JP2005029527A - フッ素系環状化合物、フッ素系重合性単量体、フッ素系高分子化合物、並びにそれを用いたレジスト材料及びパターン形成方法 - Google Patents
フッ素系環状化合物、フッ素系重合性単量体、フッ素系高分子化合物、並びにそれを用いたレジスト材料及びパターン形成方法 Download PDFInfo
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- JP2005029527A JP2005029527A JP2003272269A JP2003272269A JP2005029527A JP 2005029527 A JP2005029527 A JP 2005029527A JP 2003272269 A JP2003272269 A JP 2003272269A JP 2003272269 A JP2003272269 A JP 2003272269A JP 2005029527 A JP2005029527 A JP 2005029527A
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- VYYVKHFJUOWWCH-UHFFFAOYSA-N FC(C(CC(C1)C2C=CC1C2)(C(F)(F)F)OCOCC(CC(C1)C23)C1C2OC3(C(F)(F)F)C(F)(F)F)(F)F Chemical compound FC(C(CC(C1)C2C=CC1C2)(C(F)(F)F)OCOCC(CC(C1)C23)C1C2OC3(C(F)(F)F)C(F)(F)F)(F)F VYYVKHFJUOWWCH-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F16/14—Monomers containing only one unsaturated aliphatic radical
- C08F16/26—Monomers containing oxygen atoms in addition to the ether oxygen
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D305/00—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms
- C07D305/14—Heterocyclic compounds containing four-membered rings having one oxygen atom as the only ring hetero atoms condensed with carbocyclic rings or ring systems
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
Abstract
【解決手段】 ノルボルナジエン類とヘキサフルオロアセトンから誘導されるオキサシクロブタン構造を有し、酸不安定性機能を併せ持つ新規なフッ素系環状化合物を見出した。このフッ素系環状化合物又はその誘導体を用いて重合又は共重合したフッ素系高分子化合物を用いることにより、優れたレジスト材料及びそれを用いた微細パターン形成方法を見出した。
【選択図】 なし
Description
本発明の一般式(6)で表されるフッ素系環状化合物は、一般式(1)、構造式(2)のいずれか1項に記載のフッ素系環状化合物から誘導される化合物である。
物性データ
MS(EI): m/e 324(M+), 289(M+-Cl), 259(M+-OCH2Cl)
IR: スペクトルを図1に示した。
物性データ
MS(EI): m/e 562(M+), 287, 275, 273, 259
物性データ
MS(EI): m/e 428(M+), 259(M+-OCH2O2CCH2CCF3)
IR: スペクトルを図2に示した。
物性データ
MS(EI):m/e 606(M+), 331, 289, 287, 275, 259, 241
Claims (15)
- 請求項1、2のいずれか1項に記載のフッ素系環状化合物から誘導される一般式(3)で表されるフッ素系環状化合物。
- 請求項1、2のいずれか1項に記載のフッ素系環状化合物から誘導される一般式(6)で表されるフッ素系環状化合物。
- 請求項1、2のいずれか1項に記載のフッ素系環状化合物から誘導される一般式(10)で表されるフッ素系環状化合物。
- 請求項1、2のいずれか1項に記載のフッ素系環状化合物から誘導される一般式(12)で表されるフッ素系環状化合物。
- 請求項3〜11のいずれか1項に記載のフッ素系環状化合物を用いて重合又は共重合したフッ素系高分子化合物。
- カルボキシル基、水酸基、ヘキサフルオロカービノール基、アミノ基、スルホン酸から選ばれた一種以上の官能基を含有した高分子と、請求項1又は2記載のフッ素系環状化合物とを反応することで得られたフッ素系高分子。
- 請求項12又は13記載のフッ素系高分子化合物を用いたレジスト材料。
- 請求項14記載のレジスト材料を用いたパターン形成方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003272269A JP2005029527A (ja) | 2003-07-09 | 2003-07-09 | フッ素系環状化合物、フッ素系重合性単量体、フッ素系高分子化合物、並びにそれを用いたレジスト材料及びパターン形成方法 |
PCT/JP2004/009680 WO2005005404A1 (ja) | 2003-07-09 | 2004-07-01 | フッ素系環状化合物、フッ素系重合性単量体、フッ素系高分子化合物、並びにそれを用いたレジスト材料及びパターン形成方法 |
KR1020067000510A KR101067970B1 (ko) | 2003-07-09 | 2004-07-01 | 불소계 환상 화합물, 불소계 중합성 단량체, 불소계 고분자화합물 및 그것을 사용한 레지스트 재료 및 패턴 형성방법 |
US10/563,557 US7232917B2 (en) | 2003-07-09 | 2004-07-01 | Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation |
