸醯亞胺、N-對-甲苯磺醯基氧基-5-降冰片烯-2,3-二羧酸醯亞胺、(5-(10-樟腦磺醯基)肟基-5H-噻吩-2-基亞基)(2-甲基苯基)乙腈、(5-(對-甲苯磺醯基)肟基-5H-噻吩-2-亞基)(2-甲基苯基)乙腈等。
又,ArF準分子雷射用之光阻材料使用上述(E)成份之光酸產生劑時,較佳為鋶鹽或肟-O-磺酸酯。具體而言,例如三苯基鋶=三氟甲烷磺酸酯、三苯基鋶=五氟乙烷磺酸酯、三苯基鋶=七氟丙烷磺酸酯、三苯基鋶=九氟丁烷磺酸酯、三苯基鋶=十三氟己烷磺酸酯、三苯基鋶=十七氟辛烷磺酸酯、三苯基鋶=全氟(4-乙基環己烷)磺酸酯、4-甲基苯基二苯基鋶=九氟丁烷磺酸酯、2-氧代-2-苯基乙基硫代環戊鎓=九氟丁烷磺酸酯、4-第三丁基苯基二苯基鋶=九氟丁烷磺酸酯、4-第三丁基苯基二苯基鋶=全氟(4-乙基環己烷)磺酸酯、4-第三丁基苯基二苯基鋶=七氟辛烷磺酸酯、三苯基鋶=1,1-二氟-2-萘基乙烷磺酸酯、三苯基鋶=1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸酯、三苯基鋶=2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=1,1,3,3,3-五氟-2-(三甲基乙醯基氧基)丙烷磺酸酯、三苯基鋶=2-(環己烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=2-(2-萘醯氧基)-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=2-羥基-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=金剛烷甲氧羰基二氟甲烷磺酸酯、三苯基鋶=1-(3-羥基甲基金剛烷)甲氧羰基二氟甲烷磺酸酯、三苯基鋶=甲氧羰基二氟甲烷磺酸酯、4-第三丁基苯基二苯基鋶=2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=1,1,3,3,3-五氟-2-(三甲基乙醯基氧基)丙烷磺酸酯、4-第三丁基苯基二苯基鋶=2-(環己烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=2-(2-萘醯氧基)-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=2-羥基-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=金剛烷甲氧羰基二氟甲烷磺酸酯、4-第三丁基苯基二苯基鋶=1-(3-羥甲基金剛烷)甲氧羰基二氟甲烷磺酸酯、4-第三丁基苯基二苯基鋶=甲氧羰基二氟甲烷磺酸酯、2-氧代-2-苯基乙基硫代環戊鎓=2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-氧代-2-苯基乙基硫代環戊鎓=2-環己烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=全氟(1,3-伸丙基雙磺醯基)醯亞胺、三苯基鋶=雙(五氟乙基磺醯基)醯亞胺、2-(2,2,3,3,4,4,5,5-九氟-1-(九氟丁基磺醯基肟基)苄基)芴、2-(2,2,3,3,4,4-五氟-1-(九氟丁基磺醯基肟基)丁基)芴、2-(2,2,3,3,4,4,5,5,6,6-十氟-1-(九氟丁基磺醯基肟基)己基)芴、2-(2,2,3,3,4,4,5,5-十氟-1-(2-(環己烷羰氧基)-1,1,3,3,3-五氟丙烷磺醯基肟基)戊基)芴、2-(2,2,3,3,4,4-五氟-1-(2-(環己烷羰氧基)-1,1,3,3,3-五氟丙烷磺醯基肟基)丁基)芴、2-(2,2,3,3,4,4,5,5,6,6-十氟-1-(九氟丁基磺醯基肟基)己基)芴等。
又,ArF液浸光阻材料使用上述(E)成份之光酸產生劑時,較佳為鋶鹽或肟-O-磺酸酯。具體而言,例如三苯基鋶=九氟丁烷磺酸酯、三苯基鋶=十三氟己烷磺酸酯、三苯基鋶=十七氟辛烷磺酸酯、三苯基鋶=全氟(4-乙基環己烷)磺酸酯、4-甲基苯基二苯基鋶=九氟丁烷磺酸酯、2-氧代-2-苯基乙基硫代環戊鎓=九氟丁烷磺酸酯、4-第三丁基苯基二苯基鋶=九氟丁烷磺酸酯、4-第三丁基苯基二苯基鋶=全氟(4-乙基環己烷)磺酸酯、4-第三丁基苯基二苯基鋶=七氟辛烷磺酸酯、三苯基鋶=1,1-二氟-2-萘基乙烷磺酸酯、三苯基鋶=1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸酯、三苯基鋶=2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=1,1,3,3,3-五氟-2-(三甲基乙醯基氧基)丙烷磺酸酯、三苯基鋶=2-(環己烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=2-(2-萘醯基氧基)-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=2-羥基-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=金剛烷甲氧羰基二氟甲烷磺酸酯、三苯基鋶=1-(3-羥基甲基金剛烷)甲氧羰基二氟甲烷磺酸酯、三苯基鋶=甲氧羰基二氟甲烷磺酸酯、4-第三丁基苯基二苯基鋶=2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=1,1,3,3,3-五氟-2-(三甲基乙醯基氧基)丙烷磺酸酯、4-第三丁基苯基二苯基鋶=2-(環己烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=2-(2-萘醯氧基)-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=2-(1-金剛烷羰氧基)-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=2-羥基-1,1,3,3,3-五氟丙烷磺酸酯、4-第三丁基苯基二苯基鋶=金剛烷甲氧羰基二氟甲烷磺酸酯、4-第三丁基苯基二苯基鋶=1-(3-羥基甲基金剛烷)甲氧羰基二氟甲烷磺酸酯、4-第三丁基苯基二苯基鋶=甲氧羰基二氟甲烷磺酸酯、2-氧代-2-苯基乙基硫代環戊鎓=2-苯醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-氧代-2-苯基乙基硫代環戊鎓=2-環己烷羰氧-1,1,3,3,3-五氟丙烷磺酸酯、三苯基鋶=全氟(1,3-伸丙基雙磺醯基)醯亞胺、三苯基鋶=雙(五氟乙基磺醯基)醯亞胺、2-(2,2,3,3,4,4,5,5-九氟-1-(九氟丁基磺醯基肟基)戊基)芴、2-(2,2,3,3,4,4-五氟-1-(九氟丁基磺醯基肟基)丁基)芴、2-(2,2,3,3,4,4,5,5,6,6-十氟-1-(九氟丁基磺醯基肟基)己基)芴、2-(2,2,3,3,4,4,5,5-九氟-1-(2-(環己烷羰氧基)-1,1,3,3,3-五氟丙烷磺醯基肟基)戊基)芴、2-(2,2,3,3,4,4-五氟-1-(2-(環己烷羰氧基)-1,1,3,3,3-五氟丙烷磺醯基肟基)丁基)芴、2-(2,2,3,3,4,4,5,5,6,6-十氟-1-(九氟丁基磺醯基肟基)己基)芴等。
本發明之化學增幅光阻材料之(E)成份之光酸產生劑之添加量係只要不影響本發明之效果範圍內,並無限制,對於光阻材料中之基底樹脂100質量份時,添加0~10質量份,配合時為0.1~10質量份,較佳為0.1~5質量份。(E)成份之光酸產生劑之比例太高時,可能發生解像性劣化或顯像/光阻剝離時產生異物的問題。上述(E)成份之光酸產生劑可單獨或將2種以上混合使用。可使用曝光波長之透過率較低的光酸產生劑,以其添加量來控制光阻膜中之透過率。
又,混合使用2種以上之光酸產生劑,其中之一之光酸產生劑為產生弱酸之鎓鹽時,能具有酸擴散控制的功能。即,使用混合產生強酸(例如被氟取代之磺酸)之光酸產生劑與產生弱酸(例如未被氟取代之磺酸或羧酸)之鎓鹽時,經高能量線照射造成光酸產生劑所產生之強酸與具有未反應之弱酸陰離子之鎓鹽衝突時,藉由鹽交換釋出弱酸,產生具有強酸陰離子之鎓鹽。此過程中,因為強酸被交換成觸媒能力較低之弱酸,因此表觀上,使酸失去活性,可控制酸擴散。
產生強酸之鎓鹽與產生弱酸之鎓鹽混合使用時,如上所述,強酸可交換成弱酸,但是使弱酸與產生未反應之強酸之鎓鹽衝突,不會進行鹽交換。其係因鎓陽離子容易與更強酸之陰離子形成離子對的現象。
又,本發明之光阻材料中也可添加經由酸分解產生酸之化合物(酸增殖化合物)。這些化合物記載於J.Photopolym.Sci.and Tech.,8.43-44,45-46(1995)、J.Photopolym.Sci.and Tech.,9.29-30(1996))。
酸增殖化合物例如第三丁基-2-甲基-2-甲苯磺醯氧基甲基乙醯乙酸鹽、2-苯基-2-(2-甲苯磺醯氧基乙基)-1,3-二氧雜環丁烷等,但不限於這些化合物例。公知之光酸產生劑中,安定性、特別是熱安定性不良之化合物常具有酸增殖化合物之特性。
本發明之光阻材料之酸增殖化合物之添加量係對於光阻材料中之基底樹脂100質量份,添加2質量份以下,較佳為1質量份以下。添加量過多時,較難控制擴散,產生解像性劣化、圖案形狀劣化。
