JP4326283B2 - ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 - Google Patents
ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 Download PDFInfo
- Publication number
- JP4326283B2 JP4326283B2 JP2003272780A JP2003272780A JP4326283B2 JP 4326283 B2 JP4326283 B2 JP 4326283B2 JP 2003272780 A JP2003272780 A JP 2003272780A JP 2003272780 A JP2003272780 A JP 2003272780A JP 4326283 B2 JP4326283 B2 JP 4326283B2
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- group
- compound
- acrylate
- methacrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/62—Halogen-containing esters
- C07C69/65—Halogen-containing esters of unsaturated acids
- C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
T. H. Fedynyshyn, A. Cabral, et al, J. Photopolym. Sci. Technol., 15, 655-666(2002) Ralph R. Dammel, Raj Sakamuri, et al, J. Photopolym. Sci. Technol., 14, 603-612 (2001) Loeb, Stephen J., Martin, John W. L., et al, Canadian Journal of Chemistry, 56, 2369(1978)
1H-NMR(CDCl3, TMS基準) δ:6.21(1H, br-s), 5.76(1H, br-s), 5.44-5.38(1H, m), 4.85(2H, s), 2.45(2H, dd, J=16.0, 6.0Hz), 2.37(2H, dd, J=16.0, 4.0Hz), 1.96(3H, s)
19F-NMR(CDCl3,CFCl3基準) δ:-77.2(6F, q, J=9.0Hz), -78.9(6F, q, J=9.0Hz)
AIBNは、重合開始剤であるアゾビスイソブチロニトリルを示す。
Claims (3)
- 一般式(1)
- 請求項1に記載の重合性アクリレート化合物を用いて重合または共重合された高分子化合物。
- オレフィン、含フッ素オレフィン、アクリル酸エステル、メタクリル酸エステル、含フッ素アクリル酸エステル、含フッ素メタクリル酸エステル、ノルボルネン化合物、含フッ素ノルボルネン化合物、スチレン化合物、含フッ素スチレン化合物、ビニルエーテル、含フッ素ビニルエーテルから選ばれた一種以上の単量体と共重合されたことを特徴とする請求項2に記載の高分子化合物。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003272780A JP4326283B2 (ja) | 2003-07-10 | 2003-07-10 | ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 |
PCT/JP2004/001210 WO2005005370A1 (ja) | 2003-07-10 | 2004-02-05 | ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 |
KR1020067000303A KR100665617B1 (ko) | 2003-07-10 | 2004-02-05 | 헥사플루오로카르비놀기를 함유하는 신규한 중합성아크릴레이트 화합물 및 그로부터 제조된 폴리머 |
EP04708494A EP1645554B1 (en) | 2003-07-10 | 2004-02-05 | Novel polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom |
CN2004800197103A CN1819987B (zh) | 2003-07-10 | 2004-02-05 | 含有六氟甲醇基的新型可聚合的丙烯酸酯化合物和由其制造的聚合物 |
DE602004030447T DE602004030447D1 (de) | 2003-07-10 | 2004-02-05 | Neue polymerisierbare acrylatverbindung, die eine hexafluorcarbinolgruppe enthält, und daraus hergestelltes polymer |
US10/563,961 US7750178B2 (en) | 2003-07-10 | 2004-02-05 | Polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003272780A JP4326283B2 (ja) | 2003-07-10 | 2003-07-10 | ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005029539A JP2005029539A (ja) | 2005-02-03 |
JP4326283B2 true JP4326283B2 (ja) | 2009-09-02 |
Family
ID=34055988
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003272780A Expired - Fee Related JP4326283B2 (ja) | 2003-07-10 | 2003-07-10 | ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7750178B2 (ja) |
EP (1) | EP1645554B1 (ja) |
JP (1) | JP4326283B2 (ja) |
KR (1) | KR100665617B1 (ja) |
CN (1) | CN1819987B (ja) |
DE (1) | DE602004030447D1 (ja) |
WO (1) | WO2005005370A1 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4326283B2 (ja) * | 2003-07-10 | 2009-09-02 | セントラル硝子株式会社 | ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 |
JP4484603B2 (ja) * | 2004-03-31 | 2010-06-16 | セントラル硝子株式会社 | トップコート組成物 |
JP4628809B2 (ja) * | 2005-02-01 | 2011-02-09 | 東京応化工業株式会社 | ネガ型レジスト組成物およびレジストパターン形成方法 |
TWI332122B (en) | 2005-04-06 | 2010-10-21 | Shinetsu Chemical Co | Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process |
US20070087125A1 (en) * | 2005-10-14 | 2007-04-19 | Central Glass Company, Limited. | Process for producing top coat film used in lithography |
JP5124805B2 (ja) * | 2006-06-27 | 2013-01-23 | 信越化学工業株式会社 | 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