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JP2003272269A JP2005029527A (ja) | 2003-07-09 | 2003-07-09 | フッ素系環状化合物、フッ素系重合性単量体、フッ素系高分子化合物、並びにそれを用いたレジスト材料及びパターン形成方法 |
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JP2005029527A true JP2005029527A (ja) | 2005-02-03 |
JP2005029527A5 JP2005029527A5 (ja) | 2007-11-08 |
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JP2003272269A Pending JP2005029527A (ja) | 2003-07-09 | 2003-07-09 | フッ素系環状化合物、フッ素系重合性単量体、フッ素系高分子化合物、並びにそれを用いたレジスト材料及びパターン形成方法 |
Country Status (4)
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US (1) | US7232917B2 (ja) |
JP (1) | JP2005029527A (ja) |
KR (1) | KR101067970B1 (ja) |
WO (1) | WO2005005404A1 (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006310566A (ja) * | 2005-04-28 | 2006-11-09 | Asahi Glass Co Ltd | 加工基板の製造方法 |
JP2006310565A (ja) * | 2005-04-28 | 2006-11-09 | Asahi Glass Co Ltd | 加工基板の製造方法 |
WO2008023555A1 (fr) * | 2006-08-23 | 2008-02-28 | Tokyo Ohka Kogyo Co., Ltd. | Composition de résine pour lithographie par immersion liquide, et méthode de formation d'un motif de résine |
WO2009026123A3 (en) * | 2007-08-23 | 2009-05-22 | 3M Innovative Properties Co | Method of preparing fluoropolymers by aqueous emulsion polymerization |
US7928262B2 (en) | 2006-06-27 | 2011-04-19 | Shin-Etsu Chemical Co., Ltd. | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
US8404790B2 (en) | 2005-07-15 | 2013-03-26 | 3M Innovative Properties Company | Aqueous emulsion polymerization process for producing fluoropolymers |
KR101377361B1 (ko) * | 2012-08-23 | 2014-03-21 | 금호타이어 주식회사 | 웨트성능이 우수한 공기입 타이어 |
WO2015141526A1 (ja) * | 2014-03-20 | 2015-09-24 | 住友ベークライト株式会社 | ポリマー、感光性樹脂組成物および電子装置 |
Families Citing this family (16)
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JP4085034B2 (ja) * | 2003-07-17 | 2008-04-30 | 信越化学工業株式会社 | 化合物、高分子化合物、レジスト材料及びパターン形成方法 |
JP4235810B2 (ja) * | 2003-10-23 | 2009-03-11 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
JP2005220274A (ja) * | 2004-02-09 | 2005-08-18 | Shin Etsu Chem Co Ltd | 高分子化合物、レジスト材料及びパターン形成方法 |
TWI332122B (en) | 2005-04-06 | 2010-10-21 | Shinetsu Chemical Co | Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process |
JP5124806B2 (ja) * | 2006-06-27 | 2013-01-23 | 信越化学工業株式会社 | 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法 |
KR101035742B1 (ko) * | 2006-09-28 | 2011-05-20 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 신규 광산 발생제 및 이것을 이용한 레지스트 재료 및 패턴형성 방법 |
US8003309B2 (en) * | 2008-01-16 | 2011-08-23 | International Business Machines Corporation | Photoresist compositions and methods of use in high index immersion lithography |
US9630151B2 (en) | 2015-03-31 | 2017-04-25 | Pall Corporation | Hydrophilically modified fluorinated membrane (V) |
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US9643131B2 (en) | 2015-07-31 | 2017-05-09 | Pall Corporation | Hydrophilic porous polytetrafluoroethylene membrane (I) |