(F)成份之有機酸衍生物無特別的限制,具體例有苯酚、甲酚、鄰苯二酚、間苯二酚、苯三酚、氟甘氨酸、雙(4-羥苯基)甲烷、2,2-雙(4’-羥苯基)丙烷、雙(4-羥苯基)碸、1,1,1-三(4’-羥苯基)乙烷、1,1,2-三(4’-羥苯基)乙烷、羥基二苯甲酮、4-羥苯基乙酸、3-羥苯基乙酸、2-羥苯基乙酸、3-(4-羥苯基)丙酸、3-(2-羥苯基)丙酸、2,5-二羥苯基乙酸、3,4-二羥苯基乙酸、1,2-苯二乙酸、1,3-苯二乙酸、1,4-苯二乙酸、1,2-苯二氧基二乙酸、1,4-苯二丙酸、苯甲酸、水楊酸、4,4-雙(4’-羥苯基)戊酸、4-第三丁氧基苯基乙酸、4-(4-羥苯基)丁酸、3,4-二羥基苦杏仁酸、4-羥基苦杏仁酸等,其中較佳者為水楊酸、4,4-雙(4’-羥苯基)戊酸。其可單獨使用或組合2種以上使用。
氟取代醇可使用醇之α位以外被氟取代之化合物,無特別限定,較佳為具有1,1,1,3,3,3-六氟-2-丙醇末端的化合物。具體而言,例如下述化合物。
但是上述式中R’係上述基底樹脂中進行說明之式(C1)、(C2)表示之碳數2~30之縮醛基、碳數4~30之三級烷基等。
本發明之化學增幅光阻材料中之有機酸衍生物或氟取代醇的添加量係對於光阻材料中之基底樹脂100質量份時,添加5質量份以下,更佳為1質量份以下。添加量超過5質量份時,可能導致解像性不良。其於配合光阻中之組成的組合中,可不添加此有機酸衍生物等。
可添加藉由(G)成份之酸的作用,對於鹼性顯像液之溶解性產生變化之重量平均分子量3,000以下的化合物(溶解阻止劑),例如2,500以下之低分子量之酚或羧酸衍生物、氟取代醇之羥基之氫原子之一部份或全部被對酸不穩定之取代基取代的化合物。
重量平均分子量2,500以下之酚或羧酸衍生物,例如有雙酚A、雙酚H、雙酚S、4,4-雙(4’-羥苯基)戊酸、三(4-羥苯基)甲烷、1,1,1-三(4’-羥苯基)乙烷、1,1,2-三(4’-羥苯基)乙烷、酚酞、百里香酚酞、膽酸、脫氧膽酸、石膽酸等,氟取代醇例如與具有1,1,1,3,3,3-六氟-2-丙醇末端的化合物所例示者相同之化合物。對酸不穩定之取代基例如有上述聚合物之酸不穩定基所例示者。
較佳之溶解阻止劑例如有雙〔4-(2’-四氫吡喃氧基)苯基〕甲烷、雙〔4-(2’-四氫呋喃氧基)苯基〕甲烷、雙(4-第三丁氧基苯基)甲烷、雙(4-第三丁氧基羰氧基苯基)甲烷、雙(4-第三丁氧羰基甲氧基苯基)甲烷、雙〔4-(1’-乙氧基乙氧基)苯基〕甲烷、雙〔4-(1’-乙氧基丙氧基)苯基〕甲烷、2,2-雙〔4’-(2”-四氫吡喃氧基)苯基〕丙烷、2,2-雙〔4’-(2”-四氫呋喃氧基)苯基〕丙烷、2,2-雙(4’-第三丁氧基苯基)丙烷、2,2-雙(4’-第三丁氧基羰氧基苯基)丙烷、2,2-雙(4-第三丁氧基羰基甲氧基苯基)丙烷、2,2-雙〔4’-(1”-乙氧基乙氧基)苯基〕丙烷、2,2-雙〔4’-(1”-乙氧基丙氧基)苯基〕丙烷、4,4-雙〔4’-(2”-四氫吡喃氧基)苯基〕戊酸第三丁酯、4,4-雙〔4’-(2”-四氫呋喃氧基)苯基〕戊酸第三丁酯、4,4-雙(4’-第三丁氧基苯基)戊酸第三丁酯、4,4-雙(4-第三丁氧基羰氧基苯基)戊酸第三丁酯、4,4-雙(4’-第三丁氧基羰基甲氧基苯基)戊酸第三丁酯、4,4-雙〔4’-(1”-乙氧基乙氧基)苯基〕戊酸第三丁酯、4,4-雙〔4’-(1”-乙氧基丙氧基)苯基〕戊酸第三丁酯、三〔4-(2’-四氫吡喃氧基)苯基〕甲烷、三〔4-(2’-四氫呋喃氧基)苯基〕甲烷、三(4-第三丁氧基苯基)甲烷、三(4-第三丁氧基羰氧基苯基)甲烷、三(4-第三丁氧基羰氧基甲基苯基)甲烷、三〔4-(1’-乙氧基乙氧基)苯基〕甲烷、三〔4-(1’-乙氧基丙氧基)苯基〕甲烷、1,1,2-三〔4’-(2”-四氫吡喃氧基)苯基〕乙烷、1,1,2-三〔4’-(2”-四氫呋喃氧基)苯基〕乙烷、1,1,2-三(4’-第三丁氧基苯基)乙烷、1,1,2-三(4’-第三丁氧羰氧基苯基)乙烷、1,1,2-三(4’-第三丁氧基羰基甲氧基苯基)乙烷、1,1,2-三〔4’-(1’-乙氧基乙氧基)苯基〕乙烷、1,1,2-三〔4’-(1’-乙氧基丙氧基)苯基〕乙烷、膽酸第三丁酯、脫氧膽酸第三丁酯、石膽酸第三丁酯等。或日本特開2003-107706號公報所記載之化合物。
本發明之光阻材料中之(G)成份之溶解阻止劑的添加量係對於光阻材料中之基底樹脂100質量份時,添加20質量份以下,較佳為15質量份以下。多於20質量份時,因單體成份增加,因此,光阻材料之耐熱性會降低。
本發明之負型光阻材料所使用之(C’)成份之鹼可溶性樹脂,藉由交聯劑成為鹼難溶的樹脂,例如可使用上述之(C)成份之樹脂之取代酸不穩定基前的基底樹脂。
例如聚(對-羥基苯乙烯)、聚(間-羥基苯乙烯)、聚(4-羥基-2-甲基苯乙烯)、聚(4-羥基-3-甲基苯乙烯)、聚(α-甲基對-羥基苯乙烯)、局部氫化聚(對-羥基苯乙烯)共聚物、聚(對-羥基苯乙烯-α-甲基-對羥基苯乙烯)共聚物、聚(對-羥基苯乙烯-α-甲基苯乙烯)共聚物、聚(對-羥基苯乙烯-苯乙烯)共聚物、聚(對-羥基苯乙烯-間-羥基苯乙烯)共聚物、聚(對-羥基苯乙烯-苯乙烯)共聚物、聚(對-羥基苯乙烯-丙烯酸)共聚物、聚(對-羥基苯乙烯-甲基丙烯酸)共聚物、聚(對-羥基苯乙烯-丙烯酸甲酯)共聚物、聚(對-羥基苯乙烯-丙烯酸-甲基丙烯酸甲酯)共聚物、聚(對-羥基苯乙烯-丙烯酸甲酯)共聚物、聚(對-羥基苯乙烯-甲基丙烯酸-甲基丙烯酸甲酯)共聚物、聚甲基丙烯酸、聚丙烯酸、聚(丙烯酸-丙烯酸甲酯)共聚物、聚(甲基丙烯酸-甲基丙烯酸甲酯)共聚物、聚(丙烯酸-馬來醯亞胺)共聚物、聚(甲基丙烯酸-馬來醯亞胺)共聚物、聚(對-羥基苯乙烯-丙烯酸-馬來醯亞胺)共聚物、聚(對-羥基苯乙烯-甲基丙烯酸-馬來醯亞胺)共聚物等,但是不限於這些組合。
又,為了具有各種功能,可在上述酸不穩定基保護化聚合物之酚性羥基、羧基之一部份中導入取代基。例如為了提高與基板之密著性的取代基或為了提高耐蝕刻性的取代基,特別是為了控制未曝光部份、低曝光部份溶解於鹼顯像液之溶解速度太快,較佳為導入對酸或鹼比較安定的取代基。取代基例如有2-羥乙基、2-羥丙基、甲氧基甲基、甲氧基羰基、乙氧基羰基、甲氧基羰甲基、乙氧基羰甲基、4-甲基-2-氧代-4-氧雜環丁烷基、4-甲基-2-氧代-4-苯胺羰基、甲基、乙基、正丙基、異丙基、正丁基、第二丁基、乙醯基、三甲基乙醯基、金剛烷基、異冰片基、環己基等,但是不受此限。又,可導入酸分解性的取代基例如第三丁氧基羰基、第三丁基、第三丁氧基羰基甲基等比較不易酸分解的取代基。
本發明之光阻材料中之(C’)成份之樹脂的添加量可為任意量,但對於光阻材料中不含溶劑之全固形份100質量份時,添加65~99質量份,特別較佳為65~98質量份。
又,(H)成份之藉由酸之作用形成交聯結構的交聯劑,例如分子內具有二個以上之羥甲基、烷氧基甲基、環氧基或乙烯醚基的化合物,而取代甘脲衍生物、尿素衍生物、六(甲氧基甲基)三聚氰胺等適合作為本發明之化學增幅負型光阻材料之酸交聯劑。例如有N,N,N’,N’-四甲氧基甲基尿素與六甲氧基甲基三聚氰胺、四羥甲基取代甘脲類及如四甲氧基甲基甘脲之四烷氧基甲基取代甘脲類、取代及未取代雙-羥甲基酚類、雙酚A等之酚性化合物與環氧氯丙烷等之縮合物。特別理想之交聯劑例如有1,3,5,7-四甲氧基甲基甘脲等之1,3,5,7-四烷氧基甲基甘脲或1,3,5,7-四羥甲基甘脲、2,6-二羥甲基對甲酚、2,6-二羥甲基酚、2,2’,6,6’-四羥甲基雙酚A及1,4-雙〔2-(2-羥丙基)〕-苯、N,N,N’,N’-四甲氧基甲基尿素與六甲氧基甲基三聚氰胺等。
本發明之化學增幅光阻材料中之(H)成份之酸交聯劑的添加量可為任意,但對於光阻材料中之基底樹脂100質量份時,添加1~20質量份,較佳為5~15質量份。這些交聯劑可單獨或併用兩種以上使用。
本發明之化學增幅光阻材料中可添加為了提高塗佈性之界面活性劑、降低來自基板之散射之吸光性材料等的添加劑。
界面活性劑無特別限定,例如聚氧乙烯十二烷醚、聚氧乙烯十八烷醚、聚氧乙烯十六烷醚、聚氧乙烯油醚等之聚氧乙烯烷醚類、聚氧乙烯辛基苯酚醚、聚氧乙烯壬基苯酚醚等之聚氧乙烯烷基烯丙醚類、聚氧乙烯聚氧丙烯嵌段共聚物類、山梨糖醇酐單月桂酸酯、山梨糖醇酐單棕櫚酸酯、山梨糖醇酐單硬脂酸酯等之山梨糖醇酐脂肪酸酯類、聚氧乙烯山梨糖醇酐單月桂酸酯、聚氧乙烯山梨糖醇酐單棕櫚酸酯、聚氧乙烯山梨糖醇酐單硬脂酸酯、聚氧乙烯山梨糖醇酐三油酸酯、聚氧乙烯山梨糖醇酐三硬脂酸酯等之聚氧乙烯山梨糖醇酐脂肪酸酯之非離子界面活性劑,EFTOP EF301、EF303、EF352((股)Jemco製)、Megafac F171、F172、F173、R08、R30(大日本油墨化學工業(股)公司製)、Florade FC-430、FC-431、FC-4430、FC-4432(住友3M(股)公司製)、Asahiguard AG710、Surflon S-381、S-382、SC101、SC102、SC103、SC104、SC105、SC106、Surfynol E1004、KH-10、KH-20、KH-30及KH-40(旭玻璃(股)公司製)等之氟系界面活性劑,有機矽氧烷聚合物KP341、X-70-092、X-70-093(信越化學工業(股)公司製)、丙烯酸系或甲基丙烯酸系polyflow No.75、No.95(共榮社油脂化學工業(股)公司製),其中較佳者為FC430、Surflon S-381、Surfynol E1004、KH-20及KH-30。該類界面活性劑可單獨使用或組合2種以上使用。
本發明之化學增幅光阻材料中之界面活性劑的添加量係對於光阻材料中之基底樹脂100質量份時,添加2質量份以下,較佳為1質量份以下。