JP5124806B2 (ja) * | 2006-06-27 | 2013-01-23 | 信越化学工業株式会社 | 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
US7527912B2 (en) * | 2006-09-28 | 2009-05-05 | Shin-Etsu Chemical Co., Ltd. | Photoacid generators, resist compositions, and patterning process |
JP5165227B2 (ja) * | 2006-10-31 | 2013-03-21 | 東京応化工業株式会社 | 化合物および高分子化合物 |
JP5401800B2 (ja) * | 2007-02-15 | 2014-01-29 | セントラル硝子株式会社 | 光酸発生剤用化合物及びそれを用いたレジスト組成物、パターン形成方法 |
US8207351B2 (en) | 2010-04-30 | 2012-06-26 | International Business Machines Corporation | Cyclic carbonyl compounds with pendant carbonate groups, preparations thereof, and polymers therefrom |
KR101633657B1 (ko) | 2011-12-28 | 2016-06-28 | 금호석유화학 주식회사 | 레지스트용 첨가제 및 이를 포함하는 레지스트 조성물 |
EP3731016A4 (en) * | 2017-12-22 | 2021-02-24 | FUJIFILM Corporation | COMPOSITION OF RESIN SENSITIVE TO ACTIVE LIGHT OR SENSITIVE TO RADIATION, RESERVE FILM, PATTERN FORMATION PROCESS, MASK FORMING INCLUDING RESERVE FILM, PHOTOMASK MANUFACTURING PROCESS AND ELECTRONIC DEVICE MANUFACTURING METHOD |
JP7277798B2 (ja) * | 2018-06-28 | 2023-05-19 | セントラル硝子株式会社 | フッ素樹脂膜形成用組成物 |
JP6489275B1 (ja) * | 2018-08-14 | 2019-03-27 | セントラル硝子株式会社 | 含フッ素重合性単量体の蒸留精製法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3438946A (en) * | 1966-12-06 | 1969-04-15 | Allied Chem | Fluoroalkyl-substituted esters,diesters,and polymers therefrom |
JPS60208311A (ja) | 1984-04-03 | 1985-10-19 | Asahi Glass Co Ltd | 含フツ素プラスチツク光学材料 |
US4578508A (en) * | 1985-02-26 | 1986-03-25 | Geo-Centers, Inc. | Fluoroacrylate ester, polymer thereof, and process of making the same |
CN1010098B (zh) * | 1985-05-25 | 1990-10-24 | 赫彻斯特股份公司 | α-氟代丙烯酸酯聚合物的制备方法 |
TW363976B (en) * | 1996-06-10 | 1999-07-11 | Nof Corp | Fluoride-containing polyfunctional (meth)acrylates, compositions comprising the same, materials with low refractivity and reflection-reduction film |
CN1177603A (zh) * | 1997-04-09 | 1998-04-01 | 中国科学院上海有机化学研究所 | 含氟碳基团水溶性高聚物、制备及应用 |
WO2002021213A2 (en) | 2000-09-08 | 2002-03-14 | Shipley Company, L.L.C. | Novel polymers and photoresist compositions for short wavelength imaging |
JP4083399B2 (ja) * | 2001-07-24 | 2008-04-30 | セントラル硝子株式会社 | 含フッ素重合性単量体およびそれを用いた高分子化合物 |
JP3999030B2 (ja) * | 2001-12-13 | 2007-10-31 | セントラル硝子株式会社 | 含フッ素重合性単量体およびそれを用いた高分子化合物、反射防止膜材料 |
US7108951B2 (en) * | 2002-02-26 | 2006-09-19 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
US6806026B2 (en) * | 2002-05-31 | 2004-10-19 | International Business Machines Corporation | Photoresist composition |
JP4326283B2 (ja) * | 2003-07-10 | 2009-09-02 | セントラル硝子株式会社 | ヘキサフルオロカルビノール基を含有する新規な重合性アクリレート化合物及びそれを用いた高分子化合物 |
-
2003
- 2003-07-10 JP JP2003272780A patent/JP4326283B2/ja not_active Expired - Fee Related
-
2004
- 2004-02-05 EP EP04708494A patent/EP1645554B1/en not_active Expired - Fee Related
- 2004-02-05 WO PCT/JP2004/001210 patent/WO2005005370A1/ja active Application Filing
- 2004-02-05 CN CN2004800197103A patent/CN1819987B/zh not_active Expired - Fee Related
- 2004-02-05 US US10/563,961 patent/US7750178B2/en not_active Expired - Fee Related
- 2004-02-05 KR KR1020067000303A patent/KR100665617B1/ko not_active IP Right Cessation
- 2004-02-05 DE DE602004030447T patent/DE602004030447D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1645554A4 (en) | 2006-09-13 |
US7750178B2 (en) | 2010-07-06 |
KR20060029280A (ko) | 2006-04-05 |
EP1645554A1 (en) | 2006-04-12 |
WO2005005370A1 (ja) | 2005-01-20 |
CN1819987A (zh) | 2006-08-16 |
JP2005029539A (ja) | 2005-02-03 |
KR100665617B1 (ko) | 2007-01-09 |
DE602004030447D1 (de) | 2011-01-20 |
CN1819987B (zh) | 2010-08-25 |
EP1645554B1 (en) | 2010-12-08 |
US20060217507A1 (en) | 2006-09-28 |
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