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AU2001274579A1 (en) | 2000-06-21 | 2002-01-02 | Asahi Glass Company, Limited | Resist composition |
JP4055391B2 (ja) | 2000-11-10 | 2008-03-05 | 信越化学工業株式会社 | 高分子化合物、レジスト材料、及びパターン形成方法 |
JP3734015B2 (ja) * | 2000-11-16 | 2006-01-11 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
JP4065684B2 (ja) * | 2001-01-09 | 2008-03-26 | 三菱レイヨン株式会社 | 重合体、化学増幅型レジスト組成物、および、パターン形成方法 |
JP3904064B2 (ja) | 2001-02-28 | 2007-04-11 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
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JP2002350179A (ja) | 2001-05-24 | 2002-12-04 | Aisin Seiki Co Ltd | 回転検出装置 |
-
2003
- 2003-07-09 JP JP2003272269A patent/JP2005029527A/ja active Pending
-
2004
- 2004-07-01 US US10/563,557 patent/US7232917B2/en not_active Expired - Fee Related
- 2004-07-01 KR KR1020067000510A patent/KR101067970B1/ko active IP Right Grant
- 2004-07-01 WO PCT/JP2004/009680 patent/WO2005005404A1/ja active Application Filing
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006310565A (ja) * | 2005-04-28 | 2006-11-09 | Asahi Glass Co Ltd | 加工基板の製造方法 |
JP2006310566A (ja) * | 2005-04-28 | 2006-11-09 | Asahi Glass Co Ltd | 加工基板の製造方法 |
JP4736522B2 (ja) * | 2005-04-28 | 2011-07-27 | 旭硝子株式会社 | エッチング処理された処理基板の製造方法 |
JP4742665B2 (ja) * | 2005-04-28 | 2011-08-10 | 旭硝子株式会社 | エッチング処理された処理基板の製造方法 |
US8404790B2 (en) | 2005-07-15 | 2013-03-26 | 3M Innovative Properties Company | Aqueous emulsion polymerization process for producing fluoropolymers |
US7928262B2 (en) | 2006-06-27 | 2011-04-19 | Shin-Etsu Chemical Co., Ltd. | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
US8030515B2 (en) | 2006-06-27 | 2011-10-04 | Shin-Etsu Chemical Co., Ltd. | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
WO2008023555A1 (fr) * | 2006-08-23 | 2008-02-28 | Tokyo Ohka Kogyo Co., Ltd. | Composition de résine pour lithographie par immersion liquide, et méthode de formation d'un motif de résine |
WO2009026123A3 (en) * | 2007-08-23 | 2009-05-22 | 3M Innovative Properties Co | Method of preparing fluoropolymers by aqueous emulsion polymerization |
US8623957B2 (en) | 2007-08-23 | 2014-01-07 | 3M Innovative Properties Company | Method of preparing fluoropolymers by aqueous emulsion polymerization |
KR101377361B1 (ko) * | 2012-08-23 | 2014-03-21 | 금호타이어 주식회사 | 웨트성능이 우수한 공기입 타이어 |
WO2015141526A1 (ja) * | 2014-03-20 | 2015-09-24 | 住友ベークライト株式会社 | ポリマー、感光性樹脂組成物および電子装置 |
JPWO2015141526A1 (ja) * | 2014-03-20 | 2017-04-06 | 住友ベークライト株式会社 | ポリマー、感光性樹脂組成物および電子装置 |
Also Published As
Publication number | Publication date |
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US7232917B2 (en) | 2007-06-19 |
KR20060029683A (ko) | 2006-04-06 |
WO2005005404A1 (ja) | 2005-01-20 |
US20060270864A1 (en) | 2006-11-30 |
KR101067970B1 (ko) | 2011-09-26 |
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