本發明之化學增幅光阻材料中可添加紫外線吸收劑。對此沒有特別限制,可使用日本特開平11-190904號公報記載者,較佳者有雙(4-羥苯基)亞碸、雙(4-第三丁氧基苯基)亞碸、雙(4-第三丁氧基羰氧基苯基)亞碸、雙〔4-(1-乙氧基乙氧基)苯基〕亞碸等之二芳基亞碸衍生物;雙(4-羥苯基)碸、雙(4-第三丁氧基苯基)碸、雙(4-第三丁氧基羰氧基苯基)碸、雙〔4-(1-乙氧基乙氧基)苯基〕碸、雙〔4-(1-乙氧基丙氧基)苯基〕碸等之二芳基碸衍生物;對苯醌二疊氮、萘醌二疊氮、蒽醌二疊氮、重氮芴、重氮萘滿酮、重氮菲酮等之重氮化合物;萘醌-1,2-二疊氮基-5-磺酸氯與2,3,4-三羥基二苯甲酮之全部或部份酯化合物、萘醌-1,2-二疊氮基-4-磺酸氯與2,4,4’-三羥基二苯甲酮之全部或局部酯化合物等之含醌二疊氮基化合物等,9-蒽羧酸第三丁酯、9-蒽羧酸第三戊酯、9-蒽羧酸第三甲氧基甲酯、9-蒽羧酸第三乙氧基乙酯、9-蒽羧酸2-第三-四氫吡喃酯、9-蒽羧酸2-第三-四氫呋喃酯等。
上述紫外線吸收劑之添加量係依光阻材料種類而不同,可添加或不添加,添加時,對於基底樹脂100質量份時,添加0~10質量份,較佳為0.5~10質量份,更較佳為1~5質量份。
使用本發明之化學增幅型光阻材料形成圖型時,可使用公知的微影技術,例如以旋轉塗佈、滾筒塗佈、流動塗佈、浸漬塗佈、噴霧塗佈、刮刀塗佈等適當塗佈方法,在製造積體電路用之基板(Si、SiO2
、SiN、SiON、TiN、WSi、BPSG、SOG、有機防反射膜等)或光罩電路製造用之基板(Cr,CrO,CrON,MoSi等)上,塗佈形成塗佈形成膜厚0.1~2.0μm,在加熱板上以60~150℃,預烘烤1~10分鐘,較佳為80~140℃下預烘烤1~5分鐘。接著選自紫外線、遠紫外線、電子線、EUV、X射線、準分子電射、γ射線、同步輻射線等之光源,較佳為300nm以下之曝光波長下,使目的之圖型通過所定光罩進行曝光。
其中較佳之光源為準分子電射,特別是KrF準分子雷射或245~255nm之遠紫外線、ArF準分子雷射。曝光量為1~200mJ/cm2
,較佳為10~100mJ/cm2
。在加熱板上,以60~150℃曝光後烘烤1~5分鐘,較佳為80~140℃曝光後烘烤1~3分鐘(PEB)。
使用0.1~5質量%,較佳為2~3質量%四甲基氫氧化銨(TMAH)等鹼性水溶液之顯像液,以浸漬(dip)法、攪拌法(puddle)、噴霧法(spray)等一般方法顯像0.1~3分鐘,較佳為0.5~2分鐘,然後在基板上形成目的之圖型。
本發明之光阻材料最適合於以高能量線,如254~193nm之遠紫外線、157nm之真空紫外線、電子線、X射線、準分子雷射、γ射線、同步輻射線形成精細圖案。又,在上述範圍的上限及下限外時,有時無法獲得目的之圖型。
本發明中,特別是曝光時使用波長193nm之ArF準分子雷射,在基板與投影透鏡之間插入水、甘油、乙二醇等之液體的液浸微影法。
以下,揭示合成例及實施例與比較例具體說明本發明,但是本發明不受下述實施例所限定。
〔合成例1〕三苯鋶氯之合成將二苯基亞碸40g(0.2莫耳)溶解於二氯甲烷400g中,在冰冷下攪拌。以不超過20℃之溫度下滴加三甲基甲矽烷基氯65g(0.6莫耳),再以此溫度熟成30分鐘。接著以不超過20℃的溫度下滴加另外由金屬鎂14.6g(0.6莫耳)與氯苯67.5g(0.6莫耳)、四氫呋喃(THF)168g所調製之Grignard試劑。經1小時反應熟成後,以不超過20℃的溫度下添加水50g,反應停止,再添加水150g、12N鹽酸10g及二乙醚200g。
分開取得水層,以二乙醚100g洗淨,得到三苯鋶氯水溶液。此水溶液不進行單離操作,直接以水溶液狀態用於其後之反應。
〔合成例2〕4-第三丁基苯基二苯基鋶溴化物之合成除了使用4-第三丁基溴苯取代合成例1之氯苯,增加萃取時之水量外,其餘與合成例1相同得到目的物。
〔合成例3〕4-第三丁氧基苯基二苯基鋶氯之合成除了使用4-第三丁氧基氯苯取代合成例1之氯苯,溶劑使用含有三乙胺5質量%之二氯甲烷溶劑,增加萃取時之水量外,其餘與合成例1相同得到目的物。
〔合成例4〕三(4-甲基苯基)鋶氯之合成除了使用雙(4-甲基苯基)亞碸取代合成例1之二苯基亞碸,使用4-氯甲苯取代合成例1之氯苯,增加萃取時之水量外,其餘與合成例1相同得到目的物。
〔合成例5〕三(4-第三丁基苯基)鋶溴化物之合成除了使用雙(4-第三丁基苯基)亞碸取代合成例1之二苯基亞碸,使用4-第三丁基溴苯取代合成例1之氯苯,增加萃取時之水量外,其餘與合成例1相同得到目的物。
〔合成例6〕雙(4-第三丁基苯基)碘鎓硫酸氫鹽之合成將第三丁基苯84g(0.5莫耳)、碘酸鉀53g(0.25莫耳)、乙酸酐50g之混合物,在冰冷下攪拌,以不超過30℃的溫度下滴加乙酸酐35g與濃硫酸95g之混合物。接著室溫下熟成3小時,再度冰冷後,滴加水250g,使反應停止。此反應液使用二氯甲烷400g萃取,有機層中添加亞硫酸氫鈉6g進行脫色。此有機層使用水250g洗淨,此操作重複三次。將洗淨後之有機層以減壓濃縮得到目的之粗生成物。此粗生成物不再進行純化,直接用於其後之反應。
〔合成例7〕苯醯甲基四氫噻吩鎓溴化物之合成將苯醯甲基溴化物88.2g(0.44莫耳)、四氫噻吩39.1g(0.44莫耳)溶解於硝基甲烷220g中,於室溫下攪拌4小時。反應液中添加水800g與二乙醚400g,分開取得分離之水層,得到目的之苯醯甲基四氫噻吩鎓溴化物水溶液。
〔合成例8〕二甲基苯基鋶硫酸鹽之合成將茴香硫醚6.2g(0.05莫耳)與二甲基硫酸6.9g(0.055莫耳)在室溫下攪拌12小時。反應液中添加水100g與二乙醚50ml,分開取得水層,得到目的之二甲基苯基鋶硫酸鹽水溶液。
〔合成例9〕2-苯甲醯氧基-1,1,3,3,3-五氟丙烷-1-磺酸鈉之合成將常法合成之1,1,3,3,3-五氟-2-丙烷-2-基苯甲酸鹽10.0g分散於水72g中,添加亞硫酸氫鈉12.0g與過氧化苯醯1.24g,在85℃下反應65小時。將反應液放置冷卻後,添加甲苯進行分液操作,分開取得之水層中添加飽和氯化鈉水溶液,將析出之白色結晶進行過濾。此結晶以少量飽和氯化鈉水溶液洗淨後,減壓乾燥得到目的之2-苯甲醯氧基-1,1,3,3,3-五氟丙烷-1-磺酸鈉〔白色結晶5.85g(收率43%)〕。
〔合成例10〕三苯基鋶-2-苯甲醯氧基-1,1,3,3,3-五氟丙烷-1-磺酸鹽之合成將相當合成例1之三苯基鋶氯水溶液0.011莫耳之水溶液與合成例9合成之2-苯甲醯氧基-1,1,3,3,3-五氟丙烷-1-磺酸鈉3.6g(0.01莫耳)在二氯甲烷50g中攪拌。分開取得有機層,此有機層以水50g洗淨3次。將有機層濃縮,殘渣中添加二乙醚25g產生結晶。將結晶過濾、乾燥得到目的物〔白色結晶4.5g(收率75%)〕。
〔合成例11〕三苯基鋶2-羥基-1,1,3,3,3-五氟丙烷-1-磺酸鹽之合成(PAG1)將合成例10之三苯基鋶2-苯甲醯氧基-1,1,3,3,3-五氟丙烷-1-磺酸鹽34.4g溶解於甲醇72g中,在冰冷下攪拌。以不超過10℃之溫度下滴加5%氫氧化鈉水溶液54.0g。以此溫度熟成4小時。接著以不超過10℃的溫度下滴加12N鹽酸6.8g,反應停止,減壓除去甲醇。添加二氯甲烷270g,有機層以水40g洗淨3次後,將有機層濃縮,殘渣中添加二乙醚60g產生結晶。將結晶過濾、乾燥得到目的物〔白色結晶24.3g(收率85%)〕。
〔合成例12~18〕除了使用合成例2~8所調製之鋶鹽外,與合成例10及合成例11相同合成目的物。這些鎓鹽(PAG2~PAG8)如下所示。
〔合成例19〕三苯基鋶環己烷-1,2-二羧酸氫1-(二氟硫甲基)-2,2,2-三氟乙酯之合成〔PAG A〕將合成例11之三苯基鋶2-羥基-1,1,3,3,3-五氟丙烷-1-磺酸鹽4.9g(0.01莫耳)、三乙胺1.0g(0.01莫耳)、N,N-二甲基胺基吡啶0.24g(0.002莫耳)溶解於乙腈20g中,添加cis-環己烷-1,2-二羧酸酐1.85g(0.012莫耳),50℃下加熱攪拌24小時。添加由12N鹽酸2g與水20g所調製之稀鹽酸水溶液後,將乙腈減壓餾去。殘渣中添加二氯甲烷50g與水20g,分開取得有機層,接著此有機層以水20g洗淨,減壓餾去二氯甲烷。殘渣中添加醚,進行再結晶純化,過濾、乾燥得到目的物〔白色結晶3.8g(收率59%)〕。
以下揭示製得之目的物之光譜數據。核磁共振光譜(1
H-NMR,19
F-NMR/DMSO-d6
)如圖1、圖2所示。
紅外線吸收光譜(IR(KBr);cm-1
)3066、2940、2859、1768、1733、1477、1448、1371、1326、1276、1251、1232、1189、1166、1145、1112、1074、995、750、682、642、503
飛行時間型質量分析(TOFMS;MALDI)POSITIVE M+
263((C6
H5
)3
S+
相當)NEGATIVE M-
383(CF3
CH(OCO-C6
H10
-CO2
H)CF2
SO3 -
相當)
〔合成例20〕三苯基鋶雙環〔2.2.1〕庚烷-2,3-二羧酸環己基1-(二氟硫甲基)-2,2,2-三氟乙酯之合成〔PAG B〕將合成例11之三苯基鋶2-羥基-1,1,3,3,3-五氟丙烷-1-磺酸鹽4.9g(0.01莫耳)、三乙胺1.0g(0.01莫耳)、N,N-二甲基胺基吡啶0.24g(0.002莫耳)溶解於乙腈20g中進行冰冷。在不超過50℃下添加3-環己氧基羰基雙環〔2.2.1〕庚烷-2-羰基氯3.4g(0.012莫耳),室溫下攪拌1小時。添加由12N鹽酸1g與水10g所調製之稀鹽酸水溶液後,將乙腈減壓餾去。殘渣中添加二氯甲烷100g與水20g,分開取得有機層,接著此有機層以水20g洗淨,減壓餾去二氯甲烷。殘渣中添加醚,分離後之油狀物重複3次傾析。油狀物經減壓乾固得到玻璃狀固體之目的物5.8g(收率82%)。
以下揭示製得之目的物之光譜數據。核磁共振光譜(1
H-NMR,19
F-NMR/DMSO-d6
)如圖3、圖4所示。
紅外線吸收光譜(IR(KBr);cm-1
