TWI394955B - Contact load measuring device and inspection device - Google Patents

Contact load measuring device and inspection device Download PDF

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Publication number
TWI394955B
TWI394955B TW094122155A TW94122155A TWI394955B TW I394955 B TWI394955 B TW I394955B TW 094122155 A TW094122155 A TW 094122155A TW 94122155 A TW94122155 A TW 94122155A TW I394955 B TWI394955 B TW I394955B
Authority
TW
Taiwan
Prior art keywords
load
mounting table
contact load
probe
contact
Prior art date
Application number
TW094122155A
Other languages
English (en)
Chinese (zh)
Other versions
TW200606439A (en
Inventor
Isamu Inomata
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200606439A publication Critical patent/TW200606439A/zh
Application granted granted Critical
Publication of TWI394955B publication Critical patent/TWI394955B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/282Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
    • G01R31/2831Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Measuring Leads Or Probes (AREA)
TW094122155A 2004-08-02 2005-06-30 Contact load measuring device and inspection device TWI394955B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004226149A JP4809594B2 (ja) 2004-08-02 2004-08-02 検査装置

Publications (2)

Publication Number Publication Date
TW200606439A TW200606439A (en) 2006-02-16
TWI394955B true TWI394955B (zh) 2013-05-01

Family

ID=35787061

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094122155A TWI394955B (zh) 2004-08-02 2005-06-30 Contact load measuring device and inspection device

Country Status (5)

Country Link
US (1) US7688096B2 (enExample)
JP (1) JP4809594B2 (enExample)
KR (2) KR20080081041A (enExample)
TW (1) TWI394955B (enExample)
WO (1) WO2006013773A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006137733A1 (en) 2005-06-23 2006-12-28 Keygene N.V. Strategies for high throughput identification and detection of polymorphisms
AU2006295556B2 (en) 2005-09-29 2012-07-05 Keygene N.V. High throughput screening of mutagenized populations
DK3404114T3 (da) 2005-12-22 2021-06-28 Keygene Nv Fremgangsmåde til detektering af AFLP-baseret polymorfisme med højt gennemløb
TWI490513B (zh) * 2006-12-29 2015-07-01 Intest Corp 用於使負載沿平移軸線平移之負載定位系統以及使負載達到平衡之方法
EP2104862B1 (en) * 2006-12-29 2012-08-08 inTEST Corporation Test head positioning system and method
KR100901982B1 (ko) * 2007-07-12 2009-06-08 주식회사 실트론 접착강도 시험장치
KR100936631B1 (ko) * 2007-11-22 2010-01-14 주식회사 쎄믹스 웨이퍼 프로버의 z축 위치 제어 장치 및 방법
JP4605232B2 (ja) * 2008-02-21 2011-01-05 株式会社デンソー 荷重センサ及びその製造方法
JP4577585B2 (ja) * 2008-03-22 2010-11-10 株式会社デンソー 荷重センサの製造方法
US8519728B2 (en) * 2008-12-12 2013-08-27 Formfactor, Inc. Compliance control methods and apparatuses
JP5083339B2 (ja) * 2010-02-04 2012-11-28 東京エレクトロン株式会社 基板搬送装置及び基板搬送方法並びに記憶媒体
JP5529769B2 (ja) * 2011-01-13 2014-06-25 東京エレクトロン株式会社 プローブカードの熱的安定化方法及び検査装置
US8963567B2 (en) 2011-10-31 2015-02-24 International Business Machines Corporation Pressure sensing and control for semiconductor wafer probing
US8901947B2 (en) 2012-09-28 2014-12-02 Electro Scientific Industries, Inc. Probe out-of-position sensing for automated test equipment
JP6137994B2 (ja) * 2013-08-28 2017-05-31 東京エレクトロン株式会社 デバイス検査方法
CN103745943B (zh) * 2014-01-29 2016-05-25 上海华力微电子有限公司 表面颗粒检测仪量测平台
KR101975386B1 (ko) 2018-01-08 2019-09-10 주식회사 한화 관성 이동체를 구비한 제품용 검사 장치 및 이를 이용한 관성 이동체를 구비한 제품의 검사 방법
JP7374682B2 (ja) * 2019-09-17 2023-11-07 株式会社国際電気セミコンダクターサービス 抵抗率測定器、半導体装置の製造方法および抵抗率測定方法
CN113624605B (zh) * 2021-08-16 2024-06-11 陕西大工旭航电磁科技有限公司 基于电磁力加载的中应变率实验装置
CN119043561A (zh) * 2024-09-26 2024-11-29 宸光(常州)新材料科技有限公司 水压检测装置及检测方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10150081A (ja) * 1996-11-15 1998-06-02 Tokyo Seimitsu Co Ltd プロービング方法およびプローバ
US6286374B1 (en) * 1998-11-09 2001-09-11 Nsk Ltd. Preload measuring apparatus of rolling bearing
US6501289B1 (en) * 1999-03-11 2002-12-31 Tokyo Electron Limited Inspection stage including a plurality of Z shafts, and inspection apparatus
US6650135B1 (en) * 2000-06-29 2003-11-18 Motorola, Inc. Measurement chuck having piezoelectric elements and method
TW200403440A (en) * 2002-08-23 2004-03-01 Tokyo Electron Ltd Probe apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001358204A (ja) * 2000-06-15 2001-12-26 Tokyo Electron Ltd 検査ステージ
JP4782953B2 (ja) 2001-08-06 2011-09-28 東京エレクトロン株式会社 プローブカード特性測定装置、プローブ装置及びプローブ方法
JP4827339B2 (ja) * 2001-08-29 2011-11-30 帝国ピストンリング株式会社 摩擦力測定装置
JP2003168707A (ja) * 2001-11-30 2003-06-13 Tokyo Electron Ltd プローブ装置
JP2003185704A (ja) * 2001-12-17 2003-07-03 Seiko Epson Corp 電極検査装置
US7068056B1 (en) * 2005-07-18 2006-06-27 Texas Instruments Incorporated System and method for the probing of a wafer

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10150081A (ja) * 1996-11-15 1998-06-02 Tokyo Seimitsu Co Ltd プロービング方法およびプローバ
US6286374B1 (en) * 1998-11-09 2001-09-11 Nsk Ltd. Preload measuring apparatus of rolling bearing
US6501289B1 (en) * 1999-03-11 2002-12-31 Tokyo Electron Limited Inspection stage including a plurality of Z shafts, and inspection apparatus
US6650135B1 (en) * 2000-06-29 2003-11-18 Motorola, Inc. Measurement chuck having piezoelectric elements and method
TW200403440A (en) * 2002-08-23 2004-03-01 Tokyo Electron Ltd Probe apparatus

Also Published As

Publication number Publication date
KR20070028611A (ko) 2007-03-12
US7688096B2 (en) 2010-03-30
JP2006047025A (ja) 2006-02-16
JP4809594B2 (ja) 2011-11-09
US20090039903A1 (en) 2009-02-12
TW200606439A (en) 2006-02-16
WO2006013773A1 (ja) 2006-02-09
KR20080081041A (ko) 2008-09-05

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