)2940、1762、1720、1477、1448、1371、1265、1251、1214、1184、1116、1087、1072、995、750、684、642、530
飛行時間型質量分析(TOFMS;MALDI)POSITIVE M+
263((C6
H5
)3
S+
相當)NEGATIVE M-
383(CF3
CH(OCO-C7
H10
-CO2
C6
H11
)CF2
SO3 -
相當)
〔合成例21〕三苯基鋶六氫-3,5-甲-2H-環戊〔b〕呋喃-2-氧代-7-羧酸=1-二氟硫甲基-2,2,2-三氟乙酯之合成〔PAG C〕除了使用六氫-3,5-甲-2-氧代-2H-環戊〔b〕呋喃-7-羧酸氯2.0g(0.01莫耳)取代合成例20之3-環己氧基羰基雙環〔2.2.1〕庚烷-2-羰基氯外,與合成例20同樣得到玻璃狀固體之目的物。
以下揭示製得之目的物之光譜數據。核磁共振光譜(1
H-NMR,19
F-NMR/DMSO-d6
)如圖5、圖6所示。
紅外線吸收光譜(IR(KBr);cm-1
)2973、1779、1477、1448、1369、1315、1253、1216、1186、1166、1135、1101、1087、1070、1035、995、983、950、840、750、684、640、578、551、522、501
飛行時間型質量分析(TOFMS;MALDI)POSITIVE M+
263((C6
H5
)3
S+
相當)NEGATIVE M-
393(CF3
CH(OCO-C8
H9
O2
)CF2
SO3 -
相當)
以下揭示〔PAG A〕、〔PAG B〕、〔PAG C〕之結構。
〔PAG A〕之陰離子部之環己烷-1,2-二羧酸衍生物有cis,trans。〔PAGB〕之陰離子部之雙環〔2.2.1〕庚烷-2,3-二羧酸衍生物有兩處之endo-、exo,〔PAG C〕之六氫-3,5-甲-2H-環戊〔b〕呋喃-2-氧代-7-羧酸衍生物有一處之endo-、exo。分析結果,〔PAG A〕、〔PAG B〕、〔PAG C〕皆為異構性混合物。
本發明之光酸產生劑可僅單一化合物所構成,或異構性混合物所構成。
〔合成例22~42〕使用合成例12~18合成之PAG2~PAG8,與合成例19~21同樣的方法合成〔PAG D〕~〔PAG X〕。
〔合成例43〕三苯基鋶4-金鋼烷酮-1-羧酸=1-(二氟硫甲基)-2,2,2-三氟乙酯之合成〔PAG Y〕5-羥基-2-金鋼烷酮與硫酸、蟻酸之反應合成之4-金鋼烷酮-1-羧酸,再藉由乙二醯氯形成對應之羧酸氯。
將合成例11之三苯基鋶2-羥基-1,1,3,3,3-五氟丙烷-1-磺酸鹽4.9g(0.01莫耳)、三乙胺1.0g(0.01莫耳)、N,N-二甲基胺基吡啶0.24g(0.002莫耳)溶解於乙腈20g中進行冰冷。在不超過5℃下添加上述4-金鋼烷酮-1-羰基氯2.6g(0.012莫耳),室溫下攪拌1小時。添加由12N鹽酸1g與水10g所調製之稀鹽酸水溶液後,將乙腈減壓餾去。殘渣中添加二氯甲烷50g、甲基異丁酮50g及水20g,分開取得有機層,接著此有機層以水20g洗淨,減壓餾去溶劑。殘渣中添加醚,分離後之油狀物重複3次傾析。油狀物經減壓乾固得到油狀之目的物4.3g(收率65%)。
以下揭示製得之目的物之光譜數據。核磁共振光譜(1
H-NMR,19
F-NMR/DMSO-d6
)如圖7、圖8所示。以1
H-NMR確認僅有少量二氯甲烷、甲基異丁酮殘留。
紅外線吸收光譜(IR(KBr);cm-1
)2937、2861、1758、1724、1687、1477、1448、1373、1326、1251、1218、1186、1162、1089、1074、1033、995、917、750、684、640、574、551、516、503
飛行時間型質量分析(TOFMS;MALDI)POSITIVE M+
263((C6
H5
)3
S+
相當)NEGATIVE M-
405((C10
H13
O-COO)CH(CF3
)CF2
SO3 -
相當)
以下揭示〔PAGY〕之結構。
〔合成例44〕三苯基鋶酞酸=氫1-(二氟硫甲基)-2,2,2-三氟乙酯之合成〔PAGZ1〕將合成例11之三苯基鋶2-羥基-1,1,3,3,3-五氟丙烷-1-磺酸鹽4.9g(0.01莫耳)溶解於四氫呋喃20g中,藉由乾冰/甲醇浴冷卻。添加正丁基鋰己烷溶液(0.01莫耳),接著在不超過5℃下添加酞酸酐3.0g(0.02莫耳),室溫下攪拌1小時。接著添加N,N,N’,N’-四甲基乙二胺0.1g(0.001莫耳),再攪拌1小時。添加由12N鹽酸1g與水10g所調製之稀鹽酸水溶液後,將四氫呋喃減壓餾去。殘渣中添加二氯甲烷50g、甲基異丁酮50g及水20g,分開取得有機層,接著此有機層以水20g洗淨,減壓餾去溶劑。殘渣中添加醚,形成結晶,得到白色結晶之目的物3.4g(收率50%)。
以下揭示製得之目的物之光譜數據。核磁共振光譜(1
H-NMR,19
F-NMR/DMSO-d6
)如圖9、圖10所示。
紅外線吸收光譜(IR(KBr);cm-1
)3064、2969、2935、1772、1727、1477、1448、1394、1371、1324、1280、1259、1228、1193、1168、1135、1110、1079、993、906、777、754、748、684、642、580、553、522、503
飛行時間型質量分析(TOFMS;MALDI)POSITIVE M+
263((C6
H5
)3
S+
相當)NEGATIVE M-
377((C7
H5
O2
-COO)CH(CF3
)CF2
SO3 -
相當)
以下揭示〔PAG Z1〕之結構。
〔合成例45〕三苯基鋶琥珀酸=氫1-(二氟硫甲基)-2,2,2-三氟乙酯之合成〔PAG Z2〕除了使用琥珀酸酐取代合成例19之環己烷-1,2-二羧酸酐外,與合成例19同樣操作得到白色結晶之目的物(收率76%)。
以下揭示製得之目的物之光譜數據。核磁共振光譜(1
H-NMR,19
F-NMR/DMSO-d6
)如圖11、圖12所示。
紅外線吸收光譜(IR(KBr);cm-1
)3093、3068、1776、1733、1477、1448、1421、1373、1321、1276、1238、1184、1170、1128、1076、995、948、906、838、752、684、642、512、503
飛行時間型質量分析(TOFMS;MALDI)POSITIVE M+
263((C6
H5
)3
S+
相當)NEGATIVE M-
329((C3
H5
O2
-COO)CH(CF3
)CF2
SO3 -
相當)
以下揭示〔PAG Z2〕之結構。
〔合成例46〕三苯基鋶3-環己烯-1,2-二羧酸=氫1-(二氟硫甲基)-2,2,2-三氟乙酯之合成〔PAG Z3〕除了使用3-環己烯-1,2-二羧酸酐取代合成例19之環己烷-1,2-二羧酸酐外,與合成例19同樣操作得到白色結晶之目的物(收率70%)。
以下揭示製得之目的物之光譜數據。核磁共振光譜(1
H-NMR,19
F-NMR/DMSO-d6
)如圖13、圖14所示。
紅外線吸收光譜(IR(KBr);cm-1
)3064、2971、1768、1735、1477、1448、1371、1324、1274、1249、1224、1189、1135、1072、995、750、684、642、503
飛行時間型質量分析(TOFMS;MALDI)POSITIVE M+
263((C6
H5
)3
S+
相當)NEGATIVE M-
381((C7
H9
O2
-COO)CH(CF3
)CF2
SO3 -
相當)
以下揭示〔PAG Z3〕之結構。
〔合成例47〕三苯基鋶4-環己酮羧酸=1-(二氟硫甲基)-2,2,2-三氟乙酯之合成〔PAG Z4〕除了使用4-環己烷羰基氯取代合成例43之4-金鋼烷酮-1-羰基氯外,與合成例43同樣操作得到油狀物之目的物(收率69%)。
以下揭示製得之目的物之光譜數據。核磁共振光譜(1
H-NMR,19
F-NMR/DMSO-d6
)如圖15、圖16所示。
紅外線吸收光譜(IR(KBr);cm-1
)1766、1712、1477、1448、1373、1324、1251、1216、1186、1116、1072、995、925、875、838、750、684、642
飛行時間型質量分析(TOFMS;MALDI)POSITIVE M+
263((C6
H5
)3
S+
相當)NEGATIVE M-
353((C6
H9
O-COO)CH(CF3
)CF2
SO3 -
相當)
以下揭示〔PAG Z4〕之結構。
(實施例1~11及比較例1,2)光阻材料之解像性評價使用上述合成例所示之光酸產生劑及下述式所示之聚合物(Polymer 1~8)作為基底樹脂使用,將阻止劑以下述表1所示之組成,溶解於含有KH-20(Semichemical(股)公司製)0.01質量%的溶劑中,調製光阻材料,再將光阻材料以0.2μm鐵氟龍(註冊商標)製過濾器過濾,分別調製光阻液。
以旋轉塗佈器將光阻溶液塗佈於矽基板上塗佈有防反射膜溶液(日產化學公司製ARC-29A),並經200℃烘烤60秒所製作之防反射膜(膜厚78nm)的基板上,使用加熱板以100℃烘烤60秒,製作120nm膜厚的光阻膜。使用ArF準分子雷射微步進機(Nikon(股)公司,NSR-S307E,NA=0.85,4/5輪帶照明,Cr光罩)對該光阻膜進行曝光,再以表2內之溫度烘烤60秒(PEB)後,使用2.38質量%之四甲基氫氧化銨水溶液顯像60秒。
光阻評價係將80nm群之線與間隙(line&space)以1:1解像之曝光量作為最佳曝光量(Eop、mJ/cm2
),並對此曝光量下分離之線與間隙之最小線寬(nm)作為評價光阻之解像度。疏密依存性之評價係在上述最佳曝光量下,測定光罩上尺寸130nm之孤立線圖型(1:10之孤立線圖型)之晶圓上實際尺寸,作為光罩忠實性(晶圓上尺寸,尺寸越大越佳)。
各光阻材料之組成結果如表1,評價結果如表2所示。
表1中,溶劑及阻止劑,比較例用之光酸產生劑如下述。
溶劑A:丙二醇單甲醚乙酸酯溶劑B:環己酮阻止劑A:三乙醇胺阻止劑B:三甲氧基甲氧基乙胺TPS-NfO:三苯基鋶全氟-1-丁烷磺酸鹽TPS-BzOPFPS:三苯基鋶2-苯醯氧基-1,1,3,3,3-五氟丙烷-1-磺酸鹽
其次使用實施例1、4、9及比較例1之光阻材料,進行模擬液浸曝光。具體而言,係與上述相同步驟形成125nm之光阻膜,使用ArF準分子雷射微步進機(Nikon(股)公司製,S307E,dipole)進行曝光。曝光隨後,將晶圓全面盛裝純水,將光阻曝光面浸漬於純水中60秒(puddle)。利用晶圓旋轉甩去純水後,以進行一般PEB步驟,接著顯像。顯像後所形成之圖型中之缺陷數使用缺陷檢查裝置WINWIN50-1200L(東京精密公司製)檢查,依下式得到缺陷密度。結果如表3所示。
缺陷密度(個/cm2
)=被檢出之總缺陷數/檢查面積形成之圖型:80nm/間距160nm線間隙之重覆圖型缺陷檢查條件:光源UV,檢查圖像尺寸0.125 μm,cell對cell之模式
使用掃描型電子顯微鏡觀察光阻剖面之圖型形狀。結果如表3所示。
由表2、3的結果得知本發明之光阻材料為高感度及高解像性,疏密依存性低,相較於以往製品而言,即使對於水之長時間清洗也無形狀變化及缺陷產生,可完全適用於液浸曝光。
〔圖1〕表示合成例19之〔PAG A〕之1
H-NMR/DMSO-d6
的圖。
〔圖2〕表示合成例19之〔PAG A〕之19
F-NMR/DMSO-d6
的圖。
〔圖3〕表示合成例20之〔PAG B〕之1
H-NMR/DMSO-d6
的圖。
〔圖4〕表示合成例20之〔PAG B〕之19
F-NMR/DMSO-d6
的圖。
〔圖5〕表示合成例21之〔PAG C〕之1
H-NMR/DMSO-d6
的圖。
〔圖6〕表示合成例21之〔PAG C〕之19
F-NMR/DMSO-d6
的圖。
〔圖7〕表示合成例43之〔PAG Y〕之1
H-NMR/DMSO-d6
的圖。
〔圖8〕表示合成例43之〔PAG Y〕之19
F-NMR/DMSO-d6
的圖。
〔圖9〕表示合成例44之〔PAG Z1〕之1
H-NMR/DMSO-d6
的圖。
〔圖10〕表示合成例44之〔PAG Z1〕之19
F-NMR/DMSO-d6
的圖。
〔圖11〕表示合成例45之〔PAG Z2〕之1
H-NMR/DMSO-d6
的圖。
〔圖12〕表示合成例45之〔PAG Z2〕之19
F-NMR/DMSO-d6
的圖。
〔圖13〕表示合成例46之〔PAG Z3〕之1
H-NMR/DMSO-d6
的圖。
〔圖14〕表示合成例46之〔PAG Z3〕之19
F-NMR/DMSO-d6
的圖。
〔圖15〕表示合成例47之〔PAG Z4〕之1
H-NMR/DMSO-d6
的圖。
〔圖16〕表示合成例47之〔PAG Z4〕之19
F-NMR/DMSO-d6
的圖。
Claims (15)
- 一種化學增幅型光阻材料用之光酸產生劑,其特徵係感應紫外線、遠紫外線、電子線、EUV、X射線、準分子雷射、γ射線或同步加速放射線之高能量線,產生下述通式(1a)所示之磺酸者,RC(=O)R1 -COOCH(CF3 )CF2 SO3 - H+ (1a)(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基,R1 係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造)。
- 一種鋶鹽,其特徵係以下述通式(2)表示,RC(=O)-R1 -COOCH(CF3 )CF2 SO3 - R2 R3 R4 S+ (2)(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基,R1 係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造,R2 、R3 及R4 係互相獨立表示取代或非 取代之碳數1~10之直鏈狀、支鏈狀或環狀之烷基、烯基或氧代烷基、或取代或非取代之碳數6~18之芳基、芳烷基或芳氧烷基,或R2 、R3 及R4 之中任2個以上互相鍵結,可與式中之硫原子共同形成環)。
- 一種鋶鹽,其特徵係以下述通式(2a)表示,RC(=O)-R1 -COOCH(CF3 )CF2 SO3 - (R5 (O)n )m Ph’S+Ph2 (2a)(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取代之碳數6~15之芳氧基或碳數4~15之雜芳氧基,R1 係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造,R5 係表示取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基或烯基、或取代或非取代之碳數6~14之芳基,m係表示1~5之整數,n係表示0(零)或1,Ph係表示苯基,Ph’係表示苯基之氫原子m個取代成R5 (O)n -基之基)。
- 一種碘鎓鹽,其特徵係以下述通式(2b)表示,RC(=O)-R1 -COOCH(CF3 )CF2 SO3 - ((R5 (O)n )m Ph’)2 I+ (2b)(式中,R係表示羥基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基、取代或非取代之碳數6~15之芳基或碳數4~15之雜芳基、取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷氧基、取代或非取 代之碳數6~15之芳氧基或碳數4~15之雜芳氧基,R1 係表示可含有具氧原子、氮原子或硫原子等之雜原子之取代基之碳數1~20的二價有機基,可與R共同形成單數或多數之環狀構造,R5 係表示取代或非取代之碳數1~20之直鏈狀、支鏈狀或環狀之烷基或烯基、或取代或非取代之碳數6~14之芳基,m係表示1~5之整數,n係表示0(零)或1,Ph’係表示苯基之氫原子m個取代成R5 (O)n -基之基)。
- 一種N-磺醯氧基醯亞胺化合物,其特徵係以下述通式(3a)表示,
- 一種肟磺酸鹽化合物,其特徵係下述通式(3b)表示,
- 一種光阻材料,其係由含有基底樹脂、酸產生劑及有機溶劑所構成之光阻材料,其特徵為該酸產生劑為產生申請專利範圍第1項之式(1a)表示之磺酸的光酸產生劑。
- 如申請專利範圍第7項之光阻材料,其中基底樹脂為選自聚(甲基)丙烯酸及其衍生物、環烯烴衍生物-馬來酸酐交互聚合物、環烯烴衍生物與馬來酸酐與聚丙烯酸或其衍生物之3或4元以上的共聚物、環烯烴衍生物-α-三氟甲基丙烯酸衍生物共聚物、聚降冰片烯、開環複分解聚合物及開環複分解聚合物氫化物之一種或兩種以上的高分子聚合物。
- 如申請專利範圍第7項之光阻材料,其中基底樹脂為含有矽原子之高分子結構體。
- 如申請專利範圍第7項之光阻材料,其中基底樹脂為含有氟原子之高分子結構體。
- 一種化學增幅正型光阻材料,其特徵係含有:申請專利範圍第8、9或10項之光阻材料中的基底樹脂、產生申請專利範圍第1項之通式(1a)表示之磺酸的光酸產生劑及溶劑,該基底樹脂為不溶或難溶於顯像液,藉由酸之作用成為可溶於顯像液。
- 如申請專利範圍第11項之化學增幅正型光阻材料,其係再添加抑制劑所成。
- 如申請專利範圍第11或12項之化學增幅正型光阻材料,其係尚含有溶解阻止劑。
- 一種圖型之形成方法,其特徵係包含:將申請專利範圍第7~13項中任一項之光阻材料塗佈於基板上的步驟;加熱處理後,介由光罩以波長300nm以下之高能量線進行曝光的步驟;於加熱處理後,使用顯像液進行顯像的步驟。
- 如申請專利範圍第14項之圖型之形成方法,其係使用波長193nm之ArF準分子雷射,在塗佈光阻材料之基板與投影透鏡之間插入水、甘油、乙二醇等液體的液浸微影法。
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Families Citing this family (60)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI332122B (en) * | 2005-04-06 | 2010-10-21 | Shinetsu Chemical Co | Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process |
EP1780199B1 (en) * | 2005-10-31 | 2012-02-01 | Shin-Etsu Chemical Co., Ltd. | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
JP4548616B2 (ja) * | 2006-05-15 | 2010-09-22 | 信越化学工業株式会社 | 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法 |
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WO2009057769A1 (ja) * | 2007-11-01 | 2009-05-07 | Central Glass Company, Limited | 新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
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US8791288B2 (en) * | 2009-05-26 | 2014-07-29 | Shin-Etsu Chemical Co., Ltd. | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process |
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JP5815575B2 (ja) | 2013-01-11 | 2015-11-17 | 信越化学工業株式会社 | パターン形成方法 |
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JP6515831B2 (ja) | 2015-02-25 | 2019-05-22 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト組成物及びレジストパターン形成方法 |
JP6298022B2 (ja) | 2015-08-05 | 2018-03-20 | 信越化学工業株式会社 | 高分子化合物、ポジ型レジスト組成物、積層体、及びレジストパターン形成方法 |
US10416558B2 (en) | 2016-08-05 | 2019-09-17 | Shin-Etsu Chemical Co., Ltd. | Positive resist composition, resist pattern forming process, and photomask blank |
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JP6714533B2 (ja) | 2017-03-22 | 2020-06-24 | 信越化学工業株式会社 | スルホニウム塩、レジスト組成物、及びパターン形成方法 |
JP6973274B2 (ja) * | 2017-05-22 | 2021-11-24 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
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US20210380629A1 (en) * | 2018-05-09 | 2021-12-09 | Vibrant Holdings, Llc | Methods of synthesizing a polynucleotide array using photoactivated agents |
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JP7067831B2 (ja) * | 2018-10-11 | 2022-05-16 | エルジー・ケム・リミテッド | 化合物、これを含むフォトレジスト組成物、これを含むフォトレジストパターン及びフォトレジストパターンの製造方法 |
JP7096189B2 (ja) | 2019-03-22 | 2022-07-05 | 信越化学工業株式会社 | レジスト組成物及びパターン形成方法 |
US12013639B2 (en) | 2020-08-13 | 2024-06-18 | Shin-Etsu Chemical Co., Ltd. | Positive resist material and patterning process |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW536549B (en) * | 1999-08-16 | 2003-06-11 | Shinetsu Chemical Co | Novel onium salts, photoacid generators for photo resist compositions, photo resist compositions, and patterning process |
TW200405128A (en) * | 2002-05-01 | 2004-04-01 | Shinetsu Chemical Co | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process |
TW594402B (en) * | 2000-10-23 | 2004-06-21 | Shinetsu Chemical Co | Novel onium salts, photoacid generators, resist compositions, and patterning process |
Family Cites Families (88)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0473547A1 (de) | 1990-08-27 | 1992-03-04 | Ciba-Geigy Ag | Olefinisch ungesättigte Oniumsalze |
JPH0725846A (ja) | 1993-07-14 | 1995-01-27 | Nec Corp | アルキルスルホニウム塩 |
US5635332A (en) | 1993-07-14 | 1997-06-03 | Nec Corporation | Alkylsulfonium salts and photoresist compositions containing the same |
JP2906999B2 (ja) | 1994-04-26 | 1999-06-21 | 信越化学工業株式会社 | レジスト材料 |
JP3063615B2 (ja) | 1995-03-16 | 2000-07-12 | 信越化学工業株式会社 | トリアリールスルホニウム塩の製造方法 |
JP3399166B2 (ja) | 1995-06-29 | 2003-04-21 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料 |
JP3830183B2 (ja) | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
JP3587413B2 (ja) | 1995-12-20 | 2004-11-10 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
JP3798458B2 (ja) | 1996-02-02 | 2006-07-19 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
TW513399B (en) | 1996-03-05 | 2002-12-11 | Shinetsu Chemical Co | Method for preparing triarylsulfonium salts |
JP3879139B2 (ja) | 1996-05-08 | 2007-02-07 | 住友化学株式会社 | グリオキシム系エステル、その製法および用途 |
TW546542B (en) | 1997-08-06 | 2003-08-11 | Shinetsu Chemical Co | High molecular weight silicone compounds, resist compositions, and patterning method |
US6048672A (en) | 1998-02-20 | 2000-04-11 | Shipley Company, L.L.C. | Photoresist compositions and methods and articles of manufacture comprising same |
TW457277B (en) | 1998-05-11 | 2001-10-01 | Shinetsu Chemical Co | Ester compounds, polymers, resist composition and patterning process |
JP3772249B2 (ja) | 1998-05-11 | 2006-05-10 | 信越化学工業株式会社 | 新規なエステル化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
US7704668B1 (en) | 1998-08-04 | 2010-04-27 | Rohm And Haas Electronic Materials Llc | Photoresist compositions and methods and articles of manufacture comprising same |
JP4131062B2 (ja) | 1998-09-25 | 2008-08-13 | 信越化学工業株式会社 | 新規なラクトン含有化合物、高分子化合物、レジスト材料及びパターン形成方法 |
JP3783780B2 (ja) | 1998-11-02 | 2006-06-07 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP3786206B2 (ja) | 1998-11-02 | 2006-06-14 | 信越化学工業株式会社 | エステル化合物及びその製造方法並びに高分子化合物 |
TWI228504B (en) | 1998-11-02 | 2005-03-01 | Shinetsu Chemical Co | Novel ester compounds, polymers, resist compositions and patterning process |
JP3680920B2 (ja) | 1999-02-25 | 2005-08-10 | 信越化学工業株式会社 | 新規なエステル化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
NL1014545C2 (nl) | 1999-03-31 | 2002-02-26 | Ciba Sc Holding Ag | Oxim-derivaten en de toepassing daarvan als latente zuren. |
SG78412A1 (en) | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
JP3944669B2 (ja) | 1999-05-19 | 2007-07-11 | 信越化学工業株式会社 | エステル化合物 |
JP3642228B2 (ja) | 1999-05-19 | 2005-04-27 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP4462397B2 (ja) | 1999-08-16 | 2010-05-12 | 信越化学工業株式会社 | 新規オニウム塩、レジスト材料及びパターン形成方法 |
NL1016815C2 (nl) | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
SG98433A1 (en) | 1999-12-21 | 2003-09-19 | Ciba Sc Holding Ag | Iodonium salts as latent acid donors |
US6723483B1 (en) | 1999-12-27 | 2004-04-20 | Wako Pure Chemical Industries, Ltd. | Sulfonium salt compounds |
JP4023086B2 (ja) | 1999-12-27 | 2007-12-19 | 和光純薬工業株式会社 | スルホニウム塩化合物 |
KR100490278B1 (ko) | 2000-03-06 | 2005-05-17 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 고분자 화합물, 레지스트 재료 및 패턴 형성 방법 |
JP4379565B2 (ja) | 2000-03-06 | 2009-12-09 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
TW548516B (en) | 2000-04-13 | 2003-08-21 | Shinetsu Chemical Co | Resist composition and patterning process |
JP4497266B2 (ja) | 2000-04-13 | 2010-07-07 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP4831278B2 (ja) | 2000-09-14 | 2011-12-07 | 信越化学工業株式会社 | 高分子化合物、レジスト材料、及びパターン形成方法 |
TW557304B (en) | 2000-09-14 | 2003-10-11 | Shinetsu Chemical Co | Polymer, resist composition and patterning process |
US6749987B2 (en) | 2000-10-20 | 2004-06-15 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
JP4150509B2 (ja) | 2000-11-20 | 2008-09-17 | 富士フイルム株式会社 | ポジ型感光性組成物 |
AU2002239563A1 (en) | 2000-11-03 | 2002-06-03 | Shipley Company, L.L.C. | Photoacid generators and photoresists comprising same |
JP2002193887A (ja) | 2000-12-26 | 2002-07-10 | Nippon Soda Co Ltd | ヨードニウム塩化合物の製造方法 |
KR20030029053A (ko) | 2001-04-05 | 2003-04-11 | 아치 스페셜티 케미칼즈, 인코포레이티드 | 포토레지스트용 퍼플루오로알킬설폰산 화합물 |
US6517994B2 (en) | 2001-04-10 | 2003-02-11 | Shin-Etsu Chemical Co., Ltd. | Lactone ring-containing (meth)acrylate and polymer thereof for photoresist composition |
JP4071021B2 (ja) | 2001-04-10 | 2008-04-02 | 信越化学工業株式会社 | ラクトン構造を有する(メタ)アクリレート化合物、その重合体、レジスト材料及びパターン形成方法 |
JP3876982B2 (ja) | 2001-04-23 | 2007-02-07 | 信越化学工業株式会社 | 高分子化合物、レジスト材料、パターン形成方法、及び新規テトラヒドロフラン化合物とその製造方法 |
US6794111B2 (en) | 2001-04-23 | 2004-09-21 | Shin-Etsu Chemical Co., Ltd. | Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation |
JP3972190B2 (ja) | 2001-06-15 | 2007-09-05 | 信越化学工業株式会社 | 高分子化合物、レジスト材料、及びパターン形成方法 |
JP4013044B2 (ja) | 2001-06-15 | 2007-11-28 | 信越化学工業株式会社 | レジスト材料、及びパターン形成方法 |
US6673518B2 (en) | 2001-06-15 | 2004-01-06 | Shin-Etsu Chemical Co., Ltd. | Polymer, resist composition and patterning process |
TW548518B (en) | 2001-06-15 | 2003-08-21 | Shinetsu Chemical Co | Resist material and patterning process |
JP3826777B2 (ja) | 2001-12-05 | 2006-09-27 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP4110319B2 (ja) | 2001-06-29 | 2008-07-02 | Jsr株式会社 | 感放射線性酸発生剤および感放射線性樹脂組成物 |
JP2003020313A (ja) | 2001-07-09 | 2003-01-24 | Shin Etsu Chem Co Ltd | 脂環構造を有する新規エポキシ化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
JP4045420B2 (ja) | 2001-07-13 | 2008-02-13 | 信越化学工業株式会社 | レジストパターン形成方法 |
TWI282036B (en) | 2001-07-13 | 2007-06-01 | Shinetsu Chemical Co | Resist patterning process |
JP4831277B2 (ja) | 2001-07-13 | 2011-12-07 | 信越化学工業株式会社 | 高分子化合物、レジスト材料、及びパターン形成方法 |
US6946233B2 (en) | 2001-07-24 | 2005-09-20 | Shin-Etsu Chemical Co., Ltd. | Polymer, resist material and patterning method |
JP3942506B2 (ja) | 2001-07-24 | 2007-07-11 | 信越化学工業株式会社 | 高分子化合物、レジスト材料、及びパターン形成方法 |
JP4054978B2 (ja) | 2001-08-24 | 2008-03-05 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
US7105267B2 (en) | 2001-08-24 | 2006-09-12 | Shin-Etsu Chemical Co., Ltd. | Resist compositions and patterning process |
JP4210836B2 (ja) | 2001-12-26 | 2009-01-21 | 信越化学工業株式会社 | 新規n−スルホニルオキシジカルボキシイミド化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法 |
JP4226842B2 (ja) | 2002-05-01 | 2009-02-18 | 信越化学工業株式会社 | 光酸発生剤、化学増幅レジスト材料及びパターン形成方法 |
JP3912512B2 (ja) | 2002-07-02 | 2007-05-09 | 信越化学工業株式会社 | 珪素含有高分子化合物、レジスト材料及びパターン形成方法 |
JP4200368B2 (ja) | 2002-07-02 | 2008-12-24 | 信越化学工業株式会社 | 珪素含有高分子化合物、レジスト材料及びパターン形成方法 |
US6919161B2 (en) | 2002-07-02 | 2005-07-19 | Shin-Etsu Chemical Co., Ltd. | Silicon-containing polymer, resist composition and patterning process |
JP2004059844A (ja) | 2002-07-31 | 2004-02-26 | Central Glass Co Ltd | 含フッ素高分子化合物 |
KR100937915B1 (ko) | 2002-07-31 | 2010-01-21 | 릴리 아이코스 엘엘씨 | 변형된 픽텟-스펭글러 반응 및 그것으로부터 제조된생성물 |
JP4410508B2 (ja) | 2002-08-07 | 2010-02-03 | セントラル硝子株式会社 | 含フッ素化合物とその高分子化合物 |
US7125943B2 (en) | 2002-08-07 | 2006-10-24 | Central Glass Company, Limited | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions |
JP2004099689A (ja) | 2002-09-06 | 2004-04-02 | Central Glass Co Ltd | 含フッ素多環式化合物、それを原料とした高分子化合物、及びそれを用いたフォトレジスト材料 |
JP4221560B2 (ja) | 2002-09-30 | 2009-02-12 | 信越化学工業株式会社 | ラクトン構造を有する三級(メタ)アクリレート化合物、その重合体、レジスト材料及びパターン形成方法 |
JP4371206B2 (ja) | 2002-09-30 | 2009-11-25 | 信越化学工業株式会社 | エステル化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
JP4032234B2 (ja) | 2002-09-30 | 2008-01-16 | 信越化学工業株式会社 | ケイ素含有重合性化合物、その製造方法、高分子化合物、レジスト材料及びパターン形成方法 |
JP3900276B2 (ja) | 2002-10-25 | 2007-04-04 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
US7256316B2 (en) | 2002-11-05 | 2007-08-14 | Central Glass Company, Limited | Fluorine-containing vinyl ethers, their polymers, and resist compositions using such polymers |
JP4410471B2 (ja) | 2003-01-10 | 2010-02-03 | セントラル硝子株式会社 | 含フッ素重合性単量体、含フッ素高分子化合物、それらを用いたレジスト材料 |
JP4133399B2 (ja) | 2003-02-10 | 2008-08-13 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
JP4557502B2 (ja) | 2003-02-21 | 2010-10-06 | セントラル硝子株式会社 | フッ素系環状化合物、フッ素系重合性単量体、フッ素系高分子化合物並びにそれを用いたレジスト材料及びパターン形成方法 |
JP4557500B2 (ja) | 2003-04-25 | 2010-10-06 | セントラル硝子株式会社 | フッ素系環状化合物 |
JP4114064B2 (ja) | 2003-05-27 | 2008-07-09 | 信越化学工業株式会社 | 珪素含有高分子化合物、レジスト材料及びパターン形成方法 |
JP2004354417A (ja) | 2003-05-27 | 2004-12-16 | Shin Etsu Chem Co Ltd | ポジ型レジスト材料並びにこれを用いたパターン形成方法 |
JP2005029527A (ja) | 2003-07-09 | 2005-02-03 | Central Glass Co Ltd | フッ素系環状化合物、フッ素系重合性単量体、フッ素系高分子化合物、並びにそれを用いたレジスト材料及びパターン形成方法 |
JP4326283B2 (ja) | 2003-07-10 | 2009-09-02 | セントラル硝子株式会社 | ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 |
JP4407814B2 (ja) | 2004-08-27 | 2010-02-03 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
EP1780198B1 (en) * | 2005-10-31 | 2011-10-05 | Shin-Etsu Chemical Co., Ltd. | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
EP1780199B1 (en) * | 2005-10-31 | 2012-02-01 | Shin-Etsu Chemical Co., Ltd. | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
JP4548616B2 (ja) * | 2006-05-15 | 2010-09-22 | 信越化学工業株式会社 | 熱酸発生剤及びこれを含むレジスト下層膜材料、並びにこのレジスト下層膜材料を用いたパターン形成方法 |
JP5124806B2 (ja) * | 2006-06-27 | 2013-01-23 | 信越化学工業株式会社 | 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
JP5124805B2 (ja) * | 2006-06-27 | 2013-01-23 | 信越化学工業株式会社 | 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
-
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- 2007-09-27 US US11/905,126 patent/US7527912B2/en active Active
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW536549B (en) * | 1999-08-16 | 2003-06-11 | Shinetsu Chemical Co | Novel onium salts, photoacid generators for photo resist compositions, photo resist compositions, and patterning process |
TW594402B (en) * | 2000-10-23 | 2004-06-21 | Shinetsu Chemical Co | Novel onium salts, photoacid generators, resist compositions, and patterning process |
TW200405128A (en) * | 2002-05-01 | 2004-04-01 | Shinetsu Chemical Co | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process |
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US7527912B2 (en) | 2009-05-05 |
TW200837049A (en) | 2008-09-16 |
KR101035742B1 (ko) | 2011-05-20 |
US20080085469A1 (en) | 2008-04-10 |
KR20080030504A (ko) | 2008-04-04 